JP6779375B2 - 低放射率(low−e)ガラスアニール装置 - Google Patents
低放射率(low−e)ガラスアニール装置 Download PDFInfo
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- JP6779375B2 JP6779375B2 JP2019518078A JP2019518078A JP6779375B2 JP 6779375 B2 JP6779375 B2 JP 6779375B2 JP 2019518078 A JP2019518078 A JP 2019518078A JP 2019518078 A JP2019518078 A JP 2019518078A JP 6779375 B2 JP6779375 B2 JP 6779375B2
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- Prior art keywords
- glass substrate
- low
- glass
- laser beam
- laser
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- 238000007507 annealing of glass Methods 0.000 title claims description 19
- 239000011521 glass Substances 0.000 claims description 155
- 239000000758 substrate Substances 0.000 claims description 128
- 239000011248 coating agent Substances 0.000 claims description 29
- 238000000576 coating method Methods 0.000 claims description 29
- 230000032258 transport Effects 0.000 claims description 20
- 230000001678 irradiating effect Effects 0.000 claims description 4
- 239000004615 ingredient Substances 0.000 claims description 2
- 239000010408 film Substances 0.000 description 49
- 229910052751 metal Inorganic materials 0.000 description 35
- 239000002184 metal Substances 0.000 description 35
- 238000010438 heat treatment Methods 0.000 description 15
- 238000000034 method Methods 0.000 description 13
- 238000004519 manufacturing process Methods 0.000 description 10
- 238000000137 annealing Methods 0.000 description 9
- 230000008859 change Effects 0.000 description 9
- 230000008569 process Effects 0.000 description 8
- 238000001816 cooling Methods 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 230000035939 shock Effects 0.000 description 6
- 230000005540 biological transmission Effects 0.000 description 5
- 238000012544 monitoring process Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 239000010410 layer Substances 0.000 description 4
- 238000012546 transfer Methods 0.000 description 4
- 230000008901 benefit Effects 0.000 description 3
- 239000005357 flat glass Substances 0.000 description 3
- 238000009434 installation Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000005224 laser annealing Methods 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 239000005344 low-emissivity glass Substances 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 238000005728 strengthening Methods 0.000 description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000004093 laser heating Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 239000005300 metallic glass Substances 0.000 description 1
- 230000000116 mitigating effect Effects 0.000 description 1
- 238000013021 overheating Methods 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000000197 pyrolysis Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000003507 refrigerant Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 239000005341 toughened glass Substances 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B25/00—Annealing glass products
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
- C03C23/0005—Other surface treatment of glass not in the form of fibres or filaments by irradiation
- C03C23/0025—Other surface treatment of glass not in the form of fibres or filaments by irradiation by a laser beam
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
- C03C23/007—Other surface treatment of glass not in the form of fibres or filaments by thermal treatment
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/32—After-treatment
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
Landscapes
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Geochemistry & Mineralogy (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Thermal Sciences (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
- Recrystallisation Techniques (AREA)
- Laser Beam Processing (AREA)
- Surface Treatment Of Glass (AREA)
Description
Claims (6)
- コーティング膜が形成されたガラス基板を搬送する搬送装置と、
前記搬送装置の経路上のある位置に設けられ、前記ガラス基板にレーザビームを前記ガラス基板と所定の角度で照射して、前記コーティング膜を安定したコーティング膜に変換させるレーザモジュールと、
レーザビームの照射方向において、前記ガラス基板にレーザビームが届く箇所の前方のガラス基板の上、下の位置に、レーザビームの反射光やレーザビームの透過光が反射できるように、且つ少なくとも一部の反射面が互いに対向するように設けられる反射鏡のペアと、を含むことを特徴とする低放射率(Low−E)ガラスアニール装置。 - 前記レーザモジュールは、前記ガラス基板と所定の角度で照射されるレーザビームの進行方向が、前記ガラス基板の搬送方向と反対方向の成分と、前記ガラス基板の表面に垂直な法線と反対方向の成分とを有するように構成され、
前記反射鏡は、前記ガラス基板と平行するか、または前記ガラス基板と所定の傾斜を形成するものであり、傾斜方向においては、前記反射鏡のペアから反射されて前記ガラス基板と接触する位置が、反射される前に前記ガラス基板と接触する位置に比べて、前記ガラス基板の進行方向を基準として後方であるように構成されて、後方で前記ガラス基板が予熱できるようになっていることを特徴とする請求項1に記載の低放射率(Low−E)ガラスアニール装置。 - 前記レーザビームは、前記ガラス基板に届いた状態で前記ガラス基板の表面に平行であり、前記ガラス基板の進行方向と垂直なラインビームであり、
前記ラインビームは、前記レーザモジュールを形成するために前記ラインビームと平行な幅方向に配列された複数の個別レーザヘッドのそれぞれから照射する単位ラインビームのうち、互いに隣接する単位ラインビームの前記幅方向の端部の互いに重なり合う部分の光強度またはエネルギー密度が、単位ラインビームの中央部の光強度またはエネルギー密度と同じレベルを有し、ラインビーム全体にわたって均一な光強度またはエネルギー密度を維持するように構成されることを特徴とする請求項1又は請求項2に記載の低放射率(Low−E)ガラスアニール装置。 - 前記個別レーザヘッドの前記幅方向の外側位置に対応する前記単位ラインビームの位置における光強度またはエネルギー密度が、前記個別レーザヘッドによる前記単位ラインビームの中央部位置における光強度またはエネルギー密度の約半分(50%)になるように構成されることを特徴とする請求項3に記載の低放射率(Low−E)ガラスアニール装置。
- 前記レーザモジュールは、レーザビームが照射される前記所定の角度を変えて調整することができ、
前記反射鏡のペアをなす反射鏡は、前記ガラス基板となす角度を変えて調整することができるように構成されることを特徴とする請求項1又は請求項2に記載の低放射率(Low−E)ガラスアニール装置。 - 前記ガラス基板に加わるレーザビームのパワー密度は、50W/mm2以上になるように構成されることを特徴とする請求項1又は請求項2に記載の低放射率(Low−E)ガラスアニール装置。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2018-0087470 | 2018-07-27 | ||
KR1020180087470A KR102061424B1 (ko) | 2018-07-27 | 2018-07-27 | 로이 유리 어닐링 장치 |
PCT/KR2018/010407 WO2020022551A1 (ko) | 2018-07-27 | 2018-09-06 | 로이 유리 어닐링 장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2020529377A JP2020529377A (ja) | 2020-10-08 |
JP6779375B2 true JP6779375B2 (ja) | 2020-11-04 |
Family
ID=69051572
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2019518078A Active JP6779375B2 (ja) | 2018-07-27 | 2018-09-06 | 低放射率(low−e)ガラスアニール装置 |
Country Status (7)
Country | Link |
---|---|
US (1) | US20210355017A1 (ja) |
EP (1) | EP3831790A4 (ja) |
JP (1) | JP6779375B2 (ja) |
KR (1) | KR102061424B1 (ja) |
CN (1) | CN111542504B (ja) |
TW (1) | TWI687376B (ja) |
WO (1) | WO2020022551A1 (ja) |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3897965B2 (ja) * | 1999-08-13 | 2007-03-28 | 株式会社半導体エネルギー研究所 | レーザー装置及びレーザーアニール方法 |
JP4748873B2 (ja) * | 2001-04-06 | 2011-08-17 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
WO2010033389A1 (en) * | 2008-09-17 | 2010-03-25 | Applied Materials, Inc. | Managing thermal budget in annealing of substrates |
FR2972447B1 (fr) * | 2011-03-08 | 2019-06-07 | Saint-Gobain Glass France | Procede d'obtention d'un substrat muni d'un revetement |
FR3001160B1 (fr) * | 2013-01-18 | 2016-05-27 | Saint Gobain | Procede d'obtention d'un substrat muni d'un revetement |
FR3002768B1 (fr) * | 2013-03-01 | 2015-02-20 | Saint Gobain | Procede de traitement thermique d'un revetement |
KR101617019B1 (ko) * | 2015-03-12 | 2016-04-29 | 주식회사 코윈디에스티 | 유리 기판 어닐링 장치 |
KR102006060B1 (ko) * | 2017-02-14 | 2019-09-25 | 주식회사 코윈디에스티 | 로이유리 열처리 방법 및 시스템 |
FR3070387A1 (fr) * | 2017-08-30 | 2019-03-01 | Saint-Gobain Glass France | Dispositif de traitement thermique ameliore |
-
2018
- 2018-07-27 KR KR1020180087470A patent/KR102061424B1/ko active IP Right Grant
- 2018-09-06 CN CN201880016398.4A patent/CN111542504B/zh active Active
- 2018-09-06 WO PCT/KR2018/010407 patent/WO2020022551A1/ko unknown
- 2018-09-06 EP EP18927455.8A patent/EP3831790A4/en not_active Withdrawn
- 2018-09-06 JP JP2019518078A patent/JP6779375B2/ja active Active
- 2018-09-06 US US16/493,097 patent/US20210355017A1/en not_active Abandoned
- 2018-10-19 TW TW107137031A patent/TWI687376B/zh active
Also Published As
Publication number | Publication date |
---|---|
US20210355017A1 (en) | 2021-11-18 |
JP2020529377A (ja) | 2020-10-08 |
EP3831790A1 (en) | 2021-06-09 |
EP3831790A4 (en) | 2022-06-01 |
WO2020022551A1 (ko) | 2020-01-30 |
CN111542504A (zh) | 2020-08-14 |
KR102061424B1 (ko) | 2019-12-31 |
TWI687376B (zh) | 2020-03-11 |
TW202007665A (zh) | 2020-02-16 |
CN111542504B (zh) | 2022-10-11 |
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