JP2016146153A - Input device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an input device that can enlarge the area of a display region (input region) by reducing the wiring region at the edge of a substrate, can suppress a phenomenon in which an unnecessary sensitivity is generated between a wiring layer and an electrode layer, and further can keep the display quality satisfactory.SOLUTION: A plurality of first electrode layers 21 are interconnected by a connection unit 22 and formed continuously in the Y direction, and second electrode layers 31 are formed mutually independently and arranged in the X direction. Second wiring layers 35a-35d are integrally formed in the second electrode layers 31, and each second wiring layer extends in the Y direction through a wiring passage 32 formed in a second electrode layer 31A. A distance can be kept between the second wiring layers and the first electrode layers 21, so that it can be suppressed that the second wiring layers and the first electrode layers 21 have unnecessary sensitivities.SELECTED DRAWING: Figure 2

Description

  The present invention relates to an input device in which a plurality of light-transmitting first electrode layers and second electrode layers are formed on the same surface of a light-transmitting substrate.

  A portable electronic device or the like is provided with an input device that detects capacitance, and this input device is disposed in front of a display panel such as a color liquid crystal panel.

  In the input device, a plurality of translucent electrode layers are formed on a translucent substrate, and the electrode layers are connected in the second direction with the first electrode layer connected in the first direction. And a second electrode layer. When driving power is applied to one of the first electrode layer and the second electrode layer, a detection output is obtained from the other electrode layer, and the location of the input device near the finger or the like is determined. It can be detected.

  In this type of input device, there is one in which both the first electrode layer and the second electrode layer are formed on the same surface of one substrate so that the number of substrates can be reduced and the thickness can be reduced.

  In this input device, a first wiring layer (lead layer) connected to the first electrode layer and a second wiring layer (lead layer) connected to the second electrode layer are formed on the surface of the substrate. However, since the first electrode layer is connected in the first direction and the second electrode layer is connected in the second direction, the first wiring layer is connected to the first of the substrate. It is necessary to route at the edge in one direction and route the second wiring layer at the edge in the second direction of the substrate. If a wiring region is formed on two sides of the substrate that are orthogonal to each other, this wiring region becomes a dead region that does not function as a detection region. Further, when the input device is attached to the front panel, it is necessary to cover the wiring area with a decorative layer, and there is a problem that the display area of the display panel is narrowed by the provision of the decorative layer.

  In the touch screen panel described in Patent Document 1, a second sensing electrode continuous in the Y direction and a second connection pattern for connecting the second sensing electrodes in the Y direction are integrally formed, and both sides of the second connection pattern are formed. The first sensing electrodes arranged in the X direction are formed independently of each other. Further, the drive pattern passes between the first sensing electrode and the second sensing electrode and continuously extends in the Y direction. The second connection pattern and the drive pattern are covered with an insulating layer, and the first detection electrodes adjacent in the X direction are connected to each other by the first connection pattern formed on the insulating layer.

  The touch screen panel includes a driving wiring connected to the second sensing electrode when the driving pattern passes below the first connection pattern, and a driving wiring connected to the first sensing electrode via the driving pattern. Can be pulled out only to the edge of the substrate facing in the Y direction.

  In the touch panel described in Patent Document 2, a plurality of first electrodes arranged in the X direction and a first conductive wire that connects the first electrodes are integrally formed on the surface of the substrate. An opening is formed in each first electrode, and second electrodes are formed independently of each other inside the opening. An insulating layer is formed on the first electrode, a second conductor is formed on the insulating layer, and second electrode layers adjacent in the Y direction are connected to each other by the second conductor.

  Conductive segments extending in the Y direction are provided on the surface of the substrate, and each conductive segment is connected to the first conductive line, but at the intersection of the first conductive line and the conductive segment that should not be connected, The insulating layer is formed on the surface of the first conducting wire, and the conductive segments are connected to each other through a third conducting wire formed on the insulating layer.

  In this touch panel, since the conductive segment connected to the first electrode conducting in the X direction extends in the Y direction, the lead wire connected to the first electrode and the second electrode are connected. The lead wire can be routed only to the edge of the substrate in the Y direction.

JP 2012-150782 A JP 2013-143131 A

  In the touch screen panel described in Patent Document 1, the drive pattern that conducts to the first sensing electrode passes through a position close to the side of the second sensing electrode. Therefore, an electrostatic capacitance is formed between the drive pattern and the second sensing electrode, and a facing portion between the drive pattern and the second sensing electrode becomes a sensitivity region. When a finger or the like approaches, a detection output is generated between the driving pattern and the second sensing electrode, and this output detects the change in capacitance between the first sensitivity electrode and the second sensitivity electrode. Is superimposed on the detected output as detection noise.

  The touch panel described in Patent Document 2 functions as a wiring layer (lead layer) in which the conductive segment conducting to the first electrode extends in the Y direction. The conductive segment is located in the opening. Since it is away from the second electrode, the electrostatic coupling between the conductive segment and the second electrode is weakened, and the problem that the region that should not originally have sensitivity as described in Patent Document 1 is less likely to occur.

  However, in the touch panel described in Patent Document 2, since the conductive segment extending in the Y direction passes between the first electrodes adjacent in the X direction, the first electrode adjacent in the X direction is connected to the conductive segment. Therefore, it is necessary to dispose the electrodes apart from each other, making it difficult to arrange the electrodes densely.

  Moreover, since the complicated structure of arrange | positioning a 2nd electrode in the opening part formed in the 1st electrode is employ | adopted, the number of the 2nd conducting wires which connect the 2nd electrode is set. It is necessary to provide two locations for each first electrode. Therefore, when the number of electrodes is increased, the number of second conductive wires and the number of insulating blocks formed under the second conductive wires are increased, and many second conductive wires are displayed when a display panel provided behind is displayed. Insulating blocks are easy to see and become conspicuous, and display quality tends to be impaired.

  SUMMARY OF THE INVENTION The present invention solves the above-described conventional problems, and reduces the wiring area at the edge of the substrate so that the area of the display area (input area) can be increased, and is not required between the wiring layer and the electrode layer. An object of the present invention is to provide an input device that can suppress a phenomenon in which a high sensitivity is formed and can maintain a good display quality.

In the present invention, a first electrode layer and a second electrode layer formed of a light-transmitting conductive material are formed on a light-transmitting substrate, and the plurality of first electrode layers are in a first direction. In the input device, the plurality of second electrode layers are arranged in a second direction intersecting the first direction,
A connecting portion for connecting any one of the first electrode layer and the second electrode layer is integrally formed of the light-transmitting conductive material, and a first insulating layer is formed on the connecting portion. A layer and a first bridge connection layer are overlapped, and the other electrode layer is electrically connected by the first bridge connection layer,
A wiring passage extending in the first direction is formed inside the second electrode layer, and the wiring layer passing through the wiring passage is electrically connected to the other second electrode layer,
One of the segmented electrode layer obtained by dividing the second electrode layer by the wiring path and the wiring layer is continuous in the wiring path, and the second insulating layer and the second layer are formed on the continuous portion. The bridge connection layer is formed, and the other layer is electrically connected by the second bridge connection layer.

  In the input device according to the present invention, since the wiring layer conducting to the second electrode layer passes through the wiring passage formed in the second electrode layer, the electrostatic capacitance between the wiring layer and the first electrode layer is reduced. Coupling can be weakened, and an unnecessary sensitivity region can be prevented from being formed between the wiring layer and the first electrode layer.

  Further, since the wiring layer passes through the inside of the second electrode layer, it is not necessary to form a passage for drawing the wiring layer in the first direction outside the second electrode layer. Therefore, the arrangement pitch of the second electrode layer can be appropriately set regardless of the presence of the wiring layer.

  In the present invention, it is preferable that an opening is formed in a region of the second electrode layer where the wiring passage is not formed. Moreover, it is preferable that an opening is formed in the region of the first electrode layer.

  In the above invention, it is possible to prevent a large difference in the area of the electrode layer between the second electrode layer having the wiring passage and the other electrode layer having no wiring passage, and the sensitivity of each electrode layer can be prevented. It becomes easy to align.

  The input device of the present invention can be configured such that a plurality of the wiring layers pass through the wiring passage, and each of the wiring layers is electrically connected to a different second electrode layer.

  Alternatively, a plurality of the wiring passages are formed in the second electrode layer, the wiring layers pass through the respective wiring passages, and the respective wiring layers are electrically connected to different second electrode layers. Can be configured.

  In the input device according to the aspect of the invention, it is preferable that the wiring passage is formed in a central portion that bisects the second electrode layer in the second direction.

  In the above configuration, the distance between each of the first electrode layers located on both sides of the second electrode layer and the wiring layer can be evenly separated.

  In the input device of the present invention, the first insulating layer and the second insulating layer are formed of the same material and in the same process, and the first bridge connection layer and the second bridge connection layer are formed of the same material. Preferably, they are formed in the same process.

  For example, in the input device of the present invention, the first electrode layer and the second electrode layer are quadrangular, and the corners of the quadrilateral are directed in the first direction and the second direction.

  In the input device according to the present invention, the wiring layer passes through a region facing the first electrode layer, and the conductive layer is interposed between the first electrode layer and the wiring layer at this position. A protective layer made of a material is preferably provided.

  In this case, it is preferable that the protective layer is formed of the same translucent conductive material as the first electrode layer.

  Moreover, the protective connection layer which connects the said protective layers arrange | positioned at intervals in the 1st direction can be comprised as what has passed the inside of the said wiring channel | path.

  Furthermore, the protective layer can be configured as being formed continuously with the second electrode layer.

  In the input device according to the present invention, since the wiring layer conducting to the second electrode layer passes through the wiring passage formed in the second electrode layer, the wiring layer and the first electrode layer are separated from each other. As a result, it becomes difficult to form an unnecessary sensitivity region between the wiring layer and the first electrode layer, and the detection accuracy can be increased.

  Further, since the wiring layer passes through the inside of the second electrode layer, it is not necessary to form a passage for drawing the wiring layer in the first direction outside the second electrode layer. Therefore, it becomes easy to arrange the second electrode layer regardless of the presence of the wiring layer, and for example, the arrangement pitch of the second electrode layer can be set appropriately.

  Furthermore, by forming a protective layer between the first electrode layer and the wiring layer, the capacitance between the first electrode layer and the wiring layer can be reduced, and detection noise can be reduced.

The exploded perspective view of the touch panel using the input device of an embodiment of the invention, The top view which shows arrangement | positioning of the electrode of the input device of the 1st Embodiment of this invention, The expanded sectional view which cut | disconnected the input device shown in FIG. 2 by the III-III line | wire, The expanded sectional view which cut | disconnected the I arrow part of the input device shown in FIG. 2 by the IV-IV line, The partial top view which shows arrangement | positioning of the electrode of the input device of the 2nd Embodiment of this invention, The fragmentary top view which shows arrangement | positioning of the electrode of the input device of the 3rd Embodiment of this invention, The enlarged plan view of the 2nd electrode layer which shows the modification of this invention, The top view which shows the electrode layer and protective layer of the input device of the 4th Embodiment of this invention, The partial top view which shows the modification of the protective layer of the input device of the said 4th Embodiment, The fragmentary top view which shows the electrode layer and protective layer of the input device of the 5th Embodiment of this invention, The elements on larger scale which show the electrode layer and protective layer of the input device of the 6th Embodiment of this invention, The elements on larger scale which show the electrode layer and protective layer of the input device of the 7th Embodiment of this invention, Line showing the difference in capacitance between the wiring layer and the first electrode layer in the embodiment with the protective layer (seventh embodiment) and the embodiment without the protective layer Figure,

  A touch panel 1 is shown in FIG. The touch panel 1 includes a front panel 2 and an input device 10 of the present invention located below the front panel 2.

  The front panel 2 constitutes a part of a case of various electronic devices such as a mobile phone, a navigation device, a game device, and a communication device. The front panel 2 is formed of a transparent synthetic resin material such as acrylic or glass, and the inside of the device can be seen through from the outside of the front panel 2.

  The input device 10 has a translucent substrate 11. The substrate 11 is a resin sheet such as PET (polyethylene terephthalate). The front panel 2 and the input device 10 are bonded via OCA (transparent adhesive).

  In the input device 10, the Y direction is the first direction and the X direction is the second direction. As shown in FIGS. 1 and 2, the input device 10 is provided with a wiring region H only on one edge 10 y side in the first direction (Y direction), and a region other than the wiring region H is a detection region. S. A display panel 5 such as a color liquid crystal panel is housed in the case of the electronic device, and the display screen of the display panel 5 is viewed from the outside through the front panel 2 and the detection region S of the input device 10. Is possible. Therefore, the detection area S is also a display area.

  In FIG. 2 and subsequent figures, the input device 10 is shown in a posture in which the wiring region H is directed upward in the drawing. In the input device 10, since the wiring region H is not formed in the edge portion 10 x facing the second direction (X direction), the detection region (display region) S is positioned very close to the edge portion 10 x of the input device 10. The dead space for wiring can be eliminated.

  As shown in FIG. 2, a first electrode array 20 extending in the first direction (Y direction) and a second electrode array 30 extending in the second direction (X direction) are formed on the common surface of the substrate 11. Is formed.

  In the first electrode array 20, a plurality of first electrode layers 21 and a first electrode layer 21 and a connecting portion 22 that connects (connects) the first electrode layers 21 in the Y direction are integrally formed. The column 20 is provided in three columns y1, y2, and y3. This number is selected according to the area of the input device 10.

  The first electrode layer 21 is a square (or rhombus), the corners of the square are oriented in the X direction and the Y direction, and the connecting part 22 is a corner of the first electrode layer 21 adjacent in the Y direction. The parts are linked together.

  The second electrode rows 30 are regularly arranged at an equal pitch in the X direction along the four rows x1, x2, x3, and x4, and along each row of ya, yb, yc, and yd. They are regularly arranged in the Y direction at an equal pitch. The number of columns in the X direction and the Y direction is selected according to the area of the input device 10. The second electrode layer 31 is a square (or rhombus), and each corner is directed in the X direction and the Y direction. The square sides of the first electrode layer 21 and the second electrode layer 31 have the same size.

  Some of the second electrode layers 31 have a wiring passage 32 formed at the center thereof. Reference numeral 31A is attached to the second electrode layer in which the wiring passage 32 is formed, and the wiring passage 32 is formed. It is distinguished from the second electrode layer 31 which does not have.

  In the second electrode layer 31A, the wiring passage 32 is formed to extend linearly in the Y direction. The wiring passage 32 is formed at the center in the X direction so that the second electrode layer 31A can be equally divided in the X direction. The second electrode layer 31 </ b> A is divided into two segmented electrode layers 33 and 33 by the wiring passage 32.

  The first electrode layer 21, the connecting portion 22, and the second electrode layers 31, 31A are formed of the same light-transmitting conductive material. The light-transmitting conductive material is formed of an ITO (indium tin oxide) layer, a metal nanowire layer typified by silver nanowires, a thin metal layer formed in a mesh shape, or a conductive polymer layer.

  FIG. 3 shows a cross-sectional view of the laminated structure of the intersection of the first electrode row 20 in the y1 row and the second electrode row 30 in the x2 row.

  At this intersection, a translucent first insulating layer 41 that covers the connecting portion 22 of the first electrode array 20 is formed, and the first bridge connection layer 42 is formed on the first insulating layer 41. Is formed. By the first bridge connection layer 42, the second electrode layers 31 adjacent to both sides in the X direction of the coupling portion 22 are connected and are electrically connected. The insulating layer 41 and the first bridge connection layer 42 are formed at all the intersections of the first electrode row 20 and the second electrode row 30, and the second electrode layer 31 arranged in the x1 row. (31A) are connected in the X direction. Similarly, in the x2, x3, and x4 columns, the second electrode layer 31 (31A) is connected in the X direction.

  The translucent first insulating layer 41 is composed of a novolac resin or a novolac resin and an acrylic resin. The first bridge connection layer 42 is formed by superposing a conductive metal material such as Au (gold), Au alloy, CuNi alloy (copper / nickel alloy), Ni (nickel) on the base layer of the amorphous ITO layer. More preferably, it is covered with a protective layer of an amorphous ITO layer.

  When the 1st electrode layer 21, the connection part 22, and the 2nd electrode layer 31 are formed with an ITO layer, by forming these with crystalline ITO, the 1st electrode layer 21 and the connection part 22 are formed. In addition, it is possible to select and etch crystalline ITO that constitutes the second electrode layer 31 and amorphous ITO that constitutes the first insulating layer 32.

  Note that, at the intersection of the first electrode row 20 and the second electrode row 30, a connecting portion that connects the second electrode layers 31 (31A) adjacent in the X direction is integrated with the second electrode layer. The plurality of second electrode layers 31 (31A) may be formed continuously in the X direction. In this case, the first electrode layers 21 that are independent from each other are disposed on both sides in the Y direction across the connecting portion, and the first electrode layer 21 is disposed on the connecting portion that connects the second electrode layer 31 (31A). The insulating layer 41 and the first bridge connection layer 42 are formed, and the first electrode layers 21 adjacent in the Y direction are connected by the first bridge connection layer 42.

  As shown in FIG. 2, in the wiring region H formed at one end of the substrate 11 in the Y direction, the first wiring layer 25a formed integrally with the first electrode layer 21 in the y1 row, and y2, y3 First wiring layers 25b and 25c formed integrally with each of the first electrode layers 21 in the row are formed. In the wiring region H, second wiring layers 35a, 35b, 35c, and 35d that are electrically connected to the second electrode rows 30 are formed.

  The first wiring layers 25a, 25b, and 25c and the second wiring layers 35a, 35b, 35c, and 35d are routed in the wiring region H and are electrically connected to a connector portion provided in the wiring region H.

  As shown in FIG. 2, the second wiring layer 35a is formed integrally with the second electrode layer 31 located at the intersection of the x1 column and the ya column.

  The second wiring layer 35b is formed integrally with the second electrode layer 31 located at the intersection of the x2 column and the yb column. The second wiring layer 35b passes through the inside of the wiring passage 32 formed in the second electrode layer 31A located at the intersection of the x1 column and the yb column and linearly extends in the Y direction to enter the wiring region H. Has reached.

  The second wiring layer 35c is formed integrally with the second electrode layer 31 located at the intersection of the x3 column and the yc column. The second wiring layer 35c includes the wiring path 32 formed in the second electrode layer 31A located at the intersection of the x2 column and the yc column, and the second electrode layer 31A located at the intersection of the x1 column and the yc column. Passing through the inside of the wiring passage 32 formed in the above, it extends linearly in the Y direction and reaches the wiring region H.

  The second wiring layer 35d is formed integrally with the second electrode layer 31 located at the intersection of the x4 column and the yd column. The second wiring layer 35d includes the wiring path 32 formed in the second electrode layer 31A located at the intersection of the x3 column and the yd column, and the second electrode layer 31A located at the intersection of the x2 column and the yd column. And the wiring passage 32 formed in the electrode layer 31A formed in the electrode layer 31A located at the intersection of the x1 row and the yd row, and linearly extends in the Y direction to reach the wiring region H.

  The second wiring layer 35a is electrically connected to each second electrode layer 31 (31A) constituting the second electrode row 30 located in the x1 row, and the second wiring layers 35b, 35c, and 35d are Each of the second electrode layers 31 (31A) constituting the second electrode row 30 located in the x2, x3, and x4 rows is electrically connected.

  The second wiring layers 35 a, 35 b, 35 c, and 35 d are all formed integrally with the second electrode layer 31 by a translucent conductive material that constitutes the second electrode layer 31.

  FIG. 4 shows a cross-sectional structure of the second electrode layer 31A located at the intersection of the x3 column and the yd column.

The second electrode layer 31 </ b> A is divided into two divided electrode layers 33 and 33 by the wiring passage 32. A second insulating layer 43 is formed on the wiring path 32 and the second wiring layer 35d, and a second bridge connection layer 44 is formed thereon. The divided electrode layers 33 and 33 divided by the wiring passage 32 are connected by the second bridge connection layer 44, so that the entire second electrode layer 31A can function as one electrode layer. Yes.
This is the same in all of the second electrode layers 31A provided in other places.

  The second insulating layer 43 shown in FIG. 4 is formed of the same material and in the same process as the first insulating layer 32 shown in FIG. The second bridge connection layer 44 shown in FIG. 4 is formed of the same material and in the same process as the first bridge connection layer 42 shown in FIG.

  In the manufacturing process of the input device 10, a material in which a light-transmitting conductive material such as ITO is formed on the surface of the substrate 11 is used, and this conductive material is etched to form the first electrode array 20 and the second electrode. A row 30, first wiring layers 25a, 25b, and 25c and second wiring layers 35a, 35b, 35c, and 35d are formed.

  After that, a resin layer of novolac resin and acrylic resin is formed on the substrate 11, and the first insulating layer 41 and the second insulating layer 43 are simultaneously patterned by a photolithography process. Further, a laminated body for the bridge connection layer is formed, and the first bridge connection layer 42 and the second bridge connection layer 44 are simultaneously formed by the etching process.

  In the input device 10 shown in FIG. 2, the display image of the display panel 5 can be seen from the outside through the input device 10 and the front panel 2. The input device 10 can be operated by touching the front panel 2 with a finger while viewing this display.

  In the input device 10, a capacitance is formed between the first electrode row 20 and the second electrode row 30. Either one of the first electrode array 20 and the second electrode array 30 is sequentially supplied with pulsed drive power, and when the drive power is applied, a detection current flowing in the other electrode array is detected. Is done. When the finger approaches, a capacitance is formed between the finger and the electrode layer, so that the detection current changes. By detecting this change in the detected current, it is possible to detect which part of the front panel 2 the finger is approaching.

  Since the wiring path 32 penetrating in the Y direction is formed in the second electrode layer 31A, the area is substantially smaller than that of the electrode layer that does not have the wiring path 32. Sensitivity may vary. Therefore, in the embodiment shown in FIG. 2, the opening 31b is formed in the second electrode layer 31 where the wiring passage 32 is not formed, and the second electrode layer 31A having the wiring passage 32 and the wiring passage 32 are connected. A difference in area between the second electrode layer 31 and the second electrode layer 31 that is not included is not so much generated.

  Furthermore, an opening 21b is also formed in the first electrode layer 21, so that the area difference between the first electrode layer 21 and the second electrode layer 31A is not greatly different.

  In the input device 10, the second wiring layers 35a, 35b, 35c, and 35d extend in the Y direction through the inside of the wiring passage 32 formed in the second electrode layer 31A. Since the second wiring layers 35b, 35c, 35d are sandwiched between the divided electrode layers 33, 33 of the second electrode layer 31A on both sides in the X direction, the second wiring layers 35b, 35c, 35d, The area where one electrode layer 21 is adjacent can be reduced, and the electrostatic coupling between the second wiring layers 35b, 35c and 35d and the first electrode layer 21 can be reduced. Therefore, it is possible to suppress the routing portion of the second wiring layers 35b, 35c, and 35d from having extra sensitivity, and the original detection output detected between the first electrode row 20 and the second electrode row 30. This makes it difficult to superimpose noise on the screen, thereby increasing the detection accuracy.

  Further, since the second wiring layers 35b, 35c, and 35d pass through the inside of the second electrode layer 31A, a passage for allowing the second wiring layer to pass between adjacent electrode layers is formed. There is no need. Therefore, the arrangement of the electrode layers 21 and 31 is not restricted due to the routing of the second wiring layer. For example, the electrode layers 21 and 31 can be arranged close to each other, and the detection operation can be performed. It becomes possible to increase the resolution.

  FIG. 5 is a partial plan view showing an electrode arrangement structure of the input device 110 according to the second embodiment of the present invention. In FIG. 5, the same components as those in the first embodiment shown in FIG.

  In the input device 110 shown in FIG. 5, the second wiring layer 35a is formed integrally with the second electrode layer 31A located at the intersection of the x1 column and the ya column. A wiring path 32 is formed in the second electrode layer 31A, and the second wiring layer 35b passing through the wiring path 32 is a second electrode layer located at the intersection of the x2 column and the ya column. 31 is formed integrally.

  In the wiring passage 32 formed in the second electrode layer 31A located at the intersection of the x1 row and the yb row and in the wiring passage 32 formed in the second electrode layer 31A located at the intersection of the x2 row and the yb row Two second wiring layers 35c and 35d pass therethrough. One second wiring layer 35c is formed integrally with the second electrode layer 31A located at the intersection of the x3 column and the yb column. The other second wiring layer 35d passes through the inside of the wiring path 32 of the second electrode layer 31A located at the intersection of the x3 column and the yb column, and is a second electrode located at the intersection of the x4 column and the yb column. It is formed integrally with the layer 31.

  The second electrode layer 31A located at the intersection of the x1 column and the yb column, and the second electrode layer 31A located at the intersection of the x2 column and the yb column have the second wiring layers 35c and 35d in the wiring path 32. Since two passes, the second insulating layer 43 and the second bridge connection layer 44 for connecting the left and right segmented electrode layers 33 and 33 straddle the two second wiring layers 35c and 35d. It is formed as follows.

  In the input device 10 of the first embodiment shown in FIG. 2, since only one second wiring layer passes through the wiring passage 32 formed in the second electrode layer 31A, the second electrode layer For example, 31 (31A) cannot be configured unless the number of arrays in the X direction and the number of arrays in the Y direction are the same. In contrast, in the second embodiment shown in FIG. 5, two or more second wiring layers pass through the wiring passage 32 of the second electrode layer 31A. It is possible to configure the number of arrangements 31 (31A) so that the Y direction is larger than the X direction.

  FIG. 6 is a partial plan view showing an electrode arrangement structure of the input device 210 according to the third embodiment of the present invention. Only the differences from the input device 110 of the second embodiment shown in FIG. 5 will be described below.

  In the input device 210 shown in FIG. 6, two wiring paths are provided in the second electrode layer 31A located at the intersection of the x1 column and the yb column and the second electrode layer 31A located at the intersection of the x2 column and the yb column. 32 and 32 are formed separately. The second wiring layer 35 c passes through the inside of one wiring passage 32, and the second wiring layer 35 d passes through the inside of the other wiring passage 32.

  In the second electrode layer 31A, since two wiring passages 32 are formed, the electrode layer is divided into three segmented electrode layers 33, 33, 33. In each wiring passage 32, a second insulating layer 43 and a second bridge connection layer 44 are formed across the second wiring layer.

  In the second electrode layer 31A located at the intersection of the x2 column and the yb column, the second insulating layer 43 and the second bridge connection layer 44 covering the one wiring passage 32 and the other wiring passage 32 are covered. The second insulating layer 43 and the second bridge connection layer 44 are formed with a distance in the Y direction. This makes it easy to prevent a phenomenon in which two sets of the second insulating layer 43 and the second bridge connection layer 44 that are arranged close to each other are noticeable as if they are integrated.

FIG. 7 shows a modification of the present invention.
FIG. 7 shows the second electrode layer 31A. In the second electrode layer 31 </ b> A, segmented electrode layers 33 and 33 segmented in the X direction are coupled by a coupling portion 37. The segment electrode layers 33 and 33 and the connecting portion 37 are integrally formed of the same conductive material. The wiring passages 32 and 32 are divided and formed in the Y direction with the connecting portion 37 interposed therebetween. The second wiring layers 35e and 35e are disposed in the wiring passages 32 and 32, but are separated with the connecting portion 37 interposed therebetween.

In this configuration, the second insulating layer 45 and the second bridge connection layer 46 covering the coupling portion 37 are formed to extend in the Y direction, and the second bridge layer 46 separated by the second bridge connection layer 46 is formed. The wiring layers 35e and 35e are connected and are electrically connected.
FIG. 8 shows an input device 310 according to the fourth embodiment of the present invention.

  In the input device 10 according to the first embodiment shown in FIG. 2, the second wiring layer 35d extending in the Y direction from the second electrode layer 31 located at the intersection of the x4 column and the yd column includes xa, When passing through each column of xb, xc, xd, it faces each corner of the plurality of first electrode layers 21 located in the right direction. The second wiring layer 35c faces each corner of the first electrode layer 21 located on both sides in the X direction when passing through each column of xa, xb, and xc. When the second wiring layer 35b passes through each column of xa and xb, the second wiring layer 35b faces each corner of the first electrode layer 21 located on both sides thereof. The second wiring layer 35a faces the corner of the first electrode layer 21 when passing through the xa row.

  Therefore, a capacitance is formed between the second wiring layers 35a, 35b, 35c, and 35d and the corners of the first electrode layer 21 at opposite portions. In the second wiring layer, the number of locations facing the corners of the first electrode layer 21 increases in 35b rather than 35a, and this increases in the order of the second wiring layers 35c, 35d,. The portion where one second wiring layer and one corner of the first electrode layer 21 face each other has a slight length, and the capacitance does not increase so much at that portion. As the number of locations facing the corners of the first electrode layer 21 increases, such as the layer 35d, the cumulative value of the capacitance increases, and there is a concern that the detection noise is slightly increased.

  Therefore, in the input device 310 according to the fourth embodiment shown in FIG. 8, the intersection of each column of ya, yb, yc, yd and the xa column, and the intersection of each column of yb, yc, yd and the xb column. Between the second wiring layers 35 a, 35 b, 25 c, 25 d and the first electrode layer 21 at the intersection of each of the sections yc and yd and the xc column, and at the intersection of the yd and xd columns A protective layer 51 is formed.

  The protective layer 51 is formed of the same light-transmitting conductive material as the first electrode layer 21 and the second electrode layer 31. Although the shape of the protective layer 51 is not particularly limited, in the embodiment shown in FIG. 8, the second wiring layers 35a and 35b are formed such that the protective layer 51 is rectangular and the long side extends in the Y direction. , 35c and 35d.

  Each of the plurality of protective layers 51 is independent of each other and is separated without being connected to any of the first electrode layer 21, the second electrode layer 31, and the second wiring layers 35a, 35b, 35c, and 35d. ing. By providing this protective layer 51, the capacitance between the second wiring layers 35a, 35b, 35c, and 35d and the first electrode layer 21 can be reduced.

  FIG. 9 shows a modification of the protective layer provided in the input device 310 of the fourth embodiment.

  The protective layer 55 shown in FIG. 9 includes a linear portion 55a interposed between the second wiring layer 35c and the first electrode layer 21, and two sides of the first electrode layer 21 in the X direction. It has an inclined portion 55b that extends obliquely with respect to both sides in the Y direction. In this modification, since the portion of the first electrode layer 21 that faces the second wiring layer 35c is surrounded by the protective layer 55, the first electrode layer 21 and the second wiring layer 35c It is possible to further reduce the capacitance between them.

FIG. 10 shows an input device 410 according to the fifth embodiment of the present invention.
In the fifth embodiment, the protective layer 52 located between the second wiring layer 35c and the first electrode layer 21 is continuous with the second electrode layer 31 or 31A located closest thereto. Is formed. In this embodiment, since the protective layer 52 is always at the same potential as the second electrode layer 31 or 31A at a position close thereto, it is possible to prevent the protective layer 52 from being individually charged. The effect of reducing the capacitance between the wiring layer and the first electrode layer 21 can be enhanced.

  FIG. 11 shows an input device 510 according to the sixth embodiment of the present invention. In FIG. 11, only the second electrode layers 31 and 31A and the second wiring layer 35c located in the yc row are extracted and enlarged.

  In the sixth embodiment, the protective layers 53 arranged between the second wiring layer 35 c and the first electrode layer 21 are connected by the protective connection layer 54. The protective connection layer 54 passes through the inside of the wiring passage 32 together with the second wiring layer 35c. Therefore, the second insulating layer 43 and the second bridge connection layer 44 are formed so as to cover both the second wiring layer 35 c and the protective connection layer 54.

  In the sixth embodiment, since the plurality of protective layers 53 can be set to the same potential, it is possible to avoid that the plurality of protective layers 53 are individually charged and the protective layers 53 have different potentials. The effect of reducing the capacitance can be enhanced.

FIG. 12 shows an input device 610 according to a seventh embodiment of the present invention.
The input device 610 according to the seventh embodiment is similar to the input device 110 according to the second embodiment illustrated in FIG. 5 in that the intersection between the x1 column and the yb column and the intersection between the x2 column and the yb column. Two second wiring layers 35c and 35d pass through the wiring passage 32 of the second electrode layer 31A located at the position. Similarly, in the yc column, yd column, ye column,..., There are portions where two second wiring layers pass through the second electrode layer 31A.

  Similar to the input device 10 of the first embodiment shown in FIG. 2, the input device 610 has an opening 21 b in the first electrode layer 21 and an opening 31 b in the second electrode layer 31. Is formed. And at the intersection of each column of xa, xb, xc,... And each column of ya, yb, yc,. A protective layer 51 is formed at a portion facing the electrode layer 21. The protective layer 51 is formed independently of the first electrode layer 21 and the second electrode layers 31 and 31A.

  In the embodiment shown in FIG. 12, two second wiring layers pass between the first electrode layers 21 adjacent in the X direction in each column of xa, xb, xc,. However, by forming a protective layer 51 between the two wiring layers and the first electrode layer 21, the second wiring layers 35a, 35b, 35c,. It is possible to reduce the capacitance between the two.

FIG. 13 is a simulation result showing the effect of the protective layer 51.
This simulation is a comparison between the input device 610 of the seventh embodiment having the protective layer 51 shown in FIG. 12 and the input device 110 of the second embodiment having no protective layer shown in FIG. is there. FIG. 13A shows the result related to the input device 610 having the protective layer 51, and FIG. 13B shows the result related to the input device 110 not having the protective layer 51.

  In the simulation, one side of each of the first electrode layer 21 and the second electrode layer 31 is 3 mm, the width dimension of the second wiring layers 35a, 35b,... Is 45 μm, as shown in FIG. The distance δ in the X direction between the second wiring layer and the corner portion of the first electrode layer 21 when the layer 51 was not provided was 30 μm. The distance is the same value in all portions of the facing portion between the second wiring layer and the first electrode layer 21. The protective layer 51 had a width dimension in the X direction of 500 μm and a length dimension in the Y direction of 1.2 mm. Furthermore, the openings 21b and 31b were 3 mm × 0.18 mm.

  In the simulation shown in FIG. 13, the first electrode row 20 is 12 rows from y1 to y12, and the second electrode row 30 is 21 rows from x1 to x21.

  In the detection operation using this input device, the first electrode array 20 is selected as a drive electrode in the order of y1, y2, y3,... And a drive voltage is applied in order. During the period when the first electrode row 20 of y1 is selected as the drive electrode, the second electrode row 30 is selected in the order of x1, x2, x3,. The output is detected in the order of the columns x3,. Next, during the period in which the first electrode row 20 of y2 is selected as the drive electrode, the second electrode row 30 is selected in the order of x1, x2, x3,. Is done. As this proceeds in the order of y3, y4, y5,..., The position where the finger approaches the front panel 2 can be detected on the XY coordinates.

  In the simulation shown in FIG. 13, the second electrode array 30 is used as the detection electrodes in the order of x1, x2, x3, x4,... During the period in which the first electrode array 20 of y1 is selected as the drive electrode. The capacitance between the second electrode row 30 selected in the order of x1, x2, x3, x4,... And the y1 row of electrode rows 20 was determined. Next, during the period when the first electrode row 20 of y2 is selected as the drive electrode, the second electrode rows 30 of x1, x2, x3, x4,. The capacitance between the second electrode row 30 and the y1 row electrode row 20 selected in order was determined. This is the result of repeating y3, y4, y5,..., Y12 in this order.

  In both FIGS. 13A and 13B, the horizontal axis indicates the rows x1, x2, x3,..., X21 of the second electrode row 30 selected in order as detection electrodes. , The vertical axis represents the first electrode row 20 of each row of y1, y2, y3,..., Y12 selected as the drive electrode, and each row of x1, x2, x3,. The electrostatic capacitance (unit: pF) between the second electrode array 30 is shown.

  In the simulation result in which the protective layer 51 is provided as shown in FIG. 13A, when the first electrode row 20 in the y12 row is used as a drive electrode and the second electrode row 30 in the X21 row is used as a detection electrode, The capacitance between both electrode rows was the maximum value CA, and CA = 0.88 pF. On the other hand, as shown in FIG. 13B, in the simulation result in which the protective layer 51 is not provided, the first electrode row 20 in the y12 row is used as the drive electrode, and the second electrode row 30 in the X21 row is used as the detection electrode. , The capacitance between both electrode rows was the maximum value CB, and CB = 1.07 pF.

  By providing the protective layer 51, the maximum value of the accumulated capacitance between the second wiring layer and the first electrode layer 21 can be improved by about 18%.

DESCRIPTION OF SYMBOLS 1 Touch panel 2 Front panel 5 Display panel 10 Input device 11 Board | substrate 20 1st electrode row | line | column 21 1st electrode layer 21b Opening part 22 Connection part 25a, 25b, 25c 1st wiring layer 30 2nd electrode row | line | column 31, 31A Second electrode layer 31b Opening 32 Wiring path 33 Sectional electrode layers 35a, 35b, 35c, 35d Second wiring layer 37 Connecting portion 41 First insulating layer 42 First bridge connection layer 43 Second insulating layer 44 Second bridge connection layer 51, 52, 53, 55 Protective layer 54 Protective connection layer 110, 210, 310, 410, 510, 610 Input device H Wiring region

Claims (12)

A first electrode layer and a second electrode layer formed of a light-transmitting conductive material are formed over a light-transmitting substrate, and the plurality of first electrode layers are arranged in a first direction. In the input device in which the second electrode layers are arranged in a second direction intersecting the first direction,
A connecting portion for connecting any one of the first electrode layer and the second electrode layer is integrally formed of the light-transmitting conductive material, and a first insulating layer is formed on the connecting portion. A layer and a first bridge connection layer are overlapped, and the other electrode layer is electrically connected by the first bridge connection layer,
A wiring passage extending in the first direction is formed inside the second electrode layer, and the wiring layer passing through the wiring passage is electrically connected to the other second electrode layer,
One of the segmented electrode layer obtained by dividing the second electrode layer by the wiring path and the wiring layer is continuous in the wiring path, and the second insulating layer and the second layer are formed on the continuous portion. The input device is characterized in that a bridge connection layer is formed and the other layer is electrically connected by the second bridge connection layer.   The input device according to claim 1, wherein an opening is formed in a region of the second electrode layer where the wiring passage is not formed.   The input device according to claim 1, wherein an opening is formed in a region of the first electrode layer.   The input device according to claim 1, wherein a plurality of the wiring layers pass through the wiring passage, and each of the wiring layers is electrically connected to the different second electrode layer.   A plurality of wiring passages are formed in the second electrode layer, the wiring layers pass through the wiring passages, and the wiring layers are electrically connected to different second electrode layers. The input device according to claim 1.   The input device according to claim 1, wherein the wiring passage is formed in a central portion that bisects the second electrode layer in the second direction.   The first insulating layer and the second insulating layer are formed of the same material and in the same process, and the first bridge connection layer and the second bridge connection layer are formed of the same material and in the same process. The input device according to claim 1.   The input device according to claim 1, wherein the first electrode layer and the second electrode layer are quadrangular, and the corners of the quadrilateral are directed in the first direction and the second direction. .   The wiring layer passes through a region facing the first electrode layer, and a protective layer made of a conductive material is provided between the first electrode layer and the wiring layer at this position. The input device according to any one of claims 1 to 8.   The input device according to claim 9, wherein the protective layer is made of the same light-transmitting conductive material as the first electrode layer.   The input device according to claim 9 or 10, wherein a protective connection layer that connects the protective layers arranged with a space in the first direction passes through the wiring passage.   The input device according to claim 9 or 10, wherein the protective layer is formed continuously with the second electrode layer.

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