JP6517734B2 - 散乱光検出ヘッド - Google Patents
散乱光検出ヘッド Download PDFInfo
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- JP6517734B2 JP6517734B2 JP2016115553A JP2016115553A JP6517734B2 JP 6517734 B2 JP6517734 B2 JP 6517734B2 JP 2016115553 A JP2016115553 A JP 2016115553A JP 2016115553 A JP2016115553 A JP 2016115553A JP 6517734 B2 JP6517734 B2 JP 6517734B2
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- 238000001514 detection method Methods 0.000 title claims description 100
- 238000007689 inspection Methods 0.000 claims description 294
- 230000003287 optical effect Effects 0.000 claims description 99
- 230000005540 biological transmission Effects 0.000 claims description 19
- 230000002093 peripheral effect Effects 0.000 claims description 8
- 238000003384 imaging method Methods 0.000 claims description 7
- 238000012360 testing method Methods 0.000 claims description 5
- 230000007547 defect Effects 0.000 description 60
- 230000007246 mechanism Effects 0.000 description 25
- 230000035945 sensitivity Effects 0.000 description 17
- 239000000758 substrate Substances 0.000 description 15
- 238000012552 review Methods 0.000 description 14
- 239000011521 glass Substances 0.000 description 12
- 239000004065 semiconductor Substances 0.000 description 8
- 239000013307 optical fiber Substances 0.000 description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 230000033001 locomotion Effects 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 238000005286 illumination Methods 0.000 description 4
- 230000001678 irradiating effect Effects 0.000 description 4
- 210000000078 claw Anatomy 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000004575 stone Substances 0.000 description 3
- 239000011800 void material Substances 0.000 description 3
- 206010036618 Premenstrual syndrome Diseases 0.000 description 2
- 238000012937 correction Methods 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 230000000149 penetrating effect Effects 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000004308 accommodation Effects 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000010979 ruby Substances 0.000 description 1
- 229910001750 ruby Inorganic materials 0.000 description 1
- 238000000790 scattering method Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016115553A JP6517734B2 (ja) | 2016-06-09 | 2016-06-09 | 散乱光検出ヘッド |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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JP2016115553A JP6517734B2 (ja) | 2016-06-09 | 2016-06-09 | 散乱光検出ヘッド |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015225061A Division JP5961909B1 (ja) | 2015-11-17 | 2015-11-17 | 欠陥検査装置 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2019043594A Division JP2019082496A (ja) | 2019-03-11 | 2019-03-11 | 欠陥検査装置 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2017096912A JP2017096912A (ja) | 2017-06-01 |
JP2017096912A5 JP2017096912A5 (enrdf_load_stackoverflow) | 2018-05-17 |
JP6517734B2 true JP6517734B2 (ja) | 2019-05-22 |
Family
ID=58818184
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2016115553A Expired - Fee Related JP6517734B2 (ja) | 2016-06-09 | 2016-06-09 | 散乱光検出ヘッド |
Country Status (1)
Country | Link |
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JP (1) | JP6517734B2 (enrdf_load_stackoverflow) |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53107865A (en) * | 1977-03-02 | 1978-09-20 | Hitachi Ltd | Detector of minute undulations |
US4601576A (en) * | 1983-12-09 | 1986-07-22 | Tencor Instruments | Light collector for optical contaminant and flaw detector |
JPS6117050A (ja) * | 1984-05-14 | 1986-01-25 | テンコ−ル・インスツルメンツ | 欠陥検知装置 |
DE3540916A1 (de) * | 1985-11-19 | 1987-05-21 | Zeiss Carl Fa | Verfahren und vorrichtung zur raster-lichtmikroskopischen darstellung von objekten im dunkelfeld |
JP2002188999A (ja) * | 2000-12-21 | 2002-07-05 | Hitachi Ltd | 異物・欠陥検出装置及び検出方法 |
JP2006313107A (ja) * | 2005-05-09 | 2006-11-16 | Lasertec Corp | 検査装置及び検査方法並びにそれを用いたパターン基板の製造方法 |
JP4822548B2 (ja) * | 2007-04-23 | 2011-11-24 | レーザーテック株式会社 | 欠陥検査装置 |
JP4876019B2 (ja) * | 2007-04-25 | 2012-02-15 | 株式会社日立ハイテクノロジーズ | 欠陥検査装置およびその方法 |
JP5268061B2 (ja) * | 2008-11-05 | 2013-08-21 | レーザーテック株式会社 | 基板検査装置 |
JP5686394B1 (ja) * | 2014-04-11 | 2015-03-18 | レーザーテック株式会社 | ペリクル検査装置 |
JP2015203658A (ja) * | 2014-04-16 | 2015-11-16 | 株式会社日立ハイテクノロジーズ | 検査装置 |
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2016
- 2016-06-09 JP JP2016115553A patent/JP6517734B2/ja not_active Expired - Fee Related
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Publication number | Publication date |
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JP2017096912A (ja) | 2017-06-01 |
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