JP6974900B2 - X線回折法システムにおける二次元検出器の空間的向きを決定する方法 - Google Patents
X線回折法システムにおける二次元検出器の空間的向きを決定する方法 Download PDFInfo
- Publication number
- JP6974900B2 JP6974900B2 JP2017099298A JP2017099298A JP6974900B2 JP 6974900 B2 JP6974900 B2 JP 6974900B2 JP 2017099298 A JP2017099298 A JP 2017099298A JP 2017099298 A JP2017099298 A JP 2017099298A JP 6974900 B2 JP6974900 B2 JP 6974900B2
- Authority
- JP
- Japan
- Prior art keywords
- detector
- orientation
- axis
- sample
- determining
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/207—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
- G01N33/0091—Powders
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/05—Investigating materials by wave or particle radiation by diffraction, scatter or reflection
- G01N2223/056—Investigating materials by wave or particle radiation by diffraction, scatter or reflection diffraction
- G01N2223/0566—Investigating materials by wave or particle radiation by diffraction, scatter or reflection diffraction analysing diffraction pattern
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/30—Accessories, mechanical or electrical features
- G01N2223/303—Accessories, mechanical or electrical features calibrating, standardising
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/30—Accessories, mechanical or electrical features
- G01N2223/32—Accessories, mechanical or electrical features adjustments of elements during operation
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/50—Detectors
- G01N2223/501—Detectors array
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biochemistry (AREA)
- Physics & Mathematics (AREA)
- Analytical Chemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Crystallography & Structural Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Food Science & Technology (AREA)
- Medicinal Chemistry (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US15/162,889 US10444169B2 (en) | 2016-05-24 | 2016-05-24 | Two-dimensional X-ray detector position calibration and correction with diffraction pattern |
| US15/162,889 | 2016-05-24 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2017211380A JP2017211380A (ja) | 2017-11-30 |
| JP2017211380A5 JP2017211380A5 (enExample) | 2020-04-30 |
| JP6974900B2 true JP6974900B2 (ja) | 2021-12-01 |
Family
ID=58709830
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017099298A Active JP6974900B2 (ja) | 2016-05-24 | 2017-05-18 | X線回折法システムにおける二次元検出器の空間的向きを決定する方法 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US10444169B2 (enExample) |
| EP (1) | EP3249393B1 (enExample) |
| JP (1) | JP6974900B2 (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7050273B2 (ja) * | 2017-08-22 | 2022-04-08 | 国立大学法人金沢大学 | 回折環計測装置 |
| FR3103897B1 (fr) * | 2019-12-02 | 2022-04-01 | Safran | Dispositif et procédé de mesure des angles d’orientation d’un système d’imagerie x |
| JP7300718B2 (ja) * | 2019-12-13 | 2023-06-30 | 株式会社リガク | 制御装置、システム、方法およびプログラム |
| US11953707B2 (en) * | 2020-01-14 | 2024-04-09 | Purdue Research Foundation | Smooth surface diffraction grating lens and method for manufacturing the same |
| CN115954070B (zh) * | 2022-12-29 | 2024-03-29 | 中国科学院福建物质结构研究所 | 一种高角度x射线孪生衍射点的衍射强度的校正方法 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20050037086A (ko) * | 2003-10-17 | 2005-04-21 | 삼성전자주식회사 | X선 회절 분석기 및 이 분석기의 측정 위치 보정방법 |
| US7190762B2 (en) * | 2004-10-29 | 2007-03-13 | Broker Axs, Inc | Scanning line detector for two-dimensional x-ray diffractometer |
| JP4581126B2 (ja) * | 2005-03-09 | 2010-11-17 | 独立行政法人物質・材料研究機構 | X線回折分析方法およびx線回折分析装置 |
| DE102009015507B4 (de) * | 2009-04-02 | 2010-12-23 | Bundesrepublik Deutschland, vertr.d.d. Bundesministerium für Wirtschaft und Technologie, d.vertr.d.d. Präsidenten der Physikalisch-Technischen Bundesanstalt | Verfahren zum Messen eines Rollwinkels und Rollwinkelmessvorrichtung |
| US8687766B2 (en) * | 2010-07-13 | 2014-04-01 | Jordan Valley Semiconductors Ltd. | Enhancing accuracy of fast high-resolution X-ray diffractometry |
| KR101256596B1 (ko) * | 2011-01-19 | 2013-04-19 | 한국표준과학연구원 | 실리콘 단결정의 비축을 이용한 x선 회절용 무반사 샘플홀더, 그 샘플홀더의 제조방법, 그 샘플홀더를 포함하는 x선 회절분석시스템 및 회절분석방법 |
-
2016
- 2016-05-24 US US15/162,889 patent/US10444169B2/en active Active
-
2017
- 2017-05-15 EP EP17170979.3A patent/EP3249393B1/en active Active
- 2017-05-18 JP JP2017099298A patent/JP6974900B2/ja active Active
Also Published As
| Publication number | Publication date |
|---|---|
| EP3249393B1 (en) | 2021-10-13 |
| US20170343490A1 (en) | 2017-11-30 |
| JP2017211380A (ja) | 2017-11-30 |
| US10444169B2 (en) | 2019-10-15 |
| EP3249393A1 (en) | 2017-11-29 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP6974900B2 (ja) | X線回折法システムにおける二次元検出器の空間的向きを決定する方法 | |
| US10620141B2 (en) | Measuring and analyzing residual stresses and their gradients in materials using high resolution grazing incidence X-ray diffraction | |
| KR102013090B1 (ko) | 평면도 측정 방법 및 핀 높이 조정 방법 | |
| Shi et al. | Calibration of crystal orientation and pattern center of EBSD using integrated digital image correlation | |
| CN112986291B (zh) | 控制装置、系统、方法以及程序 | |
| JP2017519979A (ja) | 2次元x線検出器を使用する同時格子定数精密化のための統合された逆格子空間マッピング | |
| JP5393126B2 (ja) | 透過電子顕微鏡のゴニオメ−タを利用した隣り合う結晶粒の結晶学的方位関係測定装置及びそれによる結晶粒界の特性の糾明方法 | |
| JP2017116548A (ja) | 走査2次元検出器を用いて正確なx線回折データを収集する方法 | |
| Bauch et al. | Innovative Analysis of X‐ray Microdiffraction Images on Selected Applications of the Kossel Technique | |
| EP2669711A2 (en) | Method for determination of geometrical sensor shifts in flat panel x-ray image detectors | |
| EP3019857B1 (en) | X-ray diffraction-based defective pixel correction method using an active pixel array sensor | |
| Horn et al. | Improved calibration of area detectors using multiple placements | |
| JP5470525B2 (ja) | 全反射蛍光x線分析装置 | |
| JP2016205893A (ja) | 結晶方位測定装置の校正方法 | |
| KR102205290B1 (ko) | 보조광원을 활용한 영상-기반 구조물 계측 시스템 | |
| JP3629542B2 (ja) | 蛍光x線分析装置 | |
| KR100936746B1 (ko) | Χ-선 토포그래피에 의한 결함의 3-차원 분포의 분석 | |
| US6873403B2 (en) | Halation-prevention filter, image analysis device equipped with said halation-prevention filter, and diffraction pattern intensity analysis method and diffraction pattern intensity correction program that use said halation-prevention filter | |
| WO2012136993A1 (en) | Methods, apparatuses and computer programs for crystallography | |
| CN109212585A (zh) | 一种用于检测中子单色器镶嵌角分布的测试方法及装置 | |
| CN210775283U (zh) | 一种辐射成像指标测试设备及检查装置 | |
| JPH06229953A (ja) | 単結晶材料の結晶格子面測定装置 | |
| JP6996471B2 (ja) | X線回折装置及びそれに用いられる試料配置システム | |
| RU2545503C1 (ru) | Способ определения геометрических смещений сенсоров в плоскопанельном детекторе рентгеновского изображения | |
| Henschel et al. | Application of Focal Curves for X-Ray Microdiffraction Methods |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20200323 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20200323 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20210303 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20210323 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20210525 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20211005 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20211102 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 6974900 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |