JP6250659B2 - 特異な立方晶窒化ホウ素結晶及びこれらの製造方法 - Google Patents
特異な立方晶窒化ホウ素結晶及びこれらの製造方法 Download PDFInfo
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- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 title claims description 42
- 229910052582 BN Inorganic materials 0.000 title claims description 41
- 239000013078 crystal Substances 0.000 title claims description 41
- 238000004519 manufacturing process Methods 0.000 title description 4
- 230000012010 growth Effects 0.000 claims description 60
- 239000000463 material Substances 0.000 claims description 30
- 238000000034 method Methods 0.000 claims description 30
- 239000003054 catalyst Substances 0.000 claims description 24
- 239000000203 mixture Substances 0.000 claims description 18
- 229910003460 diamond Inorganic materials 0.000 claims description 11
- 239000010432 diamond Substances 0.000 claims description 11
- 239000000126 substance Substances 0.000 claims description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 6
- 239000003929 acidic solution Substances 0.000 claims description 5
- 239000002131 composite material Substances 0.000 claims description 4
- 239000003518 caustics Substances 0.000 claims description 3
- 230000001788 irregular Effects 0.000 claims description 3
- 238000004140 cleaning Methods 0.000 claims description 2
- 238000006243 chemical reaction Methods 0.000 description 20
- 238000000227 grinding Methods 0.000 description 19
- 229910052751 metal Inorganic materials 0.000 description 14
- 239000002245 particle Substances 0.000 description 14
- 239000002184 metal Substances 0.000 description 13
- 230000003197 catalytic effect Effects 0.000 description 10
- 239000002775 capsule Substances 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- 150000002739 metals Chemical class 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 229910000831 Steel Inorganic materials 0.000 description 4
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 4
- -1 alkaline earth metal nitrides Chemical class 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 4
- 229910052796 boron Inorganic materials 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 150000004767 nitrides Chemical class 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 239000010959 steel Substances 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000006061 abrasive grain Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 238000011084 recovery Methods 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 2
- 208000012868 Overgrowth Diseases 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 238000000498 ball milling Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 230000005496 eutectics Effects 0.000 description 2
- 230000009643 growth defect Effects 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 229910000640 Fe alloy Inorganic materials 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 238000010306 acid treatment Methods 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000005273 aeration Methods 0.000 description 1
- 230000003698 anagen phase Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- UORVGPXVDQYIDP-UHFFFAOYSA-N borane Chemical class B UORVGPXVDQYIDP-UHFFFAOYSA-N 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000007596 consolidation process Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 150000004678 hydrides Chemical class 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 150000002642 lithium compounds Chemical class 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 238000007873 sieving Methods 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
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Description
本出願は2012年6月30日付けで出願された仮出願第61/666,831号の優先権を主張する。
主としてアルカリ及びアルカリ土類金属の窒化物及び水素化物を有する触媒系と、六方晶窒化ホウ素とを含有する混合物を使用して立方晶窒化ホウ素(CBN)粒を製造した。この例では、CBN粒を成長させるために、Li3N、LiOH及びLiH触媒を選択した(米国特許第7001577号明細書の例3を参照されたい)。混合物を、窒素が豊富な環境内で十分に混ぜ合わせ、アイソスタティック(isostatic)圧密化によってセル内に圧密化した。セルは、高圧・高温機器の反応カプセルに適合するように形成した(米国特許出願公開第2010/0064594号明細書を参照されたい。このタイプの機器は米国特許第2,941,241号明細書及び同第2,941,248号明細書に記載されている)。
例1に記載されたものと同じ化学物質で2つのセルを調製し、例1と正確に同じ手順に従ってHPHT CBN成長を実施した。約20分間かかる初期成長の終了時まで第1のセルをHPHT条件下で稼働させた。成長が終了したら、HPHT条件を室温及び周囲圧力に戻した。このセルを反応カプセルから取り出し、cBN粒の回収処理を行った。cBN粒の回収は溶解、酸処理、及び濯ぎプロセスを含むことができる。第1のセルと同じ反応カプセル内に第2のセルを装填し、そして例1に記載されているのと同じ成長設定値に従った。このセルは全サイクル時間にわたって稼働させた(例えば約1時間)。反応が終了した後、試験したこのセルを引き離し、例1に記載されているように回収した。
製造された第2のセルcBNのCBN 60/80粒子1グラムを接着母材中に結合させ、そして室温で乾燥させた。続いて、CBN粒にイオンミル研磨を施すことにより、CBN粒の断面を暴露した。次いで走査電子顕微鏡(SEM)を使用して、研磨済CBN粒を調査した。図6は、このような研磨済CBN単一結晶粒の断面図を示しており、この図で観察されるCBNコアは規則的な形状、平滑なファセット、及びサイズ60〜80μmを有していた。コア外部の過剰成長外殻部分も観察された。外殻の最大厚は約80μmであった。コア及び過剰成長外殻は界面によって明らかに区別されていた。
Claims (20)
- 単結晶構造を有するコア;及び
前記コアから外方へ向かって広がっている外方成長領域
を具備しており、前記外方成長領域のタフネス指数が前記コアのタフネス指数よりも低い、超砥粒材料であって、コア及び外方成長領域が立方晶窒化ホウ素である、超砥粒材料。 - 前記外方成長領域が、立方晶窒化ホウ素、ダイヤモンド、及びダイヤモンド複合材料からなる群から選択される材料を含有している、請求項1に記載の超砥粒材料。
- 前記コアが、立方晶窒化ホウ素、ダイヤモンド、及びダイヤモンド複合材料からなる群から選択される材料を含有している、請求項1又は2に記載の超砥粒材料。
- 前記コアの前記単結晶構造が、前記外方成長領域の化学組成とは異なる化学組成を有している、請求項1〜3のいずれか一項に記載の超砥粒材料。
- 前記コアの前記単結晶構造が、前記外方成長領域の化学組成と同じ化学組成を有している、請求項1〜3のいずれか一項に記載の超砥粒材料。
- 前記コアの単結晶構造が、実質的にファセット形状である、請求項1〜5のいずれか一項に記載の超砥粒材料。
- 前記外方成長領域の単結晶が、実質的に不規則な形状である、請求項1〜6のいずれか一項に記載の超砥粒材料。
- 前記外方成長領域が、ブロック状であり、かつ粗い、請求項1〜7のいずれか一項に記載の超砥粒材料。
- 複数の六方晶窒化ホウ素(hBN)粒を提供すること;
触媒を提供すること;
前記複数のhBN粒及び前記触媒に、単結晶構造を有するコアを形成するのに十分な第1の時間にわたる第1の高圧を加えること;並びに
前記複数のhBN粒及び前記触媒に、前記コアから外方へ向かって広がっている外方成長領域を形成するのに十分な第2の時間にわたる第2の高圧を加えること
を含み、第1の高温が、1600〜2000℃の範囲であり、かつ第1の高圧が50〜60kbarの範囲であり、第2の高温が、1400〜1600℃の範囲であり、かつ第2の高圧が70〜90kbarの範囲である、方法。 - 水、酸性溶液又は苛性化学物質の組合せを使用することにより、生成物を清浄化することを更に含む、請求項9に記載の方法。
- 前記第2の高圧が、前記第1の高圧よりも高い、請求項9又は10に記載の方法。
- 前記複数のhBN粒及び前記触媒を、高温状態に曝すことを更に含む、請求項10又は11に記載の方法。
- 前記複数のhBN粒及び前記触媒を、第1の時間にわたって前記第1の高圧で第1の高温に曝すことを更に含む、請求項10〜12のいずれか一項に記載の方法。
- 前記複数のhBN粒及び前記触媒を、第2の時間にわたって前記第2の高圧で第2の高温に曝すことを更に含み、前記第2の高温が第1の高温よりも低い、請求項13に記載の方法。
- 前記複数のhBN粒及び前記触媒を、第2の時間にわたって前記第2の高圧で第2の高温に曝すことを更に含み、前記第2の高温が前記第1の高温と同じである、請求項13に記載の方法。
- 前記コアが立方晶窒化ホウ素(cBN)の単結晶である、請求項10〜15のいずれか一項に記載の方法。
- 前記外方成長領域が単結晶立方晶窒化ホウ素である、請求項10〜16のいずれか一項に記載の方法。
- 前記外方成長領域の立方晶窒化ホウ素の前記単結晶が、粗いブロック状表面を有している、請求項10〜17のいずれか一項に記載の方法。
- 前記コアを、前記外方成長領域の成長速度よりも遅い成長速度で成長させる、請求項10〜18のいずれか一項に記載の方法。
- 立方晶窒化ホウ素の単結晶構造を有するコア;及び
前記コアから外方へ向かって広がっている外方成長領域
を具備しており、前記外方成長領域のタフネス指数が前記コアのタフネス指数よりも低い、立方晶窒化ホウ素。
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PCT/US2013/047637 WO2014004522A1 (en) | 2012-06-30 | 2013-06-25 | Unique cubic boron nitride crystals and method of manufacturing them |
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US3192015A (en) * | 1963-04-01 | 1965-06-29 | Gen Electric | Growth of large cubic form of boron nitride crystals |
DE3546113A1 (de) * | 1985-12-24 | 1987-06-25 | Santrade Ltd | Verbundpulverteilchen, verbundkoerper und verfahren zu deren herstellung |
US7323049B2 (en) * | 1997-04-04 | 2008-01-29 | Chien-Min Sung | High pressure superabrasive particle synthesis |
US6676750B1 (en) * | 1999-10-05 | 2004-01-13 | Geoffrey John Davies | Growth of diamond clusters |
AU1170501A (en) * | 1999-11-19 | 2001-05-30 | De Beers Industrial Diamond Division (Proprietary) Limited | Cubic boron nitride clusters |
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