JP6903300B1 - Electronic device and its manufacturing method - Google Patents

Electronic device and its manufacturing method Download PDF

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JP6903300B1
JP6903300B1 JP2021039813A JP2021039813A JP6903300B1 JP 6903300 B1 JP6903300 B1 JP 6903300B1 JP 2021039813 A JP2021039813 A JP 2021039813A JP 2021039813 A JP2021039813 A JP 2021039813A JP 6903300 B1 JP6903300 B1 JP 6903300B1
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base material
wiring pattern
metal wiring
connection terminal
external connection
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JP2021197358A (en
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雅明 杉本
雅明 杉本
横山 英明
英明 横山
雄一 老田
雄一 老田
清 藤巻
清 藤巻
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ELEPHANTECH INC.
Takahata Precision Co Ltd
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ELEPHANTECH INC.
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/12Mountings, e.g. non-detachable insulating substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/12Mountings, e.g. non-detachable insulating substrates
    • H01L23/14Mountings, e.g. non-detachable insulating substrates characterised by the material or its electrical properties
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/52Encapsulations
    • H01L33/54Encapsulations having a particular shape
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/62Arrangements for conducting electric current to or from the semiconductor body, e.g. lead-frames, wire-bonds or solder balls
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01RELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
    • H01R12/00Structural associations of a plurality of mutually-insulated electrical connecting elements, specially adapted for printed circuits, e.g. printed circuit boards [PCB], flat or ribbon cables, or like generally planar structures, e.g. terminal strips, terminal blocks; Coupling devices specially adapted for printed circuits, flat or ribbon cables, or like generally planar structures; Terminals specially adapted for contact with, or insertion into, printed circuits, flat or ribbon cables, or like generally planar structures
    • H01R12/70Coupling devices
    • H01R12/71Coupling devices for rigid printing circuits or like structures
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01RELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
    • H01R43/00Apparatus or processes specially adapted for manufacturing, assembling, maintaining, or repairing of line connectors or current collectors or for joining electric conductors
    • H01R43/20Apparatus or processes specially adapted for manufacturing, assembling, maintaining, or repairing of line connectors or current collectors or for joining electric conductors for assembling or disassembling contact members with insulating base, case or sleeve
    • H01R43/24Assembling by moulding on contact members
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/11Printed elements for providing electric connections to or between printed circuits
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/18Printed circuits structurally associated with non-printed electric components
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/18Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings

Abstract

【課題】部品点数を削減するとともに熱成形可能な基材上に形成された金属配線パターン上に外部接続端子を位置精度よく電気的に接合することができる電子装置及び製造方法を提供する。【解決手段】合成樹脂材料からなり実質的に平坦な2次元形状から実質的に3次元形状に変形可能な基材と、基材上に配置された金属配線パターンと、基材に熱成形を施して基材の厚み方向に3次元形状に賦形された凹部で金属配線パターンと接触し、基材の外部に設けられた外部素子とを電気的に接続するための外部接続端子と、外部接続端子の表面である端子表面が露出するように外部接続端子を囲むハウジングを形成し、基材の少なくとも一面を覆う樹脂層と、凹部で金属配線パターンと外部接続端子を電気的に接合する接合手段と、凹部に充填されて接合手段を覆う被覆層と、を備えた。【選択図】図3PROBLEM TO BE SOLVED: To provide an electronic device and a manufacturing method capable of electrically joining external connection terminals with high position accuracy on a metal wiring pattern formed on a thermoformed base material while reducing the number of parts. SOLUTION: A base material made of a synthetic resin material and capable of being deformed from a substantially flat two-dimensional shape to a substantially three-dimensional shape, a metal wiring pattern arranged on the base material, and heat molding on the base material. An external connection terminal for electrically connecting an external element provided outside the base material by contacting the metal wiring pattern with a recess formed in a three-dimensional shape in the thickness direction of the base material, and an external surface. A housing that surrounds the external connection terminal is formed so that the terminal surface, which is the surface of the connection terminal, is exposed, and a resin layer that covers at least one surface of the base material and a joint that electrically joins the metal wiring pattern and the external connection terminal at a recess. A means and a coating layer filled in the recesses to cover the joining means were provided. [Selection diagram] Fig. 3

Description

本発明は、電子装置及びその製造方法に関する。 The present invention relates to an electronic device and a method for manufacturing the same.

予め定められた処理を行う電子回路と、電子回路が配置された基体と、一方端部が折り曲げられて基体に設けられたパッドと接合されると共にパッドを介して電子回路と電気的に接続され、また他方端部がコネクタ端子となって二次モールドの際の位置決めに使用されるピンヘッダと、コネクタ端子が露出するように、電子回路、基体及びピンヘッダの一方端部を樹脂封止して得られた一次モールド体と、を備えたモジュールが知られている(特許文献1)。 An electronic circuit that performs a predetermined process, a substrate on which the electronic circuit is arranged, and a pad provided on the substrate by bending one end thereof are joined and electrically connected to the electronic circuit via the pad. Also, the pin header used for positioning in the secondary molding with the other end serving as the connector terminal and one end of the electronic circuit, substrate and pin header are resin-sealed so that the connector terminal is exposed. A module including the above-mentioned primary molded body is known (Patent Document 1).

導光板と、正負一対の素子電極を備える電極形成面と、電極形成面と反対側の実装面を有する発光素子と、素子電極と接続される導電性のワイヤと、発光素子が発する光を受けて、異なる波長の光に変換する波長変換部材と、発光素子及び波長変換部材を封止する封止樹脂と、を備える発光モジュールの製造方法であって、導光板を準備する工程と、導光板上に、波長変換部材を配置する工程と、波長変換部材上に、電極形成面を上に向け、かつ実装面を下に向けた姿勢で、発光素子を実装する工程と、導光板上であって、発光素子の周囲に、光反射性層を形成する工程と、光反射性層の上面に、電極層を形成する工程と、電極層と、素子電極とをワイヤで接続する工程と、電極層、光反射性層及び発光素子を、封止樹脂で封止する工程と、を含む発光モジュールの製造方法も知られている(特許文献2)。 Receives light emitted by a light guide plate, an electrode forming surface having a pair of positive and negative element electrodes, a light emitting element having a mounting surface opposite to the electrode forming surface, a conductive wire connected to the element electrode, and light emitted by the light emitting element. This is a method for manufacturing a light emitting module including a wavelength conversion member that converts light into light having a different wavelength, and a sealing resin that seals the light emitting element and the wavelength conversion member. The step of preparing a light guide plate and the light guide plate. A step of arranging the wavelength conversion member on the top, a step of mounting the light emitting element on the wavelength conversion member with the electrode forming surface facing up and the mounting surface facing down, and the light guide plate. A step of forming a light-reflecting layer around the light-emitting element, a step of forming an electrode layer on the upper surface of the light-reflecting layer, a step of connecting the electrode layer and the element electrode with a wire, and an electrode. A method for manufacturing a light emitting module including a step of sealing a layer, a light reflecting layer, and a light emitting element with a sealing resin is also known (Patent Document 2).

特開2017−207318号公報JP-A-2017-207318 特開2019−175892号公報JP-A-2019-175892

本発明は、部品点数を削減するとともに熱成形可能な基材上に形成された金属配線パターン上に外部接続端子を位置精度よく電気的に接合することができる電子装置及び製造方法を提供する。 The present invention provides an electronic device and a manufacturing method capable of reducing the number of parts and electrically joining external connection terminals on a metal wiring pattern formed on a thermoformed base material with high position accuracy.

前記課題を解決するために、請求項1に記載の電子装置は、
合成樹脂材料からなり実質的に平坦な2次元形状から実質的に3次元形状に変形可能な基材と、
前記基材上に配置された金属配線パターンと、
前記基材に熱成形を施して前記基材の厚み方向に前記3次元形状に賦形された凹部で前記金属配線パターンと接触し、前記基材の外部に設けられた外部素子とを電気的に接続するための外部接続端子と、
前記外部接続端子の表面である端子表面が露出するように前記外部接続端子を囲むハウジングを形成し、前記基材の少なくとも一面を覆う樹脂層と、
前記凹部で前記金属配線パターンと前記外部接続端子を電気的に接合する接合手段と、
前記凹部に充填されて前記金属配線パターン及び前記外部接続端子と前記接合手段とを一体的に覆う被覆層と、を備えた、
ことを特徴とする。
In order to solve the above problems, the electronic device according to claim 1 is used.
A base material made of synthetic resin material that can be transformed from a substantially flat two-dimensional shape to a substantially three-dimensional shape,
The metal wiring pattern arranged on the base material and
The base material is thermoformed to come into contact with the metal wiring pattern at a recess shaped into the three-dimensional shape in the thickness direction of the base material, and an external element provided outside the base material is electrically connected. With an external connection terminal for connecting to
A housing that surrounds the external connection terminal is formed so that the terminal surface, which is the surface of the external connection terminal, is exposed, and a resin layer that covers at least one surface of the base material is formed.
A joining means for electrically joining the metal wiring pattern and the external connection terminal in the recess,
The recess is filled with the metal wiring pattern and a coating layer that integrally covers the external connection terminal and the joining means.
It is characterized by that.

請求項2に記載の発明は、請求項1に記載の電子装置において、
前記樹脂層は、前記基材の一面に前記金属配線パターンを外部から不可視にする調色された接着層を介して形成されている、
ことを特徴とする。
The invention according to claim 2 is the electronic device according to claim 1.
The resin layer is formed on one surface of the base material via a toned adhesive layer that makes the metal wiring pattern invisible from the outside.
It is characterized by that.

請求項3に記載の発明は、請求項1又は2に記載の電子装置において、
前記樹脂層は、前記基材の一面とは反対側の他面には透光性の接着層を介して透明樹脂材料で形成されている、
ことを特徴とする。
The invention according to claim 3 is the electronic device according to claim 1 or 2.
The resin layer is formed of a transparent resin material on the other surface opposite to one surface of the base material via a translucent adhesive layer.
It is characterized by that.

前記課題を解決するために、請求項4に記載の電子装置の製造方法は、
合成樹脂材料からなり実質的に平坦な2次元形状から実質的に3次元形状に変形可能な基材と、
前記基材上に配置された金属配線パターンと、
前記基材に熱成形を施して前記基材の厚み方向に前記3次元形状に賦形された凹部で前記金属配線パターンと接触し、前記基材の外部に設けられた外部素子とを電気的に接続するための外部接続端子と、
前記外部接続端子の表面である端子表面が露出するように前記外部接続端子を囲むハウジングを形成し、前記基材の少なくとも一面を覆う樹脂層と、
前記凹部で前記金属配線パターンと前記外部接続端子を電気的に接合する接合手段と、
前記凹部に充填されて前記接合手段を覆う被覆層と、を備える電子装置の製造方法であって、
前記基材を準備する工程と、
前記基材上に前記金属配線パターンを配置する工程と、
前記金属配線パターンが配置された前記基材と前記外部接続端子を金型に位置決めして載置して前記凹部を賦形すると同時に前記樹脂層を射出成形する工程と、
前記金属配線パターンと前記外部接続端子とを接合手段で電気的に接合する工程と、
前記凹部に前記被覆層を充填して前記金属配線パターン及び前記外部接続端子と前記接合手段とを一体的に被覆する被覆工程と、を順に実行する、
ことを特徴とする。
In order to solve the above problems, the method for manufacturing an electronic device according to claim 4 is as follows.
A base material made of synthetic resin material that can be transformed from a substantially flat two-dimensional shape to a substantially three-dimensional shape,
The metal wiring pattern arranged on the base material and
The base material is thermoformed to come into contact with the metal wiring pattern at a recess shaped into the three-dimensional shape in the thickness direction of the base material, and an external element provided outside the base material is electrically connected. With an external connection terminal for connecting to
A housing that surrounds the external connection terminal is formed so that the terminal surface, which is the surface of the external connection terminal, is exposed, and a resin layer that covers at least one surface of the base material is formed.
A joining means for electrically joining the metal wiring pattern and the external connection terminal in the recess,
A method of manufacturing an electronic device including a coating layer that fills the recess and covers the joining means.
The process of preparing the base material and
The step of arranging the metal wiring pattern on the base material and
A step of positioning and placing the base material on which the metal wiring pattern is arranged and the external connection terminal on a mold to shape the recess and at the same time injection molding the resin layer.
A process of electrically joining the metal wiring pattern and the external connection terminal by a joining means,
A coating step of filling the recess with the coating layer and integrally covering the metal wiring pattern, the external connection terminal, and the joining means is executed in order.
It is characterized by that.

前記課題を解決するために、請求項5に記載の電子装置の製造方法は、
合成樹脂材料からなり実質的に平坦な2次元形状から実質的に3次元形状に変形可能な基材と、
前記基材上に配置された金属配線パターンと、
前記基材に熱成形を施して前記基材の厚み方向に前記3次元形状に賦形された凹部で前記金属配線パターンと接触し、前記基材の外部に設けられた外部素子とを電気的に接続するための外部接続端子と、
前記外部接続端子の表面である端子表面が露出するように前記外部接続端子を囲むハウジングを形成し、前記基材の少なくとも一面を覆う樹脂層と、
前記凹部で前記金属配線パターンと前記外部接続端子を電気的に接合する接合手段と、
前記凹部に充填されて前記接合手段を覆う被覆層と、を備える電子装置の製造方法であって、
前記基材を準備する工程と、
前記基材上に前記金属配線パターンを配置する工程と、
前記金属配線パターンが配置された前記基材を金型に位置決めして載置して前記凹部を賦形すると同時に前記金属配線パターンが配置された一面とは反対側の他面を覆うように前記樹脂層を射出成形する工程と、
前記金属配線パターンと前記外部接続端子とを接合手段で電気的に接合する工程と、
前記凹部に前記被覆層を充填して前記金属配線パターン及び前記外部接続端子と前記接合手段とを一体的に被覆する被覆工程と、
前記金属配線パターンが配置された一面を覆うように前記樹脂層を射出成形する工程と、を順に実行する、
ことを特徴とする。
In order to solve the above problems, the method for manufacturing an electronic device according to claim 5 is as follows.
A base material made of synthetic resin material that can be transformed from a substantially flat two-dimensional shape to a substantially three-dimensional shape,
The metal wiring pattern arranged on the base material and
The base material is thermoformed to come into contact with the metal wiring pattern at a recess shaped into the three-dimensional shape in the thickness direction of the base material, and an external element provided outside the base material is electrically connected. With an external connection terminal for connecting to
A housing that surrounds the external connection terminal is formed so that the terminal surface, which is the surface of the external connection terminal, is exposed, and a resin layer that covers at least one surface of the base material is formed.
A joining means for electrically joining the metal wiring pattern and the external connection terminal in the recess,
A method of manufacturing an electronic device including a coating layer that fills the recess and covers the joining means.
The process of preparing the base material and
The step of arranging the metal wiring pattern on the base material and
The base material on which the metal wiring pattern is arranged is positioned and placed on a mold to form the recess, and at the same time, the base material is covered on the other surface opposite to the one on which the metal wiring pattern is arranged. The process of injection molding the resin layer and
A process of electrically joining the metal wiring pattern and the external connection terminal by a joining means,
A coating step of filling the recess with the coating layer to integrally cover the metal wiring pattern, the external connection terminal, and the joining means.
The steps of injection molding the resin layer so as to cover one surface on which the metal wiring pattern is arranged are executed in order.
It is characterized by that.

請求項1に記載の発明によれば、部品点数を削減するとともに熱成形可能な基材上に形成された金属配線パターン上に外部接続端子を位置精度よく電気的に接合することができる。 According to the first aspect of the present invention, the number of parts can be reduced and the external connection terminals can be electrically joined on the metal wiring pattern formed on the thermoformed base material with high position accuracy.

請求項2に記載の発明によれば、金属配線パターンを不可視にして、外観上の美観を維持することができる。 According to the second aspect of the present invention, the metal wiring pattern can be made invisible to maintain the aesthetic appearance.

請求項3に記載の発明によれば、内部に加飾が施された場合に、加飾を保護しながら視認可能とすることができる。 According to the invention of claim 3, when the decoration is applied to the inside, the decoration can be made visible while being protected.

請求項4に記載の発明によれば、被覆層を配置する凹部を樹脂層と一体として形成するとともに、熱成形可能な基材上に形成された金属配線パターン上に外部接続端子を位置精度よく配置して電気的に接合することができる。 According to the invention of claim 4, the recess for arranging the coating layer is formed integrally with the resin layer, and the external connection terminal is positioned accurately on the metal wiring pattern formed on the thermoforming base material. Can be placed and electrically joined.

請求項5に記載の発明によれば、被覆層を配置する凹部と外部接続端子を挿入する挿入孔を樹脂層と一体として形成するとともに、熱成形可能な基材上に形成された金属配線パターン上に外部接続端子を位置精度よく配置して電気的に接合することができる。 According to the invention of claim 5, a recess for arranging the coating layer and an insertion hole for inserting the external connection terminal are formed integrally with the resin layer, and a metal wiring pattern formed on a thermoforming base material. External connection terminals can be arranged on top with high positional accuracy and electrically joined.

本実施形態に係る電子装置の一例を樹脂層を不図示にして示す平面模式図である。It is a plan schematic diagram which shows an example of the electronic device which concerns on this embodiment (the resin layer is not shown). 本実施形態に係る電子装置の一例を示す部分断面模式図である。It is a partial cross-sectional schematic diagram which shows an example of the electronic device which concerns on this embodiment. 本実施形態に係る電子装置の他の態様の一例を示す部分断面模式図である。It is a partial cross-sectional schematic diagram which shows an example of another aspect of the electronic device which concerns on this embodiment. 本実施形態に係る電子装置の製造方法の概略の手順の一例を示すフローチャート図である。It is a flowchart which shows an example of the schematic procedure of the manufacturing method of the electronic device which concerns on this embodiment. 本実施形態に係る電子装置の製造過程を説明するための電子装置の部分断面模式図である。It is a partial cross-sectional schematic diagram of the electronic device for demonstrating the manufacturing process of the electronic device which concerns on this embodiment. 本実施形態に係る電子装置の他の製造過程を説明するための電子装置の部分断面模式図である。It is a partial cross-sectional schematic diagram of the electronic device for demonstrating another manufacturing process of the electronic device which concerns on this embodiment. 本実施形態に係る電子装置の他の製造過程を説明するための電子装置の部分断面模式図である。It is a partial cross-sectional schematic diagram of the electronic device for demonstrating another manufacturing process of the electronic device which concerns on this embodiment. 本実施形態に係る電子装置の他の態様を示す部分断面模式図である。It is a partial cross-sectional schematic diagram which shows the other aspect of the electronic device which concerns on this embodiment.

次に図面を参照しながら、本発明の実施形態の具体例を説明するが、本発明は以下の実施形態に限定されるものではない。
尚、以下の図面を使用した説明において、図面は模式的なものであり、各寸法の比率等は現実のものとは異なることに留意すべきであり、理解の容易のために説明に必要な部材以外の図示は適宜省略されている。
Next, a specific example of the embodiment of the present invention will be described with reference to the drawings, but the present invention is not limited to the following embodiments.
In the explanation using the following drawings, it should be noted that the drawings are schematic and the ratio of each dimension is different from the actual one, which is necessary for the explanation for easy understanding. Illustrations other than the members are omitted as appropriate.

(1)電子装置の全体構成
図1は本実施形態に係る電子装置1の一例を樹脂層を不図示にして示す平面模式図、図2は本実施形態に係る電子装置1の一例を示す部分断面模式図、図3は本実施形態に係る電子装置1の他の態様の一例を示す部分断面模式図である。
以下、図面を参照しながら、本実施形態に係る電子装置1の構成について説明する。
(1) Overall Configuration of Electronic Device FIG. 1 is a schematic plan view showing an example of the electronic device 1 according to the present embodiment with the resin layer not shown, and FIG. 2 is a portion showing an example of the electronic device 1 according to the present embodiment. The schematic cross-sectional view and FIG. 3 are partial cross-sectional schematic views showing an example of another aspect of the electronic device 1 according to the present embodiment.
Hereinafter, the configuration of the electronic device 1 according to the present embodiment will be described with reference to the drawings.

電子装置1は、図1、図2に示すように、合成樹脂材料からなり変形可能な絶縁性の基材2と、この基材2上に配置された金属配線パターン3と、金属配線パターン3と接合手段で接合された外部接続端子4と、金属配線パターン3と外部接続端子4とを接合する接合部材5と、基材2の少なくとも一面を覆う樹脂層6と、接合部材5を覆う被覆層7と、を備えて構成されている。 As shown in FIGS. 1 and 2, the electronic device 1 includes a deformable insulating base material 2 made of a synthetic resin material, a metal wiring pattern 3 arranged on the base material 2, and a metal wiring pattern 3. The external connection terminal 4 joined by the joining means, the joining member 5 for joining the metal wiring pattern 3 and the external connection terminal 4, the resin layer 6 covering at least one surface of the base material 2, and the coating covering the joining member 5. It is configured to include a layer 7.

(基材)
本実施形態において使用する絶縁性の変形可能な基材2は特にフィルム状の基材に限らないが、以下、フィルム状の基材として説明する。ここで、「変形可能な基材」は、金属配線パターン3を配置後に変形できる、すなわち、熱成形、真空成形または圧空成形によって実質的に平坦な2次元形状から実質的に3次元形状に形成されることができる基材を意味する。
基材2の素材は、絶縁性の変形可能な熱可塑性樹脂であって、融点Tmが存在する場合は150℃以上であることが好ましく、200℃以上であることがより好ましい。
また、基材2のガラス転移点Tgの範囲は20℃〜250℃が好ましく、50℃〜200℃がより好ましく、70℃〜150℃が最も好ましい。ガラス転移点Tgが低すぎる場合、金属配線パターン3の形成時に基材2の歪みが大きくなる虞がある。
(Base material)
The insulating and deformable base material 2 used in the present embodiment is not particularly limited to a film-like base material, but will be described below as a film-like base material. Here, the "deformable base material" can be deformed after the metal wiring pattern 3 is placed, that is, formed from a substantially flat two-dimensional shape to a substantially three-dimensional shape by thermoforming, vacuum forming, or compressed air forming. Means a substrate that can be made.
The material of the base material 2 is an insulating and deformable thermoplastic resin, and when the melting point Tm is present, the temperature is preferably 150 ° C. or higher, more preferably 200 ° C. or higher.
The range of the glass transition point Tg of the base material 2 is preferably 20 ° C. to 250 ° C., more preferably 50 ° C. to 200 ° C., and most preferably 70 ° C. to 150 ° C. If the glass transition point Tg is too low, the distortion of the base material 2 may increase when the metal wiring pattern 3 is formed.

基材2の材質は、上記のような融点Tmおよびガラス転移点Tgの条件に該当すれば特に限定されないが、具体的には、ポリエチレンテレフタレート(PET)、ポリエチレンナフタレート(PEN)などのポリエステル、ナイロン6−10、ナイロン46などのポリアミド、ポリエーテルエーテルケトン(PEEK)、ABS、PMMA、ポリ塩化ビニルなどの熱可塑性樹脂が挙げられる。
特にポリエステルがより好ましく、さらにその中でもポリエチレンテレフタレート(PET)が経済性、電気絶縁性、耐薬品性等のバランスが良く最も好ましい。
The material of the base material 2 is not particularly limited as long as it meets the conditions of the melting point Tm and the glass transition point Tg as described above, but specifically, polyesters such as polyethylene terephthalate (PET) and polyethylene naphthalate (PEN) are used. Examples thereof include polyamides such as nylon 6-10 and nylon 46, and thermoplastic resins such as polyetheretherketone (PEEK), ABS, PMMA, and polyvinyl chloride.
In particular, polyester is more preferable, and among them, polyethylene terephthalate (PET) is most preferable because it has a good balance of economy, electrical insulation, chemical resistance and the like.

基材2の厚みは、5μm〜3mmが好ましく、12μm〜1mmがより好ましく、50μm〜200μmが最も好ましい。基材2の厚みが薄すぎる場合、強度が不十分になるとともに、金属配線パターン3のめっき工程時に基材2の歪みが大きくなる虞がある。尚、この厚みは基材2がフィルム状の基材である場合の条件であり、本発明が適用される絶縁性の基材2はフィルム状の基材に限定されない。 The thickness of the base material 2 is preferably 5 μm to 3 mm, more preferably 12 μm to 1 mm, and most preferably 50 μm to 200 μm. If the thickness of the base material 2 is too thin, the strength may be insufficient and the distortion of the base material 2 may increase during the plating process of the metal wiring pattern 3. This thickness is a condition when the base material 2 is a film-like base material, and the insulating base material 2 to which the present invention is applied is not limited to the film-like base material.

基材2の表面には、金属ナノ粒子等の触媒インクを均一に塗布するために、表面処理を施すことが好ましい。表面処理としては、例えば、コロナ処理、プラズマ処理、溶剤処理、プライマー処理を用いることができる。 The surface of the base material 2 is preferably surface-treated in order to uniformly apply the catalyst ink such as metal nanoparticles. As the surface treatment, for example, corona treatment, plasma treatment, solvent treatment, and primer treatment can be used.

このような変形可能な熱可塑性樹脂からなるフィルム状の基材2は、電子装置1の要求される使用態様によって、実質的に平坦な2次元形状から実質的に3次元形状に賦形される。 The film-like base material 2 made of such a deformable thermoplastic resin is shaped from a substantially flat two-dimensional shape to a substantially three-dimensional shape according to the required usage mode of the electronic device 1. ..

(金属配線パターン)
基材2の表面に金属配線パターン3を配置する場合、さきに、金属めっき成長のきっかけとなる金属ナノ粒子等の触媒からなる下地層3aを所定のパターン状に形成する。
下地層3aは、基材2上に金属ナノ粒子等の触媒インクを塗布したあと、乾燥および焼成を行うことにより形成する。
(Metal wiring pattern)
When the metal wiring pattern 3 is arranged on the surface of the base material 2, the base layer 3a made of a catalyst such as metal nanoparticles that triggers the growth of metal plating is formed in a predetermined pattern.
The base layer 3a is formed by applying a catalyst ink such as metal nanoparticles on the base material 2 and then drying and firing the base layer 3a.

下地層3aの厚みは、100nm〜20μmが好ましく、200nm〜5μmがさらに好ましく、500nm〜2μmが最も好ましい。下地層3aが薄すぎると、下地層3aの強度が低下するおそれがある。また、下地層3aが厚すぎると、金属ナノ粒子は通常の金属よりも高価であるため、製造コストが増大する虞がある The thickness of the base layer 3a is preferably 100 nm to 20 μm, more preferably 200 nm to 5 μm, and most preferably 500 nm to 2 μm. If the base layer 3a is too thin, the strength of the base layer 3a may decrease. Further, if the base layer 3a is too thick, the metal nanoparticles are more expensive than ordinary metals, which may increase the manufacturing cost.

触媒の材料としては、金、銀、銅、パラジウム、ニッケルなどが用いられ、導電性の観点から金、銀、銅が好ましく、金、銀に比べて安価な銅が最も好ましい。 As the material of the catalyst, gold, silver, copper, palladium, nickel and the like are used, and gold, silver and copper are preferable from the viewpoint of conductivity, and copper, which is cheaper than gold and silver, is most preferable.

触媒の粒子径は1nm〜500nmが好ましく、10nm〜100nmがより好ましい。粒子径が小さすぎる場合、粒子の反応性が高くなりインクの保存性・安定性に悪影響を与える虞がある。粒子径が大きすぎる場合、薄膜の均一形成が困難になるとともに、インクの粒子の沈殿が起こりやすくなる虞がある。 The particle size of the catalyst is preferably 1 nm to 500 nm, more preferably 10 nm to 100 nm. If the particle size is too small, the reactivity of the particles becomes high, which may adversely affect the storage stability and stability of the ink. If the particle size is too large, it becomes difficult to form a thin film uniformly, and there is a risk that ink particles are likely to precipitate.

金属配線パターン3は、下地層3aの上に電解めっきまたは無電解めっきにより形成される。めっき金属としては、銅、ニッケル、錫、銀、金などを用いることができるが、伸長性、導電性および価格の観点から銅を用いることが最も好ましい。 The metal wiring pattern 3 is formed on the base layer 3a by electrolytic plating or electroless plating. As the plating metal, copper, nickel, tin, silver, gold and the like can be used, but copper is most preferable from the viewpoint of extensibility, conductivity and price.

めっき層の厚さは、0.03μm〜100μmが好ましく、1μm〜35μmがより好ましく、3μm〜18μmが最も好ましい。めっき層が薄すぎると、機械的強度が不足するとともに、導電性が実用上十分に得られない虞がある。めっき層が厚すぎると、めっきに必要な時間が長くなり、製造コストが増大する虞がある。 The thickness of the plating layer is preferably 0.03 μm to 100 μm, more preferably 1 μm to 35 μm, and most preferably 3 μm to 18 μm. If the plating layer is too thin, the mechanical strength may be insufficient and the conductivity may not be sufficiently obtained in practice. If the plating layer is too thick, the time required for plating becomes long, which may increase the manufacturing cost.

金属配線パターン3は、図1においては、タッチセンサ3Aとして配置されている例を示しているが、金属配線パターン3には、複数の電子部品が取り付けられてもよい。電子部品としては、制御回路、歪み、抵抗、静電容量、TIRなどの接触感知、および光検出部品、圧電アクチュエータまたは振動モータなどの触知部品または振動部品、LEDなどの発光部品、マイクおよびスピーカーなどの発音または受音、メモリチップ、プログラマブルロジックチップおよびCPUなどのデバイス操作部品、デジタル信号プロセッサ(DSP)、ALSデバイス、PSデバイス、処理デバイス、MEMS等が挙げられる。 Although the metal wiring pattern 3 shows an example in which the touch sensor 3A is arranged in FIG. 1, a plurality of electronic components may be attached to the metal wiring pattern 3. Electronic components include control circuits, distortion, resistance, capacitance, contact sensing such as TIR, and light detection components, tactile or vibrating components such as piezoelectric actuators or vibration motors, light emitting components such as LEDs, microphones and speakers. Such as sounding or receiving sound, a memory chip, a programmable logic chip, a device operating component such as a CPU, a digital signal processor (DSP), an ALS device, a PS device, a processing device, a MEMS, and the like.

(外部接続端子)
金属配線パターン3上には、図2に示すように、電子装置1の外部に設けられた外部素子と電気的に接続するための外部接続端子4が接合されている。
外部接続端子4は、例えば、銅の合金などを用いて四角柱形状に形成されている。尚、外部接続端子4は、一例として、表面にニッケルメッキを施し、そのニッケルメッキの上に、金、錫などの金属やそれら金属を含む合金などのメッキが施されても良い。外部接続端子4のピッチは、接続先のコネクタの規格に応じている。外部接続端子4は、例えば、コネクタ端子となる端子部4aと、金属配線パターン3と接合部材5で接合されるアンカー部4bとからなり、アンカー部4bが接合部材5で金属配線パターン3に接合される。
(External connection terminal)
As shown in FIG. 2, an external connection terminal 4 for electrically connecting to an external element provided outside the electronic device 1 is joined to the metal wiring pattern 3.
The external connection terminal 4 is formed in a quadrangular prism shape using, for example, a copper alloy or the like. As an example, the surface of the external connection terminal 4 may be nickel-plated, and the nickel plating may be plated with a metal such as gold or tin or an alloy containing these metals. The pitch of the external connection terminal 4 corresponds to the standard of the connector to which the connection is made. The external connection terminal 4 is composed of, for example, a terminal portion 4a serving as a connector terminal, an anchor portion 4b joined by a metal wiring pattern 3 and a joining member 5, and the anchor portion 4b is joined to the metal wiring pattern 3 by the joining member 5. Will be done.

(接合部材)
図2(a)に示すように、外部接続端子4のアンカー部4bは金属配線パターン3と接合手段の一例としての接合部材5で接合されている。接合部材5としては、はんだ5Aが挙げられる。はんだ5Aは、基材2の軟化点より低温の溶融温度を有する低温はんだが望ましく、例えば、錫(Sn)とビスマス(Bi)との合金(SnBi)、錫(Sn)とビスマス(Bi)とニッケル(Ni)と銅(Cu)との合金(SnBiNiCu)、錫(Sn)とビスマス(Bi)と銅(Cu)とアンチモン(Sb)との合金(SnBiCuSb)、錫(Sn)と銀(Ag)とビスマス(Bi)との合金(SnAgBi)、錫(Sn)とインジウム(In)との合金(SnIn)、錫(Sn)とインジウム(In)とビスマス(Bi)との合金(SnInBi)、又は、基材2の軟化点と比較して相対的に低い融点を持つその他の合金とビスマス(Bi)及び/又はインジウム(In)とのその他の組み合わせとすることができ、例えば基材2としてのポリエチレンテレフタレート(PET)の軟化点より低い120〜140℃の融点を有することが望ましい。
(Joining member)
As shown in FIG. 2A, the anchor portion 4b of the external connection terminal 4 is joined to the metal wiring pattern 3 by a joining member 5 as an example of the joining means. Examples of the joining member 5 include solder 5A. The solder 5A is preferably a low-temperature solder having a melting temperature lower than the softening point of the base material 2, for example, an alloy (SnBi) of tin (Sn) and bismuth (Bi), tin (Sn) and bismuth (Bi). Alloy of nickel (Ni) and copper (Cu) (SnBiNiCu), alloy of tin (Sn) and bismuth (Bi) and copper (Cu) and antimony (Sb) (SnBiCuSb), tin (Sn) and silver (Ag) ) And an alloy of bismuth (Bi) (SnAgBi), an alloy of tin (Sn) and indium (In) (SnIn), an alloy of tin (Sn), indium (In) and bismuth (Bi) (SnInBi), Alternatively, another alloy having a melting point relatively low as compared with the softening point of the base material 2 and other combinations of bismuth (Bi) and / or indium (In) can be used, for example, as the base material 2. It is desirable to have a melting point of 120-140 ° C., which is lower than the softening point of polyethylene terephthalate (PET).

基材2の軟化点よりも低い融点を持つはんだペーストを用いることにより、基材2は溶融又はその他の変形をしない一方で、はんだペーストは溶融して金属配線パターン3と化学的かつ物理的に接合し得る状態になる。そして、はんだが固化して、はんだ5Aを介して金属配線パターン3に外部接続端子4が接合される。 By using a solder paste having a melting point lower than the softening point of the base material 2, the base material 2 does not melt or otherwise deform, while the solder paste melts and chemically and physically with the metal wiring pattern 3. It is ready to be joined. Then, the solder solidifies, and the external connection terminal 4 is joined to the metal wiring pattern 3 via the solder 5A.

また、外部接続端子4と金属配線パターン3との接合には、レーザーはんだ付けや光焼成はんだ付けを用いてもよい。この場合は、こてはんだ付けに比べて、非接触で基材2に負荷を与えないことから、はんだは特に低温はんだに限らず、通常のはんだでもよい。 Further, laser soldering or light firing soldering may be used for joining the external connection terminal 4 and the metal wiring pattern 3. In this case, as compared with trowel soldering, the base material 2 is not subjected to a load in a non-contact manner. Therefore, the solder is not limited to low temperature solder, and may be ordinary solder.

接合部材5としては、図2(b)に示すように、導電性の線材5Bであってもよい。導電性の線材5Bは、外部接続端子4のアンカー部4bと金属配線パターン3とをワイヤーボンディングにより電気的に接続する導線であり、具体的には、金、銅、銀、白金、アルミニウム又はこれらの合金の金属線を用いることができる。特に、後述する被覆材からの応力による破断が生じにくく、熱抵抗などに優れる金線が好ましい。 As shown in FIG. 2B, the joining member 5 may be a conductive wire rod 5B. The conductive wire 5B is a conducting wire that electrically connects the anchor portion 4b of the external connection terminal 4 and the metal wiring pattern 3 by wire bonding, and specifically, gold, copper, silver, platinum, aluminum, or these. Metal wire of the alloy of the above can be used. In particular, a gold wire that is less likely to break due to stress from the coating material described later and has excellent thermal resistance is preferable.

(樹脂層)
樹脂層6は、外部接続端子4の端子部4aが露出するように基材2の一面2aに対して接着層ADを介して形成され、図2に示すように、金属配線パターン3が配置された一面2aを覆う本体部61と、筒形状を有し、筒の内部に外部接続端子4の端子部4aが露出するように囲むハウジング部62と、を備えて構成されている。本実施形態に係る電子装置1においては、外部接続端子4及びハウジング部62が、電子装置1と電子装置1の外部に設けられた外部素子とを電気的に接続するコネクタを構成している。
これにより、部品点数を削減するとともに変形可能な基材2上に形成された金属配線パターン3上に外部接続端子4を位置精度よく配置することができる。尚、接着層ADは、金属配線パターン3を覆い隠すように調色されていることが好ましい。
(Resin layer)
The resin layer 6 is formed on one surface 2a of the base material 2 via the adhesive layer AD so that the terminal portion 4a of the external connection terminal 4 is exposed, and the metal wiring pattern 3 is arranged as shown in FIG. It is configured to include a main body portion 61 that covers one side 2a, and a housing portion 62 that has a tubular shape and surrounds the terminal portion 4a of the external connection terminal 4 so as to be exposed inside the cylinder. In the electronic device 1 according to the present embodiment, the external connection terminal 4 and the housing portion 62 form a connector for electrically connecting the electronic device 1 and an external element provided outside the electronic device 1.
As a result, the number of parts can be reduced and the external connection terminal 4 can be arranged with high positional accuracy on the metal wiring pattern 3 formed on the deformable base material 2. The adhesive layer AD is preferably toned so as to cover the metal wiring pattern 3.

尚、樹脂層6は、基材2の金属配線パターン3が配置された一面2aとは反対側の他面2bにも形成してもよい。この他面2bに形成される樹脂層6は、一面2aに形成される樹脂層6と同一の樹脂材料であってもよいが、異なる樹脂材料であってもよい。他面2bに形成される樹脂層6は接着層ADを透光性とした上で樹脂材料を透明樹脂材料とすることで、例えば電子装置1の内部に加飾が施された場合に、加飾を保護しながら視認可能とすることができる。ここで、その使用態様から、基材2の一面2aを覆う本体部61と、外部接続端子4の端子部4aが露出するように外部接続端子4を囲むハウジング部62からなる樹脂層6が形成された側は、電子装置1としては裏面側となり、透明樹脂材料からなる樹脂層6が形成された側は加飾側として電子装置1としての表面側となる。 The resin layer 6 may also be formed on the other surface 2b on the side opposite to the one surface 2a on which the metal wiring pattern 3 of the base material 2 is arranged. The resin layer 6 formed on the other surface 2b may be the same resin material as the resin layer 6 formed on the one surface 2a, but may be a different resin material. The resin layer 6 formed on the other surface 2b is formed by making the adhesive layer AD translucent and using the resin material as a transparent resin material, for example, when the inside of the electronic device 1 is decorated. It can be made visible while protecting the decoration. Here, from the usage mode, a resin layer 6 composed of a main body portion 61 that covers one surface 2a of the base material 2 and a housing portion 62 that surrounds the external connection terminal 4 so that the terminal portion 4a of the external connection terminal 4 is exposed is formed. The side that has been formed is the back side of the electronic device 1, and the side on which the resin layer 6 made of the transparent resin material is formed is the front side of the electronic device 1 as the decorative side.

樹脂層6は、二次モールド成形可能な熱可塑性樹脂材料からなる熱可塑性樹脂である。具体的には、ポリカーボネート(PC)、ポリエチレンテレフタレート(PET)、ポリメチルメタクリレート(PMMA)、ポリアミド(PA)、アクリルブタジエンスチレン(ABS)、ポリエチレン(PE)、ポリプロピレン(PP)、変性ポリフェニレンエーテル(m−PPE)、変性ポリフェニレンオキサイト(m−PPO)、シクロオレフィンコポリマー(COC)、シクロオレフィンポリマー(COP)、ポリテトラフルオロエチレン(PTFE)、ポリ塩化ビニル(PVC)、またはこれらの混合物を含む熱可塑性樹脂を用いることができる。 The resin layer 6 is a thermoplastic resin made of a thermoplastic resin material that can be secondarily molded. Specifically, polycarbonate (PC), polyethylene terephthalate (PET), polymethylmethacrylate (PMMA), polyamide (PA), acrylic butadiene styrene (ABS), polyethylene (PE), polypropylene (PP), modified polyphenylene ether (m). -PPE), modified polyphenylene oxide (m-PPO), cycloolefin copolymer (COC), cycloolefin polymer (COP), polytetrafluoroethylene (PTFE), polyvinyl chloride (PVC), or a mixture thereof. A plastic resin can be used.

樹脂層6は、図3に示すように、基材2の金属配線パターン3が配置された一面2aとは反対側の他面2bに形成してもよい。この場合、図3(b)に示すように、基材2の金属配線パターン3が配置された一面2aにも樹脂層6を形成することで電子装置1の金属配線パターン3及び金属配線パターン3に取り付けられた電子部品を覆い保護することができる。 As shown in FIG. 3, the resin layer 6 may be formed on the other surface 2b on the side opposite to the one surface 2a on which the metal wiring pattern 3 of the base material 2 is arranged. In this case, as shown in FIG. 3B, the metal wiring pattern 3 and the metal wiring pattern 3 of the electronic device 1 are formed by forming the resin layer 6 on the one surface 2a on which the metal wiring pattern 3 of the base material 2 is arranged. It is possible to cover and protect the electronic components attached to the.

(被覆層)
被覆層7は、外部接続端子4と金属配線パターン3が接合部材5で接合された状態で、上面を覆うように凹部8にポッティングで配置され接合部材5を保護する。凹部8は、図2に示すように、樹脂層6を二次モールドする際に、樹脂層6が形成されない領域として形成される。また、図3に示すように、基材2と外部接続端子4を金型に載置して樹脂層6を二次モールドする際に、熱成形可能な基材2に金型で賦形することによって形成されてもよい。
(Coating layer)
The coating layer 7 is arranged in the recess 8 by potting so as to cover the upper surface in a state where the external connection terminal 4 and the metal wiring pattern 3 are joined by the joining member 5, and protects the joining member 5. As shown in FIG. 2, the recess 8 is formed as a region in which the resin layer 6 is not formed when the resin layer 6 is secondarily molded. Further, as shown in FIG. 3, when the base material 2 and the external connection terminal 4 are placed on a mold and the resin layer 6 is secondarily molded, the base material 2 is thermoformed by the mold. It may be formed by.

被覆層7に用いる樹脂材料としては、熱硬化性樹脂材料、二液硬化性樹脂材料、光硬化性樹脂材料、又は湿気硬化性樹脂材料からなる硬化性樹脂が好ましい。具体的には、エポキシ樹脂、ウレタン樹脂、アクリル樹脂、ポリイミド樹脂、ポリアミド樹脂、ビスマレイミド、フェノール樹脂、ポリエステル樹脂、シリコーン樹脂、オキセタン樹脂など、様々な樹脂等を用いることができる。これらの中では、特にエポキシ樹脂が好適である。尚、これらの硬化性樹脂は、単独で用いてもよく、2種類以上を混合して用いてもよい。 As the resin material used for the coating layer 7, a curable resin made of a thermosetting resin material, a two-component curable resin material, a photocurable resin material, or a moisture-curable resin material is preferable. Specifically, various resins such as epoxy resin, urethane resin, acrylic resin, polyimide resin, polyamide resin, bismaleimide, phenol resin, polyester resin, silicone resin, and oxetane resin can be used. Among these, epoxy resin is particularly preferable. These curable resins may be used alone or in combination of two or more.

被覆層7に用いる樹脂材料の粘度は、室温(20±5℃)で、0.3Pa・s以上15Pa・s以下であることが好ましい。樹脂材料脂の粘度が0.3Pa・s以上であれば、ポッティングにより賦形された凹部8を埋めるように樹脂材料を容易に配置しやすい。
これらの硬化性樹脂材料は、接着剤や塗料としても用いられ、種々の材料に対して高い密着性を有するとともに、硬化前のモノマーの状態では粘度が低いため、成形性に優れ、外部接続端子4のアンカー部4bと金属配線パターン3とを接合する接合部材5の全体を覆うのに好適である。
The viscosity of the resin material used for the coating layer 7 is preferably 0.3 Pa · s or more and 15 Pa · s or less at room temperature (20 ± 5 ° C.). When the viscosity of the resin material fat is 0.3 Pa · s or more, the resin material can be easily arranged so as to fill the recess 8 formed by potting.
These curable resin materials are also used as adhesives and paints, have high adhesion to various materials, and have low viscosity in the state of the monomer before curing, so they are excellent in moldability and external connection terminals. It is suitable for covering the entire joining member 5 that joins the anchor portion 4b of 4 and the metal wiring pattern 3.

(2)電子装置の製造方法
図4は電子装置1の製造方法の概略の手順の一例を示すフローチャート図、図5は電子装置1の製造過程を説明するための電子装置1の部分断面模式図、図6は電子装置1の他の製造過程を説明するための電子装置1の部分断面模式図である。
電子装置1は、熱可塑性樹脂により構成された熱成形可能な基材2上に、金属ナノ粒子等の触媒インクを塗布する下地層形成工程S1と、めっき処理により下地層3aの上に金属配線パターン3を形成するめっき工程S2と、金属配線パターン3が配置された基材2と外部接続端子4を金型に載置して基材2の少なくとも一面を覆うように射出成形により熱可塑性樹脂を二次モールドする樹脂充填工程S3と、金属配線パターン3と外部接続端子4とを接合部材5で電気的に接合する電気的接合工程S4と、を経て製造される。
(2) Manufacturing Method of Electronic Device FIG. 4 is a flowchart showing an example of a schematic procedure of the manufacturing method of the electronic device 1, and FIG. 5 is a schematic partial cross-sectional view of the electronic device 1 for explaining the manufacturing process of the electronic device 1. FIG. 6 is a schematic partial cross-sectional view of the electronic device 1 for explaining another manufacturing process of the electronic device 1.
The electronic device 1 includes a base layer forming step S1 in which a catalyst ink such as metal nanoparticles is applied onto a thermoforming base material 2 made of a thermoplastic resin, and metal wiring on the base layer 3a by plating. The plating step S2 for forming the pattern 3, the base material 2 on which the metal wiring pattern 3 is arranged, and the external connection terminal 4 are placed on a mold, and the thermoplastic resin is injection-molded so as to cover at least one surface of the base material 2. Is manufactured through a resin filling step S3 for secondary molding and an electrical joining step S4 for electrically joining the metal wiring pattern 3 and the external connection terminal 4 with the joining member 5.

(下地層形成工程)
所定の形状及び大きさに形成された実質的に平坦なフィルム状の基材2上に金属配線パターン3を配置するために、基材2上に金属めっき成長のきっかけとなる金属ナノ粒子等の触媒粒子からなる下地層3aを所定のパターン状に形成する。尚、基材2は、金属ナノ粒子等の触媒粒子からなる触媒インクを均一に塗布するために、例えば、コロナ処理、プラズマ処理、溶剤処理、プライマー処理等の表面処理を施すことが好ましい。
(Underground layer forming process)
In order to arrange the metal wiring pattern 3 on the substantially flat film-like base material 2 formed into a predetermined shape and size, metal nanoparticles or the like that trigger the growth of metal plating on the base material 2 The base layer 3a made of catalyst particles is formed in a predetermined pattern. The base material 2 is preferably subjected to surface treatment such as corona treatment, plasma treatment, solvent treatment, and primer treatment in order to uniformly apply the catalyst ink composed of catalyst particles such as metal nanoparticles.

基材2上に金属ナノ粒子等の触媒粒子からなる触媒インクを塗布する方法としては、インクジェット印刷方式、シルクスクリーン印刷方式、グラビア印刷方式、オフセット印刷方式、フレキソ印刷方式、ローラーコーター方式、刷毛塗り方式、スプレー方式、ナイフジェットコーター方式、パッド印刷方式、グラビアオフセット印刷方式、ダイコーター方式、バーコーター方式、スピンコーター方式、コンマコーター方式、含浸コーター方式、ディスペンサー方式、メタルマスク方式が挙げられるが、本実施形態においてはインクジェット印刷方式を用いている。 As a method of applying a catalyst ink composed of catalyst particles such as metal nanoparticles on the base material 2, an inkjet printing method, a silk screen printing method, a gravure printing method, an offset printing method, a flexo printing method, a roller coater method, and brush coating are used. Methods, spray method, knife jet coater method, pad printing method, gravure offset printing method, die coater method, bar coater method, spin coater method, comma coater method, impregnation coater method, dispenser method, metal mask method, etc. In this embodiment, an inkjet printing method is used.

具体的には、1000cps以下、例えば、2cpsから30cpsの低粘度の触媒インクをインクジェット印刷方式で塗布した後、溶媒を揮発させ金属ナノ粒子のみを残す。その後、溶媒を除去し(乾燥)、金属ナノ粒子を焼結させる(焼成)。
焼成温度は、100°C〜300°Cが好ましく、150°C〜200°Cがより好ましい。焼成温度が低すぎると、金属ナノ粒子同士の焼結が不十分となるとともに、金属ナノ粒子以外の成分が残ることで、密着性が得られない虞がある。また、焼成温度が高すぎると、基材2の劣化や歪みが発生する虞がある。
Specifically, after applying a low-viscosity catalyst ink of 1000 cps or less, for example, 2 cps to 30 cps by an inkjet printing method, the solvent is volatilized to leave only metal nanoparticles. Then, the solvent is removed (drying) and the metal nanoparticles are sintered (baking).
The firing temperature is preferably 100 ° C to 300 ° C, more preferably 150 ° C to 200 ° C. If the firing temperature is too low, the sintering of the metal nanoparticles will be insufficient, and components other than the metal nanoparticles will remain, so that adhesion may not be obtained. Further, if the firing temperature is too high, the base material 2 may be deteriorated or distorted.

触媒インク中の金属ナノ粒子の含有割合については、質量比で5%〜60%が好ましく、10%〜30%がさらに好ましい。含有割合が低すぎる場合、金属ナノ粒子による下地層3aを形成するのに必要なナノ粒子が足らずピンホールが発生する虞があり、含有割合が高過ぎるとインクの中で粒子同士が凝集しやすくなるなど安定性が損なわれる虞がある。 The content ratio of the metal nanoparticles in the catalyst ink is preferably 5% to 60%, more preferably 10% to 30% in terms of mass ratio. If the content ratio is too low, there is a risk that the nanoparticles required to form the base layer 3a made of metal nanoparticles will be insufficient and pinholes will occur, and if the content ratio is too high, the particles will easily aggregate in the ink. There is a risk that stability will be impaired.

(めっき工程)
下地層形成工程を経て基材2上に形成された下地層3aに対し、電解めっきまたは無電解めっきを行うことにより、下地層3aの表面および内部にめっき金属を析出させる。めっき方法は公知のめっき液およびめっき処理と同様であり、具体的に無電解銅めっき、電解銅めっきが挙げられる。
(Plating process)
By performing electrolytic plating or electroless plating on the base layer 3a formed on the base material 2 through the base layer forming step, plating metal is deposited on the surface and inside of the base layer 3a. The plating method is the same as that of known plating solutions and plating treatments, and specific examples thereof include electrolytic copper plating and electrolytic copper plating.

(樹脂充填工程)
樹脂充填工程S3では、まず、図5(a)に示すように、めっき工程S2で金属配線パターン3が配置された基材2の金属配線パターン3が配置された一面2aの反対側の他面2bにバインダーインクBaを塗布した上で樹脂層6を二次モールドにより形成する。バインダーインクBaは、接着性樹脂を含み、スクリーン印刷、インクジェット印刷、スプレーコート、筆塗り等で塗布され、基材2と二次モールドされる樹脂層6との接着性を向上させる。尚、透明樹脂材料からなる樹脂層6が形成される場合は、透光性を有することが好ましい。
(Resin filling process)
In the resin filling step S3, first, as shown in FIG. 5A, the other surface on the opposite side of the one side 2a on which the metal wiring pattern 3 of the base material 2 on which the metal wiring pattern 3 is arranged is arranged in the plating step S2. After applying the binder ink Ba to 2b, the resin layer 6 is formed by a secondary mold. The binder ink Ba contains an adhesive resin and is applied by screen printing, inkjet printing, spray coating, brush coating or the like to improve the adhesiveness between the base material 2 and the second-molded resin layer 6. When the resin layer 6 made of a transparent resin material is formed, it is preferably translucent.

次に、基材2の金属配線パターン3が配置された一面2aにバインダーインクBbを塗布した後、図5(b)に示すように、基材2の他面2bに樹脂層6が形成された基材2と外部接続端子4を、二次モールド成形用金型に位置決めして載置した状態で金型を閉じて熱可塑性樹脂を基材2の一面2aを覆うように射出成形する。ここで、バインダーインクBbは、金属配線パターン3を覆い隠すように調色されていることが好ましい。これにより、樹脂層6が配置された電子装置1の裏面側から金属配線パターン3を不可視にして、外観上の美観を維持することができる。 Next, after the binder ink Bb is applied to the one surface 2a on which the metal wiring pattern 3 of the base material 2 is arranged, the resin layer 6 is formed on the other surface 2b of the base material 2 as shown in FIG. 5 (b). The base material 2 and the external connection terminal 4 are positioned and placed on the mold for secondary molding, the mold is closed, and the thermoplastic resin is injection-molded so as to cover one surface 2a of the base material 2. Here, the binder ink Bb is preferably toned so as to cover the metal wiring pattern 3. As a result, the metal wiring pattern 3 can be made invisible from the back surface side of the electronic device 1 on which the resin layer 6 is arranged, and the appearance can be maintained.

この樹脂充填工程S3においては、金型と外部接続端子4の位置決めを行った状態で熱可塑性樹脂が射出成形によって射出され、金属配線パターン3が配置された一面2aを覆う本体部61と、外部接続端子4の端子部4aが露出するように外部接続端子4を囲むハウジング部62とが一体となった樹脂層6が形成される。
このように、外部接続端子4と金属配線パターン3が配置された基材2を金型に位置決めして載置した状態で樹脂層6を二次モールドすることで、部品点数を削減するとともに変形可能な基材上に形成された金属配線パターン3上に外部接続端子4を位置精度よく配置することができる。
In this resin filling step S3, the thermoplastic resin is injected by injection molding with the mold and the external connection terminal 4 positioned, and the main body 61 covering the one surface 2a on which the metal wiring pattern 3 is arranged and the outside A resin layer 6 is formed in which the housing portion 62 surrounding the external connection terminal 4 is integrated so that the terminal portion 4a of the connection terminal 4 is exposed.
In this way, the resin layer 6 is secondarily molded with the base material 2 on which the external connection terminal 4 and the metal wiring pattern 3 are arranged positioned and placed on the mold, thereby reducing the number of parts and deforming. The external connection terminal 4 can be arranged with high positional accuracy on the metal wiring pattern 3 formed on the possible base material.

尚、樹脂充填工程S3では、図6に示すように、一面2aに金属配線パターン3が配置された基材2と外部接続端子4を、二次モールド成形用金型に位置決めして載置した状態で熱可塑性樹脂を基材2の一面2aとは反対側の他面2bを覆うように射出成形して(図6(a)参照)、他面2bを覆う本体部61と、外部接続端子4を囲むハウジング部62とが一体となった樹脂層6を先に形成してもよい。その後、金属配線パターン3と外部接続端子4をはんだ5Aで接合して、はんだ5Aをポッティングにより被覆層7で覆い(図6(b)参照)、金属配線パターン3が配置された一面2aを覆うように樹脂層6を二次成形してもよい(図6(c)参照)。 In the resin filling step S3, as shown in FIG. 6, the base material 2 in which the metal wiring pattern 3 is arranged on one surface 2a and the external connection terminal 4 are positioned and placed on the secondary molding die. In this state, the thermoplastic resin is injection-molded so as to cover the other surface 2b on the side opposite to the one surface 2a of the base material 2 (see FIG. 6A), and the main body 61 covering the other surface 2b and the external connection terminal. The resin layer 6 in which the housing portion 62 surrounding the 4 is integrated may be formed first. After that, the metal wiring pattern 3 and the external connection terminal 4 are joined with the solder 5A, the solder 5A is covered with the coating layer 7 by potting (see FIG. 6B), and the one surface 2a on which the metal wiring pattern 3 is arranged is covered. The resin layer 6 may be secondarily molded as described above (see FIG. 6C).

また、樹脂充填工程S3では、図3に示すように、基材2と外部接続端子4を金型に載置して金属配線パターン3と外部接続端子4とを接合部材5で接続する領域に熱成形で凹部8を賦形してもよい。凹部8には、後述する接合工程S4において、硬化性樹脂材料がポッティングされ被覆層7が形成される。これにより、被覆層7を配置する凹部8を樹脂層6と一体して形成することができる。 Further, in the resin filling step S3, as shown in FIG. 3, the base material 2 and the external connection terminal 4 are placed on the mold, and the metal wiring pattern 3 and the external connection terminal 4 are connected by the joining member 5. The recess 8 may be shaped by thermoforming. In the joining step S4 described later, the curable resin material is potted in the recess 8 to form the coating layer 7. As a result, the recess 8 in which the coating layer 7 is arranged can be integrally formed with the resin layer 6.

(電気的接合工程)
基材2上に形成された金属配線パターン3上に外部接続端子4を接合部材5としてのはんだ5Aで接合するために、金属配線パターン3及び外部接続端子4のアンカー部4bにはんだペーストを塗布する。はんだペーストの塗布は、ステンシル印刷装置、スクリーン印刷装置、ディスペンサー装置等の公知の装置を用いて行うことができる。本実施形態においては、ディスペンサー装置を用いてはんだペーストを塗布する。
(Electrical joining process)
In order to join the external connection terminal 4 on the metal wiring pattern 3 formed on the base material 2 with the solder 5A as the joining member 5, solder paste is applied to the metal wiring pattern 3 and the anchor portion 4b of the external connection terminal 4. To do. The solder paste can be applied using a known device such as a stencil printing device, a screen printing device, or a dispenser device. In this embodiment, the solder paste is applied using a dispenser device.

ディスペンサー装置によって金属配線パターン3及び外部接続端子4のアンカー部4b上にはんだペーストを塗布後、図5(c)に示すように、はんだを溶融、固化させて、金属配線パターン3上にはんだ5Aを介して外部接続端子4のアンカー部4bを電気的に接合する。例えば、熱成形等で変形可能な熱可塑性樹脂からなる基材2は、その軟化点が低いが、はんだに低温はんだを用いてこてはんだ付けすることで、基材2は電気的接合工程の熱によって溶融又はその他の変形をすることはない。 After applying the solder paste on the metal wiring pattern 3 and the anchor portion 4b of the external connection terminal 4 by the dispenser device, as shown in FIG. 5C, the solder is melted and solidified, and the solder 5A is placed on the metal wiring pattern 3. The anchor portion 4b of the external connection terminal 4 is electrically joined via the solder. For example, the base material 2 made of a thermoplastic resin that can be deformed by thermoforming or the like has a low softening point, but by soldering with a low-temperature solder to the solder, the base material 2 is heated by the electrical joining process. Does not melt or otherwise deform.

また、はんだ付けは、レーザーはんだ付けや光焼成はんだ付けを用いてもよい。この場合は、非接触で基材2に負荷を与えないことから、はんだは特に低温はんだに限らず、通常のはんだでもよい Further, as the soldering, laser soldering or light firing soldering may be used. In this case, the solder is not limited to low-temperature solder, and may be ordinary solder because it is non-contact and does not give a load to the base material 2.

尚、電気的接合工程S4において、金属配線パターン3と外部接続端子4を接合部材5としての導電性の線材で超音波利用のワイヤーボンディング方法で電気的及び機械的に接合してもよい(図2(b)参照)。導電性の線材としては、金ワイヤー、アルミワイヤーなどを使用することができるが、アルミニウムを主成分とするアルミワイヤーを用いることで、ワイヤーボンディング時の熱によって、基材2が溶融したり変形することを抑制することができる。 In the electrical bonding step S4, the metal wiring pattern 3 and the external connection terminal 4 may be electrically and mechanically bonded by a wire bonding method using ultrasonic waves with a conductive wire rod as a bonding member 5 (FIG. 6). 2 (b)). A gold wire, an aluminum wire, or the like can be used as the conductive wire, but by using an aluminum wire containing aluminum as a main component, the base material 2 is melted or deformed by the heat at the time of wire bonding. Can be suppressed.

接合部材5で接合後に、図5(d)に示すように、樹脂充填工程S3で賦形された凹部8に未硬化の硬化性樹脂材料をポッティング(樹脂盛り)して、金属配線パターン3及び外部接続端子4と接合部材5とを一体的に被覆して被覆層7を形成する。
ポッティングで形成された未硬化の被覆層7を硬化させる方法としては、硬化性樹脂材料を硬化できれば、特に制限されず、使用する樹脂の種類に応じて適宜選択することができる。本実施形態においては、硬化性樹脂材料として、硬化のための加熱を必要としない二液硬化性樹脂材料、光硬化性樹脂材料、又は湿気硬化性樹脂材料を用いることで、基材2が溶融したり変形することを抑制することができる。。
After joining with the joining member 5, as shown in FIG. 5D, an uncured curable resin material is potted (resin-filled) in the recess 8 formed in the resin filling step S3 to form the metal wiring pattern 3 and The external connection terminal 4 and the joining member 5 are integrally covered to form the coating layer 7.
The method for curing the uncured coating layer 7 formed by potting is not particularly limited as long as the curable resin material can be cured, and can be appropriately selected depending on the type of resin used. In the present embodiment, the base material 2 is melted by using a two-component curable resin material, a photocurable resin material, or a moisture-curable resin material that does not require heating for curing as the curable resin material. It is possible to suppress the deformation and deformation. ..

本実施形態に係る電子装置1によれば、部品点数を削減するとともに変形可能な基材2上に形成された金属配線パターン3上に外部接続端子4を位置精度よく配置することができる。位置精度よく配置された外部接続端子4と金属配線パターン3は、はんだ5Aではんだ付けされ、あるいは導電性の線材5Bを介してワイヤーボンディングされ、接合される。 According to the electronic device 1 according to the present embodiment, the number of parts can be reduced and the external connection terminal 4 can be arranged with high position accuracy on the metal wiring pattern 3 formed on the deformable base material 2. The external connection terminal 4 and the metal wiring pattern 3 arranged with high positional accuracy are soldered with solder 5A or wire-bonded via a conductive wire rod 5B to be joined.

図7は電子装置1の他の製造過程を説明するための電子装置1の部分断面模式図、図8は電子装置1の他の態様を示す部分断面模式図である。
本実施形態に係る電子装置1の製造方法によれば、図7に示すように、金属配線パターン3が配置された基材2に樹脂層6を二次モールドして、基材2の他面2b上に本体部61と外部接続端子4を囲むハウジング部62が一体となった樹脂層6を形成(図7(a)参照)した後、外部接続端子4をハウジング部62に形成された挿入孔6aに圧入して、金属配線パターン3とはんだ5Aで電気的に接合してもよい(図7(b)参照)。外部接続端子4を挿入する挿入孔6aは、二次モールドでハウジング部62と一体として形成され、外部接続端子4を位置精度よく配置することができる。
FIG. 7 is a schematic partial cross-sectional view of the electronic device 1 for explaining another manufacturing process of the electronic device 1, and FIG. 8 is a schematic partial cross-sectional view showing another aspect of the electronic device 1.
According to the manufacturing method of the electronic device 1 according to the present embodiment, as shown in FIG. 7, the resin layer 6 is secondarily molded on the base material 2 on which the metal wiring pattern 3 is arranged, and the other surface of the base material 2 is formed. After forming a resin layer 6 in which the main body 61 and the housing 62 surrounding the external connection terminal 4 are integrated on 2b (see FIG. 7A), the external connection terminal 4 is inserted into the housing 62. It may be press-fitted into the hole 6a and electrically joined to the metal wiring pattern 3 with the solder 5A (see FIG. 7B). The insertion hole 6a into which the external connection terminal 4 is inserted is formed integrally with the housing portion 62 by a secondary mold, and the external connection terminal 4 can be arranged with high positional accuracy.

はんだ5Aは、被覆層7で覆われ、必要に応じて基材2の一面2aを覆うように樹脂層6を二次成形してもよい(図7(c)参照)。 The solder 5A may be covered with the coating layer 7, and the resin layer 6 may be secondarily formed so as to cover one surface 2a of the base material 2 if necessary (see FIG. 7C).

また、図8に示すように、外部接続端子4と金属配線パターン3が配置された基材2を金型に位置決めして載置した状態で樹脂層6を二次モールドすることで、図8の矢印で示すように、外部接続端子4のアンカー部62と金属配線パターン3とを二次成形された樹脂圧で密着させて電気的に接合してもよい。尚、アンカー部62には予めバネ性を有するたわみ形状を設けて金属配線パターン3との電気的接合を向上させてもよい。これにより、金属配線パターン3と外部接続端子4との電気的接合に接合部材5を使用することなく部品点数をより削減するとともに、変形可能な基材2上に形成された金属配線パターン3上に外部接続端子4を位置精度よく配置することができる。 Further, as shown in FIG. 8, the resin layer 6 is secondarily molded in a state where the base material 2 on which the external connection terminal 4 and the metal wiring pattern 3 are arranged is positioned and placed on the mold. As shown by the arrow of, the anchor portion 62 of the external connection terminal 4 and the metal wiring pattern 3 may be brought into close contact with each other by a secondary molded resin pressure and electrically joined. The anchor portion 62 may be provided with a flexible shape having a spring property in advance to improve the electrical connection with the metal wiring pattern 3. As a result, the number of parts can be further reduced without using the joining member 5 for electrical joining between the metal wiring pattern 3 and the external connection terminal 4, and the metal wiring pattern 3 formed on the deformable base material 2 can be used. The external connection terminal 4 can be arranged with high positional accuracy.

1・・・電子装置
2・・・基材
3・・・金属配線パターン
4・・・外部接続端子
4a・・・端子部
4b・・・アンカー部
5・・・接合部材
5A・・・はんだ
5B・・・線材
6・・・樹脂層
7・・・被覆層
1 ... Electronic device 2 ... Base material 3 ... Metal wiring pattern 4 ... External connection terminal 4a ... Terminal part 4b ... Anchor part 5 ... Joining member 5A ... Solder 5B・ ・ ・ Wire material 6 ・ ・ ・ Resin layer 7 ・ ・ ・ Coating layer

Claims (5)

合成樹脂材料からなり実質的に平坦な2次元形状から実質的に3次元形状に変形可能な基材と、
前記基材上に配置された金属配線パターンと、
前記基材に熱成形を施して前記基材の厚み方向に前記3次元形状に賦形された凹部で前記金属配線パターンと接触し、前記基材の外部に設けられた外部素子とを電気的に接続するための外部接続端子と、
前記外部接続端子の表面である端子表面が露出するように前記外部接続端子を囲むハウジングを形成し、前記基材の少なくとも一面を覆う樹脂層と、
前記凹部で前記金属配線パターンと前記外部接続端子を電気的に接合する接合手段と、
前記凹部に充填されて前記金属配線パターン及び前記外部接続端子と前記接合手段とを一体的に覆う被覆層と、を備えた、
ことを特徴とする電子装置。
A base material made of synthetic resin material that can be transformed from a substantially flat two-dimensional shape to a substantially three-dimensional shape,
The metal wiring pattern arranged on the base material and
The base material is thermoformed to come into contact with the metal wiring pattern at a recess shaped into the three-dimensional shape in the thickness direction of the base material, and an external element provided outside the base material is electrically connected. With an external connection terminal for connecting to
A housing that surrounds the external connection terminal is formed so that the terminal surface, which is the surface of the external connection terminal, is exposed, and a resin layer that covers at least one surface of the base material is formed.
A joining means for electrically joining the metal wiring pattern and the external connection terminal in the recess,
The recess is filled with the metal wiring pattern and a coating layer that integrally covers the external connection terminal and the joining means.
An electronic device characterized by that.
前記樹脂層は、前記基材の一面に前記金属配線パターンを外部から不可視にする調色された接着層を介して形成されている、
ことを特徴とする請求項1に記載の電子装置。
The resin layer is formed on one surface of the base material via a toned adhesive layer that makes the metal wiring pattern invisible from the outside.
The electronic device according to claim 1.
前記樹脂層は、前記基材の一面とは反対側の他面には透光性の接着層を介して透明樹脂材料で形成されている、
ことを特徴とする請求項1又は2に記載の電子装置。
The resin layer is formed of a transparent resin material on the other surface opposite to one surface of the base material via a translucent adhesive layer.
The electronic device according to claim 1 or 2.
合成樹脂材料からなり実質的に平坦な2次元形状から実質的に3次元形状に変形可能な基材と、
前記基材上に配置された金属配線パターンと、
前記基材に熱成形を施して前記基材の厚み方向に前記3次元形状に賦形された凹部で前記金属配線パターンと接触し、前記基材の外部に設けられた外部素子とを電気的に接続するための外部接続端子と、
前記外部接続端子の表面である端子表面が露出するように前記外部接続端子を囲むハウジングを形成し、前記基材の少なくとも一面を覆う樹脂層と、
前記凹部で前記金属配線パターンと前記外部接続端子を電気的に接合する接合手段と、
前記凹部に充填されて前記接合手段を覆う被覆層と、を備える電子装置の製造方法であって、
前記基材を準備する工程と、
前記基材上に前記金属配線パターンを配置する工程と、
前記金属配線パターンが配置された前記基材と前記外部接続端子を金型に位置決めして載置して前記凹部を賦形すると同時に前記樹脂層を射出成形する工程と、
前記金属配線パターンと前記外部接続端子とを接合手段で電気的に接合する工程と、
前記凹部に前記被覆層を充填して前記金属配線パターン及び前記外部接続端子と前記接合手段とを一体的に被覆する被覆工程と、を順に実行する、
ことを特徴とする電子装置の製造方法。
A base material made of synthetic resin material that can be transformed from a substantially flat two-dimensional shape to a substantially three-dimensional shape,
The metal wiring pattern arranged on the base material and
The base material is thermoformed to come into contact with the metal wiring pattern at a recess shaped into the three-dimensional shape in the thickness direction of the base material, and an external element provided outside the base material is electrically connected. With an external connection terminal for connecting to
A housing that surrounds the external connection terminal is formed so that the terminal surface, which is the surface of the external connection terminal, is exposed, and a resin layer that covers at least one surface of the base material is formed.
A joining means for electrically joining the metal wiring pattern and the external connection terminal in the recess,
A method of manufacturing an electronic device including a coating layer that fills the recess and covers the joining means.
The process of preparing the base material and
The step of arranging the metal wiring pattern on the base material and
A step of positioning and placing the base material on which the metal wiring pattern is arranged and the external connection terminal on a mold to shape the recess and at the same time injection molding the resin layer.
A process of electrically joining the metal wiring pattern and the external connection terminal by a joining means,
A coating step of filling the recess with the coating layer and integrally covering the metal wiring pattern, the external connection terminal, and the joining means is executed in order.
A method for manufacturing an electronic device.
合成樹脂材料からなり実質的に平坦な2次元形状から実質的に3次元形状に変形可能な基材と、
前記基材上に配置された金属配線パターンと、
前記基材に熱成形を施して前記基材の厚み方向に前記3次元形状に賦形された凹部で前記金属配線パターンと接触し、前記基材の外部に設けられた外部素子とを電気的に接続するための外部接続端子と、
前記外部接続端子の表面である端子表面が露出するように前記外部接続端子を囲むハウジングを形成し、前記基材の少なくとも一面を覆う樹脂層と、
前記凹部で前記金属配線パターンと前記外部接続端子を電気的に接合する接合手段と、
前記凹部に充填されて前記接合手段を覆う被覆層と、を備える電子装置の製造方法であって、
前記基材を準備する工程と、
前記基材上に前記金属配線パターンを配置する工程と、
前記金属配線パターンが配置された前記基材を金型に位置決めして載置して前記凹部を賦形すると同時に前記金属配線パターンが配置された一面とは反対側の他面を覆うように前記樹脂層を射出成形する工程と、
前記金属配線パターンと前記外部接続端子とを接合手段で電気的に接合する工程と、
前記凹部に前記被覆層を充填して前記金属配線パターン及び前記外部接続端子と前記接合手段とを一体的に被覆する被覆工程と、
前記金属配線パターンが配置された一面を覆うように前記樹脂層を射出成形する工程と、を順に実行する、
ことを特徴とする電子装置の製造方法。
A base material made of synthetic resin material that can be transformed from a substantially flat two-dimensional shape to a substantially three-dimensional shape,
The metal wiring pattern arranged on the base material and
The base material is thermoformed to come into contact with the metal wiring pattern at a recess shaped into the three-dimensional shape in the thickness direction of the base material, and an external element provided outside the base material is electrically connected. With an external connection terminal for connecting to
A housing that surrounds the external connection terminal is formed so that the terminal surface, which is the surface of the external connection terminal, is exposed, and a resin layer that covers at least one surface of the base material is formed.
A joining means for electrically joining the metal wiring pattern and the external connection terminal in the recess,
A method of manufacturing an electronic device including a coating layer that fills the recess and covers the joining means.
The process of preparing the base material and
The step of arranging the metal wiring pattern on the base material and
The base material on which the metal wiring pattern is arranged is positioned and placed on a mold to form the recess, and at the same time, the base material is covered on the other surface opposite to the one on which the metal wiring pattern is arranged. The process of injection molding the resin layer and
A process of electrically joining the metal wiring pattern and the external connection terminal by a joining means,
A coating step of filling the recess with the coating layer to integrally cover the metal wiring pattern, the external connection terminal, and the joining means.
The steps of injection molding the resin layer so as to cover one surface on which the metal wiring pattern is arranged are executed in order.
A method for manufacturing an electronic device.
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