JP6694128B1 - チップパッケージ装置及びその位置合わせ圧接方法 - Google Patents
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- 238000000034 method Methods 0.000 title claims description 31
- 238000003466 welding Methods 0.000 title claims description 12
- 239000007791 liquid phase Substances 0.000 claims abstract description 46
- 239000000853 adhesive Substances 0.000 claims abstract description 38
- 230000001070 adhesive effect Effects 0.000 claims abstract description 37
- 238000004806 packaging method and process Methods 0.000 claims abstract description 26
- 238000003825 pressing Methods 0.000 claims abstract description 10
- 239000011248 coating agent Substances 0.000 claims description 15
- 238000000576 coating method Methods 0.000 claims description 15
- 238000005259 measurement Methods 0.000 abstract description 9
- 238000010586 diagram Methods 0.000 abstract description 2
- 239000007921 spray Substances 0.000 description 7
- 230000000694 effects Effects 0.000 description 4
- 239000000463 material Substances 0.000 description 3
- 241000207923 Lamiaceae Species 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012858 packaging process Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000009529 body temperature measurement Methods 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 239000002070 nanowire Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
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Abstract
Description
ることである。
ップと下チップ53、54との間に設置される分離可能なマスク55と、前記回転ステージ33に接続され且つ前記上圧接部材51の一側にある接着剤タンク56とを含み、このうち、前記接着剤タンク56内には、前記上チップ53と下チップ54とをパッケージするためのパッケージ用接着剤561が含まれている。
、前記第一のフォーカシングセンサー72、第二のフォーカシングセンサー73及び前記スライドステージ34に電気的に接続されているプロセッサー74とを含む。
3 主体ユニット
31 ステージ
311 水平軸
312 垂直軸
32 支持フレーム
33 回転ステージ
34 スライドステージ
5 パッケージユニット
51 上圧接部材
52 下圧接部材
53 上チップ
54 下チップ
55 マスク
551 本体
552 開口部
553 塗布通路
554 接続リブ
56 接着剤タンク
561 パッケージ用接着剤
7 位置合わせユニット
71 位置合わせセンサー
72 第一のフォーカシングセンサー
73 第二のフォーカシングセンサー
74 プロセッサー
Claims (10)
- 液相サンプルに対してパッケージを行うチップパッケージ装置であって、
水平軸と前記水平軸に直交する垂直軸が定義されているステージと、前記ステージの上に設置される支持フレームと、前記支持フレームに接続される回転ステージとを含む主体ユニットと、
前記回転ステージに接続される上圧接部材と、間隔を置いて前記上圧接部材と対向し且つ前記ステージの上に位置する下圧接部材と、前記上圧接部材の一端部に設置される分離可能な上チップと、前記下圧接部材の一端部に設置される分離可能な下チップと、前記上チップと下チップとの間に設置される分離可能なマスクとを含むパッケージユニットと、
前記上圧接部材の中央部と前記垂直軸との上に設置される位置合わせセンサーと、前記ステージと前記水平軸との上に設置される第一のフォーカシングセンサーとを有する位置合わせユニットとを含み、
前記垂直軸は、前記上圧接部材と下圧接部材との中央部に位置し、前記水平軸は前記下圧接部材の上方に位置し、
前記下圧接部材の上には前記下チップと前記マスクとを設置し、前記液相サンプルを前記マスクの中に設置し、且つパッケージ用接着剤を前記液相サンプルの外周に塗り、前記マスクを取り外した後、前記位置合わせセンサーと前記第一のフォーカシングセンサーとのそれぞれが前記下チップの位置を測定し、これにより、前記上チップと下チップとを位置合わせさせて圧接するチップパッケージ装置。 - 位置合わせユニットは、前記ステージと前記水平軸との上に設置される第二のフォーカシングセンサーを更に含み、且つ前記第一のフォーカシングセンサーと前記第二のフォーカシングセンサーとが90°になるように設置されている請求項1に記載のチップパッケージ装置。
- 前記主体ユニットは、前記上圧接部材に接続されるように前記回転ステージ上に設置されるスライドステージを更に含み、前記スライドステージの作動により前記上圧接部材を連動してX軸或いはY軸の方向に沿ってスライドさせ、前記位置合わせユニットは、前記位置合わせセンサーと、前記第一のフォーカシングセンサーと第二のフォーカシングセンサーと、前記スライドステージに電気的に接続されるプロセッサーとをさらに含み、前記位置合わせセンサーと前記第一のフォーカシングセンサーと第二のフォーカシングセンサーとのそれぞれが前記下チップの位置を測定するとき、前記位置合わせセンサーは位置信号を前記プロセッサーに送り、前記プロセッサーが前記位置信号に基づいて前記スライドステージの移動を行い、前記第一及び第二のフォーカシングセンサーのそれぞれは、映像信号を前記プロセッサーに送ってフォーカシング処理を行い、前記プロセッサーは、フォーカシング処理で得られる結果によって前記スライドステージの移動を制御し、これにより、前記上チップと下チップとを位置合わせさせて圧接する請求項2に記載のチップパッケージ装置。
- 前記マスクは、本体と、前記本体の上に開口する少なくとも一つの開口部と、間隔を置いて前記開口部を囲む塗布通路と、前記塗布通路と前記本体とに接続される少なくとも一つの接続リブとを含み、前記下圧接部材の上に前記下チップと前記マスクとを設置し、前記液相サンプルを前記開口部の中に位置し、前記パッケージ用接着剤を前記塗布通路の中に塗り、前記上チップを前記マスクの上方に圧接する請求項3に記載のチップパッケージ装置。
- 前記パッケージユニットは、前記回転ステージに接続され且つ前記上圧接部材の一側に設置される接着剤タンクを更に有し、前記接着剤タンク内に前記上チップと下チップとをパッケージするためのパッケージ用接着剤が含まれている請求項4に記載のチップパッケ
ージ装置。 - 液相サンプルをパッケージすることに適用する方法であって、
(A)下圧接部材の上に下チップとマスクとを設置する工程と、
(B)回転ステージを回転させて接着剤タンクを下圧接部材の上に位置させ、前記液相サンプルを前記マスクの開口部の中に設置し、パッケージ用接着剤を前記マスクの塗布通路に塗る工程と、
(C)前記マスクを取り外して前記回転ステージを回転させ、上圧接部材の上に上チップを設置し、前記上圧接部材を前記下圧接部材の上に位置させ、これにより、前記上チップと下チップとを位置合わせさせて圧接する工程とを含み、
前記位置合わせして圧接する工程において、位置合わせセンサーが前記下チップの位置を測定して位置信号をプロセッサーに送ることと、前記プロセッサーが前記位置信号に基づいてスライドステージの移動を制御することと、第一及び第二のフォーカシングセンサーのそれぞれが二方向に向けて前記下チップの位置を測定して映像信号を前記プロセッサーに送ってフォーカシング処理を行うことと、前記プロセッサーがフォーカシング処理で得られる結果によって前記スライドステージの移動を制御することとを含むチップパッケージ装置の位置合わせ圧接方法。 - 前記上チップと下チップとを圧接するための圧力は1KPAであり、圧接時間は10分未満であり、圧接の温度は100℃未満である請求項6に記載のチップパッケージ装置の位置合わせ圧接方法。
- 前記工程(C)において、前記上チップと下チップとの間にあるパッケージ用接着剤は、高さが1000μm〜1μm(Micrometer、μm)の範囲にあり、直径が1000μm〜10μmの範囲にあるパターンになり、且つその厚さの差の平均は50%以下である請求項7に記載のチップパッケージ装置の位置合わせ圧接方法。
- 前記工程(B)において、前記液相サンプルの粘度は100センチポアズ〜1000000センチポアズ(centi−poise、cp)の範囲にある請求項8に記載のチップパッケージ装置の位置合わせ圧接方法。
- 前記工程(B)において、予め前記液相サンプルを前記マスクの開口部の中に設置した後、前記パッケージ用接着剤を前記マスクにおける塗布通路に塗る請求項9に記載のチップパッケージ装置の位置合わせ圧接方法。
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