JP6345692B2 - 非リン系添加剤を使用する腐食および汚染の軽減 - Google Patents
非リン系添加剤を使用する腐食および汚染の軽減 Download PDFInfo
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- JP6345692B2 JP6345692B2 JP2015550711A JP2015550711A JP6345692B2 JP 6345692 B2 JP6345692 B2 JP 6345692B2 JP 2015550711 A JP2015550711 A JP 2015550711A JP 2015550711 A JP2015550711 A JP 2015550711A JP 6345692 B2 JP6345692 B2 JP 6345692B2
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Classifications
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- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F5/00—Softening water; Preventing scale; Adding scale preventatives or scale removers to water, e.g. adding sequestering agents
- C02F5/08—Treatment of water with complexing chemicals or other solubilising agents for softening, scale prevention or scale removal, e.g. adding sequestering agents
- C02F5/10—Treatment of water with complexing chemicals or other solubilising agents for softening, scale prevention or scale removal, e.g. adding sequestering agents using organic substances
- C02F5/12—Treatment of water with complexing chemicals or other solubilising agents for softening, scale prevention or scale removal, e.g. adding sequestering agents using organic substances containing nitrogen
- C02F5/125—Treatment of water with complexing chemicals or other solubilising agents for softening, scale prevention or scale removal, e.g. adding sequestering agents using organic substances containing nitrogen combined with inorganic substances
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/68—Treatment of water, waste water, or sewage by addition of specified substances, e.g. trace elements, for ameliorating potable water
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K15/00—Anti-oxidant compositions; Compositions inhibiting chemical change
- C09K15/04—Anti-oxidant compositions; Compositions inhibiting chemical change containing organic compounds
- C09K15/30—Anti-oxidant compositions; Compositions inhibiting chemical change containing organic compounds containing heterocyclic ring with at least one nitrogen atom as ring member
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F11/00—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F11/00—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
- C23F11/08—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F11/00—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
- C23F11/08—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids
- C23F11/10—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids using organic inhibitors
- C23F11/14—Nitrogen-containing compounds
- C23F11/149—Heterocyclic compounds containing nitrogen as hetero atom
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F11/00—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
- C23F11/08—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids
- C23F11/18—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids using inorganic inhibitors
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
- C02F2103/26—Nature of the water, waste water, sewage or sludge to be treated from the processing of plants or parts thereof
- C02F2103/28—Nature of the water, waste water, sewage or sludge to be treated from the processing of plants or parts thereof from the paper or cellulose industry
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- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
- C02F2103/32—Nature of the water, waste water, sewage or sludge to be treated from the food or foodstuff industry, e.g. brewery waste waters
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- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
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- C02F2103/36—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32 from the manufacture of organic compounds
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/005—Processes using a programmable logic controller [PLC]
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/005—Processes using a programmable logic controller [PLC]
- C02F2209/008—Processes using a programmable logic controller [PLC] comprising telecommunication features, e.g. modems or antennas
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/02—Temperature
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/04—Oxidation reduction potential [ORP]
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
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- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/06—Controlling or monitoring parameters in water treatment pH
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- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/40—Liquid flow rate
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- C02F2303/00—Specific treatment goals
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Description
(a)保存デバイスを用意するステップと、
(b)水を保存デバイスに導入するステップと、
(c)制御装置、および制御装置と連通している複数のセンサーを含む、監視および制御ユニットを用意するステップであり、複数のセンサーのそれぞれが水の特性を測定するように操作可能であるステップと、
(d)制御装置と連通している1つ以上のポンプを用意するステップであり、1つ以上のポンプが化学物質注入ポンプを含むことができるステップと、
(e)測定される水の1つ以上の特性のそれぞれに対する許容範囲を、制御装置に入力するステップと、
(f)保存デバイス内の水と連通している第1の端部、ならびに監視および制御ユニットの注入口に接続されている第2の端部を有する送出(delivery)導管を用意するステップと、
(g)保存デバイスから、水の試料を監視および制御ユニットにポンプで注入するステップと、
(h)水の試料の1つ以上の特性を、複数のセンサーで測定するステップと、
(i)リンを実質的に含まない水処理用組成物を、化学物質注入ポンプで保存デバイス内の水に添加するステップと、
(j)生産水の試料の測定された1つ以上の特性が、ステップ(e)で制御装置に入力された許容範囲内にあるかどうかを決定するステップと、
(k)測定された1つ以上の特性が、ステップ(e)で入力されたその特性に関連する許容範囲外にある場合には、1つ以上の化学物質注入ポンプから水への流入を変化させるステップであり、化学物質が、水に関連して測定された特性を許容範囲内に入るように調節することができるステップと、
(l)任意選択により、ステップ(a)〜(k)を反復して、1つ以上の特性がステップ(e)で入力された許容範囲内に入ったかどうかを決定するステップと
を含む。
分散剤1=18%ポリマレイン酸分散剤、ならびに12%アクリル酸およびAMPSのコポリマー分散剤の混合物である組成物;
アゾール1=42.8%アゾールを含むナトリウム塩としてのトリルトリアゾール;
分散剤2=アクリル酸およびヒドロキシポリエトキシ(10)アリルエーテルのコポリマー分散剤;ならびに
アゾール2=ブチルベンゾトリアゾールおよびトリルトリアゾールの混合物。
Claims (10)
- 1種以上のアゾール化合物、1種以上の遷移金属、および1種以上の分散剤を含む水処理用組成物であって、リンを含まず、前記1種以上の分散剤が、ポリマレイン酸と、アクリル酸及び2−アクリルアミド−2−メチルプロパンスルホン酸を含むコポリマーとの混合物を含み、前記1種以上の遷移金属が、亜鉛を含み、前記1種以上のアゾール化合物が、ブチルベンゾトリアゾールおよびトリルトリアゾールの混合物を含むことを特徴とする水処理用組成物。
- 請求項1に記載の水処理用組成物であって、前記1種以上の分散剤が、2ppm〜50ppmの範囲の量で存在することを特徴とする水処理用組成物。
- 請求項1に記載の水処理用組成物であって、前記1種以上のアゾール化合物が、3ppm〜20ppmの範囲の量で存在することを特徴とする水処理用組成物。
- 請求項1〜3のいずれか1項に記載の水処理用組成物であって、前記1種以上の遷移金属が、2ppm〜4ppmの範囲の量で存在することを特徴とする水処理用組成物。
- 前記1種以上の分散剤が、ポリマレイン酸と、アクリル酸及び2−アクリルアミド−2−メチルプロパンスルホン酸を含むコポリマーとの混合物を約3ppmの量で含み、前記1種以上の遷移金属が、亜鉛を約4ppmの量で含み、前記1種以上のアゾール化合物が、ブチルベンゾトリアゾール及びトリルトリアゾールの混合物を約3ppmの量で含む、請求項1に記載の水処理用組成物。
- 水性システムにおける表面の腐食または汚染を軽減する方法であって、
(a)水性媒体を少なくとも1つの金属表面を有する筐体に導入するステップと、
(b)1種以上のアゾール化合物、1種以上の遷移金属、および1種以上の分散剤を含み、リンを含まない水処理用組成物を、前記水性媒体に注入するステップと、
を含み、
(c)監視および制御ユニット、ならびに1つ以上の化学物質注入ポンプを含むオンライン式自動化法であり、
前記1種以上の分散剤が、ポリマレイン酸と、アクリル酸及び2−アクリルアミド−2−メチルプロパンスルホン酸を含むコポリマーとの混合物を含み、前記1種以上の遷移金属が、亜鉛を含み、前記1種以上のアゾール化合物が、ブチルベンゾトリアゾール及びトリルトリアゾールの混合物を含むことを特徴とする方法。 - 請求項6に記載の方法であって、ステップ(a)の前に、少なくとも1つの金属表面を前記水処理用組成物で前処理するステップをさらに含むことを特徴とする方法。
- 請求項6に記載の方法であって、前記少なくとも1つの金属表面が、銅または銅合金を含むことを特徴とする方法。
- 請求項6に記載の方法であって、1種以上のアゾール化合物の前記有効量が、2ppm〜20ppmであり、1種以上の遷移金属の前記有効量が、2ppm〜4ppmであり、1種以上の分散剤の前記有効量が、2ppm〜20ppmであることを特徴とする方法。
- 水の1つ以上の特性を監視および制御する方法であって、
(a)水を保存デバイスに導入するステップと、
(b)保存デバイスから、水の試料を監視および制御ユニットにポンプで注入するステップであって、監視および制御ユニットは制御装置、および制御装置と連通している複数のセンサーを含み、複数のセンサーのそれぞれが水の特性を測定するように操作可能であり、
1つ以上のポンプは制御装置と連通しており、1つ以上のポンプは1つ以上の化学物質注入ポンプを含み、送出導管は水と連通している第1の端部、ならびに監視および制御ユニットの注入口に接続されている第2の端部を有する、ステップと、
(c)測定される水の1つ以上の特性のそれぞれに対する許容範囲を、制御装置に入力するステップと、
(d)水の試料の1つ以上の特性を、複数のセンサーで測定するステップと、
(e)請求項1に記載の水処理用組成物を、化学物質注入ポンプで水に添加するステップと、
(f)生産水の試料の測定された1つ以上の特性が、ステップ(c)で制御装置に入力された許容範囲内にあるかどうかを決定するステップと、
(g)測定された1つ以上の特性が、ステップ(c)で入力されたその特性に関連する許容範囲外にある場合には、1つ以上の化学物質注入ポンプから水への化学物質の流入を変化させるステップであり、化学物質が、水に関連して測定された特性を許容範囲内に入るように調節することができるステップと、
(h)任意選択により、ステップ(a)〜(f)を反復して、1つ以上の特性がステップ(c)で入力された許容範囲内に入ったかどうかを決定するステップと
を含むことを特徴とする方法。
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