JP6329253B2 - コンデンサフィルム、その製造方法およびそれで製造された物品 - Google Patents
コンデンサフィルム、その製造方法およびそれで製造された物品 Download PDFInfo
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- JP6329253B2 JP6329253B2 JP2016517045A JP2016517045A JP6329253B2 JP 6329253 B2 JP6329253 B2 JP 6329253B2 JP 2016517045 A JP2016517045 A JP 2016517045A JP 2016517045 A JP2016517045 A JP 2016517045A JP 6329253 B2 JP6329253 B2 JP 6329253B2
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- polyetherimide
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- 239000003990 capacitor Substances 0.000 title claims description 39
- 238000004519 manufacturing process Methods 0.000 title description 23
- 229920001601 polyetherimide Polymers 0.000 claims description 192
- 239000004697 Polyetherimide Substances 0.000 claims description 185
- 239000000203 mixture Substances 0.000 claims description 78
- 125000003118 aryl group Chemical group 0.000 claims description 48
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 claims description 39
- 238000001125 extrusion Methods 0.000 claims description 31
- 229920000642 polymer Polymers 0.000 claims description 30
- 229910052751 metal Inorganic materials 0.000 claims description 29
- 239000002184 metal Substances 0.000 claims description 29
- 230000015556 catabolic process Effects 0.000 claims description 28
- 238000012360 testing method Methods 0.000 claims description 25
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 claims description 23
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 claims description 16
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 claims description 16
- 229940018564 m-phenylenediamine Drugs 0.000 claims description 16
- 150000004985 diamines Chemical class 0.000 claims description 15
- 229920001296 polysiloxane Polymers 0.000 claims description 15
- 230000009477 glass transition Effects 0.000 claims description 12
- 238000006116 polymerization reaction Methods 0.000 claims description 12
- 229920000728 polyester Polymers 0.000 claims description 11
- 229920000515 polycarbonate Polymers 0.000 claims description 8
- 239000004417 polycarbonate Substances 0.000 claims description 8
- 230000003746 surface roughness Effects 0.000 claims description 7
- 239000004793 Polystyrene Substances 0.000 claims description 6
- 238000005227 gel permeation chromatography Methods 0.000 claims description 6
- 230000003287 optical effect Effects 0.000 claims description 6
- 229920002223 polystyrene Polymers 0.000 claims description 6
- 229920006162 poly(etherimide sulfone) Polymers 0.000 claims description 5
- 239000003795 chemical substances by application Substances 0.000 claims description 4
- 238000000691 measurement method Methods 0.000 claims description 4
- 150000007933 aliphatic carboxylic acids Chemical class 0.000 claims description 3
- 150000001412 amines Chemical class 0.000 claims description 3
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 claims description 3
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims description 3
- 125000002993 cycloalkylene group Chemical group 0.000 claims description 3
- 125000006681 (C2-C10) alkylene group Chemical group 0.000 claims description 2
- 239000010408 film Substances 0.000 description 327
- 239000000463 material Substances 0.000 description 47
- -1 poly (propylene) Polymers 0.000 description 46
- 238000000034 method Methods 0.000 description 38
- 230000007547 defect Effects 0.000 description 29
- 150000001875 compounds Chemical class 0.000 description 26
- 239000011104 metalized film Substances 0.000 description 25
- 239000002904 solvent Substances 0.000 description 14
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 11
- 230000008569 process Effects 0.000 description 11
- 239000000945 filler Substances 0.000 description 10
- 230000037303 wrinkles Effects 0.000 description 10
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 9
- 229910052782 aluminium Inorganic materials 0.000 description 9
- 239000000356 contaminant Substances 0.000 description 9
- 229910052731 fluorine Inorganic materials 0.000 description 9
- 239000011737 fluorine Substances 0.000 description 9
- 238000002156 mixing Methods 0.000 description 9
- 238000010998 test method Methods 0.000 description 9
- 238000004804 winding Methods 0.000 description 9
- 239000000654 additive Substances 0.000 description 8
- 229910052698 phosphorus Inorganic materials 0.000 description 8
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical group [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 7
- 229910052736 halogen Inorganic materials 0.000 description 7
- 239000011574 phosphorus Chemical group 0.000 description 7
- 229920006254 polymer film Polymers 0.000 description 7
- 239000003381 stabilizer Substances 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- 229910001369 Brass Inorganic materials 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- 125000000217 alkyl group Chemical group 0.000 description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 6
- 239000010951 brass Substances 0.000 description 6
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 6
- 150000002367 halogens Chemical class 0.000 description 6
- 239000000155 melt Substances 0.000 description 6
- 230000008018 melting Effects 0.000 description 6
- 238000002844 melting Methods 0.000 description 6
- 125000001424 substituent group Chemical group 0.000 description 6
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 5
- 150000008064 anhydrides Chemical class 0.000 description 5
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 5
- 229910052737 gold Inorganic materials 0.000 description 5
- 239000010931 gold Substances 0.000 description 5
- 125000005843 halogen group Chemical group 0.000 description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 5
- 239000003921 oil Substances 0.000 description 5
- AQSJGOWTSHOLKH-UHFFFAOYSA-N phosphite(3-) Chemical class [O-]P([O-])[O-] AQSJGOWTSHOLKH-UHFFFAOYSA-N 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- 239000010409 thin film Substances 0.000 description 5
- XUQNLOIVFHUMTR-UHFFFAOYSA-N 2-[[2-hydroxy-5-nonyl-3-(1-phenylethyl)phenyl]methyl]-4-nonyl-6-(1-phenylethyl)phenol Chemical compound OC=1C(C(C)C=2C=CC=CC=2)=CC(CCCCCCCCC)=CC=1CC(C=1O)=CC(CCCCCCCCC)=CC=1C(C)C1=CC=CC=C1 XUQNLOIVFHUMTR-UHFFFAOYSA-N 0.000 description 4
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 4
- 125000003277 amino group Chemical group 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 229910052804 chromium Inorganic materials 0.000 description 4
- 239000011651 chromium Substances 0.000 description 4
- 238000000113 differential scanning calorimetry Methods 0.000 description 4
- KZTYYGOKRVBIMI-UHFFFAOYSA-N diphenyl sulfone Chemical compound C=1C=CC=CC=1S(=O)(=O)C1=CC=CC=C1 KZTYYGOKRVBIMI-UHFFFAOYSA-N 0.000 description 4
- 125000005842 heteroatom Chemical group 0.000 description 4
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 4
- 238000001465 metallisation Methods 0.000 description 4
- 229910052759 nickel Inorganic materials 0.000 description 4
- 238000000847 optical profilometry Methods 0.000 description 4
- 230000000704 physical effect Effects 0.000 description 4
- 238000000807 solvent casting Methods 0.000 description 4
- 230000003068 static effect Effects 0.000 description 4
- 239000010936 titanium Substances 0.000 description 4
- 229910052719 titanium Inorganic materials 0.000 description 4
- 229910052725 zinc Inorganic materials 0.000 description 4
- 239000011701 zinc Substances 0.000 description 4
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 3
- CZODRQXDLWOZTE-UHFFFAOYSA-N C1(=C(C=CC=C1)N)N.C1(C=2C(C(=O)O1)=CC=CC2)=O Chemical compound C1(=C(C=CC=C1)N)N.C1(C=2C(C(=O)O1)=CC=CC2)=O CZODRQXDLWOZTE-UHFFFAOYSA-N 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 230000002411 adverse Effects 0.000 description 3
- 125000001931 aliphatic group Chemical group 0.000 description 3
- 239000003963 antioxidant agent Substances 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 3
- 229910052794 bromium Inorganic materials 0.000 description 3
- 229910052791 calcium Inorganic materials 0.000 description 3
- 125000004432 carbon atom Chemical group C* 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 238000004132 cross linking Methods 0.000 description 3
- 239000003989 dielectric material Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- 239000000499 gel Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- 239000012633 leachable Substances 0.000 description 3
- 229910052749 magnesium Inorganic materials 0.000 description 3
- 239000011777 magnesium Substances 0.000 description 3
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- XRBCRPZXSCBRTK-UHFFFAOYSA-N phosphonous acid Chemical class OPO XRBCRPZXSCBRTK-UHFFFAOYSA-N 0.000 description 3
- 229910052700 potassium Inorganic materials 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 229910052708 sodium Inorganic materials 0.000 description 3
- 239000011734 sodium Substances 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- 230000000007 visual effect Effects 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 125000004400 (C1-C12) alkyl group Chemical group 0.000 description 2
- RFFLAFLAYFXFSW-UHFFFAOYSA-N 1,2-dichlorobenzene Chemical compound ClC1=CC=CC=C1Cl RFFLAFLAYFXFSW-UHFFFAOYSA-N 0.000 description 2
- KGRVJHAUYBGFFP-UHFFFAOYSA-N 2,2'-Methylenebis(4-methyl-6-tert-butylphenol) Chemical compound CC(C)(C)C1=CC(C)=CC(CC=2C(=C(C=C(C)C=2)C(C)(C)C)O)=C1O KGRVJHAUYBGFFP-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical group N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- NOWKCMXCCJGMRR-UHFFFAOYSA-N Aziridine Chemical compound C1CN1 NOWKCMXCCJGMRR-UHFFFAOYSA-N 0.000 description 2
- 0 Cc1ccc(*c2ccc(C)cc2)cc1 Chemical compound Cc1ccc(*c2ccc(C)cc2)cc1 0.000 description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical compound OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 150000001340 alkali metals Chemical class 0.000 description 2
- 125000003342 alkenyl group Chemical group 0.000 description 2
- 125000005011 alkyl ether group Chemical group 0.000 description 2
- 125000002947 alkylene group Chemical group 0.000 description 2
- 125000003368 amide group Chemical group 0.000 description 2
- 150000001448 anilines Chemical class 0.000 description 2
- 125000002490 anilino group Chemical group [H]N(*)C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 2
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 2
- 150000004984 aromatic diamines Chemical class 0.000 description 2
- 125000005013 aryl ether group Chemical group 0.000 description 2
- 235000010290 biphenyl Nutrition 0.000 description 2
- 125000006267 biphenyl group Chemical group 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 125000004122 cyclic group Chemical group 0.000 description 2
- 125000000392 cycloalkenyl group Chemical group 0.000 description 2
- ZJIPHXXDPROMEF-UHFFFAOYSA-N dihydroxyphosphanyl dihydrogen phosphite Chemical compound OP(O)OP(O)O ZJIPHXXDPROMEF-UHFFFAOYSA-N 0.000 description 2
- LTYMSROWYAPPGB-UHFFFAOYSA-N diphenyl sulfide Chemical compound C=1C=CC=CC=1SC1=CC=CC=C1 LTYMSROWYAPPGB-UHFFFAOYSA-N 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 238000005566 electron beam evaporation Methods 0.000 description 2
- 125000004185 ester group Chemical group 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 239000003063 flame retardant Substances 0.000 description 2
- 125000001153 fluoro group Chemical group F* 0.000 description 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 2
- 150000002430 hydrocarbons Chemical group 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 125000003392 indanyl group Chemical group C1(CCC2=CC=CC=C12)* 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- 230000000670 limiting effect Effects 0.000 description 2
- 239000000395 magnesium oxide Substances 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 239000006082 mold release agent Substances 0.000 description 2
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000001624 naphthyl group Chemical group 0.000 description 2
- 229910052758 niobium Inorganic materials 0.000 description 2
- 239000010955 niobium Substances 0.000 description 2
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 2
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 2
- 125000000962 organic group Chemical group 0.000 description 2
- 150000002903 organophosphorus compounds Chemical class 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000008188 pellet Substances 0.000 description 2
- 150000002989 phenols Chemical class 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920002959 polymer blend Polymers 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 239000001294 propane Substances 0.000 description 2
- 239000000376 reactant Substances 0.000 description 2
- 238000006722 reduction reaction Methods 0.000 description 2
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Chemical group 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 238000007619 statistical method Methods 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 125000001174 sulfone group Chemical group 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- XFNJVJPLKCPIBV-UHFFFAOYSA-N trimethylenediamine Chemical compound NCCCN XFNJVJPLKCPIBV-UHFFFAOYSA-N 0.000 description 2
- HVLLSGMXQDNUAL-UHFFFAOYSA-N triphenyl phosphite Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)OC1=CC=CC=C1 HVLLSGMXQDNUAL-UHFFFAOYSA-N 0.000 description 2
- QVWDCTQRORVHHT-UHFFFAOYSA-N tropone Chemical compound O=C1C=CC=CC=C1 QVWDCTQRORVHHT-UHFFFAOYSA-N 0.000 description 2
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 description 1
- 125000004739 (C1-C6) alkylsulfonyl group Chemical group 0.000 description 1
- 125000006652 (C3-C12) cycloalkyl group Chemical group 0.000 description 1
- 125000006654 (C3-C12) heteroaryl group Chemical group 0.000 description 1
- RELMFMZEBKVZJC-UHFFFAOYSA-N 1,2,3-trichlorobenzene Chemical compound ClC1=CC=CC(Cl)=C1Cl RELMFMZEBKVZJC-UHFFFAOYSA-N 0.000 description 1
- GEYOCULIXLDCMW-UHFFFAOYSA-N 1,2-phenylenediamine Chemical compound NC1=CC=CC=C1N GEYOCULIXLDCMW-UHFFFAOYSA-N 0.000 description 1
- 125000001989 1,3-phenylene group Chemical group [H]C1=C([H])C([*:1])=C([H])C([*:2])=C1[H] 0.000 description 1
- 125000001140 1,4-phenylene group Chemical group [H]C1=C([H])C([*:2])=C([H])C([H])=C1[*:1] 0.000 description 1
- PWGJDPKCLMLPJW-UHFFFAOYSA-N 1,8-diaminooctane Chemical compound NCCCCCCCCN PWGJDPKCLMLPJW-UHFFFAOYSA-N 0.000 description 1
- RUFPHBVGCFYCNW-UHFFFAOYSA-N 1-naphthylamine Chemical compound C1=CC=C2C(N)=CC=CC2=C1 RUFPHBVGCFYCNW-UHFFFAOYSA-N 0.000 description 1
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 1
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 1
- GXURZKWLMYOCDX-UHFFFAOYSA-N 2,2-bis(hydroxymethyl)propane-1,3-diol;dihydroxyphosphanyl dihydrogen phosphite Chemical compound OP(O)OP(O)O.OCC(CO)(CO)CO GXURZKWLMYOCDX-UHFFFAOYSA-N 0.000 description 1
- UUAIOYWXCDLHKT-UHFFFAOYSA-N 2,4,6-tricyclohexylphenol Chemical compound OC1=C(C2CCCCC2)C=C(C2CCCCC2)C=C1C1CCCCC1 UUAIOYWXCDLHKT-UHFFFAOYSA-N 0.000 description 1
- VOZKAJLKRJDJLL-UHFFFAOYSA-N 2,4-diaminotoluene Chemical compound CC1=CC=C(N)C=C1N VOZKAJLKRJDJLL-UHFFFAOYSA-N 0.000 description 1
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- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
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- Compositions Of Macromolecular Compounds (AREA)
Description
(実施例1〜4)
(実施例1)
目的:この実施例の目的は、一軸延伸高収率押出ポリエーテルイミドフィルムの製造において、芳香族二無水物と、m−フェニレンジアミンから選択されたジアミンと、の重合から誘導された単位を含み、第1級モノアミン(アニリン)で末端キャップ化された押出ポリエーテルイミドであるポリエーテルイミド(PEI1)の収率を評価することであった。
目的:この実施例の目的は、一軸延伸高収率押出ポリエーテルイミドフィルムの製造において、芳香族二無水物と、m−フェニレンジアミンから選択されたジアミンと、の重合から誘導された単位を含み、置換芳香族第1級モノアミン(アニリン)で末端キャップ化されていない押出ポリエーテルイミドであるポリエーテルイミド(PEI2)の収率を評価することであった。
目的:この実施例の目的は、一軸延伸高収率押出ポリエーテルイミドフィルムの製造において、芳香族二無水物と、p−フェニレンジアミンから選択されたジアミンと、の重合から誘導された単位を含み、置換芳香族第1級モノアミン(アニリン)で末端キャップ化されていない押出ポリエーテルイミドであるポリエーテルイミド(PEI4)の収率を評価することであった。
目的:この実施例の目的は、一軸延伸高収率押出ポリエーテルイミドフィルムの製造において、芳香族二無水物と、p−フェニレンジアミンから選択されたジアミンと、の重合から誘導された単位を含み、置換芳香族第1級モノアミン(アニリン)で末端キャップ化された押出ポリエーテルイミドであるポリエーテルイミド(PEI3)の生成を評価することであった。
以下の材料を使用して、試験用のポリエーテルイミドフィルムを製造した。
以下の段落では、これらの実施例で使用する材料の特性決定方法について説明する。5.25オンスのバレルを備えた180トン射出成形機を用いて、薄膜に変換前の比較用として、引張試験用および熱変形温度(HDT)試験用のASTMサンプルを成形した。材料は、150℃の除湿乾燥器内で8時間乾燥させて水分量を0.02質量%未満とした後、溶融温度380℃で成形した。オイルサーモレータを用いて、型表面温度を150℃に制御した。スクリュー回転数は、スクリュー復帰後のスクリュー減圧なしに、背圧0.3MPaで60〜80rpmであった。典型的なサイクルタイムは32〜35秒であり、成形するASTM試験片に応じて変えた。引張特性は、ASTM D638標準試験方法に準拠し、I形試験片、速度0.2インチ/minで評価し、熱変形温度は、ASTM D648に準拠し、264psi(1.8MPa)、0.250インチ(6.4mm)アニーリングなしの試験サンプルで評価した。また、各材料のペレットを用いて、ASTM D1238に準拠し、337℃および6.6kgfでのメルトフローレートのレオロジー特性を測定し、さらに、キャピラリーレオメータを用いて、340℃におけるせん断粘度を測定した。ガラス転移温度(Tg)は、300℃までの加熱速度を20℃/minとした示差走査熱量法(DSC)で測定し、2回目のスキャンの結果を報告する。決定した特性を表2に示す。
以下の材料で試験用のフィルムを製造した。示したフィルム実施例は、表1にリストアップした材料で製造され、定容積流れとして16RPMで作動するMaag融液ポンプを装備した、定圧モードで制御されるDr.Collin 30mm単軸押出機を用いて調製されたものである。材料を加工前に除湿乾燥機内で6〜8時間乾燥させて、水分量を0.02質量%未満とした。溶融温度は、材料の種類と押し出されるフィルム厚に応じて350〜365℃とした。ダイリップギャップ設定を300μmとした450mm幅のCloeren Epoch Vダイを通して、材料を押し出した。連続ライン速度14m/秒でその後の融液カーテンを引き降ろすことにより、10μmの押出フィルムを研磨キャスティングロール上に形成し、フィルム試験用のコアに巻き付けた。
表4に示したフィルム試験結果は、前述の手順によって押し出しされたフィルムに対して、以下の試験方法と手順を用いて評価したものである。各材料の押出し薄膜の絶縁破壊強度を、ASTM D−149試験方法に準じ、Galden HT(登録商標)オイル中で測定した。ホットプレート/抵抗コイルを用いて、該オイルの温度を試験温度とした。電極は、3インチの黄銅板底部電極上の1/4インチステンレスボールで構成されている。Trek30/20±30kV DC高圧電源を用いて、黄銅板の電圧を500V/sにて上昇させて材料を電気的に短絡させ、絶縁破壊が生じた時の電圧をLabviewコンピュータソフトウェアで記録した。絶縁破壊強度を20℃、50℃、100℃および150℃で測定した。各温度での20サンプルの結果からワイブル統計分析による平均値を報告値とした。
上記の方法を用いて、表3と4に示す結果が得られた。図1は、実施例1と2での欠陥の結果を示す。
表3の実施例1の我々の結果は、第1級モノアミンで末端キャップ化されたポリエーテルイミド(PEI1)で作られた押出ポリエーテルイミドフィルムは、第1級モノアミンで末端キャップ化されていないポリエーテルイミド(PEI2)で作られたフィルムより高性能であることを示している。我々の結果は、さらに、高収率押出ポリエーテルイミドフィルムは、押出前で、ポリエーテルイミドを少なくとも90質量%含むことも示している。
実施例2の我々の結果は、第1級モノアミンで末端キャップ化されていないポリエーテルイミドで作られた押出ポリエーテルイミドフィルムは、末端キャップ化されたポリエーテルイミド(PEI1)で作られたフィルムより性能が著しく低下することを示している。大きな欠陥の数は、末端キャップとしてアニリンを含む材料より著しく多かった。欠陥数は、欠陥がダイリップ表面上に集まり最終的に通過ウェブ上に落ちるにつれて材料が炭化・燃焼し、その後フィルム内での欠陥となるため、時間と共に増加する。これによって、潜在的には長い生産運転が数時間に制限される。なぜなら、この問題によって、収率が再構築される前に機械表面の清浄化が必要となるためである。加工性と従って収率は、時間経過と共に低下する。なぜなら、欠陥数が多くなりすぎていかなる用途にも有用でなくなるためである。また、光学的スキャナでカウントされ、必ずしも視覚的欠陥とはならないダイラインや介在物、染みなどの視覚的欠陥が肉眼で容易に見分けられるようになるため、形態および機能上許容できないものとなって収率ロスに繋がる。アニリン末端キャップを含まない材料の欠陥数は、時間に対して増加し、全体的な機械利用と生産収率は低下する。
実施例1の我々の結果は、芳香族第1級モノアミンで末端キャップ化されたポリエーテルイミド(PEI1)で作られた押出ポリエーテルイミドフィルムは、第1級モノアミンで末端キャップ化されていないポリエーテルイミド(PEI2)で作られたフィルムより高性能であることを示している。アニリン末端キャップとp−フェニレンジアミンを用いた材料(PEI4)は、ポリエーテルイミド材料に典型的な機械的特性および電気的特性を有しており、化学構造が類似しているため、該材料の予期される結果は同様である。それらは、材料の種類が同じであり、加工時には、同じ加工方法、温度および圧力が用いられる。さらに、我々の結果は、高収率押出ポリエーテルイミドフィルムは、押出前で、ポリエーテルイミドを少なくとも90質量%含んでおり、この材料を使用すれば同様の結果が得られるであろうことを示している。
実施例2の我々の結果は、芳香族第1級モノアミンで末端キャップ化されていないポリエーテルイミド(PEI2)で作られた押出ポリエーテルイミドフィルムの性能は、末端キャップ化されたポリエーテルイミド(PEI1)で作られたフィルムより著しく劣っていることを示している。p−フェニレンジアミンを用い、モノアミン末端キャップを含まないポリエーテルイミドでの我々の結果では、収率が悪く、生産運転も短いであろう。材料は劣化し、フィルム内の欠陥レベルも著しく高くなって、生産収率が低下する。該材料は、同じポリエーテルイミド材料種に属することから予期されるように、m−フェニレンジアミンを用いたポリエーテルイミド(PEI2)の化学構造および特性に類似している。さらに、我々の結果は、m−フェニレンジアミンを用い、芳香族第1級モノアミン末端キャップを含まないポリエーテルイミドと同様の方法で該材料を使用すると、フィルムの収率が90%未満となることを示している。
材料特性
(フィルム調製方法)
以下の材料で試験用のフィルムを製造した。示したフィルム実施例は、表1にリストアップした材料で製造され、定容積流れとして16RPMで作動するMaag融液ポンプを装備した、定圧モードで制御されるDr. Collin 30mm単軸押出機を用いて調製されたものである。材料を加工前に除湿乾燥機内で6〜8時間乾燥させて、水分量を0.02質量%未満とした。溶融温度は、材料の種類と押し出されるフィルム厚に応じて350〜365℃とした。ダイリップギャップ設定を300μmとした450mm幅のCloeren Epoch Vダイを通して、材料を押し出した。連続ライン速度14m/秒でその後の融液カーテンを引き降ろすことにより、10μmの押出フィルムを研磨キャスティングロール上に形成し、フィルム試験用のコアに巻き付けた。
表5に報告したフィルム試験結果は、前述の手順によって押し出されたフィルムに対して、以下の試験方法と手順を用いて評価したものである。
表5の結果は、我々の発明から作られたフィルムの1kHz、23℃およびRH50%における誘電率は少なくとも3であり、一方、我々の発明の範囲内ではないフィルムのそれは、同条件において、3未満であることを示している。誘電率の2.92から3.06への上昇は、キャパシタンス等級を5%変化させることでコンデンサの性能に影響を及ぼすので、重要な変化である。理論に拘束されることなく、これによって、より多くのエネルギーの貯蔵が可能となり、従って、コンデンサのエネルギー密度が向上する。散逸率の増加(熱の形態のエネルギー損失)を伴わない誘電率の増加は重要な進展である。なぜなら、散逸率と誘電率は共に増加すると予期され、誘電率だけの増加を見ることは予期されていなかったためである。最後に、後述の表において、温度と周波数の関数としての一貫した結果であることが示されるであろう。
実施例9〜61の目的は、示されたポリエーテルイミドで作られたフィルムの重要な特性を試験し、芳香族第1級モノアミン末端キャップ(アニリン)の使用が電気的特性、熱特性および機械的特性などのフィルム性能特性に及ぼす効果を評価することであった。結果を以下の表に示す。
試験用フィルムを製造する前述の手順を用いて、以下の結果を得た。
表6の結果は、芳香族第1級モノアミン末端キャップポリエーテルイミドフィルムを含む実施例9〜19では、1kHz、23℃およびRH50%における誘電率が少なくとも3の材料が生成され、一方、モノアミンを含まないポリエーテルイミドの誘電率は3未満であることを示している。評価した温度領域に亘って、約5%上昇した。
表6に示した我々の結果は、本発明に準じて作られたフィルムの誘電率は、1MHz、23℃およびRH50%において約3であり、一方、本発明の範囲内でないフィルムのそれは、同条件において、3未満であることを示している。実施例20〜30に示されるように、温度の関数としての誘電率は、温度の関数として安定であり、発明材料の20℃の値と比較して2%未満変化する。
表7の結果は、実施例31〜41の1kHz、23℃およびRH50%における散逸率は1%以下であり、本発明に準じて作られた押出ポリエーテルイミドフィルムは、押出前で、ポリエーテルイミドを少なくとも90質量%含んでおり、一方、本発明に準じていないポリエーテルイミド(第1級モノアミンで末端キャップ化されていない)で作られたフィルムは、押出前で、90質量%未満のポリエーテルイミドで作られていることを示している。芳香族第1級モノアミンアニリンを使用した場合、フィルムの品質および表面は非常に良好であり、ダイライン、大きな介在物、炭化および劣化したポリマーなどの欠陥がなく、そのために、材料の収率は、非アニリン末端キャップ化材料と対照的に90%超であった。
我々の結果は、両方のフィルムの絶縁破壊強度は、ASTM D−149に準拠して測定して、少なくとも300V/μmであるが、本発明に準じて作られた押出ポリエーテルイミドフィルムは、押出前で、ポリエーテルイミドを少なくとも90質量%含んでおり、一方、本発明に準じていないポリエーテルイミド(第1級モノアミンで末端キャップ化されていない)で作られたフィルムは、押出前で、90質量%未満のポリエーテルイミドで作られていることを示している。また、本発明に準じて作られたフィルムは、本発明の他の特長も満たしていた。
Claims (12)
- 芳香族二無水物と、m−フェニレンジアミン、p−フェニレンジアミンおよびこれらの組み合わせから選択されたジアミンと、の重合から誘導された単位を含む押出ポリエーテルイミドであって、アニリンで末端キャップ化された押出ポリエーテルイミドを含み、
1kHz、23℃、RH50%における誘電率は、少なくとも3であり、押出前で、前記ポリエーテルイミドを少なくとも90質量%含むことを特徴とする一軸延伸高収率押出ポリエーテルイミドフィルム。 - 前記ポリエーテルイミドの質量平均分子量は、ポリスチレン標準を用いたゲル透過クロマトグラフィで求めて、20,000〜400,000ダルトンであり;
100秒−1と5000秒−1での粘度比は、キャピラリーレオメータで測定して、340℃で10未満であり;
引張弾性率は、ASTM D638に準拠して求めて、380,000psi(2618MPa)以上であり;
前記フィルムのガラス転移温度は、厚みが0.125インチ(3.2mm)の試験サンプルを用い、ASTM D648に準拠し66psi(0.45MPa)で測定して、217℃超であり、熱変形温度は、同条件で測定して、少なくとも195℃であり、
1kHz、23℃、RH50%における散逸率は、1%以下であり、
絶縁破壊強度は、ASTM D−149に準拠して測定して、少なくとも300V/μmであり、
シワなし領域の前記フィルムの厚み変動は、光学的形状測定法で測定して、前記フィルム厚の±10%以下であり、
シワなし領域の平均表面粗さ(Ra)は、光学的形状測定法で測定して、前記フィルムの平均厚の±3%未満であることを特徴とする請求項1に記載の一軸延伸高収率押出フィルム。 - 前記ポリエーテルイミドは、下式の構造を有することを特徴とする請求項1に記載の一軸延伸高収率押出フィルム:
- 前記フィルムは架橋ポリエーテルイミドを含むことを特徴とする請求項1に記載の一軸延伸高収率押出フィルム。
- 前記フィルムは、分枝鎖ポリエーテルイミドを含むことを特徴とする請求項1に記載の一軸延伸高収率押出フィルム。
- 前記フィルムは、さらに、C15−C30カルボン酸、C15−C30脂肪族カルボン酸アミドおよびこれらの混合物から選択された離型剤を、組成物の合計質量に対して、5.0質量%未満含むことを特徴とする請求項1に記載の一軸延伸高収率押出フィルム。
- 前記フィルムは、さらに、シリコーンポリエーテルイミド、ポリエーテルイミドスルホン、ポリエステル、ポリカーボネート、シリコーンポリカーボネート−ポリエステルコポリマーおよびこれらの組み合わせから選択されたポリマーを、前記組成物の合計質量に対して、20質量%未満含むことを特徴とする請求項1に記載の一軸延伸高収率押出フィルム。
- 前記フィルムは、m−フェニレンジアミン、p−フェニレンジアミンおよびこれらの組み合わせから選択されたアミンの重合から誘導された単位を含むポリエーテルイミド以外のポリエーテルイミドを15%未満含むことを特徴とする請求項1に記載の一軸延伸高収率押出フィルム。
- 請求項1に記載の一軸延伸高収率押出フィルムを含むことを特徴とする物品。
- さらに、前記フィルムの少なくとも一部に配置された導電性金属の層を含むことを特徴とする請求項9に記載の物品。
- 請求項10に記載の物品を含むことを特徴とするコンデンサ。
- 請求項11に記載のコンデンサを備えることを特徴とする電子物品。
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Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3484664A (en) * | 1968-11-21 | 1969-12-16 | Hercules Inc | Electrical capacitors |
US3740623A (en) * | 1972-01-14 | 1973-06-19 | Trw Inc | Self-healing non-metallized polystyrene capacitor |
JPS59210939A (ja) * | 1983-05-13 | 1984-11-29 | Toyobo Co Ltd | 架橋したポリエ−テルイミド成形物 |
JPH05320339A (ja) * | 1992-05-15 | 1993-12-03 | Mitsui Toatsu Chem Inc | 熱安定性良好なポリイミドおよびその製造方法 |
JP2000071268A (ja) * | 1998-08-31 | 2000-03-07 | Du Pont Toray Co Ltd | ポリイミドフィルムおよびその製造方法 |
US6919422B2 (en) * | 2003-06-20 | 2005-07-19 | General Electric Company | Polyimide resin with reduced mold deposit |
US9161440B2 (en) * | 2006-06-26 | 2015-10-13 | Sabic Global Technologies B.V. | Articles comprising a polyimide solvent cast film having a low coefficient of thermal expansion and method of manufacture thereof |
US20080044639A1 (en) * | 2006-06-26 | 2008-02-21 | Kwok Pong Chan | Polyimide solvent cast films having a low coefficient of thermal expansion and method of manufacture thereof |
US8034857B2 (en) | 2007-07-12 | 2011-10-11 | Sabic Innovative Plastics Ip B.V. | Polyetherimide/polyphenylene ether sulfone blends |
JP2009173847A (ja) * | 2007-12-27 | 2009-08-06 | Toray Ind Inc | 熱可塑性樹脂組成物および成形品 |
US8545988B2 (en) * | 2008-02-25 | 2013-10-01 | Sabic Innovative Plastics Ip B.V. | Polyetherimide and polyetherimide sulfone blends having automotive lighting applications |
EP2108673A1 (en) * | 2008-04-11 | 2009-10-14 | DuPont Teijin Films U.S. Limited Partnership | Plastic film having a high breakdown voltage |
JP5960250B2 (ja) * | 2011-05-12 | 2016-08-02 | サビック グローバル テクノロジーズ ベスローテン フェンノートシャップ | コンデンサ用非晶性ポリエーテルイミドフィルム、その製造方法およびそれから製造される物品 |
US9127128B2 (en) * | 2011-10-28 | 2015-09-08 | Sabic Global Technologies B.V. | Polyetherimides, methods of manufacture, and articles formed therefrom |
US8722187B2 (en) * | 2011-10-31 | 2014-05-13 | Sabic Innovative Plastics Ip B.V. | Solventless process for the preparation of amine functional polyetherimide resins with improved melt flow |
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- 2014-05-30 JP JP2016517045A patent/JP6329253B2/ja active Active
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- 2014-05-30 EP EP14733902.2A patent/EP3003686B1/en active Active
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JP2016528308A (ja) | 2016-09-15 |
KR102475422B1 (ko) | 2022-12-07 |
EP3003686B1 (en) | 2017-12-20 |
KR20190141799A (ko) | 2019-12-24 |
CN105473309B (zh) | 2018-02-02 |
KR20160015201A (ko) | 2016-02-12 |
CN105473309A (zh) | 2016-04-06 |
WO2014194212A1 (en) | 2014-12-04 |
EP3003686A1 (en) | 2016-04-13 |
KR102058217B1 (ko) | 2019-12-20 |
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