JP6203154B2 - 有機分子メモリ - Google Patents
有機分子メモリ Download PDFInfo
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- JP6203154B2 JP6203154B2 JP2014193009A JP2014193009A JP6203154B2 JP 6203154 B2 JP6203154 B2 JP 6203154B2 JP 2014193009 A JP2014193009 A JP 2014193009A JP 2014193009 A JP2014193009 A JP 2014193009A JP 6203154 B2 JP6203154 B2 JP 6203154B2
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- organic molecule
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- 230000015654 memory Effects 0.000 title claims description 63
- 230000006870 function Effects 0.000 claims description 31
- 239000002052 molecular layer Substances 0.000 claims description 17
- 125000006575 electron-withdrawing group Chemical group 0.000 claims description 6
- 230000000903 blocking effect Effects 0.000 claims description 5
- 125000000217 alkyl group Chemical group 0.000 claims description 4
- 125000004432 carbon atom Chemical group C* 0.000 claims description 4
- 230000000052 comparative effect Effects 0.000 description 23
- 238000011156 evaluation Methods 0.000 description 10
- 238000010586 diagram Methods 0.000 description 9
- 230000008859 change Effects 0.000 description 8
- 125000005647 linker group Chemical group 0.000 description 8
- 239000000126 substance Substances 0.000 description 7
- 229910052721 tungsten Inorganic materials 0.000 description 7
- 239000010937 tungsten Substances 0.000 description 7
- 239000010931 gold Substances 0.000 description 6
- 239000000523 sample Substances 0.000 description 6
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 6
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 4
- 229910052737 gold Inorganic materials 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 239000002094 self assembled monolayer Substances 0.000 description 4
- 239000013545 self-assembled monolayer Substances 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 125000004434 sulfur atom Chemical group 0.000 description 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 3
- 125000005677 ethinylene group Chemical group [*:2]C#C[*:1] 0.000 description 3
- 239000010410 layer Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 125000000101 thioether group Chemical group 0.000 description 3
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 125000004093 cyano group Chemical group *C#N 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 125000005678 ethenylene group Chemical group [H]C([*:1])=C([H])[*:2] 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 238000004776 molecular orbital Methods 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 239000011733 molybdenum Substances 0.000 description 2
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 230000005641 tunneling Effects 0.000 description 2
- -1 —I) Chemical group 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical group C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical group C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
- 238000005411 Van der Waals force Methods 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000003282 alkyl amino group Chemical group 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
- GPBUGPUPKAGMDK-UHFFFAOYSA-N azanylidynemolybdenum Chemical compound [Mo]#N GPBUGPUPKAGMDK-UHFFFAOYSA-N 0.000 description 1
- 125000000751 azo group Chemical group [*]N=N[*] 0.000 description 1
- LLCSWKVOHICRDD-UHFFFAOYSA-N buta-1,3-diyne Chemical group C#CC#C LLCSWKVOHICRDD-UHFFFAOYSA-N 0.000 description 1
- 150000001722 carbon compounds Chemical class 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 238000007385 chemical modification Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 125000004663 dialkyl amino group Chemical group 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical group [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 125000004185 ester group Chemical group 0.000 description 1
- 125000001033 ether group Chemical group 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 150000002391 heterocyclic compounds Chemical class 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- 150000003008 phosphonic acid esters Chemical class 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 125000000168 pyrrolyl group Chemical group 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 238000010301 surface-oxidation reaction Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 description 1
- 125000004954 trialkylamino group Chemical group 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/801—Constructional details of multistable switching devices
- H10N70/881—Switching materials
- H10N70/882—Compounds of sulfur, selenium or tellurium, e.g. chalcogenides
- H10N70/8822—Sulfides, e.g. CuS
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
- G11C13/0009—RRAM elements whose operation depends upon chemical change
- G11C13/0014—RRAM elements whose operation depends upon chemical change comprising cells based on organic memory material
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
- G11C13/0009—RRAM elements whose operation depends upon chemical change
- G11C13/0014—RRAM elements whose operation depends upon chemical change comprising cells based on organic memory material
- G11C13/0016—RRAM elements whose operation depends upon chemical change comprising cells based on organic memory material comprising polymers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/50—Bistable switching devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/701—Organic molecular electronic devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
- H10K30/671—Organic radiation-sensitive molecular electronic devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/30—Coordination compounds
- H10K85/381—Metal complexes comprising a group IIB metal element, e.g. comprising cadmium, mercury or zinc
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/801—Constructional details of multistable switching devices
- H10N70/841—Electrodes
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C2213/00—Indexing scheme relating to G11C13/00 for features not covered by this group
- G11C2213/10—Resistive cells; Technology aspects
- G11C2213/15—Current-voltage curve
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/20—Multistable switching devices, e.g. memristors
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Electromagnetism (AREA)
- Inorganic Chemistry (AREA)
- Semiconductor Memories (AREA)
Description
を備える。
p1=(φ1−e1)1/2×L1 ・・・(1)
p2=(φ2−e2)1/2×L2 ・・・(2)
(111)表面を備える金(Au)基板上に、図8(a)に示す有機分子を用いて金とイオウ原子を結合させ、第1の有機分子を固定した。走査型トンネル顕微鏡(STM)のタングステン(W)の探針(tip)に、オクタアルキルチオールを用いてタングステンとイオウ原子を結合させ、第2の有機分子であるオクタアルキル鎖を固定した。その後、STMにより、金基板とタングステン探針間に流れる電流を測定した。
図9(a)〜図16(a)に示す有機分子を用いること以外は、実施例1と同様の試料作製と測定を行った。
タングステン探針にオクタアルキル鎖を固定しない点以外は、実施例1と同様の試料作製と測定を行った。
図9(a)〜図16(a)に示す有機分子を用いること以外は、比較例1と同様の試料作製と測定を行った。
14 上部電極配線(第2の電極)
16 有機分子層
16a 第1の有機分子
16b 第2の有機分子
Claims (4)
- 第1の仕事関数を有する第1の電極と、
第2の仕事関数を有する第2の電極と、
前記第1の電極と前記第2の電極との間に設けられ、前記第1の電極に化学結合し抵抗変化型分子鎖を有し前記第1の仕事関数より大きい第1のエネルギー準位を有する第1の有機分子と、前記第2の電極に化学結合し前記第2の仕事関数より大きく前記第1のエネルギー準位よりも小さい第2のエネルギー準位を有する第2の有機分子と、を含む有機分子層と、
を備える有機分子メモリ。 - 前記第1の仕事関数をφ 1 、前記第1のエネルギー準位をe 1 、前記第1の有機分子の長さをL 1 とする場合に式(1)で表記される第1の阻止係数p 1 よりも、
前記第2の仕事関数をφ 2 、前記第2のエネルギー準位をe 2 、前記第2の有機分子の長さをL 2 とする場合に式(2)で表記される第2の阻止係数p 2 が小さい請求項1記載の有機分子メモリ。
p 1 =(φ 1 −e 1 ) 1/2 ×L 1 ・・・(1)
p 2 =(φ 2 −e 2 ) 1/2 ×L 2 ・・・(2) - 前記第2の有機分子が炭素数3個以上11個以下のアルキル鎖を含む請求項1又は請求項2記載の有機分子メモリ。
- 前記第1の有機分子が、直鎖軸方向外に電子吸引基又は電子供与基が付加された一次元的又は擬一次元的なπ共役系鎖を含む請求項1ないし請求項3いずれか一項記載の有機分子メモリ。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014193009A JP6203154B2 (ja) | 2014-09-22 | 2014-09-22 | 有機分子メモリ |
US14/843,229 US9412944B2 (en) | 2014-09-22 | 2015-09-02 | Organic molecular memory |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014193009A JP6203154B2 (ja) | 2014-09-22 | 2014-09-22 | 有機分子メモリ |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2016066640A JP2016066640A (ja) | 2016-04-28 |
JP2016066640A5 JP2016066640A5 (ja) | 2016-12-01 |
JP6203154B2 true JP6203154B2 (ja) | 2017-09-27 |
Family
ID=55526560
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014193009A Expired - Fee Related JP6203154B2 (ja) | 2014-09-22 | 2014-09-22 | 有機分子メモリ |
Country Status (2)
Country | Link |
---|---|
US (1) | US9412944B2 (ja) |
JP (1) | JP6203154B2 (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6158013B2 (ja) * | 2013-09-24 | 2017-07-05 | 株式会社東芝 | 有機分子メモリ |
JP2019054207A (ja) * | 2017-09-19 | 2019-04-04 | 東芝メモリ株式会社 | 記憶装置及び記憶装置の製造方法 |
JP2023081627A (ja) * | 2021-12-01 | 2023-06-13 | キオクシア株式会社 | 有機分子メモリ |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20040191567A1 (en) | 2002-09-03 | 2004-09-30 | Caballero Gabriel Joseph | Light emitting molecules and organic light emitting devices including light emitting molecules |
US7807991B2 (en) * | 2003-08-19 | 2010-10-05 | Fuji Electric Holdings Co., Ltd. | Switching element |
US20070126001A1 (en) * | 2005-12-05 | 2007-06-07 | Sung-Yool Choi | Organic semiconductor device and method of fabricating the same |
JP2008066542A (ja) | 2006-09-07 | 2008-03-21 | Univ Chuo | 金属錯体化合物、電子素子、デバイス、電子素子の駆動方法 |
JP5390554B2 (ja) | 2011-03-24 | 2014-01-15 | 株式会社東芝 | 有機分子メモリ |
JP5717490B2 (ja) | 2011-03-24 | 2015-05-13 | 株式会社東芝 | 有機分子メモリ |
JP2013197268A (ja) * | 2012-03-19 | 2013-09-30 | Toshiba Corp | 不揮発性半導体記憶装置 |
JP2013197363A (ja) * | 2012-03-21 | 2013-09-30 | Toshiba Corp | 不揮発性半導体記憶装置およびその製造方法 |
JP6158013B2 (ja) * | 2013-09-24 | 2017-07-05 | 株式会社東芝 | 有機分子メモリ |
-
2014
- 2014-09-22 JP JP2014193009A patent/JP6203154B2/ja not_active Expired - Fee Related
-
2015
- 2015-09-02 US US14/843,229 patent/US9412944B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
JP2016066640A (ja) | 2016-04-28 |
US20160087203A1 (en) | 2016-03-24 |
US9412944B2 (en) | 2016-08-09 |
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