JP7189180B2 - 逆向き磁化磁気構造体を生成する方法 - Google Patents
逆向き磁化磁気構造体を生成する方法 Download PDFInfo
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- H01F41/16—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates the magnetic material being applied in the form of particles, e.g. by serigraphy, to form thick magnetic films or precursors therefor
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- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
- B81C1/00214—Processes for the simultaneaous manufacturing of a network or an array of similar microstructural devices
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- H01F1/03—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity
- H01F1/032—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of hard-magnetic materials
- H01F1/04—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of hard-magnetic materials metals or alloys
- H01F1/047—Alloys characterised by their composition
- H01F1/053—Alloys characterised by their composition containing rare earth metals
- H01F1/055—Alloys characterised by their composition containing rare earth metals and magnetic transition metals, e.g. SmCo5
- H01F1/057—Alloys characterised by their composition containing rare earth metals and magnetic transition metals, e.g. SmCo5 and IIIa elements, e.g. Nd2Fe14B
- H01F1/0571—Alloys characterised by their composition containing rare earth metals and magnetic transition metals, e.g. SmCo5 and IIIa elements, e.g. Nd2Fe14B in the form of particles, e.g. rapid quenched powders or ribbon flakes
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- H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
- H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
- H01F10/12—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys
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- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
- H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
- H01F10/12—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys
- H01F10/123—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys having a L10 crystallographic structure, e.g. [Co,Fe][Pt,Pd] thin films
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- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
- H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
- H01F10/12—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys
- H01F10/126—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys containing rare earth metals
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- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/02—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets
- H01F41/0253—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing permanent magnets
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- H—ELECTRICITY
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- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/02—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets
- H01F41/0253—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing permanent magnets
- H01F41/0273—Imparting anisotropy
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- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
- H01F41/22—Heat treatment; Thermal decomposition; Chemical vapour deposition
Description
・ 構造体/磁石の端部長さ:10~1000μm、及び/又は
・ 構造体/磁石同士の間の距離:10~1000μm
・ 構造体/磁石の端部長さ:20~500μm、及び/又は
・ 構造体/磁石同士の間の距離:20~500μm
・ 小型磁気スケール、
・ ボイルコイルドライブやハルバッハ配列に基づいたMEMS部品、
・ 磁気浮上に基づいて無接触で支持された硬磁性構造体又はマイクロ構造体の可動配列体を備えるMEMS部品。
113 基板材の第一面
116 基板材の第二面
120 キャビティ
130 第一硬磁性体(物質)
140 第二硬磁性体(物質)
300 磁気構造体
350 硬磁性構造体
Claims (13)
- 基板材(110、110a、110b)の中又は上に磁気構造体(300、700、800、900、1000)を生成する方法(110A、110B)であって、
前記基板材の中又は上に複数の第一キャビティ(120)を生成し、第一保磁力(HCA、HCB、H1、H2)を示す第一硬磁性体(130、140)で前記複数の第一キャビティを充填して、第一硬磁性配列体(350、1140a、1140b)を生成することと、
前記基板材の中又は上に複数の第二キャビティを生成し、前記第一保磁力よりも小さな第二保磁力を示す第二硬磁性体で前記複数の第二キャビティを充填して、第二硬磁性配列体(350、1140a、1140b)を生成することと、
前記第一保磁力及び前記第二保磁力を超える磁場強度を示す第一磁場を用いて、前記第一硬磁性配列体及び前記第二硬磁性配列体を第一向きに磁化することと、
前記第一保磁力未満であるが前記第二保磁力を超える磁場強度を示す第二磁場を用いて、前記第一向きと異なる第二向きに前記第二硬磁性配列体を磁化することと、を備え、
前記第二硬磁性配列体を磁化することが、前記第一硬磁性配列体及び前記第二硬磁性配列体を前記第二磁場に晒すことを含む、方法。 - 前記第一保磁力と前記第二保磁力との間の差が50%以上である、請求項1に記載の方法。
- 前記第一硬磁性配列体の第一キャビティの深さ及び/又は断面積が前記第二硬磁性配列体の第二キャビティの深さ及び/又は断面積と異なることで、磁化後の前記第一硬磁性配列体の各磁石と前記第二硬磁性配列体の各磁石の磁場強度が等しくなっている、請求項1又は2に記載の方法。
- 前記第一キャビティの断面積が前記第二キャビティの断面積と等しく、前記第一キャビティの深さが前記第二キャビティの深さと異なることで、磁化後の前記第一硬磁性配列体の各磁石と前記第二硬磁性配列体の各磁石の磁場強度が等しくなっている、請求項3に記載の方法。
- 前記複数の第一キャビティと前記複数の第二キャビティを充填することが、充填された物質を物理的及び/又は化学的に固化させることを備える、請求項1から4のいずれか一項に記載の方法。
- 前記充填された物質を物理的及び/又は化学的に固化させることが、前記基板材に原子層堆積法を行うことを備える、請求項5に記載の方法。
- 前記基板材がガラス材、シリコン材、プラスチック材、又はセラミック材である、請求項1から6のいずれか一項に記載の方法。
- 前記第一硬磁性体と前記第二硬磁性体がNdFeB材及び/又はSmCo材及び/又はPtCo材である、請求項1から7のいずれか一項に記載の方法。
- 前記第一硬磁性体と前記第二硬磁性体が粉体(230)及び/又は物質粒子(230)である、請求項1から8のいずれか一項に記載の方法。
- 前記基板材の中又は上に前記第一硬磁性配列体と前記第二硬磁性配列体を生成することが、
第一基板の中又は上に前記第一硬磁性配列体を生成するステップと、
第二基板の中又は上に前記第二硬磁性配列体を生成するステップと、を含み、
前記第一基板と前記第二基板が磁化前に接続される、請求項1から9のいずれか一項に記載の方法。 - 前記基板材の中又は上に前記第一硬磁性配列体と前記第二硬磁性配列体を生成することが、
第一基板の中又は上に第一数個の第一硬磁性配列体と第二硬磁性配列体を生成するステップと、
第二基板の中又は上に第二数個の第一硬磁性配列体と第二硬磁性配列体を生成するステップと、を含む
前記第一基板と前記第二基板が磁化前に接続される、請求項1から9のいずれか一項に記載の方法。 - 前記第一硬磁性配列体(350、1140a、1140b)の各磁石と前記第二硬磁性配列体(350、1140a、1140b)の各磁石が基板材の中又は上に交互に配置されている、請求項1から11のいずれか一項に記載の方法。
- 前記第一硬磁性配列体及び/又は前記第二硬磁性配列体が、前記基板材の第一面(113)上に位置するか、又は、前記基板材の第一面から前記基板材の所定の深さまで若しくは前記第一面の反対側の第二面(116)まで延在する、請求項1から12のいずれか一項に記載の方法。
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Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007227916A (ja) | 2006-02-22 | 2007-09-06 | Samsung Electronics Co Ltd | マグネチックドメイン移動を利用した磁気メモリ |
JP2012529181A (ja) | 2009-06-02 | 2012-11-15 | コリレイテッド マグネティックス リサーチ, エルエルシー | 磁界放出システム及び方法 |
JP2014095535A (ja) | 2012-11-12 | 2014-05-22 | Nissan Motor Co Ltd | 磁気冷暖房装置 |
JP6260339B2 (ja) | 2014-02-24 | 2018-01-17 | 富士通株式会社 | 情報処理装置,データ変換プログラム,及びデータ変換方法 |
JP2018201018A (ja) | 2017-05-26 | 2018-12-20 | 日東電工株式会社 | 磁石の製造方法および磁石の着磁方法 |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54152200A (en) | 1978-05-22 | 1979-11-30 | Sony Corp | Method and apparatus for magnetizing magnetic lattice pattern |
DE3026299A1 (de) * | 1980-07-11 | 1982-02-04 | Magnetfabrik Bonn Gmbh Vorm. Gewerkschaft Windhorst, 5300 Bonn | Dauermagnetsystem mit mehreren dauermagneten, die in zueinander entgegengesetzten richtungen magnetisiert sind |
US5396136A (en) | 1992-10-28 | 1995-03-07 | Sri International | Magnetic field levitation |
JP3179616B2 (ja) | 1993-03-02 | 2001-06-25 | アポロ医療器株式会社 | 軟質線状磁性体の着磁装置 |
KR100403970B1 (ko) | 2000-09-08 | 2003-11-01 | 학교법인 서강대학교 | 자성유체를 이용한 마이크로 펌프 및 이 마이크로 펌프에자성유체를 수용하는 방법 |
JP2004063050A (ja) | 2002-07-31 | 2004-02-26 | Hoya Corp | 磁気ディスク用磁気記録媒体およびその製造方法 |
DE102004049999A1 (de) | 2004-10-14 | 2006-04-20 | Giesecke & Devrient Gmbh | Sicherheitselement |
WO2007062268A2 (en) | 2005-11-28 | 2007-05-31 | University Of Florida Research Foundation, Inc. | Method and structure for magnetically-directed, self-assembly of three-dimensional structures |
US7428092B2 (en) * | 2005-11-30 | 2008-09-23 | Spatial Photonics, Inc. | Fast-response micro-mechanical devices |
JP2009004069A (ja) | 2007-05-22 | 2009-01-08 | Fujitsu Ltd | 磁気ヘッドおよび情報記憶装置 |
RU2549137C2 (ru) | 2010-06-09 | 2015-04-20 | Гизеке Унд Девриент Гмбх | Способ и устройство для проверки ценных документов |
DE102011010899A1 (de) | 2011-02-04 | 2012-08-09 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zum Erzeugen einer dreidimensionalen Struktur sowie dreidimensionale Struktur |
DE102013205891A1 (de) | 2013-04-03 | 2014-10-09 | Giesecke & Devrient Gmbh | Prüfung eines mit Magnetmaterialien versehenen Sicherheitselements |
WO2015058206A1 (en) * | 2013-10-18 | 2015-04-23 | The General Hosptial Corporation | Microfluidic sorting using high gradient magnetic fields |
US10121581B2 (en) | 2014-09-29 | 2018-11-06 | Apple Inc. | Method for magnetizing multiple zones in a monolithic piece of magnetic material |
DE102015115347A1 (de) | 2015-09-11 | 2017-03-16 | Beckhoff Automation Gmbh | Magnetanordnung für einen elektrischen Motor |
DE102016215616B4 (de) * | 2016-08-19 | 2020-02-20 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zum Herstellen einer magnetischen Struktur und Vorrichtung |
US10014465B1 (en) | 2017-04-03 | 2018-07-03 | Headway Technologies, Inc. | Maintaining coercive field after high temperature anneal for magnetic device applications with perpendicular magnetic anisotropy |
BE1025465B1 (de) | 2017-08-11 | 2019-03-11 | Phoenix Contact Gmbh & Co. Kg | Verfahren zum Magnetisieren von mindestens zwei Magneten unterschiedlicher magnetischer Koerzitivfeldstärken |
CN111213328B (zh) * | 2017-08-15 | 2023-06-16 | 弗劳恩霍夫应用研究促进协会 | 无线网络和设备 |
-
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Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007227916A (ja) | 2006-02-22 | 2007-09-06 | Samsung Electronics Co Ltd | マグネチックドメイン移動を利用した磁気メモリ |
JP2012529181A (ja) | 2009-06-02 | 2012-11-15 | コリレイテッド マグネティックス リサーチ, エルエルシー | 磁界放出システム及び方法 |
JP2014095535A (ja) | 2012-11-12 | 2014-05-22 | Nissan Motor Co Ltd | 磁気冷暖房装置 |
JP6260339B2 (ja) | 2014-02-24 | 2018-01-17 | 富士通株式会社 | 情報処理装置,データ変換プログラム,及びデータ変換方法 |
JP2018201018A (ja) | 2017-05-26 | 2018-12-20 | 日東電工株式会社 | 磁石の製造方法および磁石の着磁方法 |
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