JP6532450B2 - 成膜方法 - Google Patents
成膜方法 Download PDFInfo
- Publication number
- JP6532450B2 JP6532450B2 JP2016236514A JP2016236514A JP6532450B2 JP 6532450 B2 JP6532450 B2 JP 6532450B2 JP 2016236514 A JP2016236514 A JP 2016236514A JP 2016236514 A JP2016236514 A JP 2016236514A JP 6532450 B2 JP6532450 B2 JP 6532450B2
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- Prior art keywords
- film
- forming
- plasma
- vacuum chamber
- support plate
- Prior art date
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- 238000000151 deposition Methods 0.000 title claims description 10
- 230000015572 biosynthetic process Effects 0.000 claims description 30
- 229920006254 polymer film Polymers 0.000 claims description 25
- 239000000178 monomer Substances 0.000 claims description 24
- 239000002994 raw material Substances 0.000 claims description 24
- 150000002500 ions Chemical class 0.000 claims description 23
- 239000002184 metal Substances 0.000 claims description 7
- 238000000034 method Methods 0.000 claims description 6
- 238000000354 decomposition reaction Methods 0.000 claims 1
- 238000006116 polymerization reaction Methods 0.000 claims 1
- 230000002093 peripheral effect Effects 0.000 description 15
- 238000012545 processing Methods 0.000 description 7
- 230000008021 deposition Effects 0.000 description 5
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 5
- 238000012986 modification Methods 0.000 description 5
- 230000004048 modification Effects 0.000 description 5
- 238000002474 experimental method Methods 0.000 description 4
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000000379 polymerizing effect Effects 0.000 description 2
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 2
- 239000004810 polytetrafluoroethylene Substances 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 238000004891 communication Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- -1 polytetrafluoroethylene Polymers 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/503—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using dc or ac discharges
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4582—Rigid and flat substrates, e.g. plates or discs
- C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
- C23C16/4586—Elements in the interior of the support, e.g. electrodes, heating or cooling devices
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Plasma & Fusion (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Physical Vapour Deposition (AREA)
- Plasma Technology (AREA)
Description
Claims (2)
- 成膜対象物を、立体形状を持つと共にその外表面に一方向にのびる凹孔が凹設されたものとし、この成膜対象物が配置される真空チャンバに原料モノマーを導入する原料モノマー導入手段と、電極と交流電源とを有して当該電極への交流電力の投入により前記真空チャンバ内にプラズマを発生させるプラズマ発生手段とを備える成膜装置を用い、この成膜対象物の少なくとも前記凹孔の内表面にポリマー膜を成膜する成膜方法であって、
前記電極は、前記成膜対象物を支持する支持板部を有するものにおいて、
前記真空チャンバ内に前記成膜対象物を配置し、前記真空チャンバ内に前記原料モノマーを導入し、前記電極に交流電力を投入して前記真空チャンバ内にプラズマを発生させ、プラズマで原料モノマーを分解、重合させて形成したイオン及びラジカルを付着、堆積させてポリマー膜を成膜する工程を含み、
前記成膜対象物として、その外表面に金属膜が成膜されたものを用い、前記ポリマー膜の成膜中、前記成膜対象物を前記電極の前記支持板部の一方の面に設置して前記凹孔の孔軸が前記支持板部に直交する姿勢にし、前記支持板部と前記成膜対象物の前記金属膜とで有底筒状体を構成した状態でプラズマを発生させることにより、プラズマと前記凹孔の内表面との間にイオンシース層を形成することを特徴とする成膜方法。 - 前記支持板部の一方の面に前記成膜対象物の複数個が間隔を存して設置されることを特徴とする請求項1記載の成膜方法。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016236514A JP6532450B2 (ja) | 2016-12-06 | 2016-12-06 | 成膜方法 |
CN201711278236.1A CN108149226B (zh) | 2016-12-06 | 2017-12-06 | 成膜装置及成膜方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016236514A JP6532450B2 (ja) | 2016-12-06 | 2016-12-06 | 成膜方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2018090868A JP2018090868A (ja) | 2018-06-14 |
JP6532450B2 true JP6532450B2 (ja) | 2019-06-19 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016236514A Active JP6532450B2 (ja) | 2016-12-06 | 2016-12-06 | 成膜方法 |
Country Status (2)
Country | Link |
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JP (1) | JP6532450B2 (ja) |
CN (1) | CN108149226B (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB201814231D0 (en) * | 2018-08-31 | 2018-10-17 | Univ Surrey | Apparatus for forming a poly(p-xylylene) film on a component |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0270059A (ja) * | 1987-12-02 | 1990-03-08 | Idemitsu Petrochem Co Ltd | 器具およびその製造方法 |
JP2003285844A (ja) * | 2002-03-28 | 2003-10-07 | Toppan Printing Co Ltd | プラスチック容器 |
WO2006133730A1 (en) * | 2005-06-16 | 2006-12-21 | Innovative Systems & Technologies | Method for producing coated polymer |
AU2005334309B8 (en) * | 2005-07-12 | 2010-07-22 | Mitsubishi Heavy Industries Machinery Systems, Ltd. | Apparatus for forming a coating film on an inner surface of a container |
JP2007291439A (ja) * | 2006-04-24 | 2007-11-08 | Tokyo Electron Ltd | 成膜方法、プラズマ成膜装置及び記憶媒体 |
JP5312860B2 (ja) * | 2007-07-09 | 2013-10-09 | 日本リビング株式会社 | Dlc製膜方法及び製膜装置 |
CN102016106A (zh) * | 2008-04-25 | 2011-04-13 | 株式会社爱发科 | 成膜方法和成膜装置 |
JP5392215B2 (ja) * | 2010-09-28 | 2014-01-22 | 東京エレクトロン株式会社 | 成膜方法及び成膜装置 |
-
2016
- 2016-12-06 JP JP2016236514A patent/JP6532450B2/ja active Active
-
2017
- 2017-12-06 CN CN201711278236.1A patent/CN108149226B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
CN108149226A (zh) | 2018-06-12 |
CN108149226B (zh) | 2021-05-04 |
JP2018090868A (ja) | 2018-06-14 |
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