JP7095542B2 - 厚膜抵抗体用組成物、厚膜抵抗体用ペースト、および厚膜抵抗体 - Google Patents

厚膜抵抗体用組成物、厚膜抵抗体用ペースト、および厚膜抵抗体 Download PDF

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JP7095542B2
JP7095542B2 JP2018191805A JP2018191805A JP7095542B2 JP 7095542 B2 JP7095542 B2 JP 7095542B2 JP 2018191805 A JP2018191805 A JP 2018191805A JP 2018191805 A JP2018191805 A JP 2018191805A JP 7095542 B2 JP7095542 B2 JP 7095542B2
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thick film
film resistor
mass
composition
paste
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JP2020061467A5 (enExample
JP2020061467A (ja
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富士雄 幕田
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Sumitomo Metal Mining Co Ltd
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Sumitomo Metal Mining Co Ltd
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JP2018191805A 2018-10-10 2018-10-10 厚膜抵抗体用組成物、厚膜抵抗体用ペースト、および厚膜抵抗体 Active JP7095542B2 (ja)

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JP2018191805A JP7095542B2 (ja) 2018-10-10 2018-10-10 厚膜抵抗体用組成物、厚膜抵抗体用ペースト、および厚膜抵抗体

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JP2018191805A JP7095542B2 (ja) 2018-10-10 2018-10-10 厚膜抵抗体用組成物、厚膜抵抗体用ペースト、および厚膜抵抗体

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JP2020061467A JP2020061467A (ja) 2020-04-16
JP2020061467A5 JP2020061467A5 (enExample) 2021-07-29
JP7095542B2 true JP7095542B2 (ja) 2022-07-05

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Families Citing this family (1)

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Publication number Priority date Publication date Assignee Title
JP7135696B2 (ja) * 2018-10-10 2022-09-13 住友金属鉱山株式会社 厚膜抵抗体用組成物、厚膜抵抗体用ペースト、および厚膜抵抗体

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080185561A1 (en) 2006-11-17 2008-08-07 Summers John D Resistor compositions for electronic circuitry applications
US20090111948A1 (en) 2007-10-25 2009-04-30 Thomas Eugene Dueber Compositions comprising polyimide and hydrophobic epoxy and phenolic resins, and methods relating thereto

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5223695A (en) * 1975-08-15 1977-02-22 Shoei Kagaku Kogyo Kk Production method of resistive paint

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080185561A1 (en) 2006-11-17 2008-08-07 Summers John D Resistor compositions for electronic circuitry applications
US20090111948A1 (en) 2007-10-25 2009-04-30 Thomas Eugene Dueber Compositions comprising polyimide and hydrophobic epoxy and phenolic resins, and methods relating thereto

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