JP6555703B2 - リソグラフィ装置のための制御システムおよび方法 - Google Patents

リソグラフィ装置のための制御システムおよび方法 Download PDF

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Publication number
JP6555703B2
JP6555703B2 JP2018544531A JP2018544531A JP6555703B2 JP 6555703 B2 JP6555703 B2 JP 6555703B2 JP 2018544531 A JP2018544531 A JP 2018544531A JP 2018544531 A JP2018544531 A JP 2018544531A JP 6555703 B2 JP6555703 B2 JP 6555703B2
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value
module
time base
time
synchronization
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Japanese (ja)
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JP2019506006A5 (enExample
JP2019506006A (ja
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ステーンストラ、ヘルレ・ティエルク
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ASML Netherlands BV
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ASML Netherlands BV
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    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F1/00—Details not covered by groups G06F3/00 - G06F13/00 and G06F21/00
    • G06F1/04—Generating or distributing clock signals or signals derived directly therefrom
    • G06F1/14—Time supervision arrangements, e.g. real time clock
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/24—Circuit arrangements not adapted to a particular application of the tube and not otherwise provided for
    • H01J37/243—Beam current control or regulation circuits
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F13/00—Interconnection of, or transfer of information or other signals between, memories, input/output devices or central processing units
    • G06F13/38—Information transfer, e.g. on bus
    • G06F13/40—Bus structure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/045—Beam blanking or chopping, i.e. arrangements for momentarily interrupting exposure to the discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control
    • H01J37/3023—Programme control
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H01J37/3177—Multi-beam, e.g. fly's eye, comb probe
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04J—MULTIPLEX COMMUNICATION
    • H04J3/00—Time-division multiplex systems
    • H04J3/02—Details
    • H04J3/06—Synchronising arrangements
    • H04J3/0635—Clock or time synchronisation in a network
    • H04J3/0638—Clock or time synchronisation among nodes; Internode synchronisation
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04L—TRANSMISSION OF DIGITAL INFORMATION, e.g. TELEGRAPHIC COMMUNICATION
    • H04L7/00—Arrangements for synchronising receiver with transmitter
    • H04L7/0008—Synchronisation information channels, e.g. clock distribution lines
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2059—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a scanning corpuscular radiation beam, e.g. an electron beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/304—Controlling tubes
    • H01J2237/30472—Controlling the beam
    • H01J2237/30483—Scanning
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31761—Patterning strategy
    • H01J2237/31762—Computer and memory organisation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31761—Patterning strategy
    • H01J2237/31766—Continuous moving of wafer
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof

Landscapes

  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Theoretical Computer Science (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Signal Processing (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Electron Beam Exposure (AREA)
  • Electron Sources, Ion Sources (AREA)
JP2018544531A 2015-12-28 2016-12-23 リソグラフィ装置のための制御システムおよび方法 Active JP6555703B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US14/979,583 2015-12-28
US14/979,583 US10096450B2 (en) 2015-12-28 2015-12-28 Control system and method for lithography apparatus
PCT/EP2016/082618 WO2017114794A1 (en) 2015-12-28 2016-12-23 Control system and method for lithography apparatus

Publications (3)

Publication Number Publication Date
JP2019506006A JP2019506006A (ja) 2019-02-28
JP2019506006A5 JP2019506006A5 (enExample) 2019-06-20
JP6555703B2 true JP6555703B2 (ja) 2019-08-07

Family

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Country Status (6)

Country Link
US (1) US10096450B2 (enExample)
EP (1) EP3398271B1 (enExample)
JP (1) JP6555703B2 (enExample)
KR (1) KR102022434B1 (enExample)
CN (1) CN108702229B (enExample)
WO (1) WO2017114794A1 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10593509B2 (en) 2018-07-17 2020-03-17 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Charged particle beam device, multi-beam blanker for a charged particle beam device, and method for operating a charged particle beam device
US10483080B1 (en) * 2018-07-17 2019-11-19 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Charged particle beam device, multi-beam blanker for a charged particle beam device, and method for operating a charged particle beam device
CN108919612B (zh) * 2018-07-27 2021-08-31 中国电子科技集团公司第十三研究所 电子束曝光方法、电子束光刻方法及金属线条制备方法
DE102018133703B4 (de) * 2018-12-29 2020-08-06 Carl Zeiss Multisem Gmbh Vorrichtung zur Erzeugung einer Vielzahl von Teilchenstrahlen und Vielstrahl-Teilchenstrahlsysteme
CN113032015B (zh) * 2019-12-24 2022-02-18 中国科学院沈阳自动化研究所 一种用于精密运动控制的通信方法
DE102020107738B3 (de) * 2020-03-20 2021-01-14 Carl Zeiss Multisem Gmbh Teilchenstrahl-System mit einer Multipol-Linsen-Sequenz zur unabhängigen Fokussierung einer Vielzahl von Einzel-Teilchenstrahlen, seine Verwendung und zugehöriges Verfahren

Family Cites Families (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4215380A1 (de) 1992-05-11 1993-11-18 Siemens Ag Verfahren zum Synchronisieren von lokalen Zeitgebern eines Automatisierungssystems
US5661700A (en) * 1994-07-18 1997-08-26 Allen-Bradley Company, Inc. Synchronizable local clock for industrial controller system
DE19626287A1 (de) 1996-07-01 1997-02-13 Abb Management Ag Verfahren zum Betrieb eines Antriebssystems und Vorrichtung zur Durchführung des Verfahrens
US6535528B1 (en) 1999-03-15 2003-03-18 Nortel Networks Limited DS256 synchronous digital interface
DE10145218A1 (de) * 2001-09-13 2003-04-03 Bosch Gmbh Robert Verfahren und Vorrichtung zur Zeitbestimmung in einem Bussystem und Bussystem
CN100524026C (zh) 2002-10-25 2009-08-05 迈普尔平版印刷Ip有限公司 光刻系统
EP2523207A3 (en) * 2002-10-30 2015-08-26 Mapper Lithography IP B.V. Electron beam generator
WO2004081910A2 (en) 2003-03-10 2004-09-23 Mapper Lithography Ip B.V. Apparatus for generating a plurality of beamlets
US7084414B2 (en) 2003-05-28 2006-08-01 Mapper Lithography Ip B.V. Charged particle beamlet exposure system
CN1829945B (zh) 2003-07-30 2010-05-05 迈普尔平版印刷Ip有限公司 调制器电路
WO2005069661A1 (en) 2004-01-13 2005-07-28 Philips Intellectual Property & Standards Gmbh Synchronization of time base units
US7709815B2 (en) 2005-09-16 2010-05-04 Mapper Lithography Ip B.V. Lithography system and projection method
EP2080300B1 (en) 2006-10-31 2018-09-19 NXP USA, Inc. Network and method for setting a time-base of a node in the network
EP2132613A4 (en) 2007-03-01 2016-05-04 Qulsar Sweden Ab ELECTRONIC TIMER SYSTEM, TIME CONTROL AND GENERATION OF TIMING SIGNALS
EP2165541B1 (en) * 2007-05-11 2013-03-27 Audinate Pty Ltd Systems, methods and computer-readable media for configuring receiver latency
US8445869B2 (en) 2008-04-15 2013-05-21 Mapper Lithography Ip B.V. Projection lens arrangement
EP2260499B1 (en) 2008-02-26 2016-11-30 Mapper Lithography IP B.V. Projection lens arrangement
EP2250660A1 (en) 2008-02-26 2010-11-17 Mapper Lithography IP B.V. Projection lens arrangement
WO2009141428A1 (en) 2008-05-23 2009-11-26 Mapper Lithography Ip B.V. Imaging system
JP5743886B2 (ja) 2008-06-04 2015-07-01 マッパー・リソグラフィー・アイピー・ビー．ブイ． ターゲットを露光するための方法およびシステム
AU2009284710A1 (en) 2008-08-21 2010-02-25 Chronologic Pty Ltd Synchronisation and timing method and apparatus
JP2012504369A (ja) * 2008-09-30 2012-02-16 ラムバス・インコーポレーテッド 信号の較正方法および装置
CN102232237B (zh) 2008-10-01 2014-09-24 迈普尔平版印刷Ip有限公司 静电透镜构件
CN102422380A (zh) 2009-02-22 2012-04-18 迈普尔平版印刷Ip有限公司 带电粒子微影设备及真空腔室中产生真空的方法
US8640070B2 (en) 2010-11-08 2014-01-28 International Business Machines Corporation Method and infrastructure for cycle-reproducible simulation on large scale digital circuits on a coordinated set of field-programmable gate arrays (FPGAs)
US8884255B2 (en) 2010-11-13 2014-11-11 Mapper Lithography Ip B.V. Data path for lithography apparatus
CN103402575B (zh) * 2011-03-22 2016-03-23 基文影像公司 用于在体内装置和定位系统之间同步的系统和方法
EP2575159B1 (en) * 2011-09-30 2016-04-20 Carl Zeiss Microscopy GmbH Particle beam system and method for operating the same
DE102014225867A1 (de) * 2014-12-15 2016-06-16 Dr. Johannes Heidenhain Gmbh Vorrichtung und Verfahren zur Überprüfung eines Arbeitstaktsignals einer Positionsmesseinrichtung

Also Published As

Publication number Publication date
KR20180093081A (ko) 2018-08-20
KR102022434B1 (ko) 2019-09-18
WO2017114794A1 (en) 2017-07-06
US10096450B2 (en) 2018-10-09
JP2019506006A (ja) 2019-02-28
CN108702229B (zh) 2019-10-11
EP3398271A1 (en) 2018-11-07
EP3398271B1 (en) 2024-01-31
CN108702229A (zh) 2018-10-23
US20170186582A1 (en) 2017-06-29

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