JP2017516075A5 - - Google Patents

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Publication number
JP2017516075A5
JP2017516075A5 JP2016557933A JP2016557933A JP2017516075A5 JP 2017516075 A5 JP2017516075 A5 JP 2017516075A5 JP 2016557933 A JP2016557933 A JP 2016557933A JP 2016557933 A JP2016557933 A JP 2016557933A JP 2017516075 A5 JP2017516075 A5 JP 2017516075A5
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JP
Japan
Prior art keywords
illumination
patterned
pupil plane
pattern
measurement target
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Application number
JP2016557933A
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English (en)
Japanese (ja)
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JP2017516075A (ja
JP6775421B2 (ja
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Priority claimed from PCT/US2015/021843 external-priority patent/WO2015143378A1/en
Publication of JP2017516075A publication Critical patent/JP2017516075A/ja
Publication of JP2017516075A5 publication Critical patent/JP2017516075A5/ja
Application granted granted Critical
Publication of JP6775421B2 publication Critical patent/JP6775421B2/ja
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JP2016557933A 2014-03-20 2015-03-20 照明パターン形成を用いた計測光学系及び方法 Active JP6775421B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201461955793P 2014-03-20 2014-03-20
US61/955,793 2014-03-20
PCT/US2015/021843 WO2015143378A1 (en) 2014-03-20 2015-03-20 Compressive sensing with illumination patterning

Publications (3)

Publication Number Publication Date
JP2017516075A JP2017516075A (ja) 2017-06-15
JP2017516075A5 true JP2017516075A5 (enExample) 2018-04-26
JP6775421B2 JP6775421B2 (ja) 2020-10-28

Family

ID=54145403

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016557933A Active JP6775421B2 (ja) 2014-03-20 2015-03-20 照明パターン形成を用いた計測光学系及び方法

Country Status (5)

Country Link
US (1) US9719940B2 (enExample)
JP (1) JP6775421B2 (enExample)
KR (1) KR102135999B1 (enExample)
CN (1) CN106104202B (enExample)
WO (1) WO2015143378A1 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9793178B2 (en) * 2014-08-28 2017-10-17 University Of Rochester Focused beam scatterometry apparatus and method
KR102128488B1 (ko) 2015-12-09 2020-07-01 에이에스엠엘 홀딩 엔.브이. 플렉시블 일루미네이터
KR20180095605A (ko) 2015-12-17 2018-08-27 에이에스엠엘 네델란즈 비.브이. 스캐터로메트리에서의 편광 튜닝
JP6731490B2 (ja) 2016-03-07 2020-07-29 エーエスエムエル ネザーランズ ビー．ブイ． 照明システムおよびメトロロジシステム
US10444161B2 (en) * 2017-04-05 2019-10-15 Kla-Tencor Corporation Systems and methods for metrology with layer-specific illumination spectra
CN111316168B (zh) * 2017-10-31 2022-04-01 Asml荷兰有限公司 量测设备、测量结构的方法、器件制造方法
EP3477392A1 (en) * 2017-10-31 2019-05-01 ASML Netherlands B.V. Metrology apparatus, method of measuring a structure, device manufacturing method
WO2019129456A1 (en) 2017-12-28 2019-07-04 Asml Netherlands B.V. Apparatus for and a method of removing contaminant particles from a component of an apparatus

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19835072A1 (de) * 1998-08-04 2000-02-10 Zeiss Carl Jena Gmbh Anordnung zur Beleuchtung und/oder Detektion in einem Mikroskop
JP2003161888A (ja) * 2001-11-26 2003-06-06 Inst Of Physical & Chemical Res 特定の波長で照明できる顕微鏡
US7580559B2 (en) * 2004-01-29 2009-08-25 Asml Holding N.V. System and method for calibrating a spatial light modulator
US7446877B2 (en) * 2004-08-27 2008-11-04 Bwt Property Inc. All-fiber spectroscopic optical sensor
EP1880524B1 (en) * 2005-04-21 2013-10-30 William Marsh Rice University Method and apparatus for compressive imaging device
US7916284B2 (en) * 2006-07-18 2011-03-29 Asml Netherlands B.V. Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
US7580131B2 (en) * 2007-04-17 2009-08-25 Asml Netherlands B.V. Angularly resolved scatterometer and inspection method
NL1036123A1 (nl) * 2007-11-13 2009-05-14 Asml Netherlands Bv Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method.
ITFI20070260A1 (it) * 2007-11-21 2009-05-22 Light 4 Tech Firenze S R L Dispositivo per illuminare un oggetto con una sorgente di luce multispettrale e rivelare lo spettro della luce emessa.
WO2011103601A2 (en) * 2010-02-22 2011-08-25 William Marsh Rice University Improved number of pixels in detector arrays using compressive sensing
JP2011191199A (ja) * 2010-03-15 2011-09-29 Japan Science & Technology Agency 顕微鏡システム
US8917395B2 (en) * 2010-04-19 2014-12-23 Florida Atlantic University MEMS microdisplay optical imaging and sensor systems for underwater scattering environments
CN102759408B (zh) * 2011-04-25 2015-04-15 中国科学院空间科学与应用研究中心 一种单光子计数成像系统及其方法
US8681413B2 (en) * 2011-06-27 2014-03-25 Kla-Tencor Corporation Illumination control
KR102170875B1 (ko) * 2011-10-24 2020-10-28 가부시키가이샤 니콘 조명 광학계, 노광 장치, 및 디바이스 제조 방법
US9952140B2 (en) * 2012-05-29 2018-04-24 Kla-Tencor Corporation Small spot size spectroscopic ellipsometer
US9341769B2 (en) * 2012-12-17 2016-05-17 Kla-Tencor Corporation Spectral control system

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