JP6267432B2 - 光学デバイスの製造方法 - Google Patents

光学デバイスの製造方法 Download PDF

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Publication number
JP6267432B2
JP6267432B2 JP2013061194A JP2013061194A JP6267432B2 JP 6267432 B2 JP6267432 B2 JP 6267432B2 JP 2013061194 A JP2013061194 A JP 2013061194A JP 2013061194 A JP2013061194 A JP 2013061194A JP 6267432 B2 JP6267432 B2 JP 6267432B2
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transparent member
metal film
mask
member wafer
optical device
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Expired - Fee Related
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JP2013061194A
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English (en)
Japanese (ja)
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JP2014186173A (ja
JP2014186173A5 (enExample
Inventor
古堅　由紀子
由紀子 古堅
若林　小太郎
小太郎 若林
真吾 石内
真吾 石内
明則 伊東
明則 伊東
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Kyocera Corp
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Kyocera Corp
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Priority to JP2013061194A priority Critical patent/JP6267432B2/ja
Priority to CN201410109777.1A priority patent/CN104060221B/zh
Priority to US14/223,651 priority patent/US9579858B2/en
Publication of JP2014186173A publication Critical patent/JP2014186173A/ja
Publication of JP2014186173A5 publication Critical patent/JP2014186173A5/ja
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Publication of JP6267432B2 publication Critical patent/JP6267432B2/ja
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  • Optical Elements Other Than Lenses (AREA)
  • Optical Filters (AREA)
  • Surface Treatment Of Optical Elements (AREA)
JP2013061194A 2013-03-23 2013-03-23 光学デバイスの製造方法 Expired - Fee Related JP6267432B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2013061194A JP6267432B2 (ja) 2013-03-23 2013-03-23 光学デバイスの製造方法
CN201410109777.1A CN104060221B (zh) 2013-03-23 2014-03-21 光学器件制造方法
US14/223,651 US9579858B2 (en) 2013-03-23 2014-03-24 Method of manufacturing optical device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013061194A JP6267432B2 (ja) 2013-03-23 2013-03-23 光学デバイスの製造方法

Publications (3)

Publication Number Publication Date
JP2014186173A JP2014186173A (ja) 2014-10-02
JP2014186173A5 JP2014186173A5 (enExample) 2015-12-24
JP6267432B2 true JP6267432B2 (ja) 2018-01-24

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JP2013061194A Expired - Fee Related JP6267432B2 (ja) 2013-03-23 2013-03-23 光学デバイスの製造方法

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JP (1) JP6267432B2 (enExample)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06258611A (ja) * 1993-03-04 1994-09-16 Yazaki Corp ファブリー・ペローエタロン型波長選択フィルタの製造方法
JP5381884B2 (ja) * 2010-04-16 2014-01-08 セイコーエプソン株式会社 波長可変干渉フィルターの製造方法
JP5716412B2 (ja) * 2011-01-24 2015-05-13 セイコーエプソン株式会社 波長可変干渉フィルター、光モジュール、及び光分析装置
JP2012173314A (ja) * 2011-02-17 2012-09-10 Seiko Epson Corp 波長可変干渉フィルター、光モジュール、および電子機器

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JP2014186173A (ja) 2014-10-02

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