JP6543754B2 - Input device - Google Patents

Description

  The present invention relates to an input device in which a plurality of translucent first electrode layers and a plurality of second electrode layers are formed on the same surface of a translucent substrate.

  A portable electronic device or the like is provided with an input device for detecting a capacitance, and the input device is disposed in front of a display panel such as a color liquid crystal panel.

  In the input device, a plurality of light transmitting electrode layers are formed on a light transmitting substrate, and the electrode layers are connected in a second direction to a first electrode layer connected in a first direction. And a second electrode layer. When driving power is applied to one of the first electrode layer and the second electrode layer, a detection output is obtained from the other electrode layer, and it is determined where in the input device a finger or the like is approaching. It will be able to detect.

  In this type of input device, there are devices in which both the first electrode layer and the second electrode layer are formed on the same surface of one substrate so that the number of substrates can be reduced for thinning.

  In this input device, the first wiring layer (lead layer) connected to the first electrode layer, and the second wiring layer (lead layer) connected to the second electrode layer are provided on the surface of the substrate. The first electrode layer is connected in the first direction and the second electrode layer is connected in the second direction. It is necessary to route at the edge in the direction 1 and route the second wiring layer at the edge in the second direction of the substrate. If the wiring area is formed on two mutually orthogonal sides of the substrate, this wiring area becomes a dead area which does not function as a detection area. In addition, when the input device is attached to the front panel, it is necessary to cover the wiring area with the decorative layer, and there is a problem that the display area of the display panel is narrowed by the provision of the decorative layer.

  In the touch screen panel described in Patent Document 1, a second sensing pattern continuous in the Y direction and a second connection pattern connecting the second sensing electrodes in the Y direction are integrally formed, and both sides of the second connection pattern are formed. The first sensing electrodes aligned in the X direction are formed independently of each other. Also, a drive pattern extends continuously between the first sensing electrode and the second sensing electrode in the Y direction. The second connection pattern and the drive pattern are covered with the insulating layer, and the first detection electrodes formed in the X direction are connected to each other by the first connection pattern formed on the insulating layer.

  In the touch screen panel, when the drive pattern passes below the first connection pattern, a drive wire connected to the second sensing electrode, and a drive wire connected to the first sensing electrode via the drive pattern. Can be drawn only to the edge of the substrate facing in the Y direction.

  In the touch panel described in Patent Document 2, a plurality of first electrodes aligned in the X direction and a first conductive wire connecting the first electrodes are integrally formed on the surface of a substrate. An opening is formed in each first electrode, and second electrodes are formed independently of each other in the opening. An insulating layer is formed on the first electrode, and a second conducting wire is formed on the insulating layer, and adjacent second electrode layers in the Y direction are connected by the second conducting wire.

  The surface of the substrate is provided with conductive segments extending in the Y direction, and each conductive segment is connected to the first conductive wire, but at the intersection between the first conductive wire and the conductive segment, which should not be connected: The insulating layer is formed on the surface of the first conducting wire, and the conductive segments are connected to each other through a third conducting wire formed on the insulating layer.

  In this touch panel, since the conductive segment connected to the first electrode conducting in the X direction extends in the Y direction, the lead wire connected to the first electrode and the second electrode are connected The leads can be routed only to the edge of the substrate in the Y direction.

Unexamined-Japanese-Patent No. 2012-150782 JP, 2013-143131, A

  In the touch screen panel described in Patent Document 1, the drive pattern conducted to the first sensing electrode passes a position close to the side of the second sensing electrode. Therefore, a capacitance is formed between the drive pattern and the second sensing electrode, and the opposing portion between the drive pattern and the second sensing electrode becomes a sensitivity region. When a finger or the like approaches, a detection output is generated between the drive pattern and the second sensing electrode, and this output is intended to detect a change in capacitance between the first sensitivity electrode and the second sensitivity electrode. Is superimposed as detection noise on the detection output of

  In the touch panel described in Patent Document 2, the conductive segment conducting to the first electrode functions as a wiring layer (lead layer) extending in the Y direction, but the conductive segment is located in the opening. Since it is separated from the electrode 2, the electrostatic coupling between the conductive segment and the second electrode is weak, and the problem that the region which should not have the sensitivity as described in Patent Document 1 becomes the sensitivity region hardly occurs.

  However, in the touch panel described in Patent Document 2, since the conductive segment extending in the Y direction passes between the first electrodes adjacent in the X direction, the conductive segments adjacent in the X direction become the conductive segments. In order to pass through, it is necessary to arrange them apart, which makes it difficult to densely arrange the electrodes.

  In addition, since a complex structure in which the second electrode is disposed in the opening formed in the first electrode is adopted, the number of second conductive wires connecting the second electrodes is It is necessary to provide two places for one first electrode. Therefore, when the number of electrodes is increased, the number of second conductive lines and the number of insulating blocks formed under the second conductive lines increase, and when the display panel provided behind is displayed, the number of second conductive lines is increased. And the insulating block are easily visible and noticeable, and the display quality is easily impaired.

  The present invention solves the above-mentioned conventional problems, and reduces the wiring area at the edge of the substrate so that the area of the display area (input area) can be expanded, and it is unnecessary between the wiring layer and the electrode layer. It is an object of the present invention to provide an input device capable of suppressing a phenomenon in which the sensitivity is formed and further capable of maintaining good display quality.

In the present invention, a first electrode layer and a second electrode layer formed of a light transmitting conductive material are formed on a light transmitting substrate, and a plurality of the first electrode layers are formed in a first direction. An input device in which the plurality of second electrode layers are arranged in a second direction crossing the first direction;
A connecting portion connecting the first electrode layer and one of the second electrode layers is integrally formed of the translucent conductive material, and a first insulating layer is formed on the connecting portion. A layer and a first bridge connection layer are formed in an overlapping manner, and the other electrode layers are conducted by the first bridge connection layer,
A wiring passage extending in a first direction is formed inside the second electrode layer, and a wiring layer passing through the wiring passage is electrically connected to the other second electrode layer,
A divided electrode layer obtained by dividing the second electrode layer by the wiring passage, and any one layer of the wiring layer are continuous in the wiring passage, and a second insulating layer and a second insulating layer are formed on the continuous portion. And the other layer is conducted by the second bridge connection layer .

  In the input device of the present invention, since the wiring layer conducting to the second electrode layer passes through the wiring passage formed in the second electrode layer, the electrostatic capacitance between the wiring layer and the first electrode layer Bonding can be weakened, and unnecessary sensitivity regions can be prevented from being formed between the wiring layer and the first electrode layer.

  Further, since the wiring layer passes through the inside of the second electrode layer, it is not necessary to form a passage for drawing the wiring layer in the first direction outside the second electrode layer. Therefore, regardless of the presence of the wiring layer, the arrangement pitch of the second electrode layer can be properly set.

The present invention is characterized in that an opening is formed in a region of the second electrode layer in which the wiring passage is not formed. Preferably , an opening is also formed in the region of the first electrode layer.

  In the above invention, it is possible to prevent a large difference in the area of the electrode layer between the second electrode layer having the wiring passage and the other electrode layer not having the wiring passage, and the sensitivity in each electrode layer It will be easier to align.

  In the input device of the present invention, a plurality of the wiring layers may pass through the wiring passage, and the respective wiring layers may be electrically connected to the different second electrode layers.

Further, according to the present invention , the plurality of wiring paths are formed in the second electrode layer, and the wiring layers pass through the respective wiring paths, and the respective second wiring layers are different. It is characterized by conducting to the layer .

  In the input device of the present invention, preferably, the wiring passage is formed at a central portion which divides the second electrode layer in the second direction.

  In the above configuration, the distance between each of the first electrode layers located on both sides of the second electrode layer and the wiring layer can be equally spaced.

  In the input device of the present invention, the first insulating layer and the second insulating layer are formed of the same material and in the same process, and the first bridge connection layer and the second bridge connection layer are the same material. It is preferable to form in the same process.

  For example, in the input device of the present invention, the first electrode layer and the second electrode layer are square, and the corner of the square is directed in the first direction and the second direction.

Furthermore, in the input device of the present invention, the wiring layer passes through a region facing the first electrode layer, and a conductive state is formed between the first electrode layer and the wiring layer at this position. It is characterized in that a protective layer formed of a material is provided .

  In this case, the protective layer is preferably formed of the same light-transmitting conductive material as the first electrode layer.

  Further, the protective connection layer connecting the protective layers arranged at intervals in the first direction may be configured to pass through the inside of the wiring passage.

  Furthermore, the protective layer can be configured to be formed continuously with the second electrode layer.

  In the input device of the present invention, since the wiring layer conducting to the second electrode layer passes through the wiring passage formed in the second electrode layer, the wiring layer and the first electrode layer are separated. It becomes possible to arrange, it becomes difficult to form an unnecessary sensitivity region between the wiring layer and the first electrode layer, and detection accuracy can be enhanced.

  Further, since the wiring layer passes through the inside of the second electrode layer, it is not necessary to form a passage for drawing the wiring layer in the first direction outside the second electrode layer. Therefore, regardless of the presence of the wiring layer, the second electrode layer can be easily arranged, and for example, the arrangement pitch of the second electrode layer can be appropriately set.

  Furthermore, by forming a protective layer between the first electrode layer and the wiring layer, the capacitance between the first electrode layer and the wiring layer can be reduced, and detection noise can be reduced.

An exploded perspective view of a touch panel using the input device according to the embodiment of the present invention; A plan view showing an arrangement of electrodes of the input device according to the first embodiment of the present invention; An enlarged sectional view of the input device shown in FIG. An enlarged cross-sectional view of the input device shown in FIG. A partial plan view showing an arrangement of electrodes of an input device according to a second embodiment of the present invention; A partial plan view showing an arrangement of electrodes of an input device according to a third embodiment of the present invention; An enlarged plan view of a second electrode layer showing a modified example of the present invention; A plan view showing an electrode layer and a protective layer of an input device according to a fourth embodiment of the present invention, A partial plan view showing a modification of the protective layer of the input device according to the fourth embodiment, A partial plan view showing an electrode layer and a protective layer of an input device according to a fifth embodiment of the present invention, A partially enlarged plan view showing an electrode layer and a protective layer of an input device according to a sixth embodiment of the present invention; A partially enlarged plan view showing an electrode layer and a protective layer of an input device according to a seventh embodiment of the present invention; A line showing the difference in capacitance between the wiring layer and the first electrode layer in the embodiment with the protective layer (the seventh embodiment) and the embodiment without the protective layer Figure,

  The touch panel 1 is shown in FIG. The touch panel 1 includes a front panel 2 and an input device 10 of the present invention located below the front panel 2.

  The front panel 2 constitutes a part of the case of various electronic devices such as a portable telephone, a navigation device, a game device, and a communication device. The front panel 2 is formed of a translucent synthetic resin material such as acrylic resin or glass, and can see through the inside of the device from the outside of the front panel 2.

  The input device 10 has a translucent substrate 11. The substrate 11 is a resin sheet such as PET (polyethylene terephthalate). The front panel 2 and the input device 10 are bonded via an OCA (transparent adhesive adhesive).

  In the input device 10, the Y direction is a first direction, and the X direction is a second direction. As shown in FIGS. 1 and 2, in the input device 10, the wiring area H is provided only on one edge 10y side in the first direction (Y direction), and the area other than the wiring area H is a detection area It is S. A display panel 5 such as a color liquid crystal panel is housed in the case of the electronic device, and the display screen of the display panel 5 is viewed from the outside through the front panel 2 and the detection area S of the input device 10 Is possible. Therefore, the detection area S is also a display area.

  In FIG. 2 and thereafter, the input device 10 is shown in a posture in which the wiring area H is directed upward in the figure. In the input device 10, since the wiring area H is not formed at the edge 10x facing in the second direction (X direction), the position where the detection area (display area) S is very close to the edge 10x of the input device 10 It can be extended up to, and the dead space for wiring can be eliminated.

  As shown in FIG. 2, on a common surface of the substrate 11, a first electrode row 20 extending in a first direction (Y direction) and a second electrode row 30 extending in a second direction (X direction) are provided. It is formed.

  In the first electrode row 20, a first electrode in which a plurality of first electrode layers 21 and a connecting portion 22 connecting (connecting) the first electrode layers 21 in the Y direction are integrally formed. Three columns of y1, y2 and y3 are provided in the column 20, but this number is selected according to the area of the input device 10.

  The first electrode layer 21 is a square (or a rhombus), and corner portions of the square are directed in the X direction and the Y direction, and the connecting portion 22 is a corner of the first electrode layer 21 adjacent in the Y direction. The parts are linked.

  The second electrode rows 30 are regularly arranged at equal pitches in the X direction along the four rows x1, x2, x3, x4, and along the respective rows ya, yb, yc, yd They are regularly arranged at an equal pitch in the Y direction. The number of columns in the X direction and the Y direction is selected according to the area of the input device 10. The second electrode layer 31 is square (or rhombus), and each corner is directed in the X direction and the Y direction. The sizes of the sides of the squares of the first electrode layer 21 and the second electrode layer 31 match each other.

  The second electrode layer 31 has a wiring passage 32 formed at its central portion, and the second electrode layer in which the wiring passage 32 is formed is given the reference numeral 31A to form the wiring passage 32. It distinguishes with the 2nd electrode layer 31 which does not have.

  In the second electrode layer 31A, the wiring passage 32 is formed to extend linearly in the Y direction. The wiring passage 32 is formed at the central portion in the X direction so that the second electrode layer 31A can be equally divided in the X direction. The second electrode layer 31 </ b> A is divided by the wiring passage 32 into two divided electrode layers 33 and 33.

  The first electrode layer 21, the connecting portion 22, and the second electrode layers 31 and 31 </ b> A are formed of the same light-transmitting conductive material. The light-transmitting conductive material is formed of an ITO (indium tin oxide) layer, a metal nanowire layer represented by a silver nanowire, a thin metal layer formed in a mesh shape, a conductive polymer layer, or the like.

  FIG. 3 is a cross-sectional view showing the laminated structure of the intersection of the first electrode row 20 in the y1 row and the second electrode row 30 in the x2 row.

  At this intersection, a translucent first insulating layer 41 covering the connecting portion 22 of the first electrode array 20 is formed, and the first bridge connection layer 42 is formed on the first insulating layer 41. It is formed. By the first bridge connection layer 42, the second electrode layers 31 adjacent to both sides in the X direction of the connection portion 22 are connected and conducted. The insulating layer 41 and the first bridge connection layer 42 are formed at all intersections of the first electrode row 20 and the second electrode row 30, and the second electrode layers 31 arranged in the x1 row (31A) are connected in the X direction. Similarly, in the x2, x3 and x4 columns, the second electrode layers 31 (31A) are connected in the X direction.

  The translucent first insulating layer 41 is made of novolak resin or novolac resin and acrylic resin. In the first bridge connection layer 42, a conductive metal material such as Au (gold), Au alloy, CuNi alloy (copper-nickel alloy), Ni (nickel) or the like is overlaid on the underlayer of the amorphous ITO layer. Preferably, the protective layer is covered with an amorphous ITO layer.

  In the case where the first electrode layer 21 and the connection portion 22 and the second electrode layer 31 are formed of an ITO layer, the first electrode layer 21 and the connection portion 22 can be formed by forming them with crystalline ITO. It is possible to select and etch the crystalline ITO forming the second electrode layer 31 and the amorphous ITO forming the first insulating layer 32.

  At the intersection of the first electrode row 20 and the second electrode row 30, a connecting portion for connecting the second electrode layers 31 (31A) adjacent to each other in the X direction is integrated with the second electrode layer. A plurality of second electrode layers 31 (31A) may be formed continuously in the X direction. In this case, the first electrode layers 21 independent of each other are disposed on both sides in the Y direction across the connection portion, and the first electrode layer 21 is connected to the second electrode layer 31 (31A). The insulating layer 41 and the first bridge connection layer 42 are formed, and the first bridge connection layer 42 connects the first electrode layers 21 adjacent in the Y direction.

  As shown in FIG. 2, in the wiring area H formed at one end of the substrate 11 in the Y direction, a first wiring layer 25a formed integrally with the first electrode layer 21 in the y1 column, y2, y3. First wiring layers 25b and 25c formed integrally with the first electrode layers 21 of the column are formed. Further, in the wiring region H, second wiring layers 35a, 35b, 35c, and 35d which are electrically connected to the respective second electrode rows 30 are formed.

  The first wiring layers 25a, 25b, 25c and the second wiring layers 35a, 35b, 35c, 35d are routed in the wiring area H and are conducted to the connector portion provided in the wiring area H.

  As shown in FIG. 2, the second wiring layer 35a is integrally formed with the second electrode layer 31 located at the intersection of the x1 and ya columns.

  The second wiring layer 35 b is integrally formed with the second electrode layer 31 located at the intersection of the x2 and yb columns. The second wiring layer 35b passes through the inside of the wiring passage 32 formed in the second electrode layer 31A located at the intersection of the x1 and yb columns and linearly extends in the Y direction to the wiring region H. It has been reached.

  The second wiring layer 35c is integrally formed with the second electrode layer 31 located at the intersection of the x3 and yc columns. The second wiring layer 35c includes the wiring path 32 formed in the second electrode layer 31A located at the intersection of the x2 and yc columns, and the second electrode layer 31A located at the intersection of the x1 and yc columns. It passes through the inside of the wiring path 32 formed in and extends linearly in the Y direction to reach the wiring area H.

  The second wiring layer 35d is integrally formed with the second electrode layer 31 located at the intersection of the x4 and yd columns. The second wiring layer 35d includes the wiring path 32 formed in the second electrode layer 31A located at the intersection of the x3 and yd columns, and the second electrode layer 31A located at the intersection of the x2 and yd columns. The wiring passage 32 formed in the wiring passage 32 and the wiring passage 32 formed in the electrode layer 31A located at the intersection of the x1 and yd rows pass through the inside and linearly extend in the Y direction to reach the wiring region H.

  The second wiring layers 35a are electrically connected to the respective second electrode layers 31 (31A) constituting the second electrode row 30 positioned in the x1 row, and the second wiring layers 35b, 35c, 35d are Each of the second electrode layers 31 (31A) constituting the second electrode row 30 located in the x2, x3 and x4 rows is electrically connected.

  The second wiring layers 35 a, 35 b, 35 c and 35 d are all integrally formed with the second electrode layer 31 by a translucent conductive material constituting the second electrode layer 31.

  FIG. 4 shows the cross-sectional structure of the second electrode layer 31A located at the intersection of the x3 and yd columns.

The second electrode layer 31 </ b> A is divided into divided electrode layers 33 and 33 by the wiring passage 32. A second insulating layer 43 is formed on the wiring path 32 and the second wiring layer 35d, and a second bridge connection layer 44 is formed thereon. The divided electrode layers 33, 33 divided by the wiring passage 32 are connected by the second bridge connection layer 44, whereby the entire second electrode layer 31A can function as one electrode layer. There is.
This is the same in all the second electrode layers 31A provided elsewhere.

  The second insulating layer 43 shown in FIG. 4 is formed of the same material and in the same process as the first insulating layer 32 shown in FIG. The second bridge connection layer 44 shown in FIG. 4 is formed of the same material and in the same process as the first bridge connection layer 42 shown in FIG.

  In the manufacturing process of the input device 10, a material in which a translucent conductive material such as ITO is formed on the surface of the substrate 11 is used, and this conductive material is etched to form the first electrode array 20, the second electrode A column 30, first wiring layers 25a, 25b, 25c and second wiring layers 35a, 35b, 35c, 35d are formed.

  Thereafter, a resin layer of novolak resin and acrylic resin is formed on the substrate 11, and the first insulating layer 41 and the second insulating layer 43 are simultaneously patterned in the photolithography process. Furthermore, a laminate for the bridge connection layer is formed, and the first bridge connection layer 42 and the second bridge connection layer 44 are simultaneously formed by the etching process.

  In the input device 10 shown in FIG. 2, the display image of the display panel 5 can be viewed from outside through the input device 10 and the front panel 2. By touching the front panel 2 with a finger while watching this display, the input device 10 can be operated.

  The input device 10 has a capacitance formed between the first electrode array 20 and the second electrode array 30. Pulsed drive power is sequentially applied to one of the first electrode array 20 and the second electrode array 30, and a detection current flowing through the other electrode array is detected when the drive power is applied. Be done. When the finger approaches, a capacitance is formed between the finger and the electrode layer, so that the detection current changes. By detecting the change in the detection current, it is possible to detect which part of the front panel 2 the finger is approaching.

  Since the second electrode layer 31A has the wiring passage 32 penetrating in the Y direction, the area is substantially smaller than that of the electrode layer not having the wiring passage 32, and in the detection operation, each electrode layer The sensitivity may vary. Therefore, in the embodiment shown in FIG. 2, the opening 31b is formed in the second electrode layer 31 in which the wiring passage 32 is not formed, and the second electrode layer 31A having the wiring passage 32 and the wiring passage 32 are formed. The difference in area does not occur so much with the second electrode layer 31 which is not provided.

  Furthermore, the opening 21b is also formed in the first electrode layer 21 so that the difference in area between the first electrode layer 21 and the second electrode layer 31A is not largely different.

  In the input device 10, second wiring layers 35a, 35b, 35c and 35d extend in the Y direction through the inside of the wiring passage 32 formed in the second electrode layer 31A. Since the second wiring layers 35b, 35c, 35d are sandwiched between the divided electrode layers 33, 33 of the second electrode layer 31A on both sides in the X direction, the second wiring layers 35b, 35c, 35d, The region where the first electrode layer 21 is adjacent can be reduced, and the electrostatic coupling between the second wiring layers 35 b, 35 c, 35 d and the first electrode layer 21 can be reduced. Therefore, it is possible to suppress that the routed portions of the second wiring layers 35b, 35c and 35d have an extra sensitivity, and the original detection output detected between the first electrode array 20 and the second electrode array 30. Noise is less likely to be superimposed, and it is possible to improve detection accuracy.

  Further, since the second wiring layers 35b, 35c, and 35d pass through the inside of the second electrode layer 31A, a path for passing the second wiring layer is formed between the adjacent electrode layers. There is no need. Therefore, the arrangement of the electrode layers 21 and 31 is not restricted due to the routing of the second wiring layer, and for example, the electrode layers 21 and 31 can be arranged close to each other, and the detection operation can be performed. It is possible to increase the resolution.

  FIG. 5 is a partial plan view showing the arrangement of electrodes of the input device 110 according to the second embodiment of the present invention. 5, the same components as in the first embodiment shown in FIG. 2 are assigned the same reference numerals and detailed explanations thereof will be omitted.

  In the input device 110 shown in FIG. 5, the second wiring layer 35a is integrally formed with the second electrode layer 31A located at the intersection of the x1 and ya columns. A wiring passage 32 is formed in the second electrode layer 31A, and a second wiring layer 35b passing through the inside of the wiring passage 32 is located at the intersection of the x2 column and the ya column. It is integrally formed with 31.

  In the wiring path 32 formed in the second electrode layer 31A located at the intersection of the x1 and yb columns and in the wiring path 32 formed in the second electrode layer 31A located at the intersection of the x2 and yb columns , And two second wiring layers 35c and 35d pass through. One second wiring layer 35c is integrally formed with the second electrode layer 31A located at the intersection of the x3 and yb columns. The other second wiring layer 35d passes through the inside of the wiring path 32 of the second electrode layer 31A located at the intersection of the x3 and yb columns, and the second electrode located at the intersection of the x4 and yb columns It is integrally formed with the layer 31.

  The second electrode layers 31A located at the intersection of the x1 and yb columns and the second electrode layers 31A located at the intersection of the x2 and yb columns have the second wiring layers 35c and 35d in the wiring passage 32. Since two are passed, the second insulating layer 43 and the second bridge connection layer 44 for connecting the left and right divided electrode layers 33, 33 straddle the two second wiring layers 35c, 35d. It is formed as.

  In the input device 10 according to the first embodiment shown in FIG. 2, only one second wiring layer passes through the wiring passage 32 formed in the second electrode layer 31A. For example, 31 (31A) can not be configured unless the number of arrays in the X direction and the number of arrays in the Y direction are the same. On the other hand, in the second embodiment shown in FIG. 5, two or more second wiring layers pass through the wiring passage 32 of the second electrode layer 31A, so the second electrode layer The arrangement number 31 (31A) can be configured so that the Y direction is larger than the X direction.

  FIG. 6 is a partial plan view showing the arrangement of electrodes of an input device 210 according to a third embodiment of the present invention. Hereinafter, only differences from the input device 110 according to the second embodiment shown in FIG. 5 will be described.

  In the input device 210 shown in FIG. 6, two wiring paths are formed in the second electrode layer 31A located at the intersection of the x1 and yb columns and the second electrode layer 31A located at the intersection of the x2 and yb columns 32, 32 are formed separately. The second wiring layer 35 c passes through the inside of one wiring passage 32, and the second wiring layer 35 d passes through the inside of the other wiring passage 32.

  In the second electrode layer 31A, since two wiring paths 32 are formed, the electrode layer is divided into three divided electrode layers 33, 33, and 33. Then, in each of the wiring paths 32, a second insulating layer 43 and a second bridge connection layer 44 which straddle the second wiring layer are formed.

  In the second electrode layer 31A located at the intersection of the x2 column and the yb column, the second insulating layer 43 covering the one wiring passage 32, the second bridge connection layer 44, and the other wiring passage 32 are covered. The second insulating layer 43 and the second bridge connection layer 44 are formed at a distance in the Y direction. This makes it easy to prevent the phenomenon in which the two sets of the second insulating layer 43 and the second bridge connection layer 44 arranged in close proximity are visually observed as if they are integrated.

FIG. 7 shows a variant of the invention.
The second electrode layer 31A is shown in FIG. In the second electrode layer 31A, segment electrode layers 33 and 33 divided in the X direction are connected by a connecting portion 37. The segment electrode layers 33 and 33 and the connecting portion 37 are integrally formed of the same conductive material. The wiring paths 32 and 32 are divided in the Y direction with the connecting portion 37 interposed therebetween. The second wiring layers 35 e and 35 e are disposed in the wiring paths 32 and 32, but are separated by sandwiching the connection portion 37.

In this configuration, the second insulating layer 45 covering the connecting portion 37 and the second bridge connection layer 46 are formed to extend in the Y direction, and the second bridge layer 46 separates the second insulating layer 45 and the second bridge connection layer 46 from each other. The wiring layers 35 e and 35 e are connected to each other and conducted.
FIG. 8 shows an input device 310 according to a fourth embodiment of this invention.

  In the input device 10 according to the first embodiment shown in FIG. 2, the second wiring layer 35d extending in the Y direction from the second electrode layer 31 located at the intersection of the x4 and yd columns is xa, When passing each column of xb, xc, xd, it faces the corner of each of the plurality of first electrode layers 21 positioned in the right direction. The second wiring layer 35c, when passing each column of xa, xb, and xc, faces each corner of the first electrode layer 21 positioned on both sides in the X direction. The second wiring layer 35b, when passing each column of xa and xb, faces each corner of the first electrode layer 21 located on both sides thereof. The second wiring layer 35a faces the corner of the first electrode layer 21 when passing through the xa column.

  Therefore, at the portion where the second wiring layers 35a, 35b, 35c, 35d and the corner portion of the first electrode layer 21 face each other, a capacitance is formed between the two layers. In the second wiring layer 35b, the locations facing the corner portions of the first electrode layer 21 increase more than in the case 35a, and this increases in the order of the second wiring layers 35c, 35d,. The portion where one second wiring layer and the corner portion of one first electrode layer 21 face has a slight length, and the capacitance does not increase so much at that portion, but the second wiring As the layer 35 d and so on increase in the number of locations facing the corner of the first electrode layer 21, the accumulated value of the capacitance may be increased, and the detection noise may be slightly increased.

  Therefore, in the input device 310 according to the fourth embodiment shown in FIG. 8, the intersection between each column of ya, yb, yc, yd and the column xa, the intersection between each column of yb, yc, yd, the column xb Between the second wiring layers 35a, 35b, 25c, 25d and the first electrode layer 21 at the intersection of each column of yc and yd with the column xc and the intersection of yd and column xd The protective layer 51 is formed on the

  The protective layer 51 is formed of the same translucent conductive material as the first electrode layer 21 and the second electrode layer 31. Although the shape of the protective layer 51 is not particularly limited, in the embodiment shown in FIG. 8, the second wiring layers 35a and 35b are formed such that the protective layer 51 is rectangular and the long sides extend in the Y direction. , 35c and 35d.

  The plurality of protective layers 51 are independent of each other, and are separated without being connected to any of the first electrode layer 21 and the second electrode layer 31 and the second wiring layers 35a, 35b, 35c, and 35d. ing. By providing this protective layer 51, the electrostatic capacitance between the second wiring layers 35a, 35b, 35c, 35d and the first electrode layer 21 can be reduced.

  FIG. 9 shows a modification of the protective layer provided in the input device 310 of the fourth embodiment.

  The protective layer 55 shown in FIG. 9 has a straight portion 55 a interposed between the second wiring layer 35 c and the first electrode layer 21 and two sides of the first electrode layer 21 facing in the X direction. It has the inclined part 55b extended diagonally with respect to both of a Y direction. In this modification, the portion of the first electrode layer 21 facing the second wiring layer 35c is surrounded by the protective layer 55, so that the first electrode layer 21 and the second wiring layer 35c It is possible to further reduce the capacitance between them.

An input device 410 according to a fifth embodiment of the present invention is shown in FIG.
In the fifth embodiment, the protective layer 52 located between the second wiring layer 35c and the first electrode layer 21 is continuous with the second electrode layer 31 or 31A located closest to this. It is formed. In this embodiment, since the protective layer 52 is always at the same potential as the second electrode layer 31 or 31A located at a position close to this, the protective layer 52 can be prevented from being individually charged. The effect of reducing the capacitance between the wiring layer and the first electrode layer 21 can be enhanced.

  FIG. 11 shows an input device 510 according to a sixth embodiment of the present invention. In FIG. 11, only the second electrode layers 31 and 31A and the second wiring layer 35c located in the yc column are extracted and enlarged.

  In the sixth embodiment, protective layers 53 disposed between the second wiring layer 35 c and the first electrode layer 21 are connected by the protective connection layer 54. The protective connection layer 54 passes through the inside of the wiring passage 32 together with the second wiring layer 35 c. Thus, the second insulating layer 43 and the second bridge connection layer 44 are formed to cover both the second wiring layer 35 c and the protective connection layer 54.

  In the sixth embodiment, since the plurality of protective layers 53 can be set to the same potential, it is possible to avoid that the plurality of protective layers 53 are individually charged and the protective layers 53 have different potentials. The effect of reducing the capacitance can be enhanced.

An input device 610 according to a seventh embodiment of the present invention is shown in FIG.
Similar to the input device 110 according to the second embodiment shown in FIG. 5, the input device 610 according to the seventh embodiment has intersections between x1 and yb and intersections between x2 and yb. Two wiring layers 35c and 35d pass through the wiring passage 32 of the second electrode layer 31A located at the position of the second wiring layer 31A. Similarly, also in the yc column, yd column, ye column,..., There is a portion where two second wiring layers pass through the second electrode layer 31A.

  In the input device 610, the opening 21b is formed in the first electrode layer 21 and the opening 31b is formed in the second electrode layer 31 as in the input device 10 according to the first embodiment shown in FIG. It is formed. Then, at the intersection of each column of xa, xb, xc, ... with each column of ya, yb, yc, ..., both sides of the two second wiring layers are A protective layer 51 is formed at a portion opposed to the electrode layer 21 of FIG. The protective layer 51 is formed independently of the first electrode layer 21 and the second electrode layers 31 and 31A.

  In the embodiment shown in FIG. 12, in each row of xa, xb, xc,..., Two second wiring layers pass between the first electrode layers 21 adjacent in the X direction. However, by forming the protective layer 51 between the two wiring layers and the first electrode layer 21, the second wiring layers 35a, 35b, 35c,... And the first electrode layer 21 It is possible to reduce the capacitance between

FIG. 13 is a simulation result showing the effect of the protective layer 51.
This simulation compares the input device 610 of the seventh embodiment having the protective layer 51 shown in FIG. 12 with the input device 110 of the second embodiment having no protective layer shown in FIG. is there. FIG. 13A shows the result of the input device 610 having the protective layer 51, and FIG. 13B shows the result of the input device 110 having no protective layer 51.

  In the simulation, one side of each of the first electrode layer 21 and the second electrode layer 31 is 3 mm, and the width dimension of the second wiring layers 35a, 35b, ... is 45 μm, as shown in FIG. The distance δ in the X direction between the second wiring layer and the corner of the first electrode layer 21 when the layer 51 was not provided was set to 30 μm. The distance is the same value in all parts of the facing portions of the second wiring layer and the first electrode layer 21. The protective layer 51 has a width of 500 μm in the X direction and a length of 1.2 mm in the Y direction. Furthermore, the openings 21 b and 31 b were 3 mm × 0.18 mm.

  In the simulation shown in FIG. 13, the first electrode row 20 is 12 rows from y1 to y12, and the second electrode row 30 is 21 rows from x1 to x21.

  In the detection operation using this input device, the first electrode row 20 is selected as a drive electrode in the order of y1, y2, y3,... And a drive voltage is applied in order. While the first electrode row 20 of y1 is selected as the drive electrode, the second electrode row 30 is selected in the order of x1, x2, x3,... The output is detected in the order of the column of x3,. Next, while the first electrode row 20 of y2 is selected as the drive electrode, the second electrode row 30 is selected in the order of x1, x2, x3,. Be done. By advancing this in the order of y3, y4, y5, ..., it becomes possible to detect the position at which the finger approaches the front panel 2 on the XY coordinates.

  In the simulation shown in FIG. 13, while the first electrode row 20 of y1 is selected as a drive electrode, the second electrode row 30 is used as a detection electrode in the order of x1, x2, x3, x4,. The capacitances between the second electrode row 30 selected and in the order of x1, x2, x3, x4,... Next, while the first electrode row 20 of y2 is selected as a drive electrode, each second electrode row 30 of x1, x2, x3, x4,... Is sequentially selected as a detection electrode. The capacitances between the second electrode row 30 and the electrode row 20 of y1 rows selected in order were respectively determined. It is the result of repeating this in the order of y3, y4, y5, ..., y12.

  In both FIGS. 13A and 13B, the horizontal axis indicates the rows x1, x2, x3,..., X21 of the second electrode row 30 sequentially selected as the detection electrodes. The vertical axis represents the first electrode row 20 of each row of y1, y2, y3,..., Y12 selected as drive electrodes, and the respective rows of x1, x2, x3,. The capacitance (unit: pF) between the second electrode row 30 is shown.

  In the simulation result in which the protective layer 51 is provided as shown in FIG. 13A, assuming that the first electrode row 20 in the y12 row is a drive electrode and the second electrode row 30 in the X21 row is a detection electrode, The capacitance between both electrode rows was the maximum value CA, and CA was 0.88 pF. On the other hand, as shown in FIG. 13B, in the simulation result in which the protective layer 51 is not provided, the first electrode row 20 in the y12 row is used as a drive electrode, and the second electrode row 30 in the X21 row is detected. The capacitance between the two electrode rows was the maximum value CB, and CB = 1.07 pF.

  By providing the protective layer 51, the maximum value of the accumulated value of the capacitance between the second wiring layer and the first electrode layer 21 can be improved by about 18%.

DESCRIPTION OF SYMBOLS 1 touch panel 2 front panel 5 display panel 10 input device 11 substrate 20 1st electrode row 21 1st electrode layer 21b opening part 22 connection part 25a, 25b, 25c 1st wiring layer 30 2nd electrode row 31, 31A Second electrode layer 31 b Opening 32 Wiring passage 33 Sectioned electrode layers 35 a, 35 b, 35 c, 35 d Second wiring layer 37 Connecting portion 41 First insulating layer 42 First bridge connection layer 43 Second insulating layer 44 Second bridge connection layer 51, 52, 53, 55 Protective layer 54 Protective connection layer 110, 210, 310, 410, 510, 610 Input device H Wiring area

Claims (13)

A first electrode layer and a second electrode layer formed of a light-transmitting conductive material are formed on a light-transmitting substrate, and a plurality of the first electrode layers are arranged in a first direction. An input device in which the second electrode layers of the first and second electrode layers are aligned in a second direction crossing the
A connecting portion connecting the first electrode layer and one of the second electrode layers is integrally formed of the translucent conductive material, and a first insulating layer is formed on the connecting portion. A layer and a first bridge connection layer are formed in an overlapping manner, and the other electrode layers are conducted by the first bridge connection layer,
The plurality of the second electrode layer, therein having a wire channel extending in a first direction, includes those having two sections electrode layer divided by the wire channel,
A wiring layer passing through the inside of the wiring passage conducts to the other second electrode layer,
A second insulating layer and a second bridge connection layer are formed on the wiring layer , and the two divided electrode layers are conducted by the second bridge connection layer,
An opening is formed in a region of the second electrode layer in which the wiring passage is not formed. A first electrode layer and a second electrode layer formed of a light-transmitting conductive material are formed on a light-transmitting substrate, and a plurality of the first electrode layers are arranged in a first direction. An input device in which the second electrode layers of the first and second electrode layers are aligned in a second direction crossing the first direction;
A connecting portion connecting the first electrode layer and one of the second electrode layers is integrally formed of the translucent conductive material, and a first insulating layer is formed on the connecting portion. A layer and a first bridge connection layer are formed in an overlapping manner, and the other electrode layers are conducted by the first bridge connection layer,
In the plurality of second electrode layers, two segment electrode layers adjacent to each other in the second direction, a second connection portion connecting the two segment electrode layers, and the two segment electrode layers Divided in the first direction by the second connecting portion at
And including wiring paths, and
One of the wiring layers positioned in the wiring passage divided in the first direction by the second connecting portion is electrically connected to the other second electrode layer,
A second insulating layer and a second bridge connection layer are formed on the second connection portion, and the wiring layers are positioned to sandwich the second connection portion by the second bridge connection layer. It has been conducted,
An opening is formed in a region of the second electrode layer in which the wiring passage is not formed. The has a wiring passage through a plurality of the wiring layers, the input device according to claim 1, wherein each of the wiring layers are electrically connected to different ones of the second electrode layer. The input device according to claim 2, wherein a plurality of the wiring layers extend side by side in the wiring passage, and the respective wiring layers are electrically connected to the different second electrode layers. The input device according to any one of claims 1 to 4, wherein an opening is also formed in the region of the first electrode layer. The input device according to any one of claims 1 to 5 , wherein the wiring passage is formed at a central portion dividing the second electrode layer in a second direction. A first electrode layer and a second electrode layer formed of a light-transmitting conductive material are formed on a light-transmitting substrate, and a plurality of the first electrode layers are arranged in a first direction. An input device in which the second electrode layers of the first and second electrode layers are aligned in a second direction crossing the
A connecting portion connecting the first electrode layer and one of the second electrode layers is integrally formed of the translucent conductive material, and a first insulating layer is formed on the connecting portion. A layer and a first bridge connection layer are formed in an overlapping manner, and the other electrode layers are conducted by the first bridge connection layer,
The plurality of second electrode layers includes a plurality of wiring passages extending in the first direction in the inside, and includes a plurality of divided electrode layers divided by the wiring passages,
A wiring layer passing through each of the wiring paths conducts to the other second electrode layer ,
A second insulating layer and a second bridge connection layer are formed on each of the wiring layers , and adjacent ones of the divided electrode layers are conducted by the second bridge connection layer. An input device characterized by A first electrode layer and a second electrode layer formed of a light-transmitting conductive material are formed on a light-transmitting substrate, and a plurality of the first electrode layers are arranged in a first direction. An input device in which the second electrode layers of the first and second electrode layers are aligned in a second direction crossing the first direction;
A connecting portion connecting the first electrode layer and one of the second electrode layers is integrally formed of the translucent conductive material, and a first insulating layer is formed on the connecting portion. A layer and a first bridge connection layer are formed in an overlapping manner, and the other electrode layers are conducted by the first bridge connection layer,
In the plurality of second electrode layers, a plurality of segment electrode layers adjacent to each other in the second direction, a second connection portion connecting adjacent ones of the plurality of segment electrode layers, and the segments adjacent to each other Wiring vias divided in the first direction by the respective second connection portions between the electrode layers,
One of the wiring layers positioned in the wiring passage divided in the first direction by the second connecting portion is electrically connected to the other second electrode layer,
A second insulating layer and a second bridge connection layer are formed on the second connection portion, and the wiring layers are positioned to sandwich the second connection portion by the second bridge connection layer. An input device characterized in that it is conducted. A first electrode layer and a second electrode layer formed of a light-transmitting conductive material are formed on a light-transmitting substrate, and a plurality of the first electrode layers are arranged in a first direction. An input device in which the second electrode layers of the first and second electrode layers are aligned in a second direction crossing the
A connecting portion connecting the first electrode layer and one of the second electrode layers is integrally formed of the translucent conductive material, and a first insulating layer is formed on the connecting portion. A layer and a first bridge connection layer are formed in an overlapping manner, and the other electrode layers are conducted by the first bridge connection layer,
The plurality of second electrode layers include a wiring passage extending in the first direction in the inside thereof, and one including two divided electrode layers divided by the wiring passage,
A wiring layer passing through the inside of the wiring passage conducts to the other second electrode layer,
A second insulating layer and a second bridge connection layer are formed on the wiring layer , and the two divided electrode layers are conducted by the second bridge connection layer,
The wiring layer passes a region facing the first electrode layer, and a protective layer formed of a conductive material is provided between the first electrode layer and the wiring layer at this position. An input device characterized by A first electrode layer and a second electrode layer formed of a light-transmitting conductive material are formed on a light-transmitting substrate, and a plurality of the first electrode layers are arranged in a first direction. An input device in which the second electrode layers of the first and second electrode layers are aligned in a second direction crossing the first direction;
A connecting portion connecting the first electrode layer and one of the second electrode layers is integrally formed of the translucent conductive material, and a first insulating layer is formed on the connecting portion. A layer and a first bridge connection layer are formed in an overlapping manner, and the other electrode layers are conducted by the first bridge connection layer,
In the plurality of second electrode layers, two segment electrode layers adjacent to each other in the second direction, a second connection portion connecting the two segment electrode layers, and the two segment electrode layers And a wiring passage divided in the first direction by the second connection portion.
One of the wiring layers positioned in the wiring passage divided in the first direction by the second connecting portion is electrically connected to the other second electrode layer,
A second insulating layer and a second bridge connection layer are formed on the second connection portion, and the wiring layers are positioned to sandwich the second connection portion by the second bridge connection layer. It has been conducted,
The wiring layer passes a region facing the first electrode layer, and a protective layer formed of a conductive material is provided between the first electrode layer and the wiring layer at this position. An input device characterized by The input device according to claim 9 , wherein the protective layer is formed of the same translucent conductive material as the first electrode layer. The input device according to claim 9 , wherein a protective connection layer connecting the protective layers which are spaced apart in the first direction passes through the wiring passage. The input device according to any one of claims 9 to 12, wherein the protective layer is formed continuously with the second electrode layer.

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