JP6576019B2 - Transparent electrode film manufacturing method and laser processing machine - Google Patents

Description

  The present invention relates to a transparent electrode film mainly used for a capacitive touch sensor and a method for producing the transparent electrode film, and more particularly to a processing technique for a transparent electrode by laser patterning.

  In IT devices such as smartphones, touch sensors for combining these displays with input means are widely used. A typical touch sensor is a capacitive touch sensor, which mainly uses two transparent electrode films, and is formed by laminating transparent electrodes in stripes on each side so that they are orthogonal to each other via an insulating layer. Is done. In recent years, as a transparent electrode film for the touch sensor, a method of patterning a transparent electrode with a laser as shown in the cited document 1 has been attracting attention.

JP 2012-174578 A

  However, the transparent electrode of the transparent electrode film essentially has a low energy absorption rate of the laser. For this reason, it is necessary to increase the laser intensity when patterning the transparent electrode. However, the higher the laser intensity, the more the substrate film is affected by the heat from the laser, causing damage, deformation, It becomes easy to melt and discolor. As a result, distortion occurs and visibility and sensing performance deteriorate.

  Furthermore, in recent years, with the trend toward higher definition of displays such as LCDs in the market, there has been a demand for higher precision and higher definition for touch sensors attached to the display. For that purpose, it is necessary to form the transparent electrodes with high definition and to align the transparent electrodes for each base film with high precision, but the problem of the influence of heat by the laser becomes larger accordingly. ing.

  In the invention of Cited Document 1, a cyclic olefin copolymer polymer film composed of norbornene and ethylene is used, and among them, a film having a copolymerization ratio that increases heat resistance is used as a base film to solve the above problem. However, since the base film has a property that molding fluidity is poor and a gel is likely to be generated as compared with a conventional cyclic olefin-based film or the like, it has inevitably become a low-quality base film. Therefore, there is a problem that it cannot be applied to the transparent electrode film for touch sensors of high-grade IT equipment, which is highly demanded for precision and high definition.

  In view of the above problems, the present invention makes it possible to change the amount of energy of the laser beam according to the moving speed of the laser beam, etc., so that the conventional cyclic olefin film or polyester film is used as a base film. An object of the present invention is to provide a transparent electrode patterning method that can be applied.

  A first characteristic configuration of the present invention is a method for producing a transparent electrode film in which a transparent electrode is formed on a substrate film, and the transparent electrode is patterned by irradiating a transparent conductive film with a laser beam. A method for producing a transparent electrode film, wherein the transparent electrode is patterned by varying an energy amount of a laser beam according to a moving speed.

  A second characteristic configuration of the present invention is a method for producing a transparent electrode film in which a transparent electrode is formed on a base film, and a routing circuit is formed on an outer frame frame portion of the transparent electrode, wherein the routing circuit is A method for producing a transparent electrode film, wherein patterning is performed by irradiating a laser beam, the amount of energy of the laser beam is varied according to the moving speed of the laser beam, and the routing circuit is patterned.

  A third characteristic configuration of the present invention is a method for producing a transparent electrode film, wherein the moving speed of the laser beam and the amount of energy of the laser beam are in a substantially proportional relationship.

  A fourth characteristic configuration of the present invention is a method for producing a transparent electrode film, wherein the amount of energy of a laser beam is varied according to the moving speed of the laser beam by adjusting the processing width radius of the laser beam.

  A fifth characteristic configuration of the present invention is a control value commanded to a controller associated with a laser oscillator, a control value commanded to a laser intensity stabilizer, and an attenuator provided in an optical system interposed between the laser oscillator and the processing nozzle. By adjusting one of the control values to be commanded, the amount of energy of the laser beam is varied in accordance with the moving speed of the laser beam.

  A sixth characteristic configuration of the present invention is a laser processing machine used in the method for producing a transparent electrode film, wherein the laser beam moving means is a processing nozzle movement or a galvano scanner.

  A seventh characteristic configuration of the present invention is a transparent electrode film produced by the method for producing a transparent electrode film, wherein the transparent electrode contains a transparent conductive film made of a metal oxide, and contains a conductive fiber of ultrafine wire It is a transparent electrode film comprised from either a conductive film, the transparent conductive film which consists of a thin line of a grade which cannot be visually confirmed, and the transparent conductive film which consists of organic substance.

  According to the first characteristic configuration of the present invention, the transparent electrode film manufacturing method of the present invention is characterized in that the amount of energy of the laser beam is varied according to the moving speed of the laser beam and the transparent electrode is patterned. Therefore, even if the moving speed of the laser beam changes during patterning, the amount of energy of the laser beam applied to the substrate film can be kept appropriate, so that it is hardly affected by the heat of the laser beam and the conventional substrate. The transparent electrode of the transparent electrode film made of a film also has an effect of enabling patterning with a laser.

  According to the second characteristic configuration of the present invention, a transparent electrode film is formed on a base film, and a routing circuit is formed on an outer frame frame portion of the transparent electrode. Is patterned by irradiating with a laser beam, and the amount of energy of the laser beam is varied according to the moving speed of the laser beam to pattern the routing circuit. Therefore, even if the moving speed of the laser beam changes during patterning, the amount of energy of the laser beam applied to the base film can be kept appropriate, so that it is hardly affected by the heat of the laser beam, and the high definition by the laser beam is high. Therefore, there is an effect that the patterning of the routing circuit can be performed with high productivity.

  According to a third characteristic configuration of the present invention, the moving speed of the laser beam and the energy amount of the laser beam are in a substantially proportional relationship. Therefore, it is possible to prevent the substrate sheet from being damaged or deformed by heat, which is likely to occur when the moving speed of the laser irradiator is slow, and to prevent defective patterning of the transparent electrode that is likely to occur when the moving speed of the laser irradiator is fast.

  According to the fourth characteristic configuration of the present invention, the transparent electrode film manufacturing method of the present invention includes a control value commanded to a controller associated with a laser oscillator, a control value commanded to a laser intensity stabilizer, a laser oscillator and a processing nozzle. The amount of energy of the laser beam can be varied according to the moving speed of the laser beam by adjusting one of the control values commanded to the attenuator provided in the optical system interposed therebetween. Therefore, as long as a predetermined appropriate control value is set, the amount of energy of the laser beam can be varied according to the moving speed of the laser beam, so that there is an effect that patterning by laser can be easily performed.

  According to the fifth characteristic configuration of the present invention, the transparent electrode film manufacturing method of the present invention is such that the amount of energy of the laser beam can be varied according to the moving speed of the laser beam by adjusting the processing width radius of the laser beam. Features. Accordingly, as long as the processing width radius of the laser beam is adjusted to an appropriate value, the amount of energy of the laser beam can be varied according to the moving speed of the laser beam.

  According to a sixth characteristic configuration of the present invention, the laser processing machine of the present invention is a laser processing machine used in the method for manufacturing the transparent electrode film, wherein the laser beam moving means is a processing nozzle movement or a galvano scanner. Features. Therefore, it is possible to move in the two-dimensional direction, and it is also possible to control and vary the moving speed with high accuracy, so that the moving speed of the laser beam and the amount of energy of the laser beam have a substantially proportional relationship. There is an effect that can be easily done.

  According to the seventh characteristic configuration of the present invention, the transparent electrode film of the present invention is a transparent electrode film of the present invention, which is a transparent electrode film manufactured by the method for manufacturing a transparent electrode film, and the transparent electrode is metal-oxidized. It is comprised from the transparent conductive film which consists of a thing, the transparent conductive film which contained the conductor fiber of extra fine wire, the transparent conductive film which consists of a thin line of the grade which cannot be visually confirmed, and the transparent conductive film which consists of organic substance. Therefore, there is an effect that a transparent electrode film made of a high-definition transparent electrode and excellent in sensing sensitivity can be obtained.

  Hereinafter, an embodiment of a manufacturing method of a transparent electrode film concerning the present invention is described based on a drawing. In the transparent electrode film 100 of the present invention, a transparent electrode 20 is formed on a substrate film 10, and the transparent electrode 20 is patterned by irradiating a transparent conductive film 21 with a laser beam 1 (FIG. 1). The amount of energy of the laser beam 1 is varied according to the moving speed (FIGS. 2 and 3).

  The base film 10 may be a film of a conventionally used material, such as a thermoplastic resin, a curable resin that is cured by heat, ultraviolet rays, an electron beam, radiation, or the like, or a material such as glass, ceramics, or an inorganic material. Become. Examples of thermoplastic resins include olefin resins such as polyethylene, polypropylene, and cyclic polyolefin, vinyl resins such as polyvinyl chloride, polymethyl methacrylate, and polystyrene, cellulose resins such as nitrocellulose and triacetyl cellulose, polycarbonate, polyethylene terephthalate, and poly Examples thereof include ester resins such as dimethylcyclohexane terephthalate and aromatic polyester, ABS resins, copolymer resins of these resins, and mixed resins of these resins. Examples of the curable resin include an epoxy resin and a polyimide resin. These resins and the like may be a single material, or may be an alloy or a multilayer product.

  Moreover, there is no restriction | limiting in particular in the thickness of the base film 10, It is good to set suitably. A preferred thickness is 0.15 to 0.3 mm. This is because if the thickness is less than 0.15 mm, the rigidity is insufficient and the processing is difficult, and if the thickness is more than 0.3 mm, the weight becomes heavy and bulky. Examples of the method for producing the base film 10 include a normal extrusion method, a melt extrusion method, a calendar method, and a casting method.

  Moreover, the base film 10 may be a polarizing film such as a linearly polarizing film or a retardation film. As an example of a polarizing film, the film which made the polyvinyl alcohol layer of a core material adsorb | suck iodine etc., the acetylcellulose layer was formed in the both surfaces, and processed, such as antifouling and light leakage suppression, is mentioned.

  The transparent electrode 20 is formed by irradiating the transparent conductive film 21 with the laser beam 1 and ablating the unnecessary transparent conductive film 21 (a phenomenon in which the material of the film receiving the energy of the laser beam rapidly evaporates) (FIG. 1). ). As the transparent conductive film 21, a transparent conductive film made of a metal oxide, a transparent conductive film containing ultrafine conductor fibers, a transparent conductive film made of fine lines that cannot be visually confirmed, a transparent conductive film made of organic matter, and a transparent conductive film Examples include membranes.

  Examples of the transparent conductive film 21 made of a metal oxide include a transparent conductive film made of tin oxide, indium oxide, antimony oxide, zinc oxide, cadmium oxide, indium tin oxide (ITO), or the like. Examples of the film forming method include various sputtering methods such as a DC magnetron sputtering method, an RF sputtering method, and a pulse sputtering method, as well as a vacuum deposition method, an ion plating method, and a plating method. Alternatively, it may be formed by dissolving or dispersing in a solvent to form a liquid state, spraying or dip coating, and then dispersing the solvent. The thickness is preferably about 10 to 800 nm.

  Examples of the transparent conductive film 21 containing ultrafine conductor fibers include metal nanowires made of copper, platinum, gold, silver, nickel, etc., silicon nanowires, and transparent conductive films containing carbon nanotubes. From the viewpoint of optical properties and electrical properties, the diameter of the conductor wire of the ultrafine wire is preferably 0.3 to 100 nm, and the length is preferably about 1 to 100 μm. The two-dimensional network is dispersed and connected in a binder. Conductivity is exhibited by being formed on the formed film.

  As a method for forming the transparent conductive film 21 containing ultrafine conductor fibers, the ink is dispersed in an appropriate binder, and is then used for general-purpose printing and painting such as screen printing, offset printing, gravure printing, flexographic printing, The method of forming with various coaters is mentioned. Examples of the binder include transparent thermoplastic resins such as polyester, polyvinyl chloride, and acrylic, and transparent curable resins that are cured by heat and ionizing radiation, such as urethane acrylate and epoxy. The thickness is preferably about 0.5 to 20 μm.

  As an example of the transparent conductive film 21 made of fine lines that cannot be visually confirmed, a conductive metal such as silver, copper, palladium, etc. is formed with a line width of about 0.5 to 7 μm and an aperture ratio (a pattern of conductive metal per unit area is formed). A transparent conductive film patterned in a lattice shape or a honeycomb shape of 90.0 to 99.9%. Examples of the film forming method include an electrolytic or electroless plating method, a vacuum deposition method, a diffusion transfer method, and the like. The thickness is preferably about 0.5 to 30 μm.

  Examples of the transparent conductive film 21 made of an organic material include a thiophene-based conductive polymer such as PEDOT (polyethylenedioxythiophene), a transparent conductive film made of graphene, and the like. Examples of the method for forming a transparent conductive film made of a thiophene-based conductive polymer include the above-mentioned general-purpose printing, coating, and various coater forming methods, and the thickness is preferably about 1 to 30 μm. As a method for forming a transparent conductive film made of graphene, it is preferable to form a thin film with a thickness of 0.5 to 100 nm by a CVD method or a plasma CVD method.

  Further, the transparent electrode film 100 of the present invention may be provided with a routing circuit 25 around the outer frame frame portion of the transparent electrode 20. The routing circuit 25 is a circuit layer for transmitting the electrical signal sensed by the transparent electrode 20 to the integrated circuit chip or an external control circuit at high speed, and has higher conductivity than the transparent electrode 20 because of the necessity for transmitting at high speed. It is made of a material and pattern. The patterning of the routing circuit 25 can also be performed by a method of ablating unnecessary portions by irradiating the laser beam 1 in the same manner as the patterning of the transparent electrode 20.

  However, the wider the circuit width of the routing circuit 25 is, the better it is because of the necessity of high conductivity. However, the wider the wider the wider the width of the outer frame frame portion, and as a result, the central portion surrounded by the outer frame frame portion. The display screen becomes smaller. Therefore, in order to widen the circuit width of the routing circuit 25 while maintaining the width of the outer frame frame portion, it is necessary to finish the wiring circuit 25 in a high-definition pattern with the smallest possible line width. However, in the conventional patterning method using laser, when patterning is performed with high productivity, there arises a problem that the base film 10 near the corner 70 of the outer frame frame portion is deformed and discolored due to the heat of the laser beam.

  That is, when patterning the routing circuit 25 with a laser with high productivity, the laser beam is moved at a high speed on the edge 71 of the outer frame frame portion in the X direction, and a portion 72 as close as possible to the corner of the outer frame frame portion in the X direction. The movement speed is maintained until the corner 72 of the outer frame frame portion in the X direction is near the corner 72 of the outer frame frame portion to the corner 70 of the outer frame frame portion. Once stopped, the moving speed of the laser beam is rapidly increased from the corner 70 of the outer frame frame portion to the location 73 near the corner of the outer frame frame portion in the Y direction, and the location near the corner of the outer frame frame portion in the Y direction. The side 74 of the outer frame frame portion in the Y direction from 73 must adopt a method of moving the laser beam again at high speed (FIG. 5).

  However, in conventional laser patterning, the amount of energy is not controlled to be sufficiently variable according to the moving speed, so the moving speed of the laser beam rapidly decreases, stops, and the moving speed of the laser beam increases. In this process, an excessive amount of energy of the laser beam is applied to the base film 10. That is, the most excessive amount of energy of the laser beam is applied to the base film 10 at the corner 70 of the outer frame frame portion, and the base film 10 near the corner 70 of the outer frame frame portion is deformed by the influence of the heat of the laser beam.・ The problem of discoloration occurs. This problem increases as the routing circuit 25 is patterned with high productivity and high definition.

  In that respect, as shown in FIGS. 2 and 3 of the present invention to be described later, from the position 72 near the corner of the outer frame frame portion in the X direction to the corner 70 of the outer frame frame portion, the movement speed of the laser beam 1 is reduced. The amount of energy of the laser beam 1 decreases in proportion, and the amount of energy of the laser beam 1 becomes almost zero at the corner 70 of the outer frame frame, and the corner 70 of the outer frame frame extends from the corner 70 of the outer frame to the corner of the outer frame frame in the Y direction. If the energy amount of the laser beam 1 is increased substantially in proportion to the increase in the moving speed of the laser beam 1 up to the near point 73, the routing circuit 25 can be patterned with high productivity and high definition without causing the above problem. There is an effect that can be.

  Examples of the routing circuit 25 include conductive metal circuits such as gold, silver, copper, aluminum, nickel, and palladium, and conductive ink circuits containing the conductive metal. The conductive metal circuit is preferably formed with a thickness of about 0.1 to 50 μm by a method such as plating, vapor deposition, sputtering, or ion plating. Conductive ink circuits are made by dispersing the conductive metal particles in various resin binders such as acrylic, urethane, polyester, and cellulose, and using general-purpose printing techniques such as gravure, offset, and screen, painting, and coating with various coaters. It is good to form with thickness about 0.5-100 micrometers.

  Examples of the laser beam 1 suitable for irradiation of the transparent conductive film 21 and the routing circuit 25 include a near infrared laser with a wavelength of 1064 nm, a green laser with a wavelength of 532 nm, and an ultraviolet laser with a wavelength of 355 nm. In particular, a pulsed near-infrared laser is preferable in that it can be efficiently patterned while preventing the influence of heat on the base film 10 as much as possible because it has a high output and can easily stabilize the amount of energy.

  In the case where the transparent conductive film 21 and the routing circuit 25 are not the outermost surface and an overcoat layer or an overcoat film is formed on the transparent conductive film 21 or the routing circuit 25, the overcoat layer or the overcoat The laser beam 1 must be selected so that the energy of the laser beam can be easily concentrated on the surface of the transparent conductive film 21 and the drawing circuit 25 under the film through the film.

  The laser beam machine 50 for irradiating the laser beam 1 is formed on the base film 10 with an optical system for propagating a laser beam oscillated by a laser oscillator in principle and the laser beam 1 supplied via the optical system. The laser beam 1 is emitted in the vertical direction from the emission end of the machining nozzle 52, which is a combination with the transparent conductive film 21 and the machining nozzle 52 that emits toward the routing circuit 25 (FIG. 4). Each processing nozzle 52 may be connected to a plurality of optical fibers for guiding a plurality of types of laser beams 1 supplied from a laser oscillator. The optical system may be configured using an arbitrary optical element such as an optical fiber, a mirror, or a lens.

  The processing nozzle 52 of the laser processing machine 50 is relatively movable along the X direction (width direction) and / or the Y direction (depth direction) with respect to the base film 10 supported by the support. Configured. By doing so, it is possible to irradiate the laser beam 1 to any part of the transparent conductive film 21 and the routing circuit 25, and to move the laser beam 1 while controlling the moving speed. Specifically, the processing nozzle 52 may be mounted and moved on a linear motor carriage or the like, and conversely, an XY stage or the like is disposed on a support that supports the base film 10 and the base film. 10 may be exercised.

  Alternatively, the laser beam 1 may be moved by adopting a galvano scanner without moving the processing nozzle 52 as described above. The galvano scanner rotates a mirror that reflects the laser beam 1 by a servo motor or a stepping motor, and the optical axis of the laser beam 1 oscillated from the laser oscillator can be displaced by changing the direction of the mirror. . In order to control the irradiation position of the optical axis of the laser beam 1 in two dimensions, it is preferable to include both an X-axis galvano scanner that changes in the X-axis direction and a Y-axis galvano scanner that changes in the Y-axis direction.

  Actually, when the transparent electrode 21 and the routing circuit 25 are formed by irradiating the laser beam 1 while moving in the X direction, the moving speed of the laser beam 1 in the X direction is accelerated from the stopped state as described above. Thus, after moving at a constant speed, it becomes a profile that slows in acceleration and stops. In two dimensions, the same profile is obtained for the movement of the laser beam 1 in the Y direction. In the present invention, the amount of energy of the laser beam 1 is varied according to the moving speed of the laser beam 1.

  As an ideal profile in which the energy amount of the laser beam 1 is varied in accordance with the moving speed of the laser beam 1, the moving speed of the machining nozzle 52 and the energy amount of the laser beam 1 are completely proportional as shown in FIG. Such a profile. However, when it is technically difficult to achieve such a proportional relationship, for example, as shown in FIG. 3, the energy amount of the laser beam 1 can be varied step by step, and is proportional from a macro perspective. It is better to have a substantially proportional relationship close to this relationship. In the present invention, when the “approximately proportional relationship” is obtained by drawing a linear regression line L from point A to I at each stage as shown in FIG. It is defined as a relationship in the range of 1.2. There are at least four points (that is, points A to D in FIG. 3), and the energy amount may be zero when the movement speed is zero or the movement speed is extremely fine.

  Thus, if the moving speed of the laser beam 1 and the amount of energy of the laser beam 1 are in a substantially proportional relationship, damage, deformation, melting, discoloration, etc. due to heat of the base sheet that is likely to occur when the moving speed of the laser beam 1 is slow. In addition, the patterning failure of the transparent electrode 20 and the routing circuit 25 due to a shortage of energy that is likely to occur when the moving speed of the laser beam 1 is high can be prevented. As a result, the transparent electrode film 100 can be produced very efficiently.

  As a method for controlling the laser beam 1 so that the energy amount of the laser beam 1 is varied according to the moving speed of the laser beam 1 as described above, the oscillation frequency of the laser beam 1 is variably adjusted in proportion to the moving speed of the laser beam 1. A method is mentioned. In other words, a pulse oscillation laser processing machine 50 such as a Q switch method is used to lower the oscillation frequency of the laser beam 1 (that is, increase the period) in proportion to the decrease in the moving speed of the laser beam 1. If the period of the oscillation frequency of the laser beam 1 becomes longer, the number of times of irradiation of the laser beam 1 per unit time decreases, so that the energy amount of the laser beam 1 can be decreased indirectly. On the contrary, if the oscillation frequency of the laser beam 1 is increased in proportion to the increase in the moving speed of the laser beam 1 (that is, the period is shortened), the number of times of irradiation of the laser beam 1 per unit time increases and becomes indirect. In addition, the energy amount of the laser beam 1 can be increased.

When such a method of variably adjusting the oscillation frequency of the laser beam 1 is used, the laser processing machine 50 is not a continuous oscillation CW laser processing machine that continuously oscillates a constant output, but a pulsed output at a constant frequency. It is necessary to make a pulse laser machine that can oscillate. Examples of the pulse laser processing machine include a direct modulation method, a Q switch method, and a mode synchronization method (mode lock method) laser processing machine.

  Among them, the pulse laser processing machine of the Q switch method is a type that can oscillate the laser beam 1 at a stroke until a sufficient inversion distribution occurs in the medium of the laser beam 1, and can irradiate the laser beam 1 with a very large amount of energy. Is preferable. When using the Q-switch method pulse laser processing machine and adopting a galvano scanner for processing while moving the laser beam 1, the oscillation frequency is preferably in the range of about 2 kHz to 600 kHz. This is because if the oscillation frequency is lower than 2 kHz, the amount of energy may be insufficient, and if the oscillation frequency is higher than 600 kHz, it is difficult to perform irradiation in synchronization with the galvano scanner.

  The laser processing machine 50 is preferably provided with a function capable of frequency-modulating the oscillation frequency being processed by an external trigger and a function capable of performing nonlinear control synchronized with the oscillation frequency in combination with the function. This is because it is difficult to control the irradiation energy synchronized with the oscillation frequency even if the conventional general motion controller and the laser oscillator can be controlled with the oscillation frequency synchronized with the speed. The motion controller has a function of outputting a modulation signal of the laser oscillation frequency in proportion to the scanning speed of the laser beam 1 and an interface capable of transmitting the oscillation current command value of the laser oscillator to the transmitter in synchronization with the function. May be. Further, the laser oscillator may be provided with a function capable of receiving the modulation input from the motion controller and modulating the oscillation frequency and the oscillation current.

  In addition to the method of variably adjusting the oscillation frequency of the laser beam 1, there is a method of adjusting the energy amount of the laser beam itself emitted from the laser oscillator. As a method of adjusting the energy amount of the laser beam 1 itself, a control value (specifically, a current value or the like) commanded to a controller or a laser intensity stabilizer associated with the laser oscillator is adjusted, or the laser oscillator and the processing nozzle are connected. Control value commanded to an attenuator (attenuator) provided in an optical system interposed between them (specifically, the optical axis of a glass plate with a special film capable of changing the transmittance or reflectance of the laser beam 1) And a method of adjusting a rotation angle around the optical axis of the half-wave plate just before the polarizing beam splitter.

  Alternatively, the amount of energy of the laser beam 1 itself may be varied by adjusting the processing width radius of the laser beam 1 according to the moving speed of the laser beam 1. Since the energy distribution of the laser beam 1 is generally a Gaussian distribution, the peak value of the Gaussian distribution increases or decreases by adjusting the processing width radius with respect to the focal beam radius of the laser beam 1. If this adjustment is performed as appropriate, the energy amount of the laser beam 1 can be varied within the focal beam radius centered on the position corresponding to the peak value, although the processing beam radius is limited to a range smaller than the focal beam radius. Can do.

  In particular, the above means is useful in patterning near the edge of the transparent electrode 20. When the laser beam 1 is irradiated with the processing width radius as small as possible relative to the focal beam radius, the amount of energy outside the processing width of the laser beam 1 is sufficiently low. For this reason, since the influence of heat at the outer edge portion of the processing width is reduced, the continuity and linearity of the boundary line between the portion of the transparent conductive film 21 to be ablated and the edge portion of the transparent electrode 20 are maintained well. This is because the pattern of the transparent electrode 20 with a clean edge can be formed.

  Note that the laser beam machine 50 for irradiating the laser beam 1 forms a uniforming means for making the output distribution of the laser beam substantially uniform and an image of the laser beam whose output distribution is made substantially uniform by the uniformizing means. An image optical system, a masking means that is disposed in the vicinity of a position where an image of the laser beam is formed by the imaging optical system, and that shapes the laser beam to a shape for irradiating the workpiece is provided. Also good.

  Normally, the output distribution of the laser beam emitted from the laser oscillator is close to the Gaussian distribution. However, if the above-mentioned means are provided, the output distribution of the laser beam 1 to be irradiated does not include the nonuniformity of the original laser beam. This is because the pattern processing accuracy of 20 and the routing circuit 25 is improved. In order to make the output distribution of the laser beam substantially uniform, it is necessary to measure the output distribution of the laser beam emitted from the laser oscillator. For the measurement, a CCD sensor, a photodiode sensor, a thermal power sensor or the like may be used.

  Further, the laser processing machine 50 may be provided with a laser amplifier for simply adjusting the power and output mode quality of the light to be amplified. A laser amplifier includes a solid gain medium that receives an amplified light beam from one end face and emits the light from the other end face, an excitation light source that irradiates the gain medium with an excitation light beam and amplifies the amplified light beam, and a gain medium. And a half-wave plate that can be rotated and passed between the excitation light source and the excitation light source. In the laser amplifier, the polarization direction of the excitation light beam irradiated to the gain medium, and thus the degree of absorption of the excitation light beam can be easily increased or decreased through the rotation operation of the half-wave plate. This makes it easy to increase the energy of the amplified light beam to a necessary and sufficient level while suppressing the thermal distortion of the gain medium and ensuring the output mode quality of the amplified light beam.

  Further, the laser processing machine 50 includes a moving mechanism control controller that controls the movement of a plurality of processing nozzles, and a dedicated processing nozzle control controller that individually controls ON / OFF of the emission of the laser beam 1 from each processing nozzle. May be provided. This is because the laser beam 1 consisting of stable pulse oscillation can be irradiated by controlling with a plurality of controllers. As a result, a complicated pattern can be suitably formed without using a shielding mask.

  The processing nozzle control controller includes a position signal receiving unit that directly receives a signal output from the linear scale without using the moving mechanism controller, a relative position of the processing nozzle 52 to the processing object, and a laser beam for each processing nozzle. Each processing nozzle 52 corresponding to the information stored in the pattern information storage unit based on the signal received by the pattern information storage unit and the position signal reception unit that stores information defining the relationship between ON / OFF of the emission of An irradiation control unit that individually controls ON / OFF of emission of the laser beam 1 from the laser beam may be provided.

  Further, the laser processing machine 50 has a holding mechanism for holding the base film 10 so as not to move during laser processing, and a pitch with respect to the base film 10 and the base fixed during laser processing while supporting the base film 10 from below. A support mechanism that can move in the feed direction and avoid interference with the laser optical axis may be provided. The support mechanism may be provided with a plurality of travel direction openings extending along the travel direction and a pitch feed direction opening extending along the pitch feed direction.

It is sectional drawing which shows an example of the manufacturing method of the transparent electrode film which concerns on the 1st characteristic structure of this invention. It is a conceptual diagram which shows an example of the profile which shows the relationship between the moving speed of a laser beam, and the energy amount of a laser beam in the manufacturing method of the transparent electrode film which concerns on the 3rd characteristic structure of this invention. It is a conceptual diagram which shows another example of the profile which shows the relationship between the moving speed of a laser beam, and the energy amount of a laser beam in the manufacturing method of the transparent electrode film which concerns on the 3rd characteristic structure of this invention. It is a conceptual diagram which shows an example of the laser processing machine which concerns on the 6th characteristic structure of this invention. It is a top view which shows an example of the outer frame frame part periphery in the manufacturing method of the transparent electrode film which concerns on the 2nd characteristic structure of this invention.

DESCRIPTION OF SYMBOLS 1 Laser beam 10 Base film 20 Transparent electrode 21 Transparent electrically conductive film 25 Leading circuit 50 Laser processing machine 52 Processing nozzle 70 Four corners of an outer frame part 71 Side of an outer frame frame part of X direction 72 In four corners of an outer frame frame part of X direction Near location 73 Location near the four corners of the outer frame frame portion in the Y direction 74 Side of the outer frame frame portion in the Y direction 100 Transparent electrode film

Claims (4)

A step you form either a cyclic olefin-based transparent conductive film made of a metal oxide film, a transparent conductive film obtained by incorporating conductive fiber filament, or a transparent conductive film made of an organic substance,
Forming a transparent electrode on the cyclic olefin-based film by patterning the transparent conductive film by irradiating a laser beam, and a method for producing a transparent electrode film comprising:
In the step of forming the transparent electrode, the amount of energy of the laser beam is varied by variably adjusting the oscillation frequency of the laser beam according to the moving speed of the laser beam so that the cyclic olefin-based film is not damaged or deformed by the heat of the laser beam. A method for producing a transparent electrode film , wherein the transparent conductive film is patterned . A step you form either a cyclic olefin-based transparent conductive film made of a metal oxide film, a transparent conductive film obtained by incorporating conductive fiber filament, or a transparent conductive film made of an organic substance,
Forming a transparent electrode on the cyclic olefin-based film by patterning the transparent conductive film by irradiating a laser beam, and a method for producing a transparent electrode film comprising:
In the step of forming the transparent electrode, wherein that the cyclic olefin-based film is not damaged or deformed by heat of the laser beam, a control value for commanding the laser intensity stabilizer or attenuator in accordance with the moving speed of the laser beam by varying regulatory the amount of energy les Za rays by varying, patterning of the transparent conductive film, method for producing a transparent electrode film. A step you form either a cyclic olefin-based transparent conductive film made of a metal oxide film, a transparent conductive film obtained by incorporating conductive fiber filament, or a transparent conductive film made of an organic substance,
Forming a transparent electrode on the cyclic olefin-based film by patterning the transparent conductive film by irradiating a laser beam, and a method for producing a transparent electrode film comprising:
In the step of forming the transparent electrode, such that the cyclic olefin-based film is not damaged or deformed by heat of the laser beam, the energy of delle Za rays adjusting the processing width radius of the laser beam in accordance with the moving speed of the laser beam A method for producing a transparent electrode film , wherein the transparent conductive film is patterned while being varied. A laser processing machine for use in the method for producing a transparent electrode film according to claim 1, wherein a uniformizing means for making the output distribution of the laser beam substantially uniform, an imaging optical system for forming an image of the laser beam, Masking means for shaping into a shape for irradiating the workpiece, laser amplifier for easily adjusting the output mode quality, processing nozzle control controller for controlling the emission of the laser beam, retention mechanism for holding the substrate film, laser light A laser processing machine comprising any one of a support mechanism that avoids interference with an axis, and configured to move an irradiation position of a laser beam and vary an energy amount of the laser beam according to a moving speed of the laser beam .

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