JP7181184B2 - シンクロトロンビームラインにおいて、ナノメートル機械的安定性及び分解能を有する光学素子を移動及び位置決めするための機器 - Google Patents

シンクロトロンビームラインにおいて、ナノメートル機械的安定性及び分解能を有する光学素子を移動及び位置決めするための機器 Download PDF

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JP7181184B2
JP7181184B2 JP2019513887A JP2019513887A JP7181184B2 JP 7181184 B2 JP7181184 B2 JP 7181184B2 JP 2019513887 A JP2019513887 A JP 2019513887A JP 2019513887 A JP2019513887 A JP 2019513887A JP 7181184 B2 JP7181184 B2 JP 7181184B2
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Japan
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complementary
rotation
mounting structure
axis
translational
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Japanese (ja)
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JP2019529902A5 (enExample
JP2019529902A (ja
Inventor
ジェラウデス，レナン ラマロー
カリアーリ，リカルド マラゴジ
シルヴァ，マーロン サヴェリ
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Centro Nacional de Pesquisa em Energia e Materiais CNPEM
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Centro Nacional de Pesquisa em Energia e Materiais CNPEM
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Priority claimed from BR102016020900A external-priority patent/BR102016020900A2/pt
Application filed by Centro Nacional de Pesquisa em Energia e Materiais CNPEM filed Critical Centro Nacional de Pesquisa em Energia e Materiais CNPEM
Priority claimed from BR102017019178-8A external-priority patent/BR102017019178B1/pt
Publication of JP2019529902A publication Critical patent/JP2019529902A/ja
Publication of JP2019529902A5 publication Critical patent/JP2019529902A5/ja
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G02B26/101—Scanning systems with both horizontal and vertical deflecting means, e.g. raster or XY scanners
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/003—Alignment of optical elements
    • G02B7/005—Motorised alignment
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/062—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements the element being a crystal
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/067—Construction details
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K41/00—Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path
    • H02K41/02—Linear motors; Sectional motors
    • H02K41/035—DC motors; Unipolar motors
    • H02K41/0352—Unipolar motors
    • H02K41/0354—Lorentz force motors, e.g. voice coil motors

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Particle Accelerators (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2019513887A 2016-09-09 2017-09-06 シンクロトロンビームラインにおいて、ナノメートル機械的安定性及び分解能を有する光学素子を移動及び位置決めするための機器 Active JP7181184B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
BR102016020900A BR102016020900A2 (pt) 2016-09-09 2016-09-09 método de controle de grau de liberdade em sistemas mecatrônicos e monocromador de duplo cristal
BRBR102016020900-5 2016-09-09
BRBR102017019178-8 2017-09-06
BR102017019178-8A BR102017019178B1 (pt) 2017-09-06 2017-09-06 Instrumento para movimentação e posicionamento de elementos ópticos com resolução e estabilidade mecânica nanométricas em linhas de luz
PCT/BR2017/050262 WO2018045441A1 (pt) 2016-09-09 2017-09-06 Instrumento para movimentação e posicionamento de elementos ópticos com resolução e estabilidade mecânica nanométricas em linhas de luz

Publications (3)

Publication Number Publication Date
JP2019529902A JP2019529902A (ja) 2019-10-17
JP2019529902A5 JP2019529902A5 (enExample) 2022-08-15
JP7181184B2 true JP7181184B2 (ja) 2022-11-30

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JP2019513887A Active JP7181184B2 (ja) 2016-09-09 2017-09-06 シンクロトロンビームラインにおいて、ナノメートル機械的安定性及び分解能を有する光学素子を移動及び位置決めするための機器

Country Status (5)

Country Link
US (2) US20190204590A1 (enExample)
JP (1) JP7181184B2 (enExample)
AU (1) AU2017325120B2 (enExample)
CA (1) CA3036294C (enExample)
WO (1) WO2018045441A1 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20240168395A1 (en) * 2022-11-18 2024-05-23 Orbotech Ltd. Vertical motion axis for imaging optical head

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003203860A (ja) 2001-12-21 2003-07-18 Asml Netherlands Bv リソグラフィ装置およびデバイス製造方法
JP2004343078A (ja) 2003-04-04 2004-12-02 Asml Netherlands Bv リソグラフィ装置およびデバイス製造方法
JP2013221874A (ja) 2012-04-17 2013-10-28 Osaka Univ Ｘ線光学システム
WO2015135857A1 (en) 2014-03-12 2015-09-17 Carl Zeiss Smt Gmbh Vibration-compensated optical system, lithography apparatus and method

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2590418B2 (ja) * 1992-06-25 1997-03-12 工業技術院長 ブタン液送システム
US5283682A (en) * 1992-10-06 1994-02-01 Ball Corporation Reactionless scanning and positioning system
US8358039B2 (en) * 2008-10-17 2013-01-22 Massachusetts Institute Of Technology High-scan rate positioner for scanned probe microscopy

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003203860A (ja) 2001-12-21 2003-07-18 Asml Netherlands Bv リソグラフィ装置およびデバイス製造方法
JP2004343078A (ja) 2003-04-04 2004-12-02 Asml Netherlands Bv リソグラフィ装置およびデバイス製造方法
JP2013221874A (ja) 2012-04-17 2013-10-28 Osaka Univ Ｘ線光学システム
WO2015135857A1 (en) 2014-03-12 2015-09-17 Carl Zeiss Smt Gmbh Vibration-compensated optical system, lithography apparatus and method

Also Published As

Publication number Publication date
AU2017325120A1 (en) 2019-04-11
CA3036294A1 (en) 2018-03-15
CA3036294C (en) 2024-03-26
WO2018045441A1 (pt) 2018-03-15
US20220075179A1 (en) 2022-03-10
US11747612B2 (en) 2023-09-05
AU2017325120B2 (en) 2022-03-24
US20190204590A1 (en) 2019-07-04
JP2019529902A (ja) 2019-10-17

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