JP6417887B2 - Capacitive touch panel - Google Patents

Description

  The present invention relates to a capacitive touch panel.

  The touch panel is a device that is mounted on a smartphone, a tablet terminal, a notebook computer, or the like, and detects the position coordinates of a touched display area. There are several detection methods, for example, a capacitance method, a resistance film method, and an infrared method.

In the capacitive touch panel, a transparent sensor electrode is patterned in the display area. The sensor electrode includes, for example, M upper electrodes and N lower electrodes, and the upper electrode and the lower electrode are insulated from each other.
In addition to transparency, sensor electrodes are required to have low resistance so that high-speed sensing is possible. ITO (indium tin oxide), metal nanowires, CNT (carbon nanotubes), metal wires (metal mesh), etc. It is formed using.

A lead-out wiring for taking out the signal of the sensor electrode is formed around the sensor electrode. The sensor electrode is located in the display area of the display device, and the lead-out line is located in the frame area surrounding the display unit. The thinner the lead-out wiring, the narrower the frame.
Depending on what is selected as the material of the sensor electrode, not only the characteristics relating to the material itself such as transparency and resistance value, but also the method of forming the lead-out wiring, the assembled touch panel structure and the touch panel forming process are different.

Here, a configuration example of a touch panel using ITO electrodes is shown in FIG. 1A (referred to as touch panel A).
The electrode pattern is typically a rhombus (see 101 in FIG. 1A). The rhombic patterns of the lower sensor electrode and the upper sensor electrode are formed so as not to overlap each other in the same plane, and in the region where the lower sensor electrode and the upper sensor electrode intersect, an insulating film is used so that the sensor electrodes do not contact each other (Bridge structure).
The sensor electrode 101 is formed on the cover material 100, and can reduce the thickness of the touch panel.

  Next, a configuration example of a touch panel using metal nanowires as electrodes is shown in FIG. 1B (referred to as touch panel B). The type of metal nanowire is mainly Ag from the viewpoint of visibility and conductivity. The metal nanowires themselves are thin and short, but they are entangled like fibers and develop conductivity. The conductivity increases in proportion to the content of the metal nanowires, but the transparency decreases as the content increases.

When the content of the metal nanowire is adjusted so as to have the same transparency as that of ITO, the resistivity is about ½ that of ITO.
As a method for producing the metal nanowire electrode, there are a method in which the metal nanowire is dissolved and applied, or a method of printing (see, for example, Patent Document 1). There is also a method of forming a metal nanowire electrode by transferring a film having a resin layer containing an insulating layer and metal nanowires (see, for example, Patent Documents 2 and 3).

  This configuration example (touch panel B) differs from the configuration of touch panel A in that there is a transparent insulating film 104 between the upper sensor electrode 103 and the lower sensor electrode 105. (In touch panel A, an insulating layer is formed only at the intersection).

  Next, a configuration example of a touch panel using metal thin wires as electrodes is shown in FIG. 1C (referred to as touch panel C). The main type of fine metal wire is Cu from the viewpoint of reducing resistance. Although the metal thin wire is not transparent, it is hardly visible to human eyes if the line width is reduced to about 5 μm. Since the sensor electrode pattern and the lead-out wiring can be formed in a lump like 107 and 109 in FIG. 1C, the step of forming the lead-out wiring can be omitted. In addition, since the lead-out wiring can be formed with a thin line of about 5 μm, it is suitable for narrowing the frame.

  As a method for producing the fine metal wire, for example, there is a method in which Cu is formed on the front and back of the film substrate 108 by vapor deposition or plating, etched into a fine wire shape, and pasted on the cover material 100 with the transparent adhesive 106.

Special table 2011-515510 gazette International Publication No. 2010/021224 International Publication No. 2013/051516

The surface resistivity of ITO used as an electrode in the touch panel A is about 100Ω / □, which is inferior to metal nanowires (about 50Ω / □) and metal meshes (about 0.3Ω / □), so high-speed sensing is required. It is difficult to apply to a large touch panel.
Further, in the configuration of the touch panel A, it is difficult to narrow the frame because the lead wiring 102 normally uses Ag paste.
Further, the configuration of the touch panel A has a problem that although the thickness of the touch panel can be reduced, the touch panel A is easily affected by electromagnetic noise from the display unit at the bottom of the touch panel and is vulnerable to malfunction.

  The configuration of the touch panel B using metal nanowires as an electrode can reduce the resistivity as compared with the ITO electrode. However, in this configuration as well, the lead wiring 102 uses Ag paste as in the touch panel A. Still, there is room for improvement in terms of narrowing the frame.

  The configuration of the touch panel C can omit the step of forming the lead wiring and is suitable for narrowing the frame, but it is difficult to form a thin metal wire on the cover material via the transparent adhesive, and the touch panel A or There is a problem that the sensor is thicker than the touch panel B.

  As described above, when comparing touch panels using ITO, fine metal wires, and metal nanowires as transparent electrodes, the characteristics are both pros and cons and all characteristics (low resistance, good visibility, thin sensor configuration, narrow frame) There is a demand for a touch panel that combines the above.

  The present invention has been made in view of the above circumstances, and it is an object of the present invention to provide a touch panel that has low sensor electrode resistance, excellent visibility, is thin, has a narrow frame, and is not easily affected by LCD (liquid crystal display) noise. .

  The present invention includes an upper sensor electrode, a lower sensor electrode, a lead wire for the upper sensor electrode, a lead wire for the lower sensor electrode, and a transparent insulating film that insulates the upper sensor electrode and the lower sensor electrode, One of the sensor electrode and the lower sensor electrode relates to a capacitive touch panel that is formed of a fine metal wire and the other is formed of a metal nanowire.

  The present invention also relates to the capacitive touch panel, wherein the upper sensor electrode is formed of a thin metal wire and the lower sensor electrode is formed of a composition containing metal nanowires. According to this configuration, since the sensor electrode can be formed directly on the cover material, a thin touch panel can be provided. In addition, since an appropriate sensor pattern configuration can be employed, a touch panel that is not easily affected by LCD noise can be provided.

  Further, the present invention is the capacitive touch panel, wherein the transparent insulating film and the lower sensor electrode are a support film, a conductive film provided on the support film, and a photosensitive resin provided on the conductive film. The present invention relates to a capacitive touch panel formed using a photosensitive conductive film having a layer. By using a photosensitive conductive film, a sensor electrode pattern can be formed by photolithography, and the process can be simplified. Whether or not the photosensitive conductive film is used can be specified by observing the transparent insulating film and the sensor electrode portion with a scanning electron microscope.

  In the capacitive touch panel according to the present invention, the lead wire for the upper sensor electrode and the lead wire for the lower sensor electrode are formed by the thin metal wire, and a part of the transparent insulating film is opened. Further, the present invention relates to a capacitive touch panel in which a part of the lead wiring is exposed, and the exposed lead wiring and a sensor electrode formed of a composition containing the metal nanowire are connected with a conductive paste. According to the present invention, a touch panel with a narrow frame can be provided.

  The present invention also relates to the capacitive touch panel, wherein the thin metal wire is a Cu thin wire and the metal nanowire is an Ag nanowire. According to the present invention, it is possible to provide a touch panel having low sensor electrode resistance, excellent visibility, and excellent workability and cost.

  The present invention also relates to the capacitive touch panel, wherein the lower sensor electrode is thicker than the upper sensor electrode. ADVANTAGE OF THE INVENTION According to this invention, the touch panel which is hard to receive to the influence of the noise which a display apparatus emits can be provided.

  The present invention also relates to the capacitive touch panel, wherein a space between the adjacent lower sensor electrodes is 100 μm or less. ADVANTAGE OF THE INVENTION According to this invention, the touch panel which is hard to receive to the influence of the noise which a display apparatus emits can be provided.

  The present invention also relates to a capacitive touch panel in which the sensor electrode, the transparent insulating film, and the lead-out wiring are formed on a cover material in the capacitive touch panel.

  Further, the present invention is the capacitive touch panel according to the capacitive touch panel, wherein the sensor electrode, the transparent insulating film, and the lead-out wiring are formed on a side opposite to a side where a cover material is provided with respect to the polarizing plate. About. According to the present invention, glare between the upper sensor electrode and the lower sensor electrode can be prevented.

  Furthermore, the present invention relates to the capacitive touch panel, wherein the sensor electrode, the transparent insulating film, and the lead-out wiring are formed on the back surface of a polarizing plate in the capacitive touch panel. ADVANTAGE OF THE INVENTION According to this invention, the glare of an upper sensor electrode and a lower sensor electrode can be prevented, and a thin touch panel can be provided.

  According to the present invention, one sensor electrode is formed of a thin metal wire, and the other sensor electrode is formed of a composition containing metal nanowires, whereby the resistance of the sensor electrode is low and the visibility is excellent. A thin, narrow frame, touch panel that is less susceptible to LCD noise can be provided.

It is a figure explaining the structure of the conventional touch panel. It is a figure explaining the touch-panel structure of 1st embodiment. It is a figure explaining a sensor electrode (formed with a metal fine wire). (A) It is a figure explaining the preparation example of a transparent insulating film. (B) It is a figure explaining the preparation example of a sensor electrode (it forms with a metal nanowire containing composition). It is a figure explaining the touchscreen structure which produced the sensor part on the film substrate. It is a figure explaining the touchscreen structure which suppresses reflection of external light. It is a figure explaining the mechanism of external light reflection suppression. It is a figure explaining the touch-panel structure of 2nd embodiment. It is a figure explaining a photosensitive conductive film. (A) It is a figure explaining bonding of the photosensitive conductive film. (B) It is a figure explaining the method of exposing a lead-out wiring. (A) It is a figure explaining a sensor electrode (it forms with a metal nanowire containing composition). (B) It is a figure explaining the method of connecting a sensor electrode (it forms with a metal nanowire containing composition) and the exposed extraction wiring. It is a figure explaining the method of forming a sensor electrode (metal nanowire containing composition) with a laser. It is a figure explaining the method different from FIG. 12 which forms a sensor electrode (metal nanowire containing composition) with a laser.

Preferred embodiments of the present invention will be described in detail.
<First embodiment>
The configuration of the capacitive touch panel according to the first embodiment of the present invention will be described with reference to FIGS. FIG. 2 shows an overall configuration diagram. This configuration includes a cover material 200, an upper sensor electrode, an upper lead wire and a lower lead wire (hereinafter referred to as “upper sensor electrode and lead wire group”) 201, a transparent insulating film 202, and a lower sensor electrode 203. , A transparent adhesive 204 and a display device 205.

  The cover material 200 is made of transparent glass or a resin substrate. In addition to transparency, a material having heat resistance and fastness is preferred. For example, a material obtained by subjecting aluminosilicate glass or soda lime glass to a tempering treatment is preferable. A material obtained by subjecting polymethyl methacrylate (PMMA) or polycarbonate (PC) to a hard coat treatment is also preferable.

<Upper sensor electrode, lead-out wiring>
The upper sensor electrode and lead wiring group 201 is formed of a fine metal wire. Examples of the metal include Cu, Ag, Pt, Cr, Al, MAM (Mo / Al / Mo), and Cu is preferable from the viewpoints of conductivity, workability, and cost. Since Cu can be processed into a thin line of about 5 μm, it can be suppressed from being visually recognized by human eyes.

  An example of a method for manufacturing the upper sensor electrode and the lead-out wiring group 201 will be described. First, a metal thin film is formed on the surface of the cover material 200 as a base material by plating or vapor deposition. Next, when a photosensitive resist is applied to the entire surface of the metal thin film and the resist is exposed with ultraviolet rays or the like through a photomask, only the resist at the exposed portion is cured. When the resist that has not been exposed is removed by dipping in a developing solution, and then dipped in an etching solution for a metal thin film, the metal film at the portion where the resist has been removed is etched. By removing the resist remaining after the etching, a fine metal wire having the same pattern as the photomask is completed.

  As another production method, for example, a thin metal wire can also be formed by printing a resin composition containing metal particles on the cover material 200.

The upper sensor electrode and lead wiring group 201 will be described in detail (see FIG. 3). The lead wire group 201 includes an upper sensor electrode 300, an electrode 301 that leads the upper sensor electrode 300 to the outside, and an electrode 302 that leads the lower sensor electrode 203 to the outside.
As above-mentioned, these 300-302 are formed with a thin metal wire, and are collectively formed with the same thin metal wire. The line width of each upper sensor electrode 300 is preferably 10 μm or less, and more preferably 5 μm or less, from the viewpoint of making it difficult to visually recognize the thin line. In FIG. 3, the upper sensor electrode 300 is illustrated in a strip (stripe) shape, but is not limited to this shape. For example, it may have a mesh shape or a honeycomb shape with a line width of 10 μm or less.

<Transparent insulating film>
The transparent insulating film 202 in FIG. 2 has an insulating property and plays a role of insulating the upper sensor electrode / lead-out wiring group 201 and the lower sensor electrode 203. The transparent insulating film 202 preferably has patterning properties. As the material, a transferable sheet-like resin or a liquid resin is suitable. The film thickness of the transparent insulating film is preferably several tens of μm or less.

  4A shows an example of manufacturing a transparent insulating film when the transparent insulating film 202 is a sheet-like resin or the like. First, the sheet-like transparent insulating film 202 is transferred so as to cover the upper sensor electrode and the surface of the lead wiring group 201 formed on the cover material 200, and only a predetermined portion is cured with ultraviolet rays or the like through a photomask. The other portions are removed with a developing solution to form the exposed portion 400 of the lead wire for the lower sensor electrode. Thereby, the lead wiring 302 of the lower sensor electrode is exposed.

<Lower sensor electrode>
The lower sensor electrode 203 in FIG. 2 is made of a composition containing metal nanowires and is formed by printing or coating. Although there exist Au, Ag, Pt, Cu etc. in the kind of metal nanowire, Ag nanowire is preferable at the point which is excellent in electroconductivity and visibility.
The diameter of the metal nanowire is preferably a nanometer scale so that the visibility is excellent, and the length is preferably in the range of several μm to several tens of μm so that the contacts between the nanowires can be increased while fine patterning is possible. . Although the transmittance is determined by the content of the metal nanowires in the composition, the transmittance in the visible light region is preferably 80% or more so as not to impair visibility.

An example of manufacturing the lower sensor electrode 203 will be described with reference to FIG. When a composition containing metal nanowires is applied and dried so as to cover the lead wire 302 of the lower sensor electrode exposed by removing a part of the transparent insulating film, the lower sensor electrode 203 is formed. Flows into the exposed portion 400 of the lead wire of the lower sensor electrode and is connected to the lead wire 302 of the lower sensor electrode.
The thickness of each line of the lower sensor electrode 203 is preferably 1 mm or more, more preferably 2 mm or more, and further preferably 4 mm or more. The gap between the lines of the lower sensor electrode 203 is preferably 100 μm or less, more preferably 50 μm or less, and even more preferably 10 μm or less. As the gap is narrower, the lower sensor electrode 203 can block the electromagnetic wave noise generated by the display device 205 from being transmitted to the upper sensor electrode 300. On the other hand, when there is a gap, noise is easily transmitted to the upper sensor electrode 300 through the gap.

  In the above example, the shape of the lower sensor electrode 203 is a stripe shape. However, the shape is not limited to this, and may be a jagged shape such as a saw. The transparent adhesive 204 is preferably a material that does not corrode the lower sensor electrode 203.

  As described above, in FIGS. 2 to 4, the manufacturing example in which the sensor electrode is formed on the cover material 200 has been described. However, the present invention is not limited to this.

As another example, the configuration of FIG. In FIG. 5, the cover material 200, the upper sensor electrode and lead wiring group 201, the transparent insulating film 202, the lower sensor electrode 203, the transparent adhesive 204, and the display device 205 are the same as in FIG.
FIG. 2 is different from FIG. 2 in that sensor electrodes 201 to 203 are formed on the film base 501. The transparent adhesive 500 serves to bond the cover material 200 and the film base 501. Compared with the configuration of FIG. 2, this configuration increases the thickness of the touch panel by the thickness of the transparent adhesive 500 and the film base 501. However, the effects other than the thinness, that is, the effect that the resistance of the sensor electrode is low, the visibility is excellent, the frame is narrow, and it is not easily affected by the LCD noise is the same as the configuration of FIG.

  As another configuration example, the configuration of FIG. 6 will be described. In FIG. 6, the cover material 200, the upper sensor electrode and lead wiring group 201, the transparent insulating film 202, and the lower sensor electrode 203 are the same as in FIG. The difference is that the sensor electrode is formed on the lower surface of the polarizing plate of the liquid crystal display. The liquid crystal display includes a polarizing plate 600, a polarizing plate 603, a backlight, and other members 602 (a liquid crystal layer, a TFT (thin film transistor) substrate, and a color filter substrate). The polarizing plates 600 and 603 are both linearly polarized light and have a crossed Nicols (orthogonal) relationship. By forming the upper sensor electrode / leading wire group 201 and the lower sensor electrode 203 below the polarizing plate 600, glare between the upper sensor electrode 201 and the lower sensor electrode 203 can be suppressed.

  A mechanism in which the polarizing plate 600 prevents glare will be described with reference to FIG. FIG. 7 shows only the polarizing plate 600, the upper sensor electrode / leading wire group 201, and the lower sensor electrode 203 in FIG. 6, and the others are omitted. External incident light (sunlight, fluorescent lamp, etc.) 700 is light having various polarization components, but most of the light is cut by the polarizing plate 600 and reaches the upper sensor electrode / lead-out wiring group 201 and the lower sensor electrode 203. Only the reaching light 701 having the same polarization as the polarization direction of the polarizing plate 600 is used. Reflection occurs at the upper sensor electrode and the lower sensor electrode, and the reflected lights 702 and 703 are scattered and become light having various polarizations, but only light in the polarization direction of the polarizing plate 600 passes. As a result, the glare between the upper sensor electrode / leading wire group 201 and the lower sensor electrode 203 is eliminated.

<Second Embodiment>
The configuration of the capacitive touch panel according to the second embodiment of the present invention will be described with reference to FIGS.

  In FIG. 8, the cover material 200, the upper sensor electrode and lead wiring group 201, the transparent adhesive 204, and the display device 205 are the same as in FIG. 800 which consists of the transparent insulating film which can be patterned, and a lower sensor electrode differs in the point produced using the photosensitive transparent conductive film shown in FIG. The photosensitive transparent conductive film 902 in FIG. 9 includes a photosensitive transparent insulating film 900 and a composition 901 containing metal nanowires, and the photosensitive transparent insulating film 900 and the metal nanowire-containing composition 901 have photocurability. Patterning can be performed by exposing through a photomask pattern and developing. The photosensitive transparent insulating film 900 and the metal nanowire-containing composition 901 can be patterned simultaneously. It is also possible to pattern only the layer 901 leaving the photosensitive transparent insulating film 900. The transparent conductive film containing such metal nanowires can be produced using the methods described in Patent Documents 2 and 3.

  By using such a photosensitive transparent conductive film 902, the transparent insulating film 202 and the lower sensor electrode 203 of FIG. 2 of the first embodiment can be manufactured more easily and collectively.

<Transparent insulating film, lower sensor electrode>
A manufacturing example of 800 including a patternable transparent insulating film and a lower sensor electrode will be described with reference to FIGS. First, in FIG. 10, a sheet-like photosensitive transparent conductive film 902 is transferred so as to cover the surface of the cover material 200, the sensor electrode, and the lead-out wiring group 201, and a part of the photosensitive transparent conductive film is exposed by exposure and development. The photosensitive transparent insulating film 900 and the photosensitive metal nanowire-containing composition 901 are removed to form an opening 1000 of the photosensitive transparent conductive film. Thereby, the lead wiring 302 of the lower sensor electrode is exposed.
Next, in FIG. 11A, only the photosensitive metal nanowire-containing composition 901 is patterned to form the lower sensor electrode 1100. Thereafter, in FIG. 11B, the lower sensor electrode 1100 and the lower sensor electrode lead wiring 302 are connected through the opening 1000 of the photosensitive transparent conductive film with a conductive paste 801 (eg, Ag paste).

  In the above, the formation method in which the photosensitive transparent conductive film 902 is patterned by exposure and development is shown in FIGS. 11A and 11B.

A patterning method by laser irradiation will be described with reference to FIGS. FIG. 12 and FIG. 13 are views until a part of the photosensitive transparent conductive film 902 is removed together with the transparent insulating film 900 and the metal nanowire-containing film 901 by exposure and development to form the opening portion 1000 of the photosensitive transparent conductive film. 10 is the same.
In FIG. 12A, each lower sensor electrode 1200 is separated by a laser. Thereafter, in FIG. 12B, the lower sensor electrode 1200 and the lower sensor electrode lead-out wiring 302 are connected by the conductive paste 801 (for example, Ag paste) through the opening 1000 of the photosensitive transparent conductive film.

  Alternatively, in FIG. 13A, first, the conductive paste 1300 (for example, Ag paste) is applied so as to cover the entire opening 1000 of the photosensitive transparent conductive film, and the photosensitive metal nanowire-containing composition 901 and the lower sensor electrode are coated. The lead wiring 302 is connected. Thereafter, in FIG. 13B, the conductive paste 1300 is separated into individual lower sensor electrodes 1301 with a laser.

  As mentioned above, although embodiment of this invention was described concretely, this invention is not limited to the said embodiment, It can change and replace in the range which does not deviate from the summary.

  A capacitance type touch panel having the configuration shown in Table 1 was manufactured, and the resistance value, visibility, LCD noise block, narrow frame and thinness were evaluated. Table 1 shows the evaluation results.

  From the results shown in Table 1, the capacitive touch panel (Examples 1 and 2) of the present invention has a well-balanced characteristic required in comparison with the conventional capacitive touch panels (Comparative Examples 1 to 3). It is clear that they have both. In addition, the comparative example 4 which used CNT which is a conductive fiber instead of the metal nanowire of this invention for a lower sensor electrode has low electroconductivity compared with Example 1, 2, and it may be inferior to visibility. understood.

100 Cover material 101 Sensor electrode (ITO)
102 Lead-out wiring (Ag paste)
103 Upper sensor electrode (Ag nanowire)
104 Transparent insulating film 105 Lower sensor electrode (Ag nanowire)
106 transparent adhesive 107 upper sensor electrode and its lead wiring (Cu fine wire)
108 Film base 109 Lower sensor electrode and its lead wiring (Cu fine wire)
200 Cover material 201 Upper sensor electrode, upper lead wire and lower lead wire (upper sensor electrode and lead wire group; metal fine wire)
202 Transparent insulating film 203 Lower sensor electrode (metal nanowire-containing composition)
204 Transparent adhesive 205 Display device 300 Upper sensor electrode (fine metal wire)
301 Lead wire for upper sensor electrode (metal thin wire)
302 Lead wire for lower sensor electrode (metal thin wire)
400 Exposed portion of lead wire of lower sensor electrode 500 Transparent adhesive 501 Film substrate 600 Polarizing plate 601 Transparent adhesive 602 Liquid crystal layer, TFT substrate and color filter substrate 603 Polarizing plate 700 External incident light 701 Arrival light 702 Upper sensor electrode reflection Light 703 Lower sensor electrode reflected light 704 Reflected light 705 Reflected light 800 Patternable transparent insulating film and lower sensor electrode (metal nanowire-containing composition)
801 Conductive paste 900 Photosensitive transparent insulating film 901 Photosensitive metal nanowire-containing composition 902 Photosensitive transparent conductive film 1000 Photosensitive transparent conductive film opening 1100 Lower sensor electrode (metal nanowire-containing composition)
1200 Lower sensor electrode (metal nanowire-containing composition)
1300 Conductive paste 1301 Lower sensor electrode (composition containing metal nanowires)

Claims (9)

An upper sensor electrode; a lower sensor electrode; a lead wire for the upper sensor electrode; a lead wire for the lower sensor electrode; and a transparent insulating film that insulates the upper sensor electrode and the lower sensor electrode. Either one of the lower sensor electrodes is formed of a thin metal wire, and the other is formed of a composition containing metal nanowires .
The lead wiring of the upper sensor electrode and the lead wiring of the lower sensor electrode are formed of the thin metal wire, and a part of the lead wiring is exposed and exposed by opening a part of the transparent insulating film. A capacitive touch panel in which a lead-out wiring and a sensor electrode formed of a composition containing the metal nanowire are connected by a conductive paste .   2. The capacitive touch panel according to claim 1, wherein the upper sensor electrode is formed of a thin metal wire, and the lower sensor electrode is formed of a composition containing metal nanowires.   3. The capacitive touch panel according to claim 2, wherein the transparent insulating film and the lower sensor electrode include a support film, a conductive film provided on the support film, and a photosensitive resin layer provided on the conductive film. A capacitive touch panel formed using a photosensitive conductive film. The capacitive touch panel according to any one of claims 1 to 3 , wherein the thin metal wire is a Cu thin wire, and the metal nanowire is an Ag nanowire. The capacitive touch panel according to any one of claims 1 to 4 , wherein the lower sensor electrode is thicker than the upper sensor electrode. In capacitive touch panel according to any one of claims 1 to 5 capacitive touch panel space between the lower sensor electrode adjacent is 100μm or less. The capacitive touch panel according to any one of claims 1 to 6 , wherein the sensor electrode, the transparent insulating film, and the lead-out wiring are formed on a cover material. The capacitive touch panel according to any one of claims 1 to 6 , wherein the sensor electrode, the transparent insulating film, and the lead-out wiring are formed on a side opposite to a side where a cover material is provided with respect to the polarizing plate. Capacitive touch panel. The capacitive touch panel according to any one of claims 1 to 6 , wherein the sensor electrode, the transparent insulating film, and the lead-out wiring are formed on a back surface of a polarizing plate.

Images