JP6947767B2 - Setting device, setting method and setting program - Google Patents

Description

The present invention relates to setting a wiring area on a substrate.

The setting of the wiring area on the printed circuit board is generally performed by using CAD (Computer-Aided Design). In the design of a printed circuit board using CAD, the wiring area of the impedance-designated wiring in which the impedance value is specified may be set. In that case, it is necessary to set the wiring prohibition layer and the reference layer in order to set the impedance value of the impedance-designated wiring to the specified value.

In that case, generally, after setting the wiring area of the impedance-designated wiring, a method of manually setting the area of the wiring prohibition layer or the reference layer by manual input is used.

Here, Patent Document 1 discloses a substrate design program used when designing a printed circuit board pattern including a wiring pattern of a differential pair line using substrate data which is design information of a printed circuit board.

Further, Patent Document 2 draws a line connecting two points in the plane on which the wiring is to be formed on the displayed three-dimensional object including the surface on which the wiring is to be formed, and describes the wiring defined by the drawn line. A wiring design support device that generates a first three-dimensional data showing a three-dimensional shape is disclosed.

Japanese Unexamined Patent Publication No. 2013-127807 Japanese Unexamined Patent Publication No. 2012-058861

However, when a person sets the input of the wiring prohibition layer or the reference layer after setting the area of the impedance designation wiring, especially when the number of wirings of the impedance designation wiring is large, the area setting omission of the wiring prohibition layer or the reference layer occurs. There is a risk.

Further, when the area setting of the impedance specified wiring is changed and then the area setting is changed, the setting of the wiring prohibition layer and the reference layer must also be changed. In that case, there is a problem that an error or forgetting to change the area setting or change of the wiring prohibition layer or the reference layer occurs, or it takes time to set or change the area.

An object of the present invention is to provide a setting device or the like that reduces the probability that an error will occur in the area setting of the wiring prohibition layer that occurs when the area of the impedance-designated wiring is set.

The setting device of the present invention sets the region of the impedance-designated wiring in the first wiring layer from the position information indicating the wiring position of the impedance-designated wiring in which the range of the impedance value is specified and the width of the impedance-designated wiring. The first wiring of the first wiring prohibition layer, which is a layer in which wiring is prohibited in the first wiring layer, which is stored at the time of storing the position information or before the storage, and the first setting unit for performing the first setting. It is provided with a second setting unit for performing a second setting, which is an area setting of the first wiring prohibition layer, in the first wiring layer from the prohibition width and the position information.

The setting device of the present invention can reduce the probability that an error will occur in the area setting of the wiring prohibition layer that occurs when the area setting of the impedance-designated wiring occurs.

It is a conceptual diagram which shows the structural example of the multilayer wiring board which the setting apparatus of this embodiment targets an area setting target. It is a conceptual diagram which shows the structural example of the setting apparatus of this embodiment. It is a conceptual diagram which shows the processing flow example of the processing performed by the setting processing unit. It is a conceptual diagram which shows the area setting result example corresponding to the 1st condition information example. It is a conceptual diagram which shows the area setting result example corresponding to the 2nd condition information example. It is a conceptual diagram which shows the area setting result example corresponding to the 3rd condition information example. It is a conceptual diagram which shows the area setting result example corresponding to the 4th condition information example. It is a conceptual diagram which shows the area setting result example corresponding to the 5th condition information example. It is a conceptual diagram which shows the area setting result example corresponding to the 6th condition information example. It is a conceptual diagram which shows the area setting result example corresponding to the 7th condition information example. It is a block diagram which shows the minimum structure of the setting apparatus of embodiment.

FIG. 1 is a conceptual diagram showing a configuration of a wiring board 200, which is an example of a multilayer wiring board for which the setting device of the present embodiment described with reference to FIG. 2 targets an area setting target. The wiring board 200 has a structure in which each of the insulating layers 31 to 33 and each of the wiring layers 21 to 23 are alternately laminated.

The setting device of the present embodiment sets each area by CAD for each of the wiring layers 21 to 23. The wiring board 200 shown in FIG. 1 has only three wiring layers, but the number of wiring layers targeted by the setting device of the present embodiment for area setting is arbitrary.

The area of the impedance-designated wiring 1 is set in the wiring layer 21. Hereinafter, the wiring layer in which the impedance specified wiring area is set will be referred to as a “reference wiring layer”. The other wiring layers can be represented by the number of layers above and below the wiring layer 21 which is the reference wiring layer. For example, the wiring layer 22 is the second lower wiring layer of the wiring layer 21 which is a reference wiring layer.

In the wiring layer 21, which is the reference wiring layer, in addition to the region of the impedance-designated wiring 1, a region of the wiring prohibition layer 61, which is a layer in which wiring is prohibited, is set adjacent to the region of the impedance-designated wiring 1. The region of the wiring prohibition layer 61 is defined by, for example, the wiring prohibition width Wf1 centered on the center line 901 of the impedance-designated wiring 1.

The outside of the region of the impedance-designated wiring 1 and the wiring prohibition layer 61 in the wiring layer 21 is the region of the writable layer 71. In the present embodiment, it is assumed that the region in which none of the impedance-designated wiring, the wiring prohibition layer, and the reference layer is set is the wiring enable layer 71.

In the example of FIG. 1, only the region of the wiring prohibition layer 61 is set in the wiring layer 22. The region of the wiring prohibition layer 61 is defined by, for example, the wiring prohibition width Wf2 centered on the projection line of the center line 901 onto the wiring layer 22.

In the example of FIG. 1, only the region of the reference layer 81 is set in the wiring layer 23. The reference layer 81 is typically a ground layer. The region of the reference layer 81 is defined by, for example, the reference layer width Wr centered on the projection line of the center line 901 onto the wiring layer 23.

Next, an example of the setting device of the present embodiment for setting the area of each wiring layer as shown in FIG. 1 will be described.

FIG. 2 is a conceptual diagram showing the configuration of the setting device 100, which is an example of the setting device of the present embodiment.

The setting device 100 includes an input processing unit 101, a setting processing unit 102, a storage unit 103, and an output unit 104. The setting device 100 is, for example, a computer.

The input processing unit 101 stores the input information input from the outside such as a keyboard and a receiving device in the storage unit 103. The input information includes condition information representing a condition for setting an area as in the example described with reference to FIG. 1.

The condition information includes at least information representing the center line of the impedance-designated wiring (corresponding to the center line 901 in FIG. 1) and the impedance-designated wiring width (corresponding to the impedance-designated wiring width Wi in FIG. 1). The center line information representing the center line is, for example, a function of the coordinates of the reference wiring layer surface.

The condition information may also include a wiring prohibition width in each wiring layer. The wiring prohibition width is associated with specific information that identifies the wiring layer that sets the region of the wiring prohibition layer. The specific information is, for example, information indicating which wiring layer is above and below the reference wiring layer as a reference.

The condition information may also include a reference layer width. The reference layer width is associated with specific information that identifies the wiring layer that sets the area of the reference layer. The specific information is, for example, information indicating which wiring layer is above and below the reference wiring layer as a reference.

In addition, it can be assumed that the condition information includes the distance (distance X shown in FIG. 1) of the end portion of the wiring prohibition layer from the impedance-designated wiring end portion instead of the wiring prohibition width. In that case, the input processing unit 101 may obtain the wiring prohibition width Wf1 = 2X + Wi from the distance X and the impedance designated wiring width Wi, and store the wiring prohibition width Wf1 in the storage unit 103. Alternatively, the input processing unit 101 may store the distance X in the storage unit 103, and the wiring prohibition width Wf1 = 2X + Wi may be derived by the processing performed by the setting processing unit 102 thereafter.

Further, it may be assumed that the condition information includes discontinuous coordinate information corresponding to the center line instead of the function representing the center line of the impedance-designated wiring. In that case, the input processing unit 101 may derive a function representing the center line from the coordinates by a spline function, an S-spline function, or the like. Alternatively, the input processing unit 101 may store the coordinate information in the storage unit 103, and the function representing the center line may be derived from the coordinate information in the subsequent processing performed by the setting processing unit 102.

Further, among the condition information, the wiring prohibition width and the reference layer width may be stored in the storage unit 103 by the input processing unit 101 before the center line information and the impedance designated wiring width. The center line information and the impedance-designated wiring width may be changed after the wiring prohibition width and the reference layer width are stored.

The setting processing unit 102 monitors whether the above-mentioned condition information is newly stored in the storage unit 103 by the input processing unit 101. When the setting processing unit 102 determines that the condition information is newly stored, the setting processing unit 102 determines that the impedance-designated wiring is wired to the reference wiring layer according to the information representing the center line of the impedance-designated wiring and the impedance-designated wiring width included in the condition information. Set the area. As described above, the information representing the center line of the impedance-designated wiring is expressed as, for example, a function of the coordinates of the reference wiring layer surface. The process of setting a predetermined line width from a line given by a function related to coordinates to an area is, for example, performed by general drawing software or CAD, and is well known.

It should be noted that the impedance-designated wiring may be assumed to be a set of two wirings having a wiring interval Wa. The pair of the two wires is, for example, a differential wire. In that case, the function representing the center line of the impedance-designated wiring is, for example, a function representing the center line of a pair of two wirings. Then, the setting processing unit 102 first sets the region of the width of 2 × Wi + Wa centered on the center line excluding the region of the wiring interval Wa centered on the center line as the wiring region of the impedance-designated wiring. Set to.

A specific example of the setting process performed by the setting processing unit 102 will be described later with reference to FIG. Further, an example of correspondence with the area setting for each wiring layer for which the setting processing has been performed from the condition information will be described later with reference to FIGS. 4 to 10.

The storage unit 103 stores information instructed by the input processing unit 101 and the setting processing unit 102. The information stored in the storage unit 103 includes the condition information from the input processing unit 101. The storage unit 103 also holds programs and information for the input processing unit 101 and the setting processing unit 102 to perform the above processing. The storage unit 103 also sends the storage information instructed by the input processing unit 101 and the setting processing unit 102 to the designated configuration included in the setting device 100.

The output unit 104 outputs the information instructed by the setting processing unit 102. The output information includes the setting processing result by the setting processing unit 102. The output unit 104 is, for example, a display or a transmission device.

FIG. 3 is a conceptual diagram showing an example of a processing flow of processing performed by the setting processing unit 102 shown in FIG.

The setting processing unit 102 starts the processing shown in FIG. 3, for example, by inputting start information from the outside.

Then, the setting processing unit 102 determines whether or not new condition information is stored as the processing of S101. The content of the condition information is as described with reference to FIG. When at least a part of the condition information held by the storage unit 103 is changed, the setting processing unit 102 determines that the condition information is newly stored.

If the determination result of the processing of S101 is yes, the setting processing unit 102 performs the processing of S102. On the other hand, when the determination result by the processing of S101 is no, the setting processing unit 102 performs the processing of S101 again.

When performing the processing of S102, the setting processing unit 102 deletes each setting area of each substrate layer set at that time as the same processing. However, if there is no setting area set at that time, the setting processing unit 102 does nothing.

Then, the setting processing unit 102 sets the impedance designation wiring area in the reference wiring layer as the processing of S103. The setting processing unit 102 performs the setting by setting the range of the impedance-designated wiring width centered on the center line of the impedance-designated wiring as the impedance-designated wiring region.

Then, the setting processing unit 102 sets the range of the designated wiring prohibition width centering on the center line of the impedance designated wiring in the wiring prohibition layer as the processing of S104. However, the setting processing unit 102 excludes the impedance-designated wiring area set by the processing of S103 from the wiring prohibition layer. The wiring prohibition width specified here is the wiring prohibition width of the reference wiring layer included in the latest condition information stored in the storage unit 103.

Next, as the process of S105, the setting processing unit 102 determines whether the latest condition information held by the storage unit 103 includes the designation of the wiring prohibition width for the wiring layer other than the reference wiring layer. ..

If the determination result of the processing of S105 is yes, the setting processing unit 102 performs the processing of S106. On the other hand, when the determination result by the processing of S105 is no, the setting processing unit 102 performs the processing of S107.

When the setting processing unit 102 performs the processing of S106, as the same processing, for each wiring layer for which the wiring prohibition width is specified in the latest condition information held by the storage unit 103, the wiring prohibition layer is set according to the wiring prohibition width. Set the area. However, since the wiring prohibition layer has already been set for the reference wiring layer, it is excluded from the wiring board to be processed in S106. In the above setting, the wiring prohibition width centered on the line assuming that the center line of the impedance-designated wiring is projected on the wiring layer is set as the region of the wiring prohibition layer. Then, the setting processing unit 102 performs the processing of S107.

When the processing of S107 is performed, the setting processing unit 102 determines whether or not the reference layer width is specified in the latest condition information held by the storage unit 103 as the same processing.

If the determination result of the processing of S107 is yes, the setting processing unit 102 performs the processing of S108. On the other hand, when the determination result by the processing of S107 is no, the setting processing unit 102 performs the processing of S109.

When performing the processing of S108, the setting processing unit 102 sets the area of the reference layer according to the reference layer width for each wiring layer for which the reference layer width is specified. In this setting, the reference layer width is set to the reference layer width centered on the line assuming that the center line of the impedance-designated wiring is projected on the wiring layer. Then, the setting processing unit 102 performs the processing of S109.

When the processing of S109 is performed, the setting processing unit 102 determines whether to end the processing shown in FIG. 3 as the same processing. The setting processing unit 102 makes the determination, for example, by determining whether or not the end information is input from the outside.

When the determination result by the process of S109 is yes, the setting processing unit 102 ends the process shown in FIG. On the other hand, when the determination result by the processing of S109 is no, the setting processing unit 102 performs the processing of S101 again.

Next, an example of the setting result when the setting processing unit 102 shown in FIG. 2 performs the processing shown in FIG. 3 will be described with reference to FIGS. 4 to 10.

FIG. 4 is a conceptual diagram showing an example of the area setting result corresponding to the first example of condition information. FIG. 4A shows condition information (No. 1) which is an example of the latest condition information held by the storage unit 103 shown in FIG. 4 (b) to 4 (d) show an example of the area setting result when the setting processing unit 102 performs the processing shown in FIG. 3 based on the condition information (No. 1) shown in FIG. 4 (a).

In the condition information (No. 1) shown in FIG. 4A, the function F1 representing the center line 901 of the impedance-designated wiring and the impedance-designated wiring width Wi are specified for the wiring layer 21 which is the reference wiring layer. Therefore, the setting processing unit 102 sets the region of the impedance-designated wiring width Wi centered on the center line 901 to the impedance-designated wiring 1 region as shown in FIG. 4B by the processing of S103 of FIG. ing.

In the condition information (No. 1) shown in FIG. 4A, the wiring prohibition width Wf1 of the wiring layer 21 is further specified. Therefore, as shown in FIG. 4B, the setting processing unit 102 excludes the region of the impedance-designated wiring 1 from the region of the wiring prohibition width Wf1 centered on the center line 901 by the processing of S104 of FIG. Is set in the area of the wiring prohibition layer 61.

In the condition information (No. 1) shown in FIG. 4A, the wiring prohibition width Wf2 is further specified for the N layer below the wiring layer 21. Therefore, as shown in FIG. 4C, the setting processing unit 102 prohibits wiring centered on each of the lines projected from the center line 901 on the N layer below the wiring layer 21 by the processing of S106 in FIG. The region of the width Wf2 is set to the region of the wiring prohibition layer 61 in each wiring layer.

In the condition information (No. 1) shown in FIG. 4A, the reference layer width Wr is further specified for the N + 1th layer below the wiring layer 21. Therefore, the setting processing unit 102 has a reference layer centered on a line obtained by projecting the center line 901 onto the N + 1th layer below the wiring layer 21, as shown in FIG. 4D, by the processing of S108 in FIG. The region of the width Wr is set to the region of the reference layer 81 in the wiring layer.

FIG. 5 is a conceptual diagram showing an example of the area setting result corresponding to the second example of condition information. FIG. 5A shows condition information (No. 2) which is an example of the latest condition information held by the storage unit 103 shown in FIG. 5 (b) to 5 (d) show an example of an area setting result when the setting processing unit 102 performs the process shown in FIG. 3 based on the condition information (No. 2) shown in FIG. 5 (a).

The description of FIGS. 5 (a) to 5 (d) is described in FIGS. 4 (a) to 4 (d) except that the function representing the center line of the impedance-designated wiring is not the function F1 shown in FIG. 4 (a) but the function F2. ) Is the same as the explanation.

FIG. 6 is a conceptual diagram showing an example of the area setting result corresponding to the third example of condition information. FIG. 6A shows condition information (No. 3) which is an example of the latest condition information held by the storage unit 103 shown in FIG. 6 (b) and 6 (c) show an example of the area setting result when the setting processing unit 102 performs the process shown in FIG. 3 based on the condition information (No. 3) shown in FIG. 6 (a).

In the condition information (No. 3) shown in FIG. 6A, the wiring prohibition width is not specified for other than the wiring layer 21 which is the reference wiring layer. Therefore, the setting processing unit 102 shown in FIG. 2 determines no by the processing of S105 shown in FIG. 3, and does not perform the processing of S106. Therefore, the wiring prohibition layer is not set for the wiring layers other than the wiring layer 21.

In the condition information (No. 3) shown in FIG. 6A, the reference layer width Wr is specified for the second layer below the wiring layer 21. Therefore, the setting processing unit 102 performs the processing of S108 of FIG. As shown in FIG. 6C, the setting processing unit 102 has a region of the reference layer width Wr centered on the line projected on the lower second (directly below) layer of the wiring layer 21 as shown in FIG. 6C. Is set in the region of the reference layer 81 in the wiring layer.

FIG. 7 is a conceptual diagram showing an example of the area setting result corresponding to the fourth example of condition information. FIG. 7A shows condition information (No. 4) which is an example of the latest condition information held by the storage unit 103 shown in FIG. 7 (b) to 7 (f) show an example of the area setting result when the setting processing unit 102 performs the process shown in FIG. 3 based on the condition information (No. 4) shown in FIG. 7 (a).

In the condition information (No. 4) shown in FIG. 7 (a), in addition to the designated information included in the condition information (No. 1) shown in FIG. 4 (a), N + 1 on the wiring layer 21 which is the reference wiring layer. The reference layer width Wr is specified for the third layer. Therefore, as shown in FIG. 7B, the setting processing unit 102 has a reference layer centered on a line obtained by projecting the center line 901 onto the N + 1th layer on the wiring layer 21 by the processing of S108 in FIG. The region of the width Wr is set to the region of the reference layer 81 in the wiring layer.

In the condition information (No. 4) shown in FIG. 7 (a), in addition to the designated information included in the condition information (No. 1) shown in FIG. 4 (a), the N layer above the wiring layer 21 is further wired. The prohibited width Wf2 is specified. Therefore, as shown in FIG. 7C, the setting processing unit 102 prohibits wiring centered on each of the lines projected on the N layer above the wiring layer 21 by the processing of S106 in FIG. The region of the width Wf2 is set to the wiring prohibition layer 61 in each wiring layer.

The contents of FIGS. 7 (d) to 7 (f) are based on the contents overlapping with the condition information (No. 1) shown in FIG. 4 (a) of the condition information (No. 4) shown in FIG. 7 (a). , The contents of FIGS. 4 (b) to 4 (d) are the same.

FIG. 8 is a conceptual diagram showing an example of the area setting result corresponding to the fifth example of condition information. FIG. 8A shows condition information (No. 5) which is an example of the latest condition information held by the storage unit 103 shown in FIG. 8 (b) to 8 (d) show an example of the area setting result when the setting processing unit 102 performs the processing shown in FIG. 3 based on the condition information (No. 5) shown in FIG. 8 (a).

In the condition information (No. 5) shown in FIG. 8A, the wiring prohibition width is not specified for other than the wiring layer 21 which is the reference wiring layer. Therefore, the setting processing unit 102 shown in FIG. 2 determines no by the processing of S105 shown in FIG. 3, and does not perform the processing of S106. Therefore, the wiring prohibition layer is not set for the wiring layers other than the wiring layer 21.

In the condition information (No. 5) shown in FIG. 8A, the reference layer width Wr is specified for the N + 1th layers above and below the wiring layer 21. Therefore, the setting processing unit 102 performs the processing of S108 of FIG. As shown in FIGS. 8 (b) and 8 (d), the setting processing unit 102 has a reference layer width Wr centered on a line obtained by projecting the center line 901 onto the upper and lower N + 1th layers of the wiring layer 21. The area is set to the area of the reference layer 81 in the wiring layer.

FIG. 9 is a conceptual diagram showing an example of the area setting result corresponding to the sixth example of condition information. FIG. 9A shows condition information (No. 6) which is an example of the latest condition information held by the storage unit 103 shown in FIG. 9 (b) to 9 (e) show an example of the area setting result when the setting processing unit 102 performs the process shown in FIG. 3 based on the condition information (No. 6) shown in FIG. 9 (a).

In the condition information (No. 6) shown in FIG. 9A, the wiring prohibition width Wf2 is specified for the N layer below the wiring layer 21 which is the reference wiring layer. Therefore, as shown in FIG. 9D, the setting processing unit 102 prohibits wiring centered on each of the lines projected from the center line 901 on the N layer below the wiring layer 21 by the processing of S106 in FIG. The region of the width Wf2 is set to the wiring prohibition layer 61 in each wiring layer.

In the condition information (No. 6) shown in FIG. 9A, the reference layer width Wr is further specified for the second wiring layer above the wiring layer 21 and the N + 1th layer below. Therefore, the setting processing unit 102 performs the processing of S108 of FIG. As shown in FIG. 9B, the setting processing unit 102 has a reference layer width Wr centered on a line obtained by projecting the center line 901 onto the second (immediately above) layer above the wiring layer 21. The area is set to the area of the reference layer 81 in the wiring layer. The setting processing unit 102 is a reference layer centered on a line obtained by projecting the center line 901 onto the N + 1th layer below the wiring layer 21 by the processing of S108 in FIG. 3 and as shown in FIG. 9 (e). The region of the width Wr is set to the region of the reference layer 81 in the wiring layer.

FIG. 10 is a conceptual diagram showing an example of the area setting result corresponding to the seventh example of condition information. FIG. 10A shows condition information (No. 7) which is an example of the latest condition information held by the storage unit 103 shown in FIG. 10 (b) to 10 (d) show an example of an area setting result when the setting processing unit 102 performs the processing shown in FIG. 3 based on the condition information (7) shown in FIG. 10 (a).

In the condition information (No. 7) shown in FIG. 10A, the center line of the impedance-designated wiring composed of a pair of two wirings is defined as the center line 901 of the impedance-designated wiring. The pair of two wires is, for example, a differential wire. Then, in the condition information (No. 7), in addition to each impedance-designated wiring width Wi, the wiring interval Wa of the two impedance-designated wirings is specified. Therefore, as shown in FIG. 10B, the setting processing unit 102 performs wiring centered on the center line 901 from a region having a width of 2 × Wi + Wa centered on the center line 901 by the processing of S103 shown in FIG. The region excluding the region of the interval Wa is set in the impedance designation wiring 1.

In the condition information (No. 7) shown in FIG. 10A, the wiring prohibition width Wf1 of the wiring layer 21 which is the reference wiring layer is further specified. Therefore, the setting processing unit 102 performs the processing of S104 of FIG. As shown in FIG. 10B, the setting processing unit 102 excludes the region of the impedance-designated wiring 1 set by the processing of S103 from the region of the wiring prohibition width Wf1 centered on the center line 901 by the same processing. The area is set to the wiring prohibition layer 61.

In the condition information (No. 7) shown in FIG. 10A, the wiring prohibition width Wf2 is further specified for the N layer below the wiring layer 21. Therefore, the setting processing unit 102 prohibits wiring centered on each of the lines projected from the center line 901 on the N layer below the wiring layer 21, as shown in FIG. 10C, by the processing of S106 in FIG. The region of the width Wf2 is set to the wiring prohibition layer 61 in each wiring layer.

In the condition information (No. 7) shown in FIG. 10A, the reference layer width Wr is further specified for the N + 1th layer below the wiring layer 21. Therefore, the setting processing unit 102 performs the processing of S108 of FIG. As shown in FIG. 10D, the setting processing unit 102 sets the region of the reference layer width Wr centered on the line projected on the N + 1th layer below the wiring layer 21 as shown in FIG. 10D. It is set in the area of the reference layer 81 in the wiring layer.
[effect]
The setting device of the present embodiment automatically sets the area of the wiring prohibition layer and the reference layer based on the preset information when the area of the impedance-designated wiring is set by CAD. Therefore, the setting device makes it easier to set or change the area of the wiring prohibition layer or the reference layer when setting the area of the impedance-designated wiring by CAD. Therefore, the setting device reduces the probability that an error will occur in the setting or change of the wiring prohibition layer or the reference layer that occurs when the area of the impedance-designated wiring is set by CAD.

FIG. 11 is a block diagram showing the configuration of the setting device 100x, which is the minimum configuration of the setting device of the embodiment.

The setting device 100x includes a first setting unit 102ax and a second setting unit 102bx.

The first setting unit 102ax is a region setting of the impedance-designated wiring in the first wiring layer from the position information indicating the wiring position of the impedance-designated wiring in which the impedance value range is designated and the width of the impedance-designated wiring. Make the first setting.

The second setting unit 102bx sets the area of the first wiring prohibition layer in the first wiring layer from the first wiring prohibition width and the position information stored at the time of storing the position information or before the storage. Make the second setting. The first wiring prohibition width is the width of the first wiring prohibition layer, which is a layer in which wiring is prohibited in the first wiring layer.

When the setting device 100x sets the area of the impedance-designated wiring, the setting device 100x automatically sets the area of the first wiring prohibition layer from the position information and the first wiring prohibition width. Therefore, the setting device reduces the probability that an error will occur in the area setting of the wiring prohibition layer when setting the area of the impedance-designated wiring.

Therefore, the setting device 100x exhibits the effects described in the section [Effects of the Invention] according to the above configuration.

The setting device 100x is, for example, the setting device 100 shown in FIG.

Further, the first setting unit 102ax is, for example, a part of the setting processing unit 102 shown in FIG. 2 that performs the processing of S103 shown in FIG.

Further, the second setting unit 102bx is, for example, a part of the setting processing unit 102 shown in FIG. 2 that performs the processing of S104 shown in FIG.

Further, the impedance-designated wiring is, for example, the impedance-designated wiring 1 shown in FIGS. 1 and 4 to 10.

Further, the position information representing the wiring position is, for example, information representing the position of the center line 901 shown in FIGS. 1 and 4 to 10.

Further, the first wiring layer is, for example, the above-mentioned reference wiring layer, and the reference wiring layer is, for example, the wiring layer 21 shown in FIGS. 1 and 4 to 10.

The first wiring prohibition layer is the wiring prohibition layer 61 shown in FIGS. 1 and 4 to 10.

Although each embodiment of the present invention has been described above, the present invention is not limited to the above-described embodiment, and further modifications, substitutions, and adjustments can be made without departing from the basic technical idea of the present invention. Can be added. For example, the composition of the elements shown in each drawing is an example for facilitating the understanding of the present invention, and is not limited to the composition shown in these drawings.

Further, a part or all of the above-described embodiment may be described as in the following appendix, but is not limited to the following.
(Appendix 1)
The first setting, which is the area setting of the impedance-designated wiring in the first wiring layer, is performed from the position information indicating the wiring position of the impedance-designated wiring in which the impedance value range is specified and the width of the impedance-designated wiring. One setting part and
From the first wiring prohibition width of the first wiring prohibition layer, which is a layer in which wiring is prohibited in the first wiring layer, and the position information stored at the time of storing the position information or before the storage, the first In the wiring layer, the second setting unit that performs the second setting, which is the area setting of the first wiring prohibition layer, and
A setting device.
(Appendix 2)
From the reference layer width which is the width of the reference layer and the position information input at the time of inputting the position information or before the input, the third setting which is the area setting of the reference layer in the second wiring layer is performed. The setting device according to Appendix 1, further comprising a third setting unit.
(Appendix 3)
The setting device according to Appendix 2, wherein the second wiring layer has a plurality of layers.
(Appendix 4)
From the third wiring prohibition width of the third wiring prohibition layer, which is a layer in which wiring is prohibited in the third wiring layer, and the position information stored at the time of storing the position information or before the storage, the third wiring In the layer, the third setting unit that performs the third setting, which is the area setting of the third wiring prohibition layer, and
The setting device according to any one of Supplementary note 1 to Supplementary note 3, wherein the device comprises.
(Appendix 5)
The setting device according to Appendix 4, wherein the third wiring layer has a plurality of layers.
(Appendix 6)
The setting device according to Appendix 5, wherein the impedance-designated wiring is a set of a plurality of wirings.
(Appendix 7)
The setting device according to Appendix 6, wherein the plurality of wires are parallel to each other.
(Appendix 8)
The setting device according to Appendix 6 or Appendix 7, wherein the plurality of the plurality is two.
(Appendix 9)
The setting device according to Appendix 8, wherein the impedance-designated wiring is a differential wiring.
(Appendix 10)
The setting device according to any one of Supplementary note 1 to Supplementary note 8, wherein the position information represents the center line of the impedance designated wiring.
(Appendix 11)
From the position information indicating the wiring position of the impedance-designated wiring in which the impedance value range is specified and the width of the impedance-designated wiring, the first setting, which is the area setting of the impedance-designated wiring in the first wiring layer, is performed.
From the first wiring prohibition width of the first wiring prohibition layer, which is a layer in which wiring is prohibited in the first wiring layer, and the position information stored at the time of storing the position information or before the storage, the first In the wiring layer, the second setting, which is the area setting of the first wiring prohibition layer, is performed.
Setting method.
(Appendix 12)
The process of performing the first setting, which is the area setting of the impedance-designated wiring in the first wiring layer, from the position information indicating the wiring position of the impedance-designated wiring in which the impedance value range is specified and the width of the impedance-designated wiring. ,
From the first wiring prohibition width of the first wiring prohibition layer, which is a layer in which wiring is prohibited in the first wiring layer, and the position information stored at the time of storing the position information or before the storage, the first In the wiring layer, the process of performing the second setting, which is the area setting of the first wiring prohibition layer,
A setting program to be executed by a computer.

1 Impedance designated wiring 21, 22, 23 Wiring layer 31, 32, 33 Insulation layer 61 Wiring prohibited layer 71 Wiringable layer 81 Reference layer 100, 100x Setting device 101 Input processing unit 102 Setting processing unit 102ax First setting unit 102bx Second Setting unit 103 Storage unit 104 Output unit 901 Center line

Claims (10)

The first setting, which is the area setting of the impedance-designated wiring in the first wiring layer, is performed from the position information indicating the wiring position of the impedance-designated wiring in which the impedance value range is specified and the width of the impedance-designated wiring. One setting part and
From the first wiring prohibition width of the first wiring prohibition layer, which is a layer in which wiring is prohibited in the first wiring layer, and the position information stored at the time of storing the position information or before the storage, the first In the wiring layer, the second setting unit that performs the second setting, which is the area setting of the first wiring prohibition layer, and
A setting device. From the reference layer width which is the width of the reference layer and the position information input at the time of inputting the position information or before the input, the third setting which is the area setting of the reference layer in the second wiring layer is performed. The setting device according to claim 1, further comprising a third setting unit. The setting device according to claim 2, wherein the second wiring layer has a plurality of layers. From the third wiring prohibition width of the third wiring prohibition layer, which is a layer in which wiring is prohibited in the third wiring layer, and the position information stored at the time of storing the position information or before the storage, the third wiring In the layer, the third setting unit that performs the third setting, which is the area setting of the third wiring prohibition layer, and
The setting device according to any one of claims 1 to 3, wherein the setting device comprises. The setting device according to claim 4, wherein the third wiring layer has a plurality of layers. The setting device according to claim 5, wherein the impedance-designated wiring is a set of a plurality of wirings. The setting device according to claim 6, wherein the impedance-designated wiring is differential wiring. The setting device according to any one of claims 1 to 7, wherein the position information represents the center line of the impedance designated wiring. The first setting unit of the setting device sets the area of the impedance-designated wiring in the first wiring layer from the position information indicating the wiring position of the impedance-designated wiring in which the impedance value range is specified and the width of the impedance-designated wiring. Make the first setting that is
Second setting portion of the setting device, the stored when storing the position information or the previously stored, the first wiring inhibition layer of the first wiring inhibition width wiring in the first wiring layer is a layer prohibited And the position information, the second setting which is the area setting of the first wiring prohibition layer in the first wiring layer is performed.
Setting method. The process of performing the first setting, which is the area setting of the impedance-designated wiring in the first wiring layer, from the position information indicating the wiring position of the impedance-designated wiring in which the impedance value range is specified and the width of the impedance-designated wiring. ,
From the first wiring prohibition width of the first wiring prohibition layer, which is a layer in which wiring is prohibited in the first wiring layer, and the position information stored at the time of storing the position information or before the storage, the first In the wiring layer, the process of performing the second setting, which is the area setting of the first wiring prohibition layer,
A setting program to be executed by a computer.

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