JP6452749B2 - 限界寸法の測定 - Google Patents
限界寸法の測定 Download PDFInfo
- Publication number
- JP6452749B2 JP6452749B2 JP2017078841A JP2017078841A JP6452749B2 JP 6452749 B2 JP6452749 B2 JP 6452749B2 JP 2017078841 A JP2017078841 A JP 2017078841A JP 2017078841 A JP2017078841 A JP 2017078841A JP 6452749 B2 JP6452749 B2 JP 6452749B2
- Authority
- JP
- Japan
- Prior art keywords
- angles
- azimuth
- spectroscopic instrument
- spectroscopic
- aperture
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000005286 illumination Methods 0.000 claims description 15
- 239000000758 substrate Substances 0.000 claims description 7
- 239000011159 matrix material Substances 0.000 claims description 2
- 238000005259 measurement Methods 0.000 description 18
- 239000000523 sample Substances 0.000 description 10
- 239000002131 composite material Substances 0.000 description 8
- 230000003287 optical effect Effects 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 230000010287 polarization Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- -1 gallium arsenide Chemical class 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000004886 process control Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/55—Specular reflectivity
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
- G01B11/0641—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of polarization
- G01B11/065—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of polarization using one or more discrete wavelengths
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/02—Details
- G01J3/0205—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
- G01J3/021—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows using plane or convex mirrors, parallel phase plates, or particular reflectors
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/02—Details
- G01J3/0205—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
- G01J3/0229—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows using masks, aperture plates, spatial light modulators or spatial filters, e.g. reflective filters
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/28—Investigating the spectrum
- G01J3/42—Absorption spectrometry; Double beam spectrometry; Flicker spectrometry; Reflection spectrometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/21—Polarisation-affecting properties
- G01N21/211—Ellipsometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B2210/00—Aspects not specifically covered by any group under G01B, e.g. of wheel alignment, caliper-like sensors
- G01B2210/56—Measuring geometric parameters of semiconductor structures, e.g. profile, critical dimensions or trench depth
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/21—Polarisation-affecting properties
- G01N21/211—Ellipsometry
- G01N2021/213—Spectrometric ellipsometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/21—Polarisation-affecting properties
- G01N21/211—Ellipsometry
- G01N2021/214—Variangle incidence arrangement
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2201/00—Features of devices classified in G01N21/00
- G01N2201/06—Illumination; Optics
- G01N2201/067—Electro-optic, magneto-optic, acousto-optic elements
- G01N2201/0675—SLM
Description
Claims (8)
- 基板上で複数波長、複数方位、複数入射角の読み取りを行う分光機器であって、
合成ビーム経路に沿って照明ビームを発生する広帯域光源と、
前記照明ビームを、同時に複数の方位角度および複数の入射角度で前記基板上に向け、それによって前記合成ビーム経路に沿って反射ビームを発生させる対物レンズと、
前記照明ビームの第1の部分を選択的に通す単一の照明開口、および所望の組み合わせの方位角度および入射角度を有する前記反射ビームの第2の部分を選択的に通す、前記単一の照明開口よりもサイズが小さい開口が行列で配置されてなる複数の集光開口、を有し、前記第1の部分と前記第2の部分は前記合成ビーム経路の分離された部分である、開口プレートと、
前記組み合わせの方位角度および入射角度を受け取って、読み取り値を生成するための検知器と、
前記読み取り値を解釈するためのプロセッサと、
分析対象である異なる膜積層体に応じて前記複数の集光開口の数、サイズ、及び配置を再構成する、前記プロセッサで駆動される機械式または電子式シャッタ手段と、
を備える分光機器。 - 前記開口プレートが、さまざまな組み合わせの複数の方位角度および複数の入射角度を選択するのに個別にまたは組み合わせて使用することが可能な開口プレートの組を備える、請求項1に記載の分光機器。
- 前記開口プレートが、さまざまな組み合わせの複数の方位角度および複数の入射角度を生成するように電子的に設定可能である、請求項1に記載の分光機器。
- 前記検知器が、前記組み合わせの方位角度および入射角度を同時に受け取る、請求項1に記載の分光機器。
- 前記検知器が、前記組み合わせの方位角度および入射角度を順次受け取る、請求項1に記載の分光機器。
- 前記分光機器が反射率計である、請求項1に記載の分光機器。
- 前記分光機器がエリプソメーターである、請求項1に記載の分光機器。
- 前記対物レンズが、前記照明ビームを、すべての方位角度および実質的にすべての入射角度で向かわせるように調節可能である、請求項1に記載の分光機器。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US13/174,815 | 2011-07-01 | ||
US13/174,815 US8456639B2 (en) | 2011-07-01 | 2011-07-01 | Measurement of critical dimension |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014518605A Division JP2014521067A (ja) | 2011-07-01 | 2012-06-12 | 限界寸法の測定 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2017156351A JP2017156351A (ja) | 2017-09-07 |
JP6452749B2 true JP6452749B2 (ja) | 2019-01-16 |
Family
ID=47390357
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014518605A Pending JP2014521067A (ja) | 2011-07-01 | 2012-06-12 | 限界寸法の測定 |
JP2017078841A Active JP6452749B2 (ja) | 2011-07-01 | 2017-04-12 | 限界寸法の測定 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014518605A Pending JP2014521067A (ja) | 2011-07-01 | 2012-06-12 | 限界寸法の測定 |
Country Status (6)
Country | Link |
---|---|
US (1) | US8456639B2 (ja) |
EP (1) | EP2726849B1 (ja) |
JP (2) | JP2014521067A (ja) |
KR (1) | KR101844627B1 (ja) |
CN (1) | CN103688156B (ja) |
WO (1) | WO2013006248A2 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11512948B2 (en) * | 2020-05-26 | 2022-11-29 | Kla Corporation | Imaging system for buried metrology targets |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3624174A3 (en) * | 2013-09-16 | 2020-06-03 | Kla-Tencor Corporation | Multiple angles of incidence semiconductor metrology systems and methods |
CN104677299A (zh) * | 2013-11-29 | 2015-06-03 | 上海微电子装备有限公司 | 一种薄膜检测装置和方法 |
US9115987B2 (en) * | 2013-12-04 | 2015-08-25 | Nanometrics Incorporated | Optical metrology with multiple angles of incidence and/or azimuth angles |
CN104501738B (zh) * | 2014-12-31 | 2017-08-11 | 华中科技大学 | 纳米尺度下大面积散射场的快速测量方法及装置 |
KR101701798B1 (ko) * | 2015-02-09 | 2017-02-13 | 한양대학교 에리카산학협력단 | 입사각 분포를 최소화하는 집광형 타원해석기용 조리개 |
WO2017148665A1 (en) | 2016-03-01 | 2017-09-08 | Asml Netherlands B.V. | Metrology apparatus, method of measuring a structure and lithographic apparatus |
DE102016125793A1 (de) * | 2016-05-18 | 2017-11-23 | Google Inc. | Anzeigen von Grafiken in einer Fahrzeuganzeige |
US10141156B2 (en) * | 2016-09-27 | 2018-11-27 | Kla-Tencor Corporation | Measurement of overlay and edge placement errors with an electron beam column array |
US10215693B2 (en) * | 2016-09-29 | 2019-02-26 | Kla-Tencor Corporation | Infrared spectroscopic reflectometer for measurement of high aspect ratio structures |
JP2019207175A (ja) | 2018-05-30 | 2019-12-05 | キヤノン株式会社 | 測定装置 |
Family Cites Families (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4506979A (en) | 1981-12-08 | 1985-03-26 | Lockheed Corporation | Compact radiation fringe velocimeter for measuring in three dimensions |
US4871257A (en) * | 1982-12-01 | 1989-10-03 | Canon Kabushiki Kaisha | Optical apparatus for observing patterned article |
US5019715A (en) * | 1990-03-02 | 1991-05-28 | Spectra-Tech, Inc. | Optical system and method for sample analyzation |
US5486701A (en) | 1992-06-16 | 1996-01-23 | Prometrix Corporation | Method and apparatus for measuring reflectance in two wavelength bands to enable determination of thin film thickness |
US5412473A (en) | 1993-07-16 | 1995-05-02 | Therma-Wave, Inc. | Multiple angle spectroscopic analyzer utilizing interferometric and ellipsometric devices |
FR2729220B1 (fr) | 1995-01-06 | 1997-04-04 | Eldim | Dispositif de mesure colorimetrique d'un ecran d'affichage |
US6169601B1 (en) | 1998-06-23 | 2001-01-02 | Ade Optical Systems | Method and apparatus for distinguishing particles from subsurface defects on a substrate using polarized light |
WO2001020252A1 (en) * | 1999-09-16 | 2001-03-22 | On-Line Technologies, Inc. | Method and apparatus for performing optical measurements of layers and surface properties |
US6429943B1 (en) | 2000-03-29 | 2002-08-06 | Therma-Wave, Inc. | Critical dimension analysis with simultaneous multiple angle of incidence measurements |
US6750968B2 (en) * | 2000-10-03 | 2004-06-15 | Accent Optical Technologies, Inc. | Differential numerical aperture methods and device |
WO2002049065A1 (fr) * | 2000-12-12 | 2002-06-20 | Ebara Corporation | Dispositif a faisceau d'electrons et procede de production de dispositifs a semi-conducteur utilisant ledit dispositif a faisceau d'electrons |
IL148484A (en) * | 2002-03-04 | 2008-11-26 | Nova Measuring Instr Ltd | Optical measurements of patterned structures |
US7869057B2 (en) | 2002-09-09 | 2011-01-11 | Zygo Corporation | Multiple-angle multiple-wavelength interferometer using high-NA imaging and spectral analysis |
CN100370219C (zh) * | 2004-05-18 | 2008-02-20 | 中国科学院力学研究所 | 入射角度扫描椭偏成像测量方法和装置 |
US7483133B2 (en) | 2004-12-09 | 2009-01-27 | Kla-Tencor Technologies Corporation. | Multiple angle of incidence spectroscopic scatterometer system |
FR2880129B1 (fr) * | 2004-12-24 | 2007-04-20 | Ecole Polytechnique Etablissem | Caracterisation metrologique de circuits de microelectronique |
US7345825B2 (en) * | 2005-06-30 | 2008-03-18 | Kla-Tencor Technologies Corporation | Beam delivery system for laser dark-field illumination in a catadioptric optical system |
US20080129986A1 (en) | 2006-11-30 | 2008-06-05 | Phillip Walsh | Method and apparatus for optically measuring periodic structures using orthogonal azimuthal sample orientations |
JP5352111B2 (ja) * | 2008-04-16 | 2013-11-27 | 株式会社日立ハイテクノロジーズ | 欠陥検査方法及びこれを用いた欠陥検査装置 |
JP5332632B2 (ja) * | 2009-01-16 | 2013-11-06 | 株式会社日立製作所 | 分光検出方法及びその装置並びにそれを用いた欠陥検査方法及びその装置 |
US7961306B2 (en) * | 2009-03-30 | 2011-06-14 | Tokyo Electron Limited | Optimizing sensitivity of optical metrology measurements |
US8441639B2 (en) * | 2009-09-03 | 2013-05-14 | Kla-Tencor Corp. | Metrology systems and methods |
CN101881599B (zh) * | 2010-07-12 | 2012-01-25 | 华中科技大学 | 一种纳米结构三维形貌测量方法及装置 |
US9952140B2 (en) * | 2012-05-29 | 2018-04-24 | Kla-Tencor Corporation | Small spot size spectroscopic ellipsometer |
-
2011
- 2011-07-01 US US13/174,815 patent/US8456639B2/en active Active
-
2012
- 2012-06-12 KR KR1020147002086A patent/KR101844627B1/ko active IP Right Grant
- 2012-06-12 JP JP2014518605A patent/JP2014521067A/ja active Pending
- 2012-06-12 CN CN201280035483.8A patent/CN103688156B/zh active Active
- 2012-06-12 EP EP12806995.2A patent/EP2726849B1/en active Active
- 2012-06-12 WO PCT/US2012/042071 patent/WO2013006248A2/en active Application Filing
-
2017
- 2017-04-12 JP JP2017078841A patent/JP6452749B2/ja active Active
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11512948B2 (en) * | 2020-05-26 | 2022-11-29 | Kla Corporation | Imaging system for buried metrology targets |
Also Published As
Publication number | Publication date |
---|---|
WO2013006248A3 (en) | 2013-05-02 |
KR101844627B1 (ko) | 2018-04-02 |
EP2726849B1 (en) | 2022-06-01 |
JP2017156351A (ja) | 2017-09-07 |
CN103688156B (zh) | 2016-10-26 |
WO2013006248A2 (en) | 2013-01-10 |
EP2726849A2 (en) | 2014-05-07 |
JP2014521067A (ja) | 2014-08-25 |
KR20140045512A (ko) | 2014-04-16 |
US8456639B2 (en) | 2013-06-04 |
US20130003068A1 (en) | 2013-01-03 |
CN103688156A (zh) | 2014-03-26 |
EP2726849A4 (en) | 2015-03-11 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6452749B2 (ja) | 限界寸法の測定 | |
US7277172B2 (en) | Measuring overlay and profile asymmetry using symmetric and anti-symmetric scatterometry signals | |
US10365163B2 (en) | Optical critical dimension metrology | |
US8009292B2 (en) | Single polarizer focused-beam ellipsometer | |
US6384916B1 (en) | Parallel detecting, spectroscopic ellipsometers/polarimeters | |
US7489399B1 (en) | Spectroscopic multi angle ellipsometry | |
JP2004510972A (ja) | 差動開口数方法およびデバイス | |
US9046474B2 (en) | Multi-analyzer angle spectroscopic ellipsometry | |
US20190137776A1 (en) | Methods of manufacturing vertical semiconductor devices | |
TW202004934A (zh) | 覆蓋計量系統及方法 | |
JP2019523874A (ja) | 同時多角度分光法 | |
JP2012507027A (ja) | 可視及び近赤外域における分光偏光測定装置及び方法 | |
KR20190118603A (ko) | 높은 공간 해상도의 일립소메트리에서 사용하기 위한 시스템 및 방법 | |
CN103575661A (zh) | 包含垂直入射和斜入射的光学测量系统 | |
US20170045397A1 (en) | Device for analysing a specimen and corresponding method | |
KR102492803B1 (ko) | 조리개를 이용하여 입사 각도 또는 개구수를 조절하는 편광 분석 장치 및 방법 | |
WO2013006637A1 (en) | Multi-analyzer angle spectroscopic ellipsometry | |
JP2004012440A (ja) | 全反射局所蛍光x線分析用アライナー |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20180315 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20180327 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20180622 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20181127 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20181211 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6452749 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |