JP6278414B2 - 磁化同軸プラズマ生成装置 - Google Patents
磁化同軸プラズマ生成装置 Download PDFInfo
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- JP6278414B2 JP6278414B2 JP2015525201A JP2015525201A JP6278414B2 JP 6278414 B2 JP6278414 B2 JP 6278414B2 JP 2015525201 A JP2015525201 A JP 2015525201A JP 2015525201 A JP2015525201 A JP 2015525201A JP 6278414 B2 JP6278414 B2 JP 6278414B2
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- magnetic flux
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- 230000005291 magnetic effect Effects 0.000 claims description 165
- 230000004907 flux Effects 0.000 claims description 110
- 230000005415 magnetization Effects 0.000 claims description 11
- 229910045601 alloy Inorganic materials 0.000 claims description 8
- 239000000956 alloy Substances 0.000 claims description 8
- 239000010409 thin film Substances 0.000 claims description 8
- 239000000463 material Substances 0.000 claims description 4
- 230000035699 permeability Effects 0.000 claims description 4
- 230000035515 penetration Effects 0.000 claims description 2
- 239000007789 gas Substances 0.000 description 21
- 238000005259 measurement Methods 0.000 description 9
- 239000004020 conductor Substances 0.000 description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- 230000008859 change Effects 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 230000005292 diamagnetic effect Effects 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 238000004088 simulation Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 239000003990 capacitor Substances 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 238000002791 soaking Methods 0.000 description 2
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
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- 238000007796 conventional method Methods 0.000 description 1
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- 239000010408 film Substances 0.000 description 1
- -1 for example Substances 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
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- 238000012986 modification Methods 0.000 description 1
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- 239000012466 permeate Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
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Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/02—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma
- H05H1/10—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma using externally-applied magnetic fields only, e.g. Q-machines, Yin-Yang, base-ball
- H05H1/12—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma using externally-applied magnetic fields only, e.g. Q-machines, Yin-Yang, base-ball wherein the containment vessel forms a closed or nearly closed loop
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/02—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/48—Generating plasma using an arc
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
- H05H1/4645—Radiofrequency discharges
- H05H1/466—Radiofrequency discharges using capacitive coupling means, e.g. electrodes
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optics & Photonics (AREA)
- Electromagnetism (AREA)
- Plasma Technology (AREA)
- Physical Vapour Deposition (AREA)
Description
2 内部電極
3 プラズマ生成ガス供給部
4 電源回路
5 バイアスコイル
6 バイアスコイル用パルス電源
7 磁束保持部
8 制御部
10 絶縁部材
15 外部バイアスコイル
16 外部バイアスコイル用パルス電源
Claims (7)
- スフェロマックプラズマを生成する磁化同軸プラズマ生成装置であって、該磁化同軸プラズマ生成装置は、
外部電極と、
前記外部電極と同軸状に配置される内部電極と、
前記外部電極と内部電極との間にプラズマ生成ガスを供給するプラズマ生成ガス供給部と、
前記内部電極の内部に配置され、外部電極と内部電極との間にバイアス磁場を発生するバイアスコイルと、
前記外部電極と内部電極との間に負荷信号を印加する電源回路と、
前記バイアスコイルをパルス駆動するバイアスコイル用パルス電源と、
前記外部電極の外側に配置され、高導電率且つ低透磁率の材料からなる磁束保持部と、
スフェロマックプラズマが生成されるのに必要なバイアス磁場が外部電極と内部電極との間に与えられるのに十分な時間、且つ磁束保持部へのバイアス磁場の磁束の染み込み時間よりも短い時間でバイアスコイルをパルス駆動するようにバイアスコイル用パルス電源を制御する制御部と、
を具備することを特徴とする磁化同軸プラズマ生成装置。 - 請求項1に記載の磁化同軸プラズマ生成装置において、前記磁束保持部は、外部電極に対して着脱可能であることを特徴とする磁化同軸プラズマ生成装置。
- 請求項1に記載の磁化同軸プラズマ生成装置において、前記磁束保持部は、外部電極と一体形成されることを特徴とする磁化同軸プラズマ生成装置。
- 請求項1乃至請求項3の何れかに記載の磁化同軸プラズマ生成装置であって、さらに、外部電極の外部に配置され、外部電極と内部電極との間にバイアス磁場を発生する外部バイアスコイルと、
前記外部バイアスコイルを駆動する外部バイアスコイル用電源と、
を具備することを特徴とする磁化同軸プラズマ生成装置。 - 請求項1乃至請求項4の何れかに記載の磁化同軸プラズマ生成装置において、前記磁束保持部の厚さ、長さ、配置位置の何れか少なくとも1つにより、生成されるプラズマの速度、形状、温度、密度、磁束の何れか少なくとも1つを制御することを特徴とする磁化同軸プラズマ生成装置。
- 請求項1乃至請求項4の何れかに記載の磁化同軸プラズマ生成装置において、前記磁束保持部の厚さ、長さ、位置の何れか少なくとも1つにより、生成されるプラズマの放電開始位置を制御することを特徴とする磁化同軸プラズマ生成装置。
- 請求項6に記載の磁化同軸プラズマ生成装置を合金薄膜生成装置に用いる場合、生成されるプラズマの放電開始位置を制御することで、内部電極のプラズマにより溶発される位置を制御することを特徴とする磁化同軸プラズマ生成装置。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013138533 | 2013-07-02 | ||
JP2013138533 | 2013-07-02 | ||
PCT/JP2014/067337 WO2015002131A1 (ja) | 2013-07-02 | 2014-06-30 | 磁化同軸プラズマ生成装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2015002131A1 JPWO2015002131A1 (ja) | 2017-02-23 |
JP6278414B2 true JP6278414B2 (ja) | 2018-02-14 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015525201A Active JP6278414B2 (ja) | 2013-07-02 | 2014-06-30 | 磁化同軸プラズマ生成装置 |
Country Status (5)
Country | Link |
---|---|
US (1) | US9706633B2 (ja) |
EP (1) | EP3018981B1 (ja) |
JP (1) | JP6278414B2 (ja) |
CA (1) | CA2917195C (ja) |
WO (1) | WO2015002131A1 (ja) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6277398B2 (ja) * | 2013-08-27 | 2018-02-14 | 株式会社ユーテック | プラズマcvd装置及び配管内の成膜方法 |
JP6573276B2 (ja) * | 2015-09-16 | 2019-09-11 | 学校法人日本大学 | 磁化同軸プラズマ生成装置を用いる薄膜生成装置 |
CN106896136B (zh) * | 2017-04-19 | 2023-11-17 | 中国人民解放军装甲兵工程学院 | 一种磁化等离子体隔热效应调节检测装置及其检测方法 |
CN107860260A (zh) * | 2017-11-17 | 2018-03-30 | 中国人民解放军陆军装甲兵学院 | 磁化等离子体火炮机理研究用测试装置 |
BR112020016988A2 (pt) | 2018-02-28 | 2020-12-15 | General Fusion Inc. | Sistema para geração de plasma magnetizado e sustentação de campo magnético de plasma magnetizado |
JP7332169B2 (ja) * | 2018-11-02 | 2023-08-23 | 学校法人日本大学 | 磁化プラズモイド射出装置 |
CN110351915A (zh) * | 2019-07-24 | 2019-10-18 | 李学军 | 一种加热电解制氢及等离子发生装置 |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3755710A (en) * | 1972-03-24 | 1973-08-28 | Park Ohio Industries Inc | Gas plasma device |
US4713208A (en) * | 1986-05-21 | 1987-12-15 | The United States Of America As Represented By The United States Department Of Energy | Spheromak reactor with poloidal flux-amplifying transformer |
JPS6391999A (ja) | 1986-10-07 | 1988-04-22 | 石川島播磨重工業株式会社 | 同軸プラズマガン |
US5359258A (en) * | 1991-11-04 | 1994-10-25 | Fakel Enterprise | Plasma accelerator with closed electron drift |
JPH06151093A (ja) | 1992-11-11 | 1994-05-31 | Mitsubishi Heavy Ind Ltd | プラズマ生成加速装置 |
RU2107837C1 (ru) * | 1993-06-21 | 1998-03-27 | Сосьете Оропеен де Пропюльсьон | Плазменный двигатель уменьшенной длины с замкнутым дрейфом электронов |
DK0784417T3 (da) * | 1994-08-25 | 1999-07-19 | Aerospatiale | Plasmaaccelerator med lukket elektronstrøm |
US5763989A (en) * | 1995-03-16 | 1998-06-09 | Front Range Fakel, Inc. | Closed drift ion source with improved magnetic field |
RU2084085C1 (ru) * | 1995-07-14 | 1997-07-10 | Центральный научно-исследовательский институт машиностроения | Ускоритель с замкнутым дрейфом электронов |
JPH09115686A (ja) * | 1995-10-23 | 1997-05-02 | Mitsubishi Heavy Ind Ltd | プラズマ生成加速装置 |
US5892329A (en) * | 1997-05-23 | 1999-04-06 | International Space Technology, Inc. | Plasma accelerator with closed electron drift and conductive inserts |
US7624566B1 (en) * | 2005-01-18 | 2009-12-01 | The United States Of America As Represented By The Administrator Of National Aeronautics And Space Administration | Magnetic circuit for hall effect plasma accelerator |
JP4769014B2 (ja) | 2005-04-28 | 2011-09-07 | 学校法人日本大学 | 同軸磁化プラズマ生成装置と同軸磁化プラズマ生成装置を用いた膜形成装置 |
US7589474B2 (en) * | 2006-12-06 | 2009-09-15 | City University Of Hong Kong | Ion source with upstream inner magnetic pole piece |
JP5532720B2 (ja) | 2008-07-23 | 2014-06-25 | 学校法人日本大学 | 同軸磁化プラズマ生成装置 |
JP5984120B2 (ja) * | 2012-04-27 | 2016-09-06 | 学校法人日本大学 | 画像処理装置、x線ct撮影装置および画像処理方法 |
JP6031725B2 (ja) | 2012-09-06 | 2016-11-24 | 学校法人日本大学 | 合金薄膜生成装置 |
-
2014
- 2014-06-30 CA CA2917195A patent/CA2917195C/en active Active
- 2014-06-30 JP JP2015525201A patent/JP6278414B2/ja active Active
- 2014-06-30 US US14/902,477 patent/US9706633B2/en active Active
- 2014-06-30 EP EP14819750.2A patent/EP3018981B1/en active Active
- 2014-06-30 WO PCT/JP2014/067337 patent/WO2015002131A1/ja active Application Filing
Also Published As
Publication number | Publication date |
---|---|
EP3018981B1 (en) | 2020-07-29 |
CA2917195A1 (en) | 2015-01-08 |
JPWO2015002131A1 (ja) | 2017-02-23 |
US9706633B2 (en) | 2017-07-11 |
EP3018981A1 (en) | 2016-05-11 |
CA2917195C (en) | 2018-04-03 |
WO2015002131A1 (ja) | 2015-01-08 |
US20160374188A1 (en) | 2016-12-22 |
EP3018981A4 (en) | 2017-01-11 |
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