JP6336898B2 - Multi-cavity wiring board, wiring board and electronic device - Google Patents

Multi-cavity wiring board, wiring board and electronic device Download PDF

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JP6336898B2
JP6336898B2 JP2014260667A JP2014260667A JP6336898B2 JP 6336898 B2 JP6336898 B2 JP 6336898B2 JP 2014260667 A JP2014260667 A JP 2014260667A JP 2014260667 A JP2014260667 A JP 2014260667A JP 6336898 B2 JP6336898 B2 JP 6336898B2
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plating
wiring
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wiring board
frame
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JP2016122695A (en
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晃一 川崎
晃一 川崎
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Kyocera Corp
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本発明は、半導体素子または発光素子等の電子部品の搭載される配線基板を製作するための多数個取り配線基板に関するものである。   The present invention relates to a multi-piece wiring board for manufacturing a wiring board on which electronic components such as a semiconductor element or a light emitting element are mounted.

従来、半導体素子または水晶振動子等の電子部品を搭載するための配線基板は、例えばセラミックス等の電気絶縁材料から成る絶縁基板と、金属材料等のメタライズから成る配線導体とを有している。   2. Description of the Related Art Conventionally, a wiring board for mounting an electronic component such as a semiconductor element or a crystal resonator has an insulating board made of an electric insulating material such as ceramics and a wiring conductor made of metallization such as a metal material.

配線基板は、近年の電子装置の小型化の要求に伴って、小型化されてきており、複数の配線基板を効率よく製作するために、多数個取り配線基板を分割することによって製作されている。   The wiring board has been downsized in response to the recent demand for downsizing of electronic devices, and is manufactured by dividing a multi-piece wiring board in order to efficiently manufacture a plurality of wiring boards. .

多数個取り配線基板は、複数の配線基板領域が縦横に配列されている母基板と、複数の配線基板領域のそれぞれに設けられた配線導体とを有している。また、多数個取り配線基板には、複数の配線基板領域の周りの周囲領域に、配線導体の露出する表面に電気めっきを被着するためのめっき用端子と枠状金属層とが設けられている場合がある(例えば、特許文献1を参照。)。   The multi-cavity wiring board has a mother board in which a plurality of wiring board regions are arranged vertically and horizontally, and a wiring conductor provided in each of the plurality of wiring board regions. In addition, the multi-cavity wiring board is provided with a terminal for plating and a frame-like metal layer for depositing electroplating on the exposed surface of the wiring conductor in a peripheral area around the plurality of wiring board areas. (For example, refer to Patent Document 1).

特開2011−243930号公報JP 2011-243930 A

しかしながら、複数の配線基板領域に設けられた配線導体の露出する表面に電気めっき法によって被着されためっき層の厚みが、複数の配線基板領域毎に大きく異なる場合がある。これは、複数の配線基板領域の中央部と外周部とにおいて、めっき用端子から配線導体の露出する表面までの電気抵抗の大きさが異なるためである。特に、めっき層の厚みを厚く被着しようとすると、めっき層の厚みの差が顕著に出やすくなるということが懸念される。   However, the thickness of the plating layer deposited by electroplating on the exposed surface of the wiring conductor provided in the plurality of wiring board regions may vary greatly for each of the plurality of wiring board regions. This is because the electrical resistance from the plating terminal to the exposed surface of the wiring conductor is different between the central portion and the outer peripheral portion of the plurality of wiring board regions. In particular, there is a concern that a difference in the thickness of the plating layer is likely to be noticeable if the plating layer is to be deposited thickly.

本発明の他の一つの態様による多数個取り配線基板は、配線導体を有する複数の配線基板領域が中央部に配置され、前記複数の配線基板領域の周囲に周囲領域が配置された母基板と、前記周囲領域であって、前記複数の配線基板領域を取り囲むように設けられた枠状金属層と、前記周囲領域の外側であって前記母基板の外縁部に設けられためっき用端子と、前記母基板の前記周囲領域に設けられ、前記めっき用端子に接続している帯状のめっき用共通部と、該めっき用共通部と前記枠状金属層とを接続する複数のめっき用導体と、前記枠状金属層と前記配線導体とを接続する複数の接続配線層とを有しており、該複数のめ
っき用導体は、それぞれが前記めっき用共通部に比べて電気抵抗が大きく、平面透視において、前記めっき用共通部と前記枠状金属層と前記めっき用導体とが重なるように配置し、前記めっき用導体が前記母基板の厚み方向に延びるように設けられている
A multi-piece wiring board according to another aspect of the present invention includes a mother board in which a plurality of wiring board regions having wiring conductors are arranged at a central portion, and a peripheral area is arranged around the plurality of wiring board regions. A frame-like metal layer provided to surround the plurality of wiring substrate regions in the surrounding region, and a plating terminal provided on an outer edge portion of the mother substrate outside the surrounding region, A strip-shaped plating common portion provided in the peripheral region of the mother substrate and connected to the plating terminal; a plurality of plating conductors connecting the plating common portion and the frame-shaped metal layer; and a plurality of connection wiring layer for connecting the wiring conductor and the frame-like metal layer, plating the conductor of said plurality of electrical resistance rather large and each compared with the plating common unit, plane In fluoroscopy, the common part for plating and the front Arranged to the frame-like metal layer and the plating conductor overlaps said plating conductor is provided to extend in the thickness direction of the mother substrate.

本発明の一つの態様による多数個取り配線基板は、配線導体を有する複数の配線基板領域が中央部に配置され、複数の配線基板領域の周囲に周囲領域が配置された母基板と、周囲領域であって、複数の配線基板領域を取り囲むように設けられた枠状金属層と、周囲領域の外側であって母基板の外縁部に設けられためっき用端子と、母基板の周囲領域に設けられ、めっき用端子に接続している帯状のめっき用共通部と、めっき用共通部と枠状金属層とを接続する複数のめっき用導体と、枠状金属層と配線導体とを接続する複数の接続配線層とを有しており、複数のめっき用導体は、それぞれがめっき用共通部に比べて電気抵抗が大きく、平面透視において、めっき用共通部と枠状金属層とめっき用導体とが重なるように配置し、めっき用導体が母基板の厚み方向に延びるように設けられている。このことによって、めっき用端子からそれぞれの配線導体までの電気抵抗の比を低減することで、めっき用端子とそれぞれの配線基板領域の配線導体に接続される接続配線層との間の電気抵抗の比を低減できるとともに、めっき用端子からめっき用導体と枠状金属層との接続領域に伝わった電流は、めっき用導体側および接続配線層側よりも周囲の枠状金属層側に広がり、配線導体に直接大きな電流が伝わることを抑制するので、電気めっき法により、めっき用端子、めっき用共通部、めっき用導体、枠状金属層、接続配線層を介して、各配線基板領域の配線導体の露出する表面に被着されるめっき層の厚みの差を低減できる。
A multi-cavity wiring board according to one aspect of the present invention includes a mother board in which a plurality of wiring board regions having wiring conductors are arranged at a central portion, and a peripheral area is arranged around the plurality of wiring board areas, and the peripheral area A frame-like metal layer provided so as to surround a plurality of wiring board regions, a plating terminal provided on an outer edge of the mother board outside the surrounding area, and provided in a surrounding area of the mother board. A strip-shaped common portion for plating connected to the plating terminal, a plurality of plating conductors for connecting the common portion for plating and the frame-shaped metal layer, and a plurality for connecting the frame-shaped metal layer and the wiring conductor. It has a connection wiring layer, a plurality of plating conductors, each rather large electric resistance as compared with the common unit for plating, in a plan perspective, plating conductor and the plating for the common part and the frame-like metal layer And the conductor for plating is It is provided so as to extend in the thickness direction of the substrate. This reduces the ratio of electrical resistance from the plating terminal to each wiring conductor, thereby reducing the electrical resistance between the plating terminal and the connection wiring layer connected to the wiring conductor in each wiring board region. In addition to reducing the ratio, the current transmitted from the plating terminal to the connection area between the plating conductor and the frame-shaped metal layer spreads to the surrounding frame-shaped metal layer side rather than the plating conductor side and the connection wiring layer side. Since a large current is prevented from being transmitted directly to the conductor, the wiring conductor in each wiring board region is passed through a plating terminal, a common part for plating, a plating conductor, a frame-like metal layer, and a connection wiring layer by electroplating. The difference in the thickness of the plating layer deposited on the exposed surface can be reduced.

(a)は本発明の第1の実施形態における多数個取り配線基板を示す上面図であり、(b)は(a)に示された多数個取り配線基板の内部上面図である。(A) is a top view which shows the multi-piece wiring board in the 1st Embodiment of this invention, (b) is an internal top view of the multi-piece wiring board shown by (a). (a)は図1(a)に示された多数個取り配線基板のA−A線における縦断面図であり、(b)は図1(a)に示された多数個取り配線基板のB−B線における縦断面図である。(A) is the longitudinal cross-sectional view in the AA line of the multi-piece wiring board shown by Fig.1 (a), (b) is B of the multi-piece wiring board shown by Fig.1 (a). It is a longitudinal cross-sectional view in the -B line. (a)は図1(a)のA部における要部拡大上面図であり、(b)は図1(b)のB部における要部拡大内部上面図である。(A) is a principal part enlarged top view in the A section of Drawing 1 (a), and (b) is a principal part expansion inside top view in the B section of Drawing 1 (b). (a)は本発明の第2の実施形態における多数個取り配線基板を示す上面図であり、(b)は(a)に示された多数個取り配線基板の内部上面図である。(A) is a top view which shows the multi-piece wiring board in the 2nd Embodiment of this invention, (b) is an internal top view of the multi-piece wiring board shown by (a). (a)は図4(a)に示された多数個取り配線基板のA−A線における縦断面図であり、(b)は図4(a)に示された多数個取り配線基板のB−B線における縦断面図である。FIG. 4A is a longitudinal sectional view taken along line AA of the multi-piece wiring board shown in FIG. 4A, and FIG. 4B is a cross-sectional view of B of the multi-piece wiring board shown in FIG. It is a longitudinal cross-sectional view in the -B line. (a)は図4(a)のA部における要部拡大上面図であり、(b)は図1(b)のB部における要部拡大内部上面図である。(A) is the principal part enlarged top view in the A section of Drawing 4 (a), and (b) is the principal part expansion inside top view in the B section of Drawing 1 (b). (a)は本発明の第3の実施形態における多数個取り配線基板を示す上面図であり、(b)は(a)に示された多数個取り配線基板の内部上面図である。(A) is a top view which shows the multi-piece wiring board in the 3rd Embodiment of this invention, (b) is an internal top view of the multi-piece wiring board shown by (a). (a)および(b)は図7(a)に示された多数個取り配線基板の内部上面図である。(A) And (b) is an internal top view of the multi-piece wiring board shown by Fig.7 (a). (a)は図7(a)に示された多数個取り配線基板のA−A線における縦断面図であり、(b)は図7(a)に示された多数個取り配線基板のB−B線における縦断面図である。FIG. 7A is a longitudinal sectional view taken along line AA of the multi-cavity wiring board shown in FIG. 7A, and FIG. 7B is a cross-sectional view of B of the multi-cavity wiring board shown in FIG. It is a longitudinal cross-sectional view in the -B line.

本発明のいくつかの例示的な実施形態について、添付の図面を参照しつつ説明する。   Several exemplary embodiments of the present invention will be described with reference to the accompanying drawings.

(第1の実施形態)
本発明の第1の実施形態における多数個取り配線基板は、図1〜図3に示された例のように、配線導体2を有する複数の配線基板領域11が中央部に配置され、複数の配線基板領域11の周囲に周囲領域12が配置された母基板1と、周囲領域12であって、複数の配線基板領域11を取り囲むように設けられた枠状金属層3と、周囲領域12の外側であって母基板1の外縁部に設けられためっき用端子5と、母基板1の周囲領域12に設けられ、めっき用端子5に接続している帯状のめっき用共通部6と、めっき用共通部6と枠状金属層3とを接続する複数のめっき用導体7と、枠状金属層3と配線導体2とを接続する複数の接続配線層4とを有している。複数のめっき用導体7は、それぞれがめっき用共通部6に比べて電気抵抗が大きい。図1〜図3に示された例において、枠状金属層3は、母基板1の内部に設けられており、めっき用共通部6は、母基板1の表面に設けられている。図1〜図3において、多数個取り配線基板は、仮想のxyz空間内に設けられており、以下便宜的に「上方向」とは仮想のz軸の正方向のことをいう。なお、以下の説明における上下の区別は便宜的なものであり、実際に多数個取り配線基板および多数個取り配線基板を分割してなる配線基板等が使用される際の上下を限定するものではない。
(First embodiment)
In the multi-cavity wiring board according to the first embodiment of the present invention, as in the example shown in FIGS. 1 to 3, a plurality of wiring board regions 11 having wiring conductors 2 are arranged in the central portion, A mother board 1 in which a peripheral region 12 is arranged around the wiring substrate region 11, a peripheral region 12, a frame-shaped metal layer 3 provided so as to surround the plurality of wiring substrate regions 11, and the peripheral region 12 A plating terminal 5 provided on the outer edge of the mother board 1 on the outer side, a strip-shaped plating common part 6 provided in the peripheral region 12 of the mother board 1 and connected to the plating terminal 5; And a plurality of plating conductors 7 for connecting the common portion 6 and the frame-shaped metal layer 3, and a plurality of connection wiring layers 4 for connecting the frame-shaped metal layer 3 and the wiring conductor 2. Each of the plurality of plating conductors 7 has a larger electric resistance than the plating common portion 6. In the example shown in FIGS. 1 to 3, the frame-shaped metal layer 3 is provided inside the mother board 1, and the plating common part 6 is provided on the surface of the mother board 1. In FIG. 1 to FIG. 3, the multi-piece wiring board is provided in a virtual xyz space, and the “upward direction” means the positive direction of the virtual z axis hereinafter for convenience. In addition, the distinction between the upper and lower sides in the following description is for convenience, and is not intended to limit the upper and lower sides when a multi-cavity wiring board and a wiring board obtained by dividing the multi-cavity wiring board are actually used. Absent.

複数の配線基板領域11の各々は、多数個取り配線基板が分割されて、例えば電子部品が搭載され封止されて、外部回路基板に実装される配線基板として利用される領域である。周囲領域12は、枠状金属層3、めっき用端子5、めっき用共通部6、めっき用導体7を配設する領域であるとともに、母基板1の製造時または搬送時に用いられる領域であり、この周囲領域12を用いて母基板1用の生成形体または母基板1の加工時または搬送時の位置決め、固定等を行なうことができる。   Each of the plurality of wiring board regions 11 is an area used as a wiring board mounted on an external circuit board by dividing a multi-piece wiring board and mounting, for example, an electronic component. The peripheral region 12 is a region where the frame-shaped metal layer 3, the plating terminal 5, the plating common portion 6, and the plating conductor 7 are disposed, and is a region used when the mother board 1 is manufactured or transported. Using this peripheral region 12, it is possible to perform positioning, fixing, etc. during processing or transfer of the generated shape for the mother substrate 1 or the mother substrate 1.

母基板1の材料は、例えばセラミックスまたは樹脂等の絶縁体である。母基板1の材料がセラミックスである場合は、材料として例えば酸化アルミニウム質焼結体(アルミナセラミックス),窒化アルミニウム質焼結体,ムライト質焼結体およびガラスセラミックス質焼結体等を用いることができる。また、母基板1の材料が樹脂である場合は、材料として例えばエポキシ樹脂,ポリイミド樹脂,アクリル樹脂,フェノール樹脂,ポリエステル樹脂、および四フッ化エチレン樹脂を始めとするフッ素系樹脂またはガラスエポキシ樹脂等を用いることができる。   The material of the mother board 1 is an insulator such as ceramics or resin. When the material of the mother substrate 1 is ceramic, for example, an aluminum oxide sintered body (alumina ceramic), an aluminum nitride sintered body, a mullite sintered body, a glass ceramic sintered body, or the like may be used. it can. Further, when the material of the mother board 1 is a resin, as the material, for example, an epoxy resin, a polyimide resin, an acrylic resin, a phenol resin, a polyester resin, a fluororesin such as a tetrafluoroethylene resin, a glass epoxy resin, or the like Can be used.

母基板1の材料が酸化アルミニウム質焼結体である場合には、まず例えばアルミナ(Al),シリカ(SiO),カルシア(CaO)およびマグネシア(MgO)等の原料粉末に適当な有機溶剤および溶媒を添加混合して泥漿物を作製する。この泥沼物を、従来周知のドクターブレード法またはカレンダーロール法等を採用してシート状に成形す
ることによってセラミックグリーンシートを作製する。次に、このセラミックグリーンシートに適当な打ち抜き加工を施すとともに、セラミックグリーンシートを複数枚積層して生成形体を形成し、この生成形体を高温(約1500〜1800℃)で焼成することによって母基板1が製作される。
When the material of the base substrate 1 is an aluminum oxide sintered body, it is suitable for a raw material powder such as alumina (Al 2 O 3 ), silica (SiO 2 ), calcia (CaO) and magnesia (MgO). An organic solvent and a solvent are added and mixed to produce a slurry. A ceramic green sheet is produced by forming this quagmire into a sheet by employing a conventionally known doctor blade method or calendar roll method. Next, the ceramic green sheet is appropriately punched, and a plurality of ceramic green sheets are laminated to form a generated shape, and the generated shape is fired at a high temperature (about 1500 to 1800 ° C.) to form a mother substrate. 1 is produced.

母基板1の材料が樹脂である場合は、例えば所定の多数個取り配線基板の形状に成形できるような金型を用いて、トランスファーモールド法またはインジェクションモールド法等によって母基板1が製作される。また、例えば、母基板1がガラスエポキシ樹脂である場合は、ガラス繊維から成る基材にエポキシ樹脂の前駆体を含浸させ、このエポキシ樹脂前駆体を所定の温度で熱硬化させることによって母基板1が製作される。   When the material of the mother board 1 is a resin, the mother board 1 is manufactured by, for example, a transfer mold method or an injection mold method using a mold that can be molded into a predetermined multi-piece wiring board shape. Further, for example, when the mother board 1 is a glass epoxy resin, a base material made of glass fiber is impregnated with an epoxy resin precursor, and the epoxy resin precursor is thermally cured at a predetermined temperature to thereby form the mother board 1. Is produced.

配線導体2は、母基板1の表面および内部に設けられている。配線導体2は、多数個取り配線基板を分割した後の配線基板に電子部品を搭載したり、搭載された電子部品と外部回路基板とを電気的に接続するためのものである。配線導体2は、母基板1の表面または内部に設けられた配線層と、母基板1の内部に設けられた金導体と、母基板1を厚み方向に貫通して上下に位置する配線層同士を電気的に接続する貫通導体とを含んでいる。   The wiring conductor 2 is provided on the surface and inside of the mother board 1. The wiring conductor 2 is for mounting an electronic component on the wiring board after dividing the multi-piece wiring board, or for electrically connecting the mounted electronic component and an external circuit board. The wiring conductor 2 includes a wiring layer provided on the surface or inside of the mother board 1, a gold conductor provided inside the mother board 1, and wiring layers positioned vertically through the mother board 1 in the thickness direction. And a through conductor that electrically connects the two.

配線導体2の材料は、母基板1の材料がセラミックスである場合、タングステン(W),モリブデン(Mo),マンガン(Mn),銀(Ag),銅(Cu)等を用いることができる。配線導体2は、例えば、母基板1の材料がセラミックスである場合には、母基板1用のセラミックグリーンシートに配線導体2用のメタライズペーストをスクリーン印刷法等の印刷手段によって塗布し、母基板1用のセラミックグリーンシートとともに焼成することによって形成される。また、貫通導体は、例えば母基板1用のセラミックグリーンシートに形成された貫通孔に貫通導体用のメタライズペーストを上記印刷手段によって充填しておき、母基板1用のセラミックグリーンシートとともに焼成することによって形成される。なお、貫通孔は、金型またはパンチングによる打ち抜き加工またはレーザー加工等の加工方法によってセラミックグリーンシートに形成される。   As the material of the wiring conductor 2, when the material of the mother substrate 1 is ceramic, tungsten (W), molybdenum (Mo), manganese (Mn), silver (Ag), copper (Cu), or the like can be used. For example, when the material of the mother board 1 is ceramic, the wiring conductor 2 is formed by applying a metallized paste for the wiring conductor 2 to a ceramic green sheet for the mother board 1 by a printing means such as a screen printing method. It is formed by firing together with the ceramic green sheet for No. 1. Further, the through conductor is, for example, filled with a metallized paste for the through conductor in the through hole formed in the ceramic green sheet for the mother substrate 1 by the printing means and fired together with the ceramic green sheet for the mother substrate 1. Formed by. The through hole is formed in the ceramic green sheet by a die or punching process using punching or a processing method such as laser processing.

母基板1の材料が樹脂である場合には、配線導体2の材料は、銅,金,アルミニウム,ニッケル,クロム,モリブデン,チタンおよびこれらの合金等の金属材料を用いることができる。配線導体2は、例えば、ガラスエポキシ樹脂から成る樹脂シート上に、所定の形状に加工した銅箔を転写し、銅箔が転写された樹脂シートを積層して接着剤で接着することによって形成する。このような場合には、配線導体2は、樹脂シート上に金属箔を転写して形成する。また、配線導体2のうち、樹脂シートを厚み方向に貫通する貫通導体は、導体ペーストの印刷またはめっき法によって樹脂シートに形成した貫通孔の内面に被着形成するか、貫通孔を充填して形成すればよい。このような貫通導体は、例えば金属箔または金属柱を樹脂成形によって母基板1と一体化させたり、母基板1にスパッタリング法,蒸着法等を用いて被着させて形成される。   When the material of the mother board 1 is a resin, a metal material such as copper, gold, aluminum, nickel, chromium, molybdenum, titanium, and alloys thereof can be used as the material of the wiring conductor 2. The wiring conductor 2 is formed, for example, by transferring a copper foil processed into a predetermined shape onto a resin sheet made of glass epoxy resin, and laminating the resin sheet to which the copper foil is transferred and bonding with an adhesive. . In such a case, the wiring conductor 2 is formed by transferring a metal foil onto a resin sheet. Further, among the wiring conductors 2, the through conductors that penetrate the resin sheet in the thickness direction are deposited on the inner surfaces of the through holes formed in the resin sheet by printing or plating a conductor paste, or filled with the through holes. What is necessary is just to form. Such a through conductor is formed by, for example, integrating a metal foil or a metal column with the mother substrate 1 by resin molding, or depositing the metal substrate 1 on the mother substrate 1 using a sputtering method, a vapor deposition method, or the like.

配線導体2は、母基板1から露出して設けられた表面には、電気めっき法によりニッケル,金等の耐蝕性に優れる金属めっき層が被着される。配線導体2が腐食することを低減できるとともに、電子部品、ボンディングワイヤまたは外部回路基板と配線導体2とを強固に接合できる。例えば、配線導体2の表面には、厚さ1〜10μm程度のニッケルめっき層と厚さ0.1〜3μm程度の金めっき層とが順次被着される。   The surface of the wiring conductor 2 exposed from the mother board 1 is coated with a metal plating layer having excellent corrosion resistance, such as nickel or gold, by electroplating. Corrosion of the wiring conductor 2 can be reduced, and the electronic component, bonding wire or external circuit board and the wiring conductor 2 can be firmly bonded. For example, a nickel plating layer having a thickness of about 1 to 10 μm and a gold plating layer having a thickness of about 0.1 to 3 μm are sequentially deposited on the surface of the wiring conductor 2.

また、電子部品として、発光素子が用いられる場合には、配線導体2の表面に1〜10μm程度の厚みの銀めっき層を被着されていてもよい。電子部品が搭載される配線導体2の表面に銀めっき層が被着されていると、多数個取り配線基板を分割して得られる配線基板に発光素子を搭載した際に、発光素子から配線導体2の方に放出された光を効率よく反射できる発光装置とすることができる。   When a light emitting element is used as the electronic component, a silver plating layer having a thickness of about 1 to 10 μm may be applied to the surface of the wiring conductor 2. When a silver plating layer is deposited on the surface of the wiring conductor 2 on which the electronic components are mounted, when the light emitting element is mounted on the wiring board obtained by dividing the multi-piece wiring board, the wiring conductor Thus, a light emitting device capable of efficiently reflecting the light emitted toward the direction 2 can be obtained.

また、電子部品が搭載される配線導体2の表面は、Cuめっき層が被着されていても良い。例えば、ニッケルめっき層と金めっき層との間またはニッケルめっき層と金めっき層の下地層に10〜80μm程度のCuめっき層を被着させることで、電子部品の発する熱を配線導体2に効率良く伝熱させるとともに、信頼性に優れた電子装置とすることができる。   Further, the surface of the wiring conductor 2 on which the electronic component is mounted may be coated with a Cu plating layer. For example, by applying a Cu plating layer of about 10 to 80 μm between the nickel plating layer and the gold plating layer or on the base layer of the nickel plating layer and the gold plating layer, the heat generated by the electronic component is efficiently applied to the wiring conductor 2. It is possible to obtain a highly reliable electronic device that can conduct heat well.

枠状金属層3、接続配線層4、めっき用端子5、めっき用共通部6、めっき用導体7は、各配線基板領域11に設けられた配線導体2の露出する表面にめっき層を被着するためのものである。枠状金属層3、接続配線層4、めっき用端子5、めっき用共通部6、めっき用導体7は、配線導体2と同様の材料を用いて同様の方法で作製することができる。   The frame-shaped metal layer 3, the connection wiring layer 4, the plating terminal 5, the plating common part 6, and the plating conductor 7 are coated with a plating layer on the exposed surface of the wiring conductor 2 provided in each wiring board region 11. Is to do. The frame-shaped metal layer 3, the connection wiring layer 4, the plating terminal 5, the plating common part 6, and the plating conductor 7 can be manufactured using the same material as that of the wiring conductor 2 by the same method.

枠状金属層3は、母基板1の周囲領域12に、複数の配線基板領域11を囲むように枠状に設けられている。接続配線層4は、配線導体2と枠状金属層3との間に設けられ、配線導体2と枠状金属層3とを電気的に接続するとともに、隣接する配線基板領域11の配線導体2間に設けられ、隣接する配線基板領域11の配線導体2同士を電気的に接続している。   The frame-shaped metal layer 3 is provided in a frame shape in the peripheral region 12 of the mother substrate 1 so as to surround the plurality of wiring substrate regions 11. The connection wiring layer 4 is provided between the wiring conductor 2 and the frame-shaped metal layer 3 to electrically connect the wiring conductor 2 and the frame-shaped metal layer 3 and to connect the wiring conductor 2 in the adjacent wiring board region 11. The wiring conductors 2 of the adjacent wiring board regions 11 are electrically connected to each other.

めっき用端子5は、周囲領域12の外側であって母基板1の外縁部に設けられている。めっき用共通部6は、母基板1の周囲領域12に、帯状に設けられており、めっき用端子5に接続されている。めっき用導体7は、枠状金属層3とめっき用共通部6との間に複数設けられ、枠状金属層3とめっき用共通部6との間を電気的に接続している。めっき用端子5にめっき用電源と電気的に接続されている治具を当接して、めっき用端子5から電流を流すことによって、配線導体2に電気めっき法によるめっき層が被着される。めっき用端子5は、図1および図2に示された例においては、母基板1の対向する2側面に設けられた切り欠き部の内面に、母基板1の厚み方向に沿って延びるように設けられている。   The plating terminal 5 is provided on the outer edge of the mother board 1 outside the surrounding area 12. The plating common portion 6 is provided in a band shape in the peripheral region 12 of the mother substrate 1 and is connected to the plating terminal 5. A plurality of plating conductors 7 are provided between the frame-shaped metal layer 3 and the plating common portion 6, and electrically connect the frame-shaped metal layer 3 and the plating common portion 6. A plating layer by electroplating is applied to the wiring conductor 2 by bringing a jig electrically connected to the plating power source into contact with the plating terminal 5 and causing a current to flow from the plating terminal 5. In the example shown in FIGS. 1 and 2, the plating terminal 5 extends along the thickness direction of the mother substrate 1 on the inner surface of the notch provided on the two opposite side surfaces of the mother substrate 1. Is provided.

これらのめっき用端子5は、母基板1の材料がセラミックスである場合、セラミックグリーンシートを金型等で打ち抜いて切り欠き部を形成した後、その切り欠き部の内面に、母基板1がセラミックスである場合に使用した、配線導体2の材料と同様の材料を用いて同様の方法で作製できる。   When the material of the mother substrate 1 is ceramic, these plating terminals 5 are formed by punching out a ceramic green sheet with a mold or the like to form a notch, and then the mother substrate 1 is formed on the inner surface of the notch. It can be produced by the same method using the same material as the material of the wiring conductor 2 used in this case.

また、めっき用端子5は、母基板1の材料が樹脂である場合には、母基板1に例えばレーザー加工等を用いて切り欠き部を形成した後、切り欠き部の内面に、母基板1が樹脂である場合に使用した、配線導体2の材料と同様の材料を用いて同様の方法で作製できる。   Further, in the case where the material of the mother board 1 is resin, the plating terminal 5 is formed on the mother board 1 on the inner surface of the notch part after forming a notch part on the mother board 1 using, for example, laser processing or the like. It can be manufactured by the same method using the same material as the material of the wiring conductor 2 used when is a resin.

めっき用端子5は、図1および図2に示された例のように、切り欠き部の内面に設けられていると、めっき用の電源に接続された治具と容易に接触できる。また、1つの治具に複数のめっき用端子5が接触することによって、集約的にめっき層を設けてもよい。   When the plating terminal 5 is provided on the inner surface of the notch portion as in the example shown in FIGS. 1 and 2, it can easily come into contact with a jig connected to the power supply for plating. Moreover, you may provide a plating layer intensively by the some terminal 5 for plating contacting one jig | tool.

めっき用導体7は、図1〜図3に示された例において、母基板1の厚み方向(z軸方向
)に設けられており、枠状金属層3とめっき用共通部6とを接続している。ここで、複数のめっき用導体7は、それぞれがめっき用共通部6よりも電気抵抗が大きくなるように、例えば、図1〜図3に示された例のように、複数のめっき用導体7のそれぞれの導体幅が、めっき用共通部6の導体幅よりも小さく形成されている。また、複数のめっき用導体7のそれぞれの電気抵抗率が、めっき用共通部6の電気抵抗率よりも大きくなるようにしておき、複数のめっき用導体7のそれぞれの電気抵抗が、めっき用共通部6の電気抵抗よりも大きくなるようにしても構わない。このようなめっき用導体7は、例えば、めっき用導体7のメタライズペーストに、ガラスまたはセラミックスの粉末を他の部位よりも含有率が多くなるように添加させておくことにより形成することができる。ここで、複数のめっき用導体7のそれぞれの電気抵抗は、配線基板領域11の列の数等によって設定され、めっき用共通部6の電気抵抗よりも10〜100倍程度大きくなるように設定されることが好まし
い。また、接続配線層4およびめっき用導体7のそれぞれの電気抵抗は、枠状金属層3の電気抵抗よりも10〜100倍程度大きくなるように設定されている。このことにより、めっ
き用端子5からめっき用共通部6を介してそれぞれの複数のめっき用導体7と枠状金属層3との接続領域までの電気抵抗の比を低減することで、めっき用端子5とそれぞれの配線基板領域11の配線導体2に接続される接続配線層4との間の電気抵抗の比を低減できるとともに、枠状金属層3は電気抵抗の大きいめっき用導体7と接続配線層4との間で接続されるため、めっき用端子5からめっき用導体7と枠状金属層3との接続領域に伝わった電流は、めっき用導体7側および接続配線層4側よりも周囲の枠状金属層3側に広がり、配線導体2に直接大きな電流が伝わることを抑制するので、電気めっき法により、めっき用端子5、めっき用共通部6、めっき用導体7、枠状金属層3、接続配線層4を介して、各配線基板領域11の配線導体2の露出する表面に被着されるめっき層の厚みの差を低減できる。なお、めっき用共通部6の電気抵抗の測定は、めっき用端子5とめっき用共通部6との接続領域と、めっき用共通部6とそれぞれのめっき用導体7との接続領域の間の電気抵抗をデジタルマルチメーター等の電気抵抗測定器を用いて測定することにより行われる。また、めっき用導体7の電気抵抗の測定は、めっき用共通部6とそれぞれのめっき用導体7の接続領域と、それぞれのめっき用導体7と枠状金属層3との接続領域の間の電気抵抗をデジタルマルチメーター等の電気抵抗測定器を用いて測定することにより行われる。枠状金属層3および接続配線層4の電気抵抗についても、上述と同様の方法を用いて、それぞれの部位の接続領域間の電気抵抗を用いて測定することにより行われる。
In the example shown in FIGS. 1 to 3, the plating conductor 7 is provided in the thickness direction (z-axis direction) of the mother board 1, and connects the frame-shaped metal layer 3 and the plating common part 6. ing. Here, the plurality of plating conductors 7 have a plurality of plating conductors 7 such as in the example shown in FIGS. Each conductor width is formed smaller than the conductor width of the plating common portion 6. In addition, the electrical resistivity of each of the plurality of plating conductors 7 is set to be larger than the electrical resistivity of the common plating part 6, and the respective electrical resistances of the plurality of plating conductors 7 are common to the plating. You may make it become larger than the electrical resistance of the part 6. FIG. Such a plating conductor 7 can be formed, for example, by adding glass or ceramic powder to the metallized paste of the plating conductor 7 so as to have a higher content than other parts. Here, the electric resistance of each of the plurality of plating conductors 7 is set according to the number of columns of the wiring board region 11 and the like, and is set to be about 10 to 100 times larger than the electric resistance of the plating common portion 6. It is preferable. The electrical resistances of the connection wiring layer 4 and the plating conductor 7 are set to be about 10 to 100 times larger than the electrical resistance of the frame-shaped metal layer 3. Accordingly, the ratio of the electrical resistance from the plating terminal 5 to the connection region between the plurality of plating conductors 7 and the frame-like metal layer 3 through the plating common portion 6 is reduced, thereby the plating terminal. 5 and the connection wiring layer 4 connected to the wiring conductor 2 of each wiring board region 11 can be reduced, and the frame-like metal layer 3 can be connected to the plating conductor 7 and the connection wiring having a large electric resistance. Since it is connected to the layer 4, the current transmitted from the plating terminal 5 to the connection region between the plating conductor 7 and the frame-like metal layer 3 is more peripheral than the plating conductor 7 side and the connection wiring layer 4 side. Since it spreads to the frame-like metal layer 3 side and prevents a large current from being directly transmitted to the wiring conductor 2, the plating terminal 5, the plating common part 6, the plating conductor 7, and the frame-like metal layer are electroplated. 3. Via each connection wiring layer 4, each wiring base Can reduce the difference in thickness of the plating layer is deposited on the exposed surface of the wiring conductor 2 of the region 11. In addition, the measurement of the electrical resistance of the plating common part 6 is performed by measuring the electric current between the connection area between the plating terminal 5 and the plating common part 6 and the connection area between the plating common part 6 and each plating conductor 7. The resistance is measured by using an electric resistance measuring instrument such as a digital multimeter. In addition, the measurement of the electrical resistance of the plating conductor 7 is performed by measuring the electric current between the plating common portion 6 and the connection region of each plating conductor 7 and the connection region between each plating conductor 7 and the frame-shaped metal layer 3. The resistance is measured by using an electric resistance measuring instrument such as a digital multimeter. The electrical resistances of the frame-shaped metal layer 3 and the connection wiring layer 4 are also measured by using the same method as described above and using the electrical resistance between the connection regions of the respective parts.

なお、枠状金属層3、接続配線層4、めっき用共通部6、めっき用導体7が母基板1の内部に設けられている場合には、X線透過装置等によりそれぞれの導体の幅および厚み等を測定し、分断して各部材の抵抗率を測定して各部材の電気抵抗を算出しても構わない。   In addition, when the frame-shaped metal layer 3, the connection wiring layer 4, the plating common part 6, and the plating conductor 7 are provided inside the mother board 1, the width of each conductor and The electrical resistance of each member may be calculated by measuring the thickness, etc., and measuring the resistivity of each member.

なお、母基板1の材料がセラミックスである場合、配線導体2、枠状金属層3、接続配線層4、めっき用共通部6の厚みは、0.01〜0.03mmが好ましい。これらの導体ペーストをスクリーン印刷法等で印刷する際に、導体ペーストを均一な厚みで印刷しやすく、これらの配線が精度よく形成される。   When the material of the mother board 1 is ceramic, the thickness of the wiring conductor 2, the frame-shaped metal layer 3, the connection wiring layer 4, and the plating common part 6 is preferably 0.01 to 0.03 mm. When these conductor pastes are printed by a screen printing method or the like, the conductor paste is easily printed with a uniform thickness, and these wirings are formed with high accuracy.

複数のめっき用導体7は、図1〜図3に示す例のように、各配線基板領域11毎の近傍にて枠状金属層3にそれぞれ接続させていると、めっき用端子5から各配線基板領域11の配線導体2に接続される接続配線層4までの電気抵抗の比を小さくすることができる。また、さらには、複数のめっき用導体7は、各配線基板領域11の配線導体2に接続される接続配線層4の近傍にて枠状金属層3にそれぞれ接続させていると好ましく、複数のめっき用導体7の数は、各列の配線基板領域11の配線導体2に接続される接続配線層4の数と同等あるいはそれ以上の数であることが好ましい。   When the plurality of plating conductors 7 are connected to the frame-like metal layer 3 in the vicinity of each wiring board region 11 as in the example shown in FIGS. The ratio of the electrical resistance to the connection wiring layer 4 connected to the wiring conductor 2 in the substrate region 11 can be reduced. Furthermore, the plurality of plating conductors 7 are preferably connected to the frame-like metal layer 3 in the vicinity of the connection wiring layer 4 connected to the wiring conductor 2 of each wiring board region 11. The number of plating conductors 7 is preferably equal to or greater than the number of connection wiring layers 4 connected to the wiring conductors 2 of the wiring board regions 11 in each row.

めっき用端子5から最も近い位置に設けられためっき用導体7とめっき用共通部6までの電気抵抗が、めっき用端子5から最も近い位置に設けられためっき用導体7と枠状金属層3との接続領域までの電気抵抗よりも小さいと、各配線基板領域11の配線導体2の露出する表面に被着されるめっき層の厚みの差を良好に低減できる。   The plating conductor 7 and the frame-shaped metal layer 3 provided in the position closest to the plating terminal 5 are electrically connected to the plating conductor 7 and the plating common part 6 provided in the position closest to the plating terminal 5. If it is smaller than the electrical resistance to the connection region, the difference in the thickness of the plating layer deposited on the exposed surface of the wiring conductor 2 in each wiring board region 11 can be reduced satisfactorily.

また、上述のような場合には、図1〜図3に示す例では、平面透視における複数のめっき用導体7の導体幅を全て同じ幅としているが、めっき用端子5から遠いめっき用導体7の導体幅を、めっき用端子5から遠いめっき用導体7の導体幅よりも大きくしておくと、めっき用端子5からめっき用共通部6を介して複数のめっき用導体7と枠状金属層3とのそれぞれの接続領域までの電気抵抗の比を小さくすることができる。また、めっき用端子5から遠くなるに従って、めっき用導体7の導体幅を漸次大きくしても構わない。   In the case described above, in the example shown in FIGS. 1 to 3, the conductor widths of the plurality of plating conductors 7 in plan view are all the same, but the plating conductors 7 far from the plating terminals 5 are used. If the width of the conductor is made larger than the conductor width of the plating conductor 7 far from the plating terminal 5, a plurality of plating conductors 7 and a frame-shaped metal layer are connected from the plating terminal 5 via the plating common portion 6. The ratio of the electrical resistance to each connection region with 3 can be reduced. Further, the conductor width of the plating conductor 7 may be gradually increased as the distance from the plating terminal 5 increases.

本実施形態の多数個取り配線基板は、配線導体2を有する複数の配線基板領域11が中央
部に配置され、複数の配線基板領域11の周囲に周囲領域12が配置された母基板1と、周囲領域12であって、複数の配線基板領域11を取り囲むように設けられた枠状金属層3と、周囲領域12の外側であって母基板1の外縁部に設けられためっき用端子5と、母基板1の周囲領域12に設けられ、めっき用端子5に接続している帯状のめっき用共通部6と、めっき用共通部6と枠状金属層3とを接続する複数のめっき用導体7と、枠状金属層3と配線導体2とを接続する複数の接続配線層4とを有しており、複数のめっき用導体7は、それぞれがめっき用共通部6に比べて電気抵抗が大きい。このことによって、めっき用端子5からめっき用共通部6を介してそれぞれの複数のめっき用導体7と枠状金属層3との接続領域までの電気抵抗の比を低減することで、めっき用端子5とそれぞれの配線基板領域11の配線導体2に接続される接続配線層4との間の電気抵抗の比を低減できるので、電気めっき法により、めっき用端子5、めっき用共通部6、めっき用導体7、枠状金属層3、接続配線層4を介して、各配線基板領域11の配線導体2の露出する表面に被着されるめっき層の厚みの差を低減できる。
The multi-cavity wiring board of this embodiment includes a mother board 1 in which a plurality of wiring board regions 11 having wiring conductors 2 are arranged in the center, and a peripheral area 12 is arranged around the plurality of wiring board areas 11; A frame-like metal layer 3 provided to surround the plurality of wiring substrate regions 11 in the surrounding region 12, and a plating terminal 5 provided on the outer edge of the mother substrate 1 outside the surrounding region 12. The strip-shaped plating common portion 6 provided in the peripheral region 12 of the mother substrate 1 and connected to the plating terminal 5, and the plurality of plating conductors connecting the plating common portion 6 and the frame-shaped metal layer 3. 7 and a plurality of connection wiring layers 4 for connecting the frame-shaped metal layer 3 and the wiring conductor 2, and each of the plurality of plating conductors 7 has an electric resistance as compared with the plating common portion 6. large. Accordingly, the ratio of the electrical resistance from the plating terminal 5 to the connection region between the plurality of plating conductors 7 and the frame-like metal layer 3 through the plating common portion 6 is reduced, thereby the plating terminal. 5 and the connection wiring layer 4 connected to the wiring conductor 2 of each wiring board region 11 can be reduced, so that the plating terminal 5, the plating common part 6, the plating can be obtained by electroplating. The difference in the thickness of the plating layer deposited on the exposed surface of the wiring conductor 2 in each wiring board region 11 can be reduced via the conductor 7, the frame-shaped metal layer 3, and the connection wiring layer 4.

また、第1の実施形態において、枠状金属層3とめっき用共通部6とを母基板1の異なる高さ位置に設け、めっき用導体7を母基板1の厚み方向に延びるように設けているので、同一平面上における枠状金属層3、めっき用共通部6、めっき用導体7の形成領域を小さく、すなわち周囲領域12を小さくでき、多数個取り配線基板内に多くの配線基板領域11を配列して形成しやすくなる。   In the first embodiment, the frame-shaped metal layer 3 and the plating common portion 6 are provided at different height positions on the mother board 1, and the plating conductor 7 is provided so as to extend in the thickness direction of the mother board 1. Therefore, the formation area of the frame-like metal layer 3, the plating common portion 6, and the plating conductor 7 on the same plane can be reduced, that is, the peripheral area 12 can be reduced, and a large number of wiring board areas 11 can be provided in the multi-piece wiring board. It becomes easy to form by arranging.

本実施形態は、電気めっき法により、配線導体2の露出する表面に厚いめっき層を被着させる場合において、好適に使用することができる。   The present embodiment can be suitably used when a thick plating layer is deposited on the exposed surface of the wiring conductor 2 by electroplating.

また、図1〜図3に示す例では、枠状金属層3を母基板1の内部に設け、めっき用共通部6を母基板1の表面に設けているが、枠状金属層3を母基板1の表面に設け、めっき用共通部6を母基板1の内部に設けていても構わない。なお、配線基板領域11の境界を跨ぐ接続配線層4が母基板1の内部に設けられていると、接続配線層4にめっき層が被着されず、個々の配線基板に分割する際に、めっき層の分断がなくなり、個々の配線基板を良好に形成しやすくなる。   In the example shown in FIGS. 1 to 3, the frame-shaped metal layer 3 is provided in the mother board 1 and the plating common part 6 is provided on the surface of the mother board 1. It may be provided on the surface of the substrate 1 and the plating common part 6 may be provided inside the mother substrate 1. In addition, when the connection wiring layer 4 straddling the boundary of the wiring board region 11 is provided inside the mother board 1, the plating layer is not deposited on the connection wiring layer 4, and when divided into individual wiring boards, The plating layer is not divided and individual wiring boards can be easily formed.

本実施形態における多数個取り配線基板は、母基板1の各配線基板領域11同士の境界と、配線基板領域11と周囲領域12との境界とに沿って分割されることによって、複数の配線基板となる。多数個取り配線基板が分割された配線基板には、電子部品が接合されて搭載される。また、多数個取り配線基板は、各配線基板領域11上に電子部品を搭載した後に、分割されてもよい。多数個取り配線基板を配線基板に分割する方法としては、多数個取り配線基板の配線基板領域11の縁に分割溝を形成しておき、この分割溝に沿って撓折して分割する方法、またはスライシング法等によって配線基板領域11の縁を切断する方法等を用いることができる。分割溝は、母基板1用の生成形体にカッター刃を押し当てたり、スライシング装置によって生成形体の厚みより小さく切込んだりすることによって形成するか、焼成後にスライシング装置によって母基板1の厚みより小さく切込むことによって形成できる。   In the present embodiment, the multi-piece wiring board is divided along the boundary between the wiring board regions 11 of the mother board 1 and the boundary between the wiring board region 11 and the surrounding region 12, thereby providing a plurality of wiring boards. It becomes. Electronic components are bonded and mounted on the wiring board obtained by dividing the multi-cavity wiring board. Further, the multi-piece wiring board may be divided after electronic components are mounted on each wiring board region 11. As a method of dividing the multi-cavity wiring board into the wiring boards, a method of dividing the multi-cavity wiring board by forming a dividing groove at the edge of the wiring board region 11 and bending along the dividing groove, Alternatively, a method of cutting the edge of the wiring board region 11 by a slicing method or the like can be used. The dividing groove is formed by pressing the cutter blade against the generated shape for the mother substrate 1 or by cutting it with a slicing device to be smaller than the thickness of the generated shape, or after firing, smaller than the thickness of the mother substrate 1 by the slicing device. It can be formed by cutting.

本実施形態の配線基板によれば、上述の多数個取り配線基板に含まれている複数の配線基板領域11が個片に分割されてなることから、個々の配線基板の配線導体2の露出する表面には、電気めっき法によりめっき層が良好に被着されているので、信頼性に優れた配線基板とすることができる。   According to the wiring board of the present embodiment, the plurality of wiring board regions 11 included in the multi-cavity wiring board described above are divided into pieces, so that the wiring conductor 2 of each wiring board is exposed. Since the plating layer is satisfactorily deposited on the surface by electroplating, a highly reliable wiring board can be obtained.

多数個取り配線基板が分割されて得られる配線基板に電子部品が搭載されることによって、電子装置となる。配線基板に搭載される電子部品は、例えば半導体素子または発光素子等である。また、半導体素子または発光素子等とともにコンデンサまたはダイオード等
の小型電子部品が搭載されていてもよい。電子部品は、金(Au)−シリコン(Si)合金から成るろう材または銀(Ag)を含むエポキシ樹脂等の導電性接合材によって配線基板の上面に接合される。電子部品の電極と配線導体2とが、例えばAuを主成分とするボンディングワイヤ等の接続部材を介して電気的に接続される。電子部品は、必要に応じて樹脂等の封止材によって封止される。
An electronic device is obtained by mounting electronic components on a wiring board obtained by dividing a multi-piece wiring board. The electronic component mounted on the wiring board is, for example, a semiconductor element or a light emitting element. In addition, a small electronic component such as a capacitor or a diode may be mounted together with a semiconductor element or a light emitting element. The electronic component is bonded to the upper surface of the wiring board by a conductive bonding material such as a brazing material made of a gold (Au) -silicon (Si) alloy or an epoxy resin containing silver (Ag). The electrode of the electronic component and the wiring conductor 2 are electrically connected via a connecting member such as a bonding wire mainly composed of Au. The electronic component is sealed with a sealing material such as a resin as necessary.

本実施形態の電子装置によれば、上述の配線基板と、配線基板に搭載された電子部品とを備えていることから、電子部品や外部回路基板との接続信頼性に優れた電子装置とすることができる。   According to the electronic device of the present embodiment, since the above-described wiring board and the electronic component mounted on the wiring board are provided, the electronic device is excellent in connection reliability with the electronic component and the external circuit board. be able to.

また、上述に示されたように、配線導体2の露出する表面に、銅等の熱伝導性に優れためっき層を厚く形成した配線基板を用いた場合には、放熱性に優れた電子装置とすることができる。   In addition, as described above, when a wiring board in which a plating layer having excellent thermal conductivity such as copper is formed thick on the exposed surface of the wiring conductor 2, an electronic device having excellent heat dissipation is used. It can be.

(第2の実施形態)
次に、本発明の第2の実施形態による多数個取り配線基板について、図4〜図6を参照しつつ説明する。
(Second Embodiment)
Next, a multi-piece wiring board according to a second embodiment of the present invention will be described with reference to FIGS.

第2の実施形態における多数個取り配線基板において、第1の実施形態の多数個取り配線基板と異なる点は、枠状金属層3が、周囲領域12であって、複数の配線基板領域11を取り囲むように設けられ、めっき用端子5に接続されている点、めっき用共通部6が、枠状金属層3と配線導体2との間で接続されている点、接続配線層4がめっき用共通部6と配線導体2とを接続している点である。図4〜図6に示された例において、枠状金属層3は、母基板1の表面に設けられており、めっき用共通部6は、母基板1の内部に設けられている。   The multi-cavity wiring board of the second embodiment differs from the multi-cavity wiring board of the first embodiment in that the frame-shaped metal layer 3 is a peripheral area 12 and a plurality of wiring board areas 11 are arranged. It is provided so as to surround and is connected to the plating terminal 5, the plating common part 6 is connected between the frame-like metal layer 3 and the wiring conductor 2, and the connection wiring layer 4 is for plating The common part 6 and the wiring conductor 2 are connected. In the example shown in FIGS. 4 to 6, the frame-shaped metal layer 3 is provided on the surface of the mother substrate 1, and the plating common part 6 is provided in the mother substrate 1.

第2の実施形態の多数個取り配線基板によれば、めっき用端子5からめっき用共通部6を介してめっき用共通部6とそれぞれの複数のめっき用導体7との接続領域までの電気抵抗の比を低減することで、めっき用端子5とそれぞれの配線基板領域11の配線導体2に接続される接続配線層4との間の電気抵抗の比を低減できるとともに、めっき用共通部6は電気抵抗の大きいめっき用導体7と接続配線層4との間で接続されるため、めっき用端子5からめっき用導体7とめっき用共通部6との接続領域に伝わった電流は、めっき用導体7側および接続配線層4側よりもめっき用共通部6側に広がり、配線導体2に直接大きな電流が伝わることを抑制するので、電気めっき法により、めっき用端子5、枠状金属層3、めっき用導体7、めっき用共通部6、接続配線層4を介して、各配線基板領域11の配線導体2の露出する表面に被着されるめっき層の厚みの差を低減できる。   According to the multi-cavity wiring board of the second embodiment, the electrical resistance from the plating terminal 5 to the connection area between the plating common part 6 and each of the plurality of plating conductors 7 through the plating common part 6 The ratio of electrical resistance between the plating terminal 5 and the connection wiring layer 4 connected to the wiring conductor 2 of each wiring board region 11 can be reduced, and the plating common portion 6 Since the connection is made between the plating conductor 7 having a high electrical resistance and the connection wiring layer 4, the current transmitted from the plating terminal 5 to the connection region between the plating conductor 7 and the plating common part 6 is the plating conductor. 7 spreads to the plating common part 6 side than the connection wiring layer 4 side and suppresses a large current from being directly transmitted to the wiring conductor 2, so that the plating terminal 5, the frame-shaped metal layer 3, Plating conductor 7, both for plating Part 6, via a connection wiring layer 4, can reduce the difference in thickness of the plating layer is deposited on the exposed surface of the wiring conductor 2 of each wiring substrate area 11.

なお、第2の実施形態において、接続配線層4およびめっき用導体7のそれぞれの電気抵抗は、めっき用共通部6の電気抵抗よりも10〜100倍程度大きくなるように設定されて
いる。めっき用導体7のそれぞれの電気抵抗は、枠状金属層3の電気抵抗よりも10〜100
倍程度大きくなるように設定されている。
In the second embodiment, the electrical resistances of the connection wiring layer 4 and the plating conductor 7 are set to be about 10 to 100 times larger than the electrical resistance of the plating common part 6. The electric resistance of each of the plating conductors 7 is 10 to 100 higher than the electric resistance of the frame-shaped metal layer 3.
It is set to be about twice as large.

また、第2の実施形態において、第1の実施形態と同様に、枠状金属層3とめっき用共通部6とを母基板1の異なる高さ位置に設け、めっき用導体7を母基板1の厚み方向に延びるように設けているので、同一平面上における枠状金属層3、めっき用共通部6、めっき用導体7の形成領域を小さく、すなわち周囲領域12を小さくでき、多数個取り配線基板内に多くの配線基板領域11を配列して形成しやすくなる。   In the second embodiment, similarly to the first embodiment, the frame-shaped metal layer 3 and the plating common portion 6 are provided at different height positions on the mother board 1, and the plating conductor 7 is provided on the mother board 1. Are provided so as to extend in the thickness direction, so that the formation area of the frame-like metal layer 3, the plating common portion 6, and the plating conductor 7 on the same plane can be reduced, that is, the peripheral area 12 can be reduced, and a large number of wiring It becomes easy to arrange and form many wiring board regions 11 in the board.

本実施形態は、第1の実施形態の多数個取り配線基板と同様に、電気めっき法により、配線導体2の露出する表面に厚いめっき層を被着させる場合において、好適に使用するこ
とができる。
This embodiment can be suitably used when a thick plating layer is deposited on the exposed surface of the wiring conductor 2 by electroplating, as with the multi-cavity wiring board of the first embodiment. .

また、図4〜図6に示す例では、枠状金属層3を母基板1の表面に設け、めっき用共通部6を母基板1の内部に設けているが、枠状金属層3を母基板1の内部に設け、めっき用共通部6を母基板1の表面に設けていても構わない。なお、図1〜図3に示す例と同様に、配線基板領域11の境界を跨ぐ接続配線層4が母基板1の内部に設けられていると、接続配線層4にめっき層が被着されず、個々の配線基板に分割する際に、めっき層の分断がなくなり、個々の配線基板を良好に形成しやすくなる。   4 to 6, the frame-shaped metal layer 3 is provided on the surface of the mother board 1 and the plating common portion 6 is provided inside the mother board 1. However, the frame-shaped metal layer 3 is provided on the mother board 1. The common part 6 for plating may be provided on the surface of the mother substrate 1 provided inside the substrate 1. Similar to the example shown in FIGS. 1 to 3, if the connection wiring layer 4 straddling the boundary of the wiring board region 11 is provided inside the mother board 1, a plating layer is deposited on the connection wiring layer 4. First, when dividing into individual wiring boards, the plating layer is not divided, and it becomes easy to form the individual wiring boards satisfactorily.

また、図4〜図6に示す例においては、平面透視にて枠状金属層3とめっき用共通部6とが重ならないように配置している。このような多数個取り配線基板は、図4〜図6に示された例のように、母基板1の平面方向に延びる領域と母基板1の厚み方向に延びる領域とを備えためっき用導体7を形成しておけば良い。平面透視にて枠状金属層3とめっき用共通部6とを重ならないように配置していると、多数個取り配線基板の周囲領域12が肉厚となり、多数個取り配線基板の周囲領域12に変形が発生しやすくなることを抑制することができる。   Moreover, in the example shown in FIGS. 4-6, it arrange | positions so that the frame-shaped metal layer 3 and the plating common part 6 may not overlap by planar perspective. Such a multi-piece wiring board includes a region extending in the plane direction of the mother substrate 1 and a region extending in the thickness direction of the mother substrate 1 as in the examples shown in FIGS. 7 may be formed. If the frame-like metal layer 3 and the plating common part 6 are arranged so as not to overlap with each other in plan view, the peripheral area 12 of the multi-cavity wiring board becomes thick, and the peripheral area 12 of the multi-cavity wiring board It is possible to suppress the occurrence of deformation easily.

なお、母基板1の平面方向に延びる領域におけるめっき用導体7の厚みは、母基板1の材料がセラミックスである場合、配線導体2、枠状金属層3、接続配線層4、めっき用共通部6と同様に、0.01〜0.03mmが好ましい。   The thickness of the plating conductor 7 in the region extending in the plane direction of the mother substrate 1 is as follows: when the material of the mother substrate 1 is ceramic, the wiring conductor 2, the frame-shaped metal layer 3, the connection wiring layer 4, and the plating common part Similarly to 6, 0.01 to 0.03 mm is preferable.

また、図4〜図6に示す例では、複数のめっき用導体7の導体長さを全て同じ長さとしているが、めっき用端子5から遠い領域におけるめっき用導体7の導体長さを、めっき用端子5から近い領域におけるめっき用導体7の導体長さよりも小さくしても構わない。また、めっき用端子5から遠い領域におけるめっき用導体7の導体幅を、めっき用端子5から近い領域におけるめっき用導体7の導体幅よりも大きくしても構わない。例えば、母基板1の平面方向に延びる領域におけるめっき用導体7の導体長さまたは導体幅を異ならせて、枠状金属層3とめっき用共通部6とを接続しても構わない。   4 to 6, the conductor lengths of the plurality of plating conductors 7 are all the same, but the conductor length of the plating conductor 7 in the region far from the plating terminal 5 is plated. You may make it smaller than the conductor length of the conductor 7 for plating in the area | region near the terminal 5 for an electric field. Further, the conductor width of the plating conductor 7 in the region far from the plating terminal 5 may be larger than the conductor width of the plating conductor 7 in the region near the plating terminal 5. For example, the frame-shaped metal layer 3 and the plating common portion 6 may be connected by varying the conductor length or conductor width of the plating conductor 7 in the region extending in the planar direction of the mother substrate 1.

また、各配線基板領域11における配線導体2の露出する表面の面積の差が大きい場合には、母基板1の上面および下面に露出する配線導体2の面積に比例するように接続配線層4の幅を変更させると、各配線基板領域11内の配線導体2間での被着されるめっき層の厚みの差を低減することができる。   Further, when the difference in the area of the exposed surface of the wiring conductor 2 in each wiring board region 11 is large, the connection wiring layer 4 is proportional to the area of the wiring conductor 2 exposed on the upper and lower surfaces of the mother board 1. When the width is changed, the difference in the thickness of the plating layer to be deposited between the wiring conductors 2 in each wiring board region 11 can be reduced.

(第3の実施形態)
次に、本発明の第3の実施形態による多数個取り配線基板について、図7〜図9を参照しつつ説明する。なお、母基板1が複数の絶縁層からなる場合において、図7(a)は多数個取り配線基板の上面図、図7(b)は母基板1の上面側から2層目となる絶縁層の上面図、図8(a)は母基板1の上面側から3層目となる絶縁層の上面図、図8(b)は母基板1の上面側から4層目となる絶縁層の上面図である。
(Third embodiment)
Next, a multi-piece wiring board according to a third embodiment of the present invention will be described with reference to FIGS. When the mother board 1 is composed of a plurality of insulating layers, FIG. 7A is a top view of a multi-piece wiring board, and FIG. 7B is an insulating layer that is the second layer from the upper surface side of the mother board 1. 8A is a top view of an insulating layer that is the third layer from the upper surface side of the mother substrate 1, and FIG. 8B is an upper surface of the insulating layer that is the fourth layer from the upper surface side of the mother substrate 1. FIG.

第3の実施形態における多数個取り配線基板において、第1の実施形態の多数個取り配線基板と異なる点は、めっき用端子5が母基板1の外縁の4辺に配置され、母基板1の上面において、めっき用共通部6が相対向する2辺に配置されためっき用端子5のそれぞれに接続され、母基板1の下面において、めっき用共通部6が相対向する他の2辺に配置されためっき用端子5のそれぞれに接続されるように設けられている点、枠状金属層3およびめっき用共通部6が母基板1の内部に設けられている点である。   The multi-cavity wiring board in the third embodiment is different from the multi-cavity wiring board in the first embodiment in that the plating terminals 5 are arranged on the four sides of the outer edge of the mother board 1. On the upper surface, the plating common part 6 is connected to each of the plating terminals 5 arranged on two opposite sides, and on the lower surface of the mother board 1, the plating common part 6 is arranged on the other two opposite sides. It is a point provided so as to be connected to each of the plated terminals 5, and a point in which the frame-shaped metal layer 3 and the plating common part 6 are provided inside the mother substrate 1.

第3の実施形態の多数個取り配線基板によれば、第1の実施形態の多数個取り配線基板と同様に、めっき用端子5からめっき用共通部6を介してそれぞれの複数のめっき用導体
7と枠状金属層3との接続領域までの電気抵抗の比を低減するとともに、枠状金属層3は電気抵抗の大きいめっき用導体7と接続配線層4との間で接続されるため、めっき用端子5からめっき用導体7と枠状金属層3との接続領域に伝わった電流は、めっき用導体7側および接続配線層4側よりも周囲の枠状金属層3側に広がり、配線導体2に直接大きな電流が伝わることを抑制することで、めっき用端子5とそれぞれの配線基板領域11の配線導体2に接続される接続配線層4との間の電気抵抗の比を低減できるので、電気めっき法により、めっき用端子5、めっき用共通部6、めっき用導体7、枠状金属層3、接続配線層4を介して、各配線基板領域11の配線導体2の露出する表面に被着されるめっき層の厚みの差を低減できる。
According to the multi-cavity wiring board of the third embodiment, each of the plurality of plating conductors from the plating terminal 5 through the plating common portion 6 is the same as the multi-cavity wiring board of the first embodiment. The ratio of electrical resistance to the connection region between the frame 7 and the frame-shaped metal layer 3 is reduced, and the frame-shaped metal layer 3 is connected between the plating conductor 7 and the connection wiring layer 4 having a large electrical resistance. The current transmitted from the plating terminal 5 to the connection region between the plating conductor 7 and the frame-shaped metal layer 3 spreads to the surrounding frame-shaped metal layer 3 side rather than the plating conductor 7 side and the connection wiring layer 4 side, and wiring By suppressing the direct transmission of a large current directly to the conductor 2, the ratio of the electrical resistance between the plating terminal 5 and the connection wiring layer 4 connected to the wiring conductor 2 of each wiring board region 11 can be reduced. Electroplating method, plating terminal 5, plating Via the common part 6, the plating conductor 7, the frame-shaped metal layer 3, and the connection wiring layer 4, the difference in the thickness of the plating layer deposited on the exposed surface of the wiring conductor 2 in each wiring board region 11 can be reduced. .

なお、めっき用共通部6およびめっき用導体7の電気抵抗の測定は、第1の実施形態と同様の方法によって行われる。   In addition, the measurement of the electrical resistance of the common part 6 for plating and the conductor 7 for plating is performed by the method similar to 1st Embodiment.

第3の実施形態の多数個取り配線基板は、4辺方向から配線導体2の露出する表面にめっき層を被着させる場合において、好適に使用することができる。   The multi-cavity wiring board of the third embodiment can be suitably used when a plating layer is deposited on the exposed surface of the wiring conductor 2 from the four sides.

また、第3の実施形態において、第2の実施形態と同様に、枠状金属層3がめっき用端子5に接続され、めっき用共通部6が、枠状金属層3と配線導体2との間で接続されていても構わない。   In the third embodiment, similarly to the second embodiment, the frame-shaped metal layer 3 is connected to the plating terminal 5, and the plating common portion 6 is formed between the frame-shaped metal layer 3 and the wiring conductor 2. You may be connected between.

また、図7〜図9に示された例のように、枠状金属層3およびめっき用共通部6が母基板1の内部に設けられていると、枠状金属層3およびめっき用共通部6にめっき層が被着されて、周囲領域12の厚みが配線基板領域11の厚みよりも大きくなることを抑制することができる。   Moreover, when the frame-shaped metal layer 3 and the plating common part 6 are provided inside the mother board 1 as in the examples shown in FIGS. 7 to 9, the frame-shaped metal layer 3 and the plating common part It is possible to suppress that the thickness of the surrounding region 12 is larger than the thickness of the wiring board region 11 by depositing a plating layer on the substrate 6.

また、第3の実施形態において、第1の実施形態と同様に、枠状金属層3とめっき用共通部6とを母基板1の異なる高さ位置に設け、めっき用導体7を母基板1の厚み方向に延びるように設けているので、同一平面上における枠状金属層3、めっき用共通部6、めっき用導体7の形成領域を小さく、すなわち周囲領域12を小さくでき、多数個取り配線基板内に多くの配線基板領域11を配列して形成しやすくなる。   In the third embodiment, similarly to the first embodiment, the frame-shaped metal layer 3 and the plating common portion 6 are provided at different height positions on the mother board 1, and the plating conductor 7 is provided on the mother board 1. Are provided so as to extend in the thickness direction, so that the formation area of the frame-like metal layer 3, the plating common portion 6, and the plating conductor 7 on the same plane can be reduced, that is, the peripheral area 12 can be reduced, and a large number of wiring It becomes easy to arrange and form many wiring board regions 11 in the board.

また、図7〜図9に示された例のように、母基板1の上面側にて電気的に接続されるめっき用端子5と母基板1の下面側にて電気的に接続されるめっき用端子5と電気的に独立させていると、それぞれの配線導体2に異なるめっき層を被着させたり、配線基板領域11から周囲領域12を切り離して、配線導体2間の電気的短絡等を確認することができる多数個取り配線基板として用いることができる。   Further, as in the examples shown in FIGS. 7 to 9, plating terminals 5 electrically connected on the upper surface side of the mother substrate 1 and plating electrically connected on the lower surface side of the mother substrate 1. If it is electrically independent from the terminal 5, a different plating layer is applied to each wiring conductor 2, or the surrounding area 12 is separated from the wiring board region 11, and an electrical short circuit between the wiring conductors 2 is performed. It can be used as a multi-piece wiring board that can be confirmed.

本発明は、上述の実施の形態の例に限定されるものではなく、種々の変更は可能である。例えば、複数の配線基板領域11同士の境界に、多数個取り配線基板を分割した際に溝となるような穴が形成されており、穴の内面に導体が形成されていてもよい。このような多数個取り配線基板が分割されることによって、いわゆるキャスタレーション導体を有する配線基板を作製できる。   The present invention is not limited to the above-described embodiments, and various modifications can be made. For example, a hole may be formed at a boundary between the plurality of wiring board regions 11 so as to become a groove when the multi-piece wiring board is divided, and a conductor may be formed on the inner surface of the hole. By dividing such a multi-piece wiring board, a wiring board having a so-called castellation conductor can be produced.

また、図1〜図9に示す例では、枠状金属層3およびめっき用共通部6の少なくともいずれか一方が母基板1の内部に設けられているが、枠状金属層3およびめっき用共通部6が母基板1の表面にそれぞれ設けられていても構わない。なお、枠状金属層3およびめっき用共通部6のうち、少なくともめっき用端子5に近い方を母基板1の内部に設けておくことにより、本発明の効果を大きくすることができるので好ましい。なお、第1の実施形態または第2の実施形態において、枠状金属層3およびめっき用共通部6が、母基板1の内部にそれぞれ設けられていても構わない。   In the example shown in FIGS. 1 to 9, at least one of the frame-shaped metal layer 3 and the plating common part 6 is provided inside the mother substrate 1. The parts 6 may be provided on the surface of the mother board 1, respectively. Of the frame-shaped metal layer 3 and the plating common portion 6, it is preferable to provide at least the side closer to the plating terminal 5 inside the mother substrate 1 because the effect of the present invention can be increased. In the first embodiment or the second embodiment, the frame-shaped metal layer 3 and the plating common part 6 may be provided inside the mother board 1, respectively.

また、めっき用端子5は、図1〜図9に示す例では、母基板1の外縁に設けられた切欠き部の内面に形成しているが、母基板1の周囲領域12の外縁に、母基板1の厚み方向に貫通孔を形成し、めっき用端子5をこの貫通孔の内面に厚み方向に沿って延びるように形成していても構わない。   Moreover, although the terminal 5 for plating is formed in the inner surface of the notch part provided in the outer edge of the mother board 1 in the example shown in FIGS. 1-9, in the outer edge of the surrounding area | region 12 of the mother board 1, A through hole may be formed in the thickness direction of the mother substrate 1, and the plating terminal 5 may be formed on the inner surface of the through hole so as to extend along the thickness direction.

また、図1〜図9に示す例では、配線導体2は、各配線基板領域11に2つずつ設けているが、3つ以上の配線導体2を設けた配線基板領域11を複数配列させた多数個取り配線基板であっても構わない。   1 to 9, two wiring conductors 2 are provided in each wiring board region 11, but a plurality of wiring board regions 11 provided with three or more wiring conductors 2 are arranged. A multi-piece wiring board may be used.

また、配線基板領域11は、母基板1の上面または下面に例えば電子部品を収納するためのキャビティを備えていてもよいし、隣接する配線基板領域11間にダミー領域を有する多数個取り配線基板であっても構わない。   Further, the wiring board region 11 may be provided with a cavity for storing, for example, an electronic component on the upper surface or the lower surface of the mother board 1, and a multi-piece wiring board having a dummy region between adjacent wiring board regions 11. It does not matter.

また、本発明は、各配線基板領域11に、配線導体2以外の金属導体層、例えば、電子部品搭載用金属導体層や外部回路基板接合用金属導体層を備えた多数個取り配線基板においても同様に用いることができる。   The present invention also relates to a multi-piece wiring board in which each wiring board region 11 is provided with a metal conductor layer other than the wiring conductor 2, for example, a metal conductor layer for mounting an electronic component or a metal conductor layer for joining an external circuit board. It can be used similarly.

また、図1〜図9に示す例では、枠状金属層3、接続配線層4、めっき用共通部6、めっき用導体7は、母基板1の上面または下面に設けているが、母基板1が複数の絶縁層からなる場合は、枠状金属層3、接続配線層4、めっき用共通部6、めっき用導体7は、絶縁層間に配置していても構わない。母基板1の表面に設けられている場合と比較して、母基板1の反りや多数個取り配線基板を分割する際に接続配線層4が伸びることによって生じる配線導体2同士の短絡を低減できる。   Moreover, in the example shown in FIGS. 1-9, although the frame-shaped metal layer 3, the connection wiring layer 4, the common part 6 for plating, and the conductor 7 for plating are provided in the upper surface or lower surface of the mother board 1, When 1 consists of a plurality of insulating layers, the frame-shaped metal layer 3, the connection wiring layer 4, the plating common portion 6, and the plating conductor 7 may be disposed between the insulating layers. Compared with the case where it is provided on the surface of the mother board 1, it is possible to reduce warpage of the mother board 1 and short circuit between the wiring conductors 2 caused by the extension of the connection wiring layer 4 when dividing the multi-piece wiring board. .

また、第1の実施形態〜第3の実施形態を組み合わせた多数個取り配線基板であっても構わない。   Further, a multi-piece wiring board obtained by combining the first embodiment to the third embodiment may be used.

1・・・母基板
11・・・配線基板領域
12・・・周囲領域
2・・・配線導体
3・・・枠状金属層
4・・・接続配線層
5・・・めっき用端子
6・・・めっき用共通部
7・・・めっき用導体
1 ... Mother board
11 ... Wiring board area
12 ... Surrounding area 2 ... Wiring conductor 3 ... Frame-shaped metal layer 4 ... Connection wiring layer 5 ... Terminal for plating 6 ... Common part for plating 7 ... Conductor for plating

Claims (3)

配線導体を有する複数の配線基板領域が中央部に配置され、前記複数の配線基板領域の周囲に周囲領域が配置された母基板と、
前記周囲領域であって、前記複数の配線基板領域を取り囲むように設けられた枠状金属層と、
前記周囲領域の外側であって前記母基板の外縁部に設けられためっき用端子と、
前記母基板の前記周囲領域に設けられ、前記めっき用端子に接続している帯状のめっき用共通部と、
該めっき用共通部と前記枠状金属層とを接続する複数のめっき用導体と、
前記枠状金属層と前記配線導体とを接続する複数の接続配線層とを有しており、
該複数のめっき用導体は、それぞれが前記めっき用共通部に比べて電気抵抗が大きく、
平面透視において、前記めっき用共通部と前記枠状金属層と前記めっき用導体とが重なるように配置し、前記めっき用導体が前記母基板の厚み方向に延びるように設けられていることを特徴とする多数個取り配線基板。
A plurality of wiring board regions having wiring conductors are arranged in the center, and a mother board in which a peripheral region is arranged around the plurality of wiring board regions;
A frame-like metal layer provided in the surrounding region so as to surround the plurality of wiring board regions;
A terminal for plating provided on the outer edge of the mother board outside the peripheral region;
A strip-shaped common part for plating provided in the peripheral region of the mother board and connected to the terminal for plating;
A plurality of plating conductors connecting the common portion for plating and the frame-shaped metal layer;
A plurality of connection wiring layers connecting the frame-shaped metal layer and the wiring conductor;
Plating conductor The plurality of each electric resistance than said plating common unit rather large,
The planar common portion, the frame-like metal layer, and the plating conductor are disposed so as to overlap each other, and the plating conductor is provided so as to extend in the thickness direction of the mother board. Multi-cavity wiring board.
請求項1に記載の多数個取り配線基板に含まれている前記複数の配線基板領域が個片に分割されてなることを特徴とする配線基板。 The wiring board according to claim 1, wherein the plurality of wiring board regions included in the multi-cavity wiring board according to claim 1 are divided into pieces. 請求項に記載された配線基板と、
該配線基板に搭載された電子部品とを備えていることを特徴とする電子装置。
A wiring board according to claim 2 ;
An electronic device comprising: an electronic component mounted on the wiring board.
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