JP6323362B2 - イオン化装置 - Google Patents

イオン化装置 Download PDF

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Publication number
JP6323362B2
JP6323362B2 JP2015032833A JP2015032833A JP6323362B2 JP 6323362 B2 JP6323362 B2 JP 6323362B2 JP 2015032833 A JP2015032833 A JP 2015032833A JP 2015032833 A JP2015032833 A JP 2015032833A JP 6323362 B2 JP6323362 B2 JP 6323362B2
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Japan
Prior art keywords
ion
ions
electron
ionization chamber
ionization
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JP2015032833A
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Japanese (ja)
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JP2016157523A5 (enExample
JP2016157523A (ja
Inventor
勇介 立石
勇介 立石
和輝 高橋
和輝 高橋
佐藤　秀樹
秀樹 佐藤
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Shimadzu Corp
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Shimadzu Corp
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Application filed by Shimadzu Corp filed Critical Shimadzu Corp
Priority to JP2015032833A priority Critical patent/JP6323362B2/ja
Priority to US15/049,366 priority patent/US9679755B2/en
Priority to EP16156663.3A priority patent/EP3059756A1/en
Priority to CN201610099211.4A priority patent/CN105914124B/zh
Publication of JP2016157523A publication Critical patent/JP2016157523A/ja
Publication of JP2016157523A5 publication Critical patent/JP2016157523A5/ja
Application granted granted Critical
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/10—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/10—Ion sources; Ion guns
    • H01J49/14—Ion sources; Ion guns using particle bombardment, e.g. ionisation chambers
    • H01J49/147—Ion sources; Ion guns using particle bombardment, e.g. ionisation chambers with electrons, e.g. electron impact ionisation, electron attachment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/022—Details
    • H01J27/024—Extraction optics, e.g. grids
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/20—Ion sources; Ion guns using particle beam bombardment, e.g. ionisers
    • H01J27/205—Ion sources; Ion guns using particle beam bombardment, e.g. ionisers with electrons, e.g. electron impact ionisation, electron attachment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/06—Electron- or ion-optical arrangements
    • H01J49/067—Ion lenses, apertures, skimmers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/10—Ion sources; Ion guns
    • H01J49/14—Ion sources; Ion guns using particle bombardment, e.g. ionisation chambers
    • H01J49/145—Ion sources; Ion guns using particle bombardment, e.g. ionisation chambers using chemical ionisation

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Combustion & Propulsion (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • Electron Tubes For Measurement (AREA)
JP2015032833A 2015-02-23 2015-02-23 イオン化装置 Active JP6323362B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2015032833A JP6323362B2 (ja) 2015-02-23 2015-02-23 イオン化装置
US15/049,366 US9679755B2 (en) 2015-02-23 2016-02-22 Ionization apparatus
EP16156663.3A EP3059756A1 (en) 2015-02-23 2016-02-22 Ionization apparatus
CN201610099211.4A CN105914124B (zh) 2015-02-23 2016-02-23 电离设备

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015032833A JP6323362B2 (ja) 2015-02-23 2015-02-23 イオン化装置

Publications (3)

Publication Number Publication Date
JP2016157523A JP2016157523A (ja) 2016-09-01
JP2016157523A5 JP2016157523A5 (enExample) 2017-06-22
JP6323362B2 true JP6323362B2 (ja) 2018-05-16

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Family Applications (1)

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JP2015032833A Active JP6323362B2 (ja) 2015-02-23 2015-02-23 イオン化装置

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US (1) US9679755B2 (enExample)
EP (1) EP3059756A1 (enExample)
JP (1) JP6323362B2 (enExample)
CN (1) CN105914124B (enExample)

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* Cited by examiner, † Cited by third party
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WO2018100621A1 (ja) * 2016-11-29 2018-06-07 株式会社島津製作所 イオン化装置及び質量分析装置
US10541122B2 (en) 2017-06-13 2020-01-21 Mks Instruments, Inc. Robust ion source
US11264230B2 (en) 2017-06-29 2022-03-01 Shimadzu Corporation Quadrupole mass spectrometer
KR101819534B1 (ko) 2017-07-14 2018-03-02 한국기초과학지원연구원 이온화 소스 및 그를 포함하는 이차이온 질량분석기
JP2020535622A (ja) * 2017-09-29 2020-12-03 パーキンエルマー・ヘルス・サイエンシーズ・カナダ・インコーポレイテッドＰｅｒｋｉｎｅｌｍｅｒ Ｈｅａｌｔｈ Ｓｃｉｅｎｃｅｓ Ｃａｎａｄａ， Ｉｎｃ． 軸外イオン化デバイスおよびシステム
JP6908138B2 (ja) 2018-02-06 2021-07-21 株式会社島津製作所 イオン化装置及び質量分析装置
CN108231529B (zh) * 2018-03-09 2024-04-05 晓睿真空设备(嘉兴)有限公司 低压磁控阴极离子源
US10622200B2 (en) * 2018-05-18 2020-04-14 Perkinelmer Health Sciences Canada, Inc. Ionization sources and systems and methods using them
CN109406689B (zh) * 2018-10-22 2023-05-12 南京国科精准医学科技有限公司 一种离子渗透气体分子分离方法及装置
CN109212113B (zh) * 2018-10-22 2023-05-12 南京国科精准医学科技有限公司 一种离子捕集气体分子分离方法及装置
US12203886B2 (en) * 2019-05-15 2025-01-21 Shimadzu Corporation Ion analyzer
US11232925B2 (en) * 2019-09-03 2022-01-25 Applied Materials, Inc. System and method for improved beam current from an ion source
US11120966B2 (en) 2019-09-03 2021-09-14 Applied Materials, Inc. System and method for improved beam current from an ion source
CN111146049A (zh) * 2019-12-25 2020-05-12 兰州空间技术物理研究所 一种碳纳米管场发射阴极的小型离子源
WO2021120539A1 (zh) * 2020-06-08 2021-06-24 中国计量科学研究院 一种电子轰击电离源装置、电离轰击方法及物质分析方法
WO2022038754A1 (ja) * 2020-08-20 2022-02-24 株式会社島津製作所 質量分析装置
US11581172B2 (en) 2020-11-27 2023-02-14 Shimadzu Corporation Method for mass spectrometry and mass spectrometer
CN114566420B (zh) * 2020-11-27 2025-08-08 株式会社岛津制作所 质量分析装置
CN112599397B (zh) * 2020-12-14 2023-06-06 兰州空间技术物理研究所 一种储存式离子源
CN116997992A (zh) * 2021-05-14 2023-11-03 株式会社岛津制作所 质量分析装置
US11768176B2 (en) 2022-01-06 2023-09-26 Mks Instruments, Inc. Ion source with gas delivery for high-fidelity analysis
CN114530362B (zh) * 2022-01-24 2025-10-31 北京雪迪龙科技股份有限公司 一种聚环式飞行时间质谱仪
US20240055247A1 (en) * 2022-08-10 2024-02-15 Exum Instruments Off-axis ion extraction and shield glass assemblies for sample analysis systems
CN115223841B (zh) * 2022-08-15 2025-04-18 暨南大学 一种用于质谱仪的离子偏转器
CN119833387B (zh) * 2025-03-17 2025-06-10 中国科学院苏州生物医学工程技术研究所 电子轰击电离源

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Publication number Priority date Publication date Assignee Title
DE10325579B4 (de) * 2003-06-05 2007-10-11 Bruker Daltonik Gmbh Ionenfragmentierung durch Elektroneneinfang in linearen Ionenfallen
JP4232662B2 (ja) * 2004-03-11 2009-03-04 株式会社島津製作所 イオン化装置
JP2010244903A (ja) * 2009-04-07 2010-10-28 Shimadzu Corp 質量分析装置
CN103069539B (zh) * 2010-08-19 2015-12-16 莱克公司 用于飞行时间质谱仪的离子源和飞行时间质谱分析方法
JP6141772B2 (ja) * 2011-02-14 2017-06-07 マサチューセッツ インスティテュート オブ テクノロジー 質量分析の方法、装置、及びシステム
US9123521B2 (en) * 2012-04-26 2015-09-01 Leco Corporation Electron impact ion source with fast response
US9865422B2 (en) * 2013-03-15 2018-01-09 Nissin Ion Equipment Co., Ltd. Plasma generator with at least one non-metallic component
JP6244012B2 (ja) * 2013-04-23 2017-12-06 レコ コーポレイションＬｅｃｏ Ｃｏｒｐｏｒａｔｉｏｎ 高スループットを有する多重反射質量分析計
US9502226B2 (en) * 2014-01-14 2016-11-22 908 Devices Inc. Sample collection in compact mass spectrometry systems
DE112015001570T5 (de) * 2014-03-31 2017-01-12 Leco Corporation GC-TOF MS mit verbesserter Nachweisgrenze
US9698000B2 (en) * 2014-10-31 2017-07-04 908 Devices Inc. Integrated mass spectrometry systems

Also Published As

Publication number Publication date
CN105914124A (zh) 2016-08-31
US9679755B2 (en) 2017-06-13
EP3059756A1 (en) 2016-08-24
US20160247669A1 (en) 2016-08-25
CN105914124B (zh) 2018-07-10
JP2016157523A (ja) 2016-09-01

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