JP6428675B2 - パターン描画用の光源装置 - Google Patents

パターン描画用の光源装置 Download PDF

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Publication number
JP6428675B2
JP6428675B2 JP2016030856A JP2016030856A JP6428675B2 JP 6428675 B2 JP6428675 B2 JP 6428675B2 JP 2016030856 A JP2016030856 A JP 2016030856A JP 2016030856 A JP2016030856 A JP 2016030856A JP 6428675 B2 JP6428675 B2 JP 6428675B2
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light
light source
unit
source device
laser beam
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JP2016153893A5 (enExample
JP2016153893A (ja
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加藤　正紀
正紀 加藤
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Nikon Corp
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Nikon Corp
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  • Mechanical Optical Scanning Systems (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
JP2016030856A 2016-02-22 2016-02-22 パターン描画用の光源装置 Active JP6428675B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2016030856A JP6428675B2 (ja) 2016-02-22 2016-02-22 パターン描画用の光源装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2016030856A JP6428675B2 (ja) 2016-02-22 2016-02-22 パターン描画用の光源装置

Related Parent Applications (1)

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JP2014092862A Division JP6349924B2 (ja) 2014-04-28 2014-04-28 パターン描画装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2018204135A Division JP6587026B2 (ja) 2018-10-30 2018-10-30 パターン露光装置

Publications (3)

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JP2016153893A JP2016153893A (ja) 2016-08-25
JP2016153893A5 JP2016153893A5 (enExample) 2017-05-25
JP6428675B2 true JP6428675B2 (ja) 2018-11-28

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JP2016030856A Active JP6428675B2 (ja) 2016-02-22 2016-02-22 パターン描画用の光源装置

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Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7056572B2 (ja) * 2016-09-29 2022-04-19 株式会社ニコン ビーム走査装置およびパターン描画装置
CN114488715B (zh) * 2022-02-18 2023-09-29 西湖大学 一种光纤阵列光刻机

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4517271B2 (ja) * 1999-09-10 2010-08-04 株式会社ニコン レーザ装置を備えた露光装置
JP4375846B2 (ja) * 1999-09-10 2009-12-02 古河電気工業株式会社 レーザ装置
JP2001133710A (ja) * 1999-11-05 2001-05-18 Asahi Optical Co Ltd マルチヘッド走査光学系を持つレーザ描画装置
JP4938069B2 (ja) * 2004-03-31 2012-05-23 日立ビアメカニクス株式会社 パターン露光方法およびパターン露光装置
JP2006098719A (ja) * 2004-09-29 2006-04-13 Fuji Photo Film Co Ltd 露光装置
EP1975720A4 (en) * 2005-12-09 2010-05-05 Nikon Corp LASER LIGHT SOURCE DEVICE, EXPOSURE METHOD AND EQUIPMENT
JP2008171961A (ja) * 2007-01-10 2008-07-24 Nikon Corp レーザ装置、露光方法及び装置、並びにデバイス製造方法
NL1036407A1 (nl) * 2008-01-23 2009-07-27 Asml Netherlands Bv Polarization control apparatus and method.
JP5458513B2 (ja) * 2008-06-18 2014-04-02 株式会社ニコン 種光発生装置、光源装置及びその調整方法、光照射装置、露光装置、並びにデバイス製造方法
JP2010108001A (ja) * 2010-02-02 2010-05-13 Sumitomo Heavy Ind Ltd パターン描画方法
JP5395022B2 (ja) * 2010-09-29 2014-01-22 富士フイルム株式会社 パターン形成方法
WO2012069612A2 (en) * 2010-11-24 2012-05-31 Fianium Limited Optical systems
JP6290084B2 (ja) * 2012-08-23 2018-03-07 ギガフォトン株式会社 光源装置及びデータ処理方法

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JP2016153893A (ja) 2016-08-25

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