JP6627132B2 - 成膜装置および成膜方法 - Google Patents
成膜装置および成膜方法 Download PDFInfo
- Publication number
- JP6627132B2 JP6627132B2 JP2015128498A JP2015128498A JP6627132B2 JP 6627132 B2 JP6627132 B2 JP 6627132B2 JP 2015128498 A JP2015128498 A JP 2015128498A JP 2015128498 A JP2015128498 A JP 2015128498A JP 6627132 B2 JP6627132 B2 JP 6627132B2
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- Japan
- Prior art keywords
- mist
- substrate
- susceptor
- carrier gas
- film forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 0 *#CC(C1)C2C1CCCC2 Chemical compound *#CC(C1)C2C1CCCC2 0.000 description 1
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- Chemical Vapour Deposition (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015128498A JP6627132B2 (ja) | 2014-06-27 | 2015-06-26 | 成膜装置および成膜方法 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014132215 | 2014-06-27 | ||
| JP2014132215 | 2014-06-27 | ||
| JP2015128498A JP6627132B2 (ja) | 2014-06-27 | 2015-06-26 | 成膜装置および成膜方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016027635A JP2016027635A (ja) | 2016-02-18 |
| JP2016027635A5 JP2016027635A5 (https=) | 2018-08-09 |
| JP6627132B2 true JP6627132B2 (ja) | 2020-01-08 |
Family
ID=55352872
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015128498A Active JP6627132B2 (ja) | 2014-06-27 | 2015-06-26 | 成膜装置および成膜方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP6627132B2 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI911390B (zh) | 2021-03-02 | 2026-01-11 | 日商信越化學工業股份有限公司 | 製膜方法及製膜裝置 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61186288A (ja) * | 1985-02-14 | 1986-08-19 | Nec Corp | 炭化珪素化合物半導体の気相エピタキシヤル成長装置 |
| JPH02181938A (ja) * | 1989-01-07 | 1990-07-16 | Fujitsu Ltd | 気相エピタキシャル成長装置 |
| JPH03132014A (ja) * | 1989-10-18 | 1991-06-05 | Hitachi Ltd | Mocvd装置 |
| JPH03171718A (ja) * | 1989-11-30 | 1991-07-25 | Furukawa Electric Co Ltd:The | 気相成長装置 |
| JPH08288224A (ja) * | 1995-04-17 | 1996-11-01 | Furukawa Electric Co Ltd:The | 気相成長装置 |
| US6159287A (en) * | 1999-05-07 | 2000-12-12 | Cbl Technologies, Inc. | Truncated susceptor for vapor-phase deposition |
| WO2008121793A1 (en) * | 2007-03-30 | 2008-10-09 | The Penn State Research Foundation | Mist fabrication of quantum dot devices |
| JP5793732B2 (ja) * | 2011-07-27 | 2015-10-14 | 高知県公立大学法人 | ドーパントを添加した結晶性の高い導電性α型酸化ガリウム薄膜およびその生成方法 |
| JP5397794B1 (ja) * | 2013-06-04 | 2014-01-22 | Roca株式会社 | 酸化物結晶薄膜の製造方法 |
-
2015
- 2015-06-26 JP JP2015128498A patent/JP6627132B2/ja active Active
Also Published As
| Publication number | Publication date |
|---|---|
| JP2016027635A (ja) | 2016-02-18 |
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