JP6239300B2 - Timepiece parts manufacturing method, timepiece parts, movement and timepiece - Google Patents

Description

  The present invention relates to a method for manufacturing a timepiece part, a timepiece part, a movement, and a timepiece.

  Conventionally, a mechanical timepiece, which is one of small precision machines, is mounted with many small timepiece components such as gears and levers. Some timepiece parts are arranged to slide with other parts such as an ankle and an ankle receiver. In such a watch part that slides with other parts, a hard member such as a ruby is disposed in the sliding part in order to increase the wear resistance of the sliding part.

  On the other hand, the timepiece parts as described above have been conventionally manufactured mainly by machining such as punching, but in recent years, a method of manufacturing using an electroforming method has been adopted. By using the electroforming method, the mechanical tolerance can be reduced as compared with machining, and even a complicated outer shape can be manufactured with high accuracy.

  An electroformed material (for example, nickel) has a characteristic that the wear resistance is inferior to that of a normal rolled material. For this reason, in the timepiece parts manufactured using the electroforming method, it is particularly important to improve the wear resistance of the sliding part with other parts. For example, as shown in Patent Document 1, a technique is known in which insert molding is performed so that a hard member is disposed on the surface of an electroformed material.

European Patent Application No. 1916567

  However, in the electroforming method described in Patent Document 1, electroforming is performed in a state where the hard member is placed without being fixed to the electroforming mold. In this case, the hard member is simply placed on the electroforming mold, and the position of the hard member may be shifted during electroforming, or the hard member may be detached from the electroforming mold. There has been a problem in that the work for preventing such displacement and disengagement of the hard member is required in the electroforming process, and the work becomes complicated.

  In addition, the electroformed product obtained by the electroforming method described in Patent Document 1 has a problem in that dimensional accuracy cannot be obtained if a displacement of a hard member occurs during electroforming. Moreover, since a hard member is arrange | positioned on the surface of an electroformed member, fixation between a hard member and an electroformed member may become inadequate. In this case, there is a possibility that the hard member may come off from the electroformed member, which is problematic in terms of quality.

  In view of the circumstances as described above, it is an object of the present invention to provide a timepiece component manufacturing method, a timepiece component, a movement, and a timepiece that are excellent in workability and quality.

  A timepiece component manufacturing method according to the present invention includes an electroforming mold including a base portion in which a part of a first member having a predetermined shape is entirely buried, and a space portion formed by the first member and the base portion. An electroforming process for forming, an electroforming process for integrally forming the first member and the second member by embedding the second member in the space using an electroforming method, Removing the base from the one member and the second member.

  According to the present invention, the first member is supported by the base portion in which a part of the first member having a predetermined shape is entirely buried, so that the displacement of the first member can be prevented during electroforming. As a result, work that has been performed separately to prevent displacement of the first member is not necessary, and workability is improved. In addition, since the first member and the second member are integrally formed by filling the second member in the space formed by the first member and the base, the first member and the second member are sufficiently fixed. It will be a thing. As a result, a watch component having excellent quality can be obtained.

In the method for manufacturing a timepiece part described above, it is preferable to use a resist as the electroforming mold.
According to this configuration, the electroforming mold can be formed by a photolithography method by using a photoresist as the electroforming mold. Thereby, a highly accurate electroforming mold can be formed.

In the method for manufacturing a timepiece part described above, in the electroforming process, the electroforming process includes forming an electroformed electrode capable of transmitting light on a surface in a first direction of a substrate capable of transmitting light. Forming a first resist layer that is sensitive to the light on the surface of the substrate in the first direction, and forming a recess in the first resist layer for disposing the first member. Disposing the first member in the recess, forming a second resist layer sensitive to the light so as to cover the first resist layer and the first member, and the second The second resist layer and the first resist from the first direction surface side of the second resist layer with respect to the first region of the resist layer in the first direction that overlaps a part of the first member. The second resist layer of the second resist layer so as to pass through the resist layer. Irradiating the light in a direction substantially perpendicular to the surface of the direction, and a second region overlapping the first region of the surface in the second direction opposite to the surface in the first direction of the substrate Irradiating the light in a direction substantially perpendicular to the surface of the substrate in the second direction so as to pass through the first resist layer and the second resist layer from the surface of the substrate in the second direction. And developing the first resist layer and the second resist layer irradiated with the light to form the electroforming mold with the first resist layer and the second resist layer remaining on the substrate. Are preferably included.
According to this configuration, the first region of the second direction surface of the second resist layer that overlaps a part of the first member is irradiated with light substantially perpendicularly to the first direction surface, and the substrate The first member is sandwiched by irradiating light almost perpendicularly to the surface in the second direction with respect to the second region overlapping the first region in the surface in the second direction opposite to the surface in the first direction. The first resist layer and the second resist layer are irradiated with light from both sides (the surface side of the second resist layer, the substrate side). Thereby, generation | occurrence | production of exposure defect can be suppressed. Further, by performing the development, a part of the first member is buried in the first resist layer and the second resist layer (that is, the electroforming mold) remaining on the substrate. Thereby, position shift of the 1st member can be prevented more certainly.

  A timepiece component according to the present invention includes a first member having a predetermined shape, and a second member formed using an electroforming method integrally with the first member so as to fill a part of the first member. Is provided.

  According to the present invention, since the second member is formed using the electroforming method integrally with the first member so as to fill a part of the first member, the first member and the second member can be fixed. It will be enough. As a result, a watch component having excellent quality can be obtained.

In the timepiece component described above, the first member has a first surface and a second surface that are parallel to each other, and a side surface that connects the first surface and the second surface, and the second member is The first surface, the second surface, and the side surface are preferably formed.
According to this configuration, the second member includes the first surface and the second surface among the first members having the first surface and the second surface parallel to each other, and the side surface connecting the first surface and the second surface. Since it forms over a surface and a side surface, the structure which a part of 1st member is buried can be formed reliably.

In the timepiece component described above, it is preferable that at least one of the first member and the second member is provided with a removal restricting portion that restricts the first member from being removed from the second member.
According to this configuration, since the first member can be prevented from coming off from the second member by the removal restricting portion, the fixing force between the first member and the second member becomes stronger.

In the timepiece component described above, the drop-out restricting portion includes a recess provided in one of the first member and the second member, and a recess provided in the other of the first member and the second member. It is preferable to have the convex part arrange | positioned in.
According to this configuration, since the drop-out restricting portion has the concave portion and the convex portion disposed in the concave portion, the fixing force can be enhanced with a simple configuration.

In the timepiece component described above, it is preferable that the first member and the second member are used as a part of at least one of a gear, an ankle, a receiver, a ground plane, and a jumper.
According to this configuration, it is possible to obtain a gear, ankle, a receiver, a ground plane, and a jumper that are excellent in quality without performing complicated work.

A movement according to the present invention includes the timepiece component described above.
According to this configuration, it is possible to obtain a movement with excellent quality without performing complicated work.

A timepiece according to the present invention includes the timepiece component described above.
According to this configuration, it is possible to obtain a timepiece having excellent quality without performing complicated work.

  ADVANTAGE OF THE INVENTION According to this invention, the manufacturing method of the components for timepieces excellent in workability | operativity and quality, the components for timepieces, a movement, and a timepiece can be provided.

It is the top view and sectional drawing which show the structure of the components for timepieces. It is a flowchart for demonstrating the manufacturing method of the components for timepieces. It is process drawing (sectional drawing) for demonstrating the manufacturing method of the components for timepieces. It is process drawing (sectional drawing) for demonstrating the manufacturing method of the components for timepieces. It is process drawing (sectional drawing) for demonstrating the manufacturing method of the components for timepieces. It is a schematic block diagram of an electroforming apparatus. It is an external view of a timepiece. It is a top view of the movement front side. It is a general | schematic fragmentary sectional view which illustrates the part of an escape wheel from a barrel complete. It is a top view of an escape wheel and an ankle. It is a top view of an hour jumper. It is sectional drawing which shows the structure of an ankle beam and a claw stone.

Embodiments of the present invention will be described below with reference to the drawings.
[Watch parts]
FIG. 1 is a diagram illustrating a configuration of a timepiece component 30 according to the present embodiment. FIG. 1A is a plan view of the timepiece component 30, and FIG. 1B is a diagram showing a configuration along the section AA in FIG. In the present embodiment, an ankle receiver will be described as an example of the timepiece component 30. Examples of the timepiece component 30 include, in addition to the ankle receiver, a gear, ankle, a receiver, a base plate, a jumper (eg, hour jumper, etc.), and the like.

  As shown in FIGS. 1A and 1B, the timepiece component 30 includes a hard member 10 (an example of the “first member” of the present invention) and an electroformed member 20. A timepiece part (for example, ankle receiver) 30 according to the present embodiment is a part that constitutes a timepiece such as a mechanical timepiece, and is used as a part that slides between other parts (for example, ankle true). it can.

  The hard member 10 is made of a material having a predetermined hardness, such as metal, ruby, ceramic, glass, or silicon. In the present embodiment, the hard member 10 is formed in a ring shape, and includes a first surface 11 (an example of “another portion of the outer peripheral surface” of the present invention) and a second surface 12 (an “outer peripheral surface of the present invention”. It has an example of “another part” and a side surface 13 (an example of “a part of the outer peripheral surface” of the present invention). The hard member 10 is disposed at a sliding portion that slides between other parts. A circular through hole 10a is formed in the center of the hard member 10 in plan view. Other parts (for example, ankle true) constituting the timepiece are arranged inside the through hole 10a. The hard member 10 slides between other parts arranged inside the through hole 10a.

  The electroformed member 20 is formed using a metal material such as nickel, for example. The electroformed member 20 is integrally formed with the hard member 10 by electroforming. The electroformed member 20 is formed so as to fill a part of the hard member 10. Specifically, the electroformed member 20 has a circular through hole 20a, and is formed so that a part of the outer peripheral side of the hard member 10 is buried in an inner wall portion of the through hole 20a. The electroformed member 20 is formed so as to cover a portion straddling the first surface 11, the second surface 12, and the side surface 13 of the hard member 10.

  As described above, the timepiece component 30 has a configuration excellent in wear resistance because the hard member 10 is disposed at a sliding portion that slides between other components. Moreover, since a part of the hard member 10 is formed so as to be buried in the electroformed member 20, the fixing between the hard member 10 and the electroformed member 20 is sufficient. As a result, the timepiece component 30 is excellent in quality.

[Manufacturing method for watch parts]
FIG. 2 is a flowchart for explaining a method of manufacturing the timepiece component 30. 3 to 5 are process diagrams for explaining a method for manufacturing a timepiece part, and are cross-sectional views taken along a line AA in FIG.
In the method for manufacturing the timepiece component 30 according to the present embodiment, the timepiece component 30 is manufactured by electroforming. The manufacturing method of the timepiece component 30 includes an electroforming process (S10) and an electroforming process (S20).

<Electroforming process>
In the electroforming process S <b> 10, the electroforming mold 15 (see FIG. 4H) is formed and the hard member 10 is disposed on the electroforming mold 15.
First, in the electroforming process S10, a substrate G is prepared as shown in FIGS. 2 (S11) and 3 (a). On the first surface (surface in the first direction) Ga of the substrate G, an electroformed electrode E is formed over almost the entire surface. A light shielding pattern P is formed on the second surface (the surface opposite to the first surface Ga, the surface in the second direction) Gb of the substrate G.

  The substrate G is made of a material (eg, glass) that can transmit the exposure light EL2. The electroformed electrode E is a so-called transparent electrode and includes, for example, a material such as ITO or IZO. For this reason, the electroformed electrode E can transmit light (such as ultraviolet light) capable of exposing a predetermined photoresist. The light shielding pattern P is formed using a material that can absorb or reflect the light (for example, Cr). The shape and size of the light shielding pattern P are equal to the shape and size of the electroformed member 20 in plan view. The light shielding pattern P may be formed on the first surface Ga of the substrate G.

  Next, as shown in FIGS. 2 (S12) and 3 (b), a first resist layer R1 is formed on the electroformed electrode E of the substrate G. The first resist layer R1 is formed on almost the entire surface of the electroformed electrode E. The first resist layer R1 is exposed to light having a predetermined wavelength such as ultraviolet light. In the present embodiment, a negative photoresist is used as the first resist layer R1.

  Next, as shown in FIG. 2 (S13) and FIG. 3 (c), a concave portion Ra is formed on the surface of the first resist layer R1. The concave portion Ra can be formed by a technique such as an etching method or a press working method. When forming the concave portion Ra, the shape and size of the concave portion Ra are made substantially the same as the shape and size of the hard member 10. Therefore, the depth of the recess Ra is substantially equal to the dimension of the hard member 10 in the thickness direction.

  Next, as shown in FIG. 2 (S14) and FIG. 3 (d), the hard member 10 is disposed inside the recess Ra. At this time, since the shape and size of the concave portion Ra and the shape and size of the hard member 10 are substantially equal, the hard member 10 is disposed inside the concave portion Ra with almost no gap. Further, the surface of the first resist layer R1 and the surface of the hard member 10 are in a flush state. In addition, you may form the recessed part Ra in the dimension that a part of hard member 10 protrudes from the recessed part Ra to the surface side.

  Next, as shown in FIG. 2 (S15) and FIG. 4 (e), a second resist layer R2 is formed so as to cover the first resist layer R1 and the hard member 10. The second resist layer R2 is formed on the entire surface of the first resist layer R1 and the surface of the hard member 10. By forming the second resist layer R2, the entire surface of the hard member 10 is covered with the first resist layer R1 and the second resist layer R2.

  When a part of the hard member 10 is held so as to protrude from the concave portion Ra to the surface side, the second resist layer R2 is formed thick so as to fill the protruding part of the hard member 10. As a result, similarly to the above, the entire surface of the hard member 10 is covered with the first resist layer R1 and the second resist layer R2. Even if there is a gap between the hard member 10 and the recess Ra, the second resist layer R2 is formed so as to fill the gap. As a result, similarly to the above, the entire surface of the hard member 10 is covered with the first resist layer R1 and the second resist layer R2.

  The second resist layer R2 is exposed to light such as ultraviolet light that sensitizes the first resist layer R1. In the present embodiment, a negative photoresist is used as the second resist layer R2 in the same manner as the first resist layer R1. For example, the same photoresist as the first resist layer R1 may be used as the second resist layer R2.

  Next, as shown in FIG. 2 (S16) and FIG. 4 (f), the first exposure is performed on the first resist layer R1 and the second resist layer R2. In the first exposure, the exposure light EL1 is irradiated from the surface (first direction surface) side of the second resist layer R2. As the exposure light EL1, light having a wavelength capable of exposing the first resist layer R1 and the second resist layer R2 (eg, ultraviolet light) is used.

  In the first exposure, first, a predetermined mask M is arranged on the surface side of the second resist layer R2, and the surface of the second resist layer R2 is irradiated with the exposure light EL1 through the mask M. The mask M is formed in a plate shape by a material (for example, glass) that can transmit the exposure light EL1, and a light-shielding pattern Mp that shields the exposure light EL1 is formed (the outer peripheral portion is the light-shielding pattern P). They need to be the same, but the inner circumference doesn't have to be the same). The light shielding pattern Mp is the same as the light shielding pattern P formed on the second surface Gb of the substrate G. Therefore, the shape and size of the light shielding pattern Mp are equal to the shape and size of the electroformed member 20 in plan view. The mask M is disposed in parallel to the surface of the second resist layer R2. The exposure light EL1 is irradiated in a direction substantially perpendicular to the surfaces of the mask M and the second resist layer R2.

  A part of the exposure light EL1 is shielded by the light shielding pattern Mp, and a part that has passed through the mask M is irradiated in a substantially vertical direction to the first region Q1 on the surface of the second resist layer R2. The first region Q1 is a region outside the region overlapping the light shielding pattern P on the surface of the second resist layer R2. The exposure light EL1 irradiated to the first region Q1 sensitizes the second resist layer R2, passes through the second resist layer R2, reaches the first resist layer R1, and sensitizes the first resist layer R1.

  In addition, as shown in FIG.4 (f), since exposure light EL1 is light-shielded by the hard member 10, about the part Rb which overlaps the hard member 10 among 1st resist layers R1, exposure light EL1 does not reach | attain, It will be in the state which is not exposed. Thus, the photosensitive portions R1a and R2a are formed in the first resist layer R1 and the second resist layer R2 by the first exposure.

  Next, as shown in FIG. 2 (S17) and FIG. 4 (g), second exposure is performed on the first resist layer R1 and the second resist layer R2. In the second exposure, the exposure light EL2 is irradiated from the second surface Gb side of the substrate G. As the exposure light EL2, light having the same wavelength as that of the exposure light EL1 used in the first exposure can be used. In addition, if it is the light of the wavelength which can sensitize 1st resist layer R1 and 2nd resist layer R2, the light of a wavelength different from exposure light EL1 used by 1st exposure will be used as exposure light EL2. Also good. The exposure light EL2 is irradiated in a substantially vertical direction with respect to the second surface Gb of the substrate G.

  In the second exposure, a part of the exposure light EL2 is shielded by the light shielding pattern P, and a part of the exposure light EL2 is irradiated to the second region Q2 out of the light shielding pattern P in the second surface Gb of the substrate G. The second region Q2 is a region overlapping the first region Q1 irradiated with the exposure light EL1 in the first exposure in plan view. The exposure light EL2 applied to the second region Q2 passes through the substrate G, reaches the first resist layer R1, exposes the first resist layer R1, and passes through the first resist layer R1 to pass through the second resist. The layer R2 is reached and the second resist layer R2 is exposed.

  At this time, as shown in FIG. 4F, the portion Rb of the first resist layer R1 that overlaps the hard member 10 was not exposed because the exposure light EL1 did not reach in the first exposure. In the second exposure shown in FIG. 4G, since the exposure light EL2 reaches this portion Rb, this portion Rb is exposed to the exposure light EL2. As described above, the first exposure and the second exposure cause the photosensitive portion to be exposed to a portion of the first resist layer R1 and the second resist layer R2 that is different from the portion overlapping the light shielding pattern P (light shielding pattern Mp) in plan view. R1a and R2a are formed.

  Next, as shown in FIG. 2 (S18) and FIG. 4 (h), the first resist layer R1 and the second resist layer R2 are developed. In this development step, the first exposure of the first resist layer R1 and the second resist layer R2 is performed by supplying a developer corresponding to the negative photoresist to the first resist layer R1 and the second resist layer R2. And the part which was not exposed by the second exposure is dissolved and removed by the developer.

  By performing development, an electroforming mold 15 is formed as shown in FIG. The electroforming mold 15 includes an electroformed electrode E formed on the first surface Ga of the substrate G, a light shielding pattern P formed on the second surface Gb of the substrate G, and a first resist disposed on the electroformed electrode E. This is a structure having a photosensitive portion R1a of the layer R1 and a photosensitive portion R2a of the second resist layer R2.

  A concave portion 16 is formed on the first surface Ga of the substrate G in the electroforming mold 15 at a portion overlapping the light shielding pattern P in plan view. The recess 16 is formed in a state surrounded by the photosensitive portions R1a and R2a. By forming the recess 16, a region of the electroformed electrode E that overlaps the light shielding pattern P is exposed. The recess 16 has a shape corresponding to the electroformed member 20.

  A hard member 10 is disposed in the electroforming mold 15. The hard member 10 is supported by the photosensitive portions R1a and R2a. In the hard member 10, a part 10b on the inner peripheral side (an example of “the whole part of the first member” in the present invention) is a photosensitive part R1a of the first resist layer R1 and a photosensitive part R2a of the second resist layer R2 (in the present invention). Is supported in a state where it is buried in one example of the “base”. In other words, the portion of the hard member 10 that is not buried in the photosensitive portion R1a of the first resist layer R1 and the photosensitive portion R2a of the second resist layer R2 is supported in the recess 16. In the present invention, in the recess 16, the photosensitive portion R1a of the first resist layer R1 and the photosensitive portion R2a of the second resist layer R2, and the photosensitive portion R1a of the first resist layer R1 and the second resist of the hard member 10 are used. A space surrounded by a portion not buried in the photosensitive portion R2a of the layer R2 is referred to as a “space portion K”. As described above, the hard member 10 is arranged in the electroforming mold 15 in a state in which a portion different from the portion to be embedded in the electroformed member 20 is embedded in the photosensitive portions R1a and R2a. Thereby, the position shift of the hard member 10 is suppressed.

  Thus, the electroforming process S10 is completed by forming the electroforming mold 15 in a state where the hard member 10 is disposed.

<Electroforming process>
After the electroforming process S10 is completed, an electroforming process S20 is performed.
In the electroforming step S20, first, as shown in FIG. 2 (S21) and FIG. 5 (i), an electroformed body 21 (an example of the “second member” of the present invention) is formed in the space K of the electroforming mold 15. To do. When forming the electroformed body 21, first, the electroforming mold 15 is set in a predetermined electroforming apparatus.

FIG. 6 is a schematic diagram showing a configuration of an electroforming apparatus 40 for forming the electroformed body 21.
As shown in FIG. 6A, the electroforming apparatus 40 includes an electroforming tank 41, an electrode 42, an electric wiring 43, and a power supply unit 44. An electroforming liquid W is stored in the electroforming tank 41. The electrode 42 is immersed in the electroforming liquid W. The electrode 42 is formed using the same metal material (nickel in this embodiment) as the electroformed member 20. The electrical wiring 43 has a first wiring 43a and a second wiring 43b. The first wiring 43 a connects the electrode 42 and the anode side of the power supply unit 44. The second wiring 43 b connects the electroformed electrode E and the cathode side of the power supply unit 44. With this configuration, the electrode 42 is connected to the anode side of the power supply unit 44, and the electroformed electrode E is connected to the cathode side.

  The electroforming liquid W is selected according to the electroforming material. When the electroformed member 20 made of nickel is formed as in this embodiment, for example, a sulfamic acid bath, a watt bath, a sulfuric acid bath, or the like is used. When nickel electroforming is performed using a sulfamic acid bath, for example, sulfamic acid containing nickel sulfamate hydrate as a main component is placed in the electroforming tank 41.

  The electroforming electrode E of the electroforming mold 15 is connected to the second wiring 43b, and the electroforming mold 15 is immersed in the electroforming liquid W stored in the electroforming tank 41. 15 sets are completed. In the present embodiment, since the hard member 10 is fixed to the electroforming mold 15, there is no possibility that the hard member 10 is detached from the electroforming mold 15 when the electroforming mold 15 is set in the electroforming apparatus 40.

  After setting the electroforming mold 15, the power supply unit 44 is operated to apply a voltage between the electrode 42 and the electroformed electrode E. By this operation, nickel constituting the electrode 42 is ionized to move the electroforming liquid W, and is deposited as a metal on the electroforming electrode E in the electroforming liquid W. When the predetermined time elapses, nickel gradually grows and the electroformed body 21 is formed in the space K as shown in FIGS. 5 (i) and 6 (b). In the present embodiment, the formation of the electroformed body 21 is finished when the electroformed body 21 grows to such an extent that the space K is filled and slightly protrudes from the space K. The electroformed body 21 is formed so as to fill the hard member 10 protruding to the space K side. For this reason, the electroformed body 21 is formed integrally with the hard member 10.

  Next, as shown in FIG. 2 (S22) and FIG. 5 (j), the electroformed body 21 is polished. Specifically, after removing the electroforming mold 15 on which the electroformed body 21 is formed from the electroforming tank 41, the entire electroforming mold 15 is polished so that the electroformed body 21 has a desired thickness dimension. In this embodiment, polishing is performed so that the electroformed body 21 formed on the surface of the electroforming mold 15 is removed, and the upper surface of the electroformed body 21 and the upper surface of the photosensitive portion R2a of the second resist layer R2 are surfaces. Try to be in one state. Thereby, the electroformed member 20 is formed. By forming the electroformed member 20, a timepiece component 30 including the hard member 10 and the electroformed member 20 formed integrally with the hard member 10 is formed in the electroforming mold 15. In this way, the electroforming step S20 is completed.

<Removal process>
After the electroforming step S20 is completed, a removal step S30 is performed.
In the removal step S30, as shown in FIG. 2 (S31) and FIG. 5 (k), the photosensitive portion R1a of the first resist layer R1 and the photosensitive portion R2a of the second resist layer R2 of the electroforming mold 15 are removed by dissolution or the like. As a result, the formed timepiece component 30 is taken out of the electroforming mold 15. Thereafter, the electroformed member 20 is peeled off from the electroformed electrode E and the substrate G, whereby the timepiece component 30 is taken out. The method for taking out the timepiece component 30 is not limited to the melting as described above, and a physical method may be used.

  As described above, according to the present embodiment, by supporting the hard member 10 by forming the electroforming mold 15 so as to fill a portion of the hard member 10 that is different from the portion buried in the electroformed member 20, The positional deviation of the hard member 10 can be prevented during casting. As a result, work that has been performed separately to prevent the positional displacement of the hard member 10 is not required, so that workability is improved. Further, since the electroformed member 20 is formed integrally with the hard member 10 by using an electroforming method so as to fill a part of the hard member 10, the fixing of the hard member 10 and the electroformed member 20 becomes sufficient. . Thereby, the timepiece component 30 excellent in quality is obtained.

[Clock, movement]
Next, a mechanical wristwatch (corresponding to “clock” in claims) and a movement (corresponding to “movement” in claims) incorporated in this wristwatch will be described.

  In general, a machine body including a driving part of a timepiece is referred to as a “movement”. A state in which a dial and hands are attached to the movement, and put into a watch case to form a finished product, is referred to as “complete” of the watch. Of the two sides of the base plate constituting the watch substrate, the side of the watch case with the glass, that is, the side with the dial is referred to as the “back side” of the movement. Of the two sides of the main plate, the side of the watch case with the case back, that is, the side opposite to the dial is referred to as the “front side” of the movement.

FIG. 7 is an external view of the timepiece 1 according to the embodiment.
As shown in FIG. 7, the complete timepiece 1 of the present embodiment is a dial 4 having a movement 100 and a scale indicating information about time in a timepiece case 3 made of a case back cover and glass 2 (not shown). And a pointer including an hour hand 5 indicating the hour, a minute hand 6 indicating the minute, and a second hand 7 indicating the second. The dial 4 is provided with a date window 4a for clearly indicating a number representing a date. Thereby, the timepiece 1 can display the date in addition to the time.

  FIG. 8 is a plan view of the movement 100 as viewed from the front side. In FIG. 8, in order to make the drawing easy to see, some of the timepiece components constituting the movement 100 are not shown, and each timepiece component is illustrated in a simplified manner.

  As shown in FIG. 8, the movement 100 has a base plate 102 that constitutes a substrate of the movement 100. A winding stem 110 is rotatably incorporated in the winding stem guide hole 102 a of the main plate 102.

  The barrel complete 120 is supported rotatably with respect to the main plate 102 and the barrel holder 160. That is, the upper shaft portion of the barrel complete is supported so as to be rotatable with respect to the barrel holder 160. The lower shaft portion of the barrel is supported rotatably with respect to the main plate 102.

  The second wheel 124, the third wheel 126, the fourth wheel 128, and the escape wheel 130 are supported rotatably with respect to the main plate 102 and the train wheel bridge 162, respectively. That is, the upper shaft portion 124a of the center wheel & pinion 124, the upper shaft portion 126a of the third wheel & pinion 126, the upper shaft portion 128a of the fourth wheel & pinion 128, and the upper shaft portion 130a of the escape wheel & pinion 130 are respectively connected to the train wheel bridge 162. Is supported rotatably. Further, the lower shaft portion of the second wheel 124, the lower shaft portion of the third wheel 126, the lower shaft portion 128b of the fourth wheel 128 128 (see FIG. 9), and the lower shaft portion 130b of the escape wheel 130 (see FIG. 9). ) Are supported so as to be rotatable with respect to the main plate 102.

FIG. 9 is a schematic partial cross-sectional view illustrating portions of the escape wheel 130, the ankle 142, and the balance with hairspring 140.
As shown in FIG. 9, the ankle 142 includes an ankle body 142d and an ankle true 142f. The ankle stem 142f includes an upper shaft portion 142a and a lower shaft portion 142b. The ankle 142 is rotatably supported with respect to the main plate 102 and the ankle receiver 164. The lower shaft portion 142 b of the ankle 142 is supported so as to be rotatable with respect to the main plate 102.

  The upper shaft portion 142a of the ankle stem 142f is supported so as to be rotatable with respect to the ankle receiver 164. As the ankle receiver 164, the timepiece component 30 described in the above embodiment is used. The ankle receiver 164 includes a hard member 164a and an electroformed member 164b. The hard member 164a is formed in a ring shape from a material having a predetermined hardness, such as metal, ruby, ceramic, glass, or silicon. The upper shaft portion 142a of the pallet fork 142f is inserted into the opening of the hard member 164a. The hard member 164a is arranged to slide between the upper shaft portion 142a.

  The electroformed member 164b is formed integrally with the hard member 164a by an electroforming method. The electroformed member 164b is formed so as to fill a part of the hard member 164a. Specifically, the electroformed member 164b has a circular through hole, and is formed so that a part of the outer peripheral side of the hard member 164a is buried in the inner wall portion of the through hole.

  According to the above configuration, the hard member 164a is disposed on the sliding portion of the ankle receiver 164, and a part of the hard member 164a is disposed so as to be buried in the electroformed member 164b. For this reason, the wear resistance of the ankle receiver 164 can be improved, and the space between the hard member 164a and the electroformed member 164b is firmly fixed.

FIG. 10 is a plan view of the escape wheel and ankle.
As shown in FIG. 10, the escape wheel & pinion 130 is configured such that a plurality of teeth 132 a mesh with the ankle 142. The ankle 142 includes an ankle body 142d formed in a T shape by three ankle beams 143 and an ankle true 142f, and the ankle body 142d is configured to be rotatable about the ankle true 142f as an axis. Has been. The ankle stem 142f is attached by being driven into a holding hole (not shown) formed at the connecting portion between the ankle bodies 142d.

  Claw stones 144a and 144b formed in a substantially quadrangular prism shape are fixed to the tips of two of the three ankle beams 143. The claw stones 144a and 144b can be integrally fixed to the ankle beam 143 by the electroforming method described above. Some of the claw stones 144a and 144b are buried in the ankle beam 143.

  When the ankle 142 configured as described above is rotated around the ankle true 142f, the claw stone 144a or the claw stone 144b is moved to the tip of the tooth portion 132a of the escape wheel 130, more specifically, the sliding surface 132b. To come into contact.

  Thus, the claw stones 144a and 144b that contact the sliding surface 132b of the tooth portion 132a of the escape wheel 130 are integrally fixed to the ankle beam 143 by electroforming, and a part of the claw stones 144a and 144b is fixed. Are buried in the ankle beam 143, the claw stones 144a, 144b and the ankle beam 143 are firmly fixed.

The technical scope of the present invention is not limited to the above-described embodiment, and appropriate modifications can be made without departing from the spirit of the present invention.
In the above-described embodiment, the structure of the ankle receiver has been described as an example of the timepiece component 30, but is not limited thereto.

FIG. 11 is a plan view showing the configuration of the hour jumper 190.
As shown in FIG. 11, the hour jumper 190 has an electroformed member 190a and a hard member 190b. The hard member 190b is formed in a substantially quadrangular prism shape. The electroformed member 190a is integrally formed with the hard member 190b so as to fill a part of the hard member 190b. In this case, the space between the electroformed member 190a and the hard member 190b of the hour jumper 190 is firmly fixed.

Further, in addition to the configuration of the above-described embodiment, a removal restricting portion that restricts the removal of the hard member 10 may be provided between the hard member 10 and the electroformed member 20. Hereinafter, the omission control unit will be described.
FIG. 12A to FIG. 12H are diagrams each showing a configuration along the section BB in FIG. In each of FIGS. 12A to 12H, a part of the claw stone 144a is buried in the ankle beam 143. That is, a part of the claw stone 144a protrudes from the end surface 143t of the ankle beam 143 toward a direction perpendicular to the end surface 143t (hereinafter referred to as a third direction). Hereinafter, the end portion of the claw stone 144a embedded in the ankle beam 143 may be referred to as a base end portion, and the end portion of the portion protruding from the end face 143t may be referred to as a distal end portion. 12 (a) to 12 (h), in FIG. 12 (a), there is no disengagement restricting portion between the claw stone 144a and the ankle beam 143, whereas FIG. In (b) to (h) of FIG. 12, drop-out restricting portions 147 a to 147 g are provided between the claw stone 144 a and the ankle beam 143.

  In the configuration of the drop-out restricting portion 147a shown in FIG. 12B, a through hole (concave portion) 146a is formed between two opposing surfaces of the claw stone 144a. In contrast, the ankle beam 143 is provided with a filling portion 143a (convex portion) so as to fill the through-hole 146a of the claw stone 144a. Such a filling portion 143a is formed by electroforming the ankle beam 143 so as to fill a portion of the claw stone 144a provided with the through hole 146a. The through hole 146a and the filling portion 143a are engaged in the third direction. Thereby, it is possible to prevent the claw stone 144a from coming off from the ankle beam 143 in the third direction.

  In the configuration of the drop restricting portion 147b shown in FIG. 12C, a stepped portion (convex portion) 146b is formed at the base end portion of the claw stone 144a. The step portion 146b protrudes from the surface of the claw stone 144a in a direction crossing the third direction. In the stepped portion 146b, the claw stone 144a is thicker than other portions. Further, a corresponding step portion (concave portion) 143b is formed in a portion of the ankle beam 143 that is in contact with the step portion 146b. The step part 143b is thinner than the other parts. In this configuration, the stepped portions (stepped portion 146b and stepped portion 143b) are engaged in the third direction, so that it is possible to prevent the stonestone 144a from coming out of the ankle beam 143 in the third direction. it can.

  In the configuration of the drop-out restricting portion 147c shown in FIG. 12D, a stepped portion (concave portion) 146c is formed in a portion of the claw stone 144a that is different from the base end portion. The step portion 146c is thinner than the other portions of the claw stone 144a. A corresponding step (projection) 143c is formed in a portion of the ankle beam 143 that is in contact with the step 146c. The step portion 143c is thicker than other portions. In this configuration, the stepped portions (stepped portion 146b and stepped portion 143b) are engaged in the third direction, so that it is possible to prevent the stonestone 144a from coming out of the ankle beam 143 in the third direction. it can. In addition, the step part 146c may be a convex part (formed thicker than the other part), and the step part 143c may be a concave part (formed thinner than the other part).

  In the configuration of the drop-out restricting portion 147d shown in FIG. 12 (e), the claw stone 144a is formed so as to become gradually narrower from the proximal end portion to the distal end portion. Accordingly, the claw stone 144a is formed with an inclined portion (convex portion) 146d so that the thickness increases toward the base end portion. In addition, an inclined portion (concave portion) 143d corresponding to the inclined portion 146d is formed in a portion of the ankle beam 143 that is in contact with the claw stone 144a. The inclined portion 143d is formed so that the thickness gradually decreases from the end surface 143t toward the inside. In this configuration, since the inclined portion 146d and the inclined portion 143d are engaged in the third direction, the claw stone 144a can be prevented from coming off from the ankle beam 143 in the third direction.

  In the configuration of the drop-out restricting portion 147e shown in FIG. 12 (f), a screw thread (convex portion) 146e is formed in the claw stone 144a, and a screw hole (concave portion) 143e is formed in the ankle beam 143. In this configuration, the screw thread 146e and the screw hole 143e are engaged with each other by screwing. Thereby, it is possible to prevent the claw stone 144a from coming off from the ankle beam 143 in the third direction.

  In the configuration of the drop restricting portion 147f shown in FIG. 12 (g), a groove (concave portion) 146f is formed in a part of the claw stone 144a. The groove 146f is formed in a direction intersecting the third direction. At the position corresponding to the groove 146f in the ankle beam 143, a ridge (projection) 143f is formed. In this configuration, the groove 146f and the protrusion 143f are engaged in the third direction. Thereby, it is possible to prevent the claw stone 144a from coming off from the ankle beam 143 in the third direction.

  In the configuration of the drop-out restricting portion 147g shown in FIG. 12 (h), a stepped portion (convex portion) 146g is formed at the base end portion of the claw stone 144a. The step portion 146g is formed so that the claw stone 144a protrudes to one of the upper and lower sides of the ankle beam 143 (the upper side in FIG. 12 (h)). A step portion 143g is formed in a portion of the ankle beam 143 corresponding to the step portion 146g. The step portion 143g is formed such that the ankle beam 143 is thinned in one of the upper and lower sides. In this configuration, the step portion 146g and the step portion 143g are engaged in the third direction. Thereby, it is possible to prevent the claw stone 144a from coming off from the ankle beam 143 in the third direction.

  S10: Electroforming process S20: Electroforming process S30: Removal process 1 ... Mechanical watch (clock) 100 ... Movement 10 ... Hard member (first member) 10b ... Part 15 ... Electroforming mold 16 ... Recess K ... Space 20 ... Electroformed member (second member) 30 ... Timepiece component R1 ... First resist layer R2 ... Second resist layer G ... Substrate Ga ... First surface Gb ... Second surface Q1 ... First region Q2 ... Second region 147a ~ 147g ... Omission control part

Claims (8)

An electroforming process for forming an electroforming mold comprising: a base portion in which a part of the first member having a predetermined shape is entirely buried; and a space portion formed by the first member and the base portion;
An electroforming process of integrally forming the first member and the second member by embedding the second member in the space using an electroforming method;
A removing step of removing the base from the first member and the second member;
I have a,
In the electroforming process, the step of forming the electroforming process includes:
Forming an electroformed electrode capable of transmitting the light on a surface in a first direction of the substrate capable of transmitting light;
Forming a first resist layer sensitive to the light on the surface of the substrate in the first direction;
Forming a recess for disposing the first member in the first resist layer;
Disposing the first member in the recess;
Forming a second resist layer sensitive to the light so as to cover the first resist layer and the first member;
With respect to the first region of the second resist layer that overlaps part of the first member in the first direction surface, the second resist layer and the second resist layer from the first direction surface side of the second resist layer, and Irradiating the light in a direction substantially perpendicular to the plane of the first direction of the second resist layer so as to pass through the first resist layer;
The first resist layer from the second direction surface side of the substrate with respect to the second region overlapping the first region of the second direction surface opposite to the first direction surface of the substrate. Irradiating the light in a direction substantially perpendicular to the surface of the second direction of the substrate so as to pass through the second resist layer;
Developing the first resist layer and the second resist layer irradiated with the light, and forming the electroforming mold with the first resist layer and the second resist layer remaining on the substrate;
A method for manufacturing a timepiece part, comprising: The method for manufacturing a timepiece part according to claim 1, wherein a photoresist is used as the electroforming mold. A first member having a predetermined shape;
A second member formed using an electroforming method integrally with the first member so as to fill a part of the first member ;
The first member has a first surface and a second surface that are parallel to each other, and a side surface that connects the first surface and the second surface,
The timepiece component , wherein the second member is formed across the first surface, the second surface, and the side surface . The timepiece part according to claim 3 , wherein at least one of the first member and the second member is provided with a removal restricting portion that restricts the first member from being removed from the second member. The omission control part is
A recess provided in one of the first member and the second member;
The timepiece component according to claim 4 , further comprising: a convex portion provided on the other of the first member and the second member and disposed in the concave portion. The timepiece component according to any one of claims 3 to 5 , wherein the first member and the second member are used as a part of at least one of a gear, an ankle, a receiver, a ground plane, and a jumper. A movement comprising the timepiece part according to claim 3 . A timepiece comprising the timepiece part according to claim 3 .

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