JP6905667B2 - Method for Producing Fumaric Acid Ester Homopolymer - Google Patents
Method for Producing Fumaric Acid Ester Homopolymer Download PDFInfo
- Publication number
- JP6905667B2 JP6905667B2 JP2017095372A JP2017095372A JP6905667B2 JP 6905667 B2 JP6905667 B2 JP 6905667B2 JP 2017095372 A JP2017095372 A JP 2017095372A JP 2017095372 A JP2017095372 A JP 2017095372A JP 6905667 B2 JP6905667 B2 JP 6905667B2
- Authority
- JP
- Japan
- Prior art keywords
- fumarate
- fumaric acid
- acid ester
- group
- ethyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- -1 Fumaric Acid Ester Chemical class 0.000 title claims description 69
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Natural products OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 title claims description 58
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 title claims description 52
- 239000001530 fumaric acid Substances 0.000 title claims description 42
- 229920001519 homopolymer Polymers 0.000 title claims description 11
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 239000000203 mixture Substances 0.000 claims description 30
- 150000002148 esters Chemical group 0.000 claims description 14
- 230000001678 irradiating effect Effects 0.000 claims description 14
- 125000000217 alkyl group Chemical group 0.000 claims description 12
- 239000003999 initiator Substances 0.000 claims description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 230000003287 optical effect Effects 0.000 description 19
- 238000005259 measurement Methods 0.000 description 18
- 238000006116 polymerization reaction Methods 0.000 description 15
- 150000001875 compounds Chemical class 0.000 description 13
- 239000010408 film Substances 0.000 description 11
- 239000000463 material Substances 0.000 description 7
- 229920000642 polymer Polymers 0.000 description 7
- 239000011248 coating agent Substances 0.000 description 6
- MSVGHYYKWDQHFV-BQYQJAHWSA-N ditert-butyl (e)-but-2-enedioate Chemical compound CC(C)(C)OC(=O)\C=C\C(=O)OC(C)(C)C MSVGHYYKWDQHFV-BQYQJAHWSA-N 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 239000000853 adhesive Substances 0.000 description 5
- 230000001070 adhesive effect Effects 0.000 description 5
- JBSLOWBPDRZSMB-BQYQJAHWSA-N dibutyl (e)-but-2-enedioate Chemical compound CCCCOC(=O)\C=C\C(=O)OCCCC JBSLOWBPDRZSMB-BQYQJAHWSA-N 0.000 description 5
- DSTWFRCNXMNXTR-AATRIKPKSA-N dipropyl (e)-but-2-enedioate Chemical compound CCCOC(=O)\C=C\C(=O)OCCC DSTWFRCNXMNXTR-AATRIKPKSA-N 0.000 description 5
- 238000010526 radical polymerization reaction Methods 0.000 description 5
- ROPXFXOUUANXRR-BUHFOSPRSA-N bis(2-ethylhexyl) (e)-but-2-enedioate Chemical compound CCCCC(CC)COC(=O)\C=C\C(=O)OCC(CC)CCCC ROPXFXOUUANXRR-BUHFOSPRSA-N 0.000 description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 4
- 239000000976 ink Substances 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- CZFQVAZEWFKUTC-VOTSOKGWSA-N 4-o-tert-butyl 1-o-ethyl (e)-but-2-enedioate Chemical compound CCOC(=O)\C=C\C(=O)OC(C)(C)C CZFQVAZEWFKUTC-VOTSOKGWSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 3
- 239000012298 atmosphere Substances 0.000 description 3
- 125000004432 carbon atom Chemical group C* 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000003973 paint Substances 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- ZBOWSUWXPQRALP-VOTSOKGWSA-N (E)-4-hexan-3-yloxy-4-oxobut-2-enoic acid Chemical compound CCCC(CC)OC(=O)\C=C\C(O)=O ZBOWSUWXPQRALP-VOTSOKGWSA-N 0.000 description 2
- XLYMOEINVGRTEX-ONEGZZNKSA-N (e)-4-ethoxy-4-oxobut-2-enoic acid Chemical compound CCOC(=O)\C=C\C(O)=O XLYMOEINVGRTEX-ONEGZZNKSA-N 0.000 description 2
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 2
- UHFFVFAKEGKNAQ-UHFFFAOYSA-N 2-benzyl-2-(dimethylamino)-1-(4-morpholin-4-ylphenyl)butan-1-one Chemical compound C=1C=C(N2CCOCC2)C=CC=1C(=O)C(CC)(N(C)C)CC1=CC=CC=C1 UHFFVFAKEGKNAQ-UHFFFAOYSA-N 0.000 description 2
- XMLYCEVDHLAQEL-UHFFFAOYSA-N 2-hydroxy-2-methyl-1-phenylpropan-1-one Chemical compound CC(C)(O)C(=O)C1=CC=CC=C1 XMLYCEVDHLAQEL-UHFFFAOYSA-N 0.000 description 2
- LWRBVKNFOYUCNP-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-morpholin-4-ylpropan-1-one Chemical compound C1=CC(SC)=CC=C1C(=O)C(C)(C)N1CCOCC1 LWRBVKNFOYUCNP-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- KITWNHAYBHUALA-AATRIKPKSA-N CCC(CC)OC(=O)\C=C\C(O)=O Chemical compound CCC(CC)OC(=O)\C=C\C(O)=O KITWNHAYBHUALA-AATRIKPKSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 125000005396 acrylic acid ester group Chemical group 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- 238000010538 cationic polymerization reaction Methods 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 238000003776 cleavage reaction Methods 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- NNBZCPXTIHJBJL-UHFFFAOYSA-N decalin Chemical compound C1CCCC2CCCCC21 NNBZCPXTIHJBJL-UHFFFAOYSA-N 0.000 description 2
- XLYMOEINVGRTEX-UHFFFAOYSA-N fumaric acid monoethyl ester Natural products CCOC(=O)C=CC(O)=O XLYMOEINVGRTEX-UHFFFAOYSA-N 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229940074369 monoethyl fumarate Drugs 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 150000003254 radicals Chemical class 0.000 description 2
- 230000007017 scission Effects 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- 238000012719 thermal polymerization Methods 0.000 description 2
- QNODIIQQMGDSEF-UHFFFAOYSA-N (1-hydroxycyclohexyl)-phenylmethanone Chemical compound C=1C=CC=CC=1C(=O)C1(O)CCCCC1 QNODIIQQMGDSEF-UHFFFAOYSA-N 0.000 description 1
- AGPNRKQCEATQFT-ZHACJKMWSA-N (E)-4-decan-3-yloxy-4-oxobut-2-enoic acid Chemical compound CCCCCCCC(CC)OC(=O)\C=C\C(O)=O AGPNRKQCEATQFT-ZHACJKMWSA-N 0.000 description 1
- QVZKKRNUFOGLQZ-MDZDMXLPSA-N (E)-4-nonan-3-yloxy-4-oxobut-2-enoic acid Chemical compound CCCCCCC(CC)OC(=O)/C=C/C(=O)O QVZKKRNUFOGLQZ-MDZDMXLPSA-N 0.000 description 1
- IQBLWPLYPNOTJC-BQYQJAHWSA-N (e)-4-(2-ethylhexoxy)-4-oxobut-2-enoic acid Chemical compound CCCCC(CC)COC(=O)\C=C\C(O)=O IQBLWPLYPNOTJC-BQYQJAHWSA-N 0.000 description 1
- BAXKSCVINAKVNE-SNAWJCMRSA-N (e)-4-[(2-methylpropan-2-yl)oxy]-4-oxobut-2-enoic acid Chemical compound CC(C)(C)OC(=O)\C=C\C(O)=O BAXKSCVINAKVNE-SNAWJCMRSA-N 0.000 description 1
- UTOVMEACOLCUCK-SNAWJCMRSA-N (e)-4-butoxy-4-oxobut-2-enoic acid Chemical compound CCCCOC(=O)\C=C\C(O)=O UTOVMEACOLCUCK-SNAWJCMRSA-N 0.000 description 1
- VPTNWGPGDXUKCY-ZHACJKMWSA-N (e)-4-decoxy-4-oxobut-2-enoic acid Chemical compound CCCCCCCCCCOC(=O)\C=C\C(O)=O VPTNWGPGDXUKCY-ZHACJKMWSA-N 0.000 description 1
- IIPCXIGUIPAGQB-OUKQBFOZSA-N (e)-4-dodecoxy-4-oxobut-2-enoic acid Chemical compound CCCCCCCCCCCCOC(=O)\C=C\C(O)=O IIPCXIGUIPAGQB-OUKQBFOZSA-N 0.000 description 1
- CUOOOYOREBCEAQ-ISLYRVAYSA-N (e)-4-heptadecoxy-4-oxobut-2-enoic acid Chemical compound CCCCCCCCCCCCCCCCCOC(=O)\C=C\C(O)=O CUOOOYOREBCEAQ-ISLYRVAYSA-N 0.000 description 1
- YXIQOXQGELPIFQ-WUKNDPDISA-N (e)-4-hexadecoxy-4-oxobut-2-enoic acid Chemical compound CCCCCCCCCCCCCCCCOC(=O)\C=C\C(O)=O YXIQOXQGELPIFQ-WUKNDPDISA-N 0.000 description 1
- RNERBJNDXXEXTK-VOTSOKGWSA-N (e)-4-hexoxy-4-oxobut-2-enoic acid Chemical compound CCCCCCOC(=O)\C=C\C(O)=O RNERBJNDXXEXTK-VOTSOKGWSA-N 0.000 description 1
- ZUWTZMUABDXFJW-MDZDMXLPSA-N (e)-4-nonoxy-4-oxobut-2-enoic acid Chemical compound CCCCCCCCCOC(=O)\C=C\C(O)=O ZUWTZMUABDXFJW-MDZDMXLPSA-N 0.000 description 1
- MHQJUHSHQGQVTM-VHEBQXMUSA-N (e)-4-octadecoxy-4-oxobut-2-enoic acid Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)\C=C\C(O)=O MHQJUHSHQGQVTM-VHEBQXMUSA-N 0.000 description 1
- XXURNZLYJUXXCF-CMDGGOBGSA-N (e)-4-octan-3-yloxy-4-oxobut-2-enoic acid Chemical compound CCCCCC(CC)OC(=O)\C=C\C(O)=O XXURNZLYJUXXCF-CMDGGOBGSA-N 0.000 description 1
- VTWGIDKXXZRLGH-CMDGGOBGSA-N (e)-4-octoxy-4-oxobut-2-enoic acid Chemical compound CCCCCCCCOC(=O)\C=C\C(O)=O VTWGIDKXXZRLGH-CMDGGOBGSA-N 0.000 description 1
- AXKKHKOJPYVIKN-FOCLMDBBSA-N (e)-4-oxo-4-pentadecoxybut-2-enoic acid Chemical compound CCCCCCCCCCCCCCCOC(=O)\C=C\C(O)=O AXKKHKOJPYVIKN-FOCLMDBBSA-N 0.000 description 1
- BOFGUJVLYGISIU-AATRIKPKSA-N (e)-4-oxo-4-pentoxybut-2-enoic acid Chemical compound CCCCCOC(=O)\C=C\C(O)=O BOFGUJVLYGISIU-AATRIKPKSA-N 0.000 description 1
- AYAUWVRAUCDBFR-ONEGZZNKSA-N (e)-4-oxo-4-propoxybut-2-enoic acid Chemical compound CCCOC(=O)\C=C\C(O)=O AYAUWVRAUCDBFR-ONEGZZNKSA-N 0.000 description 1
- DQHWXDMKGYBSRD-CCEZHUSRSA-N (e)-4-oxo-4-tetradecoxybut-2-enoic acid Chemical compound CCCCCCCCCCCCCCOC(=O)\C=C\C(O)=O DQHWXDMKGYBSRD-CCEZHUSRSA-N 0.000 description 1
- FGACNJFGXDUISO-BUHFOSPRSA-N (e)-4-oxo-4-tridecoxybut-2-enoic acid Chemical compound CCCCCCCCCCCCCOC(=O)\C=C\C(O)=O FGACNJFGXDUISO-BUHFOSPRSA-N 0.000 description 1
- HLSDOKOCNQHWHV-VAWYXSNFSA-N (e)-4-oxo-4-undecoxybut-2-enoic acid Chemical compound CCCCCCCCCCCOC(=O)\C=C\C(O)=O HLSDOKOCNQHWHV-VAWYXSNFSA-N 0.000 description 1
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 1
- AZUHIVLOSAPWDM-UHFFFAOYSA-N 2-(1h-imidazol-2-yl)-1h-imidazole Chemical class C1=CNC(C=2NC=CN=2)=N1 AZUHIVLOSAPWDM-UHFFFAOYSA-N 0.000 description 1
- JMVZGKVGQDHWOI-UHFFFAOYSA-N 2-(2-methylpropoxy)-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC(C)C)C(=O)C1=CC=CC=C1 JMVZGKVGQDHWOI-UHFFFAOYSA-N 0.000 description 1
- GJKGAPPUXSSCFI-UHFFFAOYSA-N 2-Hydroxy-4'-(2-hydroxyethoxy)-2-methylpropiophenone Chemical compound CC(C)(O)C(=O)C1=CC=C(OCCO)C=C1 GJKGAPPUXSSCFI-UHFFFAOYSA-N 0.000 description 1
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 1
- SJEBAWHUJDUKQK-UHFFFAOYSA-N 2-ethylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC=C3C(=O)C2=C1 SJEBAWHUJDUKQK-UHFFFAOYSA-N 0.000 description 1
- PCKZAVNWRLEHIP-UHFFFAOYSA-N 2-hydroxy-1-[4-[[4-(2-hydroxy-2-methylpropanoyl)phenyl]methyl]phenyl]-2-methylpropan-1-one Chemical compound C1=CC(C(=O)C(C)(O)C)=CC=C1CC1=CC=C(C(=O)C(C)(C)O)C=C1 PCKZAVNWRLEHIP-UHFFFAOYSA-N 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- RDBRSAXZVONJOL-UHFFFAOYSA-N 2-methoxyacetic acid;propane-1,2-diol Chemical compound CC(O)CO.COCC(O)=O RDBRSAXZVONJOL-UHFFFAOYSA-N 0.000 description 1
- YTPSFXZMJKMUJE-UHFFFAOYSA-N 2-tert-butylanthracene-9,10-dione Chemical compound C1=CC=C2C(=O)C3=CC(C(C)(C)C)=CC=C3C(=O)C2=C1 YTPSFXZMJKMUJE-UHFFFAOYSA-N 0.000 description 1
- CLPFFLWZZBQMAO-UHFFFAOYSA-N 4-(5,6,7,8-tetrahydroimidazo[1,5-a]pyridin-5-yl)benzonitrile Chemical compound C1=CC(C#N)=CC=C1C1N2C=NC=C2CCC1 CLPFFLWZZBQMAO-UHFFFAOYSA-N 0.000 description 1
- SAFXRWJUFXUQOY-CMDGGOBGSA-N 4-o-cyclohexyl 1-o-ethyl (e)-but-2-enedioate Chemical compound CCOC(=O)\C=C\C(=O)OC1CCCCC1 SAFXRWJUFXUQOY-CMDGGOBGSA-N 0.000 description 1
- JDOZUYVDIAKODH-SNAWJCMRSA-N 4-o-ethyl 1-o-methyl (e)-but-2-enedioate Chemical compound CCOC(=O)\C=C\C(=O)OC JDOZUYVDIAKODH-SNAWJCMRSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- SUOQCNKFNVQCMO-CCEZHUSRSA-N CCCCCCCCCCCC(CC)OC(=O)\C=C\C(O)=O Chemical compound CCCCCCCCCCCC(CC)OC(=O)\C=C\C(O)=O SUOQCNKFNVQCMO-CCEZHUSRSA-N 0.000 description 1
- QVYVNSKIIQQVCZ-VHEBQXMUSA-N CCCCCCCCCCCCCCCC(CC)OC(=O)\C=C\C(O)=O Chemical compound CCCCCCCCCCCCCCCC(CC)OC(=O)\C=C\C(O)=O QVYVNSKIIQQVCZ-VHEBQXMUSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- PMVSDNDAUGGCCE-TYYBGVCCSA-L Ferrous fumarate Chemical compound [Fe+2].[O-]C(=O)\C=C\C([O-])=O PMVSDNDAUGGCCE-TYYBGVCCSA-L 0.000 description 1
- 229930194542 Keto Natural products 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical class C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 1
- DHXVGJBLRPWPCS-UHFFFAOYSA-N Tetrahydropyran Chemical compound C1CCOCC1 DHXVGJBLRPWPCS-UHFFFAOYSA-N 0.000 description 1
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical group C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 1
- GUCYFKSBFREPBC-UHFFFAOYSA-N [phenyl-(2,4,6-trimethylbenzoyl)phosphoryl]-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C(=O)C1=C(C)C=C(C)C=C1C GUCYFKSBFREPBC-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 125000005907 alkyl ester group Chemical group 0.000 description 1
- 150000004645 aluminates Chemical class 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- 230000003373 anti-fouling effect Effects 0.000 description 1
- 150000001491 aromatic compounds Chemical class 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 150000008366 benzophenones Chemical class 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- MQDJYUACMFCOFT-UHFFFAOYSA-N bis[2-(1-hydroxycyclohexyl)phenyl]methanone Chemical compound C=1C=CC=C(C(=O)C=2C(=CC=CC=2)C2(O)CCCCC2)C=1C1(O)CCCCC1 MQDJYUACMFCOFT-UHFFFAOYSA-N 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 125000006165 cyclic alkyl group Chemical group 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- PESYEWKSBIWTAK-UHFFFAOYSA-N cyclopenta-1,3-diene;titanium(2+) Chemical compound [Ti+2].C=1C=C[CH-]C=1.C=1C=C[CH-]C=1 PESYEWKSBIWTAK-UHFFFAOYSA-N 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000006356 dehydrogenation reaction Methods 0.000 description 1
- BLKQQTCUGZJWLN-VAWYXSNFSA-N dicyclohexyl (e)-but-2-enedioate Chemical compound C1CCCCC1OC(=O)/C=C/C(=O)OC1CCCCC1 BLKQQTCUGZJWLN-VAWYXSNFSA-N 0.000 description 1
- BVVRPLNLVUMGSL-FMQUCBEESA-N didecyl (e)-but-2-enedioate Chemical compound CCCCCCCCCCOC(=O)\C=C\C(=O)OCCCCCCCCCC BVVRPLNLVUMGSL-FMQUCBEESA-N 0.000 description 1
- HEJZJSIRBLOWPD-WCWDXBQESA-N didodecyl (e)-but-2-enedioate Chemical compound CCCCCCCCCCCCOC(=O)\C=C\C(=O)OCCCCCCCCCCCC HEJZJSIRBLOWPD-WCWDXBQESA-N 0.000 description 1
- IEPRKVQEAMIZSS-AATRIKPKSA-N diethyl fumarate Chemical compound CCOC(=O)\C=C\C(=O)OCC IEPRKVQEAMIZSS-AATRIKPKSA-N 0.000 description 1
- ZUWLIWZVBOETHU-JEIPZWNWSA-N diheptadecyl (e)-but-2-enedioate Chemical compound CCCCCCCCCCCCCCCCCOC(=O)\C=C\C(=O)OCCCCCCCCCCCCCCCCC ZUWLIWZVBOETHU-JEIPZWNWSA-N 0.000 description 1
- KUUZQLFCCOGXKQ-BUHFOSPRSA-N diheptyl (e)-but-2-enedioate Chemical compound CCCCCCCOC(=O)\C=C\C(=O)OCCCCCCC KUUZQLFCCOGXKQ-BUHFOSPRSA-N 0.000 description 1
- NXQIBFMKDQPBGW-QNEJGDQOSA-N dihexadecyl (e)-but-2-enedioate Chemical compound CCCCCCCCCCCCCCCCOC(=O)\C=C\C(=O)OCCCCCCCCCCCCCCCC NXQIBFMKDQPBGW-QNEJGDQOSA-N 0.000 description 1
- KJSFAWHPSSOGNK-XQQUEIPISA-N diicosyl (E)-but-2-enedioate Chemical compound CCCCCCCCCCCCCCCCCCCCOC(=O)\C=C\C(=O)OCCCCCCCCCCCCCCCCCCCC KJSFAWHPSSOGNK-XQQUEIPISA-N 0.000 description 1
- LDCRTTXIJACKKU-ONEGZZNKSA-N dimethyl fumarate Chemical compound COC(=O)\C=C\C(=O)OC LDCRTTXIJACKKU-ONEGZZNKSA-N 0.000 description 1
- 229960004419 dimethyl fumarate Drugs 0.000 description 1
- XHSDDKAGJYJAQM-ULDVOPSXSA-N dioctadecyl (e)-but-2-enedioate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)\C=C\C(=O)OCCCCCCCCCCCCCCCCCC XHSDDKAGJYJAQM-ULDVOPSXSA-N 0.000 description 1
- TVWTZAGVNBPXHU-FOCLMDBBSA-N dioctyl (e)-but-2-enedioate Chemical compound CCCCCCCCOC(=O)\C=C\C(=O)OCCCCCCCC TVWTZAGVNBPXHU-FOCLMDBBSA-N 0.000 description 1
- NFCMRHDORQSGIS-MDZDMXLPSA-N dipentyl (e)-but-2-enedioate Chemical compound CCCCCOC(=O)\C=C\C(=O)OCCCCC NFCMRHDORQSGIS-MDZDMXLPSA-N 0.000 description 1
- DKKXSNXGIOPYGQ-UHFFFAOYSA-N diphenylphosphanyl-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(C=1C=CC=CC=1)C1=CC=CC=C1 DKKXSNXGIOPYGQ-UHFFFAOYSA-N 0.000 description 1
- DYVHFPDDBMMBAX-BYYHNAKLSA-N ditetradecyl (e)-but-2-enedioate Chemical compound CCCCCCCCCCCCCCOC(=O)\C=C\C(=O)OCCCCCCCCCCCCCC DYVHFPDDBMMBAX-BYYHNAKLSA-N 0.000 description 1
- DFKBFBPHOGVNGQ-OCEACIFDSA-N ditridecyl (e)-but-2-enedioate Chemical compound CCCCCCCCCCCCCOC(=O)\C=C\C(=O)OCCCCCCCCCCCCC DFKBFBPHOGVNGQ-OCEACIFDSA-N 0.000 description 1
- FBVIPHHSIBKNAH-QURGRASLSA-N diundecyl (e)-but-2-enedioate Chemical compound CCCCCCCCCCCOC(=O)\C=C\C(=O)OCCCCCCCCCCC FBVIPHHSIBKNAH-QURGRASLSA-N 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- NKHAVTQWNUWKEO-UHFFFAOYSA-N fumaric acid monomethyl ester Natural products COC(=O)C=CC(O)=O NKHAVTQWNUWKEO-UHFFFAOYSA-N 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 238000007646 gravure printing Methods 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 229940079865 intestinal antiinfectives imidazole derivative Drugs 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000000468 ketone group Chemical group 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000012778 molding material Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- NKHAVTQWNUWKEO-NSCUHMNNSA-N monomethyl fumarate Chemical compound COC(=O)\C=C\C(O)=O NKHAVTQWNUWKEO-NSCUHMNNSA-N 0.000 description 1
- 229940005650 monomethyl fumarate Drugs 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003136 n-heptyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 238000007645 offset printing Methods 0.000 description 1
- 150000001451 organic peroxides Chemical class 0.000 description 1
- MPQXHAGKBWFSNV-UHFFFAOYSA-N oxidophosphanium Chemical class [PH3]=O MPQXHAGKBWFSNV-UHFFFAOYSA-N 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 125000003356 phenylsulfanyl group Chemical group [*]SC1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical class C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- 230000001960 triggered effect Effects 0.000 description 1
- 229920006305 unsaturated polyester Polymers 0.000 description 1
- PXXNTAGJWPJAGM-UHFFFAOYSA-N vertaline Natural products C1C2C=3C=C(OC)C(OC)=CC=3OC(C=C3)=CC=C3CCC(=O)OC1CC1N2CCCC1 PXXNTAGJWPJAGM-UHFFFAOYSA-N 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Polymerisation Methods In General (AREA)
Description
本発明は、光重合によりフマル酸エステルホモポリマーを製造する方法に関する。 The present invention relates to a method for producing a fumaric acid ester homopolymer by photopolymerization.
紫外線等のエネルギー線を照射することにより重合する光重合性組成物が広くさまざまな用途で使用されている。この光重合性組成物としては、ラジカル重合型とカチオン重合型とがある。ラジカル重合型としては、(メタ)アクリロイル基を有する化合物、不飽和ポリエステル系化合物等の不飽和二重結合を有する化合物が知られており、カチオン重合型としては、エポキシ基を有する化合物、ビニルエーテル基を有する化合物等が知られている。一般に、ラジカル重合型は、重合速度が速く、生成する塗膜硬度が高いという特徴を持つが、基材との密着性が弱いという欠点がある。また、酸素の影響を受けやすく、特に薄膜の生成においては窒素封入などの設備が必要となる。また、(メタ)アクリロイル基を有する化合物は、粘度が高いため、取扱い上、難がある。 Photopolymerizable compositions that polymerize by irradiating with energy rays such as ultraviolet rays are widely used in various applications. The photopolymerizable composition includes a radical polymerization type and a cationic polymerization type. As the radical polymerization type, a compound having an (meth) acryloyl group and a compound having an unsaturated double bond such as an unsaturated polyester compound are known, and as a cationic polymerization type, a compound having an epoxy group and a vinyl ether group are known. Compounds and the like having the above are known. In general, the radical polymerization type has a feature that the polymerization rate is high and the hardness of the coating film formed is high, but it has a drawback that the adhesion to the substrate is weak. In addition, it is easily affected by oxygen, and equipment such as nitrogen filling is required especially for the formation of thin films. Further, a compound having a (meth) acryloyl group has a high viscosity and is therefore difficult to handle.
一方、フマル酸ジアルキルエステル化合物は、(メタ)アクリロイル基を有する化合物同様、ラジカル重合することが知られており、高いガラス転移温度を有し、耐熱性に優れ、無色透明であることから、種々のフマル酸ジアルキルエステルポリマーが合成されている(特許文献1)。しかしながら、フマル酸ジアルキルエステル化合物は単独重合しづらく、他の重合性化合物と共重合させる方法が一般的である。また、フマル酸ジアルキルエステル化合物を単独重合させる方法も近年開発されつつある(特許文献2、3、4)。しかしながら、特許文献1には、光重合によるフマル酸ジアルキルエステルポリマーの製造例が記載されているが、フマル酸ジアルキルエステルポリマーを単独重合させた例は記載されていない。また、特許文献2、3には、フマル酸ジアルキルエステル化合物を単独重合させた例が記載されているが、これは熱重合による方法であり、光重合による方法については何ら記載されていない。さらに、特許文献4には、光重合によりフマル酸ジエステルを単独重合させた例が記載されているが、フマル酸ジエステルのエステル部位は極めて複雑な構造をしており、構造が単純なアルキル鎖をエステル部位にもつフマル酸アルキルエステル化合物の光重合による単独重合については何ら記載されていない。一般に、フマル酸ジエステルはエステル部位に立体障害の大きい置換基を導入することにより、ラジカル重合を容易に行わせることができるが、立体障害が小さく、構造が単純なアルキル鎖をエステル部位にもつフマル酸アルキルエステル化合物の光重合は困難であることが知られている。 On the other hand, fumaric acid dialkyl ester compounds are known to undergo radical polymerization like compounds having a (meth) acryloyl group, have a high glass transition temperature, have excellent heat resistance, and are colorless and transparent. The fumaric acid dialkyl ester polymer is synthesized (Patent Document 1). However, the fumaric acid dialkyl ester compound is difficult to homopolymerize, and a method of copolymerizing with another polymerizable compound is common. Further, a method for homopolymerizing a fumaric acid dialkyl ester compound has also been developed in recent years (Patent Documents 2, 3 and 4). However, Patent Document 1 describes an example of producing a fumaric acid dialkyl ester polymer by photopolymerization, but does not describe an example of homopolymerizing a fumaric acid dialkyl ester polymer. Further, Patent Documents 2 and 3 describe an example in which a fumaric acid dialkyl ester compound is homopolymerized, but this is a method by thermal polymerization, and no method by photopolymerization is described. Further, Patent Document 4 describes an example in which fumaric acid diester is homopolymerized by photopolymerization, but the ester moiety of fumaric acid diester has an extremely complicated structure, and an alkyl chain having a simple structure is used. No description is given about homopolymerization of the fumaric acid alkyl ester compound at the ester moiety by photopolymerization. In general, fumaric acid diester can easily carry out radical polymerization by introducing a substituent having a large steric hindrance into the ester moiety, but fumaric acid diester has an alkyl chain having a small steric hindrance and a simple structure at the ester moiety. Photopolymerization of acid alkyl ester compounds is known to be difficult.
一方、近年、UV−LEDの開発が目覚ましく、365nmUV−LED、385nmUV−LED、395nmUV−LED、405nmUV−LED等様々な波長範囲のUV−LEDが市場に出てきており、熱重合よりも効率よくポリマーを得る方法として注目を集めている。 On the other hand, in recent years, the development of UV-LED has been remarkable, and UV-LEDs in various wavelength ranges such as 365 nmUV-LED, 385 nmUV-LED, 395 nmUV-LED, and 405 nmUV-LED have appeared on the market, and are more efficient than thermal polymerization. It is attracting attention as a method for obtaining polymers.
本発明の目的は、光重合により、構造が単純なアルキル鎖をエステル部位にもつフマル酸エステル化合物を単独重合させることにより、フマル酸エステルホモポリマーを製造する方法を提供することにある。 An object of the present invention is to provide a method for producing a fumaric acid ester homopolymer by homopolymerizing a fumaric acid ester compound having an alkyl chain having a simple structure at an ester moiety by photopolymerization.
本発明者は、フマル酸エステル化合物の構造と光重合特定について鋭意検討した結果、エステル部位の構造が単純なアルキル鎖をもつフマル酸エステル化合物でも、特定の波長範囲の光源を用いて光重合することにより、容易にフマル酸エステルホモポリマーを得ることができることを見出し、本発明を完成させた。 As a result of diligent studies on the structure of the fumaric acid ester compound and the specification of photopolymerization, the present inventor photopolymerizes even a fumaric acid ester compound having an alkyl chain having a simple ester site structure using a light source in a specific wavelength range. As a result, it was found that a fumaric acid ester homopolymer can be easily obtained, and the present invention has been completed.
すなわち、本発明の第一の要旨は、少なくとも一般式(1)で表されるフマル酸エステル化合物と、光重合開始剤を含有する光重合性組成物を、光源として波長範囲が365nmから405nmの光を照射することにより、光重合することを特徴とするフマル酸エステルホモポリマーの製造方法に存する。 That is, the first gist of the present invention is to use a photopolymerizable composition containing at least the fumaric acid ester compound represented by the general formula (1) and a photopolymerization initiator as a light source and have a wavelength range of 365 nm to 405 nm. A method for producing a fumaric acid ester homopolymer, which comprises photopolymerizing by irradiating with light.
(上記一般式(1)において、R1、R2は、水素原子又は炭素数1から20のアルキル基のいずれかを表す。ただし、R1及びR2が共に水素原子となることはない。) (In the above general formula (1), R 1 and R 2 represent either a hydrogen atom or an alkyl group having 1 to 20 carbon atoms. However, both R 1 and R 2 do not become hydrogen atoms. )
本発明の第二の要旨は、エネルギー線を照射する光源がUV−LEDである第一の要旨に記載のフマル酸エステルホモポリマーの製造方法に存する。 A second gist of the present invention lies in the method for producing a fumaric acid ester homopolymer described in the first gist, wherein the light source for irradiating energy rays is a UV-LED.
本発明の第三の要旨は、UV−LEDが385nmUV−LED、395nmUV−LED又は405nmUV−LEDのいずれかである第二の要旨に記載のフマル酸エステルホモポリマーの製造方法に存する。 A third gist of the present invention resides in the method for producing a fumaric acid ester homopolymer according to the second gist, wherein the UV-LED is either a 385 nm UV-LED, a 395 nm UV-LED or a 405 nm UV-LED.
本発明では、波長範囲が365nmから405nmの光を照射することにより、エステル部位の構造が単純なアルキル鎖をもつフマル酸エステル化合物を単独重合させることができ、効率的にフマル酸エステルホモポリマーを得る事ができる。 In the present invention, by irradiating light having a wavelength range of 365 nm to 405 nm, a fumaric acid ester compound having an alkyl chain having a simple ester moiety structure can be homopolymerized, and a fumaric acid ester homopolymer can be efficiently produced. You can get it.
以下、本発明について詳細に説明する。 Hereinafter, the present invention will be described in detail.
(光重合性組成物)
本発明は、少なくとも一般式(1)で表されるフマル酸エステル化合物と、光重合開始剤を含有する光重合性組成物を用いる。
(Photopolymerizable composition)
The present invention uses a photopolymerizable composition containing at least a fumaric acid ester compound represented by the general formula (1) and a photopolymerization initiator.
(上記一般式(1)において、R1、R2は、水素原子又は炭素数1から20のアルキル基のいずれかを表す。ただし、R1及びR2が共に水素原子となることはない。) (In the above general formula (1), R 1 and R 2 represent either a hydrogen atom or an alkyl group having 1 to 20 carbon atoms. However, both R 1 and R 2 do not become hydrogen atoms. )
R1及びR2で表される炭素数1から20のアルキル基としてはメチル基、エチル基、n−プロピル基、i−プロピル基、n−ブチル基、i−ブチル基、t−ブチル基、n−アミル基、i−アミル基、n−ヘキシル基、n−ヘプチル基、n−オクチル基、2−エチルヘキシル基、n−ノニル基、n−デシル基、n−ウンデシル基、n−ドデシル基、n−トリデシル基、n−テトラデシル基、n−ペンタデシル基、n−ヘキサデシル基、n−ヘプタデシル基、n−オクタデシル基、n−ノナデシル基、n−イコシル基、シクロヘキシル基等の直鎖状、分枝鎖状又は環状のアルキル基を挙げることができる。これらの中でも、フマル酸エステルホモポリマーの耐熱性の観点から、i−プロピル基、t−ブチル基等が好ましく、特にi−プロピル基が好ましい。 Alkyl groups having 1 to 20 carbon atoms represented by R 1 and R 2 include methyl group, ethyl group, n-propyl group, i-propyl group, n-butyl group, i-butyl group and t-butyl group. n-amyl group, i-amyl group, n-hexyl group, n-heptyl group, n-octyl group, 2-ethylhexyl group, n-nonyl group, n-decyl group, n-undecyl group, n-dodecyl group, Linear and branched n-tridecyl group, n-tetradecyl group, n-pentadecyl group, n-hexadecyl group, n-heptadecyl group, n-octadecyl group, n-nonadecil group, n-icosyl group, cyclohexyl group, etc. Chain or cyclic alkyl groups can be mentioned. Among these, from the viewpoint of heat resistance of the fumaric acid ester homopolymer, an i-propyl group, a t-butyl group and the like are preferable, and an i-propyl group is particularly preferable.
そして、具体的な一般式(1)で表されるフマル酸エステル化合物としては、例えば、フマル酸モノメチル、フマル酸モノエチル、フマル酸モノ−n−プロピル、フマル酸ジモノ−i−プロピル、フマル酸モノ−n−ブチル、フマル酸モノ−i−ブチル、フマル酸モノ−t−ブチル、フマル酸モノ−n−アミル、フマル酸モノ−i−アミル、フマル酸モノ−n−ヘキシル、フマル酸モノ−n−ヘプチル、フマル酸モノ−n−オクチル、フマル酸モノ−2−エチルヘキシル、フマル酸モノ−n−ノニル、フマル酸モノ−n−デシル、フマル酸モノ−n−ウンデシル、フマル酸モノ−n−ドデシル、フマル酸モノ−n−トリデシル、フマル酸モノ−n−テトラデシル、フマル酸モノ−n−ペンタデシル、フマル酸モノ−n−ヘキサデシル、フマル酸モノ−n−ヘプタデシル、フマル酸モノ−n−オクタデシル、フマル酸モノ−n−ノナデシル、フマル酸モノ−n−イコシル、フマル酸モノシクロヘキシル等のフマル酸モノエステル化合物が挙げられる。また、フマル酸ジメチル、フマル酸ジエチル、フマル酸ジ−n−プロピル、フマル酸ジ−i−プロピル、フマル酸ジ−n−ブチル、フマル酸ジ−i−ブチル、フマル酸ジ−t−ブチル、フマル酸ジ−n−アミル、フマル酸ジ−i−アミル、フマル酸ジ−n−ヘキシル、フマル酸ジ−n−ヘプチル、フマル酸ジ−n−オクチル、フマル酸ビス(2−エチルヘキシル)、フマル酸ジ−n−ノニル、フマル酸ジ−n−デシル、フマル酸ジ−n−ウンデシル、フマル酸ジ−n−ドデシル、フマル酸ジ−n−トリデシル、フマル酸ジ−n−テトラデシル、フマル酸ジ−n−ペンタデシル、フマル酸ジ−n−ヘキサデシル、フマル酸ジ−n−ヘプタデシル、フマル酸ジ−n−オクタデシル、フマル酸ジ−n−ノナデシル、フマル酸ジ−n−イコシル、フマル酸ジシクロヘキシル、フマル酸エチル−メチル、フマル酸エチル−n−プロピル、フマル酸エチル−i−プロピル、フマル酸エチル−n−ブチル、フマル酸エチル−i−ブチル、フマル酸エチル−t−ブチル、フマル酸エチル−n−アミル、フマル酸エチル−i−アミル、フマル酸エチル−n−ヘキシル、フマル酸エチル−n−ヘプチル、フマル酸エチル−n−オクチル、フマル酸エチル−(2−エチルヘキシル)、フマル酸エチル−n−ノニル、フマル酸エチル−n−デシル、フマル酸エチル−n−ウンデシル、フマル酸エチル−n−ドデシル、フマル酸エチル−n−トリデシル、フマル酸エチル−n−テトラデシル、フマル酸エチル−n−ペンタデシル、フマル酸エチル−n−ヘキサデシル、フマル酸エチル−n−ヘプタデシル、フマル酸エチル−n−オクタデシル、フマル酸エチル−n−ノナデシル、フマル酸エチル−n−イコシル、フマル酸エチル−シクロヘキシル等のフマル酸ジエステル化合物が挙げられる。これらの中でも、フマル酸ジ−t−ブチル、フマル酸ビス(2−エチルヘキシル)、フマル酸エチル−t−ブチル、フマル酸ジ−i−ブチル、フマル酸ジ−i−プロピル、フマル酸ジ−t−ブチル等が好ましく、特にフマル酸ビス(2−エチルヘキシル)、フマル酸ジ−t−ブチル、フマル酸ジ−i−プロピルが好ましい。 Examples of the fumaric acid ester compound represented by the specific general formula (1) include monomethyl fumarate, monoethyl fumarate, mono-n-propyl fumarate, dimono-i-propyl fumarate, and mono fumarate. -N-Butyl, mono-i-butyl fumarate, mono-t-butyl fumarate, mono-n-amyl fumarate, mono-i-amyl fumarate, mono-n-hexyl fumarate, mono-n fumarate -Heptyl, mono-n-octyl fumarate, mono-2-ethylhexyl fumarate, mono-n-nonyl fumarate, mono-n-decyl fumarate, mono-n-undecyl fumarate, mono-n-dodecyl fumarate , Mono-n-tridecyl fumarate, mono-n-tetradecyl fumarate, mono-n-pentadecyl fumarate, mono-n-hexadecyl fumarate, mono-n-heptadecyl fumarate, mono-n-octadecyl fumarate, fumal Examples thereof include fumaric acid monoester compounds such as acid mono-n-nonadecil, fumaric acid mono-n-icosyl, and fumaric acid monocyclohexyl. In addition, dimethyl fumarate, diethyl fumarate, di-n-propyl fumarate, di-i-propyl fumarate, di-n-butyl fumarate, di-i-butyl fumarate, di-t-butyl fumarate, Di-n-amyl fumarate, di-i-amyl fumarate, di-n-hexyl fumarate, di-n-heptyl fumarate, di-n-octyl fumarate, bis (2-ethylhexyl) fumarate, fumal Di-n-nonyl acid, di-n-decyl fumarate, di-n-undecyl fumarate, di-n-dodecyl fumarate, di-n-tridecyl fumarate, di-n-tetradecyl fumarate, di-fumarate -N-pentadecyl, di-n-hexadecyl fumarate, di-n-heptadecyl fumarate, di-n-octadecyl fumarate, di-n-nonadecil fumarate, di-n-icosyl fumarate, dicyclohexyl fumarate, fumar Ethyl-methyl fumarate, ethyl-n-propyl fumarate, ethyl-i-propyl fumarate, ethyl-n-butyl fumarate, ethyl-i-butyl fumarate, ethyl-t-butyl fumarate, ethyl fumarate-n -Amil, ethyl-i-amyl fumarate, ethyl-n-hexyl fumarate, ethyl-n-heptyl fumarate, ethyl-n-octyl fumarate, ethyl fumarate- (2-ethylhexyl), ethyl fumarate-n -Nonyl, ethyl-n-decyl fumarate, ethyl-n-undecyl fumarate, ethyl-n-dodecyl fumarate, ethyl-n-tridecyl fumarate, ethyl-n-tetradecyl fumarate, ethyl-n-pentadecyl fumarate , Fumaric acid such as ethyl-n-hexadecyl fumarate, ethyl-n-heptadecyl fumarate, ethyl-n-octadecyl fumarate, ethyl-n-nonadecil fumarate, ethyl-n-icosyl fumarate, ethyl-cyclohexyl fumarate, etc. Diester compounds can be mentioned. Among these, di-t-butyl fumarate, bis (2-ethylhexyl) fumarate, ethyl-t-butyl fumarate, di-i-butyl fumarate, di-i-propyl fumarate, di-t fumarate -Butyl and the like are preferable, and bis (2-ethylhexyl) fumarate, di-t-butyl fumarate and di-i-propyl fumarate are particularly preferable.
本発明は、エステル部位の構造が単純なアルキル鎖をもつフマル酸エステル化合物を用いて光重合させることができる点に特徴を有している。 The present invention is characterized in that it can be photopolymerized using a fumaric acid ester compound having a simple alkyl chain structure at the ester site.
本発明において、上記一般式(1)で表されるフマル酸エステル化合物を光重合させる際に用いる重合開始剤としては、水素引き抜き型の光重合開始剤を用いることもできるし、光を照射することにより化合物が分解しラジカルを発生する分子内開裂型の光重合開始剤を用いることもできる。 In the present invention, as the polymerization initiator used when the fumaric acid ester compound represented by the general formula (1) is photopolymerized, a hydrogen abstraction type photopolymerization initiator can be used or irradiated with light. As a result, an intramolecular cleavage type photopolymerization initiator that decomposes the compound to generate radicals can also be used.
このような分子内開裂型の光重合開始剤としては、例えば、2,2−ジメトキシ−1,2−ジフェニルエタン−1−オン(商品名「イルガキュア651」、ビー・エー・エス・エフ社製、イルガキュアはビー・エー・エス・エフ社の登録商標)等のベンジルメチルケタール類、1−ヒドロキシシクロヘキシルフェニルケトン(商品名「イルガキュア184」、ビー・エー・エス・エフ社製)、2−ヒドロキシ−2−メチル−1−フェニルプロパン−1−オン(商品名「ダロキュア1173」、ビー・エー・エス・エフ社製、ダロキュアはビー・エー・エス・エフ社の登録商標)、1−[4−(2−ヒドロキシエトキシ)−フェニル]−2−ヒドロキシ−2−メチル−1−プロパン−1−オン(商品名「イルガキュア2959」、ビー・エー・エス・エフ社製)、2−ヒドロキシ−1−{4−[4−(2−ヒドロキシ−2−メチルプロピオニル)−ベンジル]フェニル}−2−メチル−1−オン(商品名「イルガキュア127」、ビー・エー・エス・エフ社製)等のα−ヒドロキシアルキルフェノン類、2−メチル−1−[4−(メチルチオ)フェニル]−2−モルフォリノプロパン−1−オン(商品名「イルガキュア907」、ビー・エー・エス・エフ社製)、2−ベンジル−2−ジメチルアミノ−1−(4−モルフォリノフェニル)−ブタノン−1(商品名「イルガキュア369」、ビー・エー・エス・エフ社製)等のα−アミノアセトフェノン類、アセトフェノン、2−ヒドロキシ−2−フェニルアセトフェノン、2−エトキシ−2−フェニルアセトフェノン、2−メトキシ−2−フェニルアセトフェノン、2−イソプロポキシ−2−フェニルアセトフェノン、2−イソブトキシ−2−フェニルアセトフェノン等のアセトフェノン類、ベンジル、4,4’−ジメトキシベンジル等のベンジル類、2−エチルアントラキノン、2−t−ブチルアントラキノン等のアントラキノン類、ビス(2,4,6−トリメチルベンゾイル)−フェニルホスフィンオキサイド、2,4,6−トリメチルベンゾイルジフェニルホスフィンオキサイド(商品名「イルガキュアTPO」、ビー・エー・エス・エフ社製)等のホスフィンオキサイド類、1,2−オクタンジオン1−[4−(フェニルチオ)−2−(o−ベンゾイルオキシム)]や1−[9−エチル−6−(2−メチルベンゾイル)−9H−カルバゾール−3−イル]−1−(o−アセチルオキシム)等の(ケト)オキシムエステル類等の他、チタノセン類、ベンゾフェノン類、イミダゾール誘導体、ビスイミダゾール誘導体、N−アリールグリシン誘導体、有機アジド化合物、アルミナート錯体、有機過酸化物、N−アルコキシピリジニウム塩、チオキサントン誘導体等を挙げることができる。もちろん本発明の趣旨を超えなければこれらの例に限定されるものではない。これらは単独でも用いられるし、2種以上を併用しても良い。 Examples of such an intramolecular cleavage type photopolymerization initiator include 2,2-dimethoxy-1,2-diphenylethane-1-one (trade name "Irgacure 651", manufactured by BASF Co., Ltd.). , Irgacure is a registered trademark of BASF Co., Ltd.), benzylmethyl ketals, 1-hydroxycyclohexylphenylketone (trade name "Irgacure 184", manufactured by BASF Co., Ltd.), 2-hydroxy -2-Methyl-1-phenylpropan-1-one (trade name "DaroCure 1173", manufactured by BASF, DaroCure is a registered trademark of BASF), 1- [4 -(2-Hydroxyethoxy) -phenyl] -2-hydroxy-2-methyl-1-propane-1-one (trade name "Irgacure 2959", manufactured by BAS), 2-hydroxy-1 -{4- [4- (2-Hydroxy-2-methylpropionyl) -benzyl] phenyl} -2-methyl-1-one (trade name "Irgacure 127", manufactured by BAS), etc. α-Hydroxyalkylphenones, 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropane-1-one (trade name "Irgacure 907", manufactured by BAS), Α-Aminoacetophenones such as 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butanone-1 (trade name "Irgacure 369", manufactured by BAS), acetophenone, Acetphenones such as 2-hydroxy-2-phenylacetophenone, 2-ethoxy-2-phenylacetophenone, 2-methoxy-2-phenylacetophenone, 2-isopropoxy-2-phenylacetophenone, 2-isobutoxy-2-phenylacetophenone, Benzyls, benzyls such as 4,4'-dimethoxybenzyl, anthraquinones such as 2-ethylanthraquinone, 2-t-butyl anthraquinone, bis (2,4,6-trimethylbenzoyl) -phenylphosphine oxide, 2,4 Phosphine oxides such as 6-trimethylbenzoyldiphenylphosphine oxide (trade name "Irgacure TPO", manufactured by BASF), 1,2-octanedione 1- [4- (phenylthio) -2- (o) -Benzoyl oxime)] and 1- [9-ethyl-6- (2-methylbenzoyl) -9H-carbazole-3-yl] -1- (o-) In addition to (keto) oxime esters such as acetyloxime), titanocene, benzophenones, imidazole derivatives, bisimidazole derivatives, N-arylglycine derivatives, organic azide compounds, aluminate complexes, organic peroxides, N-alkoxy Examples thereof include pyridinium salts and thioxanthone derivatives. Of course, the present invention is not limited to these examples as long as it does not go beyond the gist of the present invention. These may be used alone or in combination of two or more.
光重合開始剤を用いる場合の使用量は、本発明の光重合性組成物中の一般式(1)で表されるフマル酸エステル化合物に対して通常0.001重量%以上、20重量%以下の範囲で用いることができ、好ましくは0.01重量%以上、10重量%以下の範囲で用いられる。またこれらは単独で用いることもできるし2種以上を併用しても良い。 When a photopolymerization initiator is used, the amount used is usually 0.001% by weight or more and 20% by weight or less with respect to the fumaric acid ester compound represented by the general formula (1) in the photopolymerizable composition of the present invention. It can be used in the range of 0.01% by weight or more and 10% by weight or less. Further, these may be used alone or in combination of two or more.
(その他の成分)
また、本発明の光重合性組成物には必要に応じて溶媒を加えることもできる。用いる溶媒は特に限定はないが、ヘキサン、ヘプタン、シクロヘキサン、デカリン等の炭化水素系化合物、クロロホルム、四塩化炭素、ジクロロメタン等のハロゲン置換炭化水素、ベンゼン、トルエン、キシレン等の芳香族系化合物、クロロベンゼン等のハロゲン置換芳香族、ジエチルエーテル、テトラヒドロフラン、テトラヒドロピラン、ジオキサン、プロピレングリコールモノメトキシアセテート、ジグライム等のエーテル系化合物、アセトン、メチルエチルケトン、メチルイソブチルケトン、シクロヘキサノン等のケトン系化合物、N−メチルピロリドン等の窒素原子含有化合物、酢酸エチル、酢酸ブチル等のエステル系化合物等が好適に用いられる。
(Other ingredients)
In addition, a solvent can be added to the photopolymerizable composition of the present invention, if necessary. The solvent used is not particularly limited, but is limited to hydrocarbon compounds such as hexane, heptane, cyclohexane and decalin, halogen-substituted hydrocarbons such as chloroform, carbon tetrachloride and dichloromethane, aromatic compounds such as benzene, toluene and xylene, and chlorobenzene. Halogen-substituted aromatics such as diethyl ether, tetrahydrofuran, tetrahydropyran, dioxane, propylene glycol monomethoxyacetate, ether compounds such as jiglime, ketone compounds such as acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, N-methylpyrrolidone and the like. Nitrogen atom-containing compounds, ester compounds such as ethyl acetate and butyl acetate are preferably used.
(光重合性組成物の重合、硬化)
本発明の光重合性組成物は、光照射することにより容易に重合、硬化させることができる。また、本発明に係る光重合性組成物は種々の方法で重合、硬化させることが可能である。例えば、適当な基材上に塗布したものや、該光重合性組成物をスペーサを配したガラス板等にはさみこんだもの等に光を照射して塗膜やフィルム、シートを得ることができる。また、光を透過するような型に該光重合性組成物を流しいれたもの等に光を照射することにより重合、硬化した成型物が得られる。また、該光重合性組成物を塗布しその後適当なパターンを有するマスクを介して光を照射することにより、パターンに応じた重合、硬化を行うこともできる。さらには、インクジェットプリンターのノズルから吐出された光重合性組成物に光を照射することにより基材上に塗布された組成物を重合、硬化させるもしくは組成物を重合させながら立体物の成形を行うこともできる。
(Polymerization and curing of photopolymerizable composition)
The photopolymerizable composition of the present invention can be easily polymerized and cured by irradiating with light. Further, the photopolymerizable composition according to the present invention can be polymerized and cured by various methods. For example, a coating film, a film, or a sheet can be obtained by irradiating light on a material coated on an appropriate base material or a material in which the photopolymerizable composition is sandwiched between glass plates or the like having spacers arranged therein. .. In addition, a polymerized and cured molded product can be obtained by irradiating a mold in which the photopolymerizable composition is poured with light so as to transmit light. Further, by applying the photopolymerizable composition and then irradiating light through a mask having an appropriate pattern, polymerization and curing according to the pattern can be performed. Further, by irradiating the photopolymerizable composition discharged from the nozzle of the inkjet printer with light, the composition applied on the substrate is polymerized and cured, or the composition is polymerized to form a three-dimensional object. You can also do it.
さらに、該光重合性組成物をフラスコ等の適当な反応器に仕込み必要に応じて撹拌を行いながら光照射することにより反応器内での光重合性化合物の光重合を行うことができる。これら光照射による重合は不活性雰囲気下で行っても良いし、通常の大気下で実施してもかまわない。例えば、本発明の光重合性組成物中にラジカル重合性化合物を含む場合不活性雰囲気下で光重合させることにより、発生するラジカルが酸素により消費されにくくなり重合が効率的に進行する場合がある。 Further, the photopolymerizable compound can be photopolymerized in the reactor by charging the photopolymerizable composition into an appropriate reactor such as a flask and irradiating with light while stirring if necessary. The polymerization by irradiation with light may be carried out in an inert atmosphere or in a normal atmosphere. For example, when the photopolymerizable composition of the present invention contains a radically polymerizable compound, by photopolymerizing in an inert atmosphere, the generated radicals are less likely to be consumed by oxygen, and the polymerization may proceed efficiently. ..
(光源)
本発明におけるエネルギー線の照射の際に用いられる光源としては、波長が300〜500nmの波長の光を含む光源を使用することが好ましい。複数の波長成分を含む光源でもよいし、またLEDやレーザ光を用いるものでいわゆる単色光を発する光源でも構わない。具体的には、高圧水銀ランプ、超高圧水銀メタルハライドランプ、ガリウムドープドランプ、マイクロ波励起方式UVランプ(例えば、フュージョン(株)製のHバルブ、Dバルブ、Vバルブ)、365nm、375nm、385nm、395nm、405nm、436nm等の波長の光を発するLEDランプ又はレーザ光等が挙げられる。太陽光や白熱灯や蛍光灯等の照明器具の光の使用も可能である。特に、365nm、375nm、385nm、395nm、405nm、436nm等の波長の光を発するLEDランプが好ましい。
(light source)
As the light source used for irradiating the energy rays in the present invention, it is preferable to use a light source containing light having a wavelength of 300 to 500 nm. A light source containing a plurality of wavelength components may be used, or a light source that uses an LED or a laser beam and emits so-called monochromatic light may be used. Specifically, high-pressure mercury lamps, ultra-high-pressure mercury metal halide lamps, gallium-doped lamps, microwave-excited UV lamps (for example, H-valve, D-valve, V-valve manufactured by Fusion Co., Ltd.), 365 nm, 375 nm, 385 nm, Examples thereof include an LED lamp or laser light that emits light having a wavelength of 395 nm, 405 nm, 436 nm, or the like. It is also possible to use the light of lighting equipment such as sunlight, incandescent lamps, and fluorescent lamps. In particular, an LED lamp that emits light having a wavelength of 365 nm, 375 nm, 385 nm, 395 nm, 405 nm, 436 nm, or the like is preferable.
(光重合性組成物の用途)
本発明に係る光重合性組成物は、エネルギー線の照射によって反応、重合、硬化させることができるコーティング剤、塗料、インク、成型材等に用いることができる。具体的には金属や樹脂、ガラス、紙、木材等の基材上に塗布する塗料、ハードコート剤、汚れ防止膜、反射防止膜、衝撃緩衝膜、オーバーコート剤等のコーティング剤や保護膜材料、光硬化型の接着剤、粘着剤、光崩壊・分解型の塗料、塗膜、成型物、さらに、ホログラム材料等の光記録媒体又は光記録媒体向け材料、光造形用樹脂、3Dプリンタ用インク(樹脂)、電子回路や半導体製造用レジスト、液晶ディスプレイ、有機ELディスプレイ等のディスプレイ向けカラーフィルター用レジスト、ブラックマトリックス用レジスト、ドライフィルムレジスト等の電子材料向けレジスト、層間絶縁膜、保護膜、光取り出し膜、封止剤、シール材、スクリーン印刷・オフセット印刷・グラビア印刷等の印刷用インク、インクジェットプリンター向けの光硬化型インク、レーザパタニング用組成物、レンズ、レンズアレイ、光導波路、導光板、光拡散板、回折素子、光学用接着剤等の光学部材、ナノインプリンティング用材料等の種々の用途への適用が可能である。本発明の光重合増感剤組成物及び光重合性組成物は、その重合物、硬化物の着色が抑制されうることから特に、LCDや有機ELディスプレイのような映像関連デバイスやタッチパネル、レンズ等光学素子に用いるOCA(Optically Clear Adhesive)やOCR(Optical Clear Resin)等をはじめとする接着剤、粘着剤、コーティング剤等に好適に用いられる。
(Use of photopolymerizable composition)
The photopolymerizable composition according to the present invention can be used for coating agents, paints, inks, molding materials and the like that can be reacted, polymerized and cured by irradiation with energy rays. Specifically, coating agents and protective film materials such as paints, hard coating agents, antifouling films, antireflection films, shock absorbing films, and overcoating agents to be applied on substrates such as metals, resins, glass, paper, and wood. , Photo-curable adhesives, adhesives, photo-collapse / decomposition type paints, coatings, molded products, optical recording media such as hologram materials, materials for optical recording media, resins for optical modeling, inks for 3D printers (Resin), resists for manufacturing electronic circuits and semiconductors, resists for color filters for displays such as liquid crystal displays and organic EL displays, resists for black matrices, resists for electronic materials such as dry film resists, interlayer insulating films, protective films, optics. Extraction film, sealant, sealing material, printing ink for screen printing, offset printing, gravure printing, etc., photocurable ink for inkjet printers, laser patterning composition, lens, lens array, optical waveguide, light guide plate, It can be applied to various applications such as a light diffusing plate, a diffractive element, an optical member such as an optical adhesive, and a material for nanoprinting. Since the photopolymerizable sensitizer composition and the photopolymerizable composition of the present invention can suppress the coloring of the polymer and the cured product, in particular, video-related devices such as LCDs and organic EL displays, touch panels, lenses and the like It is suitably used for adhesives, adhesives, coating agents and the like such as OCA (Optical Clear Polymer) and OCR (Optical Clear Resin) used for optical elements.
以下、本発明をより具体的に説明するためにいくつかの実施例を示す。ただし、本発明の範囲はこれら実施例の範囲に限定されるものではない。 Hereinafter, some examples will be shown in order to explain the present invention more concretely. However, the scope of the present invention is not limited to the scope of these examples.
<光DSC測定>
本実施例において、光DSC測定は下記のようにして行った。DSC測定装置は日立ハイテク社製XDSC−7000を用い、それに光DSC測定用ユニットを装着し光を照射しながらDSC測定ができるよう設えた。
<Optical DSC measurement>
In this example, the optical DSC measurement was performed as follows. As the DSC measuring device, an XDSC-7000 manufactured by Hitachi High-Tech Co., Ltd. was used, and an optical DSC measuring unit was attached to the DSC-7000 so that DSC measurement could be performed while irradiating light.
光照射用の光源は、林時計工業社製LA−410UVを用い、バンドパスフィルターで405nm光又は365nm光を取り出してサンプルに照射できるようにした。光の照度は50mW/cm2、もしくは10mW・cm2とした。光源の光はグラスファイバーを用いてサンプル上部まで導けるようにし、光照射開始と同時にDSC測定ができるよう光源のシャッターをトリガー制御できるようにした。 As the light source for light irradiation, LA-410UV manufactured by Hayashi Clock Industry Co., Ltd. was used, and 405 nm light or 365 nm light was extracted by a bandpass filter so that the sample could be irradiated. The illuminance of the light was 50 mW / cm 2 or 10 mW · cm 2 . The light from the light source was guided to the upper part of the sample using glass fiber, and the shutter of the light source could be triggered and controlled so that DSC measurement could be performed at the same time as the start of light irradiation.
光DSCの測定は、サンプルを1mg程度測定用アルミパンの中に精秤し、DSC測定部に収めたのち光DSCユニットを装着した。その後測定部内を窒素雰囲気に保ち5分間静置して、測定を開始した。測定は通常光を照射しながら10分間継続した。一回目の測定後、サンプルはそのままで、再度同条件で測定を行い、一回目の測定結果から二回目の測定結果を差し引いた値を該サンプルの測定結果とした。結果は特に断らない限り光照射後2分間におけるサンプル1mgあたりの総発熱量で比較した。測定条件によっては2分間で光反応が完結しない場合もあるが光照射初期の反応挙動を比較するために2分間の総発熱量で比較した。 For the measurement of optical DSC, a sample was precisely weighed in an aluminum pan for measurement of about 1 mg, stored in the DSC measuring unit, and then the optical DSC unit was attached. After that, the inside of the measuring part was kept in a nitrogen atmosphere and allowed to stand for 5 minutes to start the measurement. The measurement was continued for 10 minutes while irradiating with normal light. After the first measurement, the sample was left as it was, and the measurement was performed again under the same conditions, and the value obtained by subtracting the second measurement result from the first measurement result was taken as the measurement result of the sample. Unless otherwise specified, the results were compared based on the total calorific value per 1 mg of the sample 2 minutes after light irradiation. Depending on the measurement conditions, the photoreaction may not be completed in 2 minutes, but in order to compare the reaction behavior at the initial stage of light irradiation, the total calorific value for 2 minutes was compared.
光照射に伴ってサンプル(光重合性組成物)の重合が生じた場合、重合に伴う反応熱が生ずるが光DSCではその反応熱を測定することができる。そのため、光DSCによって光照射による重合進行の状況が測定できることになる。本実施例では光照射後2分間の総発熱量を測定し、モノマーのモル重合熱から求まる、サンプルの理論発熱量を用いて、重合率(%)を算出した。この重合率が大きいほど重合が効率的に進行していると考えることができる。 When the sample (photopolymerizable composition) is polymerized by light irradiation, the reaction heat is generated by the polymerization, and the reaction heat can be measured by the optical DSC. Therefore, the state of polymerization progress due to light irradiation can be measured by optical DSC. In this example, the total calorific value for 2 minutes after light irradiation was measured, and the polymerization rate (%) was calculated using the theoretical calorific value of the sample obtained from the molar polymerization heat of the monomer. It can be considered that the larger the polymerization rate, the more efficiently the polymerization proceeds.
「実施例1」
フマル酸エステル化合物として、フマル酸ジ−t−ブチルを0.1重量部、溶媒として、N−メチルピロリドンを0.4重量部、光重合開始剤として、2,4,6−トリメチルベンゾイルジフェニルホスフィンオキサイド(商品名「イルガキュアTPO」、ビー・エー・エス・エフ社製)0.005重量部を室温で撹拌しながら固形分が消失するまで混合し光重合性組成物を得た。当該光重合性組成物1mg程度を精秤し、測定用アルミパンの中にいれ、波長405nmの光を照度は50mW/cm2の強度の光を照射しながら該光重合性組成物の光DSC測定を行った。照射してから2分後の該光重合性組成物の発熱量と該フマル酸エステル化合物のモル重合熱から重合率(%)を算出した。その結果を表1に示した。
"Example 1"
0.1 parts by weight of di-t-butyl fumarate as a fumaric acid ester compound, 0.4 parts by weight of N-methylpyrrolidone as a solvent, and 2,4,6-trimethylbenzoyldiphenylphosphine as a photopolymerization initiator. 0.005 parts by weight of oxide (trade name "Irgacure TPO", manufactured by BASF) was mixed at room temperature with stirring until the solid content disappeared to obtain a photopolymerizable composition. About 1 mg of the photopolymerizable composition is precisely weighed, placed in an aluminum pan for measurement, and the optical DSC of the photopolymerizable composition is irradiated with light having a wavelength of 405 nm and an illuminance of 50 mW / cm 2. Measurements were made. The polymerization rate (%) was calculated from the calorific value of the photopolymerizable composition 2 minutes after irradiation and the heat of molar polymerization of the fumaric acid ester compound. The results are shown in Table 1.
「実施例2〜6」
フマル酸エステル化合物として、実施例1のフマル酸ジ−t−ブチルに代えて実施例2ではフマル酸ビス(2−エチルヘキシル)を、実施例3ではフマル酸エチル−t−ブチルを、実施例4ではフマル酸ジ−i−ブチルを、実施例5ではフマル酸ジ−i−プロピルを、実施例6ではフマル酸ジブチルを実施例7ではフマル酸モノエチルをそれぞれ用いた以外は実施例1と同様にして、光DSC測定を行った。その結果を表1に示した。
"Examples 2 to 6"
As the fumarate ester compound, bis (2-ethylhexyl) fumarate was used in Example 2 instead of di-t-butyl fumarate in Example 1, and ethyl-t-butyl fumarate was used in Example 3 instead of di-t-butyl fumarate. The same as in Example 1 except that di-i-butyl fumarate was used, di-i-propyl fumarate was used in Example 5, dibutyl fumarate was used in Example 6, and monoethyl fumarate was used in Example 7. Then, optical DSC measurement was performed. The results are shown in Table 1.
「比較例1」
実施例1〜7においてフマル酸エステル化合物の代わりに、アクリル酸−i−ブチルを用いたこと以外は実施例1と同様に組成物を調合し、同様の条件で、光DSC測定を行った。その結果を表1に示した。
"Comparative Example 1"
The composition was prepared in the same manner as in Example 1 except that -i-butyl acrylate was used instead of the fumaric acid ester compound in Examples 1 to 7, and optical DSC measurement was performed under the same conditions. The results are shown in Table 1.
実施例1〜6と比較例1を比べることにより明らかなように、フマル酸エステル化合物の2分間の重合率が比較例のアクリル酸エステルに比べてすべての例において大きいか又は同等であることがわかる。よって、本発明のエステル部位の構造が単純なアルキル鎖をもつフマル酸エステル化合物でも、ポリマー原料として好適に用いられるアクリル酸−i−ブチルのようなアクリル酸エステルと同様、高い重合率でフマル酸エステルホモポリマーを製造することができる。 As is clear from comparing Examples 1 to 6 with Comparative Example 1, the polymerization rate of the fumaric acid ester compound for 2 minutes is larger or equivalent in all examples as compared with the acrylic acid ester of Comparative Example. Understand. Therefore, even a fumaric acid ester compound having an alkyl chain having a simple ester moiety structure of the present invention has a high polymerization rate as well as an acrylic acid ester such as acrylic acid-i-butyl which is preferably used as a polymer raw material. Ester homopolymers can be produced.
Claims (1)
A photopolymerizable composition containing at least a fumaric acid ester compound having a simple alkyl chain represented by the general formula (1) as an ester moiety and a photopolymerization initiator can be obtained from 385 nmUV-LED, 395 nmUV-LED or 405 nmUV-LED. A method for producing a fumaric acid ester homopolymer, which comprises photopolymerizing by irradiating with energy rays using the above as a single light source.
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