JP6486388B2 - モノリシックメッシュ支持型ｅｕｖ膜 - Google Patents

モノリシックメッシュ支持型ｅｕｖ膜 Download PDF

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Publication number
JP6486388B2
JP6486388B2 JP2016566848A JP2016566848A JP6486388B2 JP 6486388 B2 JP6486388 B2 JP 6486388B2 JP 2016566848 A JP2016566848 A JP 2016566848A JP 2016566848 A JP2016566848 A JP 2016566848A JP 6486388 B2 JP6486388 B2 JP 6486388B2
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Japan
Prior art keywords
support mesh
euv
membrane layer
mesh
zirconium
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Expired - Fee Related
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JP2016566848A
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Japanese (ja)
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JP2017504080A5 (enExample
JP2017504080A (ja
Inventor
レアソン，ブルース
グローブ，デイビッド
ロペス，ハイジ
エアーズ，トラビス
Original Assignee
ラクセル コーポレーション
ラクセル コーポレーション
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Publication of JP2017504080A5 publication Critical patent/JP2017504080A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2016566848A 2014-01-27 2014-12-29 モノリシックメッシュ支持型ｅｕｖ膜 Expired - Fee Related JP6486388B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201461932017P 2014-01-27 2014-01-27
US61/932,017 2014-01-27
PCT/US2014/072588 WO2015112310A1 (en) 2014-01-27 2014-12-29 A monolithic mesh-supported euv membrane

Publications (3)

Publication Number Publication Date
JP2017504080A JP2017504080A (ja) 2017-02-02
JP2017504080A5 JP2017504080A5 (enExample) 2017-03-09
JP6486388B2 true JP6486388B2 (ja) 2019-03-20

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JP2016566848A Expired - Fee Related JP6486388B2 (ja) 2014-01-27 2014-12-29 モノリシックメッシュ支持型ｅｕｖ膜

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Country Link
US (1) US9606459B2 (enExample)
EP (1) EP3100114B1 (enExample)
JP (1) JP6486388B2 (enExample)
WO (1) WO2015112310A1 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20170146902A1 (en) * 2014-01-27 2017-05-25 Luxel Corporation Monolithic euv transparent membrane and support mesh and method of manufacturing same
US10258930B2 (en) 2015-06-19 2019-04-16 Mark Larson High-performance, low-stress support structure with membrane
US9835940B2 (en) 2015-09-18 2017-12-05 Taiwan Semiconductor Manufacturing Company, Ltd. Method to fabricate mask-pellicle system
KR102743373B1 (ko) * 2015-11-03 2024-12-13 에이에스엠엘 네델란즈 비.브이. 멤브레인 어셈블리 제조 방법
CA3008477A1 (en) 2015-12-17 2017-06-22 Asml Netherlands B.V. Pellicle and pellicle assembly
KR102408195B1 (ko) 2016-04-25 2022-06-13 에이에스엠엘 네델란즈 비.브이. Euv 리소그래피를 위한 멤브레인
KR102691828B1 (ko) * 2021-07-27 2024-08-05 (주)휴넷플러스 관통홀 구조가 형성된 펠리클의 제조방법

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001108799A (ja) * 1999-10-08 2001-04-20 Nikon Corp Ｘ線発生装置、ｘ線露光装置及び半導体デバイスの製造方法
US6623893B1 (en) * 2001-01-26 2003-09-23 Advanced Micro Devices, Inc. Pellicle for use in EUV lithography and a method of making such a pellicle
US7723704B2 (en) * 2006-11-10 2010-05-25 Globalfoundries Inc. EUV pellicle with increased EUV light transmittance
US8018578B2 (en) * 2007-04-19 2011-09-13 Asml Netherlands B.V. Pellicle, lithographic apparatus and device manufacturing method
EP2051139B1 (en) * 2007-10-18 2010-11-24 Shin-Etsu Chemical Co., Ltd. Pellicle and method for manufacturing the same
JP4934099B2 (ja) * 2008-05-22 2012-05-16 信越化学工業株式会社 ペリクルおよびペリクルの製造方法
JP5394808B2 (ja) * 2009-04-22 2014-01-22 信越化学工業株式会社 リソグラフィ用ペリクルおよびその製造方法
JP5921109B2 (ja) 2010-08-23 2016-05-24 キヤノン株式会社 トナー
JP2012151158A (ja) * 2011-01-17 2012-08-09 Shin Etsu Chem Co Ltd Ｅｕｖ用ペリクル膜及びペリクル、並びに該膜の製造方法
KR101303795B1 (ko) 2011-12-26 2013-09-04 주식회사 에프에스티 초극자외선용 펠리클 및 그 제조방법
JP5748347B2 (ja) * 2012-02-09 2015-07-15 信越化学工業株式会社 Ｅｕｖ用ペリクル
JP5711703B2 (ja) * 2012-09-03 2015-05-07 信越化学工業株式会社 Ｅｕｖ用ペリクル
US9057957B2 (en) * 2013-06-13 2015-06-16 International Business Machines Corporation Extreme ultraviolet (EUV) radiation pellicle formation method

Also Published As

Publication number Publication date
EP3100114A1 (en) 2016-12-07
EP3100114B1 (en) 2019-06-19
US20150212434A1 (en) 2015-07-30
JP2017504080A (ja) 2017-02-02
US9606459B2 (en) 2017-03-28
WO2015112310A1 (en) 2015-07-30
EP3100114A4 (en) 2017-09-06

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