CN110546310B - 金属电沉积用的阴极板及其制造方法 - Google Patents
金属电沉积用的阴极板及其制造方法 Download PDFInfo
- Publication number
- CN110546310B CN110546310B CN201880026566.8A CN201880026566A CN110546310B CN 110546310 B CN110546310 B CN 110546310B CN 201880026566 A CN201880026566 A CN 201880026566A CN 110546310 B CN110546310 B CN 110546310B
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- cathode plate
- conductive film
- metal plate
- plate
- metal
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- 229910052751 metal Inorganic materials 0.000 title claims abstract description 107
- 239000002184 metal Substances 0.000 title claims abstract description 107
- 238000004070 electrodeposition Methods 0.000 title claims abstract description 41
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 22
- 238000000034 method Methods 0.000 title claims description 31
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 160
- 229910052759 nickel Inorganic materials 0.000 claims description 79
- 239000010935 stainless steel Substances 0.000 claims description 11
- 229910001220 stainless steel Inorganic materials 0.000 claims description 11
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 8
- 239000010936 titanium Substances 0.000 claims description 8
- 238000001039 wet etching Methods 0.000 claims description 7
- 238000007747 plating Methods 0.000 claims description 6
- 230000002093 peripheral effect Effects 0.000 claims description 5
- 229910001200 Ferrotitanium Inorganic materials 0.000 claims description 3
- 238000003754 machining Methods 0.000 claims description 3
- 238000003801 milling Methods 0.000 claims description 3
- 239000010408 film Substances 0.000 description 128
- 238000012423 maintenance Methods 0.000 description 15
- 239000011347 resin Substances 0.000 description 14
- 229920005989 resin Polymers 0.000 description 14
- 230000000052 comparative effect Effects 0.000 description 11
- 238000006073 displacement reaction Methods 0.000 description 8
- 239000000463 material Substances 0.000 description 8
- 238000007650 screen-printing Methods 0.000 description 8
- 229920001187 thermosetting polymer Polymers 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 239000008151 electrolyte solution Substances 0.000 description 5
- 229910052719 titanium Inorganic materials 0.000 description 5
- 238000011161 development Methods 0.000 description 4
- 239000003822 epoxy resin Substances 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 229920000647 polyepoxide Polymers 0.000 description 4
- 230000006866 deterioration Effects 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000000016 photochemical curing Methods 0.000 description 3
- 230000003746 surface roughness Effects 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000001723 curing Methods 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000005868 electrolysis reaction Methods 0.000 description 2
- 239000003792 electrolyte Substances 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 238000001746 injection moulding Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 239000010405 anode material Substances 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000002659 electrodeposit Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- FBAFATDZDUQKNH-UHFFFAOYSA-M iron chloride Chemical compound [Cl-].[Fe] FBAFATDZDUQKNH-UHFFFAOYSA-M 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 238000005488 sandblasting Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/16—Apparatus for electrolytic coating of small objects in bulk
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/02—Local etching
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/02—Local etching
- C23F1/04—Chemical milling
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
- C25C1/00—Electrolytic production, recovery or refining of metals by electrolysis of solutions
- C25C1/06—Electrolytic production, recovery or refining of metals by electrolysis of solutions or iron group metals, refractory metals or manganese
- C25C1/08—Electrolytic production, recovery or refining of metals by electrolysis of solutions or iron group metals, refractory metals or manganese of nickel or cobalt
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
- C25C7/00—Constructional parts, or assemblies thereof, of cells; Servicing or operating of cells
- C25C7/02—Electrodes; Connections thereof
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/003—3D structures, e.g. superposed patterned layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/20—Separation of the formed objects from the electrodes with no destruction of said electrodes
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/10—Electrodes, e.g. composition, counter electrode
- C25D17/12—Shape or form
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Electrochemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Electrolytic Production Of Metals (AREA)
- ing And Chemical Polishing (AREA)
- Milling Processes (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017-105796 | 2017-05-29 | ||
| JP2017105796A JP6500937B2 (ja) | 2017-05-29 | 2017-05-29 | 金属電着用陰極板及びその製造方法 |
| PCT/JP2018/013187 WO2018220979A1 (ja) | 2017-05-29 | 2018-03-29 | 金属電着用陰極板及びその製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN110546310A CN110546310A (zh) | 2019-12-06 |
| CN110546310B true CN110546310B (zh) | 2020-09-15 |
Family
ID=64454726
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201880026566.8A Active CN110546310B (zh) | 2017-05-29 | 2018-03-29 | 金属电沉积用的阴极板及其制造方法 |
Country Status (5)
| Country | Link |
|---|---|
| EP (1) | EP3633074B1 (enrdf_load_stackoverflow) |
| JP (1) | JP6500937B2 (enrdf_load_stackoverflow) |
| CN (1) | CN110546310B (enrdf_load_stackoverflow) |
| CA (1) | CA3064525C (enrdf_load_stackoverflow) |
| WO (1) | WO2018220979A1 (enrdf_load_stackoverflow) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7188219B2 (ja) * | 2019-03-25 | 2022-12-13 | 住友金属鉱山株式会社 | 金属電着用の陰極板 |
| JP7188216B2 (ja) * | 2019-03-25 | 2022-12-13 | 住友金属鉱山株式会社 | 金属電着用の陰極板の製造方法 |
| JP7188218B2 (ja) * | 2019-03-25 | 2022-12-13 | 住友金属鉱山株式会社 | 金属電着用の陰極板 |
| JP7188217B2 (ja) * | 2019-03-25 | 2022-12-13 | 住友金属鉱山株式会社 | 金属電着用の陰極板の製造方法 |
| JP7238524B2 (ja) * | 2019-03-25 | 2023-03-14 | 住友金属鉱山株式会社 | 金属電着用の陰極板 |
| JP2021095594A (ja) * | 2019-12-13 | 2021-06-24 | 住友金属鉱山株式会社 | ボタン型電気ニッケルの製造方法 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1449457A (zh) * | 2000-06-30 | 2003-10-15 | 霍尼韦尔国际公司 | 用于加工金属的方法和设备以及由此生产出的金属 |
| CN102149854A (zh) * | 2008-09-09 | 2011-08-10 | 斯提奥摩有限公司 | 阴极和阴极形成方法 |
| CN106661745A (zh) * | 2014-07-15 | 2017-05-10 | 迪诺拉永久电极股份有限公司 | 电解用阴极和电解用阴极的制造方法 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3668081A (en) * | 1971-03-17 | 1972-06-06 | Int Nickel Co | Production of electrolytic metal |
| GB1573449A (en) * | 1976-04-01 | 1980-08-20 | Falconbridge Nickel Mines Ltd | Reusable electrolysis cathode |
| US4040915A (en) * | 1976-06-15 | 1977-08-09 | The International Nickel Company, Inc. | Method for producing regular electronickel or S nickel rounds from electroplating baths giving highly stressed deposits |
| JPS6038678Y2 (ja) * | 1981-05-15 | 1985-11-19 | 住友金属鉱山株式会社 | 金属電着用母板 |
| JPH10317197A (ja) * | 1997-05-14 | 1998-12-02 | Sumitomo Metal Mining Co Ltd | メッキ用電気ニッケル、その製造用陰極板及び製造方法 |
| KR101664540B1 (ko) * | 2014-04-02 | 2016-10-25 | 오씨아이 주식회사 | 전해 도금용 전극 및 이를 포함하는 전해 도금 장치 |
-
2017
- 2017-05-29 JP JP2017105796A patent/JP6500937B2/ja active Active
-
2018
- 2018-03-29 EP EP18809926.1A patent/EP3633074B1/en active Active
- 2018-03-29 CA CA3064525A patent/CA3064525C/en active Active
- 2018-03-29 CN CN201880026566.8A patent/CN110546310B/zh active Active
- 2018-03-29 WO PCT/JP2018/013187 patent/WO2018220979A1/ja unknown
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1449457A (zh) * | 2000-06-30 | 2003-10-15 | 霍尼韦尔国际公司 | 用于加工金属的方法和设备以及由此生产出的金属 |
| CN102149854A (zh) * | 2008-09-09 | 2011-08-10 | 斯提奥摩有限公司 | 阴极和阴极形成方法 |
| CN106661745A (zh) * | 2014-07-15 | 2017-05-10 | 迪诺拉永久电极股份有限公司 | 电解用阴极和电解用阴极的制造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP3633074A4 (en) | 2021-03-10 |
| EP3633074B1 (en) | 2022-10-05 |
| JP2018199857A (ja) | 2018-12-20 |
| WO2018220979A1 (ja) | 2018-12-06 |
| JP6500937B2 (ja) | 2019-04-17 |
| CN110546310A (zh) | 2019-12-06 |
| EP3633074A1 (en) | 2020-04-08 |
| CA3064525C (en) | 2020-03-24 |
| CA3064525A1 (en) | 2018-12-06 |
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