JP7263708B2 - ポリカルボシラン含有組成物 - Google Patents

ポリカルボシラン含有組成物 Download PDF

Info

Publication number
JP7263708B2
JP7263708B2 JP2018134574A JP2018134574A JP7263708B2 JP 7263708 B2 JP7263708 B2 JP 7263708B2 JP 2018134574 A JP2018134574 A JP 2018134574A JP 2018134574 A JP2018134574 A JP 2018134574A JP 7263708 B2 JP7263708 B2 JP 7263708B2
Authority
JP
Japan
Prior art keywords
methyl
group
acetate
ethyl
ether
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2018134574A
Other languages
English (en)
Japanese (ja)
Other versions
JP2020012951A (ja
Inventor
謙 石橋
修平 志垣
誠 中島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissan Chemical Corp
Original Assignee
Nissan Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissan Chemical Corp filed Critical Nissan Chemical Corp
Priority to JP2018134574A priority Critical patent/JP7263708B2/ja
Publication of JP2020012951A publication Critical patent/JP2020012951A/ja
Priority to JP2023003464A priority patent/JP7494954B2/ja
Application granted granted Critical
Publication of JP7263708B2 publication Critical patent/JP7263708B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2018134574A 2018-07-17 2018-07-17 ポリカルボシラン含有組成物 Active JP7263708B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2018134574A JP7263708B2 (ja) 2018-07-17 2018-07-17 ポリカルボシラン含有組成物
JP2023003464A JP7494954B2 (ja) 2018-07-17 2023-01-13 ポリカルボシラン含有組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2018134574A JP7263708B2 (ja) 2018-07-17 2018-07-17 ポリカルボシラン含有組成物

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2023003464A Division JP7494954B2 (ja) 2018-07-17 2023-01-13 ポリカルボシラン含有組成物

Publications (2)

Publication Number Publication Date
JP2020012951A JP2020012951A (ja) 2020-01-23
JP7263708B2 true JP7263708B2 (ja) 2023-04-25

Family

ID=69170982

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2018134574A Active JP7263708B2 (ja) 2018-07-17 2018-07-17 ポリカルボシラン含有組成物
JP2023003464A Active JP7494954B2 (ja) 2018-07-17 2023-01-13 ポリカルボシラン含有組成物

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2023003464A Active JP7494954B2 (ja) 2018-07-17 2023-01-13 ポリカルボシラン含有組成物

Country Status (1)

Country Link
JP (2) JP7263708B2 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102460271B1 (ko) * 2015-04-03 2022-10-28 닛산 가가쿠 가부시키가이샤 광가교기를 가지는 단차 기판 피복 조성물
WO2025009380A1 (ja) * 2023-07-06 2025-01-09 Jsr株式会社 半導体基板の製造方法及び反転パターン形成材

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003316019A (ja) 2002-04-24 2003-11-06 Toshiba Corp パターン形成方法および半導体装置の製造方法
JP2011248242A (ja) 2010-05-28 2011-12-08 Jsr Corp 絶縁パターン形成方法及びダマシンプロセス用絶縁パターン形成材料
US20120321854A1 (en) 2009-12-01 2012-12-20 University Of Massachusetts System For Producing Patterned Silicon Carbide Structures
WO2018066515A1 (ja) 2016-10-04 2018-04-12 日産化学工業株式会社 パターン反転のための被覆組成物

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003316019A (ja) 2002-04-24 2003-11-06 Toshiba Corp パターン形成方法および半導体装置の製造方法
US20120321854A1 (en) 2009-12-01 2012-12-20 University Of Massachusetts System For Producing Patterned Silicon Carbide Structures
JP2011248242A (ja) 2010-05-28 2011-12-08 Jsr Corp 絶縁パターン形成方法及びダマシンプロセス用絶縁パターン形成材料
WO2018066515A1 (ja) 2016-10-04 2018-04-12 日産化学工業株式会社 パターン反転のための被覆組成物

Also Published As

Publication number Publication date
JP2023040240A (ja) 2023-03-22
JP7494954B2 (ja) 2024-06-04
JP2020012951A (ja) 2020-01-23

Similar Documents

Publication Publication Date Title
JP7197840B2 (ja) アンモニウム基を有する有機基を含むシリコン含有レジスト下層膜形成組成物
JP6540971B2 (ja) Ｓｏｃパターン上でのパターン反転のための被覆用組成物
JP5067537B2 (ja) 多核フェノールを含むレジスト下層膜形成組成物
US12084592B2 (en) Coating composition for pattern inversion
US10508174B2 (en) Silicon-containing coating agent for reversing planarization pattern
WO2017145808A1 (ja) シリコン含有組成物を用いた半導体基板の平坦化方法
JP2023040240A (ja) ポリカルボシラン含有組成物
JP7112023B2 (ja) 溶剤置換法を用いたレジストパターン塗布用組成物の製造方法
US20180197731A1 (en) Resist pattern coating composition including vinyl group- or (meth) acryloxy group-containing polysiloxane
JP7143763B2 (ja) シリコン含有パターン反転用被覆剤
JP4831330B2 (ja) ポリカルボシランを含むレジスト下層膜形成組成物
KR102933532B1 (ko) 실리콘함유 폴리머 조성물의 제조방법
CN113785243B (zh) 抗蚀剂图案金属化工艺用组合物

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20210706

RD02 Notification of acceptance of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7422

Effective date: 20210706

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20220530

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20220607

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20221018

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20230113

C60 Trial request (containing other claim documents, opposition documents)

Free format text: JAPANESE INTERMEDIATE CODE: C60

Effective date: 20230113

C11 Written invitation by the commissioner to file amendments

Free format text: JAPANESE INTERMEDIATE CODE: C11

Effective date: 20230124

A911 Transfer to examiner for re-examination before appeal (zenchi)

Free format text: JAPANESE INTERMEDIATE CODE: A911

Effective date: 20230130

C21 Notice of transfer of a case for reconsideration by examiners before appeal proceedings

Free format text: JAPANESE INTERMEDIATE CODE: C21

Effective date: 20230131

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20230314

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20230327

R151 Written notification of patent or utility model registration

Ref document number: 7263708

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R151