JP6913003B2 - 第1及び第2半体シェルを含むコンパクトな電子加速器 - Google Patents

第1及び第2半体シェルを含むコンパクトな電子加速器 Download PDF

Info

Publication number
JP6913003B2
JP6913003B2 JP2017212501A JP2017212501A JP6913003B2 JP 6913003 B2 JP6913003 B2 JP 6913003B2 JP 2017212501 A JP2017212501 A JP 2017212501A JP 2017212501 A JP2017212501 A JP 2017212501A JP 6913003 B2 JP6913003 B2 JP 6913003B2
Authority
JP
Japan
Prior art keywords
deflection
magnet
central
semifield
electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2017212501A
Other languages
English (en)
Japanese (ja)
Other versions
JP2018078101A5 (enExample
JP2018078101A (ja
Inventor
ミシェル アブス
ミシェル アブス
ウィレム クレーヴェン
ウィレム クレーヴェン
ヤルノ バンドワール
ヤルノ バンドワール
ジェレミー ブライソン
ジェレミー ブライソン
デニス デショー
デニス デショー
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ion Beam Applications SA
Original Assignee
Ion Beam Applications SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ion Beam Applications SA filed Critical Ion Beam Applications SA
Publication of JP2018078101A publication Critical patent/JP2018078101A/ja
Publication of JP2018078101A5 publication Critical patent/JP2018078101A5/ja
Application granted granted Critical
Publication of JP6913003B2 publication Critical patent/JP6913003B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • GPHYSICS
    • G21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21KTECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K5/00Irradiation devices
    • G21K5/04Irradiation devices with beam-forming means
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H7/00Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
    • H05H7/14Vacuum chambers
    • H05H7/18Cavities; Resonators
    • GPHYSICS
    • G21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21KTECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/08Deviation, concentration or focusing of the beam by electric or magnetic means
    • G21K1/093Deviation, concentration or focusing of the beam by electric or magnetic means by magnetic means
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H13/00Magnetic resonance accelerators; Cyclotrons
    • H05H13/10Accelerators comprising one or more linear accelerating sections and bending magnets or the like to return the charged particles in a trajectory parallel to the first accelerating section, e.g. microtrons or rhodotrons
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H7/00Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
    • H05H7/02Circuits or systems for supplying or feeding radio-frequency energy
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H7/00Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
    • H05H7/04Magnet systems, e.g. undulators, wigglers; Energisation thereof
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H7/00Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
    • H05H7/02Circuits or systems for supplying or feeding radio-frequency energy
    • H05H2007/025Radiofrequency systems
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H7/00Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
    • H05H7/04Magnet systems, e.g. undulators, wigglers; Energisation thereof
    • H05H2007/046Magnet systems, e.g. undulators, wigglers; Energisation thereof for beam deflection
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2245/00Applications of plasma devices
    • H05H2245/30Medical applications
    • H05H2245/36Sterilisation of objects, liquids, volumes or surfaces
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2277/00Applications of particle accelerators
    • H05H2277/14Portable devices

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma & Fusion (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Optics & Photonics (AREA)
  • Particle Accelerators (AREA)
JP2017212501A 2016-11-07 2017-11-02 第1及び第2半体シェルを含むコンパクトな電子加速器 Active JP6913003B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP16197612.1 2016-11-07
EP16197612.1A EP3319403B1 (en) 2016-11-07 2016-11-07 Compact electron accelerator comprising first and second half shells

Publications (3)

Publication Number Publication Date
JP2018078101A JP2018078101A (ja) 2018-05-17
JP2018078101A5 JP2018078101A5 (enExample) 2020-12-17
JP6913003B2 true JP6913003B2 (ja) 2021-08-04

Family

ID=57256129

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2017212501A Active JP6913003B2 (ja) 2016-11-07 2017-11-02 第1及び第2半体シェルを含むコンパクトな電子加速器

Country Status (5)

Country Link
US (1) US10249400B2 (enExample)
EP (1) EP3319403B1 (enExample)
JP (1) JP6913003B2 (enExample)
CN (2) CN207869479U (enExample)
BE (1) BE1025838B1 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3319402B1 (en) * 2016-11-07 2021-03-03 Ion Beam Applications S.A. Compact electron accelerator comprising permanent magnets
EP3319403B1 (en) * 2016-11-07 2022-01-05 Ion Beam Applications S.A. Compact electron accelerator comprising first and second half shells
CN110350287B (zh) * 2018-04-08 2021-04-06 中国科学院理化技术研究所 一种准球形谐振腔闭合判别方法
EP3661335B1 (en) * 2018-11-28 2021-06-30 Ion Beam Applications Vario-energy electron accelerator
CN109893777B (zh) * 2019-02-26 2020-06-23 中国原子能科学研究院 相位探测器及包含该相位探测器的质子束流相位稳定装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2616032B1 (fr) * 1987-05-26 1989-08-04 Commissariat Energie Atomique Accelerateur d'electrons a cavite coaxiale
FR2684512B1 (fr) * 1991-11-28 1997-04-18 Commissariat Energie Atomique Accelerateur d'electrons a cavite resonante.
JPH11214200A (ja) * 1998-01-29 1999-08-06 Nissin Electric Co Ltd 荷電粒子加速器
JP2001338800A (ja) * 2000-05-30 2001-12-07 Hitachi Ltd 中性子発生装置
EP2509399B1 (en) * 2011-04-08 2014-06-11 Ion Beam Applications Electron accelerator having a coaxial cavity
EP2804451B1 (en) 2013-05-17 2016-01-06 Ion Beam Applications S.A. Electron accelerator having a coaxial cavity
EP3319403B1 (en) * 2016-11-07 2022-01-05 Ion Beam Applications S.A. Compact electron accelerator comprising first and second half shells

Also Published As

Publication number Publication date
CN108064114B (zh) 2021-12-03
US10249400B2 (en) 2019-04-02
CN207869479U (zh) 2018-09-14
JP2018078101A (ja) 2018-05-17
BE1025838A1 (fr) 2019-07-23
BE1025838B1 (fr) 2019-10-18
US20180130568A1 (en) 2018-05-10
EP3319403A1 (en) 2018-05-09
CN108064114A (zh) 2018-05-22
EP3319403B1 (en) 2022-01-05

Similar Documents

Publication Publication Date Title
JP6913003B2 (ja) 第1及び第2半体シェルを含むコンパクトな電子加速器
JP6913002B2 (ja) 永久磁石を含むコンパクトな電子加速器
JP7076423B2 (ja) バリオエネルギー電子加速器
US8736176B2 (en) Device and method for producing and/or confining a plasma
KR102827492B1 (ko) 통합 프로세스 가스 분배를 이용하는 모놀리식 모듈러 마이크로파 소스
US20180096815A1 (en) Magnetron Having a Cooling Structure
US2872574A (en) Cloverleaf cyclotron
JP2025024058A (ja) 真空電子デバイスでの電子ビームの磁気静電検出、集束、および操向
JP7001456B2 (ja) プラズマ処理装置
CN109618484A (zh) 一种箱式谐振腔
KR102832136B1 (ko) 대형 리니어 플라즈마 소스, 이를 이용한 대형 리니어 하전입자빔 소스 및 대형 리니어 하전입자빔 소스용 그리드
JP2913232B2 (ja) ビーム加速器
EP1215302A1 (en) Sputtering device and film forming method
WO2025099727A1 (en) High power plasma switch with active magnetic cut-off control
CN120857340A (zh) 一种高效率花瓣加速器
WO2023053858A1 (ja) 高周波四重極線形加速器、中性子源システム及び高周波四重極線形加速器の製造方法
JP2001015299A (ja) 多重通過型加速器、加速空胴、及びこれらを用いた電子線・x線照射処理装置
WO2020184524A1 (ja) 加速器、及びサイクロトロン
JPH11283798A (ja) 荷電粒子ビーム加速装置及び荷電粒子ビーム蓄積リングの調整方法
JPH0378302A (ja) 高周波加速空胴
JPH04149998A (ja) 高周波加速空胴
JP2017037787A (ja) 荷電粒子源及び荷電粒子ビーム照射装置

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20201102

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20201102

A871 Explanation of circumstances concerning accelerated examination

Free format text: JAPANESE INTERMEDIATE CODE: A871

Effective date: 20201102

A975 Report on accelerated examination

Free format text: JAPANESE INTERMEDIATE CODE: A971005

Effective date: 20201105

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20210201

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20210209

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20210428

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20210615

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20210709

R150 Certificate of patent or registration of utility model

Ref document number: 6913003

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250