JP7262673B2 - オゾン水製造装置、水処理装置およびオゾン水製造方法 - Google Patents

オゾン水製造装置、水処理装置およびオゾン水製造方法 Download PDF

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JP7262673B2
JP7262673B2 JP2022530370A JP2022530370A JP7262673B2 JP 7262673 B2 JP7262673 B2 JP 7262673B2 JP 2022530370 A JP2022530370 A JP 2022530370A JP 2022530370 A JP2022530370 A JP 2022530370A JP 7262673 B2 JP7262673 B2 JP 7262673B2
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Prior art keywords
water
gas
ozone
dissolved
ozonated
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Japanese (ja)
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JPWO2021250745A1 (zh
JPWO2021250745A5 (zh
Inventor
昇 和田
泰宏 谷村
登起子 山内
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Mitsubishi Electric Corp
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Mitsubishi Electric Corp
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    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
    • C01B13/10—Preparation of ozone
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
    • C01B13/10—Preparation of ozone
    • C01B13/11—Preparation of ozone by electric discharge
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/44—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/50—Treatment of water, waste water, or sewage by addition or application of a germicide or by oligodynamic treatment
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/72—Treatment of water, waste water, or sewage by oxidation
    • C02F1/78—Treatment of water, waste water, or sewage by oxidation with ozone
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F3/00—Biological treatment of water, waste water, or sewage
    • C02F3/02—Aerobic processes
    • C02F3/12—Activated sludge processes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02W—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
    • Y02W10/00—Technologies for wastewater treatment
    • Y02W10/10—Biological treatment of water, waste water, or sewage

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • Inorganic Chemistry (AREA)
  • Biodiversity & Conservation Biology (AREA)
  • Microbiology (AREA)
  • Treatment Of Water By Oxidation Or Reduction (AREA)
JP2022530370A 2020-06-08 2020-06-08 オゾン水製造装置、水処理装置およびオゾン水製造方法 Active JP7262673B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2020/022549 WO2021250745A1 (ja) 2020-06-08 2020-06-08 オゾン水製造装置、水処理装置およびオゾン水製造方法

Publications (3)

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JPWO2021250745A1 JPWO2021250745A1 (zh) 2021-12-16
JPWO2021250745A5 JPWO2021250745A5 (zh) 2022-08-04
JP7262673B2 true JP7262673B2 (ja) 2023-04-21

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JP2022530370A Active JP7262673B2 (ja) 2020-06-08 2020-06-08 オゾン水製造装置、水処理装置およびオゾン水製造方法

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Country Link
JP (1) JP7262673B2 (zh)
CN (1) CN115702116B (zh)
TW (1) TWI799876B (zh)
WO (1) WO2021250745A1 (zh)

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001180915A (ja) 1999-12-20 2001-07-03 Sumitomo Precision Prod Co Ltd オゾン発生設備及びその運転方法
WO2009069772A1 (ja) 2007-11-30 2009-06-04 Mitsubishi Electric Corporation オゾン濃縮装置
JP2013188655A (ja) 2012-03-13 2013-09-26 Hitachi-Ge Nuclear Energy Ltd オゾンを用いた有機物分解システム
WO2015125500A1 (ja) 2014-02-20 2015-08-27 オルガノ株式会社 オゾン水供給方法及びオゾン水供給装置
WO2017149758A1 (ja) 2016-03-04 2017-09-08 三菱電機株式会社 膜ろ過装置、ろ過膜洗浄方法、およびろ過膜の製造方法
JP6444574B1 (ja) 2018-06-08 2018-12-26 三菱電機株式会社 水処理システムおよび水処理方法
JP6617860B1 (ja) 2019-05-27 2019-12-11 三菱電機株式会社 膜分離活性汚泥システムおよび膜洗浄装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000037695A (ja) * 1998-07-24 2000-02-08 Kurita Water Ind Ltd オゾン水供給装置
JP4587111B2 (ja) * 2000-04-06 2010-11-24 栗田工業株式会社 オゾン溶解水供給装置
JP4513122B2 (ja) * 2004-03-31 2010-07-28 栗田工業株式会社 オゾン水供給方法及びオゾン水供給装置
JP5874223B2 (ja) * 2011-07-08 2016-03-02 栗田工業株式会社 オゾン水供給装置及びオゾン水供給方法
JP5893939B2 (ja) * 2012-02-02 2016-03-23 松村 明子 オゾン水生成装置及びオゾン水生成方法
JP2014079722A (ja) * 2012-10-18 2014-05-08 Japan Organo Co Ltd オゾン水製造方法
MY181737A (en) * 2014-08-29 2021-01-06 Mitsubishi Electric Corp Method and apparatus for cleaning filter membrane, and water treatment system
JP2016064386A (ja) * 2014-09-18 2016-04-28 株式会社荏原製作所 ガス溶解水製造装置および製造方法
WO2018225186A1 (ja) * 2017-06-07 2018-12-13 三菱電機株式会社 水処理膜の洗浄装置及び洗浄方法、並びに水処理システム
WO2019212046A1 (ja) * 2018-05-02 2019-11-07 国立大学法人東北大学 加熱オゾン水の製造方法、加熱オゾン水および半導体ウエハ洗浄液

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001180915A (ja) 1999-12-20 2001-07-03 Sumitomo Precision Prod Co Ltd オゾン発生設備及びその運転方法
WO2009069772A1 (ja) 2007-11-30 2009-06-04 Mitsubishi Electric Corporation オゾン濃縮装置
JP2013188655A (ja) 2012-03-13 2013-09-26 Hitachi-Ge Nuclear Energy Ltd オゾンを用いた有機物分解システム
WO2015125500A1 (ja) 2014-02-20 2015-08-27 オルガノ株式会社 オゾン水供給方法及びオゾン水供給装置
WO2017149758A1 (ja) 2016-03-04 2017-09-08 三菱電機株式会社 膜ろ過装置、ろ過膜洗浄方法、およびろ過膜の製造方法
JP6444574B1 (ja) 2018-06-08 2018-12-26 三菱電機株式会社 水処理システムおよび水処理方法
JP6617860B1 (ja) 2019-05-27 2019-12-11 三菱電機株式会社 膜分離活性汚泥システムおよび膜洗浄装置

Also Published As

Publication number Publication date
TW202146107A (zh) 2021-12-16
TWI799876B (zh) 2023-04-21
CN115702116A (zh) 2023-02-14
JPWO2021250745A1 (zh) 2021-12-16
WO2021250745A1 (ja) 2021-12-16
CN115702116B (zh) 2024-09-13

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