JP6500937B2 - 金属電着用陰極板及びその製造方法 - Google Patents

金属電着用陰極板及びその製造方法 Download PDF

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Publication number
JP6500937B2
JP6500937B2 JP2017105796A JP2017105796A JP6500937B2 JP 6500937 B2 JP6500937 B2 JP 6500937B2 JP 2017105796 A JP2017105796 A JP 2017105796A JP 2017105796 A JP2017105796 A JP 2017105796A JP 6500937 B2 JP6500937 B2 JP 6500937B2
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Japan
Prior art keywords
cathode plate
plate
nickel
film
metal plate
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JP2017105796A
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Japanese (ja)
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JP2018199857A (ja
JP2018199857A5 (enrdf_load_stackoverflow
Inventor
寛人 渡邉
寛人 渡邉
いつみ 松岡
いつみ 松岡
祐輔 仙波
祐輔 仙波
小林　宙
宙 小林
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Sumitomo Metal Mining Co Ltd
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Sumitomo Metal Mining Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Sumitomo Metal Mining Co Ltd filed Critical Sumitomo Metal Mining Co Ltd
Priority to JP2017105796A priority Critical patent/JP6500937B2/ja
Priority to CN201880026566.8A priority patent/CN110546310B/zh
Priority to PCT/JP2018/013187 priority patent/WO2018220979A1/ja
Priority to CA3064525A priority patent/CA3064525C/en
Priority to EP18809926.1A priority patent/EP3633074B1/en
Publication of JP2018199857A publication Critical patent/JP2018199857A/ja
Publication of JP2018199857A5 publication Critical patent/JP2018199857A5/ja
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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/16—Apparatus for electrolytic coating of small objects in bulk
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching
    • C23F1/04—Chemical milling
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
    • C25C1/00—Electrolytic production, recovery or refining of metals by electrolysis of solutions
    • C25C1/06—Electrolytic production, recovery or refining of metals by electrolysis of solutions or iron group metals, refractory metals or manganese
    • C25C1/08—Electrolytic production, recovery or refining of metals by electrolysis of solutions or iron group metals, refractory metals or manganese of nickel or cobalt
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
    • C25C7/00—Constructional parts, or assemblies thereof, of cells; Servicing or operating of cells
    • C25C7/02—Electrodes; Connections thereof
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/003—3D structures, e.g. superposed patterned layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/20—Separation of the formed objects from the electrodes with no destruction of said electrodes
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C25D17/12—Shape or form

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  • Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Electrochemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Electrolytic Production Of Metals (AREA)
  • ing And Chemical Polishing (AREA)
  • Milling Processes (AREA)
JP2017105796A 2017-05-29 2017-05-29 金属電着用陰極板及びその製造方法 Active JP6500937B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2017105796A JP6500937B2 (ja) 2017-05-29 2017-05-29 金属電着用陰極板及びその製造方法
CN201880026566.8A CN110546310B (zh) 2017-05-29 2018-03-29 金属电沉积用的阴极板及其制造方法
PCT/JP2018/013187 WO2018220979A1 (ja) 2017-05-29 2018-03-29 金属電着用陰極板及びその製造方法
CA3064525A CA3064525C (en) 2017-05-29 2018-03-29 Cathode plate for metal electrodeposition and manufacturing method for same
EP18809926.1A EP3633074B1 (en) 2017-05-29 2018-03-29 Cathode plate for metal electrodeposition and manufacturing method for same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2017105796A JP6500937B2 (ja) 2017-05-29 2017-05-29 金属電着用陰極板及びその製造方法

Publications (3)

Publication Number Publication Date
JP2018199857A JP2018199857A (ja) 2018-12-20
JP2018199857A5 JP2018199857A5 (enrdf_load_stackoverflow) 2019-02-07
JP6500937B2 true JP6500937B2 (ja) 2019-04-17

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JP2017105796A Active JP6500937B2 (ja) 2017-05-29 2017-05-29 金属電着用陰極板及びその製造方法

Country Status (5)

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EP (1) EP3633074B1 (enrdf_load_stackoverflow)
JP (1) JP6500937B2 (enrdf_load_stackoverflow)
CN (1) CN110546310B (enrdf_load_stackoverflow)
CA (1) CA3064525C (enrdf_load_stackoverflow)
WO (1) WO2018220979A1 (enrdf_load_stackoverflow)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7188219B2 (ja) * 2019-03-25 2022-12-13 住友金属鉱山株式会社 金属電着用の陰極板
JP7188216B2 (ja) * 2019-03-25 2022-12-13 住友金属鉱山株式会社 金属電着用の陰極板の製造方法
JP7188218B2 (ja) * 2019-03-25 2022-12-13 住友金属鉱山株式会社 金属電着用の陰極板
JP7188217B2 (ja) * 2019-03-25 2022-12-13 住友金属鉱山株式会社 金属電着用の陰極板の製造方法
JP7238524B2 (ja) * 2019-03-25 2023-03-14 住友金属鉱山株式会社 金属電着用の陰極板
JP2021095594A (ja) * 2019-12-13 2021-06-24 住友金属鉱山株式会社 ボタン型電気ニッケルの製造方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3668081A (en) * 1971-03-17 1972-06-06 Int Nickel Co Production of electrolytic metal
GB1573449A (en) * 1976-04-01 1980-08-20 Falconbridge Nickel Mines Ltd Reusable electrolysis cathode
US4040915A (en) * 1976-06-15 1977-08-09 The International Nickel Company, Inc. Method for producing regular electronickel or S nickel rounds from electroplating baths giving highly stressed deposits
JPS6038678Y2 (ja) * 1981-05-15 1985-11-19 住友金属鉱山株式会社 金属電着用母板
JPH10317197A (ja) * 1997-05-14 1998-12-02 Sumitomo Metal Mining Co Ltd メッキ用電気ニッケル、その製造用陰極板及び製造方法
WO2002002848A2 (en) * 2000-06-30 2002-01-10 Honeywell International Inc. Method and apparatus for processing metals, and the metals so produced
CN104611730A (zh) * 2008-09-09 2015-05-13 斯提奥摩有限公司 阴极和阴极形成方法
KR101664540B1 (ko) * 2014-04-02 2016-10-25 오씨아이 주식회사 전해 도금용 전극 및 이를 포함하는 전해 도금 장치
CN106661745B (zh) * 2014-07-15 2020-05-01 迪诺拉永久电极股份有限公司 电解用阴极和电解用阴极的制造方法

Also Published As

Publication number Publication date
EP3633074A4 (en) 2021-03-10
EP3633074B1 (en) 2022-10-05
JP2018199857A (ja) 2018-12-20
WO2018220979A1 (ja) 2018-12-06
CN110546310B (zh) 2020-09-15
CN110546310A (zh) 2019-12-06
EP3633074A1 (en) 2020-04-08
CA3064525C (en) 2020-03-24
CA3064525A1 (en) 2018-12-06

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