JP6361106B2 - Substrate with transparent conductive film, touch panel substrate, touch panel integrated front protective plate for display device, and display device - Google Patents

Description

  The present invention relates to a substrate with a transparent conductive film, a touch panel substrate, a touch panel integrated front protection plate for a display device, and a display device.

  In recent years, touch panels used in combination with display panels are rapidly spreading in various display devices such as smartphones and tablet PCs (personal computers). Conventionally, the touch panel is generally disposed between a display panel and a front protective plate made of glass for protecting the touch panel. However, recently, a form in which a front protective plate for a display device and a touch panel are integrated has been put into practical use in order to meet demands for thinning, lightening, and reduction in the number of parts (Patent Document 1, Patent Document). 2).

  FIG. 12 is a diagram schematically illustrating an example of a conventional touch panel integrated front protective plate 80 for a display device in which a touch panel and a front protective plate for a display device are integrated. 12A is a plan view seen from the front side, and the cross-sectional view of FIG. 12B is a cross-sectional view taken along line CC in the plan view of FIG. 12A.

A conventional touch panel integrated front protective plate 80 for a touch panel is usually layered on the translucent substrate 1 so that the inside of the display area A1 becomes a position detection area, as illustrated in FIG. A transparent electrode 4 for detecting a touch panel position, which is formed of a transparent conductive film 2 that is transparent to itself, is formed in a predetermined pattern.
The outer periphery of the display area A1 is an opaque area A2, and a light shielding layer 7 is formed on the translucent substrate 1 in the opaque area A2. Further, visible information such as a product logo is appropriately provided in the opaque region A2, and the opaque region A2 is also a decorative portion.

In the display area A1, although the transparent electrode 4 is formed of the transparent conductive film 2 itself, the pattern of the transparent electrode 4 may appear thin depending on the light beam. Further, the visibility of the display panel to be observed may be impaired.
Therefore, various invisibility techniques for making the transparent conductive film 2 with the pattern formed difficult to see have been proposed (Patent Documents 3 and 4).
For example, the invisible technique according to Patent Document 3 is such that the refractive index is smaller than the refractive index of the transparent conductive film 2 between the transparent substrate 1 made of glass and the transparent conductive film 2 having a thickness of 10 to 30 nm. This is a technique in which by forming an intermediate layer of 30 to 60 nm, the difference in reflectance between the pattern formation part and the non-formation part of the transparent conductive film 2 is reduced by so-called thin film interference to make it invisible.
Further, the invisibility technique according to Patent Document 4 is such that the refractive index n3 is n1 <n3 <between the translucent substrate 1 having a refractive index n1 and the transparent conductive film 2 having a refractive index n2 and an optical thickness of 10 to 60 nm. In this method, an intermediate layer having an optical thickness of 100 to 175 nm with n2 is formed, thereby reducing the difference in reflectance between the pattern forming portion and the non-forming portion of the transparent conductive film 2 and making it invisible.

JP 2009-193587 A Utility Model Registration No. 3153971 Japanese Patent No. 3630374 Japanese Patent No. 4572507

However, as in Patent Document 3 and Patent Document 4, both of the conventional invisibility techniques use a thin film having a maximum thickness of about 200 nm as the intermediate layer. In the vapor phase growth method such as an apparatus, since the layer forming apparatus that requires a vacuum chamber is expensive, the invisibility cannot be easily realized at low cost. In particular, when manufacturing a large-sized touch panel with a large number of faces, or when manufacturing a substrate with a transparent conductive film before pattern formation for a wide variety of applications, such a layer forming apparatus using a vapor phase growth method is low cost. It became an obstacle when realizing invisibility easily.
In addition, since the effect of invisibility changes due to fluctuations in the thickness of the layer because the light interference effect of the thin film is used, the thickness does not vary in order to achieve the invisibility performance stably. It was necessary to manufacture with care.

  Therefore, an object of the present invention is to use a substrate with a transparent conductive film having a configuration capable of easily and stably realizing the invisibility of the pattern of the transparent conductive film, a touch panel substrate using the substrate, and further using the touch panel substrate. It is to provide a touch panel integrated front protective plate for a display device and a display device using these.

In the present invention, the front protective plate for a display device and the display device are configured as follows.
(1) a translucent substrate;
A transparent conductive film provided on at least one surface of the translucent substrate;
Between the translucent substrate and the transparent conductive film, having an optical adjustment layer provided in contact with both,
The refractive index n3 of the optical adjustment layer is such that the relationship between the refractive index n1 of the translucent substrate and the refractive index n2 of the transparent conductive film satisfies n1 <n3 ≦ n2.
And the thickness is 0.6 μm or more,
A substrate with a transparent conductive film.
(2) The substrate with a transparent conductive film according to (1), wherein the optical adjustment layer is an organic film using at least an organic substance.
(3) The substrate with a transparent conductive film according to (2), wherein the organic film is an inorganic particle-containing resin layer containing high refractive index inorganic particles having a refractive index higher than that of the resin binder in the resin binder. .
(4) The transparent conductive film is provided in a pattern,
Said optical adjustment layer is a board | substrate with a transparent conductive film in any one of said (1)-(3) provided in the non-formation part with the formation part of the pattern of the said transparent conductive film.
(5) A touch panel substrate using the transparent conductive film-provided substrate of (4) as a transparent electrode for detecting the position of the touch panel.
(6) The touch panel substrate according to (5) includes a central display region and an opaque region that is provided on an outer peripheral portion of the display region and shields visible light.
Furthermore, having a light shielding layer provided in the opaque region,
The optical adjustment layer is located on the surface of the light shielding layer in the opaque region and is a non-formed part that does not substantially overlap the light shielding layer.
Front protective plate for display device with integrated touch panel.
(7) a display panel;
As constituent members disposed on the front side from which display light from the display panel is emitted, the substrate with a transparent conductive film of (4), the touch panel substrate of (5), and the touch panel of (6). Any one selected from the body-shaped front protective plate for display device;
Comprising at least
Display device.

  According to the present invention, even if the transparent conductive film is formed in a pattern, it is possible to easily and stably realize the invisible pattern of the transparent conductive film.

BRIEF DESCRIPTION OF THE DRAWINGS It is sectional drawing explaining the board | substrate with a transparent conductive film by one Embodiment by the embodiment, (a) is before pattern formation of a transparent conductive film, (b) is after pattern formation. It is sectional drawing explaining the invisibility effect | action of an optical adjustment layer, (a) is an optical adjustment layer absence, (b) is a figure explaining an optical adjustment layer presence. It is a graph which shows the simulation result of invisibility by an optical adjustment layer, and shows the reflectance ratio and color difference of the reflective color in the formation part and non-formation part of a transparent conductive film. It is a graph which shows the simulation result of invisibility by an optical adjustment layer, and shows the reflective color in the formation part of a transparent conductive film. Sectional drawing which shows the layer structure of the Example and comparative example of a board | substrate with a transparent conductive film by this invention. It is a figure demonstrated by one Embodiment of a touchscreen board | substrate, (a) is the top view seen from the back side, (b) is sectional drawing. BRIEF DESCRIPTION OF THE DRAWINGS It is a figure explaining the front-surface protection plate for display apparatuses integrated with a touch panel by the one Embodiment, (a) is the top view seen from the back side, (b) is sectional drawing. FIG. 8 is a cross-sectional view for explaining an approaching portion between the optical adjustment layer 3 and the light shielding layer 7 in the front protective plate for a display device integrated with a touch panel in FIG. 7. FIG. Is not applicable to the present invention, and FIG. 1 is a cross-sectional view schematically illustrating an embodiment of a display device according to the present invention (using a touch panel integrated front protective plate for a display device). Sectional drawing which illustrates typically another embodiment (a touch-panel board | substrate is used) of the display apparatus by this invention. Sectional drawing which illustrates typically another embodiment (The board | substrate with a transparent conductive film is used) of the display apparatus by this invention. It is a figure which shows an example of the conventional front-surface protective plate for display apparatuses integrated with a touch panel, (a) is a top view seen from the back side, (b) is sectional drawing.

    Hereinafter, embodiments of the present invention will be described with reference to the drawings. Note that the drawings are conceptual diagrams, and the scale relations, aspect ratios, and the like of components may be exaggerated as appropriate for convenience of explanation.

[A] Definition of terms:
Hereinafter, definitions of main terms used in the present invention will be described here.

“Front side” means a member such as a substrate with a transparent conductive film, a touch panel substrate, a touch panel-integrated front protective plate for a display device, or a component thereof, when the member is used in combination with a display panel. Means the side on which the display light is emitted and the side on which the display of the display panel is observed.
The “back side” means the side opposite to the “front side” and means the side on which the display light of the display panel enters.
Originally, “one side” and “the other side” which is the opposite side are either “front side” and which side is the “front side”. In the present invention, the surface having the transparent conductive film and the optical adjustment layer with respect to the translucent substrate is called “one surface”.
The “first surface” and the “second surface” are used in the description of the touch panel substrate and the front protective plate for the display device integrated with the touch panel, and either one is the “front side”, and any surface is the “front side”. Is optional. In the present invention, “one surface” having a transparent conductive film and an optical adjustment layer will be described as “second surface”, and “the other surface” will be described as “first surface”. In particular, in the description of the front protective plate for a display device integrated with a touch panel, the “front side” surface is referred to as a “first surface”, and the “back side” surface is referred to as a “second surface”. In the description of the touch panel substrate, the “front side” surface may be the “first surface” or the “second surface”.
“Outside” means a side far from the display region based on the components formed in the opaque region.
“Inner side” means the side opposite to the “outer side”, in other words, the side closer to the display area, based on the components formed in the opaque area.
“Substantially” is a term that defines the degree of overlap between the optical adjustment layer and the light-shielding layer, and this meaning will be described in the text.

[B] Substrate with transparent conductive film:
First, a substrate with a transparent conductive film according to the present invention will be described.

  FIG. 1 is a cross-sectional view illustrating a substrate with a transparent conductive film according to an embodiment of the present invention. FIG. 1 (a) is a substrate 10 with a transparent conductive film which is a form before pattern formation of a transparent conductive film 2. FIG. 1B shows a substrate 10 with a transparent conductive film, which is in a form after pattern formation of the transparent conductive film 2.

A substrate 10 with a transparent conductive film shown in FIG. 1A includes a translucent substrate 1, a transparent conductive film 2 provided on one surface of the translucent substrate 1, and the translucent substrate 1. Between the transparent conductive film 2, an optical adjustment layer 3 provided in contact with both of them is provided. In the present embodiment, the transparent conductive film 2 and the optical adjustment layer 3 are provided on the entire surface of one surface of the translucent substrate 1.
On the other hand, the substrate 10 with a transparent conductive film shown in FIG. 1B is a form in which the transparent conductive film 2 is provided in a pattern shape with respect to the configuration of FIG.
In the present invention, when the transparent conductive film 2 is also provided on the other surface, which is the surface opposite to one surface of the translucent substrate 1, the optical adjustment layer 3 is also disposed on the other surface. There may be a form provided between 1 and the transparent conductive film 2.

The optical adjustment layer 3 has a refractive index n3 such that the relationship between the refractive index n1 of the translucent substrate 1 and the refractive index n2 of the transparent conductive film 2 satisfies n1 <n3 ≦ n2.
Furthermore, the thickness of the optical adjustment layer 3 is 0.6 μm or more.

  Hereinafter, each component will be further described in detail.

<Translucent substrate 1>
The translucent substrate 1 is not particularly limited as long as it is transparent to at least visible light and has a mechanical strength capable of protecting the surface of the display panel to which the front protective plate 10 for a display device is applied. Typically, a glass plate such as soda-lime glass, borosilicate glass, quartz glass, or aluminosilicate glass can be used. In particular, as a glass plate, chemically strengthened glass is preferable in that it has excellent mechanical strength compared to float glass and can be made thinner by that amount.
Resin can also be used for the translucent substrate 1. For example, an acrylic resin, a polycarbonate resin, a cycloolefin resin, a polyester resin, or the like can be used as the resin. By using a resin for the light-transmitting substrate 1, the weight can be reduced and flexibility can be provided.
For the light-transmitting substrate 1, a laminate of glass and resin can also be used. By using a laminated body of glass and resin for the light-transmitting substrate 1, both glass characteristics and resin characteristics can be provided.
The thickness of the translucent substrate 1 is not particularly limited. For example, in the case of glass, it can be 0.3 to 0.8 mm. In the case where the resin is used, the translucent substrate 1 has a thickness of, for example, 0.05 to 0.3 mm and is flexible and can be wound up. It can also be called a “sheet”.

(Refractive index)
The refractive index n1 of the translucent substrate 1 is usually about 1.45 to 1.60. Specific examples of the refractive index n1 are 1.52 for glass, 1.49 for acrylic resin, 1.59 for polycarbonate resin, and 1.58 for polyester resin.

  In the present invention, the refractive index of each component such as the translucent substrate 1, the transparent conductive film 2 and the optical adjustment layer 3, or the resin layer 5 described later is a refractive index in the visible light region, and is the human eye. The wavelength of 550 nm, which is a wavelength having a relatively high sensitivity, can be adopted as the evaluation wavelength of the refractive index, with the wavelength representing the visible light region. In the present invention, of course, the refractive index at other wavelengths may be considered. For example, the refractive index in the entire visible light range of 380 to 780 nm may be considered. The refractive index can be measured using a commercially available refractometer.

<Transparent conductive film 2>
Known materials and forming methods can be employed for the transparent conductive film 2.
For example, as the transparent conductive film 2, for example, ITO (Indium Tin Oxide), InZnO (Indium Zinc Oxide), AlZnO (Aluminum Zinc Oxide), InGaZnO (Indium Zn oxide) Garium Zinc Oxide; indium gallium zinc oxide) or the like can be used.
The thickness of the transparent conductive film 2 should just exhibit both the transparency and electroconductivity requested | required, for example, is 10-200 nm.

(Refractive index)
The refractive index n2 of the transparent conductive film 2 is 1.7 to 2.2, usually 1.8 to 1.9, and InZnO is 1.9 to 2.4. AlZnO is 1.9.

(Pattern presence and usage)
In the present invention, the transparent conductive film 2 may or may not be formed in a pattern. The substrate 10 with a transparent conductive film, in which the transparent conductive film 2 is not formed in a pattern,
The transparent conductive film 2 is later used as a member for pattern formation. When the transparent conductive film 2 is formed in a pattern, the use of the pattern is not particularly limited. If the use of a typical pattern is mentioned, it will be transparent electrode 4 for the position detection of a touch panel, etc.
The use of the transparent conductive film 2 formed in a pattern may be other than the electrode, and there is no particular limitation such as wiring and a transparent antenna.
In the present embodiment, a form in which the transparent conductive film 2 is formed in a pattern and a form in which the transparent conductive film 2 is not formed are handled together.

<Transparent electrode 4>
When the transparent conductive film 2 is formed in a pattern, the transparent conductive film 2 formed in the pattern can be used as the transparent electrode 4. A typical application of the transparent electrode 4 is an electrode for position detection of the touch panel, but may be an application other than the touch panel such as a transparent antenna.
When the transparent conductive film 2 is formed in a pattern and the transparent conductive film 2 is a transparent electrode 4 for detecting the position of the touch panel, the substrate 10 with the transparent conductive film is a touch panel substrate 20 described later. But there is.

<Optical adjustment layer 3>
The optical adjustment layer 3 is a layer having an invisible effect that makes the pattern difficult to see on the transparent conductive film 2 that can be patterned.
The optical adjustment layer 3 is formed between and in contact with the translucent substrate 1 and the transparent conductive film 2, and the refractive index n3 thereof is the refractive index n1 of the translucent substrate 1 and the refractive index of the transparent conductive film 2. It is a transparent layer satisfying n1 <n3 ≦ n2 and having a thickness of 0.6 μm or more in relation to n2.
As a matter of course, since the optical adjustment layer 3 is provided in contact with the transparent conductive film 2, it is electrically insulating.

The optical adjustment layer 3 is basically not particularly limited as long as it satisfies the conditions such as the contact relationship with the adjacent layer, the refractive index relationship, and the thickness. Therefore, it may be an inorganic film. In the case of an inorganic film, a liquid composition containing a precursor such as an inorganic atom-containing organic compound that becomes an inorganic substance is formed by a coating method or a printing method without using a vapor phase growth method for the purpose of the present invention. Is preferred.
However, the optical adjustment layer 3 is easy to obtain in terms of material as compared to the inorganic film, and can be easily formed by a coating method or a printing method without using a vapor phase growth method without being large in terms of equipment. It is preferable to use an organic film that can be formed.

[Organic film]
In the present invention, the organic film is not particularly limited as long as it satisfies the above various conditions as the optical adjustment layer 3 and contains an organic substance. For example, a layer using a resin as an organic material such as a high refractive index resin and an inorganic particle-containing resin layer described below can be employed.

[High refractive index resin]
As the organic film that can constitute the optical adjustment layer 3, a high refractive index resin having a refractive index higher than the refractive index n <b> 1 of the translucent substrate 1 can be used. Of course, the refractive index of the high refractive index resin is not more than the refractive index n2 of the transparent conductive film 2.
As a high refractive index resin, for example, as those capable of a refractive index of 1.60 or more, in addition to a polycarbonate resin, a sulfur atom-containing aromatic acrylic resin disclosed in Japanese Patent No. 3214520, Japanese Patent No. 3621600 Sulfur atom-containing resins such as episulfide-based sulfur atom-containing resins disclosed in JP-A-2007-39604, sulfur atom-containing aromatic urethane resins disclosed in JP-A-2007-39604, or JP-A-57-104901 Bromine atom-containing aromatic acrylic resins disclosed in JP-A-2012-82386, and fluorene skeleton-containing aromatic acrylic resins disclosed in JP 2012-82386 A.

[Inorganic particle-containing resin layer]
As an organic film that can constitute the optical adjustment layer 3, an inorganic particle-containing resin layer that contains high refractive index inorganic particles having a refractive index higher than the refractive index of the resin binder in the resin binder can be used. The resin binder containing the high refractive index inorganic particles can form the optical adjustment layer 3 using a general resin without using a high refractive index resin for the resin.

(High refractive index inorganic particles)
The high refractive index inorganic particles are basically not particularly limited, but are preferably non-conductive. Examples of such high refractive index inorganic particles include titanium oxide TiO ₂ (refractive index: 2.5 to 2.7), zirconium oxide Zr0 ₂ (refractive index: 2.1), niobium pentoxide Nb ₂ O ₅ (refractive index). Ratio: 2.3), antimony pentoxide Sb ₂ O ₅ (refractive index: 2.1), cerium oxide CeO ₂ (refractive index: 2.1 to 2.5), tantalum pentoxide Ta ₂ O ₅ (refractive index) : 2.1) can be used. These can be formed singly or as a mixed layer of two or more.
The particle diameter of the high refractive index inorganic particles is, for example, 10 to 100 nm from the viewpoint of ensuring transparency.

(Resin binder)
As the resin of the resin binder, for example, a curable resin such as an epoxy resin, an acrylic resin, or a polyimide resin can be used. As the curable resin, for example, a thermosetting epoxy resin, a photocurable acrylic photosensitive resin, or the like can be used. When a photosensitive resin is used as the resin, a pattern can also be formed using a photolithography method. For example, the inorganic particle-containing resin layer can be patterned by a photolithography method using an ultraviolet curable acrylic resin as a photosensitive resin in which high refractive index inorganic particles are dispersedly contained.

[Thickness of optical adjustment layer 3]
The thickness of the optical adjustment layer 3 is 0.6 μm or more, preferably 0.7 μm or more, and more preferably 0.8 μm or more. This is because if the thickness of the optical adjustment layer 3 does not satisfy the above value, it becomes difficult to easily and stably realize the invisible pattern of the transparent conductive film 2. For example, the reflectance ratio and the color difference ΔE of the reflection colors of the transparent conductive film 2 pattern forming portion and the non-forming portion cannot be stably invisible by reducing the influence of thickness variation. . Moreover, it is because it becomes difficult to stabilize the reflection color itself of the pattern formation part of the transparent conductive film 2 uniformly.
The upper limit of the thickness of the optical adjustment layer 3 is 2.0 μm, usually 1.0 μm. This is because if the thickness is too thick, the effect of invisibility is not increased, the material cost is increased, and the cost is increased.

[Invisibility by optical adjustment layer 3]
The invisibility effect exhibited by the optical adjustment layer 3 is a touch panel substrate 20 using a substrate 10 with a transparent conductive film, a touch panel substrate 20 using the substrate 10 with a transparent conductive film, or a substrate 10 with a transparent conductive film. This refers to the effect of making the pattern of the transparent conductive film 2 formed with a pattern difficult to see with the naked eye when the device front protective plate 30 or the like is observed.
In the present invention, “invisibility” means not only that the pattern of the transparent conductive film 2 is completely invisible with the naked eye, but also the pattern of the transparent conductive film 2 is visible but the optical adjustment layer 3 is not provided. Including that it is harder to see than in the case of.

  FIG. 2 is a diagram for explaining the principle by which the pattern of the transparent conductive film 2 becomes difficult to see due to the optical adjustment layer 3. 2A is a view for explaining the absence of the optical adjustment layer, and FIG. 2B is a view for explaining the presence of the optical adjustment layer.

First, the refraction of each of the translucent substrate 1, the optical adjustment layer 3, the transparent conductive film 2, and the resin layer 5 is assumed as follows.
The refractive index n1 of the translucent substrate 1 = 1.5,
The refractive index n2 of the transparent conductive film 2 = 1.9,
Refractive index n3 = 1.7 of the optical adjustment layer 3;
The refractive index n5 of the resin layer 5 is 1.5.

In addition, the resin layer 5 is an overcoat layer made of a resin or the like when closely laminated with another member such as a display panel. In practice, this portion is rarely an air layer in terms of improving the visibility of display on the display panel, and therefore a more realistic resin layer 5 will be described.
The resin layer 5 is a component that is not included in the substrate 10 with the transparent conductive film in the form before the pattern formation of the transparent conductive film 2. The resin layer 5 is a constituent element that can be included in the substrate 10 with the transparent conductive film in the form after the pattern formation of the transparent conductive film 2. Further, in the touch panel substrate 20 and the touch panel integrated front protective plate 30 for a display device according to the present invention, which will be described later, the resin layer 5 and the overcoat layer are constituent elements.

  The intensity of light reflection at the substance interface is related to the difference in refractive index between the two substances constituting the substance interface, and increases as the difference in refractive index increases. [Expression 1] represents a reflectance R of light incident perpendicularly to a material interface composed of a material having a refractive index na and a material having a refractive index nb, which is known as a Fresnel equation.

  From [Equation 1], focusing only on the point of reducing the light reflection at the interface, the refractive index n3 of the optical adjustment layer 3 may be set so that the refractive index difference becomes smaller. However, in the present invention, the reflectance is not simply reduced, but the reflectance at the pattern formation portion of the transparent conductive film 2 and the reflectance at the non-formation portion are made as equal as possible. It is preferable to set the refractive index of the adjustment layer 3.

First, FIG. 2A shows a conventional substrate 70 with a transparent conductive film in which the optical adjustment layer 3 does not exist.
When the reflectance R1 in the formation part in which the pattern of the transparent conductive film 2 is formed is seen, the refractive index difference at the interface between the translucent substrate 1 and the transparent conductive film 2 is 0.4. The refractive index difference at the interface between 2 and the resin layer 5 is also 0.4.
Next, when looking at the reflectance R2 in the non-formed part where the pattern of the transparent conductive film 2 is not formed, the refractive index difference at the interface between the translucent substrate 1 and the resin layer 5 is the refractive index of the two. 0 because they are equal. Therefore, the light L reaching this portion is transmitted without being reflected.
Therefore, a difference occurs between the reflectance R1 in the formation part of the transparent conductive film 2 and the reflectance R2 in the non-formation part, and the pattern of the transparent conductive film 2 is visually recognized by the difference in reflectance. It becomes.

On the other hand, FIG.2 (b) shows the board | substrate 10 with a transparent conductive film by this invention in case the optical adjustment layer 3 exists.
The interface that pays attention to the difference in refractive index is an interface formed by a layer formed in a pattern, and is therefore a surface with which the transparent conductive film 2 is in contact. Therefore, the interface between the translucent substrate 1 and the optical adjustment layer 3 is excluded.
When the reflectance r1 in the formation part in which the pattern of the transparent conductive film 2 is formed is seen, the refractive index difference at the interface between the optical adjustment layer 3 and the transparent conductive film 2 is 0.2. The refractive index difference at the interface between the resin layer 5 and the resin layer 5 is also 0.2. The refractive index difference at the interface between the translucent substrate 1 and the optical adjustment layer 3 is 0.2.
Next, looking at the reflectance r2 in the non-formed part where the pattern of the transparent conductive film 2 is not formed, the refractive index difference at the interface between the optical adjustment layer 3 and the resin layer 5 is 0.2. The refractive index difference at the interface between the translucent substrate 1 and the optical adjustment layer 3 is 0.2.
Therefore, the reflectance r1 at the formation portion when the optical adjustment layer 3 is present can be made smaller than the reflectance R1 at the formation portion when the optical adjustment layer 3 is not present in FIG. it can.
On the other hand, the reflectance at the non-forming portion can be larger than the reflectance r2 when the optical adjustment layer 3 is present compared to the reflectance R2 when the optical adjustment layer 3 is not present.

As described above, the optical adjustment layer 3 increases the reflectance at the formation portion of the transparent conductive film 2 and decreases the reflectance at the non-formation portion. If we show this reflectance relationship,
R2 <r2 <r1 <R1
It is.
The reason why the pattern of the transparent conductive film 2 is visible is due to the difference in reflectance between the pattern forming portion and the non-forming portion. Therefore, the transparent conductive film 2 is formed as described above due to the presence of the optical adjustment layer 3. As a result, the reflectance of the transparent conductive film 2 becomes invisible, and as a result, the reflectance of the transparent conductive film 2 becomes invisible.

The upper limit of the refractive index n3 of the optical adjustment layer 3 is equal to the refractive index n2 of the transparent conductive film 2. When the refractive index n3 of the optical adjustment layer 3 is equal to the refractive index n2 of the transparent conductive film 2, that is,
n3 = n2
When there is no interface in the optical sense, light is transmitted without being reflected. Such invisibility is that when layers with the same refractive index are stacked in contact with each other, both layers constituting the interface are not optically distinguished from each other, and both layers are single layers and partially different in thickness. It can be said that it is to be considered.

  As described above, in the present invention, the effect of invisibility can be obtained even if the film is not a thin film having a thickness of 200 nm or less but a thick film having a thickness of 0.6 μm or more and a single layer. On the other hand, in multilayer films using so-called thin film interference, it is necessary to consider the decrease and increase in light intensity due to interference between reflected light at multiple interfaces as the thickness increases and decreases. It is necessary to optimize the layer thickness. In this respect, in the present invention, since it is a thick film having a single layer structure that does not use interference, the thickness of the layer is not restricted from the viewpoint of invisibility, and the invisibility performance can be stably realized. It will be possible.

In the above description, the case where the refractive index n3 of the optical adjustment layer 3 is larger than the refractive index n1 of the translucent substrate 1 has been described. However, if the refractive index n3 is equal to the refractive index n1, In optical terms, the same layer as that of the translucent substrate 1 is merely stacked, and the invisible action is not exhibited.
Further, when the refractive index n3 is smaller than the refractive index n1, that is,
n3 <n1
In this case, a layer having a larger refractive index difference from the refractive index n2 of the transparent conductive film 2 is overlapped with the refractive index n2 of the transparent conductive film 2 which is larger than the refractive index n1 of the translucent substrate 1. Therefore, at this point, an increase in the refractive index difference is contrary to invisibility.
Therefore,
n1 <n3 ≦ n2
In the present invention, the refractive index relationship is set.

[Simulation result of invisibility by optical adjustment layer 3]
FIG. 3 is a graph showing the simulation result of the invisibility by the optical adjustment layer 3, and the reflectance ratio and color difference of the reflected color at the pattern formation portion and the non-formation portion of the transparent conductive film 2 of the optical adjustment layer 3. The change by thickness is shown.
FIG. 4 is a graph showing a simulation result of invisibility by the optical adjustment layer 3, and shows a change in the reflection color at the formation part of the transparent conductive film 2 depending on the thickness of the optical adjustment layer 3.
In the simulations of FIGS. 3 and 4, glass having a refractive index of 1.51 is assumed as the translucent substrate 1, ITO having a refractive index of 1.83 and a thickness of 140 nm is assumed as the transparent conductive film 2, and optical A resin layer having a refractive index of 1.51 having the same refractive index as that of the translucent substrate 1 was assumed as the outermost layer covering the entire surface of the adjustment layer 3 and the transparent conductive film 2. The thickness of the translucent substrate 1 and the resin layer 5 was set to be sufficiently thick so that optical interference does not affect.

In this simulation, the reflection color of the reflection part of the transparent conductive film 2 in the pattern formation part and the non-formation part was evaluated with respect to the perpendicular reflection light with respect to the normal incidence as the light source C defined by CIE (International Commission on Illumination). .
The reflectance was evaluated by the brightness Y of the tristimulus values in the XYZ color system defined by JIS Z 8701 as the brightness of the reflected color.
The color difference of the reflected color was evaluated by the color difference ΔE ^* ab defined by JIS Z 8730 in the L ^* a ^* b ^* color system according to JIS Z 8729.

As can be seen from the graph of FIG. 3, the difference in the reflection color between the pattern formation portion and the non-formation portion of the transparent conductive film 2 becomes larger or smaller when the thickness of the optical adjustment layer 3 is less than 0.5 μm. However, it becomes smaller as the thickness of the optical adjustment layer 3 is increased.
Specifically, if the reflectance ratio is captured by the brightness Y1 of the forming portion and the brightness Y2 of the non-forming portion, the range of 1.00 ± 0.06 if the thickness of the optical adjustment layer 3 is 0.6 μm or more. It can be seen that The reflectance ratio is better if the thickness of the optical adjustment layer 3 is thicker and is 0.7 μm or more, and if it is 1.00 μm or more, the reflectance ratio is suppressed to the range of 1.00 ± 0.02. I understand. Therefore, in terms of the reflectance ratio, it can be seen that the thickness of the optical adjustment layer 3 may be set to 0.6 μm or more, more preferably 0.7 μm or more, and even more preferably 1.0 μm or more.
On the other hand, the color difference is also suppressed to 10 or less when the thickness of the optical adjustment layer 3 is 0.6 μm or more. It can be seen that the color difference is suppressed to 6 or less when the thickness of the optical adjustment layer 3 is further thicker, 0.7 μm or more, and is suppressed to about 5 or less when 1.0 μm or more. For this reason, from the color difference, it is understood that the thickness of the optical adjustment layer 3 may be set to 0.6 μm or more, more preferably 0.7 μm or more, and further preferably 1.0 μm or more.

Next, as can be seen from the graph of FIG. 4, the reflection color of the transparent conductive film 2 itself, that is, the reflection color at the formation portion of the transparent conductive film 2 is when the thickness of the optical adjustment layer 3 is particularly less than 0.5 μm. Then, it becomes larger, smaller, or wavy, but becomes stable as the thickness of the optical adjustment layer 3 is increased.
For this reason, the thickness of the optical adjustment layer 3 is set to 0.6 μm or more, more preferably 0.7 μm or more, and even more preferably 1.0 μm or more with respect to the reflection color itself of the formation part of the transparent conductive film 2. I know it ’s good.

[Method of forming optical adjustment layer 3]
When the optical adjustment layer 3 is formed as an inorganic film, a liquid composition containing a precursor that becomes an inorganic substance is preferably applied by a coating method or a printing method, not by a vapor phase growth method that is expensive in terms of manufacturing equipment. Can be formed.
When the optical adjustment layer 3 is formed as an organic film, it dissolves or disperses the component that becomes the organic film (for example, resin, high refractive index inorganic particles, etc.) and the component that becomes the organic film as necessary. An organic composition appropriately containing a solvent to be added and further containing other known additives can be formed by a known coating method, printing method, or the like. For example, the coating method includes a spin coating method, a roll coating method, a die coating method, a spray coating method, and a bead coating method, and the printing method includes screen printing and ink jet printing. Moreover, when using photosensitive resin for the optical adjustment layer 3, it can also form by the photolithographic method.

<Manufacturing method>
Each layer which comprises the board | substrate 10 with a transparent conductive film of this embodiment is formed as follows, for example. First, the optical adjustment layer 3 is applied and formed on the entire surface of one side of the translucent substrate 1, and then the transparent conductive film 2 is formed on the entire surface of the optical adjustment layer 3. When the pattern-shaped transparent conductive film 2 is provided, then only the transparent conductive film 2 is patterned by an etching method or the like. Thus, the substrate 10 with a transparent conductive film is manufactured.

<Specific configuration example and its invisibility performance>
Here, Table 1 shows a specific configuration example of the substrate 10 with a transparent conductive film according to the present invention and its invisibility performance.

The layer configuration of each example and comparative example is shown in FIG. 5A shows the layer configuration of Example 1 and Example 2, and FIG. 5B shows the layer configuration of Comparative Example 1. FIG. In these, the resin layer 5 does not exist.
In each example and comparative example,
The translucent substrate 1 is a glass having a refractive index n1 = 1.50,
The transparent conductive film 2 is an ITO film having a refractive index n2 = 1.83 and a thickness of 140 nm,
The optical adjustment layer 3 is an organic film having a refractive index n3 = 1.75 or 1.68, and is an inorganic particle-containing resin layer having a thickness of 1.0 μm and containing high refractive index inorganic particles in an acrylic resin. The high refractive index inorganic particles are zirconium oxide.
The reflectance ratio (Y1 / Y2) was measured with a brightness Y in the above-described XYZ color system using a microspectrophotometer (Olympus Co., OSP-SP200).

As can be seen from Table 1, in Example 1 and Example 2, the pattern of the transparent conductive film 2 is made invisible by providing the optical adjustment layer 3, and the pattern is less visible compared to Comparative Example 1. I understand that.
Therefore, even if the transparent conductive film 2 is formed in a pattern, the invisible pattern of the transparent conductive film 2 can be easily and stably applied without using thin film interference formed by vapor deposition. It was confirmed that the substrate 10 with a transparent conductive film having a configuration that can be realized at low cost by a wet process is obtained.

<Deformation>
The board | substrate 10 with a transparent conductive film by this invention can take other forms other than the above-mentioned form. Some of these will be described below.

<Resin layer 5: Overcoat layer>
In the present invention, although not illustrated, when the transparent conductive film 2 has already been formed in a pattern, the transparent conductive film 2 side including the formed portion and the non-formed portion of the transparent conductive film 2 is formed. A transparent overcoat layer may be formed as the outermost layer. The overcoat layer can improve reliability such as insulation and scratch resistance.
The overcoat layer may be provided on the entire surface on the side where the transparent conductive film 2 is formed or not depending on the required specifications.

  A well-known material and a formation method can be employ | adopted for an overcoat layer. For the overcoat layer, for example, a thermosetting epoxy resin, an ultraviolet curable acrylic resin, or the like can be used. When forming a pattern, it can be formed by photolithography.

  When the overcoat layer is formed in contact with the transparent conductive film 2, it corresponds to the resin layer 5 described in FIG. For this reason, the overcoat layer is preferably electrically insulating, and the refractive index is preferably the same as that of the translucent substrate 1. For this reason, the refractive index is preferably about 1.5, for example, about 1.45 to 1.55. This is because the reflectance difference between the formed portion and the non-formed portion of the transparent conductive film 2 is reduced by increasing the reflectivity at the non-formed portion of the transparent conductive film 2. Moreover, it can also form with a general material.

[C] Touch panel substrate:
Hereinafter, a touch panel substrate according to the present invention will be described.

FIG. 6 is a cross-sectional view illustrating a touch panel substrate according to the present invention in one embodiment thereof.
6A is a plan view of the touch panel substrate 20 viewed from the back side, and FIG. 6B is a cross-sectional view taken along the line CC in the plan view of FIG. 6A.
The touch panel substrate 20 according to the present invention, as shown in one embodiment of the same figure, is the same as the above-mentioned substrate 10 with a transparent conductive film in which the transparent conductive film 2 is formed in a pattern, It is a thing obtained by utilizing the electrically conductive film 2 as the transparent electrode 4 for position detection of a touch panel.
The touch panel substrate 20 of the present embodiment further includes wiring 6 that is electrically connected to the transparent electrode 4 as shown in FIG.

As shown in FIG. 6A, the touch panel substrate 20 of the embodiment shown in FIG. 6 has a central display area A1 and an outer peripheral area A3 of the outer peripheral portion of the display area A1. As shown in FIG. 6B, the touch panel substrate 20 in this embodiment includes a translucent substrate 1, a first surface S1 of the translucent substrate 1, and a second side opposite to the first surface S1. Of the two surfaces, the surface S2, the second surface S2 is provided in a pattern on the optical adjustment layer 3 provided on the entire surface and on the surface of the optical adjustment layer 3 from the display region A1 to the outer peripheral region A3. It has the transparent electrode 4 which consists of the transparent conductive film 2, and the wiring 6 provided in the pattern form on the surface of the optical adjustment layer 3 in outer peripheral area | region A3.
The transparent electrode 4 extends to the wiring 6 in the outer peripheral area A3 and is electrically connected. The outer peripheral area A3 is provided on the outer peripheral portion of the display device front protective plate 60 when the touch panel substrate 20 is overlapped with the display device front protective plate 60 indicated by the phantom line in FIG. This is a region that is concealed by the opaque region A2 formed by the light shielding layer 7 formed.

  When the touch panel substrate 20 is used, the second surface S2 of the translucent substrate 1 on the side where the optical adjustment layer 3 and the transparent electrode 4 are provided is directed to the operator side (the viewer V side of the display panel 40 to be applied). The front side or the reverse side is arbitrary. However, the touch panel board | substrate 20 of this embodiment assumes the form which laminates | stacks and closely_contact | adheres with the front-surface protective plate 60 for display apparatuses through the resin layer 5 in between with the 2nd surface S2 facing front side.

  Hereinafter, the components will be further described.

<Display area A1, outer peripheral area A3>
The display area A1 is an area in which the content displayed by the display panel 40 can be displayed when applied to the display panel 40 indicated by a two-dot chain line imaginary line in the cross-sectional view of FIG. The outer peripheral area A3 overlaps with the opaque area A2 when combined with the front protective plate 60 for a display device indicated by a two-dot chain imaginary line in the cross-sectional view of FIG. This is a region where components to be hidden such as wiring and connectors can be provided.

<Transparent electrode 4>
The pattern of the transparent electrode 4 formed by the transparent conductive film 2 is not particularly limited as long as it is a touch panel position detection pattern. For example, the position detection method of the touch panel is arbitrary such as a resistive film method in addition to the projection capacitance method.
In the present embodiment, as a configuration example in which the transparent electrode 4 can be applied to the projected electrostatic capacitance method, a configuration that functions as a position detection by being formed only on one surface of a single translucent substrate 1. It is assumed and illustrated.
However, in the present invention, although not shown, the transparent electrode 4 for detecting the position of the touch panel may be formed separately on both surfaces of the single translucent substrate 1. The structure formed separately on each of one side of 1 may be sufficient.

<Wiring 6>
A known material and formation method can be used for the wiring 6. For example, the wiring 6 can be made of metal (including alloys thereof) such as silver, gold, copper, chromium, platinum, aluminum, palladium, and molybdenum. The wiring 6 can be formed into a pattern by a photolithography method and an etching method after forming a metal layer of a silver alloy (also referred to as APC) made of silver, palladium, and copper by a sputtering method, for example.
For the wiring 6, a conductive layer (referred to as MAM) having a three-layer structure of molybdenum (Mo) / aluminum (Al) / molybdenum (Mo) can also be used.
In the present embodiment, the wiring 6 is formed of a silver alloy (also referred to as APC) made of silver, palladium, and copper using a photolithography method and an etching method as a metal layer.
In the present invention, the method for forming the wiring 6 is not particularly limited, and may be formed by a printing method such as a screen printing method or an ink jet printing method.

<Other components>
In the present invention, the touch panel substrate 20 has a touch panel function of a touch panel function such as a connector and a control circuit in addition to the transparent electrode 4 and the wiring 6 made of the transparent conductive film 2 shown in FIG. Some or even all may be integrated.

<Manufacturing method>
Each layer which comprises the touch-panel board | substrate 20 of this embodiment is formed as follows, for example. First, the optical adjustment layer 3 is applied over the entire surface of one side of the translucent substrate 1, and then the transparent conductive film 2 is formed over the entire surface of the optical adjustment layer 3. Subsequently, only the transparent conductive film 2 is patterned by an etching method or the like to form the transparent electrode 4. Next, the wiring 6 is patterned. Thus, the touch panel substrate 20 is manufactured.

<Effect in this embodiment>
In the touch panel substrate 20 according to the present embodiment, the effect of the substrate 10 with the transparent conductive film described above can be obtained. In other words, it is possible to easily and stably realize the invisibility of the pattern of the transparent electrode 4 formed in a pattern by the transparent conductive film 2.

<Deformation>
The touch panel substrate 20 according to the present invention may take other forms other than the forms described above. Some of these will be described below.

<Resin layer 5: Overcoat layer>
In the present invention, although not shown in the drawings, a transparent overlayer such as the outermost layer on the side where the transparent electrode 4 made of the transparent conductive film 2 is formed, such as on the surface after the wiring 6 and the transparent electrode 4 are formed, is used. A coat layer may be formed. The overcoat layer can improve reliability such as insulation and scratch resistance.
The overcoat layer may be provided on the entire surface on the side where the transparent conductive film 2 is formed or not depending on the required specifications.

  A well-known material and a formation method can be employ | adopted for an overcoat layer. For the overcoat layer, for example, a thermosetting epoxy resin, an ultraviolet curable acrylic resin, or the like can be used. When forming a pattern, it can be formed by photolithography.

  When the overcoat layer is formed in contact with the transparent conductive film 2, it corresponds to the resin layer 5 described in FIG. For this reason, the overcoat layer is preferably electrically insulating, and the refractive index is preferably the same as that of the translucent substrate 1. For this reason, the refractive index is preferably about 1.5, for example, about 1.45 to 1.55. This is because the reflectance difference between the formed portion and the non-formed portion of the transparent conductive film 2 is reduced by increasing the reflectivity at the non-formed portion of the transparent conductive film 2. Moreover, it can also form with a general material.

[D] Touch panel integrated front protective plate for display device:
Next, the front protective plate for a display device integrated with a touch panel according to the present invention will be described.

  An embodiment of a front protective plate for a display device integrated with a touch panel according to the present invention will be described with reference to FIG. 7A is a plan view of the front protective plate 30 for a display device integrated with a touch panel as viewed from the back side, and FIG. 7B is a plan view of FIG. FIG.

The front protective plate 30 for a display device integrated with a touch panel according to the present embodiment shown in FIG.
As shown in (a), it has a central display area A1 and an opaque area A2 that is provided on the outer periphery of the display area A1 and shields visible light. As shown in FIG. 7B, the touch panel integrated front protective plate 30 for a display device according to this embodiment includes a translucent substrate 1, a first surface S <b> 1 of the translucent substrate 1, and the first surface. Of the two surfaces of the second surface S2 opposite to S1, on the second surface S2, the optical adjustment layer 3 provided in the display region A1, the light shielding layer 7 provided in the opaque region A2, A wiring 6 provided on the surface of the light shielding layer 7 and a transparent electrode 4 made of the transparent conductive film 2 provided in a pattern from the display area A1 to the opaque area A2 so as to be electrically connected to the wiring 6 Have.
The optical adjustment layer 3 is not substantially formed in the opaque region A2, but is formed on the surface of the light shielding layer 7 so as to cover the light shielding layer 7 very slightly. Therefore, the optical adjustment layer 3 is formed after the light shielding layer 7.
The transparent electrode 4 is formed on the surface of the optical adjustment layer 3 in the display area A1, and is formed on the surface of the light shielding layer 7 in the opaque area A2.

  The front protective plate 30 for a display device integrated with a touch panel in the present embodiment has the second surface S2 as the back side, and is directed toward the display panel 40 side indicated by an imaginary line of a two-dot chain line in FIG. The surface S1 is a form that is assumed to be used toward the viewer V side of the display of the display panel 40.

In short, the present embodiment is similar to the touch panel substrate 20 described as the embodiment described above, in which the light shielding layer 7 is further provided in the outer peripheral area A3. It is a configuration that can be realized only by forming the optical adjustment layer 3 after the light shielding layer 7 instead of forming it after the adjustment layer 3.
Therefore, since the transparent electrode 4 and the wiring 6 have already been described in the touch panel substrate 20, further description is omitted. Here, the display area A1 and the opaque area A2, the light-shielding layer 7, and portions related thereto. The optical adjustment layer 3 will be described.

<Display area A1 and opaque area A2>
As in the embodiment of the touch panel substrate 20, the display area A1 is a display in which the touch panel integrated front protective plate 30 for a display device is shown by a two-dot chain imaginary line in the cross-sectional view of FIG. This is an area where the contents displayed on the display panel 40 can be displayed when applied to the panel 40. The opaque area A2 is an area for hiding wiring, connectors, and the like that the display panel 40 has on the outer periphery. Further, the opaque area A2 is an area that also serves as a decoration portion by visible information such as a color expressed by the logo, a logo or a mark provided as appropriate.

<Light shielding layer 7>
The light shielding layer 7 is formed in the opaque region A2, and thus has a function of providing the opaque region A2 with a light shielding property capable of hiding components to be hidden. That is, the light-shielding layer 7 hides the wiring and the control circuit that are provided on the outer periphery of the display panel 40 from the center display area so that the display panel 40 cannot be viewed. Has a function of preventing damage.
Moreover, the light shielding layer 7 can use the opaque area A2 as a decoration part.

  The light-shielding property of the light-shielding layer 7 itself depends on the required specifications and the expression color, but in terms of transmittance, it is at most 3% (optical density OD is 1.5 or more), more preferably transmittance. 1% or less (optical density OD2.0 or more), more preferably 0.01% or less (optical density OD4.0 or more) in terms of transmittance is desirable. This is because if the transmittance exceeds the above value, parts to be hidden may be seen.

The light shielding layer 7 can be formed by a known material and a forming method. For example, the light shielding layer 7 can be formed from a layer containing a color pigment in a resin binder made of a cured product of a curable resin. As the curable resin, a photosensitive resin such as an ultraviolet curable acrylic resin can be used.
The color pigment used for the light shielding layer 7 may be any color pigment corresponding to the color expressed by the light shielding layer 7 and is not particularly limited. For example, as a colored pigment, a black pigment, a white pigment, a red pigment, a yellow pigment, a blue pigment, a green pigment, a purple pigment, or the like can be used. The color pigments may be used alone, or a plurality of color pigments of the same type or different colors may be used.

In this embodiment, the light shielding layer 7 is formed by a photolithography method using a colored photosensitive resin composition containing a color pigment as a resin binder in an ultraviolet curable acrylic photosensitive resin.
In the present invention, the light shielding layer 7 may be formed by a method other than the photolithography method, for example, a printing method such as screen printing or ink jet printing.

(Lining layer)
The light shielding layer 7 can have a backing layer as one constituent layer thereof.
When the light-shielding layer 7 is composed only of a colored resin layer, the backing layer can supplement the light-shielding property, for example, when the light-shielding property is insufficient particularly with a white color or the like. The backing layer is provided on the surface of the colored resin layer that is the back side of the colored resin layer.
The backing layer can typically be formed of a dark resin layer that has a greater light shielding property than the colored resin layer. The dark color resin layer can be formed, for example, by a photolithography method using a dark color photosensitive resin composition containing a black pigment in a resin binder.

<Pattern-shaped optical adjustment layer 3>
In the present invention, the optical adjustment layer 3 is partially patterned on only the display area A1 on the surface of the translucent substrate 1. In other words, the optical adjustment layer 3 is not substantially formed in the opaque region A2. This is because, in the opaque region A2, the pattern of the transparent electrode 4 by the transparent conductive film 2 is not related to visual recognition of the display panel 40.
In order to form the pattern of the optical adjustment layer 3, a known printing method or a known pattern coating method can be appropriately employed. Further, when a photosensitive resin is used for the optical adjustment layer 3, a photolithography method can also be used. In the present embodiment, the optical adjustment layer 3 is formed by a photolithography method.

(The optical adjustment layer 3 that overlaps the light-shielding layer 7 strictly but does not substantially overlap)
In the present invention, since the optical adjustment layer 3 is substantially not formed in the opaque region A2, the optical adjustment layer 3 can strictly overlap with the light shielding layer 7 forming the opaque region A2, but does not substantially overlap. In the present embodiment, the optical adjustment layer 3 can be strictly overlapped with the light shielding layer 7, but does not substantially overlap.

The cross-sectional view of FIG. 8 is a diagram illustrating a state where the optical adjustment layer 3 strictly overlaps the light shielding layer 7 but does not substantially overlap. FIG. 8A includes examples corresponding to the present invention, FIG. 8B includes examples not corresponding to the present invention, and FIG. 8C includes examples corresponding to the present invention.
8A illustrating the definition of the overlap width W, the optical adjustment layer 3 covers the vicinity of the inner outer edge of the light shielding layer 7, but the optical adjustment is substantially performed in the opaque region A2 formed by the light shielding layer 7. FIG. It is also an example of a non-formed part of the layer 3.

  Here, substantially, the overlapping width W of the optical adjustment layer 3 and the light shielding layer 7 shown in FIG. 8A is the inner side of the two outer edges of the light shielding layer 7 (display area A1 of the light shielding layer 7). The outer edge of the side) is set to zero as the reference, and the display area A1 side that does not overlap the light shielding layer 7 further inside than the inner extension is conversely added. When defined as minus, it means that the overlap width W satisfies the following [Equation 2].

Wm _LIMIT ≤ W ≤ Wp _LIMIT [Formula 2]
In Equation 2,
Wm _LIMIT is preferably −50 μm, more preferably −30 μm, still more preferably 0 μm,
Wp _LIMIT is preferably 30 μm, but may be 60 μm as described below, but is 100 μm at the maximum.

  The upper and lower dimensions of the overlap width W can be allowed in consideration of the practical alignment accuracy when the pattern of the optical adjustment layer 3 is formed and when the pattern of the light shielding layer 7 is formed. Dimensions. That is, as shown in the drawings of the above-described embodiment, the dimensions can occur when the optical adjustment layer 3 and the light shielding layer 7 are formed with the aim of W = 0.

On the other hand, FIG. 8B is not applicable to the present invention because the optical adjustment layer 3 has a layer structure including a portion covered with the light shielding layer 7. As shown in FIG. 8B, the optical adjustment layer 3 is substantially overlapped, but the optical adjustment layer 3 is formed at the tip of the light shielding layer 7, so that the optical adjustment layer is interposed between the light shielding layer 7 and the translucent substrate 1. The invisible action as the optical adjustment layer 3 can be exhibited even in the layer vertical relationship where 3 is located. However, in the configuration of FIG. 8A, the step at the inner outer edge of the light shielding layer 7 is not possible with the configuration of FIG. 8B, rather than the configuration of FIG. 8B. Is preferable in that another effect can be obtained simultaneously with the invisibility effect, in that an inclined surface with a gentle inclination can be formed on the surface of the optical adjustment layer 3. This is an effect of improving the disconnection that may occur when the transparent electrode 4 made of the transparent conductive film 2 is formed across the steps of the light shielding layer 7.
However, if the width of the inclined surface is large, the outer edge of the light shielding layer 7 may not be seen sharply because the portion becomes a concave lens. In this respect, the width of the inclined surface is preferably 50 μm or less, more preferably 30 μm. The width of the inclined surface can be adjusted by the thickness of the optical adjustment layer 3.

Next, FIG. 8C does not correspond to the present invention when W <Wm _LIMIT , and applies to the present invention when W ≧ Wm _LIMIT .
The area of W = 0 from Wm _LIMIT means that the optical adjustment layer 3 does not exist in the outer peripheral portion in the display area A1. Since the transparent electrode 4 extends from the display region A1 to the wiring 6 provided in the opaque region A2, only the portion of the outer peripheral portion outside the display region A1 is not made invisible by the optical adjustment layer 3. In the present invention, Wm _LIMIT is also set as an allowable level of the width of the non-invisible portion.
In this respect, the Wm _LIMIT is more preferably 0 μm.
That is, 0 ≦ W ≦ Wp _LIMIT
It is.
In this case, the position to be aimed at when the alignment accuracy between the pattern formation of the optical adjustment layer 3 and the pattern formation of the light shielding layer 7 is a position slightly outside from W = 0 of the inner outer edge of the light shielding layer 7. Is reasonable. Therefore, Wp _LIMIT is also shifted by the same amount as the shift amount of Wm _LIMIT , and Wp _LIMIT is more preferably 60 μm.

Wm _LIMIT and Wp _LIMIT may be increased or decreased according to the alignment accuracy that can be realized by an available manufacturing apparatus. For example, Wm _LIMIT may be −50 μm, Wp _LIMIT may be 50 μm, or Wm _LIMIT may be −20 μm, Wp _LIMIT may be 20 μm, and the like.
However, the Wm _LIMIT is more preferably zero as described above.

  A configuration in which the optical adjustment layer 3 is formed in the entire opaque region A2, that is, a configuration in which the optical adjustment layer 3 is provided over the entire surface of the light shielding layer 7, or an entire region between the light shielding layer 7 and the light-transmitting substrate 1. The structure provided in can also be considered. However, in such a configuration, the optical adjustment layer 3 is provided in an unnecessary portion.

  For the reasons described above, the optical adjustment layer 3 is not necessary in the opaque region A2 in terms of the invisibility effect. Therefore, the opaque region A2 is not formed, but strictly speaking, the light shielding layer 7 in the opaque region A2 is not. When overlapping, a configuration formed on the surface of the light shielding layer 7 is adopted in that different effects can be obtained simultaneously.

<Manufacturing method>
Each layer constituting the front protective plate 30 for a display device integrated with a touch panel according to the present embodiment is formed as follows, for example. First, the light shielding layer 7 is formed in a pattern on the part of the translucent substrate 1 that is to be the opaque region A2. Next, the optical adjustment layer 3 is formed in a pattern substantially only in the display area A1 except for the portion of the light shielding layer 7. Next, the wiring 6 is pattern-formed on the surface of the light shielding layer 7 which is the opaque region A2. Next, from the display area A1 to the opaque area A2, the transparent electrode 4 is patterned on the surface of the optical adjustment layer 3 in the display area A1 and on the surface of the light shielding layer 7 in the opaque area A2. At this time, the transparent electrode 4 forms a pattern in contact with the wiring 6 on the surface of the light shielding layer 7. Thus, the front protective plate 30 for a display device integrated with a touch panel is manufactured.

<Effect in this embodiment>
With the front protective plate 30 for a display device integrated with a touch panel according to the present embodiment, the effect of the substrate 10 with the transparent conductive film described above can be obtained. In other words, it is possible to easily and stably realize invisibility that makes it difficult to see the pattern of the transparent electrode 4 formed in a pattern by the transparent conductive film 2.
Furthermore, since the touch panel and the front protective plate for the display device are integrated, the number of components is reduced, the number of assembly steps is reduced, and the cost can be reduced.

<Deformation>
The touch panel integrated front protective plate 30 for a display device according to the present invention may take other forms besides the above-described form. Some of these will be described below.

<Resin layer 5: Overcoat layer>
In the present invention, although not shown in the drawings, a transparent overlayer such as the outermost layer on the side where the transparent electrode 4 made of the transparent conductive film 2 is formed, such as on the surface after the wiring 6 and the transparent electrode 4 are formed, is used. A coat layer may be formed. The overcoat layer can improve reliability such as insulation and scratch resistance.
The overcoat layer may be provided on the entire surface on the side where the transparent conductive film 2 is formed or not depending on the required specifications.

  A well-known material and a formation method can be employ | adopted for an overcoat layer. For the overcoat layer, for example, a thermosetting epoxy resin, an ultraviolet curable acrylic resin, or the like can be used. When forming a pattern, it can be formed by photolithography.

  When the overcoat layer is formed in contact with the transparent conductive film 2, it corresponds to the resin layer 5 described in FIG. For this reason, the overcoat layer can be electrically insulative, and its refractive index can be the same as that of the translucent substrate 1. For this reason, the refractive index is around 1.5, for example, about 1.45 to 1.55. This is because the reflectance difference between the formed portion and the non-formed portion of the transparent conductive film 2 is reduced by increasing the reflectivity at the non-formed portion of the transparent conductive film 2. Moreover, it can also form with a general material.

<Opaque area A2: Visible information>
In the present invention, although not shown, visible information may be formed in the opaque region A2. The visible information is any visible information such as a product logo, an operation explanation character, symbol, or pattern in the opaque region A2. Known materials and forming methods can be employed for the visible information.
For example, the visible information can be formed by patterning a colored resin layer as a cured layer of a photosensitive resin containing a color pigment by a photolithography method or the like.

<Opaque area A2: Window>
In the present invention, although not shown, a notification window, an infrared transmission window, or the like may be formed in the opaque region A2. Known materials and forming methods can be employed for these windows.
For example, in the case where the display device to which the touch panel-integrated front protective plate 30 for a display device is applied is a mobile phone, the notification window indicates various operation states such as incoming calls and battery charge states, This is a part to notify the user by color and color. Known structures, materials, and forming methods can be employed for the notification window.
The notification window can be provided as a non-formation part of the light shielding layer 7, for example.
In the case of a mobile phone, the infrared transmission window needs to prevent malfunction of the touch panel when the display device to which the touch panel-integrated front protective plate 30 for a display device is applied is a mobile phone. From the viewpoint of turning off the display on the display panel and extending the battery life, the infrared sensor is provided in front of the infrared sensor provided as a human sensor for detecting the approach of human skin. The infrared transmission window is a portion that is transparent to at least infrared light, but may be a portion that exhibits light shielding properties for visible light and also transmits infrared light. A well-known structure, material, and formation method can be adopted for the infrared transmission window.
For example, the infrared transmission window can be provided as a non-formation portion of the light shielding layer 7.

[E] Display device:
The display device according to the present invention includes the above-described substrate 10 with a transparent conductive film, the touch panel substrate 20, and the touch panel integrated type as constituent members arranged on the display panel and the front side from which display light from the display panel is emitted. The display device includes at least one selected from the front protective plate 30 for a display device.

In the configuration in which the touch panel substrate 20 or the touch panel integrated front protection plate 30 for a display device is used as the constituent member, the display device has a touch panel function.
In the configuration in which the substrate 10 with a transparent conductive film is used as the optical member, the display device may have a touch panel function, but also includes a device that does not have a touch panel function.

<< First Embodiment: Use of Touch Panel-Integrated Display Front Panel 30 for Display Device >>
FIG. 9 shows an embodiment of a display device according to the present invention. A display device 100 shown in FIG. 9 is a touch panel integrated front protective plate 30 for a display device integrated with a touch panel in order from the front side on the viewer V side above the drawing. A display panel 40 is provided.

<Front Protection Plate 30 for Display Device Integrated with Touch Panel>
The front protective plate 30 for a display device integrated with a touch panel is the above-described front protective plate 30 for a display device integrated with a touch panel according to the present invention. Therefore, further explanation is omitted.

However, in the drawing, it is drawn with a configuration using one translucent substrate 1, but as described above,
A method in which the transparent electrode 4 is provided separately on the two translucent substrates 1 may be used.
In the case of the figure, assuming the method in which all the transparent electrodes 4 necessary as a touch panel are provided on one translucent substrate 1, the display panel 40 side of the front protective plate 30 for a display device integrated with a touch panel is assumed. The display panel 30 and the display panel 30 are filled with the resin layer 5, and the touch panel integrated front protective plate for display device 30 and the display panel 40 are laminated and adhered.

<Display panel 40>
The display panel 40 is typically a liquid crystal display panel or an electroluminescence (EL) panel, but may be an electronic paper panel or a cathode ray tube, or various known display panels.

<Resin layer 5>
The resin layer 5 has been described in the above-described substrate 10 with a transparent conductive film.
The resin layer 5 is a transparent layer, and an adhesive sheet, a solidified layer of the applied resin liquid, or the like can be used. As an adhesive sheet, what consists of an acrylic adhesive, a polyester adhesive, an epoxy adhesive, a silicone adhesive, etc. can be used. As the resin liquid, an acrylic photocurable resin or the like can be used.
Since the refractive index n5 of the resin layer 5 is usually matched with the refractive index of the translucent substrate 1 in a commercial product, it is usually around 1.5 corresponding to general glass as the translucent substrate 1. It is. For example, the refractive index n5 is about 1.45 to 1.55.
By reducing the difference in refractive index at the interface with the resin layer 5, light reflection is reduced, and the display can be made easier to see.

<Effect in this embodiment>
By making the display device 100 configured as described above, in the touch panel-integrated front protective plate 30 for a display device, the transparent electrode 4 formed in a pattern shape with the transparent conductive film 2 becomes invisible so that the pattern becomes invisible. Can be realized easily and stably.
Furthermore, since the touch panel and the front protective plate for the display device are integrated, the number of components is reduced, the number of assembly steps is reduced, and the cost can be reduced.

<< Second Embodiment: Use of Touch Panel Substrate 20 >>
A display device 100 according to the second embodiment shown in FIG. 10 includes a display device front protective plate 60, a touch panel 50 using the touch panel substrate 20, and a display panel 40 in order from the front side on the viewer V side above the drawing. Further, the touch panel 50 and the display device front protective plate 60 are laminated and adhered through the resin layer 5 therebetween.
ing.

<Front protective plate 60 for display device>
The display device front protective plate 60 includes at least the light-transmitting substrate 1 and the light-shielding layer 7 provided in the portion of the light-transmitting substrate 1 that is the opaque region A2. As such a front protective plate 60 for a display device, a conventionally known one can be appropriately employed.

<Touch panel 50>
The touch panel 50 uses the touch panel substrate 20 according to the present invention described above. The difference between the touch panel 50 and the touch panel substrate 20 is that the touch panel substrate 20 includes some that do not have some of the necessary functions as the touch panel 50, but the touch panel 50 includes all of the necessary functions as the touch panel. . The whole may not include an external control circuit and a connector for connection with the control circuit.
The touch panel 50 is typically a projected capacitive touch panel capable of multi-touch (multi-point simultaneous input). However, if the touch panel substrate 20 is used, a position detection method, There are no particular restrictions on the configuration.

<Display panel 40>
The display panel 40 is the same as that of the first embodiment as the display device 100.

<Resin layer 5>
The resin layer 5 is the same as that of the first embodiment as the display device 100. However, it is preferable to provide the resin layer 5 when contacting the transparent electrode 4 made of the transparent conductive film 2 of the touch panel 50. In the present embodiment, the resin layer 5 is provided as a representative configuration in contact with the transparent electrode 4 of the touch panel 50. For this reason, in the drawing, the resin layer 5 is drawn in contact with the surface of the touch panel 50.
In the present invention, the resin layer 5 may be provided between the display panel 40 and the touch panel 50. However, in the present invention, the resin layer 5 can be omitted.

<Effect in this embodiment>
By making the display device 100 configured as described above, in the touch panel substrate 20 used in the touch panel 50, it is easy to make the pattern of the transparent electrode 4 formed in a pattern with the transparent conductive film 2 invisible. And it is realizable stably.

<< Third embodiment: Use of substrate 10 with transparent conductive film: No touch panel function >>
A display device 100 according to this embodiment shown in FIG. 11 includes a substrate 10 with a transparent conductive film and a display panel 40 in order from the front side on the viewer V side above the drawing, and further includes the substrate 10 with a transparent conductive film and the display panel 40. Are in close contact with each other via the resin layer 5.

<Substrate with transparent conductive film 10>
The substrate 10 with a transparent conductive film uses the substrate 10 with a transparent conductive film according to the present invention described above. However, the transparent conductive film 2 is formed in a pattern on the substrate 10 with a transparent conductive film here. In this embodiment, the transparent conductive film 2 formed in the pattern is other than the touch panel application. For example, the transparent conductive film 2 formed in a pattern is used for sensors other than antennas and touch panels.
The substrate 10 with a transparent conductive film can have a wiring 6 (not shown) or the like that is electrically connected to the transparent conductive film 2 on the outer periphery that does not hinder display.

<Display panel 40, resin layer 5>
Since the display panel 40 and the resin layer 5 are the same as those of the first embodiment as the display device 100, the description thereof is omitted.

<Effect in this embodiment>
By using the display device 100 having the above-described configuration, the substrate 10 with a transparent conductive film can be easily and stably made invisible so that the pattern of the transparent electrode 4 formed in a pattern with the transparent conductive film 2 is less visible. Can be realized.

<< Deformation as display device >>
The display device 100 of the present invention can take other forms besides the above-described form. Some of these will be described below.

In each of the above-described embodiments, the touch panel integrated front protective plate 30 for a display device, the touch panel substrate 20 and the substrate 10 with a transparent conductive film are each described as a constituent member arranged on the front side of the display panel 40 by one embodiment. did.
However, in the display device 100 according to the present invention, the configuration of the display device 100 is not particularly limited as long as at least the substrate 10 with a transparent conductive film is used as the above-described constituent member. Can take. For example, as described in part, a configuration in which the resin layer 5 is used in contact with the transparent conductive film 2 inside the touch panel 50 may be used as in the second embodiment using the touch panel 50.

[F] Application:
Applications of the transparent conductive film-coated substrate 10, the touch panel substrate 20, the touch panel integrated front protective plate 30 for a display device, and the display device 100 according to the present invention are not particularly limited. For example, a mobile phone such as a smartphone, a portable information terminal such as a tablet PC, a personal computer, a car navigation device, a digital camera, a digital photo frame, an electronic book terminal, an electronic notebook, a game machine, an automatic ticket vending machine, an ATM terminal, a POS terminal, Vending machines.

DESCRIPTION OF SYMBOLS 1 Translucent board | substrate 2 Transparent conductive film 3 Optical adjustment layer 4 Transparent electrode 5 Resin layer 6 Wiring 7 Light-shielding layer 10 Substrate with a transparent conductive film 20 Touch panel substrate 30 Front protective plate for a display device integrated with a touch panel 40 Display panel 50 Touch panel 60 Front protective plate for display device 70 (Conventional) Substrate with transparent conductive film 80 (Conventional) Front protective plate for touch panel integrated display device 100 Display device A1 Display region A2 Opaque region A3 Outer peripheral region S1 First surface S2 First Two sides V Observer W Overlap width

Claims (4)

A touch panel integrated front protection plate for a display device having a touch panel substrate using a substrate with a transparent conductive film,
The substrate with a transparent conductive film is
A translucent substrate;
A transparent conductive film provided on at least one surface of the translucent substrate;
Between the translucent substrate and the transparent conductive film, having an optical adjustment layer provided in contact with both,
The refractive index n3 of the optical adjustment layer is such that the relationship between the refractive index n1 of the translucent substrate and the refractive index n2 of the transparent conductive film satisfies n1 <n3 ≦ n2.
And the thickness of the optical adjustment layer is 0.7 μm or more,
The transparent conductive film is provided in a pattern,
The optical adjustment layer is a substrate with a transparent conductive film provided in a non-formation part together with a pattern formation part of the transparent conductive film,
The touch panel substrate uses the transparent conductive film-provided substrate as a transparent electrode for detecting the position of the touch panel.
The touch panel substrate has a central display area and an opaque area that is provided on the outer periphery of the display area and shields visible light.
Furthermore, having a light shielding layer provided in the opaque region,
The optical adjustment layer is located on the surface of the light shielding layer in the opaque region and is a non-formed part that does not substantially overlap the light shielding layer.
Front protective plate for display device with integrated touch panel. The front protective plate for a touch panel integrated display device according to claim 1, wherein the optical adjustment layer is an organic film using at least an organic substance . The front protective plate for a touch panel integrated display device according to claim 2, wherein the organic film is a layer containing high refractive index inorganic particles having a refractive index higher than that of the resin in the resin . A display panel;
As a component of display light is disposed on the front side is the side to the light exit from the display panel, a touch panel integrated display device for front protection plate according to any one of claims of claims 1 to 3 ,
Comprising at least
Display device.

Images