JP7162499B2 - 温調装置 - Google Patents
温調装置 Download PDFInfo
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- JP7162499B2 JP7162499B2 JP2018211417A JP2018211417A JP7162499B2 JP 7162499 B2 JP7162499 B2 JP 7162499B2 JP 2018211417 A JP2018211417 A JP 2018211417A JP 2018211417 A JP2018211417 A JP 2018211417A JP 7162499 B2 JP7162499 B2 JP 7162499B2
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- 239000000758 substrate Substances 0.000 claims description 92
- 230000002093 peripheral effect Effects 0.000 claims description 47
- 238000007789 sealing Methods 0.000 claims description 34
- 239000004065 semiconductor Substances 0.000 description 34
- 238000005530 etching Methods 0.000 description 24
- 230000008878 coupling Effects 0.000 description 17
- 238000010168 coupling process Methods 0.000 description 17
- 238000005859 coupling reaction Methods 0.000 description 17
- 238000005192 partition Methods 0.000 description 11
- 238000012545 processing Methods 0.000 description 9
- 239000000853 adhesive Substances 0.000 description 7
- 230000001070 adhesive effect Effects 0.000 description 7
- 239000012530 fluid Substances 0.000 description 7
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 6
- 229910052802 copper Inorganic materials 0.000 description 6
- 239000010949 copper Substances 0.000 description 6
- 238000001312 dry etching Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 4
- 239000012528 membrane Substances 0.000 description 3
- 230000005679 Peltier effect Effects 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 230000000630 rising effect Effects 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000013459 approach Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229920001973 fluoroelastomer Polymers 0.000 description 1
- 239000004519 grease Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67248—Temperature monitoring
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67103—Apparatus for thermal treatment mainly by conduction
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/3065—Plasma etching; Reactive-ion etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67069—Apparatus for fluid treatment for etching for drying etching
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67109—Apparatus for thermal treatment mainly by convection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67126—Apparatus for sealing, encapsulating, glassing, decapsulating or the like
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68735—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by edge profile or support profile
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68785—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the mechanical construction of the susceptor, stage or support
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N10/00—Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects
- H10N10/10—Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects operating with only the Peltier or Seebeck effects
- H10N10/13—Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects operating with only the Peltier or Seebeck effects characterised by the heat-exchanging means at the junction
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N10/00—Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects
- H10N10/10—Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects operating with only the Peltier or Seebeck effects
- H10N10/17—Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects operating with only the Peltier or Seebeck effects characterised by the structure or configuration of the cell or thermocouple forming the device
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Plasma & Fusion (AREA)
- Drying Of Semiconductors (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Temperature-Responsive Valves (AREA)
Description
<半導体処理装置>
第1実施形態について説明する。図1は、本実施形態に係る半導体処理装置1の一例を模式的に示す断面図である。図1に示すように、半導体処理装置1は、チャンバ装置2と、チャンバ装置2の内部空間2Sに配置され、内部空間2Sにおいて基板Wの温度を調整する温調装置3とを備える。
図2は、本実施形態に係る温調装置3の一例を模式的に示す断面図である。図3は、本実施形態に係る温調装置3の一例を示す分解斜視図である。
図4は、本実施形態に係る熱電モジュール板6の一部を拡大した断面図である。図5は、本実施形態に係る熱電モジュール板6の一部を示す斜視図である。なお、図4は、第1熱電モジュール板61と第2熱電モジュール板62との境界を拡大した断面図である。第2熱電モジュール板62から第7熱電モジュール板67のそれぞれの境界の構造は、第1熱電モジュール板61と第2熱電モジュール板62との境界の構造と同様である。
図6は、本実施形態に係るシール部材10の一例を示す断面図である。シール部材10は、例えばフッ素ゴム製のOリングである。図6に示すように、シール部材10は、天板4、ベース板5、及び熱交換板7のそれぞれに接触する。シール部材10は、天板4とベース板5と熱交換板7とにより規定されるシール空間13に配置される。シール部材10は、交換可能である。
次に、本実施形態に係る温調装置3の動作について説明する。チャンバ装置2の内部空間2Sが減圧される。基板Wがチャンバ装置2の内部空間2Sに搬入される。リフトピン9は、リフトピン9の上端部が支持面4Aよりも上方に配置されるように上昇する。リフトピン9は、内部空間2Sに搬送された基板Wの裏面を支持する。基板Wの裏面を支持したリフトピン9は下降する。リフトピン9が下降することにより、基板Wは天板4の支持面4Aに支持される。
以上説明したように、本実施形態によれば、天板4と天板4に接続されるベース板5とによって、熱電モジュール板6が配置される内部空間3Sが規定される。熱電モジュール板6が配置される内部空間3Sを有する温調装置3において、天板4及びベース板5のそれぞれに接触するシール部材10が設けられる。シール部材10が設けられることにより、温調装置3の内部空間3Sと温調装置3の外部空間(チャンバ装置2の内部空間2S)との気体の流通が抑制される。
第2実施形態について説明する。以下の説明において、上述の実施形態と同等の構成要素については同一の符号を付し、その説明を簡略又は省略する。
Claims (3)
- 基板を支持する天板と、
前記天板との間において内部空間を形成するように前記天板に接続されるベース板と、
前記内部空間に配置される熱電モジュール板と、
前記内部空間に配置され、前記熱電モジュール板と熱交換する熱交換板と、
前記熱交換板、前記天板及び前記ベース板のそれぞれに接触するシール部材と、を備える
温調装置。 - 前記シール部材は、前記天板と前記ベース板と前記熱交換板とにより規定されるシール空間に配置される、
請求項1に記載の温調装置。 - 前記天板は、前記基板を支持する支持面を有する支持部と、前記支持部の周縁部に接続され前記支持部から前記ベース板に突出する周壁部とを有し、
前記ベース板は、前記周壁部の下面に対向する上面を有し、
前記熱交換板は、前記ベース板の上面に向かって前記熱交換板の中心軸側に傾斜するテーパ面を有し、
前記シール空間は、前記天板の周壁部の内面と前記ベース板の上面と前記熱交換板のテーパ面とにより規定される、
請求項2に記載の温調装置。
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018211417A JP7162499B2 (ja) | 2018-11-09 | 2018-11-09 | 温調装置 |
KR1020217012616A KR102534505B1 (ko) | 2018-11-09 | 2019-10-30 | 온도 조절 장치 |
CN201980073575.7A CN112997331A (zh) | 2018-11-09 | 2019-10-30 | 温调装置 |
US17/291,466 US20220005727A1 (en) | 2018-11-09 | 2019-10-30 | Temperature control device |
PCT/JP2019/042611 WO2020095794A1 (ja) | 2018-11-09 | 2019-10-30 | 温調装置 |
TW108140055A TWI809220B (zh) | 2018-11-09 | 2019-11-05 | 調溫裝置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018211417A JP7162499B2 (ja) | 2018-11-09 | 2018-11-09 | 温調装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2020077809A JP2020077809A (ja) | 2020-05-21 |
JP7162499B2 true JP7162499B2 (ja) | 2022-10-28 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2018211417A Active JP7162499B2 (ja) | 2018-11-09 | 2018-11-09 | 温調装置 |
Country Status (6)
Country | Link |
---|---|
US (1) | US20220005727A1 (ja) |
JP (1) | JP7162499B2 (ja) |
KR (1) | KR102534505B1 (ja) |
CN (1) | CN112997331A (ja) |
TW (1) | TWI809220B (ja) |
WO (1) | WO2020095794A1 (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7378925B2 (ja) * | 2018-11-30 | 2023-11-14 | 株式会社Kelk | 熱電発電装置 |
JP7517886B2 (ja) | 2020-07-16 | 2024-07-17 | 株式会社アルバック | 真空処理装置用のステージ |
KR20220020092A (ko) * | 2020-08-11 | 2022-02-18 | 엘지이노텍 주식회사 | 열전 모듈 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002353298A (ja) | 2001-05-23 | 2002-12-06 | Tokyo Electron Ltd | 載置装置 |
JP2004104113A (ja) | 2002-08-22 | 2004-04-02 | Sumitomo Osaka Cement Co Ltd | サセプタ装置 |
JP2009094138A (ja) | 2007-10-04 | 2009-04-30 | Sei Hybrid Kk | ウエハ保持体および半導体製造装置 |
JP2015008287A (ja) | 2013-06-03 | 2015-01-15 | ラム リサーチ コーポレーションLam Research Corporation | 温度制御された基板支持アセンブリ |
JP2016082077A (ja) | 2014-10-17 | 2016-05-16 | 東京エレクトロン株式会社 | 載置台及び載置台の製造方法 |
JP2017022216A (ja) | 2015-07-09 | 2017-01-26 | 株式会社日立ハイテクノロジーズ | プラズマ処理装置 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007311656A (ja) * | 2006-05-19 | 2007-11-29 | Toyota Motor Corp | 熱電モジュール |
TW200913798A (en) * | 2007-09-14 | 2009-03-16 | Advanced Display Proc Eng Co | Substrate processing apparatus having electrode member |
CN101989596B (zh) * | 2009-07-30 | 2012-10-10 | 爱信精机株式会社 | 热电模块和光发送装置 |
CA2950622C (en) * | 2015-12-03 | 2020-01-07 | Wesley John Nowitzki | Press-fit bearing locking system, apparatus and method |
-
2018
- 2018-11-09 JP JP2018211417A patent/JP7162499B2/ja active Active
-
2019
- 2019-10-30 CN CN201980073575.7A patent/CN112997331A/zh active Pending
- 2019-10-30 US US17/291,466 patent/US20220005727A1/en active Pending
- 2019-10-30 WO PCT/JP2019/042611 patent/WO2020095794A1/ja active Application Filing
- 2019-10-30 KR KR1020217012616A patent/KR102534505B1/ko active IP Right Grant
- 2019-11-05 TW TW108140055A patent/TWI809220B/zh active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002353298A (ja) | 2001-05-23 | 2002-12-06 | Tokyo Electron Ltd | 載置装置 |
JP2004104113A (ja) | 2002-08-22 | 2004-04-02 | Sumitomo Osaka Cement Co Ltd | サセプタ装置 |
JP2009094138A (ja) | 2007-10-04 | 2009-04-30 | Sei Hybrid Kk | ウエハ保持体および半導体製造装置 |
JP2015008287A (ja) | 2013-06-03 | 2015-01-15 | ラム リサーチ コーポレーションLam Research Corporation | 温度制御された基板支持アセンブリ |
JP2016082077A (ja) | 2014-10-17 | 2016-05-16 | 東京エレクトロン株式会社 | 載置台及び載置台の製造方法 |
JP2017022216A (ja) | 2015-07-09 | 2017-01-26 | 株式会社日立ハイテクノロジーズ | プラズマ処理装置 |
Also Published As
Publication number | Publication date |
---|---|
TW202025375A (zh) | 2020-07-01 |
JP2020077809A (ja) | 2020-05-21 |
WO2020095794A1 (ja) | 2020-05-14 |
TWI809220B (zh) | 2023-07-21 |
US20220005727A1 (en) | 2022-01-06 |
CN112997331A (zh) | 2021-06-18 |
KR20210058973A (ko) | 2021-05-24 |
KR102534505B1 (ko) | 2023-05-26 |
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