JP6811113B2 - Impact force measuring device, substrate processing device, impact force measuring method, and substrate processing method - Google Patents

Description

The present invention relates to an impact force measuring technique for measuring an impact force received by an object when a droplet hits an object such as a substrate. The substrates to be measured include semiconductor wafers, glass substrates for liquid crystal display devices, substrates for FED (Field Emission Display), glass substrates for plasma display panels, substrates for optical disks, substrates for magnetic disks, substrates for optical magnetic disks, and photomasks. Various substrates such as substrates for use are included.

Patent Document 1 discloses a nozzle for ejecting droplets of a processing liquid for processing a substrate. The nozzle includes a main body and a piezoelectric element. The main body includes a supply port to which the treatment liquid is supplied, a plurality of discharge ports for discharging the treatment liquid, and a treatment liquid flow passage connecting the supply port and the plurality of discharge ports. The treatment liquid flow path includes a plurality of branch flow paths. The plurality of discharge ports form a plurality of rows corresponding to the plurality of branch flow paths. The plurality of discharge ports are arranged along the corresponding branch flow paths and are connected to the corresponding branch flow paths. The piezoelectric element applies vibration to the processing liquid flowing through the plurality of branch flow paths. When the treatment liquid is supplied to the supply port, the treatment liquid is introduced into the treatment liquid flow passage, flows through the plurality of branch flow paths, and is discharged from the plurality of discharge ports. The processing liquid discharged from each discharge port is divided by the vibration given by the piezoelectric element. As a result, a plurality of droplets of the treatment liquid are ejected from the nozzle.

Japanese Unexamined Patent Publication No. 2012-182320

The nozzle of Patent Document 1 has a large number of ejection ports and ejects a large number of droplets. Each discharge port is a micropore having a diameter of several μm to several tens of μm. Of the large number of discharge ports corresponding to each branch flow path, the distance between the centers of the discharge ports adjacent to each other is several hundreds. Therefore, the diameter of the droplets discharged from each discharge port is several tens of μm, and the discharge speed is as high as 10 m / s to 60 m / s. The shortest distance between the droplets is several hundred μm, and the density of the droplets in the space where a large number of droplets are ejected becomes high. When the distribution of a large number of droplets changes due to a malfunction such as a nozzle failure, the impact force (cleaning force) given to the substrate by the large number of droplets deviates from the desired state, and the fine structure formed on the substrate becomes May be damaged.

However, a large number of droplets are ejected, and each of the ejected droplets is fine and high-speed. Therefore, after the substrate processing device provided with the nozzle is installed at the site of use, the substrate has a large number of droplets. There is a problem that it is difficult to measure the impact force received from.

The present invention has been made to solve such a problem, and an object of the present invention is to provide a technique capable of easily measuring the impact force applied to a substrate by a large number of droplets ejected onto the main surface of the substrate.

In order to solve the above problems, in the impact force measuring device according to the first aspect, a nozzle capable of ejecting a large number of droplets is used, and the droplets ejected onto the main surface of the substrate held horizontally are the substrates. An impact force measuring device that measures the impact force applied to a liquid receiving unit, which receives a large number of droplets ejected from a large number of droplets by the nozzle and an impact that the liquid receiving unit receives from the large number of droplets. It is provided with a measuring unit for measuring the total force. The liquid receiving portion includes a flat inclined surface that is inclined obliquely with respect to the ejection direction of the large number of droplets, and receives the large number of droplets by the inclined surface.

The impact force measuring device according to the second aspect is an impact force for measuring the impact force applied to the substrate by the nozzle capable of ejecting a large number of droplets to the main surface of the substrate held horizontally. A measuring device, a liquid receiving unit that receives a large number of droplets ejected by the nozzle toward a large number of locations, and a measuring unit that measures the total impact force that the liquid receiving unit receives from the large number of droplets. , Equipped with. The impact force measuring device according to the second aspect is the sum of the impact forces measured by the measuring unit based on the correspondence information indicating the correspondence relationship between the sum of the impact forces and the average velocity of the large number of droplets. Further includes a calculation unit for calculating the average velocity of the large number of droplets.

The impact force measuring device according to the third aspect is the impact force measuring device according to the second aspect, and the calculation unit calculates a time change of the average velocity of the large number of droplets.

The impact force measuring device according to the fourth aspect is the impact force measuring device according to the second or third aspect, and the corresponding information is based on the discharge hole diameter of the nozzle or the liquid of a large number of droplets. It depends on the type of.

The impact force measuring device according to the fifth aspect is an impact force measuring device according to any one of the second to fourth aspects, wherein a plurality of the measuring units are arranged in a plan view, and the plurality of the measuring units are arranged. Each of the measuring units measures the total of the impact forces, and the impact force measuring device further includes a calculation unit for obtaining the horizontal distribution of the total of the impact forces received by each of the plurality of measuring units.

The impact force measuring device according to the sixth aspect is an impact force measuring device according to any one of the second to fifth aspects, and the measuring unit is a piezoelectric element adjacent to the lower part of the liquid receiving unit. is there.

The impact force measuring device according to the seventh aspect is the impact force measuring device according to any one of the second to sixth aspects, and the liquid receiving unit relates to the ejection direction of a large number of droplets. It includes a flat inclined surface that is inclined at an angle, and receives the large number of droplets by the inclined surface.

The impact force measuring device according to the eighth aspect is the impact force measuring device according to the first aspect or the seventh aspect, and the inclination angle of the inclined surface is 5 degrees to 45 degrees with respect to the horizontal plane. ..

The impact force measuring device according to the ninth aspect is an impact force measuring device according to any one of the second to sixth aspects, and the liquid receiving portion has an inlet opening at which a large number of droplets enter. It is possible to receive the large number of droplets that have entered the space surrounded by the peripheral wall portion from the entrance opening and the tubular peripheral wall portion formed in the above, and to store the liquid composed of the received large number of droplets in the space. A container including a bottom wall portion that closes the opening at the other end of the peripheral wall portion is provided, and the peripheral wall portion is filled with a liquid that exceeds a predetermined height from the bottom wall portion among the liquids in the space. A discharge port that can be discharged from the container is provided.

The impact force measuring device according to the tenth aspect is the impact force measuring device according to any one of the first to eighth aspects, wherein the base portion in which a predetermined substrate is thinned and one main surface are described above. A thin plate-shaped spacer which is attached to one main surface of the base portion and is provided with a through hole is further provided, and the measuring unit includes a part of the one main surface of the base portion and the said one. The impact force measuring device includes a strain gauge provided in a recess portion surrounded by the inner peripheral wall of the through hole of the spacer and a memory provided in the recess portion and capable of storing the output of the strain gauge. A terminal provided on the peripheral edge of the base portion and capable of outputting the output of the strain gauge stored in the memory to the outside is further provided, and the liquid receiving portion is a thin plate in which the substrate is thinned. It comes into contact with the strain gauge to close the recessed portion, and is joined to the other main surface of the spacer so as to overlap the base portion.
The impact force measuring device according to the eleventh aspect is an impact force for measuring the impact force applied to the substrate by the nozzle capable of ejecting a large number of droplets to the main surface of the substrate held horizontally. A measuring device, a liquid receiving unit that receives a large number of droplets ejected by the nozzle toward a large number of locations, and a measuring unit that measures the total impact force that the liquid receiving unit receives from the large number of droplets. , Equipped with. The liquid receiving portion receives the tubular peripheral wall portion having an inlet opening for entering the large number of droplets at one end and the large number of droplets entering the space surrounded by the peripheral wall portion from the inlet opening. In addition, a container including a bottom wall portion that closes the opening at the other end of the peripheral wall portion so that a liquid composed of a large number of received droplets can be stored in the space is provided, and the peripheral wall portion is provided in the space. A discharge port is provided so that a liquid having a height exceeding a predetermined height from the bottom wall portion can be discharged from the container.
The impact force measuring device according to the twelfth aspect is an impact force for measuring the impact force applied to the substrate by a nozzle capable of ejecting a large number of droplets and ejected onto the main surface of the substrate held horizontally. A measuring device, a liquid receiving unit that receives a large number of droplets ejected by the nozzle toward a large number of locations, and a measuring unit that measures the total impact force that the liquid receiving unit receives from the large number of droplets. , Equipped with. In the impact force measuring device according to the twelfth aspect, a base portion in which a predetermined substrate is thinned and one main surface are attached so as to face one main surface of the base portion, and a through hole is provided. A thin plate-shaped spacer is further provided, and the measuring portion includes a strain gauge provided in a recessed portion surrounded by a part of the one main surface of the base portion and an inner peripheral wall of the through hole of the spacer. The impact force measuring device includes a memory provided in the recessed portion and capable of storing the output of the strain gauge, and the impact force measuring device is provided in the peripheral portion of the base portion and stored in the memory. The liquid receiving portion is a thin plate in which the substrate is thinned, and the spacer is provided so as to contact the strain gauge to close the recessed portion and overlap the base portion. It is joined to the other main surface.

The substrate processing apparatus according to the embodiment of the first 3, an impact force measuring apparatus according to the first to 1 2 in any one embodiment, a rotatable rotation holding mechanism while holding a substantially horizontal position of the substrate, the subject A nozzle capable of ejecting a large number of droplets of the treatment liquid so as to hit a large number of parts of an object, and a first position capable of ejecting a large number of droplets so as to hit a large number of parts on the main surface of the substrate. A nozzle moving mechanism for moving the nozzle to and from a second position where the nozzle can eject a large number of droplets is provided so as to hit a large number of locations in the liquid receiving portion of the impact force measuring device.

Impact Impact force measuring method according to the aspect of the first 4, the nozzles capable of discharging a plurality of droplets, the droplets ejected into the main surface of the substrate which is held horizontally to measure the impact force applied to the substrate In a force measuring method, a liquid receiving step in which a large number of droplets are received by a liquid receiving portion capable of receiving a large number of droplets ejected by the nozzle toward a large number of locations, and a liquid receiving portion in which the liquid receiving portion receives a large number of droplets. It includes a measurement step for measuring the total impact force received from the droplet. The liquid receiving step is a step of receiving the large number of droplets by a flat inclined surface that is inclined obliquely with respect to the ejection direction of the large number of droplets.

Impact Impact force measuring method according to the aspect of the first 5, in which the nozzles capable of discharging a plurality of droplets, the droplets ejected into the main surface of the substrate which is held horizontally to measure the impact force applied to the substrate In a force measuring method, a liquid receiving step in which a large number of droplets are received by a liquid receiving portion capable of receiving a large number of droplets ejected by the nozzle toward a large number of locations, and a liquid receiving portion in which the liquid receiving portion receives a large number of droplets. It includes a measurement step for measuring the total impact force received from the droplet. The impact force measuring method according to the fifteenth aspect is based on the correspondence information indicating the correspondence relationship between the sum of the impact forces and the average velocity of the large number of droplets, and is based on the sum of the impact forces measured in the measurement step. A calculation step for calculating the average velocity of the large number of droplets is further provided.

Impact force measuring method according to the aspect of the first 6 is an impact force measuring method according to the aspect of the first 5, wherein the calculating step is a step of calculating a temporal change in the average speed of the plurality of droplets is there.

Impact force measuring method according to the aspect of the first 7, a shock measuring method according to the first 5 or aspects of the first 6, wherein the correspondence information, each discharge hole diameter of the nozzle, or the large number of liquid It depends on the type of liquid in the drop.

Impact force measuring method according to the aspect of the first 8 is an impact force measuring method from the first 5 according to any one aspect of the first 7, wherein the liquid受Su step is, the liquid receiving portion in a plan view It is a step of receiving a large number of droplets ejected toward a large number of points in each region of the plurality of regions defined in the above by each region, and the measurement step is a step of receiving an impact force received by each region of the liquid receiving portion. It is a step of measuring the total, and the impact force measuring method further includes a calculation step of obtaining a horizontal distribution of the total of the impact forces received by each region.

Impact force measuring method according to the aspect of the first 9, piezoelectric an impact force measuring method from the first 5 according to any one aspect of the first 8, wherein the measuring step adjacent the bottom of the liquid receiving part This is a step of measuring the total impact force by the element.

Impact force measuring method according to a twentieth aspect is the impact force measurement method from the first 5 according to any one aspect of the first 9, wherein the liquid receiving step, the discharge direction of the plurality of droplets This is a step of receiving the large number of droplets by a flat inclined surface that is inclined obliquely.

The impact force measuring method according to the 21st aspect is the impact force measuring method according to the 14th aspect or the 20th aspect, and the inclination angle of the inclined surface is 5 degrees to 45 degrees with respect to the horizontal plane. ..

Impact force measuring method according to a second second aspect, there is provided a shock measuring method from the first 5 according to any one aspect of the first 9, wherein the liquid receiving portion, an inlet in which the number of droplets enter A tubular peripheral wall portion having an opening formed at one end and a large number of droplets that have entered the space surrounded by the peripheral wall portion from the entrance opening are received, and a liquid composed of the large number of the received droplets is applied. A container including a bottom wall portion that closes the opening at the other end of the peripheral wall portion so that the liquid can be stored in the space is provided, and the peripheral wall portion has a predetermined height from the bottom wall portion of the liquid in the space. A discharge port capable of discharging a liquid exceeding the above amount from the container is provided, and the liquid receiving step is a liquid composed of a large number of droplets entering the space surrounded by the peripheral wall portion from the inlet opening. This is a step of storing the remaining liquid in the container while discharging the liquid exceeding a predetermined height from the bottom wall portion to the outside of the container from the discharge port.
In the impact force measuring method according to the 23rd aspect, the impact force for measuring the impact force applied to the substrate by the nozzle capable of ejecting a large number of droplets onto the main surface of the substrate held horizontally. In the measuring method, a liquid receiving step in which a large number of droplets are received by a liquid receiving portion capable of receiving a large number of droplets ejected by the nozzle toward a large number of locations, and a liquid receiving portion in which the liquid receiving portion receives the large number of liquids. It includes a measurement step for measuring the total impact force received from the drop. The liquid receiving portion receives the tubular peripheral wall portion having an inlet opening for entering the large number of droplets at one end and the large number of droplets entering the space surrounded by the peripheral wall portion from the inlet opening. Along with this, a container including a bottom wall portion that closes the opening at the other end of the peripheral wall portion so that the received liquid composed of a large number of droplets can be stored in the space is provided, and the peripheral wall portion is provided with the space. A discharge port capable of discharging a liquid exceeding a predetermined height from the bottom wall portion among the liquids in the container is provided, and the liquid receiving step is surrounded by the peripheral wall portion from the inlet opening. In the step of storing the remaining liquid in the container while discharging the liquid exceeding a predetermined height from the bottom wall portion of the liquid composed of the large number of droplets that has entered the space to the outside of the container from the discharge port. is there.

Impact force measuring method according to a second fourth aspect is a impact force measuring method of the first 4 according to the second third or one embodiment, the measuring step, the water receiver from the plurality of droplets It is a step of measuring the total impact force received by the unit by the measuring unit, the liquid receiving unit is a thin plate in which a predetermined substrate is thinned, and the liquid receiving step is the step of measuring the liquid receiving step by one main surface of the thin plate. It is a step of receiving a large number of droplets, and the measurement step is a step of measuring the total impact force that the thin plate receives from the large number of droplets by a strain gauge attached to the other main surface of the thin plate.

The substrate processing method according to the aspect of the second 5, the first 4 to a substrate processing method comprising an impact force measuring method according to any one aspect of the second 4, while holding the substrate substantially in a horizontal attitude rotation A rotary step for discharging a large number of droplets to a large number of locations on the main surface of the substrate by a nozzle capable of ejecting a large number of droplets of the treatment liquid so as to hit a large number of locations on the object. The liquid receiving step is a step of receiving the large number of droplets discharged from the nozzle by the liquid receiving unit.

According to the invention according to the first aspect, the invention according to the second aspect, the invention according to the eleventh aspect, and the invention according to the twelfth aspect , the impact force measuring device ejects nozzles toward a large number of places. It is provided with a liquid receiving unit that receives a large number of droplets and a measuring unit that measures the total impact force that the liquid receiving unit receives from a large number of droplets. Therefore, since each impact force when each droplet hits the liquid receiving portion can be measured collectively, the impact force applied to the substrate by a large number of droplets can be easily measured.

According to the invention according to the second aspect, the calculation unit is based on the total impact force measured by the measurement unit based on the correspondence information indicating the correspondence relationship between the total impact force and the average velocity of a large number of droplets. The average velocity of a large number of droplets can be calculated.

According to the invention according to the third aspect, the calculation unit can calculate the time change of the average velocity of a large number of droplets.

According to the invention according to the fourth aspect, since the corresponding information differs depending on the discharge hole diameter of the nozzle or the liquid type of a large number of droplets, the average velocity of a large number of droplets is set to the discharge hole diameter of the nozzle. , Or depending on the type of liquid in a large number of droplets, it can be calculated more accurately.

According to the invention according to the fifth aspect, the calculation unit can obtain the horizontal distribution of the total sum of the impact forces received by each of the plurality of measurement units.

The invention according to the first aspect, according to the invention of the seventh aspect, the liquid receiving part comprises a flat inclined surface which is inclined obliquely relative to the direction of ejection of the plurality of droplets, a number of the inclined surfaces Receive droplets. As a result, it is possible to suppress fluctuations in the thickness of the liquid film formed on the inclined surface by a large number of ejected droplets. Therefore, it is possible to suppress fluctuations in the measurement result of the total impact force due to fluctuations in the thickness of the liquid film.

According to the invention according to the eleventh aspect, the liquid receiving portion includes a tubular peripheral wall portion having an inlet opening for a large number of droplets formed at one end and a bottom wall portion that closes the opening at the other end of the peripheral wall portion. A container containing, is provided. The peripheral wall portion is provided with a discharge port capable of discharging the liquid in the space surrounded by the peripheral wall portion, which exceeds a predetermined height from the bottom wall portion, from the container. This makes it possible to measure the total impact force received by the container from a large number of droplets through the liquid collected in the container while keeping the amount of the liquid accumulated in the container constant. Therefore, it is possible to suppress fluctuations in the measurement result of the total impact force due to fluctuations in the amount of the treatment liquid accumulated in the container.

According to the invention according to the first and second aspects, the shape and size of the portion including the liquid receiving portion and the measuring portion of the impact force measuring device can be made the same as the shape and size of a predetermined substrate. Therefore, the state in which the liquid receiving portion of the impact force measuring device receives the impact force from a large number of droplets is brought closer to the state in which the predetermined substrate receives the impact force from a large number of droplets, and the liquid receiving portion has a large number. The total impact force received from the droplets can be measured.

According to the present invention in accordance with aspects of the first 3, the substrate processing apparatus, Eki受of nozzles to strike the plurality of locations a first position capable of ejecting multiple droplets impact force measuring device in the main surface of the substrate The nozzle can be moved to and from a second position where the nozzle can eject a large number of droplets so as to hit a large number of locations in the section. Therefore, the total impact force received by the substrate from a large number of droplets can be measured without removing the nozzle from the substrate processing apparatus.

The invention according to an aspect of the first 4, the invention according to a fifteenth aspect of the invention according to the 23rd aspect of the impact force measuring method, the nozzle is subjected to a large number of droplets ejected toward the multiple locations It includes a liquid receiving step for receiving a large number of droplets by a liquid receiving unit capable of receiving the liquid, and a measuring step for measuring the total impact force received by the liquid receiving unit from the large number of droplets. Therefore, since each impact force when each droplet hits the liquid receiving portion can be measured collectively, the impact force applied to the substrate by a large number of droplets can be easily measured.

According to the invention according to the fifth aspect, the substrate processing method includes a discharge step of ejecting a large number of droplets from a nozzle to a large number of locations on the main surface of the substrate, and a liquid discharge of a large number of droplets discharged from the nozzle. It is provided with a liquid receiving step that is received by the receiving unit. Therefore, the total impact force received by the substrate from a large number of droplets can be measured without removing the nozzle from the substrate processing apparatus.

It is a side schematic diagram for demonstrating the structural example of the substrate processing apparatus which includes the impact force measuring apparatus which concerns on embodiment. It is a plane schematic diagram for demonstrating the structural example of the substrate processing apparatus of FIG. It is a figure which shows an example of the relationship between the ejection speed of a droplet and the measurement result of the impact force by the impact force measuring apparatus of FIG. It is an enlarged view of a part of the graph shown in FIG. It is a figure which shows an example of the relationship between the presence or absence of lack of a large number of droplets, and the measurement result of the impact force by the impact force measuring apparatus of FIG. FIG. 3 is a graph showing an example of the relationship between the ejection speed of droplets and the measurement result of the impact force by the impact force measuring device when the liquid receiving portion of the impact force measuring device of FIG. 1 is in the horizontal posture. It is a side schematic diagram for demonstrating another configuration example of the impact force measuring apparatus which concerns on embodiment. It is a plane schematic diagram for demonstrating another configuration example of the impact force measuring apparatus which concerns on embodiment. It is an enlarged view which shows a part of the side sectional view of the impact force measuring apparatus of FIG. It is a flowchart which shows an example of the operation of the substrate processing apparatus which concerns on embodiment. It is a flowchart which shows an example of the operation of the impact force measuring apparatus which concerns on embodiment. It is a flowchart which shows other example of the operation of the impact force measuring apparatus which concerns on embodiment.

Hereinafter, embodiments will be described with reference to the drawings. The following embodiments are examples that embody the present invention, and are not examples that limit the technical scope of the present invention. Further, in each figure referred to below, the dimensions and numbers of each part may be exaggerated or simplified for easy understanding. The vertical direction is the vertical direction, and the substrate side is above the spin chuck.

<1. Overall configuration of substrate processing device 1>
The configuration of the substrate processing apparatus 1 will be described with reference to FIGS. 1 and 2. 1 and 2 are diagrams for explaining the configuration of the substrate processing apparatus 1 according to the embodiment. The substrate processing device 1 includes the impact force measuring device 100 according to the embodiment. 1 and 2 are a schematic side view and a schematic plan view of the substrate processing device 1. In FIG. 2, among the components of the substrate processing device 1, the description of some components such as the control unit 130 and the shatterproof unit 4 is omitted.

In FIGS. 1 and 2, in a state where the nozzle 51 is arranged at the retracted position (“second position”), a large number of droplets L2 are placed on the main body 70 from above the main body 70 of the impact force measuring device 100. The state of discharging is shown. Further, in FIGS. 1 and 2, in a state where the nozzle 51 is arranged at a position above the center of the upper surface of the substrate 9, the spin chuck 21 rotates around the rotation axis a1 in a predetermined rotation direction (direction of arrow AR1). A state in which a large number of droplets L2 are ejected onto the main surface of the substrate 9 is shown by a virtual line. The nozzle 51 discharges a large number of droplets L2 of the treatment liquid L1 onto the upper surface which is the main surface of the substrate 9. When the nozzle 51 ejects the droplet L2 to the substrate 9, the nozzle moving mechanism 3 is usually between a position above the center of the upper surface of the substrate 9 and a position above the peripheral edge of the substrate 9. The nozzle 51 is scanned along the path T1. The main surface of the substrate 9 is not limited to the case where it is the upper surface of the substrate 9 held by the rotation holding mechanism 2, and may be the lower surface. When the main surface of the substrate 9 is the lower surface, the nozzle moving mechanism 3 follows a predetermined path between the position below the center of the lower surface of the substrate 9 and the position below the peripheral edge of the substrate 9. The nozzle 51 is scanned, and the nozzle 51 discharges the droplet L2 upward.

The surface shape of the substrate 9 is substantially circular. The loading / unloading of the substrate 9 into the substrate processing device 1 is performed by a robot or the like with the nozzle 51 arranged at the shelter position by the nozzle moving mechanism 3. The substrate 9 carried into the substrate processing device 1 is detachably held by the spin chuck 21.

The substrate processing device 1 includes a rotation holding mechanism 2, a nozzle moving mechanism 3, a scattering prevention unit 4, a processing unit 5, an impact force measuring device 100, and a control unit 130. Each of these units 2 to 5 is electrically connected to the control unit 130 and operates in response to an instruction from the control unit 130. The impact force measuring device 100 includes a main body 70. The main body 70 measures the total impact force received from the large number of droplets L2 when the nozzle 51 of the processing unit 5 ejects a large number of droplets L2 toward the main body 70. The main body 70 is electrically connected to the control 130, and the impact force measured by the main body 70 is supplied to the control 130 and processed by the control 130. The control unit 130 also operates as a calculation unit of the impact force measuring device 100.

<2. Configuration of each part of the substrate processing device 1>
<Rotation holding mechanism 2>
The rotation holding mechanism 2 is a mechanism capable of rotating the substrate 9 while holding the substrate 9 in a substantially horizontal posture with one main surface facing upward. The rotation holding mechanism 2 rotates the substrate 9 around the vertical rotation axis a1 passing through the center c1 of the main surface. When the nozzle 51 discharges the processing liquid L1, the rotation holding mechanism 2 rotates the substrate 9 at a rotation speed of, for example, 200 rpm to 400 rpm.

The rotation holding mechanism 2 includes a spin chuck (“holding member”, “board holding portion”) 21. The spin chuck 21 includes a spin base 21a, which is a disk-shaped member slightly larger than the substrate 9, and a plurality of chuck pins 21b provided in the peripheral portion of the spin base 21a. Three or more chuck pins 21b may be provided in order to securely hold the circular substrate 9, and the chuck pins 21b are arranged at equal angular intervals along the peripheral edge of the spin base 21a. Each chuck pin 21b has a substrate support portion that supports the peripheral edge portion of the substrate 9 from below, and a peripheral edge that presses the peripheral edge portion supported by the substrate support portion from the side toward the center side of the substrate 9 to hold the substrate 9. It has a holding part. Each chuck pin 21b is configured to be switchable between a pressing state in which the peripheral edge holding portion presses the peripheral edge portion of the substrate 9 and an open state in which the peripheral edge holding portion is separated from the peripheral edge portion.

When the substrate 9 is delivered to the spin base 21a, the substrate processing apparatus 1 releases a plurality of chuck pins 21b, and when the substrate 9 is treated with the processing liquid, a plurality of chuck pins 21b are released. The chuck pin 21b of is pressed. By setting the pressing state, the plurality of chuck pins 21b can grip the peripheral edge portion of the substrate 9 and hold the substrate 9 in a substantially horizontal posture at a predetermined distance from the spin base 21a. As a result, the substrate 9 is supported so that the rotation axis a1 passes through the center of the upper surface and the lower surface with its surface (pattern forming surface) facing upward and the lower surface facing downward. The operation of the chuck pin 21b is controlled by the control unit 130.

The spin base 21a is provided so that its upper surface is substantially horizontal and its central axis coincides with the rotation axis a1. A cylindrical rotating shaft portion 22 is connected to the lower surface of the spin base 21a. The rotating shaft portion 22 is arranged in a posture such that its axis is along the vertical direction. The axis of the rotating shaft portion 22 coincides with the rotating shaft a1. Further, a rotation drive unit (for example, a servomotor) 23 is connected to the rotation shaft unit 22. The rotation drive unit 23 rotationally drives the rotation shaft unit 22 around its axis. Therefore, the spin chuck 21 can rotate about the rotation shaft a1 together with the rotation shaft portion 22. The rotation drive unit 23 and the rotation shaft unit 22 are rotation mechanisms 231 that rotate the spin chuck 21 around the rotation shaft a1. The rotation holding mechanism 2 also includes a rotation mechanism 231. The rotary shaft portion 22 and the rotary drive portion 23 are housed in a tubular casing 24.

In this configuration, when the rotation drive unit 23 rotates the rotation shaft portion 22 while the spin chuck 21 sucks and holds the substrate 9, the spin chuck 21 is rotated around the axis along the vertical direction. As a result, the substrate 9 held on the spin chuck 21 is rotated in the direction of arrow AR1 about the vertical rotation axis a1 passing through the center c1 in the plane thereof. As the spin chuck 21, a vacuum chuck type spin chuck that attracts and holds the lower surface of the substrate 9 may be adopted.

<Nozzle movement mechanism 3>
The nozzle moving mechanism 3 includes an arm 35 extending substantially horizontally above the holding position of the substrate 9 by the rotation holding mechanism 2 and an arm moving mechanism 30 for moving the arm 35. The nozzle moving mechanism 3 has an impact (“first position”) above the center of the upper surface of the substrate 9 on which the nozzle 51 can eject a large number of droplets L2 so as to hit a large number of locations on the main surface of the substrate 9. The nozzle 51 moves the nozzle 51 to and from a retracted position (“second position”) where the nozzle 51 can eject a large number of droplets L2 so as to hit a large number of locations in the liquid receiving portion 71 of the force measuring device 100. When the main surface of the substrate 9 is the lower surface of the substrate 9, the first position is a position below the central portion of the lower surface of the substrate 9.

The arm moving mechanism 30 includes an arm support shaft 33 that supports one end of the arm 35 and extends in the vertical direction, and an elevating drive mechanism 31 and a rotation drive mechanism 32 coupled to the arm support shaft 33. .. A rod 36 extends downward from the other end (tip) of the arm 35. A nozzle 51 is attached to the tip of the rod 36. The arm moving mechanism 30 moves the nozzle 51 integrally with the arm 35 by moving the arm 35.

The elevating drive mechanism 31 is configured to be able to elevate the arm 35. By transmitting the driving force of the elevating drive mechanism 31 to the arm support shaft 33 to raise and lower the arm support shaft 33, the arm 35 and the nozzle 51 are integrally raised and lowered. The elevating drive mechanism 31 includes, for example, a servomotor and a ball screw that converts its rotation into a linear motion and transmits the rotation to the arm support shaft 33.

The rotation drive mechanism 32 transmits the driving force to the arm support shaft 33 to rotate the arm support shaft 33 about the rotation axis a3. The rotation axis a3 extends in the vertical direction along the arm support shaft 33. The arm 35 is configured to be rotatable along a horizontal plane about the rotation axis a3. Due to the rotation of the arm 35, the nozzle 51 rotates integrally with the arm 35 about the rotation axis a3. In FIG. 2, the nozzle 51 is moved from a position above the center of the upper surface of the substrate 9 along a substantially arcuate path T1 passing above the standby position of the nozzle 51 set outside the rotation range of the substrate 9. An example is shown. The main body 70 of the impact force measuring device 100 is provided outside the rotation range of the substrate 9. The rotation drive mechanism 32 includes, for example, a servomotor and a gear mechanism that transmits the rotation to the arm support shaft 33.

The nozzle moving mechanism 3 can move the nozzle 51 in a horizontal plane in a state where a large number of droplets L2 of the processing liquid L1 are discharged so that the nozzle 51 hits a large number of points on the upper surface of the substrate 9. As a result, the nozzle 51 processes the upper surface of the substrate 9.

In this way, the nozzle moving mechanism 3 can move the nozzle 51 up and down and also move it along the path T1 in the horizontal plane.

<Scattering prevention unit 4>
The scattering prevention unit 4 includes a splash guard (“cup”) 41 for suppressing scattering of the processing liquid L1 supplied to the substrate 9. The splash guard 41 is a tubular member whose upper end portion is reduced in diameter upward. The diameter of the upper end of the splash guard 41 is slightly larger than the diameter of the substrate 9 and the casing 24. The splash guard 41 is raised and lowered between an upper position where the upper end is located above the substrate 9 and a retracted position where the upper end is below the substrate 9 by an elevating mechanism (not shown). When the nozzle 51 discharges the treatment liquid L1 toward the upper surface of the substrate 9, the splash guard 41 is arranged at an upper position and receives the treatment liquid L1 discharged from the peripheral edge of the substrate 9 by the inner wall surface. The received treatment liquid L1 is collected in a specified container or the like via a drain pipe (not shown) provided below the splash guard 41.

<Processing unit 5>
The processing unit 5 processes the substrate 9 held on the spin chuck 21. Specifically, the processing unit 5 ejects a large number of droplets L2 of the processing liquid L1 from the nozzle 51 so as to hit a large number of locations on the upper surface of the substrate 9 held on the spin chuck 21. The processing unit 5 includes a nozzle 51, a processing liquid supply mechanism 55 that supplies the processing liquid L1 to the nozzle 51, and a voltage application mechanism 57.

The nozzle 51 uses a flow path 52 that leads to the inside of the treatment liquid L1 nozzle 51 supplied from the treatment liquid supply mechanism 55 and a treatment liquid L1 that communicates with the flow path 52 and is introduced into the flow path 52 as a large number of droplets. Includes a number of tubular outlets 53 for ejection. The flow path 52 is connected to the processing liquid supply mechanism 55 by a pipe 56 for supplying the processing liquid L1. Each discharge port 53 extends in the vertical direction. One end of the discharge port 53 opens to the lower end surface of the nozzle 51, and the other end communicates with the flow path 52.

The treatment liquid supply mechanism 55 supplies the treatment liquid L1 to the nozzle 51. Specifically, the treatment liquid supply mechanism 55 includes a treatment liquid supply source (not shown) communicating with the pipe 56 and an on-off valve (not shown) that controls the outflow of the treatment liquid L1 from the treatment liquid supply source to the pipe 56. And include. The opening and closing of the on-off valve is controlled by the control unit 130. When the on-off valve is opened, the processing liquid L1 is supplied from the processing liquid supply mechanism 55 to the pipe 56, and when the on-off valve is closed, the supply of the processing liquid L1 is stopped.

As the treatment liquid L1, for example, a cleaning liquid such as pure water (deionized water) carbonated water or hydrogen water is used. As the treatment liquid L1, a chemical solution such as SPM, SC-1, DHF, or SC-2 may be used.

The nozzle 51 also includes a piezoelectric element 54 arranged therein. The piezoelectric element 54 is connected to the voltage application mechanism 57 via the wiring 58. The voltage application mechanism 57 is, for example, a mechanism including an inverter. The voltage application mechanism 57 applies an AC voltage to the piezoelectric element 54. When an AC voltage is applied to the piezoelectric element 54, the piezoelectric element 54 vibrates at a frequency corresponding to the frequency of the applied AC voltage. By controlling the voltage application mechanism 57, the control unit 130 can change the frequency of the AC voltage applied to the piezoelectric element 54 to an arbitrary frequency (for example, several hundred KHz to several MHz).

When the voltage application mechanism 57 applies an AC voltage to the piezoelectric element 54 while the processing liquid supply mechanism 55 supplies the processing liquid L1 to the nozzle 51, the piezoelectric element 54 vibrates and the processing liquid L1 flows through the flow path 52. The vibration of the piezoelectric element 54 is applied to. The processing liquid L1 discharged from each discharge port 53 is divided by this vibration and discharged as droplets L2 from each discharge port 53. As a result, the nozzle 51 can simultaneously eject a large number of droplets L2 having a uniform particle size from a large number of ejection ports 53 at a uniform speed. The nozzle 51 can eject a large number of droplets L2 so as to hit a large number of locations on the substrate 9 (“object”).

The substrate processing device 1 may further include a nozzle that discharges pure water as a cover rinse onto the upper surface of the substrate 9 in parallel with the ejection of a large number of droplets L2 onto the upper surface of the substrate 9 by the nozzle 51.

<Impact force measuring device 100>
The impact force measuring device 100 includes a main body 70. The main body 70 includes a liquid receiving unit 71 and a measuring unit 72. The liquid receiving portion 71 is a flat plate-shaped member. The liquid receiving unit 71 receives a large number of droplets L2 ejected toward the large number of locations. The measuring unit 72 measures the total impact force received by the liquid receiving unit 71 from a large number of droplets L2. As the measuring unit 72, for example, a strain gauge type load cell or the like is adopted. The impact force received by the liquid receiving unit 71 is transmitted to the measuring unit 72, causing distortion in the measuring unit 72. The measuring unit 72 converts the distortion into an electric signal. The measurement result measured by the measuring unit 72 is supplied to the CPU 11 of the control unit 130 via a wiring (not shown). As the measuring unit 72, a piezoelectric element adjacent to the lower part of the liquid receiving unit 71 may be adopted.

In the example shown in FIG. 1, the liquid receiving unit 71 and the measuring unit 72 are attached to each other via the attachment member 73, for example, by screwing or the like. When the CPU 11 of the control unit 130 processes the measurement result output by the measurement unit 72 of the main body 70, the impact force measuring device 100 includes the control unit 130.

The CPU 11 of the control unit 130 calculates the average velocity of a large number of droplets L2 from the sum of the impact forces measured by the measurement unit 72, for example, based on the correspondence information 199. Correspondence information 199 is information showing the correspondence relationship between the total impact force and the average velocity of a large number of droplets L2. Correspondence information 199 is preset and stored in the storage device 14. The CPU 11 reads the correspondence information 199 from the storage device 14 when calculating the average velocity of a large number of droplets L2. Further, the CPU 11 can also calculate the time change of the average speed of a large number of droplets L2 by sequentially storing the calculated average speed in the RAM or the like. A plurality of corresponding information 199s different for each discharge hole diameter of the nozzle 51 or for each type of liquid of a large number of droplets L2 may be stored in the storage device 14. Further, the total impact force measured by the measuring unit 72, the average velocity of the large number of droplets L2, and the average impact force given by the large number of droplets L2 are obtained in advance from each other. It is stored in the storage device 14 as the correspondence information 199, and the CPU 11 not only calculates the average velocity of a large number of droplets L2 from the sum of the impact forces measured by the measuring unit 72, but also the average given by the large number of droplets L2. The impact force of may be calculated.

The liquid receiving portion 71 includes a flat inclined surface 71a that is inclined obliquely with respect to the ejection direction of a large number of droplets L2. The inclination angle of the inclined surface 71a is preferably set to, for example, 5 degrees to 45 degrees with respect to the horizontal plane. The impact force measuring device 100 receives a large number of droplets L2 by the inclined surface 71a. The liquid receiving portion 71 may be held in a horizontal position, and the impact force received by the liquid receiving portion 71 from a large number of droplets L2 may be measured.

<Control unit 130>
The substrate processing device 1 includes a control unit 130 for controlling each unit thereof. As the hardware configuration of the control unit 130, for example, the same configuration as that of a general computer can be adopted. That is, the control unit 130 is, for example, a CPU (“calculation unit”) 11 that performs various arithmetic processes, a ROM (not shown) that is a read-only memory that stores basic programs, and a readable / writable memory that stores various information. A storage device 14 such as a RAM (not shown), an input unit (not shown) that accepts an operator's input, a program PG corresponding to various processes, and a magnetic disk for storing correspondence information 199 described later is not used. It is configured by connecting to the bus line shown in the figure.

In the control unit 130, the CPU 11 as the main control unit performs arithmetic processing according to the procedure described in the program PG to control each part of the substrate processing device 1 or the measurement result of the main body 70 of the impact force measuring device 100. Various functional units that perform processing are realized.

Each part of the substrate processing device 1 such as the rotation holding mechanism 2, the nozzle moving mechanism 3, the scattering prevention unit 4, and the processing unit 5 operates according to the control of the control unit 130.

<3. Droplet L2 ejection velocity and impact force measurement results>
FIG. 3 is a graph showing an example of the relationship between the ejection speed of the droplet L2 ejected by the nozzle 51 and the measurement result of the impact force by the impact force measuring device 100. FIG. 4 is an enlarged view of a part of the graph shown in FIG.

FIG. 5 is a graph showing an example of the relationship between the presence or absence of a large number of droplets L2 missing and the measurement result of the impact force by the impact force measuring device 100.

FIG. 6 is a graph format showing an example of the relationship between the ejection speed of the droplet L2 and the measurement result of the impact force by the impact force measuring device 100 when the liquid receiving portion 71 of the impact force measuring device 100 is in the horizontal posture. It is a figure which shows.

The graphs of FIGS. 3 (4) and 6 show that the ejection speed of the droplet L2 ejected by the nozzle 51 is changed to a plurality of velocities, and at each velocity, the impact received by the liquid receiving portion 71 from a large number of droplets L2. The result of measuring the total force by the measuring unit 72 is shown.

As shown in FIGS. 3 and 4, when the measuring unit 72 has an inclined surface 71a and receives the droplet L2 on the inclined surface 71a, the sum of the impact forces received by the liquid receiving unit 71 from each droplet L2. The relationship between the droplet and the ejection speed is that as the ejection speed increases, the total impact force also increases. Further, as shown in FIG. 4, even when the discharge speed changes by only 1 m / s, the change can be measured as a difference in impact force. When the measurement experiments for obtaining the graphs of FIGS. 3 and 4 were repeated three times, the measurement accuracy of the impact force measured in each experiment was 0.5 mN or less.

Further, the graph of FIG. 5 shows a case where a part of the large number of droplets L2 ejected by the nozzle 51 is missing due to the clogging of a part of the large number of discharge ports 53 of the nozzle 51. The result of confirming whether or not the lack can be detected as the difference of the measured impact force is shown. At the time of the measurement, the measurement results are compared between when two or three droplets L2 are missing and when they are not missing. As shown in FIG. 5, even when two or three droplets out of a large number of droplets ejected at the same time are missing, it can be detected as a difference in impact force. From this, when the inclined surface 71a is adopted, the thickness of the liquid film formed by a large number of droplets L2 ejected on the inclined surface 71a becomes stable, and as a result, the ejection speed of the droplet L2 changes. It can be seen that can be accurately measured as a change in impact force.

The graph of FIG. 6 shows the measurement results of the ejection speed of the droplet L2 and the impact force received by the liquid receiving portion 71 when the liquid receiving portion 71 is in the horizontal posture as described above. As shown in FIG. 6, when the ejection speed of the droplet L2 is high, the change in the measured impact force with respect to the change in the ejection speed is unstable. This is due to the fact that the thickness of the liquid film formed by a large number of droplets L2 on the liquid receiving portion 71 in the water-based posture becomes unstable when the discharge speed becomes high. However, even when the liquid receiving portion 71 is in the horizontal posture, each impact force when each droplet L2 hits the liquid receiving portion 71 can be measured collectively, so that when a large number of droplets L2 hit the liquid receiving portion 71, it can be measured. The impact force received by the liquid receiving unit 71 can be easily measured. Therefore, even if the liquid receiving portion 71 is placed in a horizontal position, the usefulness of the present invention is not impaired.

<4. About other configuration examples of the impact force measuring device 100>
FIG. 7 is a schematic side view for explaining a configuration example of the main body 80 as another configuration example of the main body 70 of the impact force measuring device 100. FIG. 7 is also a diagram for explaining the operation of the main body 80. The main body 80 may be adopted instead of the main body 70 of the impact force measuring device 100.

The main body 80 includes a liquid receiving unit 81 and a measuring unit 82. The liquid receiving portion 81 is formed into a tubular peripheral wall portion 81a in which an inlet opening 81c into which a large number of droplets L2 enter is formed at one end, and a space (“accommodation space”) 89 surrounded by the peripheral wall portion 81a from the inlet opening 81c. A container containing a large number of contained droplets L2 and a bottom wall portion 81b that closes the opening at the other end of the peripheral wall portion 81a so that the liquid composed of the received large number of droplets L2 can be stored in the space 89. Be prepared. The peripheral wall portion 81a is provided with a discharge port 81d capable of discharging a liquid exceeding a predetermined height from the bottom wall portion 81b among the liquids in the space 89 from the container. The measuring unit 82 is, for example, a piezoelectric element adjacent to the lower part of the liquid receiving unit 81.

A pure water supply source 84 is communicated with the space 89 of the liquid receiving portion 81 via a pipe 85. An on-off valve 86 is provided in the middle of the path of the pipe 85. The opening / closing operation of the on-off valve 86 is controlled by the control unit 130. When the on-off valve 86 is opened, pure water is supplied to the space 89 from the pure water supply source 84. When the on-off valve 86 is closed, the supply of pure water to the space 89 is stopped.

A drain pipe 87 is connected to a portion of the peripheral wall portion 81a of the liquid receiving portion 81 between the inlet opening 81c and the bottom wall portion 81b to communicate with the space 89. The opening in the peripheral wall portion 81a of the drain pipe 87 is the discharge port 81d. An on-off valve 88 is provided in the middle of the path of the drain pipe 87. The opening / closing operation of the on-off valve 88 is controlled by the control unit 130.

When the on-off valve 88 is opened, among the liquids composed of a large number of droplets L2 accumulated in the space 89, the liquid having a height of the discharge port 81d, that is, a liquid exceeding a predetermined height from the bottom wall portion 81b is drained from the discharge port 81d. It is discharged to the outside through the pipe 87. When the on-off valve 88 is closed, the liquid accumulated in the space 89 is stored in the space 89 unless it overflows from the inlet opening 81c to the outside of the liquid receiving portion 81.

The operation of the main body 80 of the impact force measuring device 100 will be described below with reference to FIG. 7. The main body 80 is preferably installed at a retracted position of the nozzle 51. The on-off valve 88 is closed, and the space 89 of the liquid receiving portion 81 stores the pure water previously supplied from the pure water supply source 84 up to a position higher than the discharge port 81d of the drain pipe 87. The on-off valve 86 is also closed.

When the nozzle 51 is moved to the retracted position and the impact force received by the liquid receiving portion 81 by the large number of droplets L2 ejected by the nozzle 51 is not measured, the tip portion of the nozzle 51 is a space 89. Immerse in the pure water inside (step S201 in FIG. 7).

From this state, when the impact force received by the liquid receiving unit 81 is measured, the on-off valve 88 is opened. As a result, the pure water stored in the space 89 beyond the discharge port 81d is discharged from the drain pipe 87. As a result, the water level of the stored pure water drops to the height of the discharge port 81d (step S202).

Next, the nozzle 51 starts ejecting a large number of droplets L2 of the treatment liquid L1. Since the on-off valve 88 is open, the height of the liquid in the space 89 is maintained at the height of the discharge port 81d even while the nozzle 51 discharges a large number of droplets L2. When a large number of droplets L2 hit the surface of the liquid, the impact received by the liquid surface becomes vibration and reaches the bottom wall portion 81b, and the measuring portion 82 responds to the magnitude of vibration (magnitude of impact force). It is converted into an electric signal (step S203). The electric signal is supplied to the CPU 11 of the control unit 130 and used for processing by the CPU 11.

Since the height of the liquid level in the space 89 is maintained at the height of the discharge port 81d even during the measurement of the impact force, the measurement result of the impact force by the measuring unit 82 fluctuates due to the fluctuation of the liquid level. Can be suppressed. As the measuring unit 82, for example, a microphone may be adopted instead of the piezoelectric element. In this case, the microphone is held at a position facing the liquid surface in the space 89, and the output of the microphone is supplied to the control unit 130.

Further, as another method capable of maintaining the height of the liquid stored in the space 89 at a constant level, the liquid droplet L2 is discharged from the nozzle 51 with the on-off valves 86 and 88 closed, and the liquid in the space 89 is discharged. May start measuring the impact force received by the liquid receiving unit 81 after waiting for the liquid to overflow from the inlet opening 81c.

FIG. 8 is a schematic plan view for explaining a configuration example of the main body 90 as another configuration example of the main body 70 of the impact force measuring device 100. FIG. 9 is an enlarged view showing a part of a side sectional view of the main body 90 of the impact force measuring device 100. FIG. 8 shows a state before the liquid receiving portion 91 is joined onto the spacer 98. The main body 90 may be adopted instead of the main body 70 of the impact force measuring device 100.

The main body 90 includes a liquid receiving unit 91, a measuring unit 92, a spacer 98, and a base portion 94. The liquid receiving portion 91 is a thin plate-shaped member having a thin substrate. The base portion 94 is also a thin plate-shaped member in which a predetermined substrate is thinned. The spacer 98 is a thin plate-shaped circular member molded of resin or the like. The spacer 98 is provided with at least one (13 in the illustrated example) through holes that penetrate the spacer 98 from one main surface of the spacer 98 toward the other main surface. The diameters of the liquid receiving portion 91, the base portion 94, and the spacer 98 are the same.

The spacer 98 is attached to the base 94 by an adhesive or the like so that one main surface thereof contacts the one main surface of the base 94 so as to overlap the base 94 and the spacer 98. As a result, a recessed portion 94a surrounded by a part of one main surface of the base portion 94 and the inner peripheral wall 98a of the through hole of the spacer 98 is formed. The measuring unit 92 is provided so as to be housed in the recessed portion 94a.

The measuring unit 92 includes a strain gauge 95 and a memory 96 that can store the output of the strain gauge 95. These may be one chip. The measuring unit 92 also includes a cushioning material 97 that stabilizes the positions of the strain gauge 95 and the memory 96 and also functions as a spacer for bringing the strain gauge 95 into contact with the lower surface of the liquid receiving unit 91.

Specifically, the memory 96 and the cushioning material 97 are provided on one main surface of the base portion 94 forming the bottom surface of the recessed portion 94a. A strain gauge 95 is provided on the cushioning material 97, and another cushioning material 97 is provided on the cushioning material 97. The through hole of the spacer 98 is completely filled with the strain gauge 95, the memory 96, and the two cushioning materials 97. The height of the upper surface of the strain gauge 95 is set to be the same as or slightly higher than the other main surface (upper surface) of the spacer 98. An adhesive is applied to the other main surface of the spacer 98 in a state where the measuring portion 92 is provided in the recessed portion 94a of the spacer 98.

The liquid receiving portion 91 is placed on the other main surface of the spacer 98 coated with the adhesive so that the other main surface of the spacer 98 and one main surface of the base portion 94 overlap, and the liquid receiving portion 91 is joined to the spacer 98. .. The liquid receiving portion 91 contacts one main surface of the strain gauge 95 to close the recessed portion 94a, and is joined to the other main surface of the spacer 98 so as to overlap the base portion 94 with the spacer 98 and the measuring portion 92 sandwiched between them. To. The thickness D1 of the manufactured main body 90 is, for example, 775 μm, which is the thickness of the substrate 9 having a diameter of 300 mm.

The strain gauge 95 and the memory 96 are electrically connected, and the output signal of the strain gauge 95 is stored in the memory 96. Further, a terminal 99 is provided on the peripheral edge of the base 94 via a wiring extending from the memory 96. The terminal 99 can output the output of the distortion gauge 95 stored in the memory 96 to the outside.

The main body 90 may be installed and used at the retracted position of the nozzle 51 like the main bodies 70 and 80, but the main body 90 is held instead of the substrate 9 held by the spin chuck 21. In this state, the impact force received by the liquid receiving unit 91 may be measured. Further, instead of the strain gauge 95 of the measuring unit 92, a piezoelectric element adjacent to the lower part of the liquid receiving unit 91 may be adopted.

Further, as shown in FIGS. 8 and 9, when the main body 90 includes a plurality of measuring units 92 in a plan view, each of the plurality of measuring units 92 receives the liquid receiving unit 91. Measure the total impact force. Each of the measured measurement results is supplied to the CPU 11 of the control unit 130 from each terminal 99 corresponding to each measurement unit 92. At this time, each memory 96 can also supply the position information of each measurement unit 92 to the CPU 11 via each terminal 99. The CPU 11 can obtain the horizontal distribution of the total impact force received by each of the plurality of measurement units 92 based on the position information of the plurality of measurement units 92 and the total impact force received by the liquid receiving unit 91. ..

<Operation of board processing device 1>
FIG. 10 is a flowchart showing an example of the operation of the substrate processing device 1. In the flowchart of FIG. 10, in a state where the substrate 9 is not mounted on the spin chuck 21, the ejection state of the nozzle 51 is first confirmed, and then the substrate 9 is mounted on the spin chuck 21 to perform processing on the substrate 9. An example of the operation flow of the case is shown. The flowchart of FIG. 10 will be described below.

When the impact force is measured by the impact force measuring device 100, the nozzle moving mechanism 3 arranges the nozzle 51 above the liquid receiving portion 71 of the impact force measuring device 100 (step S10 in FIG. 10), and then, after that, The nozzle 51 discharges a large number of droplets L2 of the processing liquid L1 to the liquid receiving unit 71 (step S20). While the ejection of a large number of droplets L2 by the nozzle 51 is continued, the main body 70 of the impact force measuring device 100 performs a measurement process of the impact force received by the liquid receiving unit 71 (step S30). The measurement process will be described later with reference to FIGS. 11 and 12. When the measurement process in step S30 is completed, the nozzle 51 stops discharging a large number of droplets L2 of the processing liquid L1 (step S40), and a robot (not shown) rotates the unprocessed substrate 9 with the spin chuck of the rotation holding mechanism 2. It is transported to 21 and placed (step S50).

After that, the nozzle moving mechanism 3 arranges the nozzle 51 above the substrate 9 (step S60), and the rotation holding mechanism 2 starts the rotation of the spin chuck 21 to start the rotation of the substrate 9 (step S70). .. The processing unit 5 supplies the processing liquid L1 to the nozzle 51 and discharges a large number of droplets L2 from the nozzle 51 onto the upper surface of the substrate 9 (step S80). When the processing of the substrate 9 is completed, the processing unit 5 stops the ejection of the droplet L2 from the nozzle 51 (step S90), and the rotation holding mechanism 2 stops the rotation of the spin chuck 21 to rotate the substrate 9. Stop (step S100).

<Operation of impact force measuring device 100>
FIG. 11 is a flowchart showing an example of the operation of the impact force measurement process by the impact force measuring device 100. FIG. 12 is a flowchart showing another example of the operation of the impact force measuring device 100. The flowcharts of FIGS. 11 and 12 will be described below.

In the flowchart of FIG. 11, the impact force measuring device 100 receives a large number of droplets L2 ejected by the nozzle 51 by the liquid receiving unit 71 (step S101 of FIG. 11), and the measuring unit 72 receives the liquid receiving unit. The total impact force received by 71 from a large number of droplets L2 is measured (step S102). The measurement result is supplied to the CPU 11 of the control unit 130.

The CPU 11 reads out the correspondence information 199 indicating the correspondence relationship between the total impact force stored in the storage device 14 and the average velocity of a large number of droplets L2 from the storage device 14, and the measurement unit is based on the correspondence information 199. The average velocity of a large number of droplets L2 is calculated from the sum of the impact forces measured by 72 (step S103). For example, the CPU 11 determines whether or not a predetermined time has elapsed from the start of measurement (step S104), and as a result of the determination, if the predetermined time has not elapsed, the process is returned to step S101 to reduce the impact force. Repeat the measurement. As a result of the determination, if a predetermined time has elapsed, the CPU 11 calculates a temporal change in the average velocity of the droplet L2 based on each average velocity calculated sequentially in time (step S105).

The flowchart of FIG. 12 shows an example of operation when the impact force measuring device 100 includes a plurality of measuring units (measurement unit 92 and the like) like the main body 90 of the impact force measuring device 100.

In the flowchart of FIG. 12, the impact force measuring device 100 receives a large number of droplets L2 ejected by the nozzle 51 by the liquid receiving unit 91 of the main body 90 (step S110 of FIG. 12). Each of the plurality of measuring units 92 of the main body unit 90 measures the total impact force received by the liquid receiving unit 71 from a large number of droplets L2 (step S120). Each measurement result is supplied to the CPU 11 of the control unit 130 from each terminal 99 of the main body 90. At this time, the memory 96 of each measurement unit 92 also supplies the position information of the measurement unit 92 to the CPU 11.

The CPU 11 receives an impact from a large number of droplets L2 at the site of each measuring unit 92 based on the position information of each measuring unit 92 supplied and the impact force measured by each measuring unit 92. The horizontal distribution of the total force is calculated (step S130). The CPU 11 reads the correspondence information 199 from the storage device 14, and calculates the horizontal distribution of the average velocities of a large number of droplets L2 from the horizontal distribution of the total impact force measured by each measuring unit 92 based on the correspondence information 199. (Step S140).

According to the impact force measuring device according to the present embodiment configured as described above, the liquid receiving unit 71 that receives a large number of droplets L2 ejected toward a large number of locations and the liquid receiving unit 71 have a large number of liquids. A measuring unit 72 for measuring the total impact force received from the drop L2 is provided. Therefore, since each impact force when each droplet L2 hits the object can be measured collectively, the impact force received by the object when a large number of droplets L2 hit the object can be easily measured.

Further, according to the impact force measuring device according to the present embodiment, the CPU 11 is measured by the measuring unit 72 based on the correspondence information 199 indicating the correspondence relationship between the total impact force and the average velocity of a large number of droplets L2. The average velocity of a large number of droplets L2 can be calculated from the sum of the impact forces.

Further, according to the impact force measuring device according to the present embodiment, the CPU 11 can calculate the time change of the average velocity of a large number of droplets L2.

Further, according to the impact force measuring device according to the present embodiment, since the corresponding information 199 differs for each discharge hole diameter of the nozzle 51 or for each type of liquid of a large number of droplets L2, the average of a large number of droplets L2. The velocity can be calculated more accurately depending on the discharge hole diameter of the nozzle 51 or the type of liquid of a large number of droplets L2.

Further, according to the impact force measuring device according to the present embodiment, the CPU 11 can obtain the horizontal distribution of the total impact force received by each of the plurality of measuring units 92.

Further, according to the impact force measuring device according to the present embodiment, the liquid receiving portion 71 includes a flat inclined surface 71a that is inclined obliquely with respect to the ejection direction of a large number of droplets L2, and a large number of the inclined surfaces 71a are used. Receives droplet L2. As a result, it is possible to suppress fluctuations in the thickness of the liquid film formed on the inclined surface 71a by a large number of ejected droplets L2. Therefore, it is possible to suppress fluctuations in the measurement result of the total impact force due to fluctuations in the thickness of the liquid film.

Further, according to the impact force measuring device according to the present embodiment, the liquid receiving portion 81 includes a tubular peripheral wall portion 81a having an inlet opening 81c into which a large number of droplets L2 enter, and the peripheral wall portion 81a. A container including a bottom wall portion 81b that closes the opening at the end is provided. The peripheral wall portion 81a is provided with a discharge port 81d capable of discharging a liquid exceeding a predetermined height from the bottom wall portion 81b among the liquids in the space surrounded by the peripheral wall portion 81a from the container. This makes it possible to measure the total impact force received by the container from a large number of droplets L2 while keeping the amount of the treatment liquid accumulated in the container constant. Therefore, it is possible to suppress fluctuations in the measurement result of the total impact force due to fluctuations in the amount of the treatment liquid accumulated in the container.

Further, according to the impact force measuring device according to the present embodiment, the shape and size of the main body 90 including the liquid receiving unit 91 and the measuring unit 92 may be the same as the shape and size of the predetermined substrate 9. it can. Therefore, the state in which the liquid receiving portion 91 of the impact force measuring device receives the impact force from a large number of droplets L2 is brought closer to the state in which the predetermined substrate 9 receives the impact force from a large number of droplets L2, and the liquid is liquid. The total impact force received by the receiving unit 91 from a large number of droplets L2 can be measured.

Further, according to the substrate processing apparatus according to the present embodiment configured as described above, the first position where the nozzle 51 can eject a large number of droplets L2 so as to hit a large number of locations on the main surface of the substrate 9 and The nozzle 51 can move the nozzle 51 to and from a second position where the nozzle 51 can eject a large number of droplets L2 so as to hit a large number of locations in the liquid receiving portion 71 of the impact force measuring device. Therefore, the total impact force received by the substrate 9 from the large number of droplets L2 can be measured without removing the nozzle 51 from the substrate processing apparatus.

Further, according to the impact force measuring method according to the present embodiment as described above, a large number of droplets L2 are received by the liquid receiving unit 71 capable of receiving a large number of droplets L2 ejected toward a large number of locations. A liquid receiving step and a measuring step for measuring the total impact force received by the liquid receiving unit 71 from a large number of droplets L2 are provided. Therefore, since each impact force when each droplet L2 hits the object can be measured collectively, the impact force received by the object when a large number of droplets L2 hit the object can be easily measured.

Further, according to the substrate 9 processing method according to the present embodiment as described above, the ejection step of ejecting a large number of droplets L2 from the nozzle 51 to a large number of locations on the main surface of the substrate 9 and the ejection from the nozzle 51. It includes a liquid receiving step in which a large number of droplets L2 are received by the liquid receiving unit 71. Therefore, the total impact force received by the substrate 9 from the large number of droplets L2 can be measured without removing the nozzle 51 from the substrate processing apparatus.

Although the present invention has been shown and described in detail, the above description is exemplary and not limiting in all embodiments. Therefore, in the present invention, the embodiments can be appropriately modified or omitted within the scope of the invention.

1 Substrate processing device 100 Impact force measuring device 11 CPU
130 Control unit 14 Storage device 199 Correspondence information 2 Rotation holding mechanism 3 Nozzle movement mechanism 4 Scattering prevention unit 5 Processing unit 51 Nozzle 70, 80, 90 Main body unit 71, 81, 91 Liquid receiving unit 71a Inclined surface 72, 82, 92 Measurement Part 9 Substrate L1 Treatment liquid L2 Droplet T1 Path a1 Rotation axis a3 Rotation axis c1 Center

Claims (25)

A nozzle capable of ejecting a large number of droplets is an impact force measuring device for measuring the impact force applied to the substrate by the droplets ejected onto the main surface of the horizontally held substrate.
A liquid receiving part that receives a large number of droplets ejected by the nozzle toward a large number of locations,
A measuring unit that measures the total impact force that the liquid receiving unit receives from the large number of droplets,
Equipped with a,
The liquid receiving portion, wherein comprises a flat inclined surface which is inclined obliquely relative to the direction of ejection of the plurality of droplets, Ru receiving the plurality of droplets by the inclined surface, the impact force measuring device. A nozzle capable of ejecting a large number of droplets is an impact force measuring device for measuring the impact force applied to the substrate by the droplets ejected onto the main surface of the horizontally held substrate.
A liquid receiving part that receives a large number of droplets ejected by the nozzle toward a large number of locations,
A measuring unit that measures the total impact force that the liquid receiving unit receives from the large number of droplets,
With
The average velocity of the large number of droplets is calculated from the sum of the impact forces measured by the measuring unit based on the correspondence information indicating the correspondence relationship between the total impact force and the average velocity of the large number of droplets. Calculation unit,
An impact force measuring device further equipped with. The impact force measuring device according to claim 2.
The calculation unit is an impact force measuring device that calculates a time change in the average velocity of a large number of droplets. The impact force measuring device according to claim 2 or 3.
An impact force measuring device in which the corresponding information differs depending on the discharge hole diameter of the nozzle or the liquid type of a large number of droplets. The impact force measuring device according to any one of claims 2 to 4.
A plurality of the measuring units are arranged in a plan view.
Each of the plurality of measuring units measures the total of the impact forces,
The impact force measuring device is
An impact force measuring device further comprising a calculation unit for obtaining a horizontal distribution of the total sum of the impact forces received by each of the plurality of measuring units. The impact force measuring device according to any one of claims 2 to 5.
The measuring unit is an impact force measuring device which is a piezoelectric element adjacent to the lower part of the liquid receiving unit. The impact force measuring device according to any one of claims 2 to 6.
The liquid receiving portion is an impact force measuring device that includes a flat inclined surface that is inclined obliquely with respect to the ejection direction of the large number of droplets, and receives the large number of droplets by the inclined surface. The impact force measuring device according to claim 1 or 7.
An impact force measuring device in which the inclination angle of the inclined surface is 5 to 45 degrees with respect to a horizontal plane. The impact force measuring device according to any one of claims 2 to 6.
The liquid receiving part is
A tubular peripheral wall portion having an inlet opening into which a large number of droplets enter is formed at one end, and a large number of droplets that have entered the space surrounded by the peripheral wall portion from the entrance opening and received a large number of droplets. A container including a bottom wall portion that closes the opening at the other end of the peripheral wall portion so that a liquid composed of droplets can be stored in the space is provided.
An impact force measuring device, wherein the peripheral wall portion is provided with a discharge port capable of discharging a liquid having a height exceeding a predetermined height from the bottom wall portion among the liquids in the space from the container. The impact force measuring device according to any one of claims 1 to 8.
The base where the predetermined substrate is thinned, and
A thin plate-shaped spacer in which one main surface is attached to face one main surface of the base and a through hole is provided.
With more
The measuring unit
A strain gauge provided in a recess portion surrounded by a part of the one main surface of the base portion and an inner peripheral wall of the through hole of the spacer.
A memory provided in the recess and capable of storing the output of the strain gauge,
Including
The impact force measuring device is further provided with a terminal provided on the peripheral edge of the base portion and capable of outputting the output of the strain gauge stored in the memory to the outside.
The liquid receiving portion is a thin plate in which the substrate is thinned, and is joined to the other main surface of the spacer so as to come into contact with the strain gauge to close the recessed portion and overlap the base portion. Force measuring device. A nozzle capable of ejecting a large number of droplets is an impact force measuring device for measuring the impact force applied to the substrate by the droplets ejected onto the main surface of the horizontally held substrate.
A liquid receiving part that receives a large number of droplets ejected by the nozzle toward a large number of locations,
A measuring unit that measures the total impact force that the liquid receiving unit receives from the large number of droplets,
With
The liquid receiving part is
A tubular peripheral wall portion having an inlet opening into which a large number of droplets enter is formed at one end, and a large number of droplets that have entered the space surrounded by the peripheral wall portion from the entrance opening and received a large number of droplets. A container including a bottom wall portion that closes the opening at the other end of the peripheral wall portion so that a liquid composed of droplets can be stored in the space is provided.
An impact force measuring device, wherein the peripheral wall portion is provided with a discharge port capable of discharging a liquid having a height exceeding a predetermined height from the bottom wall portion among the liquids in the space from the container. A nozzle capable of ejecting a large number of droplets is an impact force measuring device for measuring the impact force applied to the substrate by the droplets ejected onto the main surface of the horizontally held substrate.
A liquid receiving part that receives a large number of droplets ejected by the nozzle toward a large number of locations,
A measuring unit that measures the total impact force that the liquid receiving unit receives from the large number of droplets,
With
The base where the predetermined substrate is thinned, and
A thin plate-shaped spacer in which one main surface is attached to face one main surface of the base and a through hole is provided.
With more
The measuring unit
A strain gauge provided in a recess portion surrounded by a part of the one main surface of the base portion and an inner peripheral wall of the through hole of the spacer.
A memory provided in the recess and capable of storing the output of the strain gauge,
Including
The impact force measuring device is further provided with a terminal provided on the peripheral edge of the base portion and capable of outputting the output of the strain gauge stored in the memory to the outside.
The liquid receiving portion is a thin plate in which the substrate is thinned, and is joined to the other main surface of the spacer so as to come into contact with the strain gauge to close the recessed portion and overlap the base portion. Force measuring device. An impact force measuring device according to any one of claims 1 2 to claims 1,
A rotation holding mechanism that can rotate while holding the board in a substantially horizontal position,
A nozzle that can eject a large number of droplets of the treatment liquid so that it hits a large number of parts of the object,
The first position where the nozzle can eject a large number of droplets so as to hit a large number of points on the main surface of the substrate, and a large number of the nozzles so as to hit a large number of points on the liquid receiving portion of the impact force measuring device. A nozzle moving mechanism that moves the nozzle to and from a second position where droplets can be ejected,
A board processing device. A nozzle capable of ejecting a large number of droplets is an impact force measuring method for measuring the impact force applied to the substrate by the droplets ejected onto the main surface of the horizontally held substrate.
A liquid receiving step in which a large number of droplets are received by a liquid receiving portion capable of receiving a large number of droplets ejected toward a large number of locations by the nozzle.
A measurement step for measuring the total impact force received by the liquid receiving unit from the large number of droplets,
Equipped with a,
The liquid receiving step is a flat inclined surface that is inclined obliquely with respect to the ejection direction of the large number of droplets.
Step der receiving said plurality of droplets by Ru, impact force measurement method. A nozzle capable of ejecting a large number of droplets is an impact force measuring method for measuring the impact force applied to the substrate by the droplets ejected onto the main surface of the horizontally held substrate.
A liquid receiving step in which a large number of droplets are received by a liquid receiving portion capable of receiving a large number of droplets ejected toward a large number of locations by the nozzle.
A measurement step for measuring the total impact force received by the liquid receiving unit from the large number of droplets,
With
Calculation to calculate the average velocity of the large number of droplets from the total impact force measured in the measurement step based on the correspondence information indicating the correspondence relationship between the total impact force and the average velocity of the large number of droplets. Step,
A method for measuring impact force. A shock force measuring method according to claim 1 5,
The calculation step is an impact force measuring method, which is a step of calculating a time change in the average velocity of a large number of droplets. The impact force measuring method according to claim 15 or 16 .
An impact force measuring method in which the corresponding information differs depending on the discharge hole diameter of the nozzle or the liquid type of the large number of droplets. A shock force measuring method according to claims 1 5 to any one of claims 1 7,
The liquid受Su step is a step of receiving a large number of liquid droplets ejected towards multiple locations in each region of the plurality of regions defined in the liquid receiving portion in plan view by each region,
The measurement step is a step of measuring the total impact force received by each region of the liquid receiving portion.
The impact force measurement method is
An impact force measuring method further comprising a calculation step for obtaining a horizontal distribution of the total sum of the impact forces received by each region. A shock force measuring method according to claims 1 5 to any one of claims 1 8,
The measurement step is a step of measuring the total impact force by a piezoelectric element adjacent to the lower portion of the liquid receiving portion, which is an impact force measuring method. A shock force measuring method according to claims 1 5 to any one of claims 1 9,
The liquid receiving step is a step of receiving a large number of droplets by a flat inclined surface that is inclined obliquely with respect to the ejection direction of the large number of droplets. The impact force measuring method according to claim 14 or 20 , wherein the impact force is measured.
An impact force measuring method in which the inclination angle of the inclined surface is 5 to 45 degrees with respect to a horizontal plane. A shock force measuring method according to claims 1 5 to any one of claims 1 9,
The liquid receiving part is
A tubular peripheral wall portion having an inlet opening for entering a large number of droplets is formed at one end, and the large number of droplets that have entered the space surrounded by the peripheral wall portion from the entrance opening are received and received. A container including a bottom wall portion that closes the opening at the other end of the peripheral wall portion so that the liquid composed of the droplets of the above can be stored in the space.
The peripheral wall portion is provided with a discharge port capable of discharging a liquid in the space exceeding a predetermined height from the bottom wall portion from the container.
In the liquid receiving step, among the liquids composed of a large number of droplets entering the space surrounded by the peripheral wall portion from the inlet opening, a liquid exceeding a predetermined height from the bottom wall portion is discharged from the discharge port. An impact force measuring method, which is a step of storing the remaining liquid in the container while discharging the liquid to the outside of the container. A nozzle capable of ejecting a large number of droplets is an impact force measuring method for measuring the impact force applied to the substrate by the droplets ejected onto the main surface of the horizontally held substrate.
A liquid receiving step in which a large number of droplets are received by a liquid receiving portion capable of receiving a large number of droplets ejected toward a large number of locations by the nozzle.
A measurement step for measuring the total impact force received by the liquid receiving unit from the large number of droplets,
With
The liquid receiving part is
A tubular peripheral wall portion having an inlet opening for entering a large number of droplets is formed at one end, and the large number of droplets that have entered the space surrounded by the peripheral wall portion from the entrance opening are received and received. A container including a bottom wall portion that closes the opening at the other end of the peripheral wall portion so that the liquid composed of the droplets of the above can be stored in the space.
The peripheral wall portion is provided with a discharge port capable of discharging a liquid in the space exceeding a predetermined height from the bottom wall portion from the container.
In the liquid receiving step, among the liquids composed of a large number of droplets entering the space surrounded by the peripheral wall portion from the inlet opening, a liquid exceeding a predetermined height from the bottom wall portion is discharged from the discharge port. An impact force measuring method, which is a step of storing the remaining liquid in the container while discharging the liquid to the outside of the container. A shock force measuring method according to claims 1 4 in any one of claims 2 3,
The measuring step is a step in which the measuring unit measures the total impact force received by the liquid receiving unit from the large number of droplets.
The liquid receiving portion is a thin plate in which a predetermined substrate is thinned.
The liquid receiving step is a step of receiving the large number of droplets by one main surface of the thin plate.
The measurement step is an impact force measuring method, which is a step of measuring the total impact force received by the thin plate from the large number of droplets by a strain gauge attached to the other main surface of the thin plate. The substrate processing method comprising an impact force measuring method according to claims 1 4 in any one of claims 2 4,
A rotation step that rotates the board while holding it in a substantially horizontal position,
A discharge step of ejecting a large number of droplets to a large number of locations on the main surface of the substrate by a nozzle capable of ejecting a large number of droplets of the treatment liquid so as to hit a large number of locations of the object.
With
The substrate processing method, wherein the liquid receiving step is a step of receiving the large number of droplets discharged from the nozzle by the liquid receiving unit.

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