JP6529000B2 - イオン源、イオン源の運転方法 - Google Patents

イオン源、イオン源の運転方法 Download PDF

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Publication number
JP6529000B2
JP6529000B2 JP2017185545A JP2017185545A JP6529000B2 JP 6529000 B2 JP6529000 B2 JP 6529000B2 JP 2017185545 A JP2017185545 A JP 2017185545A JP 2017185545 A JP2017185545 A JP 2017185545A JP 6529000 B2 JP6529000 B2 JP 6529000B2
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JP
Japan
Prior art keywords
filament
resistance value
current
ion source
value
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2017185545A
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English (en)
Japanese (ja)
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JP2019061858A (ja
Inventor
裕也 平井
裕也 平井
武 松本
武 松本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissin Ion Equipment Co Ltd
Original Assignee
Nissin Ion Equipment Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissin Ion Equipment Co Ltd filed Critical Nissin Ion Equipment Co Ltd
Priority to JP2017185545A priority Critical patent/JP6529000B2/ja
Priority to KR1020180075494A priority patent/KR102276811B1/ko
Priority to CN201810725722.1A priority patent/CN109559963B/zh
Priority to TW107123112A priority patent/TWI725323B/zh
Publication of JP2019061858A publication Critical patent/JP2019061858A/ja
Application granted granted Critical
Publication of JP6529000B2 publication Critical patent/JP6529000B2/ja
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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Combustion & Propulsion (AREA)
JP2017185545A 2017-09-27 2017-09-27 イオン源、イオン源の運転方法 Active JP6529000B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2017185545A JP6529000B2 (ja) 2017-09-27 2017-09-27 イオン源、イオン源の運転方法
KR1020180075494A KR102276811B1 (ko) 2017-09-27 2018-06-29 이온원, 이온원의 운전 방법
CN201810725722.1A CN109559963B (zh) 2017-09-27 2018-07-04 离子源及离子源的运转方法
TW107123112A TWI725323B (zh) 2017-09-27 2018-07-04 離子源、離子源之運轉方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2017185545A JP6529000B2 (ja) 2017-09-27 2017-09-27 イオン源、イオン源の運転方法

Publications (2)

Publication Number Publication Date
JP2019061858A JP2019061858A (ja) 2019-04-18
JP6529000B2 true JP6529000B2 (ja) 2019-06-12

Family

ID=65864548

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2017185545A Active JP6529000B2 (ja) 2017-09-27 2017-09-27 イオン源、イオン源の運転方法

Country Status (4)

Country Link
JP (1) JP6529000B2 (ko)
KR (1) KR102276811B1 (ko)
CN (1) CN109559963B (ko)
TW (1) TWI725323B (ko)

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08227677A (ja) * 1995-02-21 1996-09-03 Nissin Electric Co Ltd イオン源のフィラメント電流の制御方法
US6555831B1 (en) * 1999-04-30 2003-04-29 Nissin Electric Co., Ltd. Ion implanting apparatus
JP3736196B2 (ja) * 1999-04-30 2006-01-18 日新イオン機器株式会社 イオン注入装置
JP2001165989A (ja) * 1999-12-10 2001-06-22 Fuji Electronics Industry Co Ltd 真空管の寿命予測装置及び高周波加熱装置
JP2004165034A (ja) * 2002-11-14 2004-06-10 Nissin Electric Co Ltd イオン源のフィラメント寿命予測方法およびイオン源装置
US8110814B2 (en) * 2003-10-16 2012-02-07 Alis Corporation Ion sources, systems and methods
JP2007073395A (ja) * 2005-09-08 2007-03-22 Tokyo Electron Ltd マグネトロンの制御方法、マグネトロンの寿命判定方法、マイクロ波発生装置、マグネトロンの寿命判定装置、処理装置及び記憶媒体
TWI494975B (zh) * 2008-02-11 2015-08-01 Advanced Tech Materials 在半導體處理系統中離子源之清洗
JP2009266779A (ja) 2008-04-30 2009-11-12 Sharp Corp イオンドーピング装置
US7843138B2 (en) * 2008-06-11 2010-11-30 Kaufman & Robinson, Inc. Power supply for a hot-filament cathode
CN102396048B (zh) * 2009-02-11 2014-08-27 先进科技材料公司 半导体制造系统中的离子源清洁方法
JP6350234B2 (ja) * 2014-11-18 2018-07-04 日新イオン機器株式会社 イオンビーム照射装置及びこれに用いられるプログラム

Also Published As

Publication number Publication date
CN109559963B (zh) 2022-04-29
CN109559963A (zh) 2019-04-02
JP2019061858A (ja) 2019-04-18
KR102276811B1 (ko) 2021-07-14
KR20190036452A (ko) 2019-04-04
TWI725323B (zh) 2021-04-21
TW201916089A (zh) 2019-04-16

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