JP6886777B2 - Transparent conductive film and touch panel - Google Patents

Description

The present invention relates to a transparent conductive film and a touch panel, and more particularly to a transparent conductive film and a touch panel including the transparent conductive film.

Conventionally, it is known that a transparent conductive film is used as an electrode member of a touch panel or the like. For example, a transparent conductive film including a base film, an optical adjusting layer, and a transparent conductive layer in this order has been proposed (see, for example, Patent Document 1 below).

The optical adjustment layer of Patent Document 1 is made of an organic-inorganic composite material containing an organic component and an inorganic component, and has a refractive index of 1.60 or more and 1.90 or less.

Japanese Unexamined Patent Publication No. 2010-27294

However, in the transparent conductive film of Patent Document 1, the optical adjustment layer contains an inorganic component. Then, when the amorphous transparent conductive layer is crystallized, the crystal growth of the transparent conductive layer is inhibited due to the inorganic component, and the specific resistance value of the transparent conductive layer becomes high. Therefore, there is a problem that it cannot cope with the increase in size of the touch panel.

On the other hand, when the optical adjustment layer does not contain an inorganic component, the inhibition of crystal growth caused by the inorganic component is suppressed, so that the specific resistance value of the transparent conductive layer can be lowered, while the refractive index of the optical adjustment layer can be lowered. Becomes low. Therefore, when the transparent conductive layer is patterned, there is a problem that the difference between the patterned portion having the transparent conductive layer and the non-patterned portion not having the transparent conductive layer becomes clear. That is, there is a problem that the visibility suppression property is lowered.

An object of the present invention is to provide a transparent conductive film having excellent visibility inhibitory properties and a low specific resistance value of the transparent conductive layer.

In the present invention (1), a base material layer containing a transparent base material, an intermediate layer, and a transparent conductive layer are provided in this order, and the intermediate layer is made of only resin and has a refractive index of 1.59 or more. It is a conductive film.

In this transparent conductive film, since the intermediate layer has a high refractive index of 1.59 or more, it is excellent in visibility suppression when the transparent conductive layer is patterned.

Further, since the intermediate layer is made of only resin, the specific resistance value of the transparent conductive layer can be lowered.

In the present invention (2), the transparent conductive film according to the above (1), wherein the intermediate layer is in contact with the base material layer, and the base material layer has ^{a surface free energy of 60 mJ / m 2 or more.} Includes.

However, when the base material layer has ^{a surface free energy of less than 60 mJ / m 2} , resin repelling occurs when the intermediate layer made of only resin is formed on the base material layer, and the intermediate layer is made uniform. It may not be possible to form.

However, according to such a transparent conductive film, since the surface free energy of the base material layer is equal to or higher than the above-mentioned lower limit, the repelling of the resin is suppressed, and the intermediate layer is in contact with the base material layer and is composed of only the resin. Can be uniformly formed, and therefore, the specific resistance value of the transparent conductive layer can be lowered.

In the present invention (3), the intermediate layer contains the transparent conductive film according to the above (1) or (2), which has a thickness of 30 nm or more and 150 nm or less.

According to such a transparent conductive film, the thickness of the intermediate layer is within the above range, so that the thickness can be reduced while maintaining the mechanical strength.

In the present invention (4), the base material layer includes the transparent base material and the hard coat layer in this order, and the hard coat layer is in contact with the intermediate layer (1) to (3). The transparent conductive film according to any one of the above items is included.

According to such a transparent conductive film, since the base material layer includes a hard coat layer, scratch resistance can be improved.

In the present invention (5), the base material layer contains the transparent conductive film according to any one of (1) to (3) above, which comprises only the transparent base material.

Such a transparent conductive film can be manufactured at low cost because the base material layer is composed of only the transparent base material.

The present invention (6) includes the transparent conductive film according to any one of (1) to (5) above, wherein the intermediate layer is an optical adjustment layer.

According to such a transparent conductive film, since the intermediate layer is an optical adjustment layer, it is excellent in visibility suppression when the transparent conductive layer is patterned.

The present invention (7) comprises the above (1) to (7), wherein the transparent conductive layer is patterned and includes a patterned portion having the transparent conductive layer and a non-patterned portion not having the transparent conductive layer. The transparent conductive film according to any one of 6) is included.

According to such a transparent conductive film, the visibility of the difference between the patterned portion and the non-patterned portion is suppressed, and the visibility suppressing property is excellent.

Further, since the intermediate layer is made of only resin, the specific resistance value of the transparent conductive layer can be lowered.

The present invention (8) includes the transparent conductive film according to any one of (1) to (7) above, which is a wound body wound in a roll shape.

Since such a transparent conductive film is a wound body wound in a roll shape, it is excellent in workability and transportability.

The present invention (9) includes a touch panel provided with the transparent conductive film according to the above (7).

Since such a touch panel includes the above-mentioned transparent conductive film, it is excellent in visibility suppression and has a low specific resistance value, so that it can be increased in size.

The transparent conductive film of the present invention is excellent in visibility suppression and can reduce the specific resistance value of the transparent conductive layer.

Since the touch panel of the present invention includes the transparent conductive film of the present invention, it is excellent in visibility suppression and has a low specific resistance value, so that it can be increased in size.

FIG. 1 shows a cross-sectional view of a first embodiment of the transparent conductive film of the present invention (a mode in which a transparent base material, a hard coat layer, an intermediate layer, and a transparent conductive layer are provided in order). FIG. 2 shows a cross-sectional view of a pattern in which the transparent conductive layer of the transparent conductive film shown in FIG. 1 is patterned. FIG. 3 shows a cross-sectional view of a second embodiment of the transparent conductive film shown in FIG. 1 (a mode in which a transparent base material, an intermediate layer, and a transparent conductive layer are provided in order). FIG. 4 shows a cross-sectional view of a pattern in which the transparent conductive layer of the transparent conductive film shown in FIG. 3 is patterned.

A first embodiment of the transparent conductive film of the present invention will be described with reference to FIG.

1. 1. Transparent Conductive Film As shown in FIG. 1, this transparent conductive film 1 has a film shape (including a sheet shape) having a predetermined thickness, extends in a direction orthogonal to the thickness direction (plane direction), and is flat. It has an upper surface and a flat lower surface (two main surfaces).

Specifically, the transparent conductive film 1 includes a transparent base material 5, a hard coat layer 6, an intermediate layer 3, and a transparent conductive layer 4 in this order. That is, the transparent conductive film 1 is formed on the transparent base material 5, the hard coat layer 6 provided on the transparent base material 5, the intermediate layer 3 provided on the hard coat layer 6, and the intermediate layer 3. It is provided with a transparent conductive layer 4 to be provided. Preferably, the transparent conductive film 1 is composed of only the transparent base material 5, the hard coat layer 6, the intermediate layer 3, and the transparent conductive layer 4. Hereinafter, each layer will be described in detail.

2. Transparent base material The transparent base material 5 is a lower layer of the transparent conductive film 1. The transparent base material 5 is a support layer (support material) that secures the mechanical strength of the transparent conductive film 1. Further, the transparent base material 5 has a film shape extending in the surface direction, and has a flat flat surface and a flat lower surface (two main surfaces).

The transparent base material 5 is made of a polymer film. The polymer film has transparency.

Examples of the material of the polymer film include polyester resins such as polyethylene terephthalate (PET), polybutylene terephthalate, and polyethylene naphthalate, and (meth) acrylic resins (acrylic resin and / or methacrylic resin) such as polymethacrylate. , Polyethylene resins such as polyethylene, polypropylene, cycloolefin polymer (COP), eg polycarbonate resins, eg polyether sulfone resins, eg polyarylate resins, eg melamine resins, eg polyamide resins, eg polyimide resins, eg. , Cellulous resin, for example, polystyrene resin, for example, synthetic resin of norbornen resin and the like.

These polymer films can be used alone or in combination of two or more.

From the viewpoint of transparency, mechanical properties and the like, polyester resin and polyolefin resin are preferable, and PET and COP are more preferable.

The thickness of the transparent substrate 5 is, for example, 2 μm or more, preferably 20 μm or more, and for example, 300 μm or less, preferably 200 μm or less.

The transparent base material 5 constitutes the base material layer 2 together with the hard coat layer 6 described later. The transparent base material 5 is a lower layer in the base material layer 2.

3. 3. Hard coat layer The hard coat layer 6 is a layer that enhances the scratch resistance of the transparent conductive film 1. The hard coat layer 6 has a film shape extending in the plane direction, and has a substantially flat upper surface and a flat lower surface (two main surfaces).

The hard coat layer 6 has a film shape (including a sheet shape) and is in direct contact with the entire upper surface of the transparent base material 5.

The hard coat layer 6 is made of a resin composition containing a resin such as a thermosetting resin, a thermoplastic resin, or an ultraviolet curable resin. These resins can be used alone or in combination of two or more. From the viewpoint of workability, an ultraviolet curable resin is preferable.

Examples of the ultraviolet curable resin include acrylic resins such as polyurethane acrylate, polyol acrylate and dipentaerythritol hexaacrylate, such as epoxy resin. In addition, the resin composition can contain inorganic particles in an appropriate ratio, if necessary.

The surface (upper surface) of the hard coat layer 6 is surface-treated. The specific surface treatment will be described in detail in a later production method.

The surface free energy of the hard coat layer 6 is, for example, 60 mJ / m ² or more, preferably 70 mJ / m ² or more, more preferably 80 mJ / m ² or more, and for example, 95 mJ / m ² or less. ..

The method for measuring the surface free energy of the hard coat layer 6 will be described in detail in a later example.

The thickness of the hard coat layer 6 is, for example, 0.1 μm or more, preferably 0.5 μm or more, and for example, 10 μm or less, preferably 5 μm or less.

The hard coat layer 6 constitutes the base material layer 2 together with the transparent base material 5. That is, the base material layer 2 includes a transparent base material 5 and a hard coat layer 6. Preferably, the base material layer 2 is composed of only the transparent base material 5 and the hard coat layer 6. The hard coat layer 6 is an upper layer in the base material layer 2.

4. Intermediate layer The intermediate layer 3 is an intervening layer interposed between the base material layer 2 and the transparent conductive layer 4. The intermediate layer 3 is provided on the upper surface of the hard coat layer 6. The intermediate layer 3 is in direct contact with the entire upper surface of the hard coat layer 6. The intermediate layer 3 has a film shape extending in the plane direction, and has a flat flat surface and a flat lower surface (two main surfaces).

Further, in the intermediate layer 3, after the transparent conductive layer 4 is arranged in the pattern in a later step, the difference between the non-pattern portion 8 and the pattern portion 7 is not recognized (that is, the visual recognition of the pattern is suppressed). ), An optical adjustment layer for adjusting the optical characteristics of the transparent conductive layer 4.

The intermediate layer 3 is made of only resin. That is, the intermediate layer 3 does not substantially contain, for example, inorganic particles (for example, silica) for adjusting the refractive index of the intermediate layer 3. In other words, the intermediate layer 3 may contain inorganic particles in a trace amount that does not impair the action and effect of the present invention, and specifically, 0.1% by mass or less with respect to 100 parts by mass of the resin. , Preferably 0.01% by mass or less, more preferably 0.001% by mass or less of inorganic particles are allowed to be contained.

Examples of the resin include curable resins and thermoplastic resins (for example, polyolefin resins), and preferably curable resins.

Examples of the curable resin include an active energy ray-curable resin that is cured by irradiation with active energy rays (specifically, ultraviolet rays, electron beams, etc.), for example, a thermosetting resin that is cured by heating. Preferably, an active energy ray-curable resin is used.

Specific examples of the curable resin include an acrylic resin, for example, a urethane resin, for example, a melamine resin, for example, an alkyd resin, for example, a siloxane-based polymer, for example, an organic silane condensate, and the like. Acrylic resin is preferable.

Examples of the acrylic resin include an acrylic resin having a fluorene skeleton, an acrylic resin having a phenyl skeleton, an acrylic resin having a urethane (meth) acrylate, and an acrylic resin having a polyisoprene skeleton. Preferably, an acrylic resin having a fluorene skeleton and an acrylic resin having a phenyl skeleton can be mentioned.

As the curable resin, a commercially available product can be used. For example, as an acrylic resin having a fluorene skeleton, the OGSOL series (specifically, OGSOL EA-0200P, OGSOL EA-0250P, OGSOL GA-5000, OGSOL EA- F5710 (manufactured by Osaka Gas Chemicals Co., Ltd.), for example, KAYARAD series (specifically, KAYARAD-HRM-3000H, KAYARAD-BNP-1, manufactured by Nippon Kayaku Co., Ltd.) Can be mentioned.

These resins can be used alone or in combination of two or more.

The refractive index of the resin is, for example, 1.58 or more, preferably 1.59 or more, more preferably 1.61 or more, and for example, 2.0 or less.

If the refractive index of the resin is at least the above-mentioned lower limit, the refractive index of the intermediate layer 3 can be adjusted within the range described later.

The thickness of the intermediate layer 3 is, for example, 30 nm or more, preferably 50 nm or more, and more preferably 70 nm or more. When the thickness of the intermediate layer 3 is at least the above lower limit, the mechanical strength of the transparent conductive film 1 can be maintained.

The thickness of the intermediate layer 3 is, for example, 150 nm or less, preferably 100 nm or less. When the thickness of the intermediate layer 3 is not more than the above upper limit, the transparent conductive film 1 can be made thinner.

The method for measuring the thickness of the intermediate layer 3 will be described in detail in a later example.

The refractive index of the intermediate layer 3 is the same as or higher than the refractive index of the resin, specifically 1.59 or more, preferably 1.60 or more, more preferably 1.61 or more. Yes, and less than 2.0.

When the refractive index of the intermediate layer 3 is at least the above-mentioned lower limit, the visibility suppression property when the transparent conductive layer 4 is patterned is excellent. That is, if the refractive index of the intermediate layer 3 is less than the above-mentioned lower limit, the visibility suppression property when the transparent conductive layer 4 is patterned is lowered.

When the refractive index of the intermediate layer 3 is not more than the above-mentioned upper limit, the visibility suppression property when the transparent conductive layer 4 is patterned is excellent.

The intermediate layer 3 is usually a single layer, but may be configured in multiple layers.

5. Transparent conductive layer The transparent conductive layer 4 is an upper layer of the transparent conductive film 1. The transparent conductive layer 4 has a film shape (including a sheet shape) extending in the surface direction, and has a flat lower surface and a flat upper surface. The transparent conductive layer 4 is in direct contact with the entire upper surface of the intermediate layer 3. The transparent conductive layer 4 is an electrode layer that is patterned and can act as an electrode of a touch panel (described later).

As the material for forming the transparent conductive layer 4, for example, at least selected from the group consisting of In, Sn, Zn, Ga, Sb, Ti, Si, Zr, Mg, Al, Au, Ag, Cu, Pd, and W. Examples include metal oxides containing one type of metal. The metal oxide can be further doped with the metal atoms shown in the above group, if necessary.

As the material, indium tin oxide composite oxide (ITO), antimony tin composite oxide (ATO) and the like are preferable, and ITO is more preferable.

The thickness of the transparent conductive layer 4 is, for example, 10 nm or more, preferably 20 nm or more, and for example, 35 nm or less, preferably 30 nm or less.

The specific resistance value of the transparent conductive layer 4 is, for example, 1.0 × 10 ^-4 Ω · cm or more, and for example, 3.00 × 10 ^-4 Ω · cm or less, preferably 2.90 × 10 ^-4. Ω · cm or less, more preferably 2.80 × 10 ^-4 Ω · cm or less, further preferably 2.70 × 10 ^-4 Ω · cm or less, especially preferably 2.65 × 10 ^-4 Ω · cm. It is less than cm.

When the specific resistance value of the transparent conductive layer 4 is equal to or less than the above upper limit, the touch panel (described later) provided with the transparent conductive film 1 can be enlarged.
6. Method for Producing a Transparent Conductive Film The transparent conductive film 1 is obtained by arranging a hard coat layer 6, an intermediate layer 3, and a transparent conductive layer 4 in this order on a transparent base material 5.

To dispose the hard coat layer 6 on the surface of the transparent base material 5, for example, the above resin composition is applied to the surface of the transparent base material 5, and when the resin is an ultraviolet curable resin, it is irradiated with ultraviolet rays. And cure.

Next, the surface (upper surface) of the hard coat layer 6 is subjected to surface treatment.

By this surface treatment, the surface free energy of the hard coat layer 6 is increased.

Examples of the surface treatment include dry treatments such as sputtering, plasma treatment, corona treatment, ultraviolet irradiation, and electron beam irradiation, and wet treatments such as undercoating treatment.

From the viewpoint of adhesion, dry treatment is preferable, corona treatment, plasma treatment is more preferable, and plasma treatment is more preferable.

In the plasma treatment, for example, the surface (upper surface) of the hard coat layer 6 is irradiated with plasma.

As a result, the hard coat layer 6 after the surface treatment has the above-mentioned surface free energy.

The surface free energy of the hard coat layer 6 before the surface treatment is, for example, ^{less than 60 J / m 2} , preferably 50 J / m ² or less, more preferably 40 J / m ² or less, still more preferably 30 J / m. ^{It is 2} or less.

Percentage of the surface free energy of the hard coat layer 6 after the surface treatment to the surface free energy of the hard coat layer 6 before the surface treatment (surface free energy of the hard coat layer 6 after the surface treatment / hard coat layer 6 before the surface treatment) The surface free energy × 100) is, for example, 120% or more, preferably 140% or more, more preferably 160% or more, further preferably 180% or more, and for example, 300% or less. is there.

If the surface free energy of the hard coat layer 6 after the surface treatment is equal to or higher than the above lower limit, the repelling of the resin can be suppressed, the hard coat layer 6 can be contacted, and the intermediate layer 3 made of only the resin can be uniformly formed. As a result, the specific resistance value of the transparent conductive layer 4 can be lowered.

Next, the intermediate layer 3 is placed on the surface of the hard coat layer 6. To arrange the intermediate layer 3 on the surface of the hard coat layer 6, for example, the above resin is applied to the surface of the hard coat layer 6, and when the resin is an active energy ray-curable resin, it is irradiated with ultraviolet rays. , Cure.

Next, the transparent conductive layer 4 is arranged on the surface of the intermediate layer 3. In order to arrange the transparent conductive layer 4 on the surface of the intermediate layer 3, for example, sputtering is used. The transparent conductive layer 4 is, for example, amorphous.

As a result, the transparent conductive film 1 is obtained.

The transparent conductive film 1 can be obtained by laminating each layer by, for example, a roll-to-roll method. As a result, the transparent conductive film 1 is obtained as a wound body wound in a roll shape.

The thickness of the transparent conductive film 1 is, for example, 20 μm or more, preferably 30 μm or more, and for example, 200 μm or less, preferably 150 μm or less.

The transparent conductive film 1 is a component of a touch panel, that is, a component for manufacturing a touch panel. Specifically, after patterning the transparent conductive layer 4 of the transparent conductive film 1 by a method described later. , A component mounted on a touch panel. That is, the transparent conductive film 1 is a device that is distributed as a single component and can be industrially used.

As shown in FIG. 2, in the transparent conductive film 1, the transparent conductive layer 4 is patterned. To pattern the transparent conductive layer 4, for example, the transparent conductive layer 4 is etched. As a result, the transparent conductive film 1 has a pattern portion 7 having the transparent conductive layer 4 and a non-patterned portion 8 having no transparent conductive layer 4.

After patterning the transparent conductive layer 4, the transparent conductive layer 4 is, for example, heated and crystallized.

7. Use of Transparent Conductive Film Such a transparent conductive film 1 is used, for example, as a touch panel in an image display device.

The touch panel is a touch sensor that operates a computer connected to the image display device by bringing a finger, a pen, or the like into contact with the menu displayed on the image display device.

Examples of the touch panel type include various methods such as an optical method, an ultrasonic method, a capacitance method, and a resistance film method. The transparent conductive film 1 is particularly preferably used for a capacitance type touch panel.

8. Action effect In this transparent conductive film 1, since the intermediate layer 3 has a high refractive index of 1.59 or more, it is excellent in visibility suppression when the transparent conductive layer 4 is patterned.

Further, the intermediate layer 3 is composed of only a resin and does not substantially contain inorganic particles. Therefore, for example, when the transparent conductive layer 4 is crystallized, the inhibition of crystal growth of the transparent conductive layer 4 due to the inorganic particles can be suppressed. Therefore, the specific resistance value of the transparent conductive layer 4 can be lowered.

However, when the base material layer has ^{a surface free energy of less than 60 mJ / m 2} , resin repelling occurs when the intermediate layer made of only resin is formed on the base material layer, and the intermediate layer is made uniform. It may not be possible to form.

However, in the transparent conductive film 1, since the surface free energy of the hard coat layer 6 is equal to or higher than the above-mentioned lower limit, the resin repelling is suppressed, the hard coat layer 6 is contacted, and the intermediate layer 3 made of only the resin is formed. It can be formed uniformly, and therefore, the specific resistance value of the transparent conductive layer 4 can be lowered.

In the transparent conductive film 1, the thickness of the intermediate layer 3 is within the above range, so that the thickness can be reduced while maintaining the mechanical strength.

In the transparent conductive film 1, since the base material layer 2 includes the hard coat layer 6, scratch resistance can be improved.

In the transparent conductive film 1, since the intermediate layer 3 is an optical adjustment layer, as shown in FIG. 2, the transparent conductive layer 4 is excellent in visibility suppression when patterned.

In the transparent conductive film 1, the transparent conductive layer 4 is patterned and includes a pattern portion 7 having the transparent conductive layer 4 and a non-patterned portion 8 not having the transparent conductive layer 4. Therefore, the pattern portion 7 The visual recognition of the difference between the non-pattern portion 8 and the non-pattern portion 8 is suppressed, and the visibility suppression property is excellent.

Since the transparent conductive film 1 is a wound body wound in a roll shape, it is excellent in workability and transportability.

A touch panel provided with the transparent conductive film 1 is excellent in visibility suppression and has a low resistivity value, so that it can be increased in size.

9. Second Embodiment In the following second embodiment, the members and processes corresponding to the above-mentioned parts are designated by the same reference numerals, and detailed description thereof will be omitted.

In the first embodiment, as shown in FIG. 1, in the transparent conductive film 1, the base material layer 2 includes the hard coat layer 6, but in the second embodiment, as shown in FIG. 3, the base material layer No. 2 does not include the hard coat layer 6, and may be composed of only the transparent base material 5.

That is, in this second embodiment, the transparent conductive film 1 includes the transparent base material 5, the intermediate layer 3, and the transparent conductive layer 4 in this order. The base material layer 2 is composed of only the transparent base material 5. The intermediate layer 3 is in direct contact with the entire upper surface of the transparent base material 5.

The transparent conductive film 1 can be manufactured by arranging the intermediate layer 3 and the transparent conductive layer 4 in this order on the transparent base material 5.

In the method for producing the transparent conductive film 1 of the second embodiment, first, the surface (upper surface) of the transparent base material 5 is surface-treated.

As the surface treatment, the same method as in the first embodiment can be mentioned.

The surface free energy of the transparent base material 5 is increased by the above-mentioned surface treatment.

The surface free energy of the transparent base material 5 after the surface treatment is, for example, 60 mJ / m ² or more, preferably 70 mJ / m ² or more, more preferably 80 mJ / m ² or more, and for example, 95 mJ / m. ^{It is 2} or less.

The surface free energy of the transparent substrate 5 before the surface treatment is, for example, ^{less than 60 J / m 2} , preferably 50 J / m ² or less, more preferably 40 J / m ² or less, still more preferably 30 J / m. ^{It is 2} or less.

Percentage of the surface free energy of the transparent base material 5 after the surface treatment to the surface free energy of the transparent base material 5 before the surface treatment (surface free energy of the transparent base material 5 after the surface treatment / transparent base material 5 before the surface treatment) The surface free energy × 100) is, for example, 120% or more, preferably 140% or more, more preferably 160% or more, further preferably 180% or more, and for example, 300% or less. is there.

If the surface free energy of the transparent base material 5 after the surface treatment is equal to or higher than the above-mentioned lower limit, the repelling of the resin can be suppressed, the transparent base material 5 can be contacted, and the intermediate layer 3 made of only the resin can be uniformly formed. As a result, the specific resistance value of the transparent conductive layer 4 can be lowered.

The method for measuring the surface free energy of the transparent base material 5 is the same as the method for measuring the surface free energy of the hard coat layer 6.

Next, the intermediate layer 3 is placed on the surface of the transparent base material 5. To arrange the intermediate layer 3 on the surface of the transparent base material 5, for example, the above-mentioned resin is applied to the surface of the transparent base material 5, and when the resin is an active energy ray-curable resin, it is irradiated with ultraviolet rays. , Cure.

Next, the transparent conductive layer 4 is arranged on the surface of the intermediate layer 3. In order to arrange the transparent conductive layer 4 on the surface of the intermediate layer 3, for example, sputtering is used. The transparent conductive layer 4 is, for example, amorphous.

As a result, the transparent conductive film 1 is obtained.

Next, as shown in FIG. 4, in the transparent conductive film 1, the transparent conductive layer 4 is patterned by etching.

The transparent conductive layer 4 is then heated, for example, to crystallize it.

The second embodiment can also have the same effects as those of the first embodiment shown in FIG.

Further, since the base material layer 2 is composed of only the transparent base material 5, the base material layer 2 further lowers the transparent conductive film 1 as compared with the first embodiment shown in FIG. 1 including the hard coat layer 6. Can be manufactured at cost.

10. Modification Example In the first embodiment, the surface (upper surface) of the hard coat layer 6 is surface-treated, but for example, the surface treatment may not be applied.

In the second embodiment, the surface (upper surface) of the transparent base material 5 is surface-treated, but for example, the surface treatment may not be applied.

In the first embodiment, the resin composition is applied to the surface of the transparent base material 5 and the hard coat layer 6 is arranged on the surface of the transparent base material 5. Can also be prepared and attached to the surface of the transparent base material 5.

In the first embodiment and the second embodiment, the intermediate layer 3 has been described as an optical adjustment layer, but it may be a functional layer that imparts functionality according to the purpose, for example, in the roll-to-roll method. It may be a blocking layer for suppressing the overlapping transparent conductive films 1 from being in close contact with each other and being difficult to peel off.

In the first embodiment and the second embodiment, the amorphous transparent conductive layer 4 is etched and then crystallized. For example, the amorphous transparent conductive layer 4 is crystallized and then etched. You can also do it.

In the first embodiment and the second embodiment, the transparent conductive film 1 is manufactured by the roll-to-roll method, but for example, a part or all of the transparent conductive film 1 can be manufactured by a batch method.

Examples and comparative examples are shown below, and the present invention will be described in more detail. The present invention is not limited to Examples and Comparative Examples. In addition, specific numerical values such as the compounding ratio (content ratio), physical property values, and parameters used in the following description are described in the above-mentioned "Form for carrying out the invention", and the compounding ratios corresponding to them ( Substitute the upper limit value (value defined as "less than or equal to" or "less than") or the lower limit value (value defined as "greater than or equal to" or "excess") such as content ratio), physical property value, parameter, etc. be able to.

The abbreviations of the components used in the following examples and comparative examples are shown below.
OGSOL EA-0250P: Product name, Acrylic resin (active energy ray-curable resin), Refractive index 1.62, KAYARAD-HRM-3000H manufactured by Osaka Gas Chemicals Co., Ltd .: Product name, Acrylic resin (active energy ray-curable resin) ), Refractive index 1.62, KAYARAD-BNP-1 manufactured by Nippon Kayaku Co., Ltd .: Product name, Acrylic resin (active energy ray-curable resin), Refractive index 1.62, Opstar Z7412 manufactured by Nippon Kayaku Co., Ltd .: Product name , Organic-inorganic composite material ( _{including ZrO 2} as an inorganic material), refractive index 1.62, DPHA manufactured by JSR: trade name "M-400", dipentaerythritol penta and hexaacrylate, refractive index 1.53, Made by Toa Synthetic Co., Ltd. 1. Production of transparent conductive film Example 1
100 parts by mass of dipentaerythritol hexaacrylate (trade name "A-DPH" manufactured by Shin-Nakamura Chemical Co., Ltd.) and 5 mass parts of hydroxycyclohexylphenyl ketone (trade name "Irgacare 184" manufactured by Tivas Specialty Chemicals) as a photopolymerization initiator. The parts were mixed and then diluted with 100 parts by mass of methyl isobutyl ketone to prepare a hard coat agent.

Next, COP (thickness 100 μm, trade name “Zeonor” manufactured by Zeon Corporation) as a transparent base material is prepared, and a resin composition is applied to the surface thereof using a bar coater, dried, and irradiated with ultraviolet rays. The resin composition was cured, whereby a hard coat layer having a thickness of 5 μm was placed on the surface of the transparent substrate. The surface free energy of the surface of the hard coat layer before the surface treatment was 30 mJ / m ² .

Next, the surface of the hard coat layer was irradiated with plasma (frequency 20 kHz, processing power 150 V, processing time 20 seconds). The surface free energy of the surface of the hard coat layer after the surface treatment was 60 mJ / m ² .

Next, OGSOL EA-0250P as a resin is applied to the surface of the hard coat layer using a spin coater, dried, and irradiated with ultraviolet rays to cure the resin, thereby intermediate on the surface of the hard coat layer. Layers were placed.

The thickness of the obtained intermediate layer was 85 nm and the refractive index was 1.63.

The thickness of the intermediate layer was calculated by measuring the reflection spectrum with Hitachi U4100 and comparing the calculated value by the optical simulation with the spectral shape.

Then, using a take-up sputtering apparatus, a transparent conductive layer made of ITO having a thickness of 20 nm was arranged on the surface of the intermediate layer.

As a result, a transparent conductive film was produced.

To measure the surface free energy, the contact angle of water and the contact angle of hexadecane with respect to the hard coat layer were measured using a "fully automatic contact angle meter DM700" manufactured by Kyowa Interface Science Co., Ltd., and these were measured. The value was analyzed by the analysis software FAMAS, and the surface free energy was calculated. As the calculation method, component analysis by Kitazaki-Hat theory was used.

Examples 2 and 3, Comparative Examples 1 and 2
A transparent conductive film was produced in the same procedure as in Example 1 except that the changes were made according to Table 1.

2. Evaluation 2-1. The surface resistivity (Ω / cm) of the transparent conductive layer of each transparent conductive film was measured using the specific resistance 4-terminal method (JIS K7194 (1994)). Next, the thickness of the transparent conductive layer was measured with a fluorescent X-ray analyzer (manufactured by Rigaku Co., Ltd.), and the specific resistance was calculated from the measured surface resistance and thickness.

The results are shown in Table 1.

2-2. Visibility inhibition The transparent conductive layer was etched to pattern the transparent conductive layer.

Next, a black acrylic plate was attached to the lower surface of the transparent base material. Next, the visibility suppression property of the pattern portion was visually evaluated from the upper side of the transparent conductive layer. Then, the case where the pattern portion was hardly visually recognized was evaluated as "◯", and the case where the pattern portion was clearly visually recognized was evaluated as "x".

The results are shown in Table 1.

1 Transparent conductive film 2 Base material layer 3 Intermediate layer 4 Transparent conductive layer 5 Transparent base material 6 Hard coat layer 7 Pattern part 8 Non-pattern part

Claims (8)

A base material layer containing a transparent base material, an intermediate layer, and a transparent conductive layer are provided in this order.
The intermediate layer is made of only a resin, have a 1.59 to 2.0 of the refractive index, and has a 150nm thickness of not less than 30 nm,
The transparent conductive film is a transparent conductive film, characterized in that the transparent conductive layer is formed of a metal oxide. The intermediate layer comes into contact with the base material layer and
The transparent conductive film according to claim 1, wherein the base material layer has ^{a surface free energy of 60 mJ / m 2} or more and 95 mJ / m ² or less. The base material layer includes the transparent base material and the hard coat layer in this order.
The transparent conductive film according to claim 1 or 2 , wherein the hard coat layer is in contact with the intermediate layer. The transparent conductive film according to claim 1 or 2 , wherein the base material layer is composed of only the transparent base material. The transparent conductive film according to any one of claims 1 to 4 , wherein the intermediate layer is an optical adjustment layer. The transparent conductive layer is patterned and
The pattern portion having the transparent conductive layer and
The transparent conductive film according to any one of claims 1 to 5 , further comprising a non-patterned portion that does not have the transparent conductive layer. The transparent conductive film according to any one of claims 1 to 6 , wherein the film is a wound body wound in a roll shape. A touch panel comprising the transparent conductive film according to claim 6.

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