JP7081670B2 - Lipophilic group-containing organosilane compounds, surface treatment agents and articles - Google Patents
Lipophilic group-containing organosilane compounds, surface treatment agents and articles Download PDFInfo
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- JP7081670B2 JP7081670B2 JP2020534142A JP2020534142A JP7081670B2 JP 7081670 B2 JP7081670 B2 JP 7081670B2 JP 2020534142 A JP2020534142 A JP 2020534142A JP 2020534142 A JP2020534142 A JP 2020534142A JP 7081670 B2 JP7081670 B2 JP 7081670B2
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- -1 organosilane compounds Chemical class 0.000 title claims description 126
- 239000012756 surface treatment agent Substances 0.000 title claims description 43
- 125000004432 carbon atom Chemical group C* 0.000 claims description 94
- 239000002904 solvent Substances 0.000 claims description 40
- 125000000217 alkyl group Chemical group 0.000 claims description 28
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 27
- 210000002374 sebum Anatomy 0.000 claims description 26
- 125000003118 aryl group Chemical group 0.000 claims description 19
- 125000002947 alkylene group Chemical group 0.000 claims description 18
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 18
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 16
- 238000000034 method Methods 0.000 claims description 12
- 239000000758 substrate Substances 0.000 claims description 11
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 10
- 239000003054 catalyst Substances 0.000 claims description 9
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 claims description 9
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 claims description 7
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 claims description 7
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 claims description 7
- 239000005642 Oleic acid Substances 0.000 claims description 7
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 claims description 7
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 claims description 7
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 claims description 7
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 5
- 238000009833 condensation Methods 0.000 claims description 4
- 230000005494 condensation Effects 0.000 claims description 4
- 230000007062 hydrolysis Effects 0.000 claims description 4
- 238000006460 hydrolysis reaction Methods 0.000 claims description 4
- 125000003302 alkenyloxy group Chemical group 0.000 claims description 3
- 125000003545 alkoxy group Chemical group 0.000 claims description 3
- XLJMAIOERFSOGZ-UHFFFAOYSA-M cyanate group Chemical group [O-]C#N XLJMAIOERFSOGZ-UHFFFAOYSA-M 0.000 claims description 3
- 125000005843 halogen group Chemical group 0.000 claims description 3
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 claims description 3
- 125000003544 oxime group Chemical group 0.000 claims description 3
- 125000004423 acyloxy group Chemical group 0.000 claims description 2
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical group [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims description 2
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 114
- 150000001875 compounds Chemical class 0.000 description 100
- 239000010408 film Substances 0.000 description 42
- 238000006243 chemical reaction Methods 0.000 description 36
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 29
- 239000000203 mixture Substances 0.000 description 28
- 238000005160 1H NMR spectroscopy Methods 0.000 description 25
- 150000001336 alkenes Chemical group 0.000 description 24
- 229910000077 silane Inorganic materials 0.000 description 24
- 239000002253 acid Substances 0.000 description 23
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 23
- 239000000243 solution Substances 0.000 description 23
- 229910018540 Si C Inorganic materials 0.000 description 21
- 239000010410 layer Substances 0.000 description 21
- 239000007788 liquid Substances 0.000 description 21
- 229910010271 silicon carbide Inorganic materials 0.000 description 21
- 125000003342 alkenyl group Chemical group 0.000 description 18
- 239000000126 substance Substances 0.000 description 17
- CLSUSRZJUQMOHH-UHFFFAOYSA-L platinum dichloride Chemical compound Cl[Pt]Cl CLSUSRZJUQMOHH-UHFFFAOYSA-L 0.000 description 15
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 14
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 14
- 230000000052 comparative effect Effects 0.000 description 13
- 239000003960 organic solvent Substances 0.000 description 13
- 238000000926 separation method Methods 0.000 description 13
- 150000004756 silanes Chemical class 0.000 description 13
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 12
- 229910052731 fluorine Inorganic materials 0.000 description 12
- 239000011737 fluorine Substances 0.000 description 12
- 239000013557 residual solvent Substances 0.000 description 12
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 12
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 12
- 238000011156 evaluation Methods 0.000 description 11
- 238000002360 preparation method Methods 0.000 description 11
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 10
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 9
- 239000007809 chemical reaction catalyst Substances 0.000 description 9
- 239000011521 glass Substances 0.000 description 9
- 239000000463 material Substances 0.000 description 9
- 239000003921 oil Substances 0.000 description 9
- OBAJXDYVZBHCGT-UHFFFAOYSA-N tris(pentafluorophenyl)borane Chemical compound FC1=C(F)C(F)=C(F)C(F)=C1B(C=1C(=C(F)C(F)=C(F)C=1F)F)C1=C(F)C(F)=C(F)C(F)=C1F OBAJXDYVZBHCGT-UHFFFAOYSA-N 0.000 description 9
- UHXCHUWSQRLZJS-UHFFFAOYSA-N (4-dimethylsilylidenecyclohexa-2,5-dien-1-ylidene)-dimethylsilane Chemical compound C[Si](C)C1=CC=C([Si](C)C)C=C1 UHXCHUWSQRLZJS-UHFFFAOYSA-N 0.000 description 8
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 7
- 239000011248 coating agent Substances 0.000 description 7
- 238000000576 coating method Methods 0.000 description 7
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 7
- 238000006459 hydrosilylation reaction Methods 0.000 description 6
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 6
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 6
- 239000012044 organic layer Substances 0.000 description 6
- 150000001282 organosilanes Chemical class 0.000 description 6
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 6
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 239000004210 ether based solvent Substances 0.000 description 5
- 150000002430 hydrocarbons Chemical group 0.000 description 5
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 5
- 125000005647 linker group Chemical group 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 5
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 4
- 239000004215 Carbon black (E152) Substances 0.000 description 4
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- 125000000732 arylene group Chemical group 0.000 description 4
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 4
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 4
- 229930195733 hydrocarbon Natural products 0.000 description 4
- CYSFUFRXDOAOMP-UHFFFAOYSA-M magnesium;prop-1-ene;chloride Chemical compound [Mg+2].[Cl-].[CH2-]C=C CYSFUFRXDOAOMP-UHFFFAOYSA-M 0.000 description 4
- 125000001421 myristyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
- 125000001624 naphthyl group Chemical group 0.000 description 4
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 4
- 239000003208 petroleum Substances 0.000 description 4
- 150000003377 silicon compounds Chemical class 0.000 description 4
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 4
- 239000008096 xylene Substances 0.000 description 4
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- 125000005073 adamantyl group Chemical group C12(CC3CC(CC(C1)C3)C2)* 0.000 description 3
- 125000005074 adamantylmethyl group Chemical group 0.000 description 3
- 238000001723 curing Methods 0.000 description 3
- 125000004122 cyclic group Chemical group 0.000 description 3
- 125000000582 cycloheptyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 3
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 3
- 125000004210 cyclohexylmethyl group Chemical group [H]C([H])(*)C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C1([H])[H] 0.000 description 3
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 3
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 238000006356 dehydrogenation reaction Methods 0.000 description 3
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 239000005400 gorilla glass Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 3
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 3
- 125000002868 norbornyl group Chemical group C12(CCC(CC1)C2)* 0.000 description 3
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 125000000286 phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 3
- 125000004344 phenylpropyl group Chemical group 0.000 description 3
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 3
- 239000005871 repellent Substances 0.000 description 3
- QBERHIJABFXGRZ-UHFFFAOYSA-M rhodium;triphenylphosphane;chloride Chemical compound [Cl-].[Rh].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 QBERHIJABFXGRZ-UHFFFAOYSA-M 0.000 description 3
- 238000005507 spraying Methods 0.000 description 3
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- CRZQGDNQQAALAY-UHFFFAOYSA-N Methyl benzeneacetate Chemical compound COC(=O)CC1=CC=CC=C1 CRZQGDNQQAALAY-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 239000006087 Silane Coupling Agent Substances 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- UKLDJPRMSDWDSL-UHFFFAOYSA-L [dibutyl(dodecanoyloxy)stannyl] dodecanoate Chemical compound CCCCCCCCCCCC(=O)O[Sn](CCCC)(CCCC)OC(=O)CCCCCCCCCCC UKLDJPRMSDWDSL-UHFFFAOYSA-L 0.000 description 2
- 230000032683 aging Effects 0.000 description 2
- 239000005456 alcohol based solvent Substances 0.000 description 2
- 150000001299 aldehydes Chemical class 0.000 description 2
- 125000005370 alkoxysilyl group Chemical group 0.000 description 2
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 125000001309 chloro group Chemical group Cl* 0.000 description 2
- 229940125773 compound 10 Drugs 0.000 description 2
- 239000012975 dibutyltin dilaurate Substances 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 125000004185 ester group Chemical group 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 2
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 150000004820 halides Chemical class 0.000 description 2
- ZLVXBBHTMQJRSX-VMGNSXQWSA-N jdtic Chemical compound C1([C@]2(C)CCN(C[C@@H]2C)C[C@H](C(C)C)NC(=O)[C@@H]2NCC3=CC(O)=CC=C3C2)=CC=CC(O)=C1 ZLVXBBHTMQJRSX-VMGNSXQWSA-N 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 2
- YRHYCMZPEVDGFQ-UHFFFAOYSA-N methyl decanoate Chemical compound CCCCCCCCCC(=O)OC YRHYCMZPEVDGFQ-UHFFFAOYSA-N 0.000 description 2
- JGHZJRVDZXSNKQ-UHFFFAOYSA-N methyl octanoate Chemical compound CCCCCCCC(=O)OC JGHZJRVDZXSNKQ-UHFFFAOYSA-N 0.000 description 2
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000004923 naphthylmethyl group Chemical group C1(=CC=CC2=CC=CC=C12)C* 0.000 description 2
- 239000012038 nucleophile Substances 0.000 description 2
- 125000000962 organic group Chemical group 0.000 description 2
- 150000003961 organosilicon compounds Chemical class 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- ZUHZGEOKBKGPSW-UHFFFAOYSA-N tetraglyme Chemical compound COCCOCCOCCOCCOC ZUHZGEOKBKGPSW-UHFFFAOYSA-N 0.000 description 2
- 229910052723 transition metal Inorganic materials 0.000 description 2
- 150000003624 transition metals Chemical class 0.000 description 2
- GETTZEONDQJALK-UHFFFAOYSA-N (trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC=CC=C1 GETTZEONDQJALK-UHFFFAOYSA-N 0.000 description 1
- QKAGYSDHEJITFV-UHFFFAOYSA-N 1,1,1,2,2,3,4,5,5,5-decafluoro-3-methoxy-4-(trifluoromethyl)pentane Chemical compound FC(F)(F)C(F)(F)C(F)(OC)C(F)(C(F)(F)F)C(F)(F)F QKAGYSDHEJITFV-UHFFFAOYSA-N 0.000 description 1
- SJBBXFLOLUTGCW-UHFFFAOYSA-N 1,3-bis(trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC=CC(C(F)(F)F)=C1 SJBBXFLOLUTGCW-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- DFUYAWQUODQGFF-UHFFFAOYSA-N 1-ethoxy-1,1,2,2,3,3,4,4,4-nonafluorobutane Chemical compound CCOC(F)(F)C(F)(F)C(F)(F)C(F)(F)F DFUYAWQUODQGFF-UHFFFAOYSA-N 0.000 description 1
- BKOOMYPCSUNDGP-UHFFFAOYSA-N 2-methylbut-2-ene Chemical group CC=C(C)C BKOOMYPCSUNDGP-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 1
- FXNFFCMITPHEIT-UHFFFAOYSA-N Ethyl 10-undecenoate Chemical compound CCOC(=O)CCCCCCCCC=C FXNFFCMITPHEIT-UHFFFAOYSA-N 0.000 description 1
- PTVSRINJXWDIKP-UHFFFAOYSA-N Ethyl 4-pentenoate Chemical compound CCOC(=O)CCC=C PTVSRINJXWDIKP-UHFFFAOYSA-N 0.000 description 1
- 239000007818 Grignard reagent Substances 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- 239000005640 Methyl decanoate Substances 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- 239000005641 Methyl octanoate Substances 0.000 description 1
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical compound OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- 229910008051 Si-OH Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910006358 Si—OH Inorganic materials 0.000 description 1
- 125000003668 acetyloxy group Chemical group [H]C([H])([H])C(=O)O[*] 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 125000003158 alcohol group Chemical group 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 239000002199 base oil Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 125000001246 bromo group Chemical group Br* 0.000 description 1
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 229940125904 compound 1 Drugs 0.000 description 1
- 229940125782 compound 2 Drugs 0.000 description 1
- 229940126214 compound 3 Drugs 0.000 description 1
- 229940125898 compound 5 Drugs 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- AYOHIQLKSOJJQH-UHFFFAOYSA-N dibutyltin Chemical compound CCCC[Sn]CCCC AYOHIQLKSOJJQH-UHFFFAOYSA-N 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- UBHZUDXTHNMNLD-UHFFFAOYSA-N dimethylsilane Chemical compound C[SiH2]C UBHZUDXTHNMNLD-UHFFFAOYSA-N 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 150000004795 grignard reagents Chemical class 0.000 description 1
- 125000004836 hexamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 239000012442 inert solvent Substances 0.000 description 1
- 125000003253 isopropoxy group Chemical group [H]C([H])([H])C([H])(O*)C([H])([H])[H] 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 150000002634 lipophilic molecules Chemical class 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 239000003863 metallic catalyst Substances 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 239000002667 nucleating agent Substances 0.000 description 1
- PKLGTKSKHJFCIX-UHFFFAOYSA-N octyl undec-10-enoate Chemical compound CCCCCCCCOC(=O)CCCCCCCCC=C PKLGTKSKHJFCIX-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
- 239000010702 perfluoropolyether Substances 0.000 description 1
- RVZRBWKZFJCCIB-UHFFFAOYSA-N perfluorotributylamine Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)N(C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F RVZRBWKZFJCCIB-UHFFFAOYSA-N 0.000 description 1
- 150000003008 phosphonic acid esters Chemical class 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920001690 polydopamine Polymers 0.000 description 1
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 230000001953 sensory effect Effects 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- NGASWKRTXGWPNN-UHFFFAOYSA-N tert-butyl but-3-enoate Chemical compound CC(C)(C)OC(=O)CC=C NGASWKRTXGWPNN-UHFFFAOYSA-N 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- 238000000427 thin-film deposition Methods 0.000 description 1
- 150000007970 thio esters Chemical class 0.000 description 1
- 150000003606 tin compounds Chemical class 0.000 description 1
- 150000003609 titanium compounds Chemical class 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- IBOKZQNMFSHYNQ-UHFFFAOYSA-N tribromosilane Chemical compound Br[SiH](Br)Br IBOKZQNMFSHYNQ-UHFFFAOYSA-N 0.000 description 1
- UCSBCWBHZLSFGC-UHFFFAOYSA-N tributoxysilane Chemical compound CCCCO[SiH](OCCCC)OCCCC UCSBCWBHZLSFGC-UHFFFAOYSA-N 0.000 description 1
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 1
- 239000005052 trichlorosilane Substances 0.000 description 1
- QQQSFSZALRVCSZ-UHFFFAOYSA-N triethoxysilane Chemical compound CCO[SiH](OCC)OCC QQQSFSZALRVCSZ-UHFFFAOYSA-N 0.000 description 1
- YFNKIDBQEZZDLK-UHFFFAOYSA-N triglyme Chemical compound COCCOCCOCCOC YFNKIDBQEZZDLK-UHFFFAOYSA-N 0.000 description 1
- DNAPJAGHXMPFLD-UHFFFAOYSA-N triiodosilane Chemical compound I[SiH](I)I DNAPJAGHXMPFLD-UHFFFAOYSA-N 0.000 description 1
- OZWKZRFXJPGDFM-UHFFFAOYSA-N tripropoxysilane Chemical compound CCCO[SiH](OCCC)OCCC OZWKZRFXJPGDFM-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/18—Materials not provided for elsewhere for application to surfaces to minimize adherence of ice, mist or water thereto; Thawing or antifreeze materials for application to surfaces
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Combustion & Propulsion (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Materials Applied To Surfaces To Minimize Adherence Of Mist Or Water (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
- Silicon Polymers (AREA)
Description
本発明は、分子中に水酸基又は加水分解性基と親油性基とを含有するオルガノシラン化合物等に関し、詳細には、親油性に優れた被膜を形成する親油性基含有(加水分解性)オルガノシラン化合物、該親油性基含有(加水分解性)オルガノシラン化合物及び/又はその部分(加水分解)縮合物を含む表面処理剤、並びに該表面処理剤で表面処理された(即ち、該表面処理剤の硬化被膜を表面に有する)物品等に関する。 The present invention relates to an organosilane compound containing a hydroxyl group or a hydrolyzable group and a lipophilic group in the molecule. A surface treatment agent containing a silane compound, the lipophilic group-containing (hydrolyzable) organosilane compound and / or a partial (hydrolyzable) condensate thereof, and a surface treatment agent surface-treated (that is, the surface treatment agent). (Has a cured film on the surface).
近年、携帯電話のディスプレイをはじめ、画面のタッチパネル化が加速している。しかし、タッチパネルは画面がむき出しの状態であり、指や頬などが直接接触する機会が多く、皮脂等の汚れが付き易いことが問題となっている。そこで、外観や視認性をよくするためにディスプレイの表面に指紋を付きにくくする技術や、汚れを落とし易くする技術の要求が年々高まってきており、これらの要求に応えることのできる材料の開発が望まれている。特にタッチパネルディスプレイの表面は指紋汚れ(皮脂汚れ)が付着し易いため、皮脂汚れを付着しにくくするための撥油層や、逆に指紋等の皮脂汚れが付着した際に該皮脂汚れ(指紋等)を目立たなくするための親油層を設けることが望まれている。 In recent years, touch panels on screens, including mobile phone displays, are accelerating. However, the touch panel has a bare screen, and there are many opportunities for direct contact with fingers, cheeks, etc., and there is a problem that dirt such as sebum is easily attached. Therefore, the demand for technology that makes it difficult for fingerprints to adhere to the surface of the display and technology that makes it easy to remove stains to improve the appearance and visibility is increasing year by year, and the development of materials that can meet these demands is being developed. It is desired. In particular, since fingerprint stains (sebum stains) easily adhere to the surface of the touch panel display, an oil-repellent layer for making it difficult for sebum stains to adhere, and conversely, when sebum stains such as fingerprints adhere, the sebum stains (sebum stains, etc.) It is desired to provide a sebum layer to make it inconspicuous.
一般に、ガラスや布などの基材表面と有機化合物とを結合させるものとして、シランカップリング剤が良く知られており、各種基材表面のコーティング剤として幅広く利用されている。シランカップリング剤は、1分子中に有機官能基と反応性シリル基(一般にはアルコキシシリル基等の加水分解性シリル基)を有し、この加水分解性シリル基が、空気中の水分などによって自己縮合反応を起こして被膜を形成する。該被膜は、加水分解性シリル基がガラスや金属などの表面と化学的・物理的に結合することにより耐久性を有する強固な被膜となる。 Generally, a silane coupling agent is well known as a substance for binding an organic compound to the surface of a base material such as glass or cloth, and is widely used as a coating agent for the surface of various base materials. The silane coupling agent has an organic functional group and a reactive silyl group (generally a hydrolyzable silyl group such as an alkoxysilyl group) in one molecule, and the hydrolyzable silyl group is caused by moisture in the air or the like. A self-condensation reaction occurs to form a film. The film becomes a durable and strong film by chemically and physically bonding the hydrolyzable silyl group to the surface of glass, metal, or the like.
そこで、フルオロポリエーテル基含有化合物に加水分解性シリル基を導入したフルオロポリエーテル基含有ポリマーを用いることによって、基材表面に密着し易く、且つ基材表面に、撥水撥油性、防汚性等を有する被膜を形成しうる組成物が数多く開示されている(特許文献1~6:特表2008-534696号公報、特表2008-537557号公報、特開2012-072272号公報、特開2012-157856号公報、特開2013-136833号公報、特開2015-199906号公報)。 Therefore, by using a fluoropolyether group-containing polymer in which a hydrolyzable silyl group is introduced into a fluoropolyether group-containing compound, it is easy to adhere to the surface of the base material, and the surface of the base material has water and oil repellency and stain resistance. A large number of compositions capable of forming a film having such a substance are disclosed (Patent Documents 1 to 6: JP-A-2008-534696, JP-A-2008-537557, JP-A-2012-072272, JP-A-2012). -157856, JP2013-136833, JP2015-199906).
しかし、従来のフルオロポリエーテル基含有ポリマーを用いて作製した撥油層は撥油性が高く、汚れ拭取り性に優れるが、指紋等が付着したときに皮脂が光を散乱し、指紋が目立ちやすいという問題点があった。 However, the oil-repellent layer prepared by using the conventional fluoropolyether group-containing polymer has high oil-repellent property and excellent stain-wiping property, but when fingerprints or the like adhere, sebum scatters light and fingerprints are easily noticeable. There was a problem.
また、親油性化合物に加水分解性シリル基を導入したシラン化合物を用いることによって、基材表面に密着し、且つ基材表面に、親油性を有する被膜を形成しうる組成物も開示されている(特許文献7:特開2001-353808号公報)。 Further, a composition capable of adhering to the surface of a substrate and forming a lipophilic film on the surface of the substrate by using a silane compound in which a hydrolyzable silyl group is introduced into the lipophilic compound is also disclosed. (Patent Document 7: Japanese Unexamined Patent Publication No. 2001-353808).
しかし、特許文献7に記載のシラン化合物は、皮脂の屈折率約1.5に比べて屈折率が大きく離れており、指紋が目立ちにくくはなるものの十分に指紋低視認性が発揮できていない。 However, the silane compound described in Patent Document 7 has a refractive index significantly different from that of sebum having a refractive index of about 1.5, and although fingerprints are less noticeable, fingerprint low visibility cannot be sufficiently exhibited.
本発明は、上記事情に鑑みなされたもので、親油性に優れた硬化被膜を形成することができるため、指紋等が付着したときに皮脂が光を散乱することなく指紋が目立ちにくくなると共に、皮脂の屈折率約1.5に近い屈折率を有する構造で硬化被膜を形成することができるため、指紋の低視認性を十分発揮することができ、かつ摩耗耐久性に優れた親油性基含有(加水分解性)オルガノシラン化合物、該親油性基含有(加水分解性)オルガノシラン化合物及び/又はその部分(加水分解)縮合物を含む表面処理剤、並びに該表面処理剤で表面処理された物品等を提供することを目的とする。 The present invention has been made in view of the above circumstances, and since it is possible to form a cured film having excellent oil resistance, the skin oil does not scatter light when a fingerprint or the like adheres, and the fingerprint becomes inconspicuous. Since the cured film can be formed with a structure having a refractive index close to about 1.5 of the refraction coefficient of the sebum, it is possible to sufficiently exhibit low visibility of the fingerprint and contain a lipophilic group having excellent wear durability. A surface treatment agent containing a (hydrolyzable) organosilane compound, the lipophilic group-containing (hydrolyzable) organosilane compound and / or a partial (hydrolyzable) condensate thereof, and an article surface-treated with the surface treatment agent. Etc. are intended to be provided.
本発明者らは、上記目的を解決すべく、国際公開第2019/082583号で皮脂の屈折率約1.5に近い指紋低視認性シラン化合物を開発した。
しかし、国際公開第2019/082583号に記載のシラン化合物は、摩耗耐久性、特に消しゴムで摩耗した際に耐久性が必ずしも十分でなく、被膜が剥がれてしまう場合があるため、使用に伴い指紋低視認性が低下してしまうことがあった。In order to solve the above object, the present inventors have developed a fingerprint low visibility silane compound having a refractive index of sebum close to about 1.5 in International Publication No. 2019/082583.
However, the silane compound described in International Publication No. 2019/082583 does not always have sufficient wear durability, especially when worn with an eraser, and the film may peel off. Therefore, the fingerprint is low with use. Visibility may be reduced.
そこで、更なる検討を行った結果、上記親油性基含有(加水分解性)オルガノシラン化合物において、後述する一般式(1)で表される特定分子構造の水酸基もしくは加水分解性基と親油性基とを含有する(加水分解性)オルガノシラン化合物、特には後述する一般式(2)で表される水酸基もしくは加水分解性基と親油性基とを含有する(加水分解性)オルガノシラン化合物を用いることにより、該親油性基含有(加水分解性)オルガノシラン化合物及び/又はその部分(加水分解)縮合物を含む表面処理剤が、親油性に優れると共に皮脂の屈折率に近い屈折率を有し、かつ摩耗耐久性に優れた硬化被膜を形成することができることを見出し、本発明をなすに至った。 Therefore, as a result of further studies, in the above-mentioned lipophilic group-containing (hydrolyzable) organosilane compound, a hydroxyl group or a hydrolyzable group having a specific molecular structure represented by the general formula (1) described later and a lipophilic group. A (hydrolyzable) organosilane compound containing and, in particular, a (hydrolyzable) organosilane compound containing a hydroxyl group represented by the general formula (2) described later or a hydrolyzable group and a lipophilic group is used. As a result, the surface treatment agent containing the lipophilic group-containing (hydrolyzable) organosilane compound and / or its partial (hydrolyzable) condensate has excellent oil lipophilicity and a refractive index close to that of sebum. Moreover, it has been found that a cured film having excellent wear durability can be formed, and the present invention has been made.
従って、本発明は、下記の親油性基含有(加水分解性)オルガノシラン化合物、表面処理剤及び物品等を提供する。
[1]
下記一般式(1)で表されるオルガノシラン化合物。
-R
3
-Z-(R
3
)
a
- (3)
(ここで、R
3
は独立に炭素数2~30のアルキレン基又はフェニレン基を含む炭素数7~30のアルキレン・フェニレン基であり、Zは単結合、又は下記式
で表される、フェニレン基、シルフェニレン基、ジシロキサン残基、環状テトラシロキサン残基から選ばれる2価の基を含んでいてもよい、炭素数2~30のアルキレン基であり、Rは独立に炭素数1~4のアルキル基又はフェニル基であり、R’は炭素数1~20のアルキル基、炭素数6~20のアリール基又は炭素数7~20のアラルキル基であり、pは2又は3であり、Xは独立に水酸基又は加水分解性基であり、nは1~3の整数である。]
[2]
前記式(1)において、左側のYが炭素数2~20のアルキレン基であり、右側のYが独立に、炭素数2~20のアルキレン基、又は下記式から選ばれるいずれかである[1]に記載のオルガノシラン化合物。
前記式(1)において、Yが炭素数2~20のアルキレン基である[1]に記載のオルガノシラン化合物。
[4]
前記式(1)において、Xがそれぞれ独立に、水酸基、炭素数1~10のアルコキシ基、炭素数2~10のアルコキシ置換アルコキシ基、炭素数1~10のアシロキシ基、炭素数2~10のアルケニルオキシ基、ハロゲン原子、オキシム基、イソシアネート基、及びシアネート基からなる群より選ばれる[1]~[3]のいずれかに記載のオルガノシラン化合物。
[5]
下記式(2)で表されるものである[1]~[4]のいずれかに記載のオルガノシラン化合物。
[6]
屈折率が1.45以上である[1]~[5]のいずれかに記載のオルガノシラン化合物。
[7]
[1]~[6]のいずれかに記載のオルガノシラン化合物及び/又はその部分(加水分解)縮合物の少なくとも1種類を含有する表面処理剤。
[8]
更に、溶剤を含むものである[7]に記載の表面処理剤。
[9]
更に、加水分解縮合触媒を含むものである[7]又は[8]に記載の表面処理剤。
[10]
25℃、相対湿度40%におけるオレイン酸接触角が30°以下の硬化被膜を与えるものである[7]~[9]のいずれかに記載の表面処理剤。
[11]
硬化した被膜に1kg荷重で皮脂を付着させた際のヘーズが10以下の硬化被膜を与えるものである[7]~[10]のいずれかに記載の表面処理剤。
[12]
消しゴムで2,000回摩耗後の水接触角が50°以上である硬化被膜を与えるものである[7]~[11]のいずれかに記載の表面処理剤。
[13]
[7]~[12]のいずれかに記載の表面処理剤の硬化被膜を表面に有する物品。
[14]
[7]~[12]のいずれかに記載の表面処理剤の硬化被膜を基材表面に形成する工程を含む基材表面のJIS K 0062に基づく屈折率を1.45~1.52にする方法。
Therefore, the present invention provides the following lipophilic group-containing (hydrolyzable) organosilane compounds, surface treatment agents, articles and the like.
[1]
An organosilane compound represented by the following general formula (1).
-R 3 -Z- (R 3 ) a- (3)
(Here, R 3 is an alkylene group having 2 to 30 carbon atoms or an alkylene phenylene group having 7 to 30 carbon atoms including a phenylene group, and Z is a single bond or the following formula.
It is an alkylene group having 2 to 30 carbon atoms and may contain a divalent group selected from a phenylene group, a sylphenylene group, a disiloxane residue and a cyclic tetrasiloxane residue represented by, and R is independent. Is an alkyl group or a phenyl group having 1 to 4 carbon atoms, R'is an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms or an aralkyl group having 7 to 20 carbon atoms, and p is 2. Or 3, X is independently a hydroxyl group or a hydrolyzable group, and n is an integer of 1 to 3. ]
[2]
In the above formula (1), Y on the left side is an alkylene group having 2 to 20 carbon atoms, and Y on the right side is an alkylene group having 2 to 20 carbon atoms independently, or one selected from the following formula [1]. ] The organosilane compound according to.
The organosilane compound according to [1], wherein Y is an alkylene group having 2 to 20 carbon atoms in the formula (1).
[ 4 ]
In the above formula (1), X is independently a hydroxyl group, an alkoxy group having 1 to 10 carbon atoms, an alkoxy-substituted alkoxy group having 2 to 10 carbon atoms, an acyloxy group having 1 to 10 carbon atoms, and 2 to 10 carbon atoms. The organosilane compound according to any one of [1] to [3] selected from the group consisting of an alkenyloxy group, a halogen atom, an oxime group, an isocyanate group, and a cyanate group.
[ 5 ]
The organosilane compound according to any one of [1] to [ 4 ] represented by the following formula (2).
[ 6 ]
The organosilane compound according to any one of [1] to [ 5 ], which has a refractive index of 1.45 or more.
[ 7 ]
A surface treatment agent containing at least one of the organosilane compound according to any one of [1] to [ 6 ] and / or a partial (hydrolyzed) condensate thereof.
[ 8 ]
Further, the surface treatment agent according to [ 7 ], which contains a solvent.
[ 9 ]
The surface treatment agent according to [ 7 ] or [ 8 ], which further comprises a hydrolysis condensation catalyst.
[ 10 ]
The surface treatment agent according to any one of [ 7 ] to [ 9 ], which gives a cured film having an oleic acid contact angle of 30 ° or less at 25 ° C. and a relative humidity of 40%.
[ 11 ]
The surface treatment agent according to any one of [ 7 ] to [ 10 ], which gives a cured film having a haze of 10 or less when sebum is attached to the cured film with a load of 1 kg.
[ 12 ]
The surface treatment agent according to any one of [ 7 ] to [ 11 ], which gives a cured film having a water contact angle of 50 ° or more after being worn 2,000 times with an eraser.
[ 13 ]
An article having a cured film of the surface treatment agent according to any one of [ 7 ] to [ 12 ] on the surface.
[ 14 ]
The refractive index of the surface of the substrate, which includes the step of forming the cured film of the surface treatment agent according to any one of [ 7 ] to [ 12 ], is set to 1.45 to 1.52 based on JIS K 0062. Method.
本発明の親油性基含有(加水分解性)オルガノシラン化合物は、分子内に親油性の末端基を有することで皮脂が付着した際に皮脂を基材上に濡れ広げることができ、またフェニレン基を含有することで皮脂の屈折率(約1.5)に硬化被膜表面の屈折率を近づけることができる。これにより該親油性基含有(加水分解性)オルガノシラン化合物及び/又はその部分(加水分解)縮合物を含有する表面処理剤にて表面処理された物品は、該物品表面のJIS K 0062に基づく屈折率が1.45以上、特には1.45~1.52とすることができるため、指紋低視認性(付着した指紋を目立たなくする性質)に優れる。更に、本発明の親油性基含有(加水分解性)オルガノシラン化合物は、3級炭素原子に結合した反応性末端基を2個以上(2個又は3個)有するため、基材密着性が向上し、特に優れた消しゴム摩耗耐久性を示す。 The oleophilic group-containing (hydrolytable) organosilane compound of the present invention has an oleophilic end group in the molecule, so that when sebum adheres, the sebum can be wetted and spread on the substrate, and a phenylene group can be obtained. By containing the above, the refractive index of the surface of the cured film can be brought close to the refractive index of sebum (about 1.5). As a result, the article surface-treated with the surface treatment agent containing the lipophilic group-containing (hydrolyzable) organosilane compound and / or its partial (hydrolyzable) condensate is based on JIS K 0062 on the surface of the article. Since the refractive index can be 1.45 or more, particularly 1.45 to 1.52, the fingerprint is excellent in low visibility (property to make the attached fingerprint inconspicuous). Further, since the lipophilic group-containing (hydrolyzable) organosilane compound of the present invention has two or more (two or three) reactive end groups bonded to tertiary carbon atoms, the adhesion to the substrate is improved. And shows particularly good eraser wear durability.
本発明の分子内に親油性基を含有する(加水分解性)オルガノシラン化合物は、下記一般式(1)で表されるものであり、混合物でもよい。
本発明の親油性基含有(加水分解性)オルガノシラン化合物は、親油性末端基と、アルコキシシリル基等の加水分解性シリル基あるいは水酸基含有シリル基が、連結基であるシルフェニレン基を介して結合した構造であり、基材密着性、親油性に優れることを特徴としている。 The lipophilic group-containing (hydrolytable) organosilane compound of the present invention has a lipophilic terminal group and a hydrolyzable silyl group such as an alkoxysilyl group or a hydroxyl group-containing silyl group via a sylphenylene group as a linking group. It has a bonded structure and is characterized by excellent adhesion to a base material and oil resistance.
上記式(1)において、Aは-C(=O)OR1で示されるエステル又はカルボン酸、-C(=O)NR1 2で示されるアミド、-C(=O)SR1で示されるチオエステル又はチオ酸、及び-P(=O)(OR1)2で示されるホスホン酸エステル又はホスホン酸のいずれかであり、本発明における親油性末端基である。In the above formula (1), A is represented by an ester or carboxylic acid represented by -C (= O) OR 1 , an amide represented by -C (= O) NR 1 2 , and -C (= O) SR 1 . It is either a thioester or a thioic acid, and a phosphonic acid ester or a phosphonic acid represented by −P (= O) (OR 1 ) 2 , and is an oil-based terminal group in the present invention.
ここで、R1は水素原子、炭素数1~30のアルキル基、炭素数6~30のアリール基又は炭素数7~30のアラルキル基であり、アルキル基としては、直鎖状、分岐状、環状のいずれでもよく、またこれらの組み合わせでもよい。好ましくは炭素数1~10の直鎖状のアルキル基であり、より好ましくは炭素数2~8の直鎖状のアルキル基である。Here, R 1 is a hydrogen atom, an alkyl group having 1 to 30 carbon atoms, an aryl group having 6 to 30 carbon atoms or an aralkyl group having 7 to 30 carbon atoms, and the alkyl group may be linear or branched. Any of them may be annular, or a combination thereof may be used. It is preferably a linear alkyl group having 1 to 10 carbon atoms, and more preferably a linear alkyl group having 2 to 8 carbon atoms.
R1として、具体的には、水素原子、メチル基、エチル基、プロピル基、ブチル基、ペンチル基、ヘキシル基、ヘプチル基、オクチル基、ノニル基、デシル基、ドデシル基、テトラデシル基、ヘキサデシル基、オクタデシル基、イソプロピル基、イソブチル基、tert-ブチル基、ネオペンチル基、テキシル基、シクロペンチル基、シクロヘキシル基、シクロヘプチル基、シクロヘキシルメチル基、ノルボルニル基、デカヒドロナフチル基、アダマンチル基、アダマンチルメチル基等のアルキル基、フェニル基、トリル基、ナフチル基等のアリール基、ベンジル基、フェニルエチル基、フェニルプロピル基等のアラルキル基などが挙げられる。R1として、好ましくはエチル基、オクチル基である。Specific examples of R 1 include hydrogen atom, methyl group, ethyl group, propyl group, butyl group, pentyl group, hexyl group, heptyl group, octyl group, nonyl group, decyl group, dodecyl group, tetradecyl group and hexadecyl group. , Octadecyl group, isopropyl group, isobutyl group, tert-butyl group, neopentyl group, texyl group, cyclopentyl group, cyclohexyl group, cycloheptyl group, cyclohexylmethyl group, norbornyl group, decahydronaphthyl group, adamantyl group, adamantylmethyl group, etc. Examples thereof include an aryl group such as an alkyl group, a phenyl group, a trill group and a naphthyl group, and an aralkyl group such as a benzyl group, a phenylethyl group and a phenylpropyl group. R 1 is preferably an ethyl group or an octyl group.
Aとしては、例えば、下記に示すものを例示することができる。
上記式(1)において、Xは互いに異なっていてよい水酸基又は加水分解性基である。このようなXとしては、水酸基、メトキシ基、エトキシ基、プロポキシ基、イソプロポキシ基、ブトキシ基などの炭素数1~10のアルコキシ基、メトキシメトキシ基、メトキシエトキシ基などの炭素数2~10のアルコキシ置換アルコキシ基、アセトキシ基などの炭素数1~10のアシロキシ基、イソプロペノキシ基などの炭素数2~10のアルケニルオキシ基、フッ素原子、塩素原子、臭素原子、ヨウ素原子などのハロゲン原子、オキシム基、イソシアネート基、シアネート基などが挙げられる。中でもメトキシ基、エトキシ基、イソプロペノキシ基、塩素原子が好適である。 In the above formula (1), X is a hydroxyl group or a hydrolyzable group which may be different from each other. Such X includes an alkoxy group having 1 to 10 carbon atoms such as a hydroxyl group, a methoxy group, an ethoxy group, a propoxy group, an isopropoxy group and a butoxy group, and 2 to 10 carbon atoms such as a methoxymethoxy group and a methoxyethoxy group. Acryoxy groups having 1 to 10 carbon atoms such as alkoxy-substituted alkoxy groups and acetoxy groups, alkenyloxy groups having 2 to 10 carbon atoms such as isopropenoxy groups, halogen atoms such as fluorine atoms, chlorine atoms, bromine atoms and iodine atoms, and oxime groups. , An isocyanate group, a cyanate group and the like. Of these, a methoxy group, an ethoxy group, an isopropenoxy group, and a chlorine atom are preferable.
上記式(1)において、Rは、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、sec-ブチル基、tert-ブチル基等の炭素数1~4のアルキル基、又はフェニル基であり、中でもメチル基が好適である。
nは1~3の整数、好ましくは2又は3であり、反応性、基材に対する密着性の観点から3がより好ましい。In the above formula (1), R is an alkyl group having 1 to 4 carbon atoms such as a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a sec-butyl group and a tert-butyl group, or a phenyl group. It is a group, and a methyl group is particularly preferable.
n is an integer of 1 to 3, preferably 2 or 3, and 3 is more preferable from the viewpoint of reactivity and adhesion to the substrate.
上記式(1)において、R’は炭素数1~20のアルキル基、炭素数6~20のアリール基又は炭素数7~20のアラルキル基である。具体的にはメチル基、エチル基、プロピル基、ブチル基、ペンチル基、ヘキシル基、ヘプチル基、オクチル基、ノニル基、デシル基、ドデシル基、テトラデシル基、ヘキサデシル基、オクタデシル基、イソプロピル基、イソブチル基、tert-ブチル基、ネオペンチル基、テキシル基、シクロペンチル基、シクロヘキシル基、シクロヘプチル基、シクロヘキシルメチル基、ノルボルニル基、デカヒドロナフチル基、アダマンチル基、アダマンチルメチル基等のアルキル基、フェニル基、トリル基、ナフチル基等のアリール基、ベンジル基、フェニルエチル基、フェニルプロピル基、ナフチルメチル基等のアラルキル基などが挙げられる。R’として好ましくは炭素数1~15のアルキル基、炭素数6~15のアリール基、炭素数7~15のアラルキル基であり、更に好ましくはブチル基、ペンチル基、ヘキシル基、ヘプチル基、オクチル基、ノニル基、テトラデシル基、フェニル基、トリル基、ナフチル基、ベンジル基、ナフチルメチル基である。 In the above formula (1), R'is an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms, or an aralkyl group having 7 to 20 carbon atoms. Specifically, methyl group, ethyl group, propyl group, butyl group, pentyl group, hexyl group, heptyl group, octyl group, nonyl group, decyl group, dodecyl group, tetradecyl group, hexadecyl group, octadecyl group, isopropyl group, isobutyl. Group, tert-butyl group, neopentyl group, texyl group, cyclopentyl group, cyclohexyl group, cycloheptyl group, cyclohexylmethyl group, norbornyl group, decahydronaphthyl group, adamantyl group, adamantylmethyl group and other alkyl groups, phenyl group, trill Examples thereof include an aryl group such as a group and a naphthyl group, an aralkyl group such as a benzyl group, a phenylethyl group, a phenylpropyl group and a naphthylmethyl group. The R'is preferably an alkyl group having 1 to 15 carbon atoms, an aryl group having 6 to 15 carbon atoms, an aralkyl group having 7 to 15 carbon atoms, and more preferably a butyl group, a pentyl group, a hexyl group, a heptyl group or an octyl group. Group, nonyl group, tetradecyl group, phenyl group, tolyl group, naphthyl group, benzyl group, naphthylmethyl group.
上記式(1)において、Yは2価の有機基で、A基とシルフェニレン基との連結基、及び3級炭素原子と加水分解性シリル基あるいは水酸基含有シリル基との連結基であり、シルアルキレン基、シルアリーレン基、ケイ素原子数2~10個の直鎖状、分岐状又は環状の2価のオルガノポリシロキサン残基から選ばれる2価の基を含んでいてもよく、また炭素数6~20のアリーレン基を含んでいてもよい炭素数2~30、特に炭素数2~20のアルキレン基であることが好ましく、より好ましくは下記式(3)で表される2価の基である。
-R3-Z-(R3)a- (3)In the above formula (1), Y is a divalent organic group, which is a linking group of an A group and a silphenylene group, and a linking group of a tertiary carbon atom and a hydrolyzable silyl group or a hydroxyl group-containing silyl group. It may contain a sylalkylene group, a sylarylene group, a divalent group selected from a linear, branched or cyclic divalent organopolysiloxane residue having 2 to 10 silicon atoms, and may contain a divalent group having 2 to 10 carbon atoms. It is preferably an alkylene group having 2 to 30 carbon atoms, particularly 2 to 20 carbon atoms, which may contain 6 to 20 arylene groups, and more preferably a divalent group represented by the following formula (3). be.
-R 3 -Z- (R 3 ) a- (3)
上記式(3)において、R3は独立に2価の炭化水素基であり、具体的には、エチレン基、プロピレン基、ブチレン基、ヘキサメチレン基等の炭素数2~30のアルキレン基、フェニレン基等の炭素数6~20のアリーレン基を含む炭素数7~30のアルキレン・アリーレン基が挙げられ、好ましくは炭素数2~20のアルキレン基である。In the above formula (3), R 3 is an independently divalent hydrocarbon group, specifically, an alkylene group having 2 to 30 carbon atoms such as an ethylene group, a propylene group, a butylene group and a hexamethylene group, and phenylene. Examples thereof include an alkylene arylene group having 7 to 30 carbon atoms including an arylene group having 6 to 20 carbon atoms such as a group, and an alkylene group having 2 to 20 carbon atoms is preferable.
上記式(3)において、Zは単結合、シルアルキレン基、シルアリーレン基、もしくはケイ素原子数2~10個、好ましくは2~5個の直鎖状、分岐状又は環状の2価のオルガノポリシロキサン残基から選ばれる2価の基である。 In the above formula (3), Z is a single bond, a sylalkylene group, a sylarylene group, or a linear, branched or cyclic divalent organopoly having 2 to 10 silicon atoms, preferably 2 to 5 atoms. It is a divalent group selected from siloxane residues.
ここで、シルアルキレン基、シルアリーレン基としては、下記に示すものが例示できる。
また、ケイ素原子数2~10個、好ましくは2~5個の直鎖状、分岐状又は環状の2価のオルガノポリシロキサン残基としては、下記に示すものが例示できる。
上記式(3)において、aは0又は1である。 In the above formula (3), a is 0 or 1.
Yの具体例としては、例えば、下記の基が挙げられる。
上記式(1)で表される親油性基含有(加水分解性)オルガノシラン化合物としては、下記式で表されるものが例示できる。
本発明の親油性基含有(加水分解性)オルガノシラン化合物として、更に好ましくは下記一般式(2)で表されるものである。
ここで、R2は炭素数1~20のアルキル基、炭素数6~20のアリール基又は炭素数7~20のアラルキル基であり、好ましくは炭素数1~10の直鎖状のアルキル基であり、より好ましくは炭素数2~8の直鎖状のアルキル基である。Here, R 2 is an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms, or an aralkyl group having 7 to 20 carbon atoms, preferably a linear alkyl group having 1 to 10 carbon atoms. Yes, more preferably a linear alkyl group having 2 to 8 carbon atoms.
R2として、具体的には、メチル基、エチル基、プロピル基、ブチル基、ペンチル基、ヘキシル基、ヘプチル基、オクチル基、ノニル基、デシル基、ドデシル基、テトラデシル基、ヘキサデシル基、オクタデシル基、イソプロピル基、イソブチル基、tert-ブチル基、ネオペンチル基、テキシル基、シクロペンチル基、シクロヘキシル基、シクロヘプチル基、シクロヘキシルメチル基、ノルボルニル基、デカヒドロナフチル基、アダマンチル基、アダマンチルメチル基等のアルキル基、フェニル基、トリル基、ナフチル基等のアリール基、ベンジル基、フェニルエチル基、フェニルプロピル基等のアラルキル基などが挙げられる。R2として、好ましくはエチル基、ブチル基、オクチル基である。Specific examples of R 2 include methyl group, ethyl group, propyl group, butyl group, pentyl group, hexyl group, heptyl group, octyl group, nonyl group, decyl group, dodecyl group, tetradecyl group, hexadecyl group and octadecyl group. , Isobutyl group, isobutyl group, tert-butyl group, neopentyl group, texyl group, cyclopentyl group, cyclohexyl group, cycloheptyl group, cyclohexylmethyl group, norbornyl group, decahydronaphthyl group, adamantyl group, adamantylmethyl group and other alkyl groups. , Aryl group such as phenyl group, trill group and naphthyl group, aralkyl group such as benzyl group, phenylethyl group and phenylpropyl group and the like. R 2 is preferably an ethyl group, a butyl group or an octyl group.
上記式(2)で表される親油性基含有(加水分解性)オルガノシラン化合物としては、下記式で表されるものが例示できる。
上記式(1)で表される親油性基含有(加水分解性)オルガノシラン化合物、特に式(1)においてA基とシルフェニレン基との連結基であるY(即ち、式(1)においてA基に隣接するY)、及び3級炭素原子と加水分解性シリル基あるいは水酸基含有シリル基との連結基であるYのいずれもが炭素数2~20のアルキレン基である親油性基含有(加水分解性)オルガノシラン化合物の調製方法としては、例えば、下記のような方法が挙げられる。
分子鎖末端に上記式(1)におけるAとフェニルジメチルシリル部位と少なくとも2つのオレフィン部位(例えばアルケニル基)を有する化合物と、トリメトキシシラン等の分子中にSiH基及び加水分解性末端基を有する有機ケイ素化合物を、ヒドロシリル化反応触媒、例えば塩化白金酸/ビニルシロキサン錯体のトルエン溶液存在下、40~120℃、好ましくは60~100℃、より好ましくは約80℃の温度で、10分~48時間、好ましくは1~36時間、より好ましくは約24時間熟成させる。また、反応を行う際、有機溶剤で希釈してもよい。A lipophilic group-containing (hydrolytable) organosilane compound represented by the above formula (1), particularly Y (that is, A in the formula (1)) which is a linking group of the A group and the sylphenylene group in the formula (1). Both Y) adjacent to the group and Y, which is a linking group of a tertiary carbon atom and a hydrolyzable silyl group or a hydroxyl group-containing silyl group, contain an oil-based group (hydrogen) in which both are alkylene groups having 2 to 20 carbon atoms. Examples of the method for preparing the (degradable) organosilane compound include the following methods.
A compound having A and a phenyldimethylsilyl moiety in the above formula (1) and at least two olefin moieties (for example, an alkenyl group) at the end of the molecular chain, and a SiH group and a hydrolyzable end group in a molecule such as trimethoxysilane. The organic silicon compound is subjected to a hydrosilylation reaction catalyst, for example, in the presence of a toluene solution of platinum chloride acid / vinylsiloxane complex, at a temperature of 40 to 120 ° C., preferably 60 to 100 ° C., more preferably about 80 ° C., for 10 minutes to 48 minutes. Aging for hours, preferably 1-36 hours, more preferably about 24 hours. Further, when carrying out the reaction, it may be diluted with an organic solvent.
ここで、分子鎖末端に上記式(1)におけるAとフェニルジメチルシリル部位と少なくとも2つのオレフィン部位(例えばアルケニル基)を有する化合物としては、下記一般式(4a)、(4b)、(4c)、(4d)及び(4e)で表されるシラン化合物が例示できる。
式(4a)で表されるシラン化合物として、具体的には、下記に示すものが例示できる。
式(4b)で表されるシラン化合物として、具体的には、下記に示すものが例示できる。
式(4c)で表されるシラン化合物として、具体的には、下記に示すものが例示できる。
式(4d)で表されるシラン化合物として、具体的には、下記に示すものが例示できる。
式(4e)で表されるシラン化合物として、具体的には、下記に示すものが例示できる。
上記式(4a)、(4b)、(4c)、(4d)及び(4e)で表されるシラン化合物の調製方法としては、まず、水酸基と少なくとも2つのオレフィン部位(例えばアルケニル基)をそれぞれ有する化合物と脱水素化反応触媒を混合する。続いて分子鎖末端に上記式(1)におけるAとフェニルジメチルシリル部位をそれぞれ有するシラン化合物(例えば、ケイ素原子に結合する置換基として分子鎖末端に上記式(1)におけるAとジメチルハイドロジェンシリルフェニル基とを有するジメチルシラン)をそれぞれ有する化合物を滴下し、0~60℃、好ましくは15~50℃、より好ましくは約30℃の温度で10分~24時間、好ましくは30分~2時間、より好ましくは1時間撹拌、熟成する。また、反応を行う際、有機溶剤で希釈してもよい。 As a method for preparing a silane compound represented by the above formulas (4a), (4b), (4c), (4d) and (4e), first, it has a hydroxyl group and at least two olefin moieties (for example, an alkenyl group). The compound and the dehydrogenation reaction catalyst are mixed. Subsequently, a silane compound having A and phenyldimethylsilyl moiety in the above formula (1) at the end of the molecular chain (for example, A and dimethylhydrogensilyl in the above formula (1) as a substituent bonded to a silicon atom) Compounds having (dimethylsilane having a phenyl group) are added dropwise at a temperature of 0 to 60 ° C., preferably 15 to 50 ° C., more preferably about 30 ° C. for 10 minutes to 24 hours, preferably 30 minutes to 2 hours. , More preferably, it is stirred for 1 hour and aged. Further, when carrying out the reaction, it may be diluted with an organic solvent.
上記式(4a)、(4b)、(4c)、(4d)及び(4e)で表されるシラン化合物を調製する際の分子鎖末端に上記式(1)におけるAとフェニルジメチルシリル部位をそれぞれ有するシラン化合物としては、下記一般式(4a’)、(4b’)、(4c’)及び(4d’)で表されるシラン化合物が例示できる。
式(4a’)で表されるシラン化合物として、具体的には、下記に示すものが例示できる。
式(4b’)で表されるシラン化合物として、具体的には、下記に示すものが例示できる。
式(4c’)で表されるシラン化合物として、具体的には、下記に示すものが例示できる。
式(4d’)で表されるシラン化合物として、具体的には、下記に示すものが例示できる。
上記式(4a’)、(4b’)、(4c’)及び(4d’)で表されるシラン化合物の調製方法としては、1,4-ビス(ジメチルシリル)ベンゼンを40~120℃、好ましくは60~100℃、より好ましくは約80℃の温度で加熱撹拌し、ヒドロシリル化反応触媒、例えば塩化白金酸/ビニルシロキサン錯体のトルエン溶液を添加する。続いて分子鎖末端に上記式(1)におけるAとオレフィン部位(例えば、アルケニル基)をそれぞれ有する化合物を、ゆっくり時間をかけて滴下し、40~120℃、好ましくは60~100℃、より好ましくは約80℃の温度で、10分~12時間、好ましくは1~6時間、より好ましくは3~6時間熟成させる。また、反応を行う際、有機溶剤で希釈してもよい。 As a method for preparing the silane compound represented by the above formulas (4a'), (4b'), (4c') and (4d'), 1,4-bis (dimethylsilyl) benzene is preferably used at 40 to 120 ° C. Is heated and stirred at a temperature of 60 to 100 ° C., more preferably about 80 ° C., and a hydrosilylation reaction catalyst, for example, a toluene solution of chloroplatinic acid / vinylsiloxane complex is added. Subsequently, a compound having A and an olefin moiety (for example, an alkenyl group) in the above formula (1) at the end of the molecular chain is slowly added dropwise over a long period of time to 40 to 120 ° C, preferably 60 to 100 ° C, more preferably. Is aged at a temperature of about 80 ° C. for 10 minutes to 12 hours, preferably 1 to 6 hours, more preferably 3 to 6 hours. Further, when carrying out the reaction, it may be diluted with an organic solvent.
ここで、分子鎖末端に上記式(1)におけるAとオレフィン部位をそれぞれ有する化合物として、具体的には、下記に示すものが挙げられる。
分子鎖末端に上記式(1)におけるAとオレフィン部位をそれぞれ有する化合物の使用量は、1,4-ビス(ジメチルシリル)ベンゼン1当量に対して0.05~0.5当量、より好ましくは0.1~0.4当量、更に好ましくは約0.2当量用いることができる。 The amount of the compound having A and the olefin moiety in the above formula (1) at the end of the molecular chain is 0.05 to 0.5 equivalents, more preferably 0.05 equivalents with respect to 1 equivalent of 1,4-bis (dimethylsilyl) benzene. 0.1 to 0.4 equivalents, more preferably about 0.2 equivalents can be used.
上記式(4a’)、(4b’)、(4c’)及び(4d’)で表されるシラン化合物の調製において、ヒドロシリル化反応触媒としては、白金黒、塩化白金酸、塩化白金酸のアルコール変性物、塩化白金酸とオレフィン、アルデヒド、ビニルシロキサン、アセチレンアルコール類等との錯体等、テトラキス(トリフェニルホスフィン)パラジウム、クロロトリス(トリフェニルホスフィン)ロジウム等の白金族金属系触媒が挙げられる。好ましくはビニルシロキサン配位化合物等の白金系化合物である。
ヒドロシリル化反応触媒の使用量は、1,4-ビス(ジメチルシリル)ベンゼンと分子鎖末端に上記式(1)におけるAとオレフィン部位をそれぞれ有する化合物の合計質量に対して、遷移金属換算(質量)で0.001~100ppm、より好ましくは0.005~50ppmとなる量で使用する。In the preparation of the silane compounds represented by the above formulas (4a'), (4b'), (4c') and (4d'), the hydrosilylation reaction catalyst is an alcohol of platinum black, platinum chloride acid or platinum chloride acid. Examples thereof include modified products, complexes of platinum chloride acid with olefins, aldehydes, vinylsiloxanes, acetylene alcohols and the like, and platinum group metal catalysts such as tetrakis (triphenylphosphine) palladium and chlorotris (triphenylphosphine) rhodium. A platinum-based compound such as a vinylsiloxane coordinate compound is preferable.
The amount of the hydrosilylation reaction catalyst used is the transition metal equivalent (mass) with respect to the total mass of 1,4-bis (dimethylsilyl) benzene and the compound having A and the olefin moiety in the above formula (1) at the end of the molecular chain. ) Is 0.001 to 100 ppm, more preferably 0.005 to 50 ppm.
上記式(4a’)、(4b’)、(4c’)及び(4d’)で表されるシラン化合物の調製には有機溶剤を用いてもよい。用いられる有機溶剤としては、エーテル系溶剤(ジブチルエーテル、ジエチルエーテル、テトラヒドロフランなど)、炭化水素系溶剤(石油ベンジン、トルエン、キシレンなど)を例示することができる。これらの中では特にトルエンが好ましい。
溶剤を用いる場合、その使用量は、分子鎖末端に上記式(1)におけるAとオレフィン部位をそれぞれ有する化合物100質量部に対して、10~300質量部、好ましくは50~150質量部、更に好ましくは約100質量部用いることができる。An organic solvent may be used for the preparation of the silane compounds represented by the above formulas (4a'), (4b'), (4c') and (4d'). Examples of the organic solvent used include ether solvents (dibutyl ether, diethyl ether, tetrahydrofuran, etc.) and hydrocarbon solvents (petroleum benzine, toluene, xylene, etc.). Of these, toluene is particularly preferred.
When a solvent is used, the amount used is 10 to 300 parts by mass, preferably 50 to 150 parts by mass, and more preferably 50 to 150 parts by mass with respect to 100 parts by mass of the compound having A and an olefin moiety in the above formula (1) at the end of the molecular chain. Preferably, about 100 parts by mass can be used.
続いて、反応を停止し、溶剤を留去することで、上記式(4a’)、(4b’)、(4c’)及び(4d’)で表されるシラン化合物が得られる。 Subsequently, the reaction is stopped and the solvent is distilled off to obtain silane compounds represented by the above formulas (4a'), (4b'), (4c') and (4d').
上記式(4a)、(4b)、(4c)、(4d)及び(4e)で表されるシラン化合物を調製する際の水酸基と少なくとも2つのオレフィン部位(例えばアルケニル基)をそれぞれ有する化合物としては、下記一般式(5)、(6)で表される化合物が例示できる。
式(5)で表される化合物として、具体的には、下記に示すものが例示できる。
式(6)で表される化合物として、具体的には、下記に示すものが例示できる。
上記式(4a)、(4b)、(4c)、(4d)及び(4e)で表されるシラン化合物を調製する際の水酸基と少なくとも2つのオレフィン部位(例えばアルケニル基)をそれぞれ有する化合物の調製方法としては、例えば、分子内にエステル基(-C(=O)-OR)を有する化合物と、求核剤としてグリニャール試薬、溶剤として例えばテトラヒドロフランを混合し、0~80℃、好ましくは10~30℃、より好ましくは約25℃で、1~6時間、好ましくは3~5時間、より好ましくは約4時間熟成する。 Preparation of a compound having a hydroxyl group and at least two olefin moieties (for example, an alkenyl group) when preparing a silane compound represented by the above formulas (4a), (4b), (4c), (4d) and (4e). As a method, for example, a compound having an ester group (-C (= O) -OR) in the molecule is mixed with a Grignard reagent as a nucleating agent and, for example, tetrahydrofuran as a solvent, and the temperature is 0 to 80 ° C., preferably 10 to 10. Aging is carried out at 30 ° C., more preferably about 25 ° C. for 1 to 6 hours, preferably 3 to 5 hours, more preferably about 4 hours.
ここで、原料である化合物は、分子内に有する基として、上述したエステルの他に、酸ハライド、酸無水物、カルボン酸、アミドなども用いることができる。
分子内にこれらの基を有する化合物として、具体的には、下記に示すものが挙げられる。
Specific examples of the compound having these groups in the molecule include those shown below.
上記式(4a)、(4b)、(4c)、(4d)及び(4e)で表されるシラン化合物を調製する際の水酸基と少なくとも2つのオレフィン部位(例えばアルケニル基)をそれぞれ有する化合物の調製に用いられる求核剤としては、アリルマグネシウムハライド、3-ブテニルマグネシウムハライド、4-ペンテニルマグネシウムハライド、5-ヘキセニルマグネシウムハライドなどを用いることができる。また、対応するリチウム試薬を用いることも可能である。
求核剤の使用量は、上記化合物1当量に対して、2~5当量、より好ましくは2.5~3.5当量、更に好ましくは約3当量用いることができる。Preparation of a compound having a hydroxyl group and at least two olefin moieties (for example, an alkenyl group) when preparing a silane compound represented by the above formulas (4a), (4b), (4c), (4d) and (4e). As the nucleophile used in the above, allylmagnesium halide, 3-butenylmagnesium halide, 4-pentenylmagnesium halide, 5-hexenylmagnesium halide and the like can be used. It is also possible to use the corresponding lithium reagent.
The amount of the nucleophile to be used may be 2 to 5 equivalents, more preferably 2.5 to 3.5 equivalents, still more preferably about 3 equivalents, relative to 1 equivalent of the above compound.
また、上記式(4a)、(4b)、(4c)、(4d)及び(4e)で表されるシラン化合物を調製する際の水酸基と少なくとも2つのオレフィン部位(例えばアルケニル基)をそれぞれ有する化合物の調製に用いられる溶剤としては、有機溶剤として、テトラヒドロフラン(THF)、モノエチレングリコールジメチルエーテル、ジエチレングリコールジメチルエーテル、トリエチレングリコールジメチルエーテル、テトラエチレングリコールジメチルエーテル、ジオキサンなどのエーテル系溶剤を用いることができる。
溶剤の使用量は、上記分子内にエステル基を有する化合物100質量部に対して、10~1,000質量部、好ましくは50~500質量部、更に好ましくは約100~300質量部用いることができる。Further, a compound having a hydroxyl group and at least two olefin moieties (for example, an alkenyl group) when preparing a silane compound represented by the above formulas (4a), (4b), (4c), (4d) and (4e). As the organic solvent, an ether solvent such as tetrahydrofuran (THF), monoethylene glycol dimethyl ether, diethylene glycol dimethyl ether, triethylene glycol dimethyl ether, tetraethylene glycol dimethyl ether, and dioxane can be used.
The amount of the solvent used is 10 to 1,000 parts by mass, preferably 50 to 500 parts by mass, and more preferably about 100 to 300 parts by mass with respect to 100 parts by mass of the compound having an ester group in the molecule. can.
続いて、反応を停止し、分液操作により水層と有機層を分離する。得られた有機層を洗浄し、溶剤を留去することで、上記式(4a)、(4b)、(4c)、(4d)及び(4e)で表されるシラン化合物を調製する際の水酸基と少なくとも2つのオレフィン部位(例えばアルケニル基)をそれぞれ有する化合物が得られる。 Subsequently, the reaction is stopped and the aqueous layer and the organic layer are separated by a liquid separation operation. The hydroxyl groups used to prepare the silane compounds represented by the above formulas (4a), (4b), (4c), (4d) and (4e) by washing the obtained organic layer and distilling off the solvent. And a compound having at least two olefin moieties (eg, an alkenyl group), respectively.
上記式(4a)、(4b)、(4c)、(4d)及び(4e)で表されるシラン化合物の調製において、分子鎖末端に上記式(1)におけるAとフェニルジメチルシリル部位をそれぞれ有するシラン化合物の使用量は、水酸基と少なくとも2つのオレフィン部位(例えばアルケニル基)をそれぞれ有する化合物1当量に対して0.8~1.2当量、より好ましくは0.9~1.1当量、更に好ましくは約1当量用いることができる。 In the preparation of the silane compounds represented by the above formulas (4a), (4b), (4c), (4d) and (4e), the A and the phenyldimethylsilyl moiety in the above formula (1) are provided at the ends of the molecular chains, respectively. The amount of the silane compound used is 0.8 to 1.2 equivalents, more preferably 0.9 to 1.1 equivalents, and more preferably 0.9 to 1.1 equivalents, relative to 1 equivalent of the compound having a hydroxyl group and at least two olefin moieties (eg, an alkenyl group). Preferably, about 1 equivalent can be used.
上記式(4a)、(4b)、(4c)、(4d)及び(4e)で表されるシラン化合物の調製において、脱水素化反応触媒としては、例えば、ロジウム、パラジウム、ルテニウム等の白金族金属系触媒やホウ素触媒などを用いることができ、具体的には、テトラキス(トリフェニルホスフィン)パラジウム、クロロトリス(トリフェニルホスフィン)ロジウム等の白金族金属系触媒、トリス(ペンタフルオロフェニル)ボラン等のホウ素触媒などが挙げられる。
脱水素化反応触媒の使用量は、式(4a)、(4b)、(4c)、(4d)及び(4e)で表されるシラン化合物を調製する際の水酸基と少なくとも2つのオレフィン部位(例えばアルケニル基)をそれぞれ有する化合物1当量に対して、0.01~0.0005当量、より好ましくは0.007~0.0003当量、更に好ましくは約0.001当量用いることができる。In the preparation of the silane compounds represented by the above formulas (4a), (4b), (4c), (4d) and (4e), the dehydrogenation reaction catalyst is, for example, a platinum group such as rhodium, palladium and ruthenium. Metallic catalysts, boron catalysts and the like can be used, and specifically, platinum group metal catalysts such as tetrakis (triphenylphosphine) palladium and chlorotris (triphenylphosphine) rhodium, tris (pentafluorophenyl) borane and the like. Examples include a boron catalyst.
The amount of the dehydrogenation reaction catalyst used is the hydroxyl group and at least two olefin moieties (eg, for example) in preparing the silane compounds represented by the formulas (4a), (4b), (4c), (4d) and (4e). 0.01 to 0.0005 equivalents, more preferably 0.007 to 0.0003 equivalents, and even more preferably about 0.001 equivalents can be used with respect to 1 equivalent of each compound having an alkenyl group).
上記式(4a)、(4b)、(4c)、(4d)及び(4e)で表されるシラン化合物の調製には有機溶剤を用いてもよい。用いられる有機溶剤としては、エーテル系溶剤(ジブチルエーテル、ジエチルエーテル、テトラヒドロフランなど)、炭化水素系溶剤(石油ベンジン、トルエン、キシレンなど)を例示することができる。これらの中では特にトルエンが好ましい。
有機溶剤の使用量は、上記式(4a)、(4b)、(4c)、(4d)及び(4e)で表されるシラン化合物を調製する際の水酸基と少なくとも2つのオレフィン部位(例えばアルケニル基)をそれぞれ有する化合物100質量部に対して、10~300質量部、好ましくは10~250質量部、更に好ましくは約200質量部用いることができる。An organic solvent may be used for the preparation of the silane compounds represented by the above formulas (4a), (4b), (4c), (4d) and (4e). Examples of the organic solvent used include ether solvents (dibutyl ether, diethyl ether, tetrahydrofuran, etc.) and hydrocarbon solvents (petroleum benzine, toluene, xylene, etc.). Of these, toluene is particularly preferred.
The amount of the organic solvent used is a hydroxyl group and at least two olefin moieties (for example, an alkenyl group) when preparing the silane compound represented by the above formulas (4a), (4b), (4c), (4d) and (4e). ) Can be used in an amount of 10 to 300 parts by mass, preferably 10 to 250 parts by mass, and more preferably about 200 parts by mass with respect to 100 parts by mass of the compound having ().
上記式(4a)、(4b)、(4c)、(4d)及び(4e)で表されるシラン化合物の調製にはフッ素系溶剤を添加してもよい。用いられるフッ素系溶剤としては、1,3-ビス(トリフルオロメチル)ベンゼン、トリフルオロメチルベンゼンなどの含フッ素芳香族炭化水素系溶剤、1,1,1,2,3,4,4,5,5,5-デカフルオロ-3-メトキシ-2-(トリフルオロメチル)ペンタンなどのハイドロフルオロエーテル(HFE)系溶剤(3M社製、商品名:Novecシリーズ)、完全フッ素化された化合物で構成されているパーフルオロ系溶剤(3M社製、商品名:フロリナートシリーズ)などが挙げられる。
フッ素系溶剤の使用量は、上記式(4a)、(4b)、(4c)、(4d)及び(4e)で表されるシラン化合物を調製する際の水酸基と少なくとも2つのオレフィン部位(例えばアルケニル基)をそれぞれ有する化合物100質量部に対して、10~300質量部、好ましくは30~100質量部、更に好ましくは約60質量部用いることができる。A fluorinated solvent may be added to the preparation of the silane compounds represented by the above formulas (4a), (4b), (4c), (4d) and (4e). As the fluorine-based solvent used, a fluorine-containing aromatic hydrocarbon solvent such as 1,3-bis (trifluoromethyl) benzene and trifluoromethylbenzene, 1,1,1,2,3,4,4,5 , 5,5-Decafluoro-3-methoxy-2- (trifluoromethyl) pentane and other hydrofluoroether (HFE) solvents (manufactured by 3M, trade name: Novec series), composed of completely fluorinated compounds Examples thereof include perfluorosolvents (manufactured by 3M, trade name: Florinate series).
The amount of the fluorine-based solvent used is the hydroxyl group and at least two olefin moieties (for example, alkenyl) when preparing the silane compounds represented by the above formulas (4a), (4b), (4c), (4d) and (4e). 10 to 300 parts by mass, preferably 30 to 100 parts by mass, and more preferably about 60 parts by mass can be used with respect to 100 parts by mass of each compound having a group).
続いて、反応を停止し、溶剤を留去することで、分子鎖末端に上記式(1)におけるAとフェニルジメチルシリル部位と少なくとも2つのオレフィン部位(例えばアルケニル基)を有する化合物が得られる。 Subsequently, the reaction is stopped and the solvent is distilled off to obtain a compound having A and a phenyldimethylsilyl moiety in the above formula (1) and at least two olefin moieties (for example, an alkenyl group) at the end of the molecular chain.
ここで、上記分子中にSiH基及び加水分解性末端基を有する有機ケイ素化合物としては、下記一般式(7)~(10)で表される化合物が好ましい。
このような分子中にSiH基及び加水分解性末端基を有する有機ケイ素化合物としては、例えば、トリメトキシシラン、トリエトキシシラン、トリプロポキシシラン、トリイソプロポキシシラン、トリブトキシシラン、トリイソプロペノキシシラン、トリアセトキシシラン、トリクロロシラン、トリブロモシラン、トリヨードシラン、また以下のようなシランが挙げられる。
上記式(1)において、分子中にSiH基及び加水分解性末端基を有する有機ケイ素化合物の使用量は、分子鎖末端に上記式(1)におけるAとフェニルジメチルシリル部位と少なくとも2つのオレフィン部位(例えばアルケニル基)を有する化合物1当量に対して2~8当量、より好ましくは3~5当量、更に好ましくは約4当量用いることができる。 In the above formula (1), the amount of the organic silicon compound having a SiH group and a hydrolyzable terminal group in the molecule is such that A and the phenyldimethylsilyl moiety in the above formula (1) and at least two olefin moieties are used at the end of the molecular chain. 2 to 8 equivalents, more preferably 3 to 5 equivalents, and even more preferably about 4 equivalents can be used with respect to 1 equivalent of the compound having (for example, an alkenyl group).
上記式(1)で表される親油性基含有(加水分解性)オルガノシラン化合物の調製において、ヒドロシリル化反応触媒としては、白金黒、塩化白金酸、塩化白金酸のアルコール変性物、塩化白金酸とオレフィン、アルデヒド、ビニルシロキサン、アセチレンアルコール類等との錯体等、テトラキス(トリフェニルホスフィン)パラジウム、クロロトリス(トリフェニルホスフィン)ロジウム等の白金族金属系触媒が挙げられる。好ましくはビニルシロキサン配位化合物等の白金系化合物である。
ヒドロシリル化反応触媒の使用量は、分子鎖末端に上記式(1)におけるAとフェニルジメチルシリル部位と少なくとも2つのオレフィン部位(例えばアルケニル基)を有する化合物とトリメトキシシラン等の分子中にSiH基及び加水分解性末端基を有する有機ケイ素化合物の合計質量に対して、遷移金属換算(質量)で0.1~100ppm、より好ましくは0.5~50ppmとなる量で使用する。In the preparation of the lipophilic group-containing (hydrolytable) organosilane compound represented by the above formula (1), the hydrosilylation reaction catalyst includes platinum black, platinum chloride acid, an alcohol-modified product of platinum chloride acid, and platinum chloride acid. Examples thereof include platinum group metal catalysts such as tetrakis (triphenylphosphine) palladium and chlorotris (triphenylphosphine) rhodium, such as complexes of olefins, aldehydes, vinylsiloxanes, acetylene alcohols and the like. A platinum-based compound such as a vinylsiloxane coordinate compound is preferable.
The amount of the hydrosilylation reaction catalyst used is such that the compound having A and a phenyldimethylsilyl moiety in the above formula (1), at least two olefin moieties (for example, an alkenyl group) at the end of the molecular chain, and a SiH group in a molecule such as trimethoxysilane. And, with respect to the total mass of the organic silicon compound having a hydrolyzable terminal group, it is used in an amount of 0.1 to 100 ppm, more preferably 0.5 to 50 ppm in terms of transition metal (mass).
上記式(1)で表される親油性基含有(加水分解性)オルガノシラン化合物の調製には有機溶剤を用いてもよい。用いられる有機溶剤としては、エーテル系溶剤(ジブチルエーテル、ジエチルエーテル、テトラヒドロフランなど)、炭化水素系溶剤(石油ベンジン、トルエン、キシレンなど)を例示することができる。これらの中では特にトルエンが好ましい。
有機溶剤の使用量は、分子鎖末端に上記式(1)におけるAとフェニルジメチルシリル部位と少なくとも2つのオレフィン部位(例えばアルケニル基)を有する化合物100質量部に対して、10~300質量部、好ましくは15~100質量部、更に好ましくは約20質量部用いることができる。An organic solvent may be used for the preparation of the lipophilic group-containing (hydrolyzable) organosilane compound represented by the above formula (1). Examples of the organic solvent used include ether solvents (dibutyl ether, diethyl ether, tetrahydrofuran, etc.) and hydrocarbon solvents (petroleum benzine, toluene, xylene, etc.). Of these, toluene is particularly preferred.
The amount of the organic solvent used is 10 to 300 parts by mass with respect to 100 parts by mass of the compound having A and a phenyldimethylsilyl moiety in the above formula (1) and at least two olefin moieties (for example, an alkenyl group) at the end of the molecular chain. It can be preferably used in an amount of 15 to 100 parts by mass, more preferably about 20 parts by mass.
続いて、反応を停止し、溶剤及び未反応成分を留去することで、上記式(1)で表される親油性基含有(加水分解性)オルガノシラン化合物が得られる。 Subsequently, the reaction is stopped and the solvent and the unreacted component are distilled off to obtain a lipophilic group-containing (hydrolyzable) organosilane compound represented by the above formula (1).
例えば、分子鎖末端に上記式(1)におけるAとフェニルジメチルシリル部位と少なくとも2つのオレフィン部位(例えばアルケニル基)を有する化合物として、下記式で表される化合物
上記式(1)で表される親油性基含有(加水分解性)オルガノシラン化合物は、その特定の分子構造に由来して、JIS K 0062に準じて測定した屈折率が1.45以上、特に1.46~1.52であるため、該屈折率が1.45以上、特に1.46~1.52の硬化被膜を形成することができるものであるが、一方、皮脂の屈折率は通常、約1.5程度であるので、該親油性基含有(加水分解性)オルガノシラン化合物の硬化被膜の屈折率を皮脂の屈折率により近づけることで皮脂を目立たなくすることができる。 The lipophilic group-containing (hydrolytable) organosilane compound represented by the above formula (1) is derived from its specific molecular structure and has a refractive index of 1.45 or more, particularly measured according to JIS K0062. Since it is 1.46 to 1.52, it is possible to form a cured film having a refractive index of 1.45 or more, particularly 1.46 to 1.52, whereas the refractive index of sebum is usually 1.46 to 1.52. Since it is about 1.5, the refractive index of the cured film of the lipophilic group-containing (hydrolytable) organosilane compound can be made inconspicuous by making the refractive index closer to the refractive index of the sebum.
本発明は、更に上記親油性基含有(加水分解性)オルガノシラン化合物及び/又はその部分(加水分解)縮合物を含有する表面処理剤を提供する。該表面処理剤は、親油性基含有(加水分解性)オルガノシラン化合物を1種単独で用いても、2種以上を組み合わせて用いてもよく、また、該親油性基含有オルガノシラン化合物の水酸基を部分的に縮合させて得られる部分縮合物、又は該親油性基含有加水分解性オルガノシラン化合物の末端加水分解性基を予め公知の方法により部分的に加水分解した水酸基を縮合させて得られる部分加水分解縮合物を1種単独で用いても、2種以上を組み合わせて用いてもよく、更に、親油性基含有(加水分解性)オルガノシラン化合物と部分縮合物又は部分加水分解縮合物とを組み合わせて用いてもよい。 The present invention further provides a surface treatment agent containing the lipophilic group-containing (hydrolyzable) organosilane compound and / or a moiety thereof (hydrolyzed) condensate. The surface treatment agent may use one type of the lipophilic group-containing (hydrolyzable) organosilane compound alone or a combination of two or more thereof, and the hydroxyl group of the lipophilic group-containing organosilane compound. Is obtained by partially condensing a hydroxyl group obtained by partially hydrolyzing a terminal hydrolyzable group of the oil-based group-containing hydrolyzable organosilane compound or a partially hydrolyzed product obtained by partially condensing the above. The partially hydrolyzed condensate may be used alone or in combination of two or more, and further, an oil-based group-containing (hydrolyzable) organosilane compound and a partially condensate or a partially hydrolyzed condensate. May be used in combination.
該表面処理剤は、適当な溶剤を含んでもよい。このような溶剤としては、アルコール系溶剤(プロピレングリコールモノメチルエーテル、ブタノール、イソプロパノールなど)、エーテル系溶剤(ジブチルエーテル、ジエチルエーテル、テトラヒドロフランなど)、炭化水素系溶剤(石油ベンジン、トルエン、キシレンなど)、ケトン系溶剤(アセトン、メチルエチルケトン、メチルイソブチルケトンなど)を例示することができる。これらの中では、溶解性、濡れ性などの点で、アルコール系溶剤、エーテル系溶剤が望ましく、特には、プロピレングリコールモノメチルエーテル、ジブチルエーテルが好ましい。 The surface treatment agent may contain a suitable solvent. Examples of such a solvent include alcohol solvents (propylene glycol monomethyl ether, butanol, isopropanol, etc.), ether solvents (dibutyl ether, diethyl ether, tetrahydrofuran, etc.), hydrocarbon solvents (petroleum benzine, toluene, xylene, etc.), and the like. A ketone solvent (acetone, methyl ethyl ketone, methyl isobutyl ketone, etc.) can be exemplified. Among these, alcohol-based solvents and ether-based solvents are preferable from the viewpoint of solubility, wettability and the like, and propylene glycol monomethyl ether and dibutyl ether are particularly preferable.
上記溶剤は、その2種以上を混合してもよく、親油性基含有(加水分解性)オルガノシラン化合物及びその部分(加水分解)縮合物を均一に溶解させることが好ましい。なお、溶剤に溶解させる親油性基含有(加水分解性)オルガノシラン化合物及びその部分(加水分解)縮合物の最適濃度は、処理方法により異なり、秤量し易い量であればよいが、直接塗工する場合は、溶剤及び親油性基含有(加水分解性)オルガノシラン化合物(及びその部分(加水分解)縮合物)の合計100質量部に対して0.01~10質量部、特に0.05~5質量部であることが好ましく、蒸着処理をする場合は、溶剤及び親油性基含有(加水分解性)オルガノシラン化合物(及びその部分(加水分解)縮合物)の合計100質量部に対して1~100質量部、特に3~30質量部であることが好ましく、ウェット処理する場合は、溶剤及び親油性基含有(加水分解性)オルガノシラン化合物(及びその部分(加水分解)縮合物)の合計100質量部に対して0.01~10質量部、特に0.05~1質量部であることが好ましい。 The solvent may be a mixture of two or more thereof, and it is preferable to uniformly dissolve the lipophilic group-containing (hydrolyzable) organosilane compound and its partial (hydrolyzable) condensate. The optimum concentration of the lipophilic group-containing (hydrolyzable) organosilane compound to be dissolved in the solvent and its partial (hydrolyzable) condensate varies depending on the treatment method and may be an amount that is easy to weigh, but direct coating is applied. In this case, 0.01 to 10 parts by mass, particularly 0.05 to 10 parts by mass with respect to a total of 100 parts by mass of the solvent and the (hydrolyzable) organosilane compound containing the lipophilic group (and its portion (hydrolyzed) condensate). It is preferably 5 parts by mass, and in the case of vapor deposition treatment, 1 part with respect to a total of 100 parts by mass of the solvent and the lipophilic group-containing (hydrolyzable) organosilane compound (and its part (hydrolyzed) condensate). It is preferably up to 100 parts by mass, particularly preferably 3 to 30 parts by mass, and in the case of wet treatment, the total amount of the solvent and the lipophilic group-containing (hydrolyzable) organosilane compound (and its portion (hydrolyzed) condensate). It is preferably 0.01 to 10 parts by mass, particularly preferably 0.05 to 1 part by mass with respect to 100 parts by mass.
表面処理剤には、加水分解縮合触媒、例えば、有機錫化合物(ジブチル錫ジメトキシド、ジラウリン酸ジブチル錫など)、有機チタン化合物(テトラn-ブチルチタネートなど)、有機酸(酢酸、メタンスルホン酸など)、無機酸(塩酸、硫酸、リン酸など)を添加してもよい。これらの中では、特に酢酸、テトラn-ブチルチタネート、ジラウリン酸ジブチル錫などが望ましい。
加水分解縮合触媒の添加量は、親油性基含有(加水分解性)オルガノシラン化合物及び/又はその部分(加水分解)縮合物100質量部に対して0.1~150質量部、特に25~125質量部であることが好ましく、更に50~110質量部であることが好ましい。Surface treatment agents include hydrolysis condensation catalysts such as organic tin compounds (dibutyltin dimethoxydo, dibutyltin dilaurate, etc.), organic titanium compounds (tetra n-butyl titanate, etc.), organic acids (acetic acid, methanesulfonic acid, etc.). , Inorganic acids (hydrochloric acid, sulfuric acid, phosphoric acid, etc.) may be added. Among these, acetic acid, tetra n-butyl titanate, dibutyltin dilaurate and the like are particularly desirable.
The amount of the hydrolysis condensation catalyst added is 0.1 to 150 parts by mass, particularly 25 to 125 parts by mass with respect to 100 parts by mass of the lipophilic group-containing (hydrolyzable) organosilane compound and / or its part (hydrolyzed) condensate. It is preferably parts by mass, and more preferably 50 to 110 parts by mass.
本発明の表面処理剤は、刷毛塗り、ディッピング、スプレー、蒸着処理など公知の方法で基材に施与することができる。蒸着処理時の加熱方法は、抵抗加熱方式でも、電子ビーム加熱方式のどちらでもよく、特に限定されるものではない。また、硬化温度は、硬化方法によって異なるが、例えば、直接塗工(刷毛塗り、ディッピング、スプレー等)の場合は、25~200℃、特に25~150℃にて15分~36時間、特に30分~24時間とすることが好ましい。加湿下で硬化させてもよい。また、蒸着処理で施与する場合は、20~200℃の範囲が望ましい。加湿下で硬化させてもよい。硬化被膜の膜厚は、基材の種類により適宜選定されるが、通常0.1~100nm、特に1~20nmである。また、例えばスプレー塗工では予め水分を添加した有機溶剤に希釈し、加水分解、つまりSi-OHを生成させた後にスプレー塗工すると塗工後の硬化が速い。 The surface treatment agent of the present invention can be applied to a substrate by a known method such as brush coating, dipping, spraying, and vapor deposition treatment. The heating method during the vapor deposition treatment may be either a resistance heating method or an electron beam heating method, and is not particularly limited. The curing temperature varies depending on the curing method, but for example, in the case of direct coating (brush coating, dipping, spraying, etc.), it is 25 to 200 ° C., particularly 25 to 150 ° C. for 15 minutes to 36 hours, particularly 30. It is preferably minutes to 24 hours. It may be cured under humidification. Further, when it is applied by thin film deposition treatment, the range of 20 to 200 ° C. is desirable. It may be cured under humidification. The film thickness of the cured film is appropriately selected depending on the type of the substrate, but is usually 0.1 to 100 nm, particularly 1 to 20 nm. Further, for example, in spray coating, if the mixture is diluted with an organic solvent to which water has been added in advance and hydrolyzed, that is, Si—OH is generated and then spray coated, the curing after coating is fast.
本発明の表面処理剤は、接触角計Drop Master(協和界面科学社製)を用いて測定した、25℃、相対湿度40%におけるオレイン酸に対する接触角が、好ましくは30°以下、より好ましくは25°以下である硬化被膜を形成することができる。従って、皮脂が付着した場合、接触角が小さく、視認性が低くなり、指紋が目立たない。この際、オレイン酸接触角は経時で変化し、40秒後には一定値に収まるので、本発明においては40秒後の数値をオレイン酸接触角としている。 The surface treatment agent of the present invention has a contact angle with respect to oleic acid at 25 ° C. and a relative humidity of 40% measured using a contact angle meter Drop Master (manufactured by Kyowa Interface Science Co., Ltd.), preferably 30 ° or less, more preferably. A cured film having a temperature of 25 ° or less can be formed. Therefore, when sebum adheres, the contact angle is small, the visibility is low, and the fingerprint is inconspicuous. At this time, the oleic acid contact angle changes with time and stays at a constant value after 40 seconds. Therefore, in the present invention, the value after 40 seconds is used as the oleic acid contact angle.
本発明の表面処理剤は、1kg荷重で皮脂を付着させた際の、ヘーズメーターNDH5000(日本電色工業社製)を用いて測定したヘーズが10以下、より好ましくは7以下である硬化被膜を形成することができる。従って、皮脂が付着した場合、ヘーズが小さく、視認性が低くなり、指紋が目立たない。 The surface treatment agent of the present invention has a cured film having a haze of 10 or less, more preferably 7 or less, measured with a haze meter NDH5000 (manufactured by Nippon Denshoku Kogyo Co., Ltd.) when sebum is attached under a load of 1 kg. Can be formed. Therefore, when sebum adheres, the haze is small, the visibility is low, and the fingerprint is inconspicuous.
本発明の表面処理剤は、ラビングテスター(新東科学社製)を用いて、下記条件で2,000回擦った後の硬化被膜の水に対する接触角(撥水性)が50°以上である硬化被膜を形成することができる。従って、指で硬化被膜を擦った際の硬化被膜の耐久性を維持することができる。
耐消しゴム摩耗性
消しゴム:Minoan社製
接触面積:6mmφ
移動距離(片道):30mm
移動速度:3,600mm/分
荷重:1kg/6mmφThe surface treatment agent of the present invention is cured by using a rubbing tester (manufactured by Shinto Kagaku Co., Ltd.) and has a cured coating having a contact angle (water repellency) of 50 ° or more with respect to water after being rubbed 2,000 times under the following conditions. A film can be formed. Therefore, the durability of the cured film when the cured film is rubbed with a finger can be maintained.
Eraser wear resistance
Eraser: Minoan contact area: 6 mmφ
Travel distance (one way): 30 mm
Moving speed: 3,600 mm / min Load: 1 kg / 6 mmφ
本発明の表面処理剤で処理される基材は特に制限されず、紙、布、金属及びその酸化物、ガラス、プラスチック、セラミック、石英など各種材質のものであってよい。本発明の表面処理剤は、前記基材に親油性を付与することができる。特に、SiO2処理されたガラスやフイルムの表面処理剤として好適に使用することができる。The base material treated with the surface treatment agent of the present invention is not particularly limited, and may be made of various materials such as paper, cloth, metal and oxides thereof, glass, plastic, ceramic, and quartz. The surface treatment agent of the present invention can impart lipophilicity to the substrate. In particular, it can be suitably used as a surface treatment agent for SiO 2 treated glass or film.
本発明の表面処理剤で処理される物品としては、カーナビゲーション、携帯電話、スマートフォン、デジタルカメラ、デジタルビデオカメラ、PDA、ポータブルオーディオプレーヤー、カーオーディオ、ゲーム機器、眼鏡レンズ、カメラレンズ、レンズフィルター、サングラス、胃カメラ等の医療用器機、複写機、PC、液晶ディスプレイ、有機ELディスプレイ、プラズマディスプレイ、タッチパネルディスプレイ、保護フイルム、反射防止フイルムなどの光学物品が挙げられる。本発明の表面処理剤は、前記物品に指紋及び皮脂が付着しても視認しづらく、特にタッチパネルディスプレイ、反射防止フイルムなどの親油層として有用である。 Articles treated with the surface treatment agent of the present invention include car navigation systems, mobile phones, smartphones, digital cameras, digital video cameras, PDAs, portable audio players, car audio systems, game devices, eyeglass lenses, camera lenses, lens filters, and the like. Examples include optical articles such as sunglasses, medical devices such as gastrocameras, copying machines, PCs, liquid crystal displays, organic EL displays, plasma displays, touch panel displays, protective films, and antireflection films. The surface treatment agent of the present invention is difficult to visually recognize even if fingerprints and sebum adhere to the article, and is particularly useful as a base oil layer for touch panel displays, antireflection films, and the like.
本発明の表面処理剤にて表面処理された物品は、該物品の基材表面のJIS K 0062に基づく屈折率を1.45以上、好ましくは1.45~1.52、特に1.47~1.50とすることができるため、指紋低視認性に優れるものとなる。 The article surface-treated with the surface treatment agent of the present invention has a refractive index of 1.45 or more, preferably 1.45 to 1.52, particularly 1.47 to 1.47 to 1.52 based on JIS K 0062 of the substrate surface of the article. Since it can be set to 1.50, the fingerprint has excellent low visibility.
以下、実施例及び比較例を示し、本発明をより詳細に説明するが、本発明は下記実施例によって限定されるものではない。 Hereinafter, the present invention will be described in more detail with reference to Examples and Comparative Examples, but the present invention is not limited to the following Examples.
[実施例1]
反応容器に入れた1,4-ビス(ジメチルシリル)ベンゼン45.7g(2.35×10-1mol)を80℃まで加熱した。続いて、塩化白金酸/ビニルシロキサン錯体のトルエン溶液1.0×10-2g(Pt単体として6.4×10-7molを含有)を添加した後、ウンデセン酸エチル10.0g(4.71×10-2mol)を3時間かけて滴下し、80℃にて3時間加熱撹拌した。その後、溶剤及び未反応物を減圧留去することで、下記式(A)
45.7 g (2.35 × 10 -1 mol) of 1,4-bis (dimethylsilyl) benzene in the reaction vessel was heated to 80 ° C. Subsequently, 1.0 × 10-2 g (containing 6.4 × 10 -7 mol of Pt alone) of a toluene solution of chloroplatinic acid / vinylsiloxane complex was added, and then 10.0 g of ethyl undecenoate (4. 71 × 10 −2 mol) was added dropwise over 3 hours, and the mixture was heated and stirred at 80 ° C. for 3 hours. Then, the solvent and the unreacted substance are distilled off under reduced pressure to obtain the following formula (A).
1H-NMR
δ0.2-0.4(-Si-CH
3 )12H
δ0.7(-(CH2)7CH
2 -Si-)2H
δ1.2-1.5(-(CH
2 )7-,-OCH2CH
3 )17H
δ1.6(-OOC-CH2CH
2 (CH2)7CH2-Si-)2H
δ2.3(-OOC-CH
2 -)2H
δ4.1(-OCH
2 CH3)2H
δ4.4(-Si-H)1H
δ7.5(-Si-C6
H
4 -Si-)4H 1 1 H-NMR
δ0.2-0.4 (-Si-C H 3 ) 12H
δ0.7 (-( CH 2 ) 7 CH 2 -Si-) 2H
δ1.2-1.5 (-( CH 2 ) 7- , -OCH 2 CH 3 ) 17H
δ1.6 (-OOC- CH 2 CH 2 (CH 2 ) 7 CH 2 -Si-) 2H
δ2.3 (-OOC-C H 2- ) 2H
δ4.1 (-OC H 2 CH 3 ) 2H
δ4.4 (-Si-H) 1H
δ7.5 (-Si- C 6H 4 -Si-) 4H
反応容器に入れたアリルマグネシウムクロリド948ml(9.48×10-1mol:1M/THF(テトラヒドロフラン)溶液)を8℃まで冷却した。続いてTHF100gで希釈したオクタン酸メチル50g(3.16×10-1mol)を滴下し、室温(25℃)で4時間撹拌した。その後、2.4M塩酸水溶液500g中へ溶液を滴下し、反応を停止させた。分液操作により、上層である有機層を回収後、減圧下、残存溶剤を留去することで、下記式(B)
1H-NMR
δ0.8-0.9(-CH2-(CH2)5-CH
3 )3H
δ1.2-1.3(-CH2-(CH
2 )5-CH3)10H
δ1.4-1.5(-CH
2 -(CH2)5-CH3)2H
δ2.2((-CH
2 -CH=CH2)2)4H
δ5.1((-CH2-CH=CH
2 )2)4H
δ5.8((-CH2-CH=CH2)2)2H 1 1 H-NMR
δ0.8-0.9 (-CH 2- (CH 2 ) 5 - CH 3 ) 3H
δ1.2-1.3 (-CH 2- ( CH 2 ) 5 -CH 3 ) 10H
δ1.4-1.5 (-CH 2- (CH 2 ) 5 - CH 3 ) 2H
δ2.2 ((-CH 2 - CH = CH 2 ) 2 ) 4H
δ5.1 ((-CH 2 -CH = CH 2 ) 2 ) 4H
δ5.8 ((-CH 2 - CH = CH 2 ) 2 ) 2H
反応容器に、下記式(B)
1H-NMR
δ0.2-0.4(-Si-CH
3 )12H
δ0.7(-(CH2)7CH
2 -Si-)2H
δ0.8-0.9(-CH2-(CH2)5-CH
3 )3H
δ1.1-1.3(-(CH
2 )7-,-OCH2CH
3 ,-CH2-(CH
2 )5-CH3)27H
δ1.4-1.5(-CH
2 -(CH
2 )5-CH3)2H
δ1.6(-OOC-CH2CH
2 (CH2)7CH2-Si-)2H
δ2.2-2.3((-CH
2 -CH=CH2)2,-OOC-CH
2 -)6H
δ4.1(-OCH
2 CH3)2H
δ5.0((-CH2-CH=CH
2 )2)4H
δ5.8((-CH2-CH=CH2)2)2H
δ7.5(-Si-C6
H
4 -Si-)4H 1 1 H-NMR
δ0.2-0.4 (-Si-C H 3 ) 12H
δ0.7 (-( CH 2 ) 7 CH 2 -Si-) 2H
δ0.8-0.9 (-CH 2- (CH 2 ) 5 - CH 3 ) 3H
δ1.1-1.3 (-( CH 2 ) 7- , -OCH 2 CH 3 , -CH 2- ( CH 2 ) 5 -CH 3 ) 27H
δ1.4-1.5 (-CH 2- (CH 2 ) 5 - CH 3 ) 2H
δ1.6 (-OOC- CH 2 CH 2 (CH 2 ) 7 CH 2 -Si-) 2H
δ2.2-2.3 ((-C H 2 -CH = CH 2 ) 2 , -OOC-C H 2- ) 6H
δ4.1 (-OC H 2 CH 3 ) 2H
δ5.0 ((-CH 2 -CH = CH 2 ) 2 ) 4H
δ5.8 ((-CH 2 - CH = CH 2 ) 2 ) 2H
δ7.5 (-Si- C 6H 4 -Si-) 4H
反応容器に、下記式(C)
得られた化合物は、1H-NMRにより下記式(D)で示される親油性基含有加水分解性オルガノシラン化合物1であることが確認された。
δ0.2-0.4(-Si-CH
3 )12H
δ0.5(-CH2CH2CH
2 -Si(-OCH3)3)4H
δ0.7(-(CH2)7CH
2 -Si-)2H
δ0.8-0.9(-CH2-(CH2)5-CH
3 )3H
δ1.1-1.5(-(CH
2 )7-,-OCH2CH
3 ,-CH
2 -(CH
2 )5-CH3,-CH
2 CH
2 CH2-Si(-OCH3)3)37H
δ1.6(-OOC-CH2CH
2 (CH2)7CH2-Si-)2H
δ2.2-2.3(-OOC-CH
2 -)2H
δ3.5(-CH2CH2CH2-Si(-OCH
3 )3)18H
δ4.1(-OCH
2 CH3)2H
δ7.5(-Si-C6
H
4 -Si-)4Hδ0.2-0.4 (-Si-C H 3 ) 12H
δ0.5 (-CH 2 CH 2 CH 2 -Si (-OCH 3 ) 3 ) 4H
δ0.7 (-( CH 2 ) 7 CH 2 -Si-) 2H
δ0.8-0.9 (-CH 2- (CH 2 ) 5 - CH 3 ) 3H
δ1.1-1.5 (-(CH 2 ) 7- , -OCH 2 CH 3 , -CH 2- ( CH 2 ) 5 - CH 3 , -C H 2 CH 2 CH 2 - Si (-OCH 3 ) 3 ) 37H
δ1.6 (-OOC- CH 2 CH 2 (CH 2 ) 7 CH 2 -Si-) 2H
δ2.2-2.3 (-OOC-C H 2- ) 2H
δ3.5 (-CH 2 CH 2 CH 2 -Si (-OC H 3 ) 3 ) 18H
δ4.1 (-OC H 2 CH 3 ) 2H
δ7.5 (-Si- C 6H 4 -Si-) 4H
[実施例2]
反応容器に入れたアリルマグネシウムクロリド805ml(8.05×10-1mol:1M/THF溶液)を8℃まで冷却した。続いてTHF100gで希釈したデカン酸メチル50g(2.68×10-1mol)を滴下し、室温で4時間撹拌した。その後、2.4M塩酸水溶液500g中へ溶液を滴下し、反応を停止させた。分液操作により、上層である有機層を回収後、減圧下、残存溶剤を留去することで、下記式(E)
805 ml of allylmagnesium chloride (8.05 × 10 -1 mol: 1 M / THF solution) placed in a reaction vessel was cooled to 8 ° C. Subsequently, 50 g (2.68 × 10 -1 mol) of methyl decanoate diluted with 100 g of THF was added dropwise, and the mixture was stirred at room temperature for 4 hours. Then, the solution was added dropwise to 500 g of a 2.4 M hydrochloric acid aqueous solution to stop the reaction. After recovering the organic layer, which is the upper layer, by the liquid separation operation, the residual solvent is distilled off under reduced pressure to obtain the following formula (E).
1H-NMR
δ0.8-0.9(-CH2-(CH2)7-CH
3 )3H
δ1.2-1.3(-CH2-(CH
2 )7-CH3)14H
δ1.4-1.5(-CH
2 -(CH2)7-CH3)2H
δ2.2((-CH
2 -CH=CH2)2)4H
δ5.1((-CH2-CH=CH
2 )2)4H
δ5.8((-CH2-CH=CH2)2)2H 1 1 H-NMR
δ0.8-0.9 (-CH 2- (CH 2 ) 7 - CH 3 ) 3H
δ1.2-1.3 (-CH 2- ( CH 2 ) 7 -CH 3 ) 14H
δ1.4-1.5 (-CH 2- (CH 2 ) 7 - CH 3 ) 2H
δ2.2 ((-CH 2 - CH = CH 2 ) 2 ) 4H
δ5.1 ((-CH 2 -CH = CH 2 ) 2 ) 4H
δ5.8 ((-CH 2 - CH = CH 2 ) 2 ) 2H
反応容器に、下記式(E)
1H-NMR
δ0.2-0.4(-Si-CH
3 )12H
δ0.7(-(CH2)7CH
2 -Si-)2H
δ0.8-0.9(-CH2-(CH2)7-CH
3 )3H
δ1.1-1.3(-(CH
2 )7-,-OCH2CH
3 ,-CH2-(CH
2 )7-CH3)31H
δ1.4-1.5(-CH
2 -(CH
2 )7-CH3)2H
δ1.6(-OOC-CH2CH
2 (CH2)7CH2-Si-)2H
δ2.2-2.3((-CH
2 -CH=CH2)2,-OOC-CH
2 -)6H
δ4.1(-OCH
2 CH3)2H
δ5.0((-CH2-CH=CH
2 )2)4H
δ5.8((-CH2-CH=CH2)2)2H
δ7.5(-Si-C6
H
4 -Si-)4H 1 1 H-NMR
δ0.2-0.4 (-Si-C H 3 ) 12H
δ0.7 (-( CH 2 ) 7 CH 2 -Si-) 2H
δ0.8-0.9 (-CH 2- (CH 2 ) 7 - CH 3 ) 3H
δ1.1-1.3 (-( CH 2 ) 7- , -OCH 2 CH 3 , -CH 2- ( CH 2 ) 7 -CH 3 ) 31H
δ1.4-1.5 (-CH 2- (CH 2 ) 7 - CH 3 ) 2H
δ1.6 (-OOC- CH 2 CH 2 (CH 2 ) 7 CH 2 -Si-) 2H
δ2.2-2.3 ((-C H 2 -CH = CH 2 ) 2 , -OOC-C H 2- ) 6H
δ4.1 (-OC H 2 CH 3 ) 2H
δ5.0 ((-CH 2 -CH = CH 2 ) 2 ) 4H
δ5.8 ((-CH 2 - CH = CH 2 ) 2 ) 2H
δ7.5 (-Si- C 6H 4 -Si-) 4H
反応容器に、下記式(F)
得られた化合物は、1H-NMRにより下記式(G)で示される親油性基含有加水分解性オルガノシラン化合物2であることが確認された。
δ0.2-0.4(-Si-CH
3 )12H
δ0.5(-CH2CH2CH
2 -Si(-OCH3)3)4H
δ0.7(-(CH2)7CH
2 -Si-)2H
δ0.8-0.9(-CH2-(CH2)7-CH
3 )3H
δ1.1-1.5(-(CH
2 )7-,-OCH2CH
3 ,-CH
2 -(CH
2 )7-CH3,-CH
2 CH
2 CH2-Si(-OCH3)3)41H
δ1.6(-OOC-CH2CH
2 (CH2)7CH2-Si-)2H
δ2.2-2.3(-OOC-CH
2 -)2H
δ3.5(-CH2CH2CH2-Si(-OCH
3 )3)18H
δ4.1(-OCH
2 CH3)2H
δ7.5(-Si-C6
H
4 -Si-)4Hδ0.2-0.4 (-Si-C H 3 ) 12H
δ0.5 (-CH 2 CH 2 CH 2 -Si (-OCH 3 ) 3 ) 4H
δ0.7 (-( CH 2 ) 7 CH 2 -Si-) 2H
δ0.8-0.9 (-CH 2- (CH 2 ) 7 - CH 3 ) 3H
δ1.1-1.5 (-(CH 2 ) 7- , -OCH 2 CH 3 , -CH 2- ( CH 2 ) 7 - CH 3 , -C H 2 CH 2 CH 2 - Si (-OCH 3 ) 3 ) 41H
δ1.6 (-OOC- CH 2 CH 2 (CH 2 ) 7 CH 2 -Si-) 2H
δ2.2-2.3 (-OOC-C H 2- ) 2H
δ3.5 (-CH 2 CH 2 CH 2 -Si (-OC H 3 ) 3 ) 18H
δ4.1 (-OC H 2 CH 3 ) 2H
δ7.5 (-Si- C 6H 4 -Si-) 4H
[実施例3]
反応容器に入れたアリルマグネシウムクロリド300ml(3.00×10-1mol:1M/THF溶液)を8℃まで冷却した。続いてTHF30gで希釈したフェニル酢酸メチル15g(1.00×10-1mol)を滴下し、室温で4時間撹拌した。その後、2.4M塩酸水溶液200g中へ溶液を滴下し、反応を停止させた。分液操作により、上層である有機層を回収後、減圧下、残存溶剤を留去することで、下記式(H)
300 ml of allylmagnesium chloride (3.00 × 10 -1 mol: 1 M / THF solution) placed in the reaction vessel was cooled to 8 ° C. Subsequently, 15 g (1.00 × 10 -1 mol) of methyl phenylacetate diluted with 30 g of THF was added dropwise, and the mixture was stirred at room temperature for 4 hours. Then, the solution was added dropwise to 200 g of a 2.4 M hydrochloric acid aqueous solution to stop the reaction. After recovering the organic layer, which is the upper layer, by the liquid separation operation, the residual solvent is distilled off under reduced pressure to obtain the following formula (H).
1H-NMR
δ2.2((-CH
2 -CH=CH2)2)4H
δ2.8(-CH
2 -C6H5)2H
δ5.1((-CH2-CH=CH
2 )2)4H
δ5.9((-CH2-CH=CH2)2)2H
δ7.2-7.3(-CH2-C6
H
5 )5H 1 1 H-NMR
δ2.2 ((-CH 2 - CH = CH 2 ) 2 ) 4H
δ2.8 (-C H 2 -C 6 H 5 ) 2H
δ5.1 ((-CH 2 -CH = CH 2 ) 2 ) 4H
δ5.9 ((-CH 2 - CH = CH 2 ) 2 ) 2H
δ7.2-7.3 (-CH 2 -C 6 H 5 ) 5H
反応容器に、下記式(H)
1H-NMR
δ0.2-0.4(-Si-CH
3 )12H
δ0.7(-(CH2)7CH
2 -Si-)2H
δ1.1-1.3(-(CH
2 )7-,-OCH2CH
3 )17H
δ1.6(-OOC-CH2CH
2 (CH2)7CH2-Si-)2H
δ2.2-2.3((-CH
2 -CH=CH2)2,-OOC-CH
2 -)6H
δ2.8(-CH
2 -C6H5)2H
δ4.1(-OCH
2 CH3)2H
δ5.1((-CH2-CH=CH
2 )2)4H
δ5.8((-CH2-CH=CH2)2)2H
δ7.2-7.3(-CH2-C6
H
5 )5H
δ7.5(-Si-C6
H
4 -Si-)4H 1 1 H-NMR
δ0.2-0.4 (-Si-C H 3 ) 12H
δ0.7 (-( CH 2 ) 7 CH 2 -Si-) 2H
δ1.1-1.3 (-( CH 2 ) 7- , -OCH 2 CH 3 ) 17H
δ1.6 (-OOC- CH 2 CH 2 (CH 2 ) 7 CH 2 -Si-) 2H
δ2.2-2.3 ((-C H 2 -CH = CH 2 ) 2 , -OOC-C H 2- ) 6H
δ2.8 (-C H 2 -C 6 H 5 ) 2H
δ4.1 (-OC H 2 CH 3 ) 2H
δ5.1 ((-CH 2 -CH = CH 2 ) 2 ) 4H
δ5.8 ((-CH 2 - CH = CH 2 ) 2 ) 2H
δ7.2-7.3 (-CH 2 -C 6 H 5 ) 5H
δ7.5 (-Si- C 6H 4 -Si-) 4H
反応容器に、下記式(I)
得られた化合物は、1H-NMRにより下記式(J)で示される親油性基含有加水分解性オルガノシラン化合物3であることが確認された。
δ0.2-0.4(-Si-CH
3 )12H
δ0.5(-CH2CH2CH
2 -Si(-OCH3)3)4H
δ0.7(-(CH2)7CH
2 -Si-)2H
δ1.1-1.5(-(CH
2 )7-,-OCH2CH
3 ,-CH
2 CH
2 CH2-Si(-OCH3)3)25H
δ1.6(-OOC-CH2CH
2 (CH2)7CH2-Si-)2H
δ2.2-2.3(-OOC-CH
2 -)2H
δ2.8(-CH
2 -C6H5)2H
δ3.5(-CH2CH2CH2-Si(-OCH
3 )3)18H
δ4.1(-OCH
2 CH3)2H
δ7.2-7.3(-CH2-C6
H
5 )5H
δ7.4(-Si-C6
H
4 -Si-)4Hδ0.2-0.4 (-Si-C H 3 ) 12H
δ0.5 (-CH 2 CH 2 CH 2 -Si (-OCH 3 ) 3 ) 4H
δ0.7 (-( CH 2 ) 7 CH 2 -Si-) 2H
δ1.1-1.5 (-( CH 2 ) 7- , -OCH 2 CH 3 , -CH 2 CH 2 CH 2 - Si ( -OCH 3 ) 3 ) 25H
δ1.6 (-OOC- CH 2 CH 2 (CH 2 ) 7 CH 2 -Si-) 2H
δ2.2-2.3 (-OOC-C H 2- ) 2H
δ2.8 (-C H 2 -C 6 H 5 ) 2H
δ3.5 (-CH 2 CH 2 CH 2 -Si (-OC H 3 ) 3 ) 18H
δ4.1 (-OC H 2 CH 3 ) 2H
δ7.2-7.3 (-CH 2 -C 6 H 5 ) 5H
δ7.4 (-Si- C 6H 4 -Si-) 4H
[実施例4]
反応容器に入れたアリルマグネシウムクロリド422ml(4.22×10-1mol:1M/THF溶液)を8℃まで冷却した。続いてTHF30gで希釈した3-ブテン酸tert-ブチル20g(1.41×10-1mol)を滴下し、室温で4時間撹拌した。その後、2.4M塩酸水溶液250g中へ溶液を滴下し、反応を停止させた。分液操作により、上層である有機層を回収後、減圧下、残存溶剤を留去することで、下記式(K)
422 ml of allylmagnesium chloride (4.22 × 10 -1 mol: 1 M / THF solution) placed in the reaction vessel was cooled to 8 ° C. Subsequently, 20 g (1.41 × 10 -1 mol) of tert-butyl 3-butenoate diluted with 30 g of THF was added dropwise, and the mixture was stirred at room temperature for 4 hours. Then, the solution was added dropwise to 250 g of a 2.4 M hydrochloric acid aqueous solution to stop the reaction. After recovering the organic layer, which is the upper layer, by the liquid separation operation, the residual solvent is distilled off under reduced pressure to obtain the following formula (K).
1H-NMR
δ2.2((-CH
2 -CH=CH2)2)6H
δ5.1((-CH2-CH=CH
2 )2)6H
δ5.9((-CH2-CH=CH2)2)3H 1 1 H-NMR
δ2.2 ((-CH 2 - CH = CH 2 ) 2 ) 6H
δ5.1 ((-CH 2 -CH = CH 2 ) 2 ) 6H
δ5.9 ((-CH 2 - CH = CH 2 ) 2 ) 3H
反応容器に、下記式(K)
1H-NMR
δ0.2-0.4(-Si-CH
3 )12H
δ0.7(-(CH2)7CH
2 -Si-)2H
δ1.1-1.3(-(CH
2 )7-,-OCH2CH
3 )17H
δ1.6(-OOC-CH2CH
2 (CH2)7CH2-Si-)2H
δ2.2-2.3((-CH
2 -CH=CH2)2,-OOC-CH
2 -)8H
δ4.1(-OCH
2 CH3)2H
δ5.1((-CH2-CH=CH
2 )2)6H
δ5.8((-CH2-CH=CH2)2)3H
δ7.2-7.3(-CH2-C6
H
5 )5H
δ7.5(-Si-C6
H
4 -Si-)4H 1 1 H-NMR
δ0.2-0.4 (-Si-C H 3 ) 12H
δ0.7 (-( CH 2 ) 7 CH 2 -Si-) 2H
δ1.1-1.3 (-( CH 2 ) 7- , -OCH 2 CH 3 ) 17H
δ1.6 (-OOC- CH 2 CH 2 (CH 2 ) 7 CH 2 -Si-) 2H
δ2.2-2.3 ((-CH 2 - CH = CH 2 ) 2 , -OOC- CH 2- ) 8H
δ4.1 (-OC H 2 CH 3 ) 2H
δ5.1 ((-CH 2 -CH = CH 2 ) 2 ) 6H
δ5.8 ((-CH 2 - CH = CH 2 ) 2 ) 3H
δ7.2-7.3 (-CH 2 -C 6 H 5 ) 5H
δ7.5 (-Si- C 6H 4 -Si-) 4H
反応容器に、下記式(L)
得られた化合物は、1H-NMRにより下記式(M)で示される親油性基含有加水分解性オルガノシラン化合物4であることが確認された。
δ0.2-0.4(-Si-CH
3 )12H
δ0.5(-CH2CH2CH
2 -Si(-OCH3)3)6H
δ0.7(-(CH2)7CH
2 -Si-)2H
δ1.1-1.5(-(CH
2 )7-,-OCH2CH
3 ,-CH
2 CH
2 CH2-Si(-OCH3)3)29H
δ1.6(-OOC-CH2CH
2 (CH2)7CH2-Si-)2H
δ2.2-2.3(-OOC-CH
2 -)2H
δ3.5(-CH2CH2CH2-Si(-OCH
3 )3)27H
δ4.1(-OCH
2 CH3)2H
δ7.4(-Si-C6
H
4 -Si-)4Hδ0.2-0.4 (-Si-C H 3 ) 12H
δ0.5 (-CH 2 CH 2 CH 2 -Si (-OCH 3 ) 3 ) 6H
δ0.7 (-( CH 2 ) 7 CH 2 -Si-) 2H
δ1.1-1.5 (-( CH 2 ) 7- , -OCH 2 CH 3 , -CH 2 CH 2 CH 2 - Si ( -OCH 3 ) 3 ) 29H
δ1.6 (-OOC- CH 2 CH 2 (CH 2 ) 7 CH 2 -Si-) 2H
δ2.2-2.3 (-OOC-C H 2- ) 2H
δ3.5 (-CH 2 CH 2 CH 2 -Si (-OC H 3 ) 3 ) 27H
δ4.1 (-OC H 2 CH 3 ) 2H
δ7.4 (-Si- C 6H 4 -Si-) 4H
[実施例5]
反応容器に入れた1,4-ビス(ジメチルシリル)ベンゼン75.7g(3.90×10-1mol)を80℃まで加熱した。続いて、塩化白金酸/ビニルシロキサン錯体のトルエン溶液1.0×10-2g(Pt単体として6.4×10-7molを含有)を添加した後、4-ペンテン酸エチル10.0g(7.80×10-2mol)を3時間かけて滴下し、80℃にて3時間加熱撹拌した。その後、溶剤及び未反応物を減圧留去することで、下記式(N)
75.7 g (3.90 × 10 -1 mol) of 1,4-bis (dimethylsilyl) benzene in the reaction vessel was heated to 80 ° C. Subsequently, 1.0 × 10-2 g (containing 6.4 × 10 -7 mol of Pt alone) of a toluene solution of chloroplatinic acid / vinylsiloxane complex was added, and then 10.0 g of ethyl 4-penteneate (containing 10.0 × 10 -7 mol). 7.80 × 10 −2 mol) was added dropwise over 3 hours, and the mixture was heated and stirred at 80 ° C. for 3 hours. Then, the solvent and the unreacted substance are distilled off under reduced pressure to obtain the following formula (N).
1H-NMR
δ0.2-0.4(-Si-CH
3 )12H
δ0.7(-(CH2CH2CH2CH
2 -Si-)2H
δ1.2(-OCH2CH
3 )3H
δ1.3(-(CH2CH2CH
2 CH2-Si-)2H
δ1.6(-(CH2CH
2 CH2CH2-Si-)2H
δ2.3(-OOC-CH
2 -)2H
δ4.1(-OCH
2 CH3)2H
δ4.4(-Si-H)1H
δ7.5(-Si-C6
H
4 -Si-)4H 1 1 H-NMR
δ0.2-0.4 (-Si-C H 3 ) 12H
δ0.7 (-(CH 2 CH 2 CH 2 CH 2 - Si-) 2H
δ1.2 (-OCH 2 CH 3 ) 3H
δ1.3 (-(CH 2 CH 2 CH 2 CH 2 -Si-) 2H
δ1.6 (-( CH 2 CH 2 CH 2 CH 2 -Si-) 2H
δ2.3 (-OOC-C H 2- ) 2H
δ4.1 (-OC H 2 CH 3 ) 2H
δ4.4 (-Si-H) 1H
δ7.5 (-Si- C 6H 4 -Si-) 4H
反応容器に、下記式(B)
1H-NMR
δ0.2-0.4(-Si-CH
3 )12H
δ0.7(-(CH2)2CH
2 -Si-)2H
δ0.8-0.9(-CH2-(CH2)5-CH
3 )3H
δ1.1-1.3(-OOC-CH2CH2CH
2 CH2-Si-,-OCH2CH
3 ,-CH2-(CH
2 )5-CH3)15H
δ1.4-1.5(-CH
2 -(CH
2 )5-CH3)2H
δ1.6(-OOC-CH2CH
2 CH2CH2-Si-)2H
δ2.2-2.3((-CH
2 -CH=CH2)2,-OOC-CH
2 -)6H
δ4.1(-OCH
2 CH3)2H
δ5.0((-CH2-CH=CH
2 )2)4H
δ5.8((-CH2-CH=CH2)2)2H
δ7.5(-Si-C6
H
4 -Si-)4H 1 1 H-NMR
δ0.2-0.4 (-Si-C H 3 ) 12H
δ0.7 (-( CH 2 ) 2 CH 2 -Si-) 2H
δ0.8-0.9 (-CH 2- (CH 2 ) 5 - CH 3 ) 3H
δ1.1-1.3 (-OOC- CH 2 CH 2 CH 2 CH 2-Si-, -OCH 2 CH 3 , -CH 2- (CH 2 ) 5 - CH 3 ) 15H
δ1.4-1.5 (-CH 2- (CH 2 ) 5 - CH 3 ) 2H
δ1.6 (-OOC- CH 2 CH 2 CH 2 CH 2 -Si-) 2H
δ2.2-2.3 ((-C H 2 -CH = CH 2 ) 2 , -OOC-C H 2- ) 6H
δ4.1 (-OC H 2 CH 3 ) 2H
δ5.0 ((-CH 2 -CH = CH 2 ) 2 ) 4H
δ5.8 ((-CH 2 - CH = CH 2 ) 2 ) 2H
δ7.5 (-Si- C 6H 4 -Si-) 4H
反応容器に、下記式(O)
得られた化合物は、1H-NMRにより下記式(P)で示される親油性基含有加水分解性オルガノシラン化合物5であることが確認された。
δ0.2-0.4(-Si-CH
3 )12H
δ0.5(-CH2CH2CH
2 -Si(-OCH3)3)4H
δ0.7(-OOC-CH2CH2CH2CH
2 -Si-)2H
δ0.8-0.9(-CH2-(CH2)5-CH
3 )3H
δ1.1-1.5(-OOC-CH2CH2CH
2 CH2-Si-,-OCH2CH
3 ,-CH
2 -(CH
2 )5-CH3,-CH
2 CH
2 CH2-Si(-OCH3)3)25H
δ1.6(-OOC-CH2CH
2 CH2CH2-Si-)2H
δ2.2-2.3(-OOC-CH
2 -)2H
δ3.5(-CH2CH2CH2-Si(-OCH
3 )3)18H
δ4.1(-OCH
2 CH3)2H
δ7.5(-Si-C6
H
4 -Si-)4Hδ0.2-0.4 (-Si-C H 3 ) 12H
δ0.5 (-CH 2 CH 2 CH 2 -Si (-OCH 3 ) 3 ) 4H
δ0.7 (-OOC- CH 2 CH 2 CH 2 CH 2 -Si-) 2H
δ0.8-0.9 (-CH 2- (CH 2 ) 5 - CH 3 ) 3H
δ1.1-1.5 (-OOC- CH 2 CH 2 CH 2 CH 2-Si-, -OCH 2 CH 3 , -CH 2- (CH 2 ) 5 - CH 3 , -CH 2 CH 2 CH 2 -Si (-OCH 3 ) 3 ) 25H
δ1.6 (-OOC- CH 2 CH 2 CH 2 CH 2 -Si-) 2H
δ2.2-2.3 (-OOC-C H 2- ) 2H
δ3.5 (-CH 2 CH 2 CH 2 -Si (-OC H 3 ) 3 ) 18H
δ4.1 (-OC H 2 CH 3 ) 2H
δ7.5 (-Si- C 6H 4 -Si-) 4H
[実施例6]
反応容器に入れた1,4-ビス(ジメチルシリル)ベンゼン32.8g(1.69×10-1mol)を80℃まで加熱した。続いて、塩化白金酸/ビニルシロキサン錯体のトルエン溶液1.0×10-2g(Pt単体として6.4×10-7molを含有)を添加した後、10-ウンデセン酸オクチル10.0g(3.38×10-2mol)を3時間かけて滴下し、80℃にて3時間加熱撹拌した。その後、溶剤及び未反応物を減圧留去することで、下記式(Q)
32.8 g (1.69 × 10 -1 mol) of 1,4-bis (dimethylsilyl) benzene in the reaction vessel was heated to 80 ° C. Subsequently, 1.0 × 10 −2 g of a toluene solution of chloroplatinic acid / vinylsiloxane complex (containing 6.4 × 10 -7 mol of Pt alone) was added, and then 10.0 g of octyl 10-undecenoate (containing 10.0 × 10 -7 mol). 3.38 × 10 −2 mol) was added dropwise over 3 hours, and the mixture was heated and stirred at 80 ° C. for 3 hours. Then, by distilling off the solvent and the unreacted material under reduced pressure, the following formula (Q)
1H-NMR
δ0.2-0.4(-Si-CH
3 )12H
δ0.7(-(CH2)7CH
2 -Si-)2H
δ0.9(-OCH2(CH2)6CH
3 )3H
δ1.2-1.5(-(CH
2 )7-,-OCH2(CH
2 )6CH3)26H
δ1.6(-OOC-CH2CH
2 (CH2)7CH2-Si-)2H
δ2.3(-OOC-CH
2 -)2H
δ4.1(-OCH
2 (CH2)6CH3)2H
δ4.4(-Si-H)1H
δ7.5(-Si-C6
H
4 -Si-)4H 1 1 H-NMR
δ0.2-0.4 (-Si-C H 3 ) 12H
δ0.7 (-( CH 2 ) 7 CH 2 -Si-) 2H
δ0.9 (-OCH 2 (CH 2 ) 6 CH 3 ) 3H
δ1.2-1.5 (-( CH 2 ) 7- , -OCH 2 ( CH 2 ) 6 CH 3 ) 26H
δ1.6 (-OOC- CH 2 CH 2 (CH 2 ) 7 CH 2 -Si-) 2H
δ2.3 (-OOC-C H 2- ) 2H
δ4.1 (-OC H 2 (CH 2 ) 6 CH 3 ) 2H
δ4.4 (-Si-H) 1H
δ7.5 (-Si- C 6H 4 -Si-) 4H
反応容器に、下記式(B)
1H-NMR
δ0.2-0.4(-Si-CH
3 )12H
δ0.7(-(CH2)7CH
2 -Si-)2H
δ0.8-0.9(-CH2-(CH2)5-CH
3 ,-(CH2)7CH
2 -Si-)6H
δ1.1-1.5(-(CH
2 )7-,-CH2-(CH
2 )5-CH3,-OCH2(CH
2 )6CH3)36H
δ1.6(-OOC-CH2CH
2 (CH2)7CH2-Si-)2H
δ2.2-2.3((-CH
2 -CH=CH2)2,-OOC-CH
2 -)6H
δ4.1(-OCH
2 (CH2)6CH3)2H
δ5.0((-CH2-CH=CH
2 )2)4H
δ5.8((-CH2-CH=CH2)2)2H
δ7.5(-Si-C6
H
4 -Si-)4H 1 1 H-NMR
δ0.2-0.4 (-Si-C H 3 ) 12H
δ0.7 (-( CH 2 ) 7 CH 2 -Si-) 2H
δ0.8-0.9 (-CH 2- ( CH 2 ) 5 - CH 3 ,-(CH 2 ) 7CH 2 -Si-) 6H
δ1.1-1.5 (-( CH 2 ) 7- , -CH 2- (CH 2 ) 5 - CH 3 , -OCH 2 (CH 2 ) 6 CH 3 ) 36H
δ1.6 (-OOC- CH 2 CH 2 (CH 2 ) 7 CH 2 -Si-) 2H
δ2.2-2.3 ((-C H 2 -CH = CH 2 ) 2 , -OOC-C H 2- ) 6H
δ4.1 (-OC H 2 (CH 2 ) 6 CH 3 ) 2H
δ5.0 ((-CH 2 -CH = CH 2 ) 2 ) 4H
δ5.8 ((-CH 2 - CH = CH 2 ) 2 ) 2H
δ7.5 (-Si- C 6H 4 -Si-) 4H
反応容器に、下記式(R)
得られた化合物は、1H-NMRにより下記式(S)で示される親油性基含有加水分解性オルガノシラン化合物6であることが確認された。
δ0.2-0.4(-Si-CH
3 )12H
δ0.5(-CH2CH2CH
2 -Si(-OCH3)3)4H
δ0.7(-(CH2)7CH
2 -Si-)2H
δ0.8-0.9(-CH2-(CH2)5-CH
3 ,-OCH2(CH2)6CH
3 )6H
δ1.1-1.5(-(CH
2 )7-,-OCH2(CH
2 )6CH3,-CH
2 -(CH
2 )5-CH3,-CH
2 CH
2 CH2-Si(-OCH3)3)46H
δ1.6(-OOC-CH2CH
2 (CH2)7CH2-Si-)2H
δ2.2-2.3(-OOC-CH
2 -)2H
δ3.5(-CH2CH2CH2-Si(-OCH
3 )3)18H
δ4.1(-OCH
2 (CH2)6CH3)2H
δ7.5(-Si-C6
H
4 -Si-)4Hδ0.2-0.4 (-Si-C H 3 ) 12H
δ0.5 (-CH 2 CH 2 CH 2 -Si (-OCH 3 ) 3 ) 4H
δ0.7 (-( CH 2 ) 7 CH 2 -Si-) 2H
δ0.8-0.9 (-CH 2- (CH 2 ) 5 - CH 3 , -OCH 2 ( CH 2 ) 6CH 3 ) 6H
δ1.1-1.5 (-( CH 2 ) 7- , -OCH 2 ( CH 2 ) 6 CH 3 , -CH 2- ( CH 2 ) 5 -CH 3 , -CH 2 CH 2 CH 2 -Si (-OCH 3 ) 3 ) 46H
δ1.6 (-OOC- CH 2 CH 2 (CH 2 ) 7 CH 2 -Si-) 2H
δ2.2-2.3 (-OOC-C H 2- ) 2H
δ3.5 (-CH 2 CH 2 CH 2 -Si (-OC H 3 ) 3 ) 18H
δ4.1 (-OC H 2 (CH 2 ) 6 CH 3 ) 2H
δ7.5 (-Si- C 6H 4 -Si-) 4H
[実施例7]
反応容器に入れた1,4-ビス(ジメチルシリル)ベンゼン40.6g(2.09×10-1mol)を80℃まで加熱した。続いて、塩化白金酸/ビニルシロキサン錯体のトルエン溶液1.0×10-2g(Pt単体として6.4×10-7molを含有)を添加した後、下記式(T)
40.6 g (2.09 × 10 -1 mol) of 1,4-bis (dimethylsilyl) benzene in the reaction vessel was heated to 80 ° C. Subsequently, 1.0 × 10 −2 g (containing 6.4 × 10 -7 mol of Pt alone) in a toluene solution of chloroplatinic acid / vinylsiloxane complex was added, and then the following formula (T) was added.
1H-NMR
δ0.2-0.4(-Si-CH
3 )12H
δ0.7(-(CH2)7CH
2 -Si-)2H
δ1.0-1.2(-N(CH2CH
3 )2)6H
δ1.2-1.5(-(CH
2 )7-)14H
δ1.6(-NOC-CH2CH
2 (CH2)7CH2-Si-)2H
δ2.3(-NOC-CH
2 -)2H
δ3.2-3.4(-N(CH
2 CH3)2)4H
δ4.4(-Si-H)1H
δ7.5(-Si-C6
H
4 -Si-)4H 1 1 H-NMR
δ0.2-0.4 (-Si-C H 3 ) 12H
δ0.7 (-( CH 2 ) 7 CH 2 -Si-) 2H
δ1.0-1.2 (-N (CH 2 CH 3 ) 2 ) 6H
δ1.2-1.5 (-( CH 2 ) 7- ) 14H
δ1.6 (-NOC-CH 2 CH 2 (CH 2 ) 7 CH 2 -Si-) 2H
δ2.3 (-NOC-C H 2- ) 2H
δ3.2-3.4 (-N ( CH 2 CH 3 ) 2 ) 4H
δ4.4 (-Si-H) 1H
δ7.5 (-Si- C 6H 4 -Si-) 4H
反応容器に、下記式(B)
1H-NMR
δ0.2-0.4(-Si-CH
3 )12H
δ0.7(-(CH2)7CH
2 -Si-)2H
δ0.8-0.9(-CH2-(CH2)5-CH
3 )3H
δ1.1-1.3(-(CH
2 )7-,-N(CH2CH
3 )2,-CH2-(CH
2 )5-CH3)30H
δ1.4-1.5(-CH
2 -(CH
2 )5-CH3)2H
δ1.6(-NOC-CH2CH
2 (CH2)7CH2-Si-)2H
δ2.2-2.3((-CH
2 -CH=CH2)2,-NOC-CH
2 -)6H
δ3.2-3.4(-N(CH
2 CH3)2)4H
δ5.0((-CH2-CH=CH
2 )2)4H
δ5.8((-CH2-CH=CH2)2)2H
δ7.5(-Si-C6
H
4 -Si-)4H 1 1 H-NMR
δ0.2-0.4 (-Si-C H 3 ) 12H
δ0.7 (-( CH 2 ) 7 CH 2 -Si-) 2H
δ0.8-0.9 (-CH 2- (CH 2 ) 5 - CH 3 ) 3H
δ1.1-1.3 (-( CH 2 ) 7- , -N (CH 2 CH 3 ) 2 , -CH 2- ( CH 2 ) 5 -CH 3 ) 30H
δ1.4-1.5 (-CH 2- (CH 2 ) 5 - CH 3 ) 2H
δ1.6 (-NOC-CH 2 CH 2 (CH 2 ) 7 CH 2 -Si-) 2H
δ2.2-2.3 ((-C H 2 -CH = CH 2 ) 2 , -NOC-C H 2- ) 6H
δ3.2-3.4 (-N ( CH 2 CH 3 ) 2 ) 4H
δ5.0 ((-CH 2 -CH = CH 2 ) 2 ) 4H
δ5.8 ((-CH 2 - CH = CH 2 ) 2 ) 2H
δ7.5 (-Si- C 6H 4 -Si-) 4H
反応容器に、下記式(V)
得られた化合物は、1H-NMRにより下記式(W)で示される親油性基含有加水分解性オルガノシラン化合物7であることが確認された。
δ0.2-0.4(-Si-CH
3 )12H
δ0.5(-CH2CH2CH
2 -Si(-OCH3)3)4H
δ0.7(-(CH2)7CH
2 -Si-)2H
δ0.8-0.9(-CH2-(CH2)5-CH
3 )3H
δ1.1-1.5(-(CH
2 )7-,-N(CH2CH
3 )2,-CH
2 -(CH
2 )5-CH3,-CH
2 CH
2 CH2-Si(-OCH3)3)40H
δ1.6(-NOC-CH2CH
2 (CH2)7CH2-Si-)2H
δ2.2-2.3(-NOC-CH
2 -)2H
δ3.5(-CH2CH2CH2-Si(-OCH
3 )3)18H
δ3.2-3.4(-N(CH
2 CH3)2)4H
δ7.5(-Si-C6
H
4 -Si-)4Hδ0.2-0.4 (-Si-C H 3 ) 12H
δ0.5 (-CH 2 CH 2 CH 2 -Si (-OCH 3 ) 3 ) 4H
δ0.7 (-( CH 2 ) 7 CH 2 -Si-) 2H
δ0.8-0.9 (-CH 2- (CH 2 ) 5 - CH 3 ) 3H
δ1.1-1.5 (-( CH 2 ) 7- , -N ( CH 2 CH 3 ) 2 , -CH 2- ( CH 2 ) 5 -CH 3 , -CH 2 CH 2 CH 2 -Si (-OCH 3 ) 3 ) 40H
δ1.6 (-NOC-CH 2 CH 2 (CH 2 ) 7 CH 2 -Si-) 2H
δ2.2-2.3 (-NOC-C H 2- ) 2H
δ3.5 (-CH 2 CH 2 CH 2 -Si (-OC H 3 ) 3 ) 18H
δ3.2-3.4 (-N ( CH 2 CH 3 ) 2 ) 4H
δ7.5 (-Si- C 6H 4 -Si-) 4H
[実施例8]
反応容器に入れた1,4-ビス(ジメチルシリル)ベンゼン31.1g(1.60×10-1mol)を80℃まで加熱した。続いて、塩化白金酸/ビニルシロキサン錯体のトルエン溶液1.0×10-2g(Pt単体として6.4×10-7molを含有)を添加した後、下記式(X)
31.1 g (1.60 × 10 -1 mol) of 1,4-bis (dimethylsilyl) benzene in the reaction vessel was heated to 80 ° C. Subsequently, 1.0 × 10 −2 g (containing 6.4 × 10 -7 mol of Pt alone) in a toluene solution of chloroplatinic acid / vinylsiloxane complex was added, and then the following formula (X) was added.
1H-NMR
δ0.2-0.4(-Si-CH
3 )12H
δ0.7(-(CH2)7CH
2 -Si-)2H
δ0.9(-SCH2(CH2)6CH
3 )3H
δ1.2-1.5(-(CH
2 )7-,-SCH2(CH
2 )6CH3)26H
δ1.6(-SOC-CH2CH
2 (CH2)7CH2-Si-)2H
δ2.3(-SOC-CH
2 -)2H
δ2.8(-SCH
2 (CH2)6CH3)2H
δ4.4(-Si-H)1H
δ7.5(-Si-C6
H
4 -Si-)4H 1 1 H-NMR
δ0.2-0.4 (-Si-C H 3 ) 12H
δ0.7 (-( CH 2 ) 7 CH 2 -Si-) 2H
δ0.9 (-SCH 2 (CH 2 ) 6 CH 3 ) 3H
δ1.2-1.5 (-( CH 2 ) 7- , -SCH 2 ( CH 2 ) 6 CH 3 ) 26H
δ1.6 (-SOC-CH 2 CH 2 (CH 2 ) 7 CH 2 -Si-) 2H
δ2.3 (-SOC-C H 2- ) 2H
δ2.8 (-SC H 2 (CH 2 ) 6 CH 3 ) 2H
δ4.4 (-Si-H) 1H
δ7.5 (-Si- C 6H 4 -Si-) 4H
反応容器に、下記式(B)
1H-NMR
δ0.2-0.4(-Si-CH
3 )12H
δ0.7(-(CH2)7CH
2 -Si-)2H
δ0.8-0.9(-CH2-(CH2)5-CH
3 ,-SCH2(CH2)6CH
3 )6H
δ1.1-1.3(-(CH
2 )7-,-SCH2(CH
2 )6CH3,-CH2-(CH
2 )5-CH3)36H
δ1.4-1.5(-CH
2 -(CH
2 )5-CH3)2H
δ1.6(-SOC-CH2CH
2 (CH2)7CH2-Si-)2H
δ2.2-2.3((-CH
2 -CH=CH2)2,-SOC-CH
2 -)6H
δ2.8(-SCH
2 (CH2)6CH3)2H
δ5.0((-CH2-CH=CH
2 )2)4H
δ5.8((-CH2-CH=CH2)2)2H
δ7.5(-Si-C6
H
4 -Si-)4H 1 1 H-NMR
δ0.2-0.4 (-Si-C H 3 ) 12H
δ0.7 (-( CH 2 ) 7 CH 2 -Si-) 2H
δ0.8-0.9 (-CH 2- (CH 2 ) 5 - CH 3 , -SCH 2 ( CH 2 ) 6CH 3 ) 6H
δ1.1-1.3 (-( CH 2 ) 7- , -SCH 2 ( CH 2 ) 6 CH 3 , -CH 2- ( CH 2 ) 5 -CH 3 ) 36H
δ1.4-1.5 (-CH 2- (CH 2 ) 5 - CH 3 ) 2H
δ1.6 (-SOC-CH 2 CH 2 (CH 2 ) 7 CH 2 -Si-) 2H
δ2.2-2.3 ((-C H 2 -CH = CH 2 ) 2 , -SOC-C H 2- ) 6H
δ2.8 (-SC H 2 (CH 2 ) 6 CH 3 ) 2H
δ5.0 ((-CH 2 -CH = CH 2 ) 2 ) 4H
δ5.8 ((-CH 2 - CH = CH 2 ) 2 ) 2H
δ7.5 (-Si- C 6H 4 -Si-) 4H
反応容器に、下記式(Z)
得られた化合物は、1H-NMRにより下記式(A’)で示される親油性基含有加水分解性オルガノシラン化合物8であることが確認された。
δ0.2-0.4(-Si-CH
3 )12H
δ0.5(-CH2CH2CH
2-Si(-OCH3)3)4H
δ0.7(-(CH2)7CH
2 -Si-)2H
δ0.8-0.9(-CH2-(CH2)5-CH
3 ,-SCH2(CH
2 )6CH3)6H
δ1.1-1.5(-(CH
2 )7-,-SCH2(CH
2 )6CH3,-CH
2 -(CH
2 )5-CH3,-CH
2 CH
2 CH2-Si(-OCH3)3)46H
δ1.6(-SOC-CH2CH
2 (CH2)7CH2-Si-)2H
δ2.2-2.3(-SOC-CH
2 -)2H
δ3.5(-CH2CH2CH2-Si(-OCH
3 )3)18H
δ2.8(-SCH
2 (CH2)6CH3)2H
δ7.5(-Si-C6
H
4 -Si-)4Hδ0.2-0.4 (-Si-C H 3 ) 12H
δ0.5 (-CH 2 CH 2 CH 2 -Si (-OCH 3 ) 3 ) 4H
δ0.7 (-( CH 2 ) 7 CH 2 -Si-) 2H
δ0.8-0.9 (-CH 2- (CH 2 ) 5 - CH 3 , -SCH 2 ( CH 2 ) 6 CH 3 ) 6H
δ1.1-1.5 (-( CH 2 ) 7- , -SCH 2 ( CH 2 ) 6 CH 3 , -CH 2- ( CH 2 ) 5 -CH 3 , -CH 2 CH 2 CH 2 -Si (-OCH 3 ) 3 ) 46H
δ1.6 (-SOC-CH 2 CH 2 (CH 2 ) 7 CH 2 -Si-) 2H
δ2.2-2.3 (-SOC-C H 2- ) 2H
δ3.5 (-CH 2 CH 2 CH 2 -Si (-OC H 3 ) 3 ) 18H
δ2.8 (-SC H 2 (CH 2 ) 6 CH 3 ) 2H
δ7.5 (-Si- C 6H 4 -Si-) 4H
比較例として、以下の化合物を使用した。
[比較例1]
下記式(B’)で示される親油性基含有加水分解性オルガノシラン化合物9
[Comparative Example 1]
Lipophilic group-containing hydrolyzable organosilane compound 9 represented by the following formula (B')
[比較例2]
下記式(C’)で示される加水分解性オルガノシラン化合物10
Hydrolyzable organosilane compound 10 represented by the following formula (C')
表面処理剤の調製及び硬化被膜の形成
実施例1~8で得られた式(D)、(G)、(J)、(M)、(P)、(S)、(W)、(A’)で示される親油性基含有加水分解性オルガノシラン化合物1~8、及び比較例1の式(B’)で示される親油性基含有加水分解性オルガノシラン化合物9を濃度0.1質量%、更に酢酸を濃度0.1質量%になるようプロピレングリコールモノメチルエーテルに溶解させて表面処理剤を調製した。その後、コーニング社製Gorillaガラスに、ディップ塗工し、120℃、30分硬化させ、膜厚3nmの硬化被膜を作製した。 Preparation of surface treatment agent and formation of cured film Formulas (D), (G), (J), (M), (P), (S), (W), (A) obtained in Examples 1 to 8 Concentrations of the lipophilic group-containing hydrolyzable organosilane compounds 1 to 8 represented by') and the lipophilic group-containing hydrolyzable organosilane compound 9 represented by the formula (B') of Comparative Example 1 at a concentration of 0.1% by mass. Further, acetic acid was dissolved in propylene glycol monomethyl ether so as to have a concentration of 0.1% by mass to prepare a surface treatment agent. Then, Gorilla glass manufactured by Corning Inc. was dipped and cured at 120 ° C. for 30 minutes to prepare a cured film having a film thickness of 3 nm.
比較例2の式(C’)で示される加水分解性オルガノシラン化合物10を、濃度0.1質量%になるようにNovec 7200(3M社製、エチルパーフルオロブチルエーテル)に溶解させて表面処理剤を調製した。その後、コーニング社製Gorillaガラスに、ディップ塗工し、120℃、30分硬化させ、膜厚8nmの硬化被膜を作製した。 The hydrolyzable organosilane compound 10 represented by the formula (C') of Comparative Example 2 is dissolved in Novec 7200 (3M, ethyl perfluorobutyl ether) so as to have a concentration of 0.1% by mass to prepare a surface treatment agent. Was prepared. Then, Gorilla glass manufactured by Corning Inc. was dipped and cured at 120 ° C. for 30 minutes to prepare a cured film having a film thickness of 8 nm.
比較例3(ブランク)として、何も塗工していないコーニング社製Gorillaガラスを用いた。 As Comparative Example 3 (blank), uncoated Gorilla glass manufactured by Corning Inc. was used.
親油性の評価
[親油性の評価]
上記にて作製した硬化被膜を形成したガラスについて、接触角計Drop Master(協和界面科学社製)を用いて、硬化被膜のオレイン酸に対する接触角(親油性)を測定した(液滴:2μl、温度:25℃、湿度(RH):40%)。測定は液滴を硬化被膜上に付着させた後、40秒後に測定した。結果(オレイン酸接触角)を表1に示す。
初期においては、実施例は良好な親油性を示した。 Evaluation of lipophilicity [Evaluation of lipophilicity]
For the glass having the cured film formed above, the contact angle (lipophilicity) of the cured film with respect to oleic acid was measured using a contact angle meter Drop Master (manufactured by Kyowa Surface Science Co., Ltd.) (droplets: 2 μl, Temperature: 25 ° C., Humidity (RH): 40%). The measurement was performed 40 seconds after the droplet was attached onto the cured film. The results (oleic acid contact angle) are shown in Table 1.
Initially, the examples showed good lipophilicity.
撥水性の評価
[撥水性の評価]
上記にて作製した硬化被膜を形成したガラスについて、接触角計Drop Master(協和界面科学社製)を用いて、硬化被膜の水に対する接触角(撥水性)を測定した(液滴:2μl、温度:25℃、湿度(RH):40%)。結果(水接触角)を表1に示す。 Evaluation of water repellency [Evaluation of water repellency]
For the glass having the cured film formed above, the contact angle (water repellency) of the cured film with respect to water was measured using a contact angle meter Drop Master (manufactured by Kyowa Interface Science Co., Ltd.) (droplets: 2 μl, temperature). : 25 ° C., humidity (RH): 40%). The results (water contact angle) are shown in Table 1.
指紋低視認性の評価
[指紋視認性の評価]
上記にて作製した硬化被膜を形成したガラスに1kg荷重で皮脂を付着させ、その視認性について以下4段階にて目視による官能評価を行った。結果を表1に示す。
4:指紋がほとんど見えない
3:指紋がわずかに見える
2:指紋が薄いがはっきり見える
1:指紋がはっきり見える Evaluation of fingerprint low visibility [Evaluation of fingerprint visibility]
Sebum was adhered to the glass having the cured film formed above under a load of 1 kg, and its visibility was visually evaluated in the following four stages. The results are shown in Table 1.
4: Fingerprints are almost invisible 3: Fingerprints are slightly visible 2: Fingerprints are thin but clearly visible 1: Fingerprints are clearly visible
[ヘーズの評価]
上記にて作製した硬化被膜を形成したガラスに1kg荷重で皮脂を付着させ、ヘーズメーターNDH5000(日本電色工業社製)を用いてヘーズを測定した。[Evaluation of Haze]
Sebum was attached to the glass having the cured film formed above with a load of 1 kg, and the haze was measured using a haze meter NDH5000 (manufactured by Nippon Denshoku Kogyo Co., Ltd.).
[屈折率の評価]
実施例1~8及び比較例1、2のオルガノシラン化合物の屈折率を、JIS K 0062に則って評価した。[Evaluation of refractive index]
The refractive indexes of the organosilane compounds of Examples 1 to 8 and Comparative Examples 1 and 2 were evaluated according to JIS K 0062.
[耐摩耗性の評価]
上記にて作製した実施例1~8及び比較例1の硬化被膜を形成したガラスについて、ラビングテスター(新東科学社製)を用いて、下記条件で2,000回擦った後の硬化被膜の水に対する接触角(撥水性)を上記と同様にして測定し、耐摩耗性の評価とした。試験環境条件は温度25℃、湿度(RH)40%である。結果(摩耗後水接触角)を表1に示す。
耐消しゴム摩耗性
消しゴム:Minoan社製
接触面積:6mmφ
移動距離(片道):30mm
移動速度:3,600mm/分
荷重:1kg/6mmφ[Evaluation of wear resistance]
The glass having the cured coatings of Examples 1 to 8 and Comparative Example 1 produced above was rubbed 2,000 times under the following conditions using a rubbing tester (manufactured by Shinto Kagaku Co., Ltd.). The contact angle (water repellency) with respect to water was measured in the same manner as above, and the wear resistance was evaluated. The test environment conditions are a temperature of 25 ° C. and a humidity (RH) of 40%. The results (water contact angle after wear) are shown in Table 1.
Eraser wear resistance
Eraser: Minoan contact area: 6 mmφ
Travel distance (one way): 30 mm
Moving speed: 3,600 mm / min Load: 1 kg / 6 mmφ
指紋低視認性の評価において、実施例1~8、比較例1はいずれにおいても指紋が全く見えなかった。一方、親油性基を有さないパーフルオロポリエーテル化合物を用いた比較例2は、指紋がはっきり見えた。また、表面処理剤を塗工していない比較例3においても指紋がはっきり見えた。
ヘーズメーターによるヘーズの測定においても、実施例はいずれもヘーズの値が低く、官能評価の結果と良い相関となった。
また、オルガノシラン化合物の屈折率についても、皮脂の屈折率(約1.5)により近いほうが指紋の低視認性に効果があった。
消しゴム摩耗耐久性については、実施例1~8はいずれも2,000回消しゴムで摩耗した後も水接触角が50°以上と耐久性の向上が確認された。指紋低視認性を示す比較例1は水接触角が50°未満になってしまい、摩耗耐久性が低い結果であった。In the evaluation of fingerprint low visibility, no fingerprint was seen in either Examples 1 to 8 and Comparative Example 1. On the other hand, in Comparative Example 2 using the perfluoropolyether compound having no lipophilic group, fingerprints were clearly visible. Further, the fingerprint was clearly visible even in Comparative Example 3 in which the surface treatment agent was not applied.
In the measurement of haze by the haze meter, the haze value was low in all the examples, which was a good correlation with the result of the sensory evaluation.
Further, regarding the refractive index of the organosilane compound, the closer to the refractive index of sebum (about 1.5), the more effective the low visibility of the fingerprint.
Regarding the wear durability of the eraser, in all of Examples 1 to 8, it was confirmed that the water contact angle was 50 ° or more even after being worn by the eraser 2,000 times, and the durability was improved. In Comparative Example 1 showing low fingerprint visibility, the water contact angle was less than 50 °, resulting in low wear durability.
Claims (14)
-R 3 -Z-(R 3 ) a - (3)
(ここで、R 3 は独立に炭素数2~30のアルキレン基又はフェニレン基を含む炭素数7~30のアルキレン・フェニレン基であり、Zは単結合、又は下記式
で表される、フェニレン基、シルフェニレン基、ジシロキサン残基、環状テトラシロキサン残基から選ばれる2価の基を含んでいてもよい、炭素数2~30のアルキレン基であり、Rは独立に炭素数1~4のアルキル基又はフェニル基であり、R’は炭素数1~20のアルキル基、炭素数6~20のアリール基又は炭素数7~20のアラルキル基であり、pは2又は3であり、Xは独立に水酸基又は加水分解性基であり、nは1~3の整数である。] An organosilane compound represented by the following general formula (1).
-R 3 -Z- (R 3 ) a- (3)
(Here, R 3 is an alkylene group having 2 to 30 carbon atoms or an alkylene phenylene group having 7 to 30 carbon atoms including a phenylene group, and Z is a single bond or the following formula.
It is an alkylene group having 2 to 30 carbon atoms and may contain a divalent group selected from a phenylene group, a sylphenylene group, a disiloxane residue and a cyclic tetrasiloxane residue represented by, and R is independent. Is an alkyl group or a phenyl group having 1 to 4 carbon atoms, R'is an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms or an aralkyl group having 7 to 20 carbon atoms, and p is 2. Or 3, X is independently a hydroxyl group or a hydrolyzable group, and n is an integer of 1 to 3. ]
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