JP6643466B2 - マイクロリソグラフィ投影装置を動作させる方法およびそのような装置の照明システム - Google Patents

マイクロリソグラフィ投影装置を動作させる方法およびそのような装置の照明システム Download PDF

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JP6643466B2
JP6643466B2 JP2018515432A JP2018515432A JP6643466B2 JP 6643466 B2 JP6643466 B2 JP 6643466B2 JP 2018515432 A JP2018515432 A JP 2018515432A JP 2018515432 A JP2018515432 A JP 2018515432A JP 6643466 B2 JP6643466 B2 JP 6643466B2
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plane
light
mirror
field
mask
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JP2018531412A5 (https=
JP2018531412A6 (ja
JP2018531412A (ja
Inventor
マルクス デギュンター
マルクス デギュンター
ヨハネス アイゼンメンゲル
ヨハネス アイゼンメンゲル
シュテファニ ヒルト
シュテファニ ヒルト
トマス コルプ
トマス コルプ
フランク シュレゼナー
フランク シュレゼナー
マンフレート マウル
マンフレート マウル
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カール・ツァイス・エスエムティー・ゲーエムベーハー
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0037—Arrays characterized by the distribution or form of lenses
    • G02B3/0062—Stacked lens arrays, i.e. refractive surfaces arranged in at least two planes, without structurally separate optical elements in-between
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Microscoopes, Condenser (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Lenses (AREA)
JP2018515432A 2015-09-23 2015-09-23 マイクロリソグラフィ投影装置を動作させる方法およびそのような装置の照明システム Active JP6643466B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/EP2015/071826 WO2017050360A1 (en) 2015-09-23 2015-09-23 Method of operating a microlithographic projection apparatus and illuminations system of such an apparatus

Publications (4)

Publication Number Publication Date
JP2018531412A JP2018531412A (ja) 2018-10-25
JP2018531412A6 JP2018531412A6 (ja) 2018-12-13
JP2018531412A5 JP2018531412A5 (https=) 2019-10-17
JP6643466B2 true JP6643466B2 (ja) 2020-02-12

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US (1) US10444631B2 (https=)
JP (1) JP6643466B2 (https=)
WO (1) WO2017050360A1 (https=)

Cited By (1)

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TWI800188B (zh) * 2021-12-29 2023-04-21 群光電子股份有限公司 影像擷取裝置及方法

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EP3704545B1 (en) * 2017-10-31 2025-12-03 Lawrence Livermore National Security, LLC System and method for depth resolved parallel two-photon polymerization for scalable submicron additive manufacturing
CN111526979B (zh) 2017-12-29 2023-08-29 劳伦斯·利弗莫尔国家安全有限责任公司 用于亚微米增材制造的系统和方法
CN111107331A (zh) * 2018-10-29 2020-05-05 南昌欧菲生物识别技术有限公司 投影模组、成像装置及电子装置
KR102651647B1 (ko) * 2019-03-12 2024-03-26 루머스 리미티드 이미지 프로젝터
DE102019204165A1 (de) * 2019-03-26 2020-10-15 Carl Zeiss Smt Gmbh Optische anordnung und lithographieanlage
JP7544127B2 (ja) * 2020-08-18 2024-09-03 株式会社ニコン 露光装置、露光方法、およびデバイス製造方法
US11366307B2 (en) 2020-08-27 2022-06-21 Kla Corporation Programmable and reconfigurable mask with MEMS micro-mirror array for defect detection
CN117597629A (zh) * 2021-07-05 2024-02-23 株式会社尼康 曝光装置、曝光方法及平板显示器的制造方法
DE102022203369A1 (de) * 2022-04-05 2023-10-05 Carl Zeiss Smt Gmbh Anordnung, Verfahren und Computerprogrammprodukt zur Kalibrierung von Facettenspiegeln
DE102023127297B3 (de) * 2023-10-06 2025-03-20 Carl Zeiss Smt Gmbh Verfahren zum Betreiben einer mikrolithographischen Projektionsbelichtungsanlage, mikrolithographische Maske sowie Projektionsbelichtungsanlage

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Publication number Priority date Publication date Assignee Title
TWI800188B (zh) * 2021-12-29 2023-04-21 群光電子股份有限公司 影像擷取裝置及方法

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US10444631B2 (en) 2019-10-15
US20180217506A1 (en) 2018-08-02
WO2017050360A1 (en) 2017-03-30
JP2018531412A (ja) 2018-10-25

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