JP7145318B2 - 排ガス浄化用触媒 - Google Patents
排ガス浄化用触媒 Download PDFInfo
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- JP7145318B2 JP7145318B2 JP2021510073A JP2021510073A JP7145318B2 JP 7145318 B2 JP7145318 B2 JP 7145318B2 JP 2021510073 A JP2021510073 A JP 2021510073A JP 2021510073 A JP2021510073 A JP 2021510073A JP 7145318 B2 JP7145318 B2 JP 7145318B2
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- exhaust gas
- noble metal
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- tio
- gas purifying
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- 239000003054 catalyst Substances 0.000 title claims description 105
- 238000000746 purification Methods 0.000 title claims description 20
- 239000002245 particle Substances 0.000 claims description 157
- 229910000510 noble metal Inorganic materials 0.000 claims description 84
- 239000004065 semiconductor Substances 0.000 claims description 74
- 239000002105 nanoparticle Substances 0.000 claims description 66
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 63
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 60
- 239000002131 composite material Substances 0.000 claims description 56
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 38
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 33
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 21
- 239000010948 rhodium Substances 0.000 claims description 10
- 239000011148 porous material Substances 0.000 claims description 8
- 229910052763 palladium Inorganic materials 0.000 claims description 7
- 229910052697 platinum Inorganic materials 0.000 claims description 6
- 229910052703 rhodium Inorganic materials 0.000 claims description 5
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims description 5
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 3
- 229910052741 iridium Inorganic materials 0.000 claims description 3
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052762 osmium Inorganic materials 0.000 claims description 3
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 claims description 3
- 229910052707 ruthenium Inorganic materials 0.000 claims description 3
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims 1
- 239000007789 gas Substances 0.000 description 94
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 20
- 238000009616 inductively coupled plasma Methods 0.000 description 18
- MWUXSHHQAYIFBG-UHFFFAOYSA-N nitrogen oxide Inorganic materials O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 18
- 238000007254 oxidation reaction Methods 0.000 description 17
- 239000010970 precious metal Substances 0.000 description 17
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 16
- 229910002091 carbon monoxide Inorganic materials 0.000 description 16
- 230000002776 aggregation Effects 0.000 description 15
- 230000003197 catalytic effect Effects 0.000 description 14
- 238000006722 reduction reaction Methods 0.000 description 14
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 12
- 239000000203 mixture Substances 0.000 description 12
- 239000002243 precursor Substances 0.000 description 11
- 229910002092 carbon dioxide Inorganic materials 0.000 description 10
- 229930195733 hydrocarbon Natural products 0.000 description 10
- 150000002430 hydrocarbons Chemical class 0.000 description 10
- 238000002156 mixing Methods 0.000 description 10
- 230000003647 oxidation Effects 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- 238000011156 evaluation Methods 0.000 description 9
- 238000000034 method Methods 0.000 description 9
- 229910001868 water Inorganic materials 0.000 description 9
- 238000005054 agglomeration Methods 0.000 description 8
- 230000032683 aging Effects 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 8
- 238000003917 TEM image Methods 0.000 description 7
- 238000004220 aggregation Methods 0.000 description 7
- 238000004458 analytical method Methods 0.000 description 7
- 239000001569 carbon dioxide Substances 0.000 description 7
- 239000003795 chemical substances by application Substances 0.000 description 7
- 239000004408 titanium dioxide Substances 0.000 description 7
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 229910052757 nitrogen Inorganic materials 0.000 description 6
- 239000007787 solid Substances 0.000 description 6
- 239000000725 suspension Substances 0.000 description 6
- 239000004215 Carbon black (E152) Substances 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 239000002923 metal particle Substances 0.000 description 5
- 239000007864 aqueous solution Substances 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 238000001878 scanning electron micrograph Methods 0.000 description 3
- 229910003603 H2PdCl4 Inorganic materials 0.000 description 2
- 229910002621 H2PtCl6 Inorganic materials 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- 229910003244 Na2PdCl4 Inorganic materials 0.000 description 2
- 229910002666 PdCl2 Inorganic materials 0.000 description 2
- 229910001260 Pt alloy Inorganic materials 0.000 description 2
- 229910019032 PtCl2 Inorganic materials 0.000 description 2
- 229910021604 Rhodium(III) chloride Inorganic materials 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000001747 exhibiting effect Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 2
- 231100000572 poisoning Toxicity 0.000 description 2
- 230000000607 poisoning effect Effects 0.000 description 2
- 229910002093 potassium tetrachloropalladate(II) Inorganic materials 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- SONJTKJMTWTJCT-UHFFFAOYSA-K rhodium(iii) chloride Chemical compound [Cl-].[Cl-].[Cl-].[Rh+3] SONJTKJMTWTJCT-UHFFFAOYSA-K 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- 238000001016 Ostwald ripening Methods 0.000 description 1
- 239000012696 Pd precursors Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000006555 catalytic reaction Methods 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 239000000383 hazardous chemical Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- VUZPPFZMUPKLLV-UHFFFAOYSA-N methane;hydrate Chemical compound C.O VUZPPFZMUPKLLV-UHFFFAOYSA-N 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Chemical & Material Sciences (AREA)
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- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Combustion & Propulsion (AREA)
- Health & Medical Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- General Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Environmental & Geological Engineering (AREA)
- Biomedical Technology (AREA)
- Toxicology (AREA)
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- General Engineering & Computer Science (AREA)
- Exhaust Gas Treatment By Means Of Catalyst (AREA)
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Description
ii)炭化水素の酸化反応:CXH2X+2+O2=>CO2+H2O
iii)窒素酸化物の還元反応:NO+CO=>CO2+N2
実施例1
ルチル型二酸化チタン(TiO2、TEMイメージ分析によって得た平均粒径50nm)粉末を水に分散して、0.5wt%懸濁液を製造した。前記ルチル型二酸化チタン懸濁液を継続して攪拌しつつ、H2PtCl6前駆体をルチル型二酸化チタン固形分100重量部に対して、Ptの含量が8重量部となるように、その含量を調節して混合し、10分間攪拌した。犠牲剤として、メチルアルコールをルチル型二酸化チタンを含む懸濁液に、H2PtCl6前駆体を混合した混合物100重量部に対して、10重量部で投入した後、継続して攪拌した。その後、ルチル型二酸化チタンと貴金属前駆体とが含まれた混合物を継続して攪拌しつつ、紫外線を約2時間照射して、光照射を施した。光照射が終了した混合物を乾燥して、Ptの担持されたTiO2半導体粒子の複合ナノ粒子を製造した。
実施例1における複合ナノ粒子製造時、ルチル型二酸化チタン固形分100重量部に対して、Ptの含量が12重量部となるように、その含量を調節して混合し、複合ナノ粒子を製造した点を除いて(すなわち、複合ナノ粒子のうち、Pt担持量が増加する)、同じ方法により複合ナノ粒子を製造した。
実施例1における複合ナノ粒子製造時、ルチル型二酸化チタン固形分100重量部に対して、Ptの含量が16重量部となるように、その含量を調節して混合し、複合ナノ粒子を製造した点を除いて(すなわち、複合ナノ粒子のうち、Pt担持量が増加する)、同じ方法により複合ナノ粒子を製造した。
実施例1における複合ナノ粒子製造時、ルチル型二酸化チタン固形分100重量部に対して、Ptの含量が5重量部となるように、その含量を調節して混合し、複合ナノ粒子を製造した点を除いて(すなわち、複合ナノ粒子のうち、Pt担持量が減少する)、同じ方法により複合ナノ粒子を製造した。
アルミナ支持体粒子(Al2O3、TEMイメージ分析によって得た平均粒径5μm)を水に分散して、水溶液を製造した。前記水溶液を継続して攪拌しつつ、H2PtCl6前駆体をAl203固形分97.6重量部に対して、Ptの含量が2.4重量部となるように投入した。Pt前駆体の含まれたAl203水溶液を、60℃の温度下で2時間攪拌した。攪拌が終了した水溶液を、80℃の温度下で24時間乾燥し、550℃の温度下で2時間塑性して、Ptの担持されたAl203粒子として排ガス浄化用触媒を製造した。前記得られた排ガス浄化用触媒に対して、ICP(Inductively Coupled Plasma)を用いてPtの含量を測定した結果、Ptの含量は、2wt%であった。
実験例1:浄化性能評価
実施例1-4及び比較例1の排ガス処理用触媒の排ガス処理性能を評価するために、自動車排ガス浄化性能評価設備(Gas Chromatograph Analyzer,ABB Ltd.)を利用して処理性能を評価した。実施例1-4及び比較例1の排ガス処理用触媒それぞれに対して、総流量5L/minのうち、1000ppmの一酸化炭素条件下で(窒素Balance)、反応温度約50℃~約500℃で、一酸化炭素の酸化反応(CO+O2->CO2)のLight Off Temperature(LOT評価)を行った。LOT・℃)とは、浄化率が50%に至った時の温度を測定したものであって、LOT値が低い触媒粒子であればあるほど、浄化性能の良い触媒と判断する。
実験例1と対比して、評価条件において、10wt%の水分を追加して評価した点を除いて、実験例1と同じ方法により排ガス浄化用触媒の浄化性能を評価した。10wt%水分は、ポンプとMass Flow Controllerを介して投入される水を、350℃の温度に気化して(Evaporizer)、水蒸気の形態で他の排ガス類似成分と共に投入した。
2 TiO2半導体粒子
3 アルミナ支持体粒子
4 複合ナノ粒子
10 排ガス浄化用触媒
Claims (7)
- 貴金属;アルミナ支持体粒子;及び前記アルミナ支持体粒子の表面上に担持されたTiO2半導体粒子;とを含む排ガス浄化用触媒であり、
前記排ガス浄化用触媒は、複合ナノ粒子を含み、
前記複合ナノ粒子は、前記貴金属を担持した前記TiO 2 半導体粒子であり、
前記複合ナノ粒子に含まれた貴金属は、前記排ガス浄化用触媒に含まれた貴金属全体のうち少なくとも90重量%を占める、排ガス浄化用触媒。 - 前記アルミナ支持体粒子100重量部に対して、前記TiO2半導体粒子を20~50重量部含む、
請求項1に記載の排ガス浄化用触媒。 - 前記複合ナノ粒子の直径は、前記アルミナ支持体粒子の表面に示された気孔の平均直径よりも大きい、
請求項1に記載の排ガス浄化用触媒。 - 前記複合ナノ粒子の平均直径は、10nm~500nmである、
請求項1に記載の排ガス浄化用触媒。 - 前記アルミナ支持体粒子の平均直径は、0.5μm~50μmである、
請求項1記載の排ガス浄化用触媒。 - 前記貴金属は、ルテニウム(Ru)、ロジウム(Rh)、パラジウム(Pd)、オスミウム(Os)、イリジウム(Ir)、白金(Pt)、及びこれらの組み合わせからなる群から選択された一つを含む、
請求項1に記載の排ガス浄化用触媒。 - 前記排ガス浄化用触媒は、前記TiO2半導体粒子を100重量部及び前記貴金属を1~50重量部含む、
請求項1に記載の排ガス浄化用触媒。
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