JP6210992B2 - 応力層を持つ事前圧壊容量マイクロマシン・トランスデューサセル - Google Patents

応力層を持つ事前圧壊容量マイクロマシン・トランスデューサセル Download PDF

Info

Publication number
JP6210992B2
JP6210992B2 JP2014537801A JP2014537801A JP6210992B2 JP 6210992 B2 JP6210992 B2 JP 6210992B2 JP 2014537801 A JP2014537801 A JP 2014537801A JP 2014537801 A JP2014537801 A JP 2014537801A JP 6210992 B2 JP6210992 B2 JP 6210992B2
Authority
JP
Japan
Prior art keywords
membrane
cell
stress layer
substrate
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2014537801A
Other languages
English (en)
Japanese (ja)
Other versions
JP2015501594A (ja
JP2015501594A5 (cg-RX-API-DMAC7.html
Inventor
ペーター ディルクセン
ペーター ディルクセン
ロナルト デッケル
ロナルト デッケル
ヴィンセント アドリアヌス ヘンネケン
ヴィンセント アドリアヌス ヘンネケン
アドリアーン レーウェンステイン
アドリアーン レーウェンステイン
バウト マーセリス
バウト マーセリス
ヨン ダウフラス フラセル
ヨン ダウフラス フラセル
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Koninklijke Philips NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninklijke Philips NV filed Critical Koninklijke Philips NV
Publication of JP2015501594A publication Critical patent/JP2015501594A/ja
Publication of JP2015501594A5 publication Critical patent/JP2015501594A5/ja
Application granted granted Critical
Publication of JP6210992B2 publication Critical patent/JP6210992B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01H—MEASUREMENT OF MECHANICAL VIBRATIONS OR ULTRASONIC, SONIC OR INFRASONIC WAVES
    • G01H9/00—Measuring mechanical vibrations or ultrasonic, sonic or infrasonic waves by using radiation-sensitive means, e.g. optical means
    • G01H9/008—Measuring mechanical vibrations or ultrasonic, sonic or infrasonic waves by using radiation-sensitive means, e.g. optical means by using ultrasonic waves
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B06—GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS IN GENERAL
    • B06B—METHODS OR APPARATUS FOR GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS OF INFRASONIC, SONIC, OR ULTRASONIC FREQUENCY, e.g. FOR PERFORMING MECHANICAL WORK IN GENERAL
    • B06B1/00—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency
    • B06B1/02—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy
    • B06B1/0292—Electrostatic transducers, e.g. electret-type
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49005—Acoustic transducer

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Micromachines (AREA)
  • Pressure Sensors (AREA)
  • Transducers For Ultrasonic Waves (AREA)
  • Measuring Fluid Pressure (AREA)
  • Electrostatic, Electromagnetic, Magneto- Strictive, And Variable-Resistance Transducers (AREA)
JP2014537801A 2011-10-28 2012-10-26 応力層を持つ事前圧壊容量マイクロマシン・トランスデューサセル Active JP6210992B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201161552482P 2011-10-28 2011-10-28
US61/552,482 2011-10-28
PCT/IB2012/055919 WO2013061298A2 (en) 2011-10-28 2012-10-26 Pre-collapsed capacitive micro-machined transducer cell with stress layer

Publications (3)

Publication Number Publication Date
JP2015501594A JP2015501594A (ja) 2015-01-15
JP2015501594A5 JP2015501594A5 (cg-RX-API-DMAC7.html) 2015-11-26
JP6210992B2 true JP6210992B2 (ja) 2017-10-11

Family

ID=47505271

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014537801A Active JP6210992B2 (ja) 2011-10-28 2012-10-26 応力層を持つ事前圧壊容量マイクロマシン・トランスデューサセル

Country Status (8)

Country Link
US (1) US9534949B2 (cg-RX-API-DMAC7.html)
EP (1) EP2771132B1 (cg-RX-API-DMAC7.html)
JP (1) JP6210992B2 (cg-RX-API-DMAC7.html)
CN (1) CN103917304B (cg-RX-API-DMAC7.html)
BR (1) BR112014009659A2 (cg-RX-API-DMAC7.html)
MX (1) MX347686B (cg-RX-API-DMAC7.html)
RU (1) RU2603518C2 (cg-RX-API-DMAC7.html)
WO (1) WO2013061298A2 (cg-RX-API-DMAC7.html)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IN2014CN04975A (cg-RX-API-DMAC7.html) 2011-12-20 2015-09-18 Koninkl Philips Nv
CN105263851B (zh) 2013-05-31 2017-10-13 罗伯特·博世有限公司 被限位的膜
DE102013223695B4 (de) * 2013-11-20 2016-09-22 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zum herstellen eines kapazitiven ultraschallwandlers und anordnung einer mehrzahl von kapazitiven ultraschallwandlern
EP3110628B1 (en) * 2014-02-28 2019-07-03 The Regents of the University of California Variable thickness diaphragm for a wideband robust piezoelectric micromachined ultrasonic transducer (pmut)
JP6684817B2 (ja) * 2014-11-25 2020-04-22 コーニンクレッカ フィリップス エヌ ヴェＫｏｎｉｎｋｌｉｊｋｅ Ｐｈｉｌｉｐｓ Ｎ．Ｖ． 超音波システム及び方法
CN105792084B (zh) * 2016-04-26 2020-02-21 瑞声声学科技(深圳)有限公司 Mems麦克风及其制造方法
US11458504B2 (en) 2016-12-22 2022-10-04 Koninklijke Philips N.V. Systems and methods of operation of capacitive radio frequency micro-electromechanical switches
RU2672099C2 (ru) * 2016-12-23 2018-11-12 Евгений Анатольевич Обжиров Электрическая машина емкостная (эме) с ячейками внутреннего сжатия
WO2018235415A1 (ja) * 2017-06-21 2018-12-27 パナソニックＩｐマネジメント株式会社 物理量センサ
DE102019203829B4 (de) * 2019-03-20 2020-12-31 Vitesco Technologies GmbH Verfahren zum Herstellen einer Fluidsensorvorrichtung und Fluidsensorvorrichtung
US11904357B2 (en) * 2020-05-22 2024-02-20 GE Precision Healthcare LLC Micromachined ultrasonic transducers with non-coplanar actuation and displacement

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5619476A (en) * 1994-10-21 1997-04-08 The Board Of Trustees Of The Leland Stanford Jr. Univ. Electrostatic ultrasonic transducer
EP1028466B1 (en) 1999-02-09 2006-08-02 STMicroelectronics S.r.l. Method for manufacturing integrated devices including electromechanical microstructures, without residual stress
US20030022412A1 (en) 2001-07-25 2003-01-30 Motorola, Inc. Monolithic semiconductor-piezoelectric device structures and electroacoustic charge transport devices
US7489593B2 (en) 2004-11-30 2009-02-10 Vermon Electrostatic membranes for sensors, ultrasonic transducers incorporating such membranes, and manufacturing methods therefor
WO2010097729A1 (en) 2009-02-27 2010-09-02 Koninklijke Philips Electronics, N.V. Pre-collapsed cmut with mechanical collapse retention
US8327521B2 (en) * 2007-09-17 2012-12-11 Koninklijke Philips Electronics N.V. Method for production and using a capacitive micro-machined ultrasonic transducer
WO2009041675A1 (en) * 2007-09-25 2009-04-02 Canon Kabushiki Kaisha Electrostatic transducer and manufacturing method therefor
US7745248B2 (en) 2007-10-18 2010-06-29 The Board Of Trustees Of The Leland Stanford Junior University Fabrication of capacitive micromachined ultrasonic transducers by local oxidation
WO2009077961A2 (en) * 2007-12-14 2009-06-25 Koninklijke Philips Electronics, N.V. Collapsed mode operable cmut including contoured substrate
EP2145696A1 (en) * 2008-07-15 2010-01-20 UAB Minatech Capacitive micromachined ultrasonic transducer and its fabrication method
JP2010061976A (ja) * 2008-09-03 2010-03-18 Toshiba Corp スイッチ及びｅｓｄ保護素子
WO2010032156A2 (en) 2008-09-16 2010-03-25 Koninklijke Philips Electronics N.V. Capacitive micromachined ultrasound transducer
US8402831B2 (en) * 2009-03-05 2013-03-26 The Board Of Trustees Of The Leland Standford Junior University Monolithic integrated CMUTs fabricated by low-temperature wafer bonding
BR112014009698A2 (pt) * 2011-10-28 2017-05-09 Koninklijke Philips Nv célula transdutora micromanufaturada capacitiva que sofreu colapso previamente e método de fabricação da mesma
JP6265906B2 (ja) * 2011-11-17 2018-01-24 コーニンクレッカ フィリップス エヌ ヴェＫｏｎｉｎｋｌｉｊｋｅ Ｐｈｉｌｉｐｓ Ｎ．Ｖ． 円環形状の崩壊領域を持つ崩壊前の静電容量型トランスデューサーセル
IN2014CN04975A (cg-RX-API-DMAC7.html) * 2011-12-20 2015-09-18 Koninkl Philips Nv

Also Published As

Publication number Publication date
JP2015501594A (ja) 2015-01-15
CN103917304A (zh) 2014-07-09
US20140251014A1 (en) 2014-09-11
MX347686B (es) 2017-05-09
WO2013061298A3 (en) 2013-09-19
EP2771132B1 (en) 2018-08-29
CN103917304B (zh) 2016-08-17
RU2603518C2 (ru) 2016-11-27
EP2771132A2 (en) 2014-09-03
BR112014009659A2 (pt) 2017-05-09
MX2014004910A (es) 2014-05-28
US9534949B2 (en) 2017-01-03
WO2013061298A2 (en) 2013-05-02
RU2014121392A (ru) 2015-12-10

Similar Documents

Publication Publication Date Title
JP6210992B2 (ja) 応力層を持つ事前圧壊容量マイクロマシン・トランスデューサセル
JP5961697B2 (ja) プラグを備える事前圧壊された容量マイクロマシン・トランスデューサセル
JP5559818B2 (ja) 機械的な圧壊保持機能を備える事前圧壊ｃｍｕｔ
CN103958079B (zh) 具有环形塌陷区域的预塌陷电容式微机械换能器元件
CN102728535B (zh) 电气机械换能器及其制造方法
CN102728533B (zh) 机电变换器及其制作方法
US9809444B2 (en) System and method for a differential comb drive MEMS
KR101357312B1 (ko) 테이퍼 형상 표면을 갖는 멤브레인 지지대를 구비한 마이크로기계 음향 변환기 및 제조 방법
JP2012119831A (ja) 超音波振動子ユニット、及び超音波プローブ
Shkel et al. Acoustic micro-resonator utilizing hemispherical air cavity for sensitivity enhancement
JP6362741B2 (ja) 電気機械変換装置及びその作製方法
JP6177375B2 (ja) 電気機械変換装置及びその作製方法
JP6184534B2 (ja) 電気機械変換装置及びその作製方法
JP2010074538A (ja) 超音波振動子
JP2012119832A (ja) 超音波振動子ユニット、及び超音波プローブ

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20151002

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20151002

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20160516

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20160531

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20160826

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20161129

RD04 Notification of resignation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7424

Effective date: 20170214

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20170406

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20170718

A911 Transfer to examiner for re-examination before appeal (zenchi)

Free format text: JAPANESE INTERMEDIATE CODE: A911

Effective date: 20170726

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20170814

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20170912

R150 Certificate of patent or registration of utility model

Ref document number: 6210992

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250