JP6484460B2 - Separation membrane operation method and separation membrane modification method - Google Patents
Separation membrane operation method and separation membrane modification method Download PDFInfo
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- JP6484460B2 JP6484460B2 JP2015034342A JP2015034342A JP6484460B2 JP 6484460 B2 JP6484460 B2 JP 6484460B2 JP 2015034342 A JP2015034342 A JP 2015034342A JP 2015034342 A JP2015034342 A JP 2015034342A JP 6484460 B2 JP6484460 B2 JP 6484460B2
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- separation membrane
- bromine
- sulfamic acid
- oxidant
- acid compound
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- 239000012528 membrane Substances 0.000 title claims description 270
- 238000000926 separation method Methods 0.000 title claims description 209
- 238000000034 method Methods 0.000 title claims description 71
- 238000002715 modification method Methods 0.000 title claims description 9
- 239000007800 oxidant agent Substances 0.000 claims description 165
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims description 157
- 229910052794 bromium Inorganic materials 0.000 claims description 154
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 128
- -1 bromine compound Chemical class 0.000 claims description 115
- 230000001590 oxidative effect Effects 0.000 claims description 105
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 104
- JGJLWPGRMCADHB-UHFFFAOYSA-N hypobromite Chemical compound Br[O-] JGJLWPGRMCADHB-UHFFFAOYSA-N 0.000 claims description 96
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 77
- 239000000460 chlorine Substances 0.000 claims description 77
- 229910052801 chlorine Inorganic materials 0.000 claims description 77
- 239000000203 mixture Substances 0.000 claims description 76
- 239000007795 chemical reaction product Substances 0.000 claims description 62
- 229920002647 polyamide Polymers 0.000 claims description 58
- 239000004952 Polyamide Substances 0.000 claims description 28
- 238000002407 reforming Methods 0.000 claims description 16
- 239000003513 alkali Substances 0.000 claims description 14
- 239000011261 inert gas Substances 0.000 claims description 7
- 239000012298 atmosphere Substances 0.000 claims description 6
- 239000007788 liquid Substances 0.000 claims description 5
- CUILPNURFADTPE-UHFFFAOYSA-N hypobromous acid Chemical compound BrO CUILPNURFADTPE-UHFFFAOYSA-N 0.000 claims description 4
- 238000001223 reverse osmosis Methods 0.000 description 25
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 24
- JHJLBTNAGRQEKS-UHFFFAOYSA-M sodium bromide Chemical compound [Na+].[Br-] JHJLBTNAGRQEKS-UHFFFAOYSA-M 0.000 description 18
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 16
- 230000007423 decrease Effects 0.000 description 16
- 238000012986 modification Methods 0.000 description 14
- 230000004048 modification Effects 0.000 description 14
- 238000006243 chemical reaction Methods 0.000 description 13
- QWPPOHNGKGFGJK-UHFFFAOYSA-N hypochlorous acid Chemical compound ClO QWPPOHNGKGFGJK-UHFFFAOYSA-N 0.000 description 12
- 238000005660 chlorination reaction Methods 0.000 description 11
- 230000000694 effects Effects 0.000 description 11
- 229910052736 halogen Inorganic materials 0.000 description 11
- 150000002367 halogens Chemical class 0.000 description 11
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 10
- 150000003839 salts Chemical class 0.000 description 10
- 238000004519 manufacturing process Methods 0.000 description 9
- 239000003607 modifier Substances 0.000 description 9
- 238000002360 preparation method Methods 0.000 description 9
- 239000000243 solution Substances 0.000 description 9
- SXDBWCPKPHAZSM-UHFFFAOYSA-N bromic acid Chemical compound OBr(=O)=O SXDBWCPKPHAZSM-UHFFFAOYSA-N 0.000 description 8
- 238000002347 injection Methods 0.000 description 8
- 239000007924 injection Substances 0.000 description 8
- LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 description 8
- 239000012466 permeate Substances 0.000 description 8
- 229920005597 polymer membrane Polymers 0.000 description 8
- 239000000126 substance Substances 0.000 description 8
- 239000003795 chemical substances by application Substances 0.000 description 7
- 230000006866 deterioration Effects 0.000 description 7
- 229920000642 polymer Polymers 0.000 description 7
- 239000005708 Sodium hypochlorite Substances 0.000 description 6
- CODNYICXDISAEA-UHFFFAOYSA-N bromine monochloride Chemical compound BrCl CODNYICXDISAEA-UHFFFAOYSA-N 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 5
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 5
- SXDBWCPKPHAZSM-UHFFFAOYSA-M bromate Inorganic materials [O-]Br(=O)=O SXDBWCPKPHAZSM-UHFFFAOYSA-M 0.000 description 5
- 239000001301 oxygen Substances 0.000 description 5
- 229910052760 oxygen Inorganic materials 0.000 description 5
- 239000011780 sodium chloride Substances 0.000 description 5
- 229910052783 alkali metal Inorganic materials 0.000 description 4
- DKSMCEUSSQTGBK-UHFFFAOYSA-M bromite Chemical compound [O-]Br=O DKSMCEUSSQTGBK-UHFFFAOYSA-M 0.000 description 4
- 125000004432 carbon atom Chemical group C* 0.000 description 4
- 230000007797 corrosion Effects 0.000 description 4
- 238000005260 corrosion Methods 0.000 description 4
- 239000002270 dispersing agent Substances 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- 239000003112 inhibitor Substances 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 239000003814 drug Substances 0.000 description 3
- 229940079593 drug Drugs 0.000 description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000001728 nano-filtration Methods 0.000 description 3
- NLKNQRATVPKPDG-UHFFFAOYSA-M potassium iodide Chemical compound [K+].[I-] NLKNQRATVPKPDG-UHFFFAOYSA-M 0.000 description 3
- 230000001629 suppression Effects 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 229910001854 alkali hydroxide Inorganic materials 0.000 description 2
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 2
- QBWCMBCROVPCKQ-UHFFFAOYSA-N chlorous acid Chemical compound OCl=O QBWCMBCROVPCKQ-UHFFFAOYSA-N 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 238000010612 desalination reaction Methods 0.000 description 2
- OSVXSBDYLRYLIG-UHFFFAOYSA-N dioxidochlorine(.) Chemical compound O=Cl=O OSVXSBDYLRYLIG-UHFFFAOYSA-N 0.000 description 2
- WQYVRQLZKVEZGA-UHFFFAOYSA-N hypochlorite Chemical compound Cl[O-] WQYVRQLZKVEZGA-UHFFFAOYSA-N 0.000 description 2
- 230000002401 inhibitory effect Effects 0.000 description 2
- AMXOYNBUYSYVKV-UHFFFAOYSA-M lithium bromide Chemical compound [Li+].[Br-] AMXOYNBUYSYVKV-UHFFFAOYSA-M 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 238000001471 micro-filtration Methods 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 2
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 description 2
- 239000000376 reactant Substances 0.000 description 2
- 238000011084 recovery Methods 0.000 description 2
- 230000002829 reductive effect Effects 0.000 description 2
- QDWYPRSFEZRKDK-UHFFFAOYSA-M sodium;sulfamate Chemical compound [Na+].NS([O-])(=O)=O QDWYPRSFEZRKDK-UHFFFAOYSA-M 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000011550 stock solution Substances 0.000 description 2
- VYECFMCAAHMRNW-UHFFFAOYSA-N sulfamic acid Chemical compound NS(O)(=O)=O.NS(O)(=O)=O VYECFMCAAHMRNW-UHFFFAOYSA-N 0.000 description 2
- 238000000108 ultra-filtration Methods 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- BZSXEZOLBIJVQK-UHFFFAOYSA-N 2-methylsulfonylbenzoic acid Chemical compound CS(=O)(=O)C1=CC=CC=C1C(O)=O BZSXEZOLBIJVQK-UHFFFAOYSA-N 0.000 description 1
- BMYNFMYTOJXKLE-UHFFFAOYSA-N 3-azaniumyl-2-hydroxypropanoate Chemical compound NCC(O)C(O)=O BMYNFMYTOJXKLE-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- ZKQDCIXGCQPQNV-UHFFFAOYSA-N Calcium hypochlorite Chemical compound [Ca+2].Cl[O-].Cl[O-] ZKQDCIXGCQPQNV-UHFFFAOYSA-N 0.000 description 1
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 1
- 239000004155 Chlorine dioxide Substances 0.000 description 1
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical compound OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 description 1
- 229920002125 Sokalan® Polymers 0.000 description 1
- WOHVONCNVLIHKY-UHFFFAOYSA-L [Ba+2].[O-]Cl=O.[O-]Cl=O Chemical compound [Ba+2].[O-]Cl=O.[O-]Cl=O WOHVONCNVLIHKY-UHFFFAOYSA-L 0.000 description 1
- SWLVFNYSXGMGBS-UHFFFAOYSA-N ammonium bromide Chemical compound [NH4+].[Br-] SWLVFNYSXGMGBS-UHFFFAOYSA-N 0.000 description 1
- KHPLPBHMTCTCHA-UHFFFAOYSA-N ammonium chlorate Chemical compound N.OCl(=O)=O KHPLPBHMTCTCHA-UHFFFAOYSA-N 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- ISFLYIRWQDJPDR-UHFFFAOYSA-L barium chlorate Chemical compound [Ba+2].[O-]Cl(=O)=O.[O-]Cl(=O)=O ISFLYIRWQDJPDR-UHFFFAOYSA-L 0.000 description 1
- HPEWZLCIOKVLBZ-UHFFFAOYSA-N barium hypochlorite Chemical compound [Ba+2].Cl[O-].Cl[O-] HPEWZLCIOKVLBZ-UHFFFAOYSA-N 0.000 description 1
- 159000000009 barium salts Chemical class 0.000 description 1
- BEHLMOQXOSLGHN-UHFFFAOYSA-N benzenamine sulfate Chemical compound OS(=O)(=O)NC1=CC=CC=C1 BEHLMOQXOSLGHN-UHFFFAOYSA-N 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- JVRFDDZTAVRMCC-UHFFFAOYSA-N bromic acid hypochlorous acid Chemical compound ClO.Br(=O)(=O)O JVRFDDZTAVRMCC-UHFFFAOYSA-N 0.000 description 1
- FECFIIXKXJBOSU-UHFFFAOYSA-N butylsulfamic acid Chemical group CCCCNS(O)(=O)=O FECFIIXKXJBOSU-UHFFFAOYSA-N 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- YALMXYPQBUJUME-UHFFFAOYSA-L calcium chlorate Chemical compound [Ca+2].[O-]Cl(=O)=O.[O-]Cl(=O)=O YALMXYPQBUJUME-UHFFFAOYSA-L 0.000 description 1
- 159000000007 calcium salts Chemical class 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- XTEGARKTQYYJKE-UHFFFAOYSA-N chloric acid Chemical compound OCl(=O)=O XTEGARKTQYYJKE-UHFFFAOYSA-N 0.000 description 1
- 229940005991 chloric acid Drugs 0.000 description 1
- 239000012320 chlorinating reagent Substances 0.000 description 1
- 235000019398 chlorine dioxide Nutrition 0.000 description 1
- OGQPUOLFKIMRMF-UHFFFAOYSA-N chlorosulfamic acid Chemical compound OS(=O)(=O)NCl OGQPUOLFKIMRMF-UHFFFAOYSA-N 0.000 description 1
- 229940077239 chlorous acid Drugs 0.000 description 1
- 150000001868 cobalt Chemical class 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 150000001879 copper Chemical class 0.000 description 1
- 150000007973 cyanuric acids Chemical class 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- BAQKWXACUNEBOT-UHFFFAOYSA-N dibutylsulfamic acid Chemical compound CCCCN(S(O)(=O)=O)CCCC BAQKWXACUNEBOT-UHFFFAOYSA-N 0.000 description 1
- YGNOYUCUPMACDT-UHFFFAOYSA-N dimethylsulfamic acid Chemical compound CN(C)S(O)(=O)=O YGNOYUCUPMACDT-UHFFFAOYSA-N 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- XRVWREPFYXZOPK-UHFFFAOYSA-N dipropylsulfamic acid Chemical compound CCCN(S(O)(=O)=O)CCC XRVWREPFYXZOPK-UHFFFAOYSA-N 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- IOISAJSHULNACL-UHFFFAOYSA-N ethyl(methyl)sulfamic acid Chemical compound CCN(C)S(O)(=O)=O IOISAJSHULNACL-UHFFFAOYSA-N 0.000 description 1
- SIVVHUQWDOGLJN-UHFFFAOYSA-N ethylsulfamic acid Chemical group CCNS(O)(=O)=O SIVVHUQWDOGLJN-UHFFFAOYSA-N 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 150000002357 guanidines Chemical class 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 150000002505 iron Chemical class 0.000 description 1
- 150000002696 manganese Chemical class 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- YZVQGLCYZLGIAM-UHFFFAOYSA-N methyl(propyl)sulfamic acid Chemical compound CCCN(C)S(O)(=O)=O YZVQGLCYZLGIAM-UHFFFAOYSA-N 0.000 description 1
- MYMDOKBFMTVEGE-UHFFFAOYSA-N methylsulfamic acid Chemical group CNS(O)(=O)=O MYMDOKBFMTVEGE-UHFFFAOYSA-N 0.000 description 1
- 150000002815 nickel Chemical class 0.000 description 1
- AMULHDKUJWPBKU-UHFFFAOYSA-L nickel(2+);dichlorite Chemical compound [Ni+2].[O-]Cl=O.[O-]Cl=O AMULHDKUJWPBKU-UHFFFAOYSA-L 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920001444 polymaleic acid Polymers 0.000 description 1
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 1
- VKJKEPKFPUWCAS-UHFFFAOYSA-M potassium chlorate Chemical compound [K+].[O-]Cl(=O)=O VKJKEPKFPUWCAS-UHFFFAOYSA-M 0.000 description 1
- SATVIFGJTRRDQU-UHFFFAOYSA-N potassium hypochlorite Chemical compound [K+].Cl[O-] SATVIFGJTRRDQU-UHFFFAOYSA-N 0.000 description 1
- VISKNDGJUCDNMS-UHFFFAOYSA-M potassium;chlorite Chemical compound [K+].[O-]Cl=O VISKNDGJUCDNMS-UHFFFAOYSA-M 0.000 description 1
- JWQSOOZHYMZRBT-UHFFFAOYSA-N propan-2-ylsulfamic acid Chemical group CC(C)NS(O)(=O)=O JWQSOOZHYMZRBT-UHFFFAOYSA-N 0.000 description 1
- HLIBNTOXKQCYMV-UHFFFAOYSA-N propylsulfamic acid Chemical group CCCNS(O)(=O)=O HLIBNTOXKQCYMV-UHFFFAOYSA-N 0.000 description 1
- 239000013535 sea water Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- UKLNMMHNWFDKNT-UHFFFAOYSA-M sodium chlorite Chemical compound [Na+].[O-]Cl=O UKLNMMHNWFDKNT-UHFFFAOYSA-M 0.000 description 1
- 229960002218 sodium chlorite Drugs 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- AKHNMLFCWUSKQB-UHFFFAOYSA-L sodium thiosulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=S AKHNMLFCWUSKQB-UHFFFAOYSA-L 0.000 description 1
- 235000019345 sodium thiosulphate Nutrition 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 230000001954 sterilising effect Effects 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 159000000008 strontium salts Chemical class 0.000 description 1
- IIACRCGMVDHOTQ-UHFFFAOYSA-M sulfamate Chemical compound NS([O-])(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-M 0.000 description 1
- IIACRCGMVDHOTQ-UHFFFAOYSA-N sulfamic acid Chemical class NS(O)(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-N 0.000 description 1
- FDDDEECHVMSUSB-UHFFFAOYSA-N sulfanilamide Chemical compound NC1=CC=C(S(N)(=O)=O)C=C1 FDDDEECHVMSUSB-UHFFFAOYSA-N 0.000 description 1
- 229940124530 sulfonamide Drugs 0.000 description 1
- 239000008400 supply water Substances 0.000 description 1
- 238000004448 titration Methods 0.000 description 1
- 229910021642 ultra pure water Inorganic materials 0.000 description 1
- 239000012498 ultrapure water Substances 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
- 150000003751 zinc Chemical class 0.000 description 1
Landscapes
- Separation Using Semi-Permeable Membranes (AREA)
Description
本発明は、逆浸透膜等の分離膜の運転方法、分離膜の改質方法、および分離膜に関する。 The present invention relates to a method for operating a separation membrane such as a reverse osmosis membrane, a method for modifying a separation membrane, and a separation membrane.
逆浸透膜(RO膜)やナノろ過膜(NF膜)等のポリアミド系の分離膜の運転において、例えばスライム抑制を目的として各種の臭素系酸化剤を使用した場合、臭素系酸化剤が分離膜に流入する場合がある。臭素系酸化剤としては、次亜塩素酸等の酸化剤と臭化物イオンの反応物、次亜臭素酸等が挙げられる。しかし、これらの臭素系酸化剤は、被処理水のpHが低いほど、分離膜の透過水量を低下させ易いという問題が知られている(非特許文献1参照)。 In the operation of polyamide-based separation membranes such as reverse osmosis membranes (RO membranes) and nanofiltration membranes (NF membranes), for example, when various bromine-based oxidants are used for the purpose of slime suppression, bromine-based oxidants are used as separation membranes. May flow into. Examples of the bromine-based oxidizing agent include a reaction product of an oxidizing agent such as hypochlorous acid and bromide ions, and hypobromite. However, these brominated oxidants are known to have a problem that the lower the pH of the water to be treated, the easier it is to reduce the amount of permeated water of the separation membrane (see Non-Patent Document 1).
本発明の目的は、分離膜に臭素系酸化剤が接触しても透過水量の低下が抑制され、安定的に分離膜装置を運転する分離膜の運転方法を提供することにある。また、本発明の目的は、分離膜の劣化を抑制しつつ、透過水量および透過水質を改善するための分離膜の改質方法、その改質方法により改質された逆浸透膜を提供することにある。 An object of the present invention is to provide a method for operating a separation membrane in which a decrease in the amount of permeate is suppressed even when a bromine-based oxidant comes into contact with the separation membrane, and the separation membrane device is stably operated. Another object of the present invention is to provide a method for modifying a separation membrane for improving the amount of permeated water and the quality of permeated water while suppressing deterioration of the separation membrane, and a reverse osmosis membrane modified by the modifying method. It is in.
本発明は、塩素系酸化剤で塩素処理されたポリアミド系の分離膜に安定化次亜臭素酸組成物を接触させ、前記安定化次亜臭素酸組成物が、臭素系酸化剤、もしくは臭素化合物と塩素系酸化剤との反応物と、スルファミン酸化合物とを含有する、または、臭素系酸化剤、もしくは臭素化合物と塩素系酸化剤との反応物と、スルファミン酸化合物との反応生成物を含有し、前記分離膜に前記安定化次亜臭素酸組成物を接触させる際の被処理水のpHが6.0以上である分離膜の運転方法である。 According to the present invention, a stabilized hypobromite composition is brought into contact with a polyamide separation membrane that has been chlorinated with a chlorine-based oxidant, and the stabilized hypobromite composition is a bromine-based oxidant or a bromine compound. Contains a reaction product of a chlorinated oxidant and a sulfamic acid compound, or a reaction product of a brominated oxidant or a reaction product of a bromine compound and a chlorinated oxidant, and a sulfamic acid compound. and, wherein the pH of the water to be treated when the contacting stabilized hypobromous acid composition on the separation membrane is a driving method of 6.0 or more der Ru separation membrane.
前記分離膜の運転方法において、前記安定化次亜臭素酸組成物が、臭素とスルファミン酸化合物とを含有する、または、臭素とスルファミン酸化合物との反応生成物を含有することが好ましい。 In the operation method of the separation membrane, the stabilized hypobromite composition preferably contains bromine and a sulfamic acid compound, or contains a reaction product of bromine and a sulfamic acid compound.
前記分離膜の運転方法において、前記臭素とスルファミン酸化合物との反応生成物が、水、アルカリおよびスルファミン酸化合物を含む混合液に臭素を不活性ガス雰囲気下で添加して反応させる工程を含む方法により得られたものであることが好ましい。 In the method for operating the separation membrane, the reaction product of bromine and a sulfamic acid compound includes a step of reacting a mixed liquid containing water, an alkali and a sulfamic acid compound by adding bromine in an inert gas atmosphere. It is preferable that it was obtained by.
本発明は、塩素系酸化剤で塩素処理されたポリアミド系の分離膜に安定化次亜臭素酸組成物を接触させ、前記安定化次亜臭素酸組成物が、臭素系酸化剤、もしくは臭素化合物と塩素系酸化剤との反応物と、スルファミン酸化合物とを含有する、または、臭素系酸化剤、もしくは臭素化合物と塩素系酸化剤との反応物と、スルファミン酸化合物との反応生成物を含有し、前記分離膜に前記安定化次亜臭素酸組成物を接触させる際の被処理水のpHが6.0以上である分離膜の改質方法である。 According to the present invention, a stabilized hypobromite composition is brought into contact with a polyamide separation membrane that has been chlorinated with a chlorine-based oxidant, and the stabilized hypobromite composition is a bromine-based oxidant or a bromine compound. Contains a reaction product of a chlorinated oxidant and a sulfamic acid compound, or a reaction product of a brominated oxidant or a reaction product of a bromine compound and a chlorinated oxidant, and a sulfamic acid compound. and, wherein the pH of the water to be treated when the contacting stabilized hypobromous acid composition on the separation membrane is a method of modifying a separation membrane Ru der 6.0 or more.
前記分離膜の改質方法において、前記安定化次亜臭素酸組成物が、臭素とスルファミン酸化合物とを含有する、または、臭素とスルファミン酸化合物との反応生成物を含有することが好ましい。 In the separation membrane modification method, it is preferable that the stabilized hypobromite composition contains bromine and a sulfamic acid compound or a reaction product of bromine and a sulfamic acid compound.
前記分離膜の改質方法において、前記臭素とスルファミン酸化合物との反応生成物が、水、アルカリおよびスルファミン酸化合物を含む混合液に臭素を不活性ガス雰囲気下で添加して反応させる工程を含む方法により得られたものであることが好ましい。 In the method for reforming the separation membrane, the reaction product of bromine and a sulfamic acid compound includes a step of adding bromine to a mixed liquid containing water, an alkali, and a sulfamic acid compound in an inert gas atmosphere to cause a reaction. It is preferable that it is obtained by the method.
本発明は、前記分離膜の改質方法により改質された分離膜である。 The present invention is a separation membrane modified by the separation membrane modification method.
本発明の分離膜の運転方法では、分離膜に予め塩素処理が施されることで、その後、分離膜に臭素系酸化剤が接触しても透過水量の低下が抑制され、安定的に分離膜装置を運転することができる。また、本発明では、分離膜の劣化を抑制しつつ、透過水量および透過水質を改善するための分離膜の改質方法、その改質方法により改質された分離膜を提供することができる。 In the operation method of the separation membrane of the present invention, the separation membrane is subjected to chlorination in advance, so that even if the bromine-based oxidant comes into contact with the separation membrane thereafter, a decrease in the amount of permeate is suppressed, and the separation membrane is stably provided. The device can be operated. Further, the present invention can provide a method for modifying a separation membrane for improving the amount of permeated water and the quality of permeated water while suppressing deterioration of the separation membrane, and a separation membrane modified by the modifying method.
本発明の実施の形態について以下説明する。本実施形態は本発明を実施する一例であって、本発明は本実施形態に限定されるものではない。 Embodiments of the present invention will be described below. This embodiment is an example for carrying out the present invention, and the present invention is not limited to this embodiment.
<分離膜の運転方法>
本発明の実施形態に係る分離膜の運転方法は、塩素系酸化剤で塩素処理されたポリアミド系の分離膜に臭素系酸化剤を接触させる方法である。
<Operation method of separation membrane>
The operation method of the separation membrane according to the embodiment of the present invention is a method in which a bromine-based oxidizing agent is brought into contact with a polyamide-based separation membrane that has been chlorinated with a chlorine-based oxidizing agent.
本発明の実施形態に係る分離膜の運転方法は、ポリアミド系の分離膜への給水または洗浄水等の中に、塩素系酸化剤を存在させて接触させた後、臭素系酸化剤を存在させて接触させる方法である。塩素系酸化剤で塩素処理されたポリアミド系の分離膜への給水等の中に、臭素系酸化剤を存在させて接触させてもよい。また、本実施形態に関わる分離膜の運転方法は、事前に塩素系酸化剤を接触させた分離膜を使用して、現場で臭素系酸化剤を接触させてもよいし、現場で分離膜に塩素系酸化剤を接触させた後に、臭素系酸化剤を接触させてもよい。 In the operation method of the separation membrane according to the embodiment of the present invention, after bringing the chlorinated oxidant into contact with the supply water or the washing water to the polyamide-based separation membrane, the bromine-based oxidant is present. It is a method of making contact. A bromine-based oxidant may be present in contact with the polyamide-type separation membrane chlorinated with a chlorine-based oxidant, for example. In addition, the operation method of the separation membrane according to this embodiment may use a separation membrane that has been contacted with a chlorine-based oxidant in advance, and may contact the bromine-based oxidant on-site, or the separation membrane on-site. After contacting the chlorine-based oxidizing agent, the bromine-based oxidizing agent may be contacted.
これらの方法により、ポリアミド系の分離膜に予め塩素系酸化剤を十分接触させて塩素処理することで、分離膜に臭素系酸化剤が接触しても透過水量の低下が抑制され、安定的に分離膜装置を運転することができる。分離膜に予め塩素系酸化剤を接触させることで分離膜材質内に塩素が導入される。塩素が導入された膜では、臭素が導入されにくくなるため、一般的に透過水量低下を引き起こす臭素系酸化剤の影響を受け難くなると推測される。 By these methods, a chlorine-based oxidant is sufficiently brought into contact with a polyamide-based separation membrane in advance to perform chlorination, and even if a bromine-based oxidant comes into contact with the separation membrane, a decrease in the amount of permeated water is suppressed and stable. The separation membrane device can be operated. Chlorine is introduced into the material of the separation membrane by previously contacting the separation membrane with a chlorine-based oxidant. In a membrane into which chlorine has been introduced, bromine is less likely to be introduced, so it is generally assumed that the membrane is less susceptible to the influence of a bromine-based oxidant that causes a reduction in the amount of permeated water.
分離膜への塩素系酸化剤および臭素系酸化剤の接触は、常圧条件下、加圧条件下または減圧条件下で行えばよいが、分離膜の塩素処理を確実に行うことができる、処理水を製造しながら接触処理を行うことができる等の点から、加圧条件下で行うことが好ましい。分離膜への塩素系酸化剤および臭素系酸化剤の接触は、例えば、0.1MPa〜10MPaの範囲の加圧条件下で行うことが好ましい。 The contact of the chlorine-based oxidant and bromine-based oxidant to the separation membrane may be performed under normal pressure, pressurized or reduced pressure conditions, but the separation membrane can be reliably chlorinated. In view of being able to perform contact treatment while producing water, it is preferable to carry out under pressure. The contact of the chlorine-based oxidant and the bromine-based oxidant with the separation membrane is preferably performed under a pressure condition in the range of 0.1 MPa to 10 MPa, for example.
分離膜への塩素系酸化剤および臭素系酸化剤の接触は、例えば、0℃〜100℃の範囲の温度条件下で行えばよい。 The contact of the chlorine-based oxidant and the bromine-based oxidant with the separation membrane may be performed, for example, under temperature conditions in the range of 0 ° C to 100 ° C.
分離膜への塩素系酸化剤の接触は、有効塩素濃度[mg−Cl/L]×時間[hr]の値として、0.1〜1000mg−Cl/L・hrであることが好ましい。0.1mg−Cl/L・hr未満であると、膜に対して十分な塩素処理効果が得られず、1000mg−Cl/L・hrを超えると、膜を劣化させる場合がある。 The contact of the chlorine-based oxidizing agent with the separation membrane is preferably 0.1 to 1000 mg-Cl / L · hr as a value of effective chlorine concentration [mg-Cl / L] × time [hr]. If the amount is less than 0.1 mg-Cl / L · hr, a sufficient chlorination effect cannot be obtained for the membrane, and if it exceeds 1000 mg-Cl / L · hr, the membrane may be deteriorated.
分離膜に接触する臭素系酸化剤による有効ハロゲン濃度は有効塩素濃度換算で、0.01〜100mg/Lであることが好ましい。0.01mg/L未満であると、十分なスライム抑制効果等を得ることができない場合があり、100mg/Lより多いと、分離膜の劣化、配管等の腐食を引き起こす可能性がある。 The effective halogen concentration by the bromine-based oxidizing agent that contacts the separation membrane is preferably 0.01 to 100 mg / L in terms of effective chlorine concentration. If it is less than 0.01 mg / L, a sufficient slime-inhibiting effect may not be obtained. If it is more than 100 mg / L, there is a possibility of causing deterioration of the separation membrane and corrosion of the piping.
塩素系酸化剤が接触する際の被処理水のpHは4〜13の範囲であることが好ましく、6〜12の範囲であることがより好ましい。pH4未満である場合は、透過水量が低下する場合があり、pH13を超えると、分離膜が劣化する場合がある。 The pH of the water to be treated when the chlorine-based oxidizing agent comes into contact is preferably in the range of 4 to 13, and more preferably in the range of 6 to 12. When the pH is less than 4, the amount of permeated water may decrease, and when the pH exceeds 13, the separation membrane may deteriorate.
臭素系酸化剤が接触する際の被処理水のpHは5.5以上であることが好ましく、6.0以上であることがより好ましく、pH6.5〜10の範囲であることがさらに好ましい。pH5.5未満である場合は、あらかじめ分離膜に塩素処理を施していても、臭素系酸化剤による透過水量低下の影響を受ける場合がある。pH10を超えると、透過水量が増加しすぎる場合がある。 The pH of the water to be treated when the bromine-based oxidant comes into contact is preferably 5.5 or more, more preferably 6.0 or more, and even more preferably in the range of pH 6.5 to 10. When the pH is less than 5.5, even if the separation membrane has been subjected to chlorination in advance, it may be affected by a decrease in the amount of permeated water due to the bromine-based oxidizing agent. If the pH exceeds 10, the amount of permeated water may increase too much.
本実施形態に係る分離膜の運転方法において、塩素系酸化剤としては、特に制限はない。塩素系酸化剤としては、例えば、塩素ガス、二酸化塩素、次亜塩素酸またはその塩、亜塩素酸またはその塩、塩素酸またはその塩、過塩素酸またはその塩、塩素化イソシアヌル酸またはその塩等が挙げられる。これらのうち、塩としては、例えば、次亜塩素酸ナトリウム、次亜塩素酸カリウム等の次亜塩素酸アルカリ金属塩、次亜塩素酸カルシウム、次亜塩素酸バリウム等の次亜塩素酸アルカリ土類金属塩、亜塩素酸ナトリウム、亜塩素酸カリウム等の亜塩素酸アルカリ金属塩、亜塩素酸バリウム等の亜塩素酸アルカリ土類金属塩、亜塩素酸ニッケル等の他の亜塩素酸金属塩、塩素酸アンモニウム、塩素酸ナトリウム、塩素酸カリウム等の塩素酸アルカリ金属塩、塩素酸カルシウム、塩素酸バリウム等の塩素酸アルカリ土類金属塩等が挙げられる。これらの塩素系酸化剤は、1種を単独で用いても、2種以上を組み合わせて用いてもよい。塩素系酸化剤としては、取り扱い性等の点から、次亜塩素酸ナトリウムを用いるのが好ましい。 In the operation method of the separation membrane according to the present embodiment, there is no particular limitation on the chlorinated oxidant. Examples of the chlorine-based oxidizing agent include chlorine gas, chlorine dioxide, hypochlorous acid or a salt thereof, chlorous acid or a salt thereof, chloric acid or a salt thereof, perchloric acid or a salt thereof, chlorinated isocyanuric acid or a salt thereof. Etc. Among these, examples of the salt include alkali metal hypochlorites such as sodium hypochlorite and potassium hypochlorite, alkaline earth hypochlorite such as calcium hypochlorite and barium hypochlorite. Metal salts, alkali metal chlorites such as sodium chlorite and potassium chlorite, alkaline earth metal chlorites such as barium chlorite, and other metal chlorites such as nickel chlorite , Alkali metal chlorates such as ammonium chlorate, sodium chlorate and potassium chlorate, and alkaline earth metal chlorates such as calcium chlorate and barium chlorate. These chlorine-based oxidants may be used alone or in combination of two or more. As the chlorine-based oxidant, sodium hypochlorite is preferably used from the viewpoint of handleability.
本実施形態に係る分離膜の運転方法において、臭素系酸化剤としては、特に制限はない。臭素系酸化剤としては、「次亜臭素酸塩」等や、「塩素系酸化剤と臭化物イオンとの反応生成物」、「安定化次亜臭素酸組成物」等が挙げられるが、好ましくは「安定化次亜臭素酸組成物」である。「安定化次亜臭素酸組成物」は、分離膜の阻止率への悪影響が小さく、塩素処理された分離膜に連続的に添加しても、長期間安定して運転することができる。 In the operation method of the separation membrane according to the present embodiment, the bromine-based oxidant is not particularly limited. Examples of bromine-based oxidizing agents include “hypobromite”, “reaction product of chlorine-based oxidizing agent and bromide ions”, “stabilized hypobromite composition”, etc. “Stabilized hypobromite composition”. The “stabilized hypobromite composition” has little adverse effect on the rejection of the separation membrane, and can be stably operated for a long time even when continuously added to the chlorinated separation membrane.
例えば、ポリアミド系の分離膜への給水等の中に、塩素系酸化剤を存在させて接触させた後、「臭素系酸化剤」と「スルファミン酸化合物」とを存在させてポリアミド系の分離膜に接触させる、または「臭素化合物と塩素系酸化剤との反応物」と「スルファミン酸化合物」とを存在させてポリアミド系の分離膜に接触させる。これにより、給水等の中で、安定化次亜臭素酸組成物が生成すると考えられる。 For example, in a feed water to a polyamide-based separation membrane, a chlorinated oxidant is present and contacted, and then a “bromine-based oxidant” and a “sulfamic acid compound” are present to form a polyamide-based separation membrane. Or “reactant of bromine compound and chlorinated oxidant” and “sulfamic acid compound” are present in contact with the polyamide separation membrane. Thereby, it is thought that the stabilized hypobromite composition produces | generates in water supply etc.
また、例えば、ポリアミド系の分離膜への給水等の中に、塩素系酸化剤を存在させて接触させた後、「臭素系酸化剤とスルファミン酸化合物との反応生成物」である安定化次亜臭素酸組成物を存在させてポリアミド系の分離膜に接触させる、または「臭素化合物と塩素系酸化剤との反応物と、スルファミン酸化合物と、の反応生成物」である安定化次亜臭素酸組成物を存在させてポリアミド系の分離膜に接触させてもよい。 In addition, for example, in the water supply to a polyamide-based separation membrane, after the presence of a chlorine-based oxidant and contact, a stabilization reaction that is a “reaction product of a bromine-based oxidant and a sulfamic acid compound” Stabilized hypobromite in the presence of a bromite composition in contact with a polyamide separation membrane or “reaction product of a reaction product of a bromine compound and a chlorine-based oxidant and a sulfamic acid compound” An acid composition may be present and contacted with the polyamide separation membrane.
具体的には本発明の実施形態に係る分離膜の運転方法は、例えば、ポリアミド系の分離膜への給水等の中に、塩素系酸化剤を存在させて接触させた後、「臭素」、「塩化臭素」または「臭化ナトリウムと次亜塩素酸との反応物」と、「スルファミン酸化合物」と、を存在させてポリアミド系の分離膜に接触させる方法である。 Specifically, in the operation method of the separation membrane according to the embodiment of the present invention, for example, in the water supply to the polyamide-type separation membrane, after bringing the chlorinated oxidant into contact therewith, “bromine”, In this method, “bromine chloride” or “reaction product of sodium bromide and hypochlorous acid” and “sulfamic acid compound” are present and brought into contact with a polyamide separation membrane.
また、本発明の実施形態に係る分離膜の運転方法は、例えば、ポリアミド系の分離膜への給水等の中に、塩素系酸化剤を存在させて接触させた後、「臭素とスルファミン酸化合物との反応生成物」、「塩化臭素とスルファミン酸化合物との反応生成物」、または「臭化ナトリウムと次亜塩素酸との反応物と、スルファミン酸化合物と、の反応生成物」である安定化次亜臭素酸組成物を存在させてポリアミド系の分離膜に接触させる方法である。 Further, the operation method of the separation membrane according to the embodiment of the present invention is, for example, a method in which a bromine and a sulfamic acid compound are contacted in the presence of a chlorine-based oxidizing agent in water supply to a polyamide-based separation membrane. A reaction product of “a reaction product of sulfamic acid compound with sodium bromide and hypochlorous acid” or “a reaction product of a reaction product of sodium bromide with hypochlorous acid”. This is a method in which a hypobromite composition is present and brought into contact with a polyamide separation membrane.
本実施形態に係る分離膜の運転方法では、例えば、ポリアミド系の分離膜を備える分離膜装置の運転の際に、分離膜への給水等の中に、塩素系酸化剤を薬注ポンプ等により注入した後、「臭素系酸化剤」または「臭素化合物と塩素系酸化剤との反応物」と、「スルファミン酸化合物」とを薬注ポンプ等により注入すればよい。「臭素系酸化剤」または「臭素化合物と塩素系酸化剤との反応物」と、「スルファミン酸化合物」とは別々に給水中に添加してもよく、または、原液同士で混合させてから給水中に添加してもよい。 In the operation method of the separation membrane according to the present embodiment, for example, when operating a separation membrane device including a polyamide-based separation membrane, a chlorine-based oxidant is supplied to the separation membrane by using a chemical injection pump or the like. After injection, “bromine-based oxidant” or “reaction product of bromine compound and chlorine-based oxidant” and “sulfamic acid compound” may be injected by a chemical injection pump or the like. “Brominated oxidant” or “reaction product of bromine compound and chlorinated oxidant” and “sulfamic acid compound” may be added separately to the feed water, or mixed with the stock solution before feeding water. It may be added inside.
また、例えば、ポリアミド系の分離膜への給水等の中に、塩素系酸化剤を薬注ポンプ等により注入した後、「臭素系酸化剤とスルファミン酸化合物との反応生成物」、または「臭素化合物と塩素系酸化剤との反応物と、スルファミン酸化合物と、の反応生成物」を薬注ポンプ等により注入してもよい。 In addition, for example, after injecting a chlorine-based oxidant into a water supply to a polyamide-based separation membrane with a chemical pump or the like, a “reaction product of a bromine-based oxidant and a sulfamic acid compound” or “bromine A reaction product of a reaction product of a compound and a chlorine-based oxidant and a sulfamic acid compound ”may be injected by a chemical injection pump or the like.
「臭素系酸化剤」または「臭素化合物と塩素系酸化剤との反応物」の当量に対する「スルファミン酸化合物」の当量の比は、1以上であることが好ましく、1以上2以下の範囲であることがより好ましい。「臭素系酸化剤」または「臭素化合物と塩素系酸化剤との反応物」の当量に対する「スルファミン酸化合物」の当量の比が1未満であると、分離膜を劣化させる可能性があり、2を超えると、製造コストが増加する場合がある。 The ratio of the equivalent of “sulfamic acid compound” to the equivalent of “bromine-based oxidizing agent” or “reaction product of bromine compound and chlorine-based oxidizing agent” is preferably 1 or more, and is in the range of 1 or more and 2 or less. It is more preferable. If the ratio of the equivalent amount of the “sulfamic acid compound” to the equivalent amount of the “bromine-based oxidant” or “reaction product of the bromine compound and the chlorine-based oxidant” is less than 1, the separation membrane may be deteriorated. If it exceeds, the manufacturing cost may increase.
臭素系酸化剤としては、臭素(液体臭素)、塩化臭素、臭素酸、臭素酸塩、次亜臭素酸等が挙げられる。 Examples of bromine-based oxidizing agents include bromine (liquid bromine), bromine chloride, bromic acid, bromate, and hypobromite.
これらのうち、臭素を用いた「臭素とスルファミン酸化合物」または「臭素とスルファミン酸化合物との反応生成物」の製剤は、「次亜塩素酸と臭素化合物とスルファミン酸」の製剤および「塩化臭素とスルファミン酸」の製剤等に比べて、塩化物イオンが少なく、ポリアミド系の分離膜をより劣化させず、RO透過水等の膜透過水への有効ハロゲンのリーク量がより少ないため、分離膜用スライム抑制剤としてはより好ましい。また、配管等の金属材料の腐食を引き起こす可能性が低いため、より好ましい。 Among these, the preparations of “bromine and sulfamic acid compound” or “reaction product of bromine and sulfamic acid compound” using bromine are the preparations of “hypochlorous acid, bromine compound and sulfamic acid” and “bromine chloride”. Compared with ”and sulfamic acid” preparations, etc., there is less chloride ion, the polyamide-based separation membrane is not further deteriorated, and the amount of effective halogen leaked into membrane permeated water such as RO permeated water is smaller. It is more preferable as a slime inhibitor. Further, it is more preferable because it is less likely to cause corrosion of metal materials such as piping.
すなわち、本発明の実施形態に係る分離膜の運転方法は、ポリアミド系の分離膜への給水等の中に、塩素系酸化剤を存在させて接触させた後、ポリアミド系の分離膜に臭素とスルファミン酸化合物とを接触させる、または、臭素とスルファミン酸化合物との反応生成物を接触させることが好ましい。 That is, in the operation method of the separation membrane according to the embodiment of the present invention, after bringing the chlorinated oxidant into contact with water or the like to the polyamide separation membrane, bromine and It is preferable to contact the sulfamic acid compound or to contact the reaction product of bromine and the sulfamic acid compound.
臭素化合物としては、臭化ナトリウム、臭化カリウム、臭化リチウム、臭化アンモニウムおよび臭化水素酸等が挙げられる。これらのうち、製剤コスト等の点から、臭化ナトリウムが好ましい。 Examples of bromine compounds include sodium bromide, potassium bromide, lithium bromide, ammonium bromide and hydrobromic acid. Of these, sodium bromide is preferable from the viewpoint of formulation cost and the like.
スルファミン酸化合物は、以下の一般式(1)で示される化合物である。
R2NSO3H (1)
(式中、Rは独立して水素原子または炭素数1〜8のアルキル基である。)
The sulfamic acid compound is a compound represented by the following general formula (1).
R 2 NSO 3 H (1)
(In the formula, R is independently a hydrogen atom or an alkyl group having 1 to 8 carbon atoms.)
スルファミン酸化合物としては、例えば、2個のR基の両方が水素原子であるスルファミン酸(アミド硫酸)の他に、N−メチルスルファミン酸、N−エチルスルファミン酸、N−プロピルスルファミン酸、N−イソプロピルスルファミン酸、N−ブチルスルファミン酸等の2個のR基の一方が水素原子であり、他方が炭素数1〜8のアルキル基であるスルファミン酸化合物、N,N−ジメチルスルファミン酸、N,N−ジエチルスルファミン酸、N,N−ジプロピルスルファミン酸、N,N−ジブチルスルファミン酸、N−メチル−N−エチルスルファミン酸、N−メチル−N−プロピルスルファミン酸等の2個のR基の両方が炭素数1〜8のアルキル基であるスルファミン酸化合物、N−フェニルスルファミン酸等の2個のR基の一方が水素原子であり、他方が炭素数6〜10のアリール基であるスルファミン酸化合物、またはこれらの塩等が挙げられる。スルファミン酸塩としては、例えば、ナトリウム塩、カリウム塩等のアルカリ金属塩、カルシウム塩、ストロンチウム塩、バリウム塩等のアルカリ土類金属塩、マンガン塩、銅塩、亜鉛塩、鉄塩、コバルト塩、ニッケル塩等の他の金属塩、アンモニウム塩およびグアニジン塩等が挙げられる。スルファミン酸化合物およびこれらの塩は、1種を単独で用いても、2種以上を組み合わせて用いてもよい。スルファミン酸化合物としては、環境負荷等の点から、スルファミン酸(アミド硫酸)を用いるのが好ましい。 Examples of the sulfamic acid compound include sulfamic acid (amidosulfuric acid) in which both two R groups are hydrogen atoms, N-methylsulfamic acid, N-ethylsulfamic acid, N-propylsulfamic acid, N- A sulfamic acid compound in which one of two R groups such as isopropylsulfamic acid and N-butylsulfamic acid is a hydrogen atom and the other is an alkyl group having 1 to 8 carbon atoms, N, N-dimethylsulfamic acid, N, Two R groups such as N-diethylsulfamic acid, N, N-dipropylsulfamic acid, N, N-dibutylsulfamic acid, N-methyl-N-ethylsulfamic acid, N-methyl-N-propylsulfamic acid, etc. One of two R groups such as a sulfamic acid compound and N-phenylsulfamic acid, both of which are alkyl groups having 1 to 8 carbon atoms, An atom, the other is sulfamic acid compound or a salt thereof, such as an aryl group having 6 to 10 carbon atoms. Examples of the sulfamate include alkali metal salts such as sodium salt and potassium salt, alkaline earth metal salts such as calcium salt, strontium salt and barium salt, manganese salt, copper salt, zinc salt, iron salt, cobalt salt, Other metal salts such as nickel salts, ammonium salts, guanidine salts and the like can be mentioned. The sulfamic acid compounds and salts thereof may be used alone or in combination of two or more. As the sulfamic acid compound, sulfamic acid (amidosulfuric acid) is preferably used from the viewpoint of environmental load.
本実施形態に係る分離膜の運転方法において、臭素系酸化剤とともにさらにアルカリを存在させてもよい。アルカリとしては、水酸化ナトリウム、水酸化カリウム等の水酸化アルカリ等が挙げられる。低温時の製品安定性等の点から、水酸化ナトリウムと水酸化カリウムとを併用してもよい。また、アルカリは、固形でなく、水溶液として用いてもよい。 In the operation method of the separation membrane according to the present embodiment, an alkali may be further present together with the bromine-based oxidizing agent. Examples of the alkali include alkali hydroxides such as sodium hydroxide and potassium hydroxide. From the viewpoint of product stability at low temperatures, sodium hydroxide and potassium hydroxide may be used in combination. Further, the alkali is not solid and may be used as an aqueous solution.
分離膜としては、逆浸透膜(RO膜)、ナノろ過膜(NF膜)、精密ろ過膜(MF膜)、限外ろ過膜(UF膜)等が挙げられる。これらのうち、特に逆浸透膜(RO膜)に、本発明の実施形態に係る分離膜の運転方法を好適に適用することができる。また、逆浸透膜として昨今主流であるポリアミド系高分子膜に本発明の実施形態に係る分離膜の運転方法を好適に適用することができる。ポリアミド系高分子膜は、臭素系酸化剤に接触すると透過水量の低下を起こし易く、例えば、臭化物イオン存在下で、遊離塩素等を添加すると、水中で次亜臭素酸塩が生成され、これがポリアミド系高分子膜に一時的にでも接触すると、透過水量の著しい低下が起こる。しかしながら、本実施形態に係る分離膜の運転方法ではポリアミド系高分子膜においても、このような著しい膜性能の低下はほとんど起こらない。 Examples of the separation membrane include a reverse osmosis membrane (RO membrane), a nanofiltration membrane (NF membrane), a microfiltration membrane (MF membrane), and an ultrafiltration membrane (UF membrane). Among these, the operation method of the separation membrane according to the embodiment of the present invention can be preferably applied to a reverse osmosis membrane (RO membrane). Moreover, the operation method of the separation membrane which concerns on embodiment of this invention is suitably applicable to the polyamide-type polymer membrane which is mainstream these days as a reverse osmosis membrane. Polyamide polymer membranes tend to decrease the amount of permeated water when they come into contact with bromine-based oxidants. For example, when free chlorine or the like is added in the presence of bromide ions, hypobromite is generated in water. When contacted with the polymer polymer membrane even temporarily, the permeated water amount significantly decreases. However, in the operation method of the separation membrane according to the present embodiment, such a remarkable decrease in membrane performance hardly occurs even in the polyamide polymer membrane.
ポリアミド系の逆浸透膜を備える逆浸透膜装置において、逆浸透膜への給水のpH5.5以上でスケールが発生する場合には、スケール抑制のために分散剤を臭素系酸化剤または安定化次亜臭素酸組成物と併用してもよい。分散剤としては、例えば、ポリアクリル酸、ポリマレイン酸、ホスホン酸等が挙げられる。分散剤の給水への添加量は、例えば、RO濃縮水中の濃度として0.1〜1,000mg/Lの範囲である。 In a reverse osmosis membrane apparatus equipped with a polyamide-based reverse osmosis membrane, when scale is generated at pH 5.5 or higher of water supplied to the reverse osmosis membrane, a dispersant may be used as a bromine-based oxidant or a stabilizing agent to suppress the scale. You may use together with a bromite composition. Examples of the dispersant include polyacrylic acid, polymaleic acid, and phosphonic acid. The amount of the dispersant added to the feed water is, for example, in the range of 0.1 to 1,000 mg / L as the concentration in the RO concentrated water.
また、分散剤を使用せずにスケールの発生を抑制するためには、例えば、RO濃縮水中のシリカ濃度を溶解度以下に、カルシウムスケールの指標であるランゲリア指数を0以下になるように、逆浸透膜装置の回収率等の運転条件を調整することが挙げられる。 In addition, in order to suppress the occurrence of scale without using a dispersant, for example, reverse osmosis is performed so that the silica concentration in RO concentrated water is less than the solubility and the Langeria index, which is a calcium scale index, is less than 0. Adjusting the operating conditions such as the recovery rate of the membrane device.
<分離膜の改質方法および分離膜>
本発明の実施形態に係る分離膜の改質方法は、塩素系酸化剤で塩素処理されたポリアミド系の分離膜に臭素系酸化剤を接触させる方法である。本実施形態に係る分離膜の改質方法は、例えば、塩素系酸化剤をポリアミド系分離膜に接触させる方法、またはポリアミド系分離膜に、塩素系酸化剤、臭素系酸化剤を塩素系酸化剤、臭素系酸化剤の順で接触させる方法である。また、本発明の実施形態に係る分離膜は、この分離膜の改質方法により改質された分離膜である。ここで、本明細書における分離膜の「改質」とは、透過水量の改善および透過水質の改善(すなわち阻止率の向上)を指す場合もあり、透過水量の低下の抑制および透過水質の低下の抑制(すなわち阻止率の低下の抑制)を指す場合もある。
<Method for reforming separation membrane and separation membrane>
The method for modifying a separation membrane according to an embodiment of the present invention is a method in which a bromine-based oxidizing agent is brought into contact with a polyamide-based separation membrane that has been chlorinated with a chlorine-based oxidizing agent. The modification method of the separation membrane according to the present embodiment includes, for example, a method in which a chlorine-based oxidizing agent is brought into contact with a polyamide-based separation membrane, or a chlorine-based oxidizing agent and a bromine-based oxidizing agent in a chlorine-based oxidizing agent The bromine-based oxidizing agent is contacted in this order. Further, the separation membrane according to the embodiment of the present invention is a separation membrane modified by the method for modifying the separation membrane. Here, “reformation” of the separation membrane in this specification may refer to an improvement in the amount of permeated water and an improvement in the quality of the permeated water (that is, an improvement in the rejection rate). In some cases, it refers to the suppression of the reduction (that is, the suppression of the decrease in the blocking rate).
本発明の実施形態に係る分離膜の改質方法は、ポリアミド系の分離膜への給水または洗浄水等の中に、改質剤として塩素系酸化剤を存在させて接触させた後、臭素系酸化剤を存在させて接触させる方法である。塩素系酸化剤で塩素処理されたポリアミド系の分離膜への給水等の中に、臭素系酸化剤を存在させて接触させてもよい。 In the method for reforming a separation membrane according to an embodiment of the present invention, a bromine-based separation membrane is brought into contact with a polyamide-based separation membrane in the presence of a chlorine-based oxidizing agent in the feed water or washing water. In this method, an oxidizing agent is present and contacted. A bromine-based oxidant may be present in contact with the polyamide-type separation membrane chlorinated with a chlorine-based oxidant, for example.
これらの方法により、ポリアミド系の分離膜に予め塩素系酸化剤を十分接触させて塩素処理し、さらに臭素系酸化剤を接触させることにより、分離膜の劣化を抑制しつつ、透過水量および透過水質が改善される。 By these methods, the amount of permeated water and the quality of permeated water are controlled by sufficiently contacting a chlorinated oxidant with a polyamide-based separation membrane in advance and then treating the chlorinated chlorinating agent with the bromine-based oxidant, and further suppressing the deterioration of the separation membrane. Is improved.
分離膜への塩素系酸化剤および臭素系酸化剤の接触は、常圧条件下、加圧条件下または減圧条件下で行えばよいが、分離膜の改質を確実に行うことができる等の点から、加圧条件下で行うことが好ましい。分離膜への塩素系酸化剤および臭素系酸化剤の接触は、例えば、0.1MPa〜10MPaの範囲の加圧条件下で行うことが好ましい。 The contact of the chlorine-based oxidant and bromine-based oxidant to the separation membrane may be performed under normal pressure, pressurized or reduced pressure conditions, but the separation membrane can be reliably modified, etc. From the viewpoint, it is preferable to carry out under a pressurized condition. The contact of the chlorine-based oxidant and the bromine-based oxidant with the separation membrane is preferably performed under a pressure condition in the range of 0.1 MPa to 10 MPa, for example.
分離膜への塩素系酸化剤および臭素系酸化剤の接触は、例えば、0℃〜100℃の範囲の温度条件下で行えばよい。 The contact of the chlorine-based oxidant and the bromine-based oxidant with the separation membrane may be performed, for example, under a temperature condition in the range of 0 ° C to 100 ° C.
分離膜への塩素系酸化剤の接触は、有効塩素濃度[mg−Cl/L]×時間[hr]の値として、0.1〜1000mg−Cl/L・hrであることが好ましい。0.1mg−Cl/L・hr未満であると、膜に対して十分な改質効果が得られず、1000mg−Cl/L・hrを超えると、膜を劣化させる場合がある。 The contact of the chlorine-based oxidizing agent with the separation membrane is preferably 0.1 to 1000 mg-Cl / L · hr as a value of effective chlorine concentration [mg-Cl / L] × time [hr]. If the amount is less than 0.1 mg-Cl / L · hr, a sufficient modification effect cannot be obtained for the membrane, and if it exceeds 1000 mg-Cl / L · hr, the membrane may be deteriorated.
分離膜に接触する臭素系酸化剤による有効ハロゲン濃度は有効塩素濃度換算で、0.01〜100mg/Lであることが好ましい。0.01mg/L未満であると、十分なスライム抑制効果等を得ることができない場合があり、100mg/Lより多いと、分離膜の劣化、配管等の腐食を引き起こす可能性がある。 The effective halogen concentration by the bromine-based oxidizing agent that contacts the separation membrane is preferably 0.01 to 100 mg / L in terms of effective chlorine concentration. If it is less than 0.01 mg / L, a sufficient slime-inhibiting effect may not be obtained. If it is more than 100 mg / L, there is a possibility of causing deterioration of the separation membrane and corrosion of the piping.
塩素系酸化剤が接触する際の被処理水のpHは4〜13の範囲であることが好ましく、6〜12の範囲であることがより好ましい。pH4未満である場合は、透過水量が低下する場合があり、pH13を超えると、分離膜が劣化する場合がある。 The pH of the water to be treated when the chlorine-based oxidizing agent comes into contact is preferably in the range of 4 to 13, and more preferably in the range of 6 to 12. When the pH is less than 4, the amount of permeated water may decrease, and when the pH exceeds 13, the separation membrane may deteriorate.
臭素系酸化剤が接触する際の被処理水のpHは5.5以上であることが好ましく、6.0以上であることがより好ましく、pH6.5〜10の範囲であることがさらに好ましい。ポリアミド系の分離膜への上記改質剤の接触がpH5.5未満で行われると、あらかじめ分離膜に塩素処理を施していても、臭素系酸化剤による透過水量低下の影響を受ける場合がある。pH10を超えると、透過水量が増加し過ぎる場合がある。 The pH of the water to be treated when the bromine-based oxidant comes into contact is preferably 5.5 or more, more preferably 6.0 or more, and even more preferably in the range of pH 6.5 to 10. If the above-mentioned modifier is brought into contact with the polyamide-based separation membrane at a pH of less than 5.5, even if the separation membrane has been previously subjected to chlorination, it may be affected by a decrease in the amount of permeated water due to the bromine-based oxidizing agent. . If the pH exceeds 10, the amount of permeated water may increase excessively.
本実施形態に係る分離膜の改質方法において、臭素系酸化剤としては、特に制限はない。臭素系酸化剤としては、「次亜臭素酸塩」等や、「塩素系酸化剤と臭化物イオンとの反応生成物」、「安定化次亜臭素酸組成物」等が挙げられるが、好ましくは「安定化次亜臭素酸組成物」である。「安定化次亜臭素酸組成物」は、分離膜の阻止率への悪影響が小さく、塩素処理された分離膜に連続的に添加しても、改質効果が高い。 In the separation membrane reforming method according to the present embodiment, the bromine-based oxidizing agent is not particularly limited. Examples of bromine-based oxidizing agents include “hypobromite”, “reaction product of chlorine-based oxidizing agent and bromide ions”, “stabilized hypobromite composition”, etc. “Stabilized hypobromite composition”. The “stabilized hypobromite composition” has little adverse effect on the rejection of the separation membrane, and has a high reforming effect even when continuously added to a chlorinated separation membrane.
本発明の実施形態に係る分離膜の改質方法は、例えば、ポリアミド系の分離膜への給水等の中に、改質剤として塩素系酸化剤を存在させて接触させた後、「臭素系酸化剤」と「スルファミン酸化合物」とを存在させてポリアミド系の分離膜に接触させる方法、または「臭素化合物と塩素系酸化剤との反応物」と「スルファミン酸化合物」とを存在させてポリアミド系の分離膜に接触させる方法である。これにより、給水等の中で、安定化次亜臭素酸組成物が生成すると考えられる。 The separation membrane reforming method according to the embodiment of the present invention includes, for example, supplying a bromine-based separation agent in the presence of a chlorinated oxidant as a modifying agent in, for example, feed water to a polyamide-based separation membrane. A method in which an “oxidant” and a “sulfamic acid compound” are present and brought into contact with a polyamide separation membrane, or a “reaction product of a bromine compound and a chlorine-based oxidizing agent” and a “sulfamic acid compound” are present in a polyamide. This is a method of contacting with a separation membrane of the system. Thereby, it is thought that the stabilized hypobromite composition produces | generates in water supply etc.
また、本発明の実施形態に係る分離膜の改質方法は、例えば、ポリアミド系の分離膜への給水等の中に、改質剤として塩素系酸化剤を存在させて接触させた後、「臭素系酸化剤とスルファミン酸化合物との反応生成物」である安定化次亜臭素酸組成物を存在させてポリアミド系の逆浸透膜に接触させる方法、または「臭素化合物と塩素系酸化剤との反応物と、スルファミン酸化合物と、の反応生成物」である安定化次亜臭素酸組成物を存在させてポリアミド系の分離膜に接触させる方法である。 In addition, the method for reforming the separation membrane according to the embodiment of the present invention includes, for example, supplying a chlorinated oxidizing agent as a modifying agent in water supply to a polyamide-based separation membrane and bringing it into contact. A method of contacting a polyamide-based reverse osmosis membrane with a stabilized hypobromite composition that is a reaction product of a bromine-based oxidant and a sulfamic acid compound; In this method, a stabilized hypobromite composition which is a reaction product of a reactant and a sulfamic acid compound is present and brought into contact with a polyamide separation membrane.
具体的には本発明の実施形態に係る分離膜の改質方法は、例えば、ポリアミド系の分離膜への給水等の中に、改質剤として塩素系酸化剤を存在させて接触させた後、「臭素」、「塩化臭素」または「臭化ナトリウムと次亜塩素酸との反応物」と、「スルファミン酸化合物」と、を存在させてポリアミド系の分離膜に接触させる方法である。 Specifically, the method for reforming a separation membrane according to an embodiment of the present invention is, for example, after bringing a chlorinated oxidant as a modifier into contact with water or the like to supply a polyamide-based separation membrane. , “Bromine”, “bromine chloride” or “reaction product of sodium bromide and hypochlorous acid” and “sulfamic acid compound” are present in contact with the polyamide separation membrane.
また、本発明の実施形態に係る分離膜の改質方法は、例えば、ポリアミド系の分離膜への給水等の中に、改質剤として塩素系酸化剤を存在させて接触させた後、「臭素とスルファミン酸化合物との反応生成物」、「塩化臭素とスルファミン酸化合物との反応生成物」、または「臭化ナトリウムと次亜塩素酸との反応物と、スルファミン酸化合物と、の反応生成物」である安定化次亜臭素酸組成物を存在させてポリアミド系の分離膜に接触させる方法である。 In addition, the method for reforming the separation membrane according to the embodiment of the present invention includes, for example, supplying a chlorinated oxidizing agent as a modifying agent in water supply to a polyamide-based separation membrane and bringing it into contact. Reaction product of bromine and sulfamic acid compound "," Reaction product of bromine chloride and sulfamic acid compound "or" Reaction product of sodium bromide and hypochlorous acid and sulfamic acid compound " This is a method in which a stabilized hypobromite composition, which is a product, is present and brought into contact with a polyamide separation membrane.
本実施形態に係る分離膜の改質方法では、例えば、ポリアミド系の分離膜を備える分離膜装置の運転の際に、ポリアミド系の分離膜への給水等の中に、改質剤として塩素系酸化剤を薬注ポンプ等により注入した後、改質剤として「臭素系酸化剤」または「臭素化合物と塩素系酸化剤との反応物」と、「スルファミン酸化合物」とを薬注ポンプ等により注入すればよい。「臭素系酸化剤」または「臭素化合物と塩素系酸化剤との反応物」と、「スルファミン酸化合物」とは別々に給水等の中に添加してもよく、または、原液同士で混合させてから給水等の中に添加してもよい。また、例えば、改質剤を添加した水中に、ポリアミド系の分離膜を所定の時間、浸漬して接触させてもよい。 In the method for reforming a separation membrane according to the present embodiment, for example, during operation of a separation membrane device including a polyamide-based separation membrane, water is supplied to the polyamide-based separation membrane and the like as a modifier. After injecting the oxidizer with a chemical injection pump, etc., use a chemical injection pump or the like to add “bromine-based oxidant” or “reaction product of bromine compound and chlorine-based oxidant” and “sulfamic acid compound” as modifiers. Just inject. The “bromine-based oxidant” or “reaction product of bromine compound and chlorine-based oxidant” and the “sulfamic acid compound” may be added separately to the feed water or the like, or mixed with the stock solution. May be added to the water supply. Further, for example, the polyamide separation membrane may be immersed and contacted in water to which a modifier is added.
また、例えば、ポリアミド系の分離膜への給水等の中に、改質剤として塩素系酸化剤を薬注ポンプ等により注入した後、改質剤として「臭素系酸化剤とスルファミン酸化合物との反応生成物」、または「臭素化合物と塩素系酸化剤との反応物と、スルファミン酸化合物と、の反応生成物」を薬注ポンプ等により注入してもよい。また、例えば、改質剤を添加した水中に、ポリアミド系の分離膜を所定の時間、浸漬して接触させてもよい。 Further, for example, after injecting a chlorinated oxidant as a modifier into a water supply to a polyamide-based separation membrane by a chemical pump or the like, the modifier is “a bromine oxidant and a sulfamic acid compound. “Reaction product” or “reaction product of bromine compound and chlorine-based oxidizing agent and sulfamic acid compound” may be injected by a chemical injection pump or the like. Further, for example, the polyamide separation membrane may be immersed and contacted in water to which a modifier is added.
改質剤による改質は、例えば、ポリアミド系の分離膜を備える分離膜装置の運転の際に分離膜への給水等の中に、上記改質剤を連続的または間欠的に添加すればよい。 The modification with the modifying agent may be performed by, for example, adding the modifying agent continuously or intermittently into the water supply to the separation membrane during the operation of the separation membrane device including the polyamide separation membrane. .
「臭素系酸化剤」または「臭素化合物と塩素系酸化剤との反応物」の当量に対する「スルファミン酸化合物」の当量の比は、1以上であることが好ましく、1以上2以下の範囲であることがより好ましい。「臭素系酸化剤」または「臭素化合物と塩素系酸化剤との反応物」の当量に対する「スルファミン酸化合物」の当量の比が1未満であると、逆浸透膜を劣化させる可能性があり、2を超えると、製造コストが増加する場合がある。 The ratio of the equivalent of “sulfamic acid compound” to the equivalent of “bromine-based oxidizing agent” or “reaction product of bromine compound and chlorine-based oxidizing agent” is preferably 1 or more, and is in the range of 1 or more and 2 or less. It is more preferable. If the ratio of the equivalent of “sulfamic acid compound” to the equivalent of “bromine-based oxidant” or “reaction product of bromine compound and chlorine-based oxidant” is less than 1, the reverse osmosis membrane may be deteriorated, If it exceeds 2, the production cost may increase.
臭素系酸化剤、臭素化合物、塩素系酸化剤およびスルファミン酸化合物については、上述した通りである。 The bromine-based oxidizing agent, bromine compound, chlorine-based oxidizing agent, and sulfamic acid compound are as described above.
臭素系酸化剤のうち、臭素を用いた「臭素とスルファミン酸化合物」または「臭素とスルファミン酸化合物との反応生成物」の製剤は、「次亜塩素酸と臭素化合物とスルファミン酸」の製剤および「塩化臭素とスルファミン酸」の製剤等に比べて、塩化物イオンが少なく、ポリアミド系の分離膜をより劣化させず、RO透過水等の膜透過水への有効ハロゲンのリーク量がより少ないため、分離膜用スライム抑制剤としてはより好ましい。また、配管等の金属材料の腐食を引き起こす可能性が低いため、より好ましい。 Among the bromine-based oxidants, the preparation of “bromine and sulfamic acid compound” or “reaction product of bromine and sulfamic acid compound” using bromine is the preparation of “hypochlorous acid, bromine compound and sulfamic acid” and Compared to “bromine chloride and sulfamic acid” preparations, etc., it has less chloride ions, does not deteriorate the polyamide separation membrane, and has less leakage of effective halogen into membrane permeated water such as RO permeated water. More preferable as a slime inhibitor for separation membranes. Further, it is more preferable because it is less likely to cause corrosion of metal materials such as piping.
すなわち、本発明の実施形態に係る分離膜の改質方法は、ポリアミド系の分離膜に、改質剤として塩素系酸化剤を存在させて接触させた後、臭素とスルファミン酸化合物とを接触させる、または、臭素とスルファミン酸化合物との反応生成物を接触させることが好ましい。 That is, in the method for modifying a separation membrane according to the embodiment of the present invention, after bringing a polyamide-based separation membrane into contact with a chlorinated oxidizing agent as a modifying agent, bromine and a sulfamic acid compound are brought into contact with each other. Alternatively, it is preferable to contact a reaction product of bromine and a sulfamic acid compound.
本実施形態に係る分離膜の改質方法において、臭素系酸化剤とともにさらにアルカリを存在させてもよい。アルカリとしては、水酸化ナトリウム、水酸化カリウム等の水酸化アルカリ等が挙げられる。低温時の製品安定性等の点から、水酸化ナトリウムと水酸化カリウムとを併用してもよい。また、アルカリは、固形でなく、水溶液として用いてもよい。 In the method for reforming the separation membrane according to the present embodiment, an alkali may be further present together with the bromine-based oxidizing agent. Examples of the alkali include alkali hydroxides such as sodium hydroxide and potassium hydroxide. From the viewpoint of product stability at low temperatures, sodium hydroxide and potassium hydroxide may be used in combination. Further, the alkali is not solid and may be used as an aqueous solution.
分離膜としては、逆浸透膜(RO膜)、ナノろ過膜(NF膜)、精密ろ過膜(MF膜)、限外ろ過膜(UF膜)等が挙げられる。これらのうち、特に逆浸透膜(RO膜)に、本発明の実施形態に係る分離膜の改質方法を好適に適用することができる。また、逆浸透膜として昨今主流であるポリアミド系高分子膜に本発明の実施形態に係る分離膜の改質方法を好適に適用することができる。ポリアミド系高分子膜は、臭素系酸化剤に接触すると透過水量の低下を起こし易く、例えば、臭化物イオン存在下で、遊離塩素等を添加すると、水中で次亜臭素酸塩が生成され、これがポリアミド系高分子膜に一時的にでも接触すると、透過水量の著しい低下が起こる。しかしながら、本実施形態に係る分離膜の改質方法ではポリアミド系高分子膜においても、このような著しい膜性能の低下はほとんど起こらない。 Examples of the separation membrane include a reverse osmosis membrane (RO membrane), a nanofiltration membrane (NF membrane), a microfiltration membrane (MF membrane), and an ultrafiltration membrane (UF membrane). Of these, the separation membrane modification method according to the embodiment of the present invention can be suitably applied to a reverse osmosis membrane (RO membrane). In addition, the method for reforming a separation membrane according to the embodiment of the present invention can be suitably applied to a polyamide-based polymer membrane, which is currently mainstream as a reverse osmosis membrane. Polyamide polymer membranes tend to decrease the amount of permeated water when they come into contact with bromine-based oxidants. For example, when free chlorine or the like is added in the presence of bromide ions, hypobromite is generated in water. When contacted with the polymer polymer membrane even temporarily, the permeated water amount significantly decreases. However, in the method for modifying a separation membrane according to the present embodiment, such a remarkable decrease in membrane performance hardly occurs even in a polyamide polymer membrane.
本実施形態に係る分離膜の改質方法により改質されたポリアミド系の逆浸透膜を備える逆浸透膜装置の用途としては、例えば、海水淡水化、排水回収等が挙げられる。 Examples of the use of the reverse osmosis membrane device including the polyamide-based reverse osmosis membrane modified by the separation membrane modification method according to the present embodiment include seawater desalination and wastewater recovery.
<分離膜運転用組成物、分離膜改質用組成物>
本実施形態に係る分離膜の運転方法および分離膜の改質方法で用いられる分離膜運転用組成物または分離膜改質用組成物(以下、両者を併せて「分離膜運転・改質用組成物」と呼ぶ)は、「臭素系酸化剤」または「臭素化合物と塩素系酸化剤との反応物」と、「スルファミン酸化合物」とを含有するものであり、さらにアルカリを含有してもよい。
<Composition for separation membrane operation, Composition for modification of separation membrane>
Separation membrane operation composition or separation membrane modification composition used in the separation membrane operation method and separation membrane modification method according to the present embodiment (hereinafter referred to as “separation membrane operation / modification composition” Is a product containing “bromine-based oxidizing agent” or “reaction product of bromine compound and chlorine-based oxidizing agent” and “sulfamic acid compound”, and may further contain an alkali. .
また、本実施形態に係る分離膜運転・改質用組成物は、「臭素系酸化剤とスルファミン酸化合物との反応生成物」、または「臭素化合物と塩素系酸化剤との反応物と、スルファミン酸化合物と、の反応生成物」を含有するものであり、さらにアルカリを含有してもよい。 Further, the separation membrane operation / modification composition according to the present embodiment includes a “reaction product of a bromine-based oxidant and a sulfamic acid compound” or a “reaction product of a bromine compound and a chlorine-based oxidant, and a sulfamine. It contains "reaction product of an acid compound" and may further contain an alkali.
臭素系酸化剤、臭素化合物、塩素系酸化剤およびスルファミン酸化合物については、上述した通りである。 The bromine-based oxidizing agent, bromine compound, chlorine-based oxidizing agent, and sulfamic acid compound are as described above.
本実施形態に係る分離膜運転・改質用組成物としては、ポリアミド系分離膜をより劣化させず、RO透過水等への有効ハロゲンのリーク量がより少ないため、臭素と、スルファミン酸化合物とを含有するもの、または、臭素とスルファミン酸化合物との反応生成物を含有するものが好ましい。 As the separation membrane operation / modification composition according to this embodiment, since the polyamide separation membrane is not further deteriorated and the amount of effective halogen leaked to RO permeate is smaller, bromine, sulfamic acid compound, Or those containing a reaction product of bromine and a sulfamic acid compound are preferred.
本実施形態に係る分離膜運転・改質用組成物は、クロロスルファミン酸等の結合塩素系スライム抑制剤と比較すると、酸化力が高く、スライム抑制力、スライム剥離力が著しく高いにもかかわらず、同じく酸化力の高い次亜塩素酸のような著しい膜劣化をほとんど引き起こすことがない。通常の使用濃度では、膜劣化への影響は実質的に無視することができる。このため、ポリアミド系の逆浸透膜(RO膜)等の分離膜用のスライム抑制剤、改質剤としては最適である。 The composition for operation / reformation of the separation membrane according to the present embodiment has higher oxidizing power, slime suppressing power, and slime peeling power significantly higher than those of bonded chlorine-based slime inhibitors such as chlorosulfamic acid. Also, it hardly causes significant film deterioration like hypochlorous acid having high oxidizing power. At normal use concentrations, the effect on film degradation can be substantially ignored. Therefore, it is optimal as a slime inhibitor and modifier for separation membranes such as polyamide-based reverse osmosis membranes (RO membranes).
本実施形態に係る分離膜運転・改質用組成物は、次亜塩素酸とは異なり、逆浸透膜(RO膜)等をほとんど透過しないため、処理水水質への影響がほとんどない。また、次亜塩素酸等と同様に現場で濃度を測定することができるため、より正確な濃度管理が可能である。 Unlike the hypochlorous acid, the separation membrane operation / modification composition according to the present embodiment hardly permeates the reverse osmosis membrane (RO membrane) or the like, and therefore has little influence on the quality of treated water. Further, since the concentration can be measured on site in the same manner as hypochlorous acid or the like, more accurate concentration management is possible.
組成物のpHは、例えば、13.0超であり、13.2超であることがより好ましい。組成物のpHが13.0以下であると組成物中の有効ハロゲンが不安定になる場合がある。 The pH of the composition is, for example, more than 13.0, more preferably more than 13.2. When the pH of the composition is 13.0 or less, the effective halogen in the composition may become unstable.
分離膜運転・改質用組成物中の臭素酸濃度は、5mg/kg未満であることが好ましい。分離膜運転・改質用組成物中の臭素酸濃度が5mg/kg以上であると、RO透過水等の臭素酸イオンの濃度が高くなる場合がある。 The bromic acid concentration in the separation membrane operation / modification composition is preferably less than 5 mg / kg. When the bromate concentration in the separation membrane operation / modification composition is 5 mg / kg or more, the concentration of bromate ions such as RO permeate may increase.
<分離膜運転用組成物、分離膜改質用組成物の製造方法>
本実施形態に係る分離膜の運転方法および分離膜の改質方法で用いられる分離膜運転用組成物または分離膜改質用組成物は、臭素系酸化剤とスルファミン酸化合物とを混合する、または臭素化合物と塩素系酸化剤との反応物と、スルファミン酸化合物とを混合することにより得られ、さらにアルカリを混合してもよい。
<Production Method for Separation Membrane Operation and Separation Membrane Modification Composition>
The separation membrane operation composition or the separation membrane modification composition used in the separation membrane operation method and the separation membrane modification method according to the present embodiment is a mixture of a bromine-based oxidizing agent and a sulfamic acid compound, or It is obtained by mixing a reaction product of a bromine compound and a chlorine-based oxidant and a sulfamic acid compound, and an alkali may be further mixed.
臭素と、スルファミン酸化合物とを含有する分離膜運転・改質用組成物、または、臭素とスルファミン酸化合物との反応生成物を含有する分離膜運転・改質用組成物の製造方法としては、水、アルカリおよびスルファミン酸化合物を含む混合液に臭素を不活性ガス雰囲気下で添加して反応させる工程を含むことが好ましい。不活性ガス雰囲気下で添加して反応させることにより、組成物中の臭素酸イオン濃度が低くなり、RO透過水等中の臭素酸イオン濃度が低くなる。 As a method for producing a separation membrane operation / modification composition containing bromine and a sulfamic acid compound, or a separation membrane operation / modification composition containing a reaction product of bromine and a sulfamic acid compound, It is preferable to include a step of adding bromine to a mixed liquid containing water, an alkali and a sulfamic acid compound in an inert gas atmosphere and reacting them. By adding and reacting under an inert gas atmosphere, the bromate ion concentration in the composition is lowered, and the bromate ion concentration in the RO permeate and the like is lowered.
用いる不活性ガスとしては限定されないが、製造等の面から窒素およびアルゴンのうち少なくとも1つが好ましく、特に製造コスト等の面から窒素が好ましい。 Used but are not limited to inert gas, at least one and preferably one in terms of nitrogen and argon, such as production, nitrogen is particularly preferred from the viewpoint of production cost and the like.
臭素の添加の際の反応器内の酸素濃度は6%以下が好ましいが、4%以下がより好ましく、2%以下がさらに好ましく、1%以下が特に好ましい。臭素の反応の際の反応器内の酸素濃度が6%を超えると、反応系内の臭素酸の生成量が増加する場合がある。 The oxygen concentration in the reactor upon addition of bromine is preferably 6% or less, more preferably 4% or less, further preferably 2% or less, and particularly preferably 1% or less. If the oxygen concentration in the reactor during the bromine reaction exceeds 6%, the amount of bromic acid produced in the reaction system may increase.
臭素の添加率は、組成物全体の量に対して25重量%以下であることが好ましく、1重量%以上20重量%以下であることがより好ましい。臭素の添加率が組成物全体の量に対して25重量%を超えると、反応系内の臭素酸の生成量が増加する場合がある。1重量%未満であると、殺菌力、改質効果が劣る場合がある。 The addition ratio of bromine is preferably 25% by weight or less, more preferably 1% by weight or more and 20% by weight or less based on the total amount of the composition. If the bromine addition rate exceeds 25% by weight relative to the total amount of the composition, the amount of bromic acid produced in the reaction system may increase. If it is less than 1% by weight, the sterilizing power and the reforming effect may be inferior.
臭素添加の際の反応温度は、0℃以上25℃以下の範囲に制御することが好ましいが、製造コスト等の面から、0℃以上15℃以下の範囲に制御することがより好ましい。臭素添加の際の反応温度が25℃を超えると、反応系内の臭素酸の生成量が増加する場合があり、0℃未満であると、凍結する場合がある。 The reaction temperature during the addition of bromine is preferably controlled in the range of 0 ° C. to 25 ° C., but more preferably in the range of 0 ° C. to 15 ° C. from the viewpoint of production cost and the like. When the reaction temperature at the time of bromine addition exceeds 25 degreeC, the production amount of the bromic acid in a reaction system may increase, and when it is less than 0 degreeC, it may freeze.
以下、実施例および比較例を挙げ、本発明をより具体的に詳細に説明するが、本発明は、以下の実施例に限定されるものではない。 Hereinafter, although an example and a comparative example are given and the present invention is explained more concretely in detail, the present invention is not limited to the following examples.
[塩素処理の有無と臭素系酸化剤通水時の透過水量低下の関係]
予め塩素系酸化剤を接触させた分離膜と、塩素系酸化剤を接触させていない分離膜における、臭素系酸化剤通水時の、透過水量の挙動について比較した。
[Relationship between presence / absence of chlorination and decrease in permeate volume when bromine-based oxidant is passed]
The behavior of the amount of permeated water when a bromine-based oxidant was passed through a separation membrane previously contacted with a chlorine-based oxidant and a separation membrane not contacted with a chlorine-based oxidant were compared.
(塩素処理条件)
・RO膜:ポリアミド系高分子逆浸透膜(水温:25℃、運転圧力:0.75MPaの条件において、2000mg/LのNaCl溶液の導電率阻止率が95%以上)
・塩素処理条件:純水に次亜塩素酸ナトリウムを有効塩素として10mg−CL/L添加し、pH10に調整し、圧力0.75MPa、水温25℃にて1hr通水
(Chlorine treatment conditions)
RO membrane: polyamide polymer reverse osmosis membrane (water temperature: 25 ° C., operating pressure: 0.75 MPa, conductivity rejection of 2000 mg / L NaCl solution is 95% or more)
Chlorine treatment conditions: 10 mg-CL / L of sodium hypochlorite as effective chlorine was added to pure water, adjusted to pH 10, and passed for 1 hr at a pressure of 0.75 MPa and a water temperature of 25 ° C.
(臭素系酸化剤通水条件)
・試験装置:平膜試験装置
・分離膜:ポリアミド系高分子逆浸透膜(水温:25℃、運転圧力:0.75MPaの条件において、2000mg/LのNaCl溶液の導電率阻止率が95%以上)、またはこれに上記塩素処理を施した逆浸透膜
・運転圧力:0.75MPa
・原水:相模原井水(導電率240μS/cm)
・試験水pH:6.5
・薬剤:安定化次亜臭素酸組成物1を、有効ハロゲン濃度(有効塩素換算濃度)として1mg/Lとなるように添加
(Brominated oxidant flow conditions)
Test device: Flat membrane test device Separation membrane: Polyamide polymer reverse osmosis membrane (water temperature: 25 ° C., operating pressure: 0.75 MPa, conductivity rejection of 2000 mg / L NaCl solution is 95% or more ), Or reverse osmosis membrane with the above chlorination treatment and operating pressure: 0.75 MPa
・ Raw water: Sagamiharai water (conductivity 240μS / cm)
Test water pH: 6.5
・ Drug: Stabilized hypobromite composition 1 is added so that the effective halogen concentration (effective chlorine equivalent concentration) is 1 mg / L.
(評価方法)
・分離膜の透過水量への影響:120hr通水後の透過水量保持率(%)
([臭素系酸化剤通水120hr後の透過水量/臭素系酸化剤通水前の透過水量]×100)
(Evaluation method)
・ Effect on the amount of permeated water of the separation membrane: Permeated water retention rate after passing through 120 hours (%)
([Permeated water amount after 120 hours of bromine-based oxidant flow / Amount of permeated water before flow of bromine-based oxidant] × 100)
(安定化次亜臭素酸組成物1の調製)
窒素雰囲気下で、液体臭素:16.9重量%(wt%)、スルファミン酸:10.7重量%、水酸化ナトリウム:12.9重量%、水酸化カリウム:3.94重量%、水:残分を混合して、安定化次亜臭素酸組成物1を調製した。安定化次亜臭素酸組成物1のpHは14、有効ハロゲン濃度(有効塩素換算濃度)は7.5重量%であった。安定化次亜臭素酸組成物1の詳細な調製方法は以下の通りである。
(Preparation of Stabilized Hypobromite Composition 1)
Under nitrogen atmosphere, liquid bromine: 16.9% by weight (wt%), sulfamic acid: 10.7% by weight, sodium hydroxide: 12.9% by weight, potassium hydroxide: 3.94% by weight, water: remaining Minutes were mixed to prepare stabilized hypobromite composition 1. The pH of the stabilized hypobromite composition 1 was 14, and the effective halogen concentration (effective chlorine equivalent concentration) was 7.5% by weight. The detailed preparation method of the stabilized hypobromite composition 1 is as follows.
反応容器内の酸素濃度が1%に維持されるように、窒素ガスの流量をマスフローコントローラでコントロールしながら連続注入で封入した2Lの4つ口フラスコに1436gの水、361gの水酸化ナトリウムを加え混合し、次いで300gのスルファミン酸を加え混合した後、反応液の温度が0〜15℃になるように冷却を維持しながら、473gの液体臭素を加え、さらに48%水酸化カリウム溶液230gを加え、組成物全体の量に対する重量比でスルファミン酸10.7%、臭素16.9%、臭素の当量に対するスルファミン酸の当量比が1.04である、目的の安定化次亜臭素酸組成物1を得た。生じた溶液のpHは、ガラス電極法にて測定したところ、14であった。生じた溶液の臭素含有率は、臭素をヨウ化カリウムによりヨウ素に転換後、チオ硫酸ナトリウムを用いて酸化還元滴定する方法により測定したところ16.9%であり、理論含有率(16.9%)の100.0%であった。また、臭素反応の際の反応容器内の酸素濃度は、株式会社ジコー製の「酸素モニタJKO−02 LJDII」を用いて測定した。なお、臭素酸濃度は5mg/kg未満であった。 Add 1436 g of water and 361 g of sodium hydroxide to a 2 L four-necked flask sealed by continuous injection while controlling the flow rate of nitrogen gas with a mass flow controller so that the oxygen concentration in the reaction vessel is maintained at 1%. Next, after adding 300 g of sulfamic acid and mixing, 473 g of liquid bromine was added while maintaining cooling so that the temperature of the reaction solution was 0 to 15 ° C., and 230 g of 48% potassium hydroxide solution was added. The target stabilized hypobromite composition 1 having a sulfamic acid ratio of 10.7% by weight relative to the total amount of the composition, 16.9% bromine, and an equivalent ratio of sulfamic acid to the equivalent of bromine of 1.04. Got. The pH of the resulting solution was 14 as measured by the glass electrode method. The bromine content of the resulting solution was 16.9% as measured by a redox titration method using sodium thiosulfate after bromine was converted to iodine with potassium iodide, and the theoretical content (16.9% ) Of 100.0%. In addition, the oxygen concentration in the reaction vessel during the bromine reaction was measured using “Oxygen Monitor JKO-02 LJDII” manufactured by Zico Corporation. The bromic acid concentration was less than 5 mg / kg.
<実施例1>
上記塩素処理を事前に施した分離膜に臭素系酸化剤である安定化次亜臭素酸組成物1を上記条件で通水した。結果を表1に示す。
<Example 1>
The stabilized hypobromite composition 1 as a bromine-based oxidant was passed through the separation membrane subjected to the chlorination in advance under the above conditions. The results are shown in Table 1.
<比較例1>
塩素処理を事前に施していない上記分離膜を使用した以外は、実施例1と同じ条件で通水した。結果を表1に示す。
<Comparative Example 1>
Water was passed under the same conditions as in Example 1 except that the above separation membrane not subjected to chlorination was used. The results are shown in Table 1.
比較例1では、臭素系酸化剤を通水したのち、透過水量が初期値の70%未満に低下したが、実施例1では80%以上の透過水量を保持した。 In Comparative Example 1, the permeated water amount decreased to less than 70% of the initial value after passing the bromine-based oxidizing agent, but in Example 1, the permeated water amount was maintained at 80% or more.
[臭素系酸化剤通水時のpHの影響]
(臭素系酸化剤通水条件)
・試験装置:平膜試験装置
・分離膜:ポリアミド系高分子逆浸透膜(水温:25℃、運転圧力:0.75MPaの条件において、2000mg/LのNaCl溶液の導電率阻止率が95%以上)
・運転圧力:0.75MPa
・原水:相模原井水(導電率240μS/cm)
・試験水pH:5.0〜8.0
・薬剤:安定化次亜臭素酸組成物1を、有効ハロゲン濃度(有効塩素換算濃度)として1mg/Lとなるように添加
[Effect of pH when bromine-based oxidant passes]
(Brominated oxidant flow conditions)
Test device: Flat membrane test device Separation membrane: Polyamide polymer reverse osmosis membrane (water temperature: 25 ° C., operating pressure: 0.75 MPa, conductivity rejection of 2000 mg / L NaCl solution is 95% or more )
・ Operating pressure: 0.75 MPa
・ Raw water: Sagamiharai water (conductivity 240μS / cm)
Test water pH: 5.0 to 8.0
・ Drug: Stabilized hypobromite composition 1 is added so that the effective halogen concentration (effective chlorine equivalent concentration) is 1 mg / L.
(評価方法)
・分離膜の透過水量への影響:120hr通水後の透過水量保持率(%)
([臭素系酸化剤通水120hr後の透過水量/臭素系酸化剤通水前の透過水量]×100)
(Evaluation method)
・ Effect on the amount of permeated water of the separation membrane: Permeated water retention rate after passing through 120 hours (%)
([Permeated water amount after 120 hours of bromine-based oxidant flow / Amount of permeated water before flow of bromine-based oxidant] × 100)
<参考例2,3、実施例4,5>
事前に塩素処理を施した上記分離膜に、pH5.0〜8.0の条件で安定化次亜臭素酸組成物1を通水した。結果を表2に示す。
< Reference Examples 2 and 3, Examples 4 and 5>
The stabilized hypobromite composition 1 was passed through the separation membrane that had been previously chlorinated under conditions of pH 5.0 to 8.0. The results are shown in Table 2.
<比較例2〜5>
事前に塩素処理を施していない上記分離膜に、pH5.0〜8.0の条件で安定化次亜臭素酸組成物1を通水した。結果を表2に示す。
<Comparative Examples 2-5>
The stabilized hypobromite composition 1 was passed through the separation membrane that had not been previously chlorinated under conditions of pH 5.0 to 8.0. The results are shown in Table 2.
分離膜に臭素系酸化剤を接触させる際の被処理水のpHが5.5以上であることが好ましく、6.0以上がより好ましいことがわかった。 It was found that the pH of the water to be treated when the bromine-based oxidizing agent is brought into contact with the separation membrane is preferably 5.5 or more, and more preferably 6.0 or more.
[臭素系酸化剤の種類の影響]
(試験条件)
・試験装置:平膜試験装置
・分離膜:ポリアミド系高分子逆浸透膜(2000mg/LのNaCl溶液における導電率阻止率が95%以上)に事前に塩素処理を施したもの
・運転圧力:0.75MPa
・原水:相模原井水(導電率240μS/cm)
・試験水pH:7.0
・薬剤:安定化次亜臭素酸組成物1または安定化次亜臭素酸組成物2を、有効ハロゲン濃度(有効塩素換算濃度)として10mg/Lとなるように添加
・試験時間:64日
[Influence of the type of bromine-based oxidant]
(Test conditions)
・ Test equipment: Flat membrane test equipment ・ Separation membrane: Polyamide-based polymer reverse osmosis membrane (conductivity rejection in a 2000 mg / L NaCl solution is 95% or more) in advance. Chlorine treatment ・ Operating pressure: 0 .75 MPa
・ Raw water: Sagamiharai water (conductivity 240μS / cm)
Test water pH: 7.0
-Drug: Stabilized hypobromite composition 1 or stabilized hypobromite composition 2 is added so that the effective halogen concentration (effective chlorine equivalent concentration) is 10 mg / L.-Test time: 64 days
(評価方法)
・試験前後でのRO膜における導電率阻止率(%)
(Evaluation method)
-Conductivity rejection rate (%) in RO membrane before and after the test
(安定化次亜臭素酸組成物2)
臭化ナトリウム:11重量%、12%次亜塩素酸ナトリウム水溶液:50重量%、スルファミン酸ナトリウム:14重量%、水酸化ナトリウム:8重量%、水:残分を混合して、安定化次亜臭素酸組成物2を調製した。安定化次亜臭素酸組成物2のpHは14、有効ハロゲン濃度(有効塩素換算濃度)は6重量%であった。安定化次亜臭素酸組成物2の組成物の詳細な調製方法は以下の通りである。
(Stabilized hypobromite composition 2)
Sodium bromide: 11% by weight, 12% sodium hypochlorite aqueous solution: 50% by weight, sodium sulfamate: 14% by weight, sodium hydroxide: 8% by weight, water: the remainder is mixed to stabilize hypochlorous acid Bromic acid composition 2 was prepared. The pH of the stabilized hypobromite composition 2 was 14, and the effective halogen concentration (effective chlorine equivalent concentration) was 6% by weight. The detailed preparation method of the composition of the stabilized hypobromite composition 2 is as follows.
反応容器に17gの水を入れ、11gの臭化ナトリウムを加え撹拌して溶解させた後、50gの12%次亜塩素酸ナトリウム水溶液を加え混合し、次いで14gのスルファミン酸ナトリウムを加え撹拌して溶解させた後、8gの水酸化ナトリウムを加え撹拌し溶解させて目的の組成物を得た。 17 g of water was put into a reaction vessel, 11 g of sodium bromide was added and dissolved by stirring, 50 g of 12% aqueous sodium hypochlorite solution was added and mixed, and then 14 g of sodium sulfamate was added and stirred. After dissolution, 8 g of sodium hydroxide was added, stirred and dissolved to obtain the desired composition.
<実施例6>
安定化次亜臭素酸組成物1を通水し、試験前後での分離膜における導電率阻止率を測定した。結果を表3に示す。
<Example 6>
The stabilized hypobromite composition 1 was passed through and the conductivity rejection rate in the separation membrane before and after the test was measured. The results are shown in Table 3.
<実施例7>
安定化次亜臭素酸組成物2を通水し、試験前後での分離膜における導電率阻止率を測定した。結果を表3に示す。
<Example 7>
The stabilized hypobromite composition 2 was passed through, and the conductivity rejection rate in the separation membrane before and after the test was measured. The results are shown in Table 3.
実施例6,7共に、90%以上の導電率阻止率を保持したが、実施例6の方がより高い阻止率を示した。 In both Examples 6 and 7, the conductivity rejection rate of 90% or more was maintained, but Example 6 showed a higher rejection rate.
[塩素処理における塩素系酸化剤の分離膜への接触度の影響]
(試験条件)
・試験装置:平膜試験装置
・分離膜:ポリアミド系高分子逆浸透膜(水温:25℃、運転圧力:0.75MPaの条件において、2000mg/LのNaCl溶液の導電率阻止率が95%以上)
・運転圧力:0.75MPa
・原水:超純水
・塩素系酸化剤:次亜塩素酸ナトリウム
[Effect of contact degree of chlorinated oxidant on separation membrane in chlorination]
(Test conditions)
Test device: Flat membrane test device Separation membrane: Polyamide polymer reverse osmosis membrane (water temperature: 25 ° C., operating pressure: 0.75 MPa, conductivity rejection of 2000 mg / L NaCl solution is 95% or more )
・ Operating pressure: 0.75 MPa
・ Raw water: Ultrapure water ・ Chlorine oxidizer: Sodium hypochlorite
(評価方法)
・試験前後での分離膜における導電率阻止率(%)
(Evaluation method)
-Conductivity rejection rate (%) in the separation membrane before and after the test
<実施例8>
分離膜への塩素系酸化剤の接触度を10mg−CL/L×hrとした。結果を表4に示す。
<Example 8>
The contact degree of the chlorine-based oxidizing agent to the separation membrane was 10 mg-CL / L × hr. The results are shown in Table 4.
<比較例6>
分離膜への塩素系酸化剤の接触度を1034mg−CL/L×hrとした。結果を表4に示す。
<Comparative Example 6>
The degree of contact of the chlorine-based oxidizing agent with the separation membrane was 1034 mg-CL / L × hr. The results are shown in Table 4.
導電率阻止率は、実施例8では90%以上であったが、比較例6では90%未満に低下した。 The conductivity rejection was 90% or more in Example 8, but decreased to less than 90% in Comparative Example 6.
以上の通り、分離膜に予め塩素処理が施されることで、その後、分離膜に臭素系酸化剤が接触しても透過水量の低下が抑制され、安定的に分離膜装置を運転することができることがわかった。また、分離膜に予め塩素処理を施した後、臭素系酸化剤を接触させることで、分離膜の劣化を抑制しつつ、透過水量および透過水質を改善することができることがわかった。 As described above, since the separation membrane is preliminarily treated with chlorine, even if a bromine-based oxidant comes into contact with the separation membrane thereafter, a decrease in the amount of permeate is suppressed, and the separation membrane device can be operated stably. I knew it was possible. Further, it was found that the permeated water amount and the permeated water quality can be improved while the deterioration of the separation membrane is suppressed by bringing the separation membrane into contact with a bromine-based oxidant in advance after chlorination.
Claims (6)
前記安定化次亜臭素酸組成物が、臭素系酸化剤、もしくは臭素化合物と塩素系酸化剤との反応物と、スルファミン酸化合物とを含有する、または、臭素系酸化剤、もしくは臭素化合物と塩素系酸化剤との反応物と、スルファミン酸化合物との反応生成物を含有し、
前記分離膜に前記安定化次亜臭素酸組成物を接触させる際の被処理水のpHが6.0以上であることを特徴とする分離膜の運転方法。 The stabilized hypobromite composition is brought into contact with a polyamide separation membrane that has been chlorinated with a chlorinated oxidant ,
The stabilized hypobromite composition contains a bromine-based oxidant, a reaction product of a bromine compound and a chlorine-based oxidant, and a sulfamic acid compound, or a bromine-based oxidant, or a bromine compound and chlorine. Containing a reaction product with a oxidant and a reaction product with a sulfamic acid compound,
The method of operating the separation membrane, characterized in der Rukoto pH 6.0 or more water to be treated when the contacting stabilized hypobromous acid composition to the separation membrane.
前記安定化次亜臭素酸組成物が、臭素とスルファミン酸化合物とを含有する、または、臭素とスルファミン酸化合物との反応生成物を含有することを特徴とする分離膜の運転方法。 A method for operating the separation membrane according to claim 1 ,
The method for operating a separation membrane, wherein the stabilized hypobromite composition contains bromine and a sulfamic acid compound or contains a reaction product of bromine and a sulfamic acid compound.
前記臭素とスルファミン酸化合物との反応生成物が、水、アルカリおよびスルファミン酸化合物を含む混合液に臭素を不活性ガス雰囲気下で添加して反応させる工程を含む方法により得られたものであることを特徴とする分離膜の運転方法。 A method for operating the separation membrane according to claim 2 ,
The reaction product of bromine and a sulfamic acid compound is obtained by a method including a step of reacting a mixed liquid containing water, an alkali and a sulfamic acid compound by adding bromine in an inert gas atmosphere. A method of operating a separation membrane characterized by the above.
前記安定化次亜臭素酸組成物が、臭素系酸化剤、もしくは臭素化合物と塩素系酸化剤との反応物と、スルファミン酸化合物とを含有する、または、臭素系酸化剤、もしくは臭素化合物と塩素系酸化剤との反応物と、スルファミン酸化合物との反応生成物を含有し、
前記分離膜に前記安定化次亜臭素酸組成物を接触させる際の被処理水のpHが6.0以上であることを特徴とする分離膜の改質方法。 The stabilized hypobromite composition is brought into contact with a polyamide separation membrane that has been chlorinated with a chlorinated oxidant ,
The stabilized hypobromite composition contains a bromine-based oxidant, a reaction product of a bromine compound and a chlorine-based oxidant, and a sulfamic acid compound, or a bromine-based oxidant, or a bromine compound and chlorine. Containing a reaction product with a oxidant and a reaction product with a sulfamic acid compound,
Modification method of the separation membrane, characterized in der Rukoto pH 6.0 or more treated water upon contacting the stabilized hypobromous acid composition to said separation membrane.
前記安定化次亜臭素酸組成物が、臭素とスルファミン酸化合物とを含有する、または、臭素とスルファミン酸化合物との反応生成物を含有することを特徴とする分離膜の改質方法。 A method for reforming a separation membrane according to claim 4 ,
The method for reforming a separation membrane, wherein the stabilized hypobromite composition contains bromine and a sulfamic acid compound or contains a reaction product of bromine and a sulfamic acid compound.
前記臭素とスルファミン酸化合物との反応生成物が、水、アルカリおよびスルファミン酸化合物を含む混合液に臭素を不活性ガス雰囲気下で添加して反応させる工程を含む方法により得られたものであることを特徴とする分離膜の改質方法。 A method for modifying a separation membrane according to claim 5 ,
The reaction product of bromine and a sulfamic acid compound is obtained by a method including a step of reacting a mixed liquid containing water, an alkali and a sulfamic acid compound by adding bromine in an inert gas atmosphere. A method for reforming a separation membrane characterized by the above.
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