JP6775421B2 - 照明パターン形成を用いた計測光学系及び方法 - Google Patents

照明パターン形成を用いた計測光学系及び方法 Download PDF

Info

Publication number
JP6775421B2
JP6775421B2 JP2016557933A JP2016557933A JP6775421B2 JP 6775421 B2 JP6775421 B2 JP 6775421B2 JP 2016557933 A JP2016557933 A JP 2016557933A JP 2016557933 A JP2016557933 A JP 2016557933A JP 6775421 B2 JP6775421 B2 JP 6775421B2
Authority
JP
Japan
Prior art keywords
illumination
pattern
measurement
pixels
polarization
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2016557933A
Other languages
English (en)
Japanese (ja)
Other versions
JP2017516075A (ja
JP2017516075A5 (enExample
Inventor
アムノン マナッセン
アムノン マナッセン
アンディ ヒル
アンディ ヒル
アヴィ アブラモフ
アヴィ アブラモフ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KLA Corp
Original Assignee
KLA Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by KLA Corp filed Critical KLA Corp
Publication of JP2017516075A publication Critical patent/JP2017516075A/ja
Publication of JP2017516075A5 publication Critical patent/JP2017516075A5/ja
Application granted granted Critical
Publication of JP6775421B2 publication Critical patent/JP6775421B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/01—Arrangements or apparatus for facilitating the optical investigation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/0228—Control of working procedures; Failure detection; Spectral bandwidth calculation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02—Details
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02—Details
    • G01J3/0205—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
    • G01J3/0218—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows using optical fibers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02—Details
    • G01J3/0205—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
    • G01J3/0229—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows using masks, aperture plates, spatial light modulators or spatial filters, e.g. reflective filters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28—Investigating the spectrum
    • G01J3/2823—Imaging spectrometer
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G01N21/4785—Standardising light scatter apparatus; Standards therefor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N21/95623—Inspecting patterns on the surface of objects using a spatial filtering method
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02—Details
    • G01J3/0205—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
    • G01J3/021—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows using plane or convex mirrors, parallel phase plates, or particular reflectors
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G01N2021/8848—Polarisation of light
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/06—Illumination; Optics
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/12—Circuits of general importance; Signal processing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Health & Medical Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Signal Processing (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
JP2016557933A 2014-03-20 2015-03-20 照明パターン形成を用いた計測光学系及び方法 Active JP6775421B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201461955793P 2014-03-20 2014-03-20
US61/955,793 2014-03-20
PCT/US2015/021843 WO2015143378A1 (en) 2014-03-20 2015-03-20 Compressive sensing with illumination patterning

Publications (3)

Publication Number Publication Date
JP2017516075A JP2017516075A (ja) 2017-06-15
JP2017516075A5 JP2017516075A5 (enExample) 2018-04-26
JP6775421B2 true JP6775421B2 (ja) 2020-10-28

Family

ID=54145403

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016557933A Active JP6775421B2 (ja) 2014-03-20 2015-03-20 照明パターン形成を用いた計測光学系及び方法

Country Status (5)

Country Link
US (1) US9719940B2 (enExample)
JP (1) JP6775421B2 (enExample)
KR (1) KR102135999B1 (enExample)
CN (1) CN106104202B (enExample)
WO (1) WO2015143378A1 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9793178B2 (en) * 2014-08-28 2017-10-17 University Of Rochester Focused beam scatterometry apparatus and method
NL2017766A (en) 2015-12-09 2017-06-14 Asml Holding Nv A flexible illuminator
WO2017102327A1 (en) * 2015-12-17 2017-06-22 Asml Netherlands B.V. Polarization tuning in scatterometry
WO2017153130A1 (en) 2016-03-07 2017-09-14 Asml Netherlands B.V. Illumination system and metrology system
US10444161B2 (en) * 2017-04-05 2019-10-15 Kla-Tencor Corporation Systems and methods for metrology with layer-specific illumination spectra
WO2019086221A1 (en) * 2017-10-31 2019-05-09 Asml Netherlands B.V. Metrology apparatus, method of measuring a structure, device manufacturing method
EP3477392A1 (en) * 2017-10-31 2019-05-01 ASML Netherlands B.V. Metrology apparatus, method of measuring a structure, device manufacturing method
KR102429845B1 (ko) 2017-12-28 2022-08-04 에이에스엠엘 네델란즈 비.브이. 장치의 컴포넌트로부터 오염물 입자를 제거하는 장치 및 방법

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19835072A1 (de) * 1998-08-04 2000-02-10 Zeiss Carl Jena Gmbh Anordnung zur Beleuchtung und/oder Detektion in einem Mikroskop
JP2003161888A (ja) * 2001-11-26 2003-06-06 Inst Of Physical & Chemical Res 特定の波長で照明できる顕微鏡
US7580559B2 (en) * 2004-01-29 2009-08-25 Asml Holding N.V. System and method for calibrating a spatial light modulator
US7446877B2 (en) * 2004-08-27 2008-11-04 Bwt Property Inc. All-fiber spectroscopic optical sensor
US20060239336A1 (en) * 2005-04-21 2006-10-26 Baraniuk Richard G Method and Apparatus for Compressive Imaging Device
US7916284B2 (en) * 2006-07-18 2011-03-29 Asml Netherlands B.V. Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
US7580131B2 (en) * 2007-04-17 2009-08-25 Asml Netherlands B.V. Angularly resolved scatterometer and inspection method
NL1036123A1 (nl) * 2007-11-13 2009-05-14 Asml Netherlands Bv Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method.
ITFI20070260A1 (it) * 2007-11-21 2009-05-22 Light 4 Tech Firenze S R L Dispositivo per illuminare un oggetto con una sorgente di luce multispettrale e rivelare lo spettro della luce emessa.
DE112011100627T5 (de) * 2010-02-22 2013-04-18 William Marsh Rice University Verbesserte Pixelzahl in Detektoranordnungen unter Verwendung von komprimierterAbtastung
JP2011191199A (ja) * 2010-03-15 2011-09-29 Japan Science & Technology Agency 顕微鏡システム
US8917395B2 (en) * 2010-04-19 2014-12-23 Florida Atlantic University MEMS microdisplay optical imaging and sensor systems for underwater scattering environments
CN102759408B (zh) * 2011-04-25 2015-04-15 中国科学院空间科学与应用研究中心 一种单光子计数成像系统及其方法
US8681413B2 (en) * 2011-06-27 2014-03-25 Kla-Tencor Corporation Illumination control
CN104025257B (zh) * 2011-10-24 2017-09-19 株式会社尼康 照明光学系统、曝光装置及组件制造方法
WO2013181156A1 (en) * 2012-05-29 2013-12-05 Kla-Tencor Corporation Small spot size spectroscopic ellipsometer
US9341769B2 (en) 2012-12-17 2016-05-17 Kla-Tencor Corporation Spectral control system

Also Published As

Publication number Publication date
JP2017516075A (ja) 2017-06-15
US9719940B2 (en) 2017-08-01
WO2015143378A1 (en) 2015-09-24
CN106104202A (zh) 2016-11-09
US20160025646A1 (en) 2016-01-28
CN106104202B (zh) 2019-08-02
KR20160135769A (ko) 2016-11-28
KR102135999B1 (ko) 2020-07-21

Similar Documents

Publication Publication Date Title
JP6775421B2 (ja) 照明パターン形成を用いた計測光学系及び方法
US10401228B2 (en) Simultaneous capturing of overlay signals from multiple targets
KR102857289B1 (ko) 초분광 이미징을 사용하는 반도체 공정의 광학적 진단
CN101978247B (zh) 光电检测器和测量光的方法
KR102048793B1 (ko) 표면 컬러를 이용한 표면 토포그래피 간섭측정계
US20080144014A1 (en) Apparatus for wafer inspection
TW201921132A (zh) 使用多重參數組態之疊對度量
US20120085932A1 (en) Systems and methods for multispectral imaging
JP2017506531A (ja) カラー内視鏡検査のための装置および方法
JP6084620B2 (ja) 共焦点分光計および共焦点分光計における画像形成方法
US11531275B1 (en) Parallel scatterometry overlay metrology
CN114450575B (zh) 在扫描及静态模式中的敏感光学计量
JP2014532173A5 (enExample)
TW202235852A (zh) 利用短波紅外線波長之光學計量
TWI640764B (zh) 用於使用多個照明波長檢測樣本之系統及方法
JP4669889B2 (ja) 分光測色装置及び分光測色方法
TWI853816B (zh) 光學地量測與成像一量測物件的裝置與方法
KR102125483B1 (ko) 공초점 계측 장치
WO2017168477A1 (ja) 撮像装置および画像処理方法
JP2010127723A (ja) 形状測定装置
WO2018128146A1 (ja) 分光測定方法および分光測定装置
WO2017026296A1 (ja) 試料測定装置
KR101242929B1 (ko) 다파장 구별 촬영 장치

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20180315

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20180315

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20190226

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20190305

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20190603

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20190802

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20191217

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20200316

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20200908

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20201006

R150 Certificate of patent or registration of utility model

Ref document number: 6775421

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250