JP6891130B2 - 構造化照明イメージを生成するためのシステムおよび方法 - Google Patents

構造化照明イメージを生成するためのシステムおよび方法 Download PDF

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JP6891130B2
JP6891130B2 JP2017562590A JP2017562590A JP6891130B2 JP 6891130 B2 JP6891130 B2 JP 6891130B2 JP 2017562590 A JP2017562590 A JP 2017562590A JP 2017562590 A JP2017562590 A JP 2017562590A JP 6891130 B2 JP6891130 B2 JP 6891130B2
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JP2018523153A (ja
JP2018523153A5 (enExample
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スティーブン リトル，
スティーブン リトル，
ポール ボスホーテン，
ポール ボスホーテン，
アンドリュー ガンダーソン，
アンドリュー ガンダーソン，
ラリー ライストローム，
ラリー ライストローム，
クリス ネム，
クリス ネム，
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ライフ テクノロジーズ コーポレーション
ライフ テクノロジーズ コーポレーション
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/0004—Microscopes specially adapted for specific applications
    • G02B21/002—Scanning microscopes
    • G02B21/0024—Confocal scanning microscopes (CSOMs) or confocal "macroscopes"; Accessories which are not restricted to use with CSOMs, e.g. sample holders
    • G02B21/0052—Optical details of the image generation
    • G02B21/0076—Optical details of the image generation arrangements using fluorescence or luminescence
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
    • G01N21/64—Fluorescence; Phosphorescence
    • G01N21/645—Specially adapted constructive features of fluorimeters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
    • G01N21/64—Fluorescence; Phosphorescence
    • G01N21/645—Specially adapted constructive features of fluorimeters
    • G01N21/6456—Spatial resolved fluorescence measurements; Imaging
    • G01N21/6458—Fluorescence microscopy
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/36—Microscopes arranged for photographic purposes or projection purposes or digital imaging or video purposes including associated control and data processing arrangements
    • G02B21/365—Control or image processing arrangements for digital or video microscopes
    • G02B21/367—Control or image processing arrangements for digital or video microscopes providing an output produced by processing a plurality of individual source images, e.g. image tiling, montage, composite images, depth sectioning, image comparison
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
    • G01N21/64—Fluorescence; Phosphorescence
    • G01N21/645—Specially adapted constructive features of fluorimeters
    • G01N2021/6463—Optics
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
    • G01N21/64—Fluorescence; Phosphorescence
    • G01N21/645—Specially adapted constructive features of fluorimeters
    • G01N2021/6463—Optics
    • G01N2021/6478—Special lenses

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Multimedia (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Microscoopes, Condenser (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
JP2017562590A 2015-06-02 2016-05-10 構造化照明イメージを生成するためのシステムおよび方法 Active JP6891130B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201562169669P 2015-06-02 2015-06-02
US62/169,669 2015-06-02
PCT/US2016/031568 WO2016195926A1 (en) 2015-06-02 2016-05-10 Systems and methods for generating a structured illumination image

Publications (3)

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JP2018523153A JP2018523153A (ja) 2018-08-16
JP2018523153A5 JP2018523153A5 (enExample) 2019-06-13
JP6891130B2 true JP6891130B2 (ja) 2021-06-18

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JP2017562590A Active JP6891130B2 (ja) 2015-06-02 2016-05-10 構造化照明イメージを生成するためのシステムおよび方法

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US (1) US10634892B2 (enExample)
EP (1) EP3304049B1 (enExample)
JP (1) JP6891130B2 (enExample)
CN (1) CN107683430B (enExample)
WO (1) WO2016195926A1 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
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US12348841B2 (en) * 2022-03-15 2025-07-01 Intuitive Surgical Operations, Inc. Systems and methods for determining a measure of photobleaching of a fluorescence target

Family Cites Families (20)

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US6426835B1 (en) * 1999-03-23 2002-07-30 Olympus Optical Co., Ltd. Confocal microscope
US6891671B1 (en) * 2000-04-18 2005-05-10 Gary Greenberg Apparatus and methods for creating real-time 3-D images and constructing 3-D models of an object imaged in an optical system
DE10327531B4 (de) * 2003-06-17 2006-11-30 Leica Microsystems Cms Gmbh Verfahren zur Messung von Fluoreszenzkorrelationen in Gegenwart von langsamen Signalschwankungen
JP4426856B2 (ja) * 2004-01-28 2010-03-03 オリンパス株式会社 蛍光検出装置、濃淡情報補正方法、濃淡情報補正プログラムおよび走査型共焦点レーザ顕微鏡
US7612350B2 (en) * 2005-01-18 2009-11-03 Olympus Corporation Scanning microscope and specimen image obtaining method in which adjacent data obtaining points are not consecutively obtained
US20070057211A1 (en) * 2005-05-25 2007-03-15 Karsten Bahlman Multifocal imaging systems and method
EP2034349B2 (en) * 2006-06-08 2023-07-19 Nikon Corporation Observing apparatus and observing method
WO2008124832A1 (en) * 2007-04-10 2008-10-16 University Of Rochester Structured illumination for imaging of stationary and non-stationary, fluorescent and non-flourescent objects
US8558998B2 (en) * 2008-06-16 2013-10-15 The Regents Of The University Of Colorado, A Body Corporate Fourier domain sensing
DE102008049878A1 (de) * 2008-09-30 2010-04-01 Carl Zeiss Microlmaging Gmbh Verbesserte Verfahren und Vorrichtungen für die Mikroskopie mit strukturierter Beleuchtung
US8693742B2 (en) * 2008-12-17 2014-04-08 The Regents Of The University Of Colorado Three-dimensional single-molecule fluorescence imaging beyond the diffraction limit using a double-helix point spread function
JP5412394B2 (ja) * 2010-09-30 2014-02-12 オリンパス株式会社 標本観察装置
KR101252938B1 (ko) * 2011-04-08 2013-04-12 한국과학기술원 초고해상도 현미경 시스템 및 그 시스템을 이용한 영상 획득 방법
US20120307247A1 (en) * 2011-05-31 2012-12-06 Nanyang Technological University Fluorescence Microscopy Method And System
CN102621117B (zh) * 2012-03-09 2014-03-12 福建师范大学 一种活细胞激光扫描共聚焦显微成像系统
EP2713195B1 (en) * 2012-09-28 2017-04-12 Universität Heidelberg High resolution microscopy by means of structured illumination at large working distances
CN103090787B (zh) * 2013-01-29 2016-01-20 哈尔滨工业大学 基于被测表面荧光激发的共焦显微测量装置
JP6246555B2 (ja) * 2013-10-25 2017-12-13 株式会社キーエンス 顕微鏡撮像装置、顕微鏡撮像方法および顕微鏡撮像プログラム
US10061111B2 (en) * 2014-01-17 2018-08-28 The Trustees Of Columbia University In The City Of New York Systems and methods for three dimensional imaging
CN107667310B (zh) * 2015-06-02 2021-01-01 生命技术公司 荧光成像系统

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Publication number Publication date
JP2018523153A (ja) 2018-08-16
US20180157021A1 (en) 2018-06-07
CN107683430A (zh) 2018-02-09
CN107683430B (zh) 2021-01-01
EP3304049B1 (en) 2020-05-06
US10634892B2 (en) 2020-04-28
EP3304049A1 (en) 2018-04-11
WO2016195926A1 (en) 2016-12-08

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