JP6474963B2 - 洗浄用組成物 - Google Patents

洗浄用組成物 Download PDF

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Publication number
JP6474963B2
JP6474963B2 JP2014041972A JP2014041972A JP6474963B2 JP 6474963 B2 JP6474963 B2 JP 6474963B2 JP 2014041972 A JP2014041972 A JP 2014041972A JP 2014041972 A JP2014041972 A JP 2014041972A JP 6474963 B2 JP6474963 B2 JP 6474963B2
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Japan
Prior art keywords
mass
cleaning composition
surfactant
extract
sodium
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JP2014041972A
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English (en)
Japanese (ja)
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JP2015168615A5 (enExample
JP2015168615A (ja
Inventor
知子 小關
知子 小關
美帆 山口
美帆 山口
晃子 石川
晃子 石川
元子 池田
元子 池田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mochida Pharmaceutical Co Ltd
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Mochida Pharmaceutical Co Ltd
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Publication date
Application filed by Mochida Pharmaceutical Co Ltd filed Critical Mochida Pharmaceutical Co Ltd
Priority to JP2014041972A priority Critical patent/JP6474963B2/ja
Publication of JP2015168615A publication Critical patent/JP2015168615A/ja
Publication of JP2015168615A5 publication Critical patent/JP2015168615A5/ja
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Publication of JP6474963B2 publication Critical patent/JP6474963B2/ja
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  • Cosmetics (AREA)
  • Detergent Compositions (AREA)
JP2014041972A 2014-03-04 2014-03-04 洗浄用組成物 Active JP6474963B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2014041972A JP6474963B2 (ja) 2014-03-04 2014-03-04 洗浄用組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014041972A JP6474963B2 (ja) 2014-03-04 2014-03-04 洗浄用組成物

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2018245901A Division JP6837470B2 (ja) 2018-12-27 2018-12-27 洗浄用組成物

Publications (3)

Publication Number Publication Date
JP2015168615A JP2015168615A (ja) 2015-09-28
JP2015168615A5 JP2015168615A5 (enExample) 2017-02-09
JP6474963B2 true JP6474963B2 (ja) 2019-02-27

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ID=54201676

Family Applications (1)

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JP2014041972A Active JP6474963B2 (ja) 2014-03-04 2014-03-04 洗浄用組成物

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JP (1) JP6474963B2 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6534958B2 (ja) * 2016-04-20 2019-06-26 株式会社ナリス化粧品 消臭化粧料
JP2019112332A (ja) * 2017-12-22 2019-07-11 小林製薬株式会社 皮膚洗浄用組成物
JP7322261B2 (ja) * 2017-12-22 2023-08-07 小林製薬株式会社 皮膚洗浄用組成物
CN114945351A (zh) * 2020-01-17 2022-08-26 联合利华知识产权控股有限公司 毛发处理组合物
JPWO2023042911A1 (enExample) * 2021-09-17 2023-03-23
CN114939074B (zh) * 2022-04-02 2023-05-02 深圳市仙迪化妆品股份有限公司 一种去屑祛味清洁组合物及其应用

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10227269A1 (de) * 2002-06-19 2004-01-08 Merck Patent Gmbh Thiazolderivate
JPWO2004028502A1 (ja) * 2002-09-27 2006-01-19 持田製薬株式会社 抗真菌剤および抗細菌剤配合洗浄用組成物
JP2004269419A (ja) * 2003-03-07 2004-09-30 Mochida Pharmaceut Co Ltd ミコナゾール含有水性注射剤
JP5097367B2 (ja) * 2006-07-25 2012-12-12 ライオン株式会社 毛髪化粧料組成物
JP5615515B2 (ja) * 2009-05-26 2014-10-29 持田製薬株式会社 洗浄用組成物
JP5562592B2 (ja) * 2009-07-31 2014-07-30 持田製薬株式会社 アゾール系抗真菌剤を含む毛髪化粧料

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Publication number Publication date
JP2015168615A (ja) 2015-09-28

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