JP7065857B2 - サセプター - Google Patents
サセプター Download PDFInfo
- Publication number
- JP7065857B2 JP7065857B2 JP2019536352A JP2019536352A JP7065857B2 JP 7065857 B2 JP7065857 B2 JP 7065857B2 JP 2019536352 A JP2019536352 A JP 2019536352A JP 2019536352 A JP2019536352 A JP 2019536352A JP 7065857 B2 JP7065857 B2 JP 7065857B2
- Authority
- JP
- Japan
- Prior art keywords
- susceptor
- horizontal plate
- vertical rod
- cvd apparatus
- cvd
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4582—Rigid and flat substrates, e.g. plates or discs
- C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
- C23C16/4586—Elements in the interior of the support, e.g. electrodes, heating or cooling devices
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4582—Rigid and flat substrates, e.g. plates or discs
- C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4582—Rigid and flat substrates, e.g. plates or discs
- C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
- C23C16/4584—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally the substrate being rotated
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4582—Rigid and flat substrates, e.g. plates or discs
- C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
- C23C16/4585—Devices at or outside the perimeter of the substrate support, e.g. clamping rings, shrouds
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
- C30B25/12—Substrate holders or susceptors
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Description
化学気相成長法(CVD)、有機金属気相成長法(MOCVD)、有機金属気相成長法(MOVPE)、及び有機金属気相成長法(OMVPE)は当技術分野で知られている方法、例えば、非特許文献1を参照。また、特許文献2;特許文献3;特許文献4;特許文献5;特許文献6;特許文献7;特許文献8;特許文献9;特許文献10、特許文献11、及び、特許文献12、並びに、本明細書中に引用された他の参考文献を参照。また、特許文献13及び特許文献14も参照。このような方法を実施するためのリアクターを作製するための方法は、当技術分野において公知である。
本明細書で提供されるのは、化学気相成長法(CVD)リアクター用のサセプターデバイスである。このデバイスは、少なくとも1つのウェハを保持するようになっている少なくとも1つの水平プレートと;水平プレートと一体でかつ水平プレートに実質的に垂直な少なくとも1つの垂直ロッドと;を備える。垂直ロッドは、プレートの中央で水平プレートに接合し得る。便宜上、垂直ロッドを備えた水平プレートに基づくこのサセプターデバイス構造は「マッシュルーム形状サセプター」と称され得る。
CVD処理及びリアクターに使用されるものを含む誘導加熱システムは当技術分野において既知である。例えば、特許文献1、特許文献15、及び非特許文献2を参照。当技術分野で知られているように1つまたは複数のコイルを使用することができ、RFコイルの間隔は特定の用途に適合させることができる。当業者は、所望の温度結果を達成し、かつ十分な均一加熱を得るために十分なRF結合が生じるシステムを作り出すことができる。誘導加熱は、1,500℃を超えるような高温加熱を可能にする。
図2及び図3に示されるような垂直型リアクター、ならびに当分野で既知の水平型リアクターなどのCVDリアクター及び有機金属化学気相成長法(MOCVD)リアクターのための多くのリアクター設計がある。リアクターは、例えば、コールドウォールリアクターまたはホットウォールリアクターであり得る。これらのタイプのCVD及びMOCVDリアクターは、半導体単一膜とレーザ及びLEDなどのヘテロ構造とのさまざまな組み合わせのように、さまざまなエピタキシャル化合物の調製に使用されてきた。
サセプターデバイス及びより大きなリアクターは、当技術分野において既知の方法によって製造され得る。サセプターを構成する材料は、当技術分野において既知の方法によってマッシュルーム形状に機械加工され得、ウェハの溝を考慮に入れることができる。
当技術分野で知られているように、例えば窒化アルミニウム、炭化ケイ素、窒化ガリウム、ヒ化ガリウム、ヒ化インジウムガリウム、ヒ化アルミニウムガリウムなどのような様々な膜材料をウェハ上にエピタキシャル成長させることができる。
Claims (10)
- 少なくとも1つのウェハを保持するようになっている水平プレートと、
前記水平プレートと一体化されかつ前記水平プレートに対して垂直な垂直ロッドと、
サセプターを少なくとも部分的に覆う断熱構造と、
誘導コイルと、
反応室と、を含むサセプターデバイスであって、前記誘導コイルは前記反応室の内部に設置されるサセプターデバイスを含むCVD装置であって、
前記サセプターデバイスは、前記誘導コイルによる誘導加熱に適しており、
前記垂直ロッドの垂直長さに沿ってのみ前記誘導コイルが配置されて前記垂直ロッドが前記水平プレートのための一次熱源として機能し、
前記垂直ロッドの垂直長さに沿って、かつ前記水平プレートの水平長さに沿って、前記断熱構造が配置されている、CVD装置。 - 前記垂直ロッドがねじ山を有し、前記断熱構造の内壁は対応するねじ山を有する、請求項1に記載のCVD装置。
- 前記CVD装置は、シャワーヘッド注入構造をさらに含むことを特徴とする請求項1に記載のCVD装置。
- 前記水平プレートは、一つ以上のウェハを受け入れるように構成された一つ以上の領域を有し、前記シャワーヘッド注入構造が前記一つ以上のウェハの表面から10mm未満に配置される、請求項3に記載のCVD装置。
- 前記サセプターデバイスを回転するように構成されたローターを更に備える、請求項1に記載のCVD装置。
- 前記水平プレートは前記誘導コイルの上面全体を覆う、請求項1に記載のCVD装置。
- 前記サセプターデバイスが抵抗加熱器を含まない、請求項1に記載のCVD装置。
- 前記サセプターデバイスが、前記水平プレートと一体化されかつ前記水平プレートに対して垂直な2つ以上の垂直ロッドを備える、請求項1に記載のCVD装置。
- 前記少なくとも1つの垂直ロッドの直径が、前記少なくとも1つの水平プレートの直径よりも大きい、請求項1に記載のCVD装置。
- CVDが少なくとも1500℃のサセプター表面温度で行われることを特徴とする請求項6に記載のCVD装置を使用する方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201662396679P | 2016-09-19 | 2016-09-19 | |
US62/396,679 | 2016-09-19 | ||
PCT/IB2017/055637 WO2018051304A1 (en) | 2016-09-19 | 2017-09-18 | Susceptor |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2019530253A JP2019530253A (ja) | 2019-10-17 |
JP7065857B2 true JP7065857B2 (ja) | 2022-05-12 |
Family
ID=60083369
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2019536352A Active JP7065857B2 (ja) | 2016-09-19 | 2017-09-18 | サセプター |
Country Status (5)
Country | Link |
---|---|
US (1) | US11339478B2 (ja) |
EP (1) | EP3516090A1 (ja) |
JP (1) | JP7065857B2 (ja) |
CN (1) | CN110023537B (ja) |
WO (1) | WO2018051304A1 (ja) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003037071A (ja) | 2001-07-25 | 2003-02-07 | Shin Etsu Handotai Co Ltd | サセプタ、気相成長装置および気相成長方法 |
JP2003520746A (ja) | 2000-01-31 | 2003-07-08 | マットソン テクノロジー インコーポレイテッド | 基板をエピタキシャルにより処理するための装置及び方法 |
JP2006028625A (ja) | 2004-07-21 | 2006-02-02 | Denso Corp | Cvd装置 |
US20100059182A1 (en) | 2008-09-05 | 2010-03-11 | Jusung Engineering Co., Ltd. | Substrate processing apparatus |
JP2016111043A (ja) | 2014-12-02 | 2016-06-20 | 昭和電工株式会社 | ウェハ支持台、化学気相成長装置、エピタキシャルウェハ |
Family Cites Families (60)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3696223A (en) * | 1970-10-05 | 1972-10-03 | Cragmet Corp | Susceptor |
US3783822A (en) * | 1972-05-10 | 1974-01-08 | J Wollam | Apparatus for use in deposition of films from a vapor phase |
JPS55130898A (en) * | 1979-04-02 | 1980-10-11 | Hitachi Ltd | Preparation of ferrite single crystal |
US5242501A (en) | 1982-09-10 | 1993-09-07 | Lam Research Corporation | Susceptor in chemical vapor deposition reactors |
US4579080A (en) * | 1983-12-09 | 1986-04-01 | Applied Materials, Inc. | Induction heated reactor system for chemical vapor deposition |
US4632058A (en) * | 1984-02-27 | 1986-12-30 | Gemini Research, Inc. | Apparatus for uniform chemical vapor deposition |
JP2764416B2 (ja) | 1989-01-13 | 1998-06-11 | 東芝セラミックス株式会社 | サセプタ |
US5091208A (en) | 1990-03-05 | 1992-02-25 | Wayne State University | Novel susceptor for use in chemical vapor deposition apparatus and its method of use |
JPH03287770A (ja) * | 1990-04-05 | 1991-12-18 | Hitachi Electron Eng Co Ltd | 枚葉式常圧cvd装置 |
US5370739A (en) * | 1992-06-15 | 1994-12-06 | Materials Research Corporation | Rotating susceptor semiconductor wafer processing cluster tool module useful for tungsten CVD |
US5534072A (en) * | 1992-06-24 | 1996-07-09 | Anelva Corporation | Integrated module multi-chamber CVD processing system and its method for processing subtrates |
JPH0711446A (ja) * | 1993-05-27 | 1995-01-13 | Applied Materials Inc | 気相成長用サセプタ装置 |
DE19581430D2 (de) | 1994-12-27 | 1997-08-21 | Siemens Ag | Verfahren zum Herstellen von mit Bor dotiertem , einkristallinem Siliciumcarbid |
DE69629412T2 (de) * | 1995-04-20 | 2004-06-24 | Ebara Corp. | Anlage zur Dampfabscheidung von Dünnschichten |
US5700725A (en) | 1995-06-26 | 1997-12-23 | Lucent Technologies Inc. | Apparatus and method for making integrated circuits |
JP3471144B2 (ja) | 1995-09-06 | 2003-11-25 | 東京エレクトロン株式会社 | 縦型熱処理装置及びその断熱構造体並びに遮熱板 |
US6031211A (en) | 1997-07-11 | 2000-02-29 | Concept Systems Design, Inc. | Zone heating system with feedback control |
US5835678A (en) | 1996-10-03 | 1998-11-10 | Emcore Corporation | Liquid vaporizer system and method |
US5759263A (en) | 1996-12-05 | 1998-06-02 | Abb Research Ltd. | Device and a method for epitaxially growing objects by cvd |
US5788777A (en) * | 1997-03-06 | 1998-08-04 | Burk, Jr.; Albert A. | Susceptor for an epitaxial growth factor |
US6217662B1 (en) | 1997-03-24 | 2001-04-17 | Cree, Inc. | Susceptor designs for silicon carbide thin films |
US6321680B2 (en) | 1997-08-11 | 2001-11-27 | Torrex Equipment Corporation | Vertical plasma enhanced process apparatus and method |
US6062851A (en) * | 1998-10-23 | 2000-05-16 | The B. F. Goodrich Company | Combination CVI/CVD and heat treat susceptor lid |
US6121592A (en) * | 1998-11-05 | 2000-09-19 | Inductotherm Corp. | Induction heating device and process for the controlled heating of a non-electrically conductive material |
US6368404B1 (en) * | 1999-04-23 | 2002-04-09 | Emcore Corporation | Induction heated chemical vapor deposition reactor |
EP1063318B1 (en) * | 1999-06-04 | 2004-08-25 | Goodrich Corporation | Combination CVI/CVD and heat treat susceptor lid |
US6425504B1 (en) * | 1999-06-29 | 2002-07-30 | Iowa State University Research Foundation, Inc. | One-piece, composite crucible with integral withdrawal/discharge section |
DE10102991C2 (de) * | 2000-02-19 | 2003-11-20 | Ald Vacuum Techn Ag | Einrichtung zum Aufheizen eines Werkstücks aus Metall |
US6506252B2 (en) | 2001-02-07 | 2003-01-14 | Emcore Corporation | Susceptorless reactor for growing epitaxial layers on wafers by chemical vapor deposition |
TW559905B (en) * | 2001-08-10 | 2003-11-01 | Toshiba Corp | Vertical chemical vapor deposition system cross-reference to related applications |
JP3888531B2 (ja) | 2002-03-27 | 2007-03-07 | 日本碍子株式会社 | セラミックヒーター、セラミックヒーターの製造方法、および金属部材の埋設品 |
JP3722477B2 (ja) * | 2002-04-02 | 2005-11-30 | 株式会社椿本チエイン | ケーブル類保護案内ガイド |
US6724803B2 (en) * | 2002-04-04 | 2004-04-20 | Ucar Carbon Company Inc. | Induction furnace for high temperature operation |
CN100347083C (zh) | 2003-08-22 | 2007-11-07 | 德山株式会社 | 硅生产装置 |
US7122769B2 (en) * | 2003-12-25 | 2006-10-17 | Canon Kabushiki Kaisha | Induction heating apparatus for image fixing |
US20050274324A1 (en) * | 2004-06-04 | 2005-12-15 | Tokyo Electron Limited | Plasma processing apparatus and mounting unit thereof |
JP2006179613A (ja) | 2004-12-21 | 2006-07-06 | Rigaku Corp | 半導体ウエハ縦型熱処理装置用磁性流体シールユニット |
US8709162B2 (en) | 2005-08-16 | 2014-04-29 | Applied Materials, Inc. | Active cooling substrate support |
US8941037B2 (en) * | 2006-12-25 | 2015-01-27 | Tokyo Electron Limited | Substrate processing apparatus, focus ring heating method, and substrate processing method |
US20100199914A1 (en) | 2007-10-10 | 2010-08-12 | Michael Iza | Chemical vapor deposition reactor chamber |
JP2011500961A (ja) | 2007-10-11 | 2011-01-06 | バレンス プロセス イクウィップメント,インコーポレイテッド | 化学気相成長反応器 |
KR101525892B1 (ko) | 2008-09-05 | 2015-06-05 | 주성엔지니어링(주) | 기판 처리 장치 |
US20110290175A1 (en) * | 2009-06-07 | 2011-12-01 | Veeco Instruments, Inc. | Multi-Chamber CVD Processing System |
EP2549522A4 (en) * | 2010-03-15 | 2013-07-31 | Sumitomo Electric Industries | PRODUCTION METHOD FOR SEMICONDUCTOR THIN LAYERS, DEVICE FOR PRODUCING SEMICONDUCTOR THIN LAYERS, SUSCEPTOR AND SUSCEPTOR TOOL |
US20120148760A1 (en) * | 2010-12-08 | 2012-06-14 | Glen Eric Egami | Induction Heating for Substrate Processing |
KR101318174B1 (ko) | 2011-08-23 | 2013-10-18 | 주식회사 에스에프에이 | 서셉터 및 이를 구비하는 화학기상증착장치 |
JP5387662B2 (ja) | 2011-11-29 | 2014-01-15 | 東京エレクトロン株式会社 | 被処理基板支持構造、およびプラズマ処理装置 |
KR20130111029A (ko) | 2012-03-30 | 2013-10-10 | 삼성전자주식회사 | 화학 기상 증착 장치용 서셉터 및 이를 구비하는 화학 기상 증착 장치 |
US8933375B2 (en) | 2012-06-27 | 2015-01-13 | Asm Ip Holding B.V. | Susceptor heater and method of heating a substrate |
KR101413898B1 (ko) * | 2012-11-06 | 2014-06-30 | 엔지케이 인슐레이터 엘티디 | 서셉터 |
US20140124788A1 (en) * | 2012-11-06 | 2014-05-08 | Intermolecular, Inc. | Chemical Vapor Deposition System |
CN103436862B (zh) | 2013-08-06 | 2015-04-22 | 中国电子科技集团公司第四十八研究所 | 一种用于mocvd反应器的支撑轴及mocvd反应器 |
KR20160000700A (ko) * | 2014-06-25 | 2016-01-05 | (주)포인트엔지니어링 | Cvd 공정을 위한 서셉터 |
US10208398B2 (en) * | 2014-12-02 | 2019-02-19 | Showa Denko K.K. | Wafer support, chemical vapor phase growth device, epitaxial wafer and manufacturing method thereof |
ITUB20160556A1 (it) | 2016-02-08 | 2017-08-08 | L P E S P A | Suscettore con perno riscaldato e reattore per deposizione epitassiale |
US11059010B2 (en) * | 2016-04-26 | 2021-07-13 | Haldor Topsøe A/Se | Induction heated reactor |
US10222312B2 (en) * | 2016-06-28 | 2019-03-05 | Anton Paar Quantatec, Inc. | Cryogenic temperature controller for volumetric sorption analyzers |
CN106435524B (zh) | 2016-07-27 | 2018-10-23 | 东莞市中镓半导体科技有限公司 | 一种垂直式hvpe生长设备用温场装置 |
US11979965B2 (en) * | 2017-01-10 | 2024-05-07 | King Abdullah University Of Science And Technology | Susceptors for induction heating with thermal uniformity |
US20190118252A1 (en) * | 2017-10-20 | 2019-04-25 | Desktop Metal, Inc. | Induction heating systems and techniques for fused filament metal fabrication |
-
2017
- 2017-09-18 US US16/331,215 patent/US11339478B2/en active Active
- 2017-09-18 WO PCT/IB2017/055637 patent/WO2018051304A1/en unknown
- 2017-09-18 CN CN201780056663.7A patent/CN110023537B/zh active Active
- 2017-09-18 EP EP17784011.3A patent/EP3516090A1/en active Pending
- 2017-09-18 JP JP2019536352A patent/JP7065857B2/ja active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003520746A (ja) | 2000-01-31 | 2003-07-08 | マットソン テクノロジー インコーポレイテッド | 基板をエピタキシャルにより処理するための装置及び方法 |
JP2003037071A (ja) | 2001-07-25 | 2003-02-07 | Shin Etsu Handotai Co Ltd | サセプタ、気相成長装置および気相成長方法 |
JP2006028625A (ja) | 2004-07-21 | 2006-02-02 | Denso Corp | Cvd装置 |
US20100059182A1 (en) | 2008-09-05 | 2010-03-11 | Jusung Engineering Co., Ltd. | Substrate processing apparatus |
JP2016111043A (ja) | 2014-12-02 | 2016-06-20 | 昭和電工株式会社 | ウェハ支持台、化学気相成長装置、エピタキシャルウェハ |
Also Published As
Publication number | Publication date |
---|---|
CN110023537B (zh) | 2021-11-16 |
CN110023537A (zh) | 2019-07-16 |
WO2018051304A1 (en) | 2018-03-22 |
EP3516090A1 (en) | 2019-07-31 |
US11339478B2 (en) | 2022-05-24 |
JP2019530253A (ja) | 2019-10-17 |
US20190186006A1 (en) | 2019-06-20 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR101791245B1 (ko) | 위치적으로 상이하게 열 소산 부재에 커플링된 실링 패널을 갖는 mocvd 반응기 | |
US7024105B2 (en) | Substrate heater assembly | |
US7615121B2 (en) | Susceptor system | |
US20130118686A1 (en) | Temperature controlled chamber liner | |
US9194044B2 (en) | Deposition apparatus and method | |
WO2013062834A1 (en) | Plasma reactor with chamber wall temperature control | |
KR20120073273A (ko) | Cvd 반응기 | |
US20120108081A1 (en) | Apparatus having improved substrate temperature uniformity using direct heating methods | |
US20190330764A1 (en) | CRUCIBLE AND SiC SINGLE CRYSTAL GROWTH APPARATUS | |
TWI385725B (zh) | A structure that reduces the deposition of polymer on the backside of the substrate | |
US7488922B2 (en) | Susceptor system | |
JP7065857B2 (ja) | サセプター | |
US11453957B2 (en) | Crystal growing apparatus and crucible having a main body portion and a first portion having a radiation rate different from that of the main body portion | |
JP5087983B2 (ja) | 炭化珪素半導体結晶膜形成装置および炭化珪素半導体結晶膜形成方法 | |
JP7347173B2 (ja) | 結晶成長装置 | |
JP7085886B2 (ja) | 遮蔽部材及び単結晶成長装置 | |
JP2007180132A (ja) | サセプタ及びそのサセプタを用いたcvd装置 | |
JP7400450B2 (ja) | SiC単結晶製造装置およびSiC単結晶の製造方法 | |
Li et al. | Susceptor | |
JP5251720B2 (ja) | 化学気相成長半導体膜形成装置および化学気相成長半導体膜形成方法 | |
US20150013608A1 (en) | Ceramic heater | |
US11453959B2 (en) | Crystal growth apparatus including heater with multiple regions and crystal growth method therefor | |
JP2020015642A (ja) | 結晶成長装置 | |
US11193207B2 (en) | Treatment chamber for a chemical vapour deposition (CVD) reactor and thermalization process carried out in this chamber | |
JP2020093974A (ja) | 結晶成長装置及び坩堝 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20190820 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20200812 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20210819 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20210830 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20211124 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20220328 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20220426 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 7065857 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |