CA3036294C - Instrument for moving and positioning of optical elements with nanometric mechanical stability and resolution in synchroton light source beamlines - Google Patents

Instrument for moving and positioning of optical elements with nanometric mechanical stability and resolution in synchroton light source beamlines Download PDF

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Publication number
CA3036294C
CA3036294C CA3036294A CA3036294A CA3036294C CA 3036294 C CA3036294 C CA 3036294C CA 3036294 A CA3036294 A CA 3036294A CA 3036294 A CA3036294 A CA 3036294A CA 3036294 C CA3036294 C CA 3036294C
Authority
CA
Canada
Prior art keywords
complementary
mounting structure
rotation axis
relation
instrument
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CA3036294A
Other languages
English (en)
French (fr)
Other versions
CA3036294A1 (en
Inventor
Renan RAMALHO GERALDES
Ricardo MALAGODI CALIARI
Marlon SAVERI SILVA
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Centro Nacional de Pesquisa em Energia e Materiais CNPEM
Original Assignee
Centro Nacional de Pesquisa em Energia e Materiais CNPEM
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from BR102016020900A external-priority patent/BR102016020900A2/pt
Application filed by Centro Nacional de Pesquisa em Energia e Materiais CNPEM filed Critical Centro Nacional de Pesquisa em Energia e Materiais CNPEM
Priority claimed from BR102017019178-8A external-priority patent/BR102017019178B1/pt
Publication of CA3036294A1 publication Critical patent/CA3036294A1/en
Application granted granted Critical
Publication of CA3036294C publication Critical patent/CA3036294C/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G02B26/101—Scanning systems with both horizontal and vertical deflecting means, e.g. raster or XY scanners
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/003—Alignment of optical elements
    • G02B7/005—Motorised alignment
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/062—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements the element being a crystal
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/067—Construction details
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K41/00—Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path
    • H02K41/02—Linear motors; Sectional motors
    • H02K41/035—DC motors; Unipolar motors
    • H02K41/0352—Unipolar motors
    • H02K41/0354—Lorentz force motors, e.g. voice coil motors

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Particle Accelerators (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
CA3036294A 2016-09-09 2017-09-06 Instrument for moving and positioning of optical elements with nanometric mechanical stability and resolution in synchroton light source beamlines Active CA3036294C (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
BR102016020900A BR102016020900A2 (pt) 2016-09-09 2016-09-09 método de controle de grau de liberdade em sistemas mecatrônicos e monocromador de duplo cristal
BRBR102016020900-5 2016-09-09
BRBR102017019178-8 2017-09-06
BR102017019178-8A BR102017019178B1 (pt) 2017-09-06 2017-09-06 Instrumento para movimentação e posicionamento de elementos ópticos com resolução e estabilidade mecânica nanométricas em linhas de luz
PCT/BR2017/050262 WO2018045441A1 (pt) 2016-09-09 2017-09-06 Instrumento para movimentação e posicionamento de elementos ópticos com resolução e estabilidade mecânica nanométricas em linhas de luz

Publications (2)

Publication Number Publication Date
CA3036294A1 CA3036294A1 (en) 2018-03-15
CA3036294C true CA3036294C (en) 2024-03-26

Family

ID=61561391

Family Applications (1)

Application Number Title Priority Date Filing Date
CA3036294A Active CA3036294C (en) 2016-09-09 2017-09-06 Instrument for moving and positioning of optical elements with nanometric mechanical stability and resolution in synchroton light source beamlines

Country Status (5)

Country Link
US (2) US20190204590A1 (enExample)
JP (1) JP7181184B2 (enExample)
AU (1) AU2017325120B2 (enExample)
CA (1) CA3036294C (enExample)
WO (1) WO2018045441A1 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20240168395A1 (en) * 2022-11-18 2024-05-23 Orbotech Ltd. Vertical motion axis for imaging optical head

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2590418B2 (ja) * 1992-06-25 1997-03-12 工業技術院長 ブタン液送システム
US5283682A (en) * 1992-10-06 1994-02-01 Ball Corporation Reactionless scanning and positioning system
EP1321822A1 (en) * 2001-12-21 2003-06-25 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
US7126671B2 (en) 2003-04-04 2006-10-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8358039B2 (en) * 2008-10-17 2013-01-22 Massachusetts Institute Of Technology High-scan rate positioner for scanned probe microscopy
JP6048867B2 (ja) 2012-04-17 2016-12-21 国立大学法人大阪大学 Ｘ線光学システム
DE102014204523A1 (de) * 2014-03-12 2015-09-17 Carl Zeiss Smt Gmbh Schwingungskompensiertes optisches system, lithographieanlage und verfahren

Also Published As

Publication number Publication date
JP7181184B2 (ja) 2022-11-30
AU2017325120A1 (en) 2019-04-11
CA3036294A1 (en) 2018-03-15
WO2018045441A1 (pt) 2018-03-15
US20220075179A1 (en) 2022-03-10
US11747612B2 (en) 2023-09-05
AU2017325120B2 (en) 2022-03-24
US20190204590A1 (en) 2019-07-04
JP2019529902A (ja) 2019-10-17

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